Hat

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Description

FIG. 1 is a top perspective view of a hat, showing my new design with an adjustment strap in a fully loosened position;

FIG. 2 is a bottom perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right-side elevational view thereof;

FIG. 6 is a left-side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is an alternate bottom perspective view thereof, illustrated with the hat in an inside-out configuration and showing an adjustment strap in a tightened position; and,

FIG. 10 is an alternate bottom perspective view thereof, illustrated with the hat in an inside-out configuration and showing an adjustment strap in the loosened position.

The broken line outline of the partial human figure in FIG. 1 assists in illustrating how the claimed design may appear when worn, but forms no part of the claimed design. The dash-dash broken lines on the hat depict claimed stitching. The dot-dash broken lines in FIGS. 2, 8, 9, and 10 define the bounds of the claim and the broken line and area within form no part of the claimed design.

Claims

The ornamental design for a hat, as shown and described.

Referenced Cited
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Patent History
Patent number: D907336
Type: Grant
Filed: Mar 3, 2020
Date of Patent: Jan 12, 2021
Inventor: Yong Juan Wu (Nanjing)
Primary Examiner: Jasmine Mlinarcik
Application Number: 29/726,452
Classifications
Current U.S. Class: D2/880