Hat

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Description

FIG. 1 is a front perspective view of a hat, showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left-side elevational view thereof;

FIG. 5 is a right-side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a rear perspective view thereof.

The even length broken lines on the hat depict stitching and form part of the claimed design. The dot-dash broken lines in FIG. 7 that extend to the solid lines and the unshaded areas between those lines define portions of the hat that form no part of the claimed design.

Claims

The ornamental design for a hat, as shown and described.

Referenced Cited
U.S. Patent Documents
D136649 November 1943 Dannenberg
D142162 August 1945 Dannenberg
D429871 August 29, 2000 Dassinger
6484323 November 26, 2002 Pu
D594185 June 16, 2009 Lacy
D619788 July 20, 2010 Lacy
D681926 May 14, 2013 Votel
D747856 January 26, 2016 Foster
D755483 May 10, 2016 Arenson
D827990 September 11, 2018 Lacy
D843087 March 19, 2019 Foster
D853687 July 16, 2019 Foster
D865332 November 5, 2019 Boyle
Patent History
Patent number: D892461
Type: Grant
Filed: Jan 17, 2019
Date of Patent: Aug 11, 2020
Inventor: Zong Yun Miao (Nanjing)
Primary Examiner: Jasmine Mlinarcik
Application Number: 29/677,212
Classifications
Current U.S. Class: D2/886