Mask

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Description

FIG. 1 is a front, top, and right side perspective view of a mask showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational side view thereof;

FIG. 5 is a right side elevational side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a rear, bottom, right side perspective view thereof;

FIG. 9 is a front, top, and right side perspective view showing that a front portion of the mask is at a left rotation position; and,

FIG. 10 is a front, top, and right side perspective view showing that the front portion of the mask is at a right rotation position.

The broken lines in the drawings depict portions of the mask that form no part of the claimed design.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
Foreign Patent Documents
304700984 June 2018 CN
D1121613 September 2001 JP
D192285 August 2018 TW
Patent History
Patent number: D861856
Type: Grant
Filed: Jun 11, 2018
Date of Patent: Oct 1, 2019
Assignee: MICROBASE TECHNOLOGY CORP. (Taoyuan)
Inventors: Chien-Hua Lin (Taoyuan), Shao-Yi Huang (Taoyuan), Yu-Chung Hsu (Taoyuan), Kai-Yao Lo (Taoyuan), Chia-Chen Huang (Taoyuan), Chi-Shan Hung (Taoyuan)
Primary Examiner: Lilyana Bekic
Application Number: 29/650,937
Classifications