Hat
The portions of the hat illustrated in long even length broken lines and the unshaded areas within the long even length broken lines adjacent to the solid lines of the hat depict portions of the hat that form no part of the claimed design. The short dashed broken lines in
Claims
The ornamental design for a hat, as shown and described.
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Type: Grant
Filed: May 14, 2018
Date of Patent: Aug 11, 2020
Inventor: Ding Hu Chen (New York, NY)
Primary Examiner: Jasmine Mlinarcik
Application Number: 29/647,478