Abstract: A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.

Abstract: Apparatuses and methods for applying a coating to an ear of corn are disclosed. An enclosure having a user accessible workspace and a motor to turn an ear of corn therein to apply a coating to the ear of corn rotated by the motor is also disclosed. The method includes providing an enclosure with a user accessible workspace for housing a motor assembly having a motor with a grip, releasably securing the ear of corn to the grip, rotating the ear of corn with the motor, and spraying the coating on the ear of corn with the coating applicator associated with the workspace. Each ear of corn has an identifier to track and index the ear corn during coating and drying.

Abstract: A substrate liquid processing apparatus of the present invention includes a guide rotary cup configured to guide a process-liquid scattering from a substrate rotating and being held by a substrate holding table and a guide cup configured to guide downward the process-liquid guided by the guide rotary cup. The guide cup includes a downward extension portion extending downward from an inner peripheral end portion of a guide cup body and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion. The inner peripheral extension portion is configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup can be guided downward.

Abstract: The invention relates to a method of generating a multicomponent particle comprising: and a multicomponent particle generating system comprising a movable support constructed to accelerate particles supplied on the movable support; a particle supply system for supplying the particles to the movable support; at least one nozzle arranged to generate a generally uninterrupted fluid jet along at least part of a circumference of the movable support without breaking up; to have said accelerated particles collide with the fluid jet so as to combine said particles with fluid of the fluid jet, for providing a multicomponent particle; and a collector arranged in the trajectory of said particles, by which said particles can be captured after collision with the fluid jet.

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).

Abstract: In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template.

Abstract: The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.

Abstract: A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit.

Abstract: Various embodiments of methods and devices for coating stents are described herein.

Abstract: A substrate processing apparatus including: a heating part for heating a wafer; a transport part through which a wafer is transported; a first transfer arm that receives a wafer from the heating part and places the wafer on the transport part; and a second transfer arm including a pair of plate-like tweezers that receives the wafer placed on the transport part from the transport part and transfers the wafer. The transport part includes a cooling plate having a cooling surface on which a wafer is placed. The cooling plate includes a temperature-adjusting channel through which a temperature-adjusting water is circulated for cooling the cooling plate to a temperature lower than a temperature of the heating process of the heating part. The cooling surface is provided with a recess that is similar in shape to and slightly larger than a planar shape of the pair of tweezers.

Abstract: The invention includes a lower guide unit which obliquely extends downward to an outside from a position closely opposed to a peripheral edge portion of a rear surface of the substrate held on the substrate holding unit, and is formed in an annular shape in a circumferential direction of the substrate; and an upper guide unit which has an upper end surface located at a substantially same height as a front surface of the substrate held on the substrate holding unit, forms a lower annular flow path between the upper guide unit and the lower guide unit for guiding downward together with a gas flow a treatment solution scattering from the substrate, is formed in an annular shape opposed to the lower guide unit to surround an outside lower region of the substrate, and has an inner peripheral surface having a longitudinal-sectional shape curved to bulge outward and extending downward.

Abstract: A gluing mechanism comprising a platform, a plurality of turn tables set on the platform for workpieces, a motor for driving the turn tables and a gluing device firmly set up on the platform. The gluing device comprises a forward assembly, an elevator, a panning assembly and a plurality of glue applicators. The forward assembly is set on the platform and moves along a shorter side of the platform. The elevator is set on the forward assembly and moves relative to the platform vertically. The panning assembly is set on the elevator and moves along a longer side of the platform. The glue applicators are installed on the panning assembly. The motor drives the turn tables simultaneously. The gluing mechanism of the present invention has benefits of simple structure, a high working efficiency and proceeds a precise rotary gluing process to workpieces. Therefore, an excellent gluing quality can be realized.

Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.

Abstract: A nozzle for use in a coating apparatus for the application of a coating substance to a stent is provided. Method for coating a stent can include discharging a coating composition out from a needle of a nozzle assembly, and atomizing the coating composition as the coating composition is discharged. The needle can be positioned in a chamber of the nozzle assembly, and gas can be introduced into the chamber for atomizing the coating composition.

Abstract: A substrate processing apparatus including a holder for rotatably holding a substrate; a coating solution supply nozzle for supplying a coating solution onto a front surface of the substrate to be processed held by the holder; a treatment chamber housing the holder and the coating solution supply nozzle; a cooling device which cools the substrate before the coating solution is supplied to the substrate, to a predetermined temperature; a heating devices which heats the substrate coated with the coating solution to a predetermined temperature; and a transferer that transfers the substrate between the treatment chamber, the cooling device and the heating device, wherein the treatment chamber, the cooling device and the heating device are partitioned from ambient air, and wherein at least the treatment chamber is connected to a gas supply mechanism having a supply source of a gas having a kinematic viscosity coefficient higher than that of air.

Abstract: A stent mandrel fixture for supporting a stent during the application of a coating substance is provided.

Abstract: A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.

Abstract: An apparatus for applying a layer to a hydrophobic surface. The apparatus including: a chuck having a top surface and rotatable about a axis perpendicular to the top surface and passing through a center point of the top surface; and hollow first and second dispense nozzles having respective first and second bores, the first and second dispense nozzles mounted on a application head disposed above the top surface of the chuck, the application head moveable in a direction parallel to the top surface of the chuck, the first dispense nozzle alignable over the center point when the application head is in a first position and the second dispense nozzle alignable over the center point when the application head is in a second position, at least a portion of the bore of second dispense tube having a maximum cross-sectional dimension of between about 0.5 millimeters and about 2.0 millimeters.

Abstract: A system for forming a coating on a stent has a hub for holding a plurality of cartridges. Each cartridge has a plurality of mandrels, each mandrel capable of supporting a stent. A chamber has a drying section and a spray coating section, and is configured to receive a cartridge from the hub. An arm moves a cartridge from the hub to the chamber. A spray applicator applies a coating composition to a stent in the spray coating section.

Abstract: A method and an apparatus of the present invention is used for the high-rate deposition of materials, such as carbon, silicon, metals, metal oxides, and the like, onto a metal substrate defined by a metal tape. The particles of the material are mixed with fluid and are injected against the metal tape at high pressure and high velocity. The particles of the material form a current collection surface of the metal tape. The metal tape is used as cathode or anode combined with a separator to form a fuel cell of a secondary battery, metal-ceramic membranes, film composite metal-ceramic materials for electronic devices.

Abstract: A coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.

Abstract: In order to apply a liquid material including a small number of bubbles, in particular almost no bubbles larger than a predetermined size, a liquid material supplying apparatus includes: a pressure tank applying a positive pressure higher than the atmospheric pressure to the liquid material; a syringe having a nozzle for discharging the liquid material; and a liquid path member forming a liquid path leading the liquid material from the pressure tank to the syringe; a valve member which is provided on the liquid path member and which opens/closes the liquid path; a bubble defoaming filter which is provided on the liquid path member between the syringe and the valve member and which removes bubbles from the liquid material lead in the liquid path member; and a pressure applying mechanism which starts/stops discharging the liquid material from the nozzle by selectively applying a first pressure higher than the atmospheric pressure and a second pressure lower than the first pressure.

Abstract: A coating and drying apparatus for the application of a coating substance to a stent and drying the stent is provided. The apparatus can include a cartridge. The cartridge can comprise a core, a plurality of stent mandrels, a first clutch, and a second clutch. The core can extend outwards from a circumference of the core. Each stent mandrel can be capable of supporting a stent. The first clutch can be coupled to the core and capable of being removeably coupled to a first shaft such that rotation of the first shaft enables rotation of the core. The second clutch can be coupled to the plurality of stent mandrels and capable of being removeably coupled to a second shaft such that rotation of the second shaft enables rotation of the stent mandrels.

Abstract: A method of cleaning a spin coater apparatus is provided. In one embodiment, the method comprises providing a spin coater apparatus having a coater cup comprising a basin with sidewalls, a rotatable platform situated inside the cup adapted for holding and rotating a wafer to be coated, and a solvent dispensing means mounted under the rotatable platform; placing the substrate on the rotatable platform; rotating the rotatable platform; continuously dispensing a cleaning solvent from the solvent dispensing means to rinse the backside of the wafer with the cleaning solvent and to pre-wet an interior surface of the sidewalls; and dispensing a coating material upon the wafer, the substrate mounted on the rotatable platform.

Abstract: To provide a coating apparatus capable of automatically executing a series of steps of measuring the shape of a lens and applying a primer solution thereon, drying the primer solution and applying a photochromic coating solution thereon, and curing the coated solutions by the UV irradiation, liberating the operator from the work of setting the lenses piece by piece. A lens-feeding portion 2 is arranged upstream of the series of steps, the lens-feeding portion 2 having lens-holding units 22 in which a plurality of lenses are arranged straight in the horizontal direction and/or in the up-and-down direction, and a first lens sub-carrier means 31 for carrying the lenses held therein to the lens-measuring portion 3.

Abstract: A coating system includes a housing, a coating umbrella, a rotatable assembly, a lift driver, a solvent storage chamber, and a jet device. The housing includes a block dividing the housing into a coating chamber and a painting chamber. The coating umbrella is configured for receiving a number of workpieces. The rotatable assembly is connected to the coating umbrella to drive the rotatable assembly to rotate. The lift driver lifts the rotatable assembly to switch the position of the coating umbrella between the coating chamber and the spray painting chamber. The solvent storage chamber is configured for storing paint solvent. The solvent storage chamber communicates with the painting chamber. The jet device is received in the solvent storage chamber, and communicated with the painting chamber to spray the paint solvent onto the workpieces.

Abstract: Wafers A1 to A10 of a first lot A and wafers B1 to B10 of a second lot B are processed by a second heating unit at different temperatures, respectively. A wafer W is carried in a processing block included in coating and developing system along a route passing a temperature control unit CPL2, a coating unit BCT, a heating unit LHP2, a temperature control unit CPL3, a coating unit COT, a heating unit LHP3, and a cooling unit COL in that order. The process temperature of the heating unit LHP3 is changed after the last wafer A10 of the first lot A has been processed by the heating unit LHP3.

Abstract: A substrate treatment apparatus of the present invention includes: a holding means for rotatably holding a substrate to be treated; a coating solution supply nozzle for supplying a coating solution onto the front surface of the substrate to be treated held on the holding means; a treatment container with an upper surface open for housing them; an exhaust means for exhausting an atmosphere in the treatment container from the bottom; a multiblade centrifugal fan provided on the inner periphery of the treatment container for flowing airflow on a front surface side of the substrate to the exhaust means; and a controller for controlling the number of rotations of the multiblade centrifugal fan corresponding to the number of rotations of the substrate, wherein the number of rotations of the multiblade centrifugal fan is controlled so that turbulent airflow flowing in a circumferential direction on the front surface of the substrate generated due to the rotation of the substrate is corrected to laminar airflow flowi

Abstract: A liquid application device capable of applying liquid to different size medium includes a transfer device for transferring the medium, a regulating member for regulating a transferring position of the transferred medium, and a liquid applicator including an application member for applying liquid to the medium transferred by the transfer means and a retention member for retaining the liquid in a liquid retention space which is formed by causing the retention member to abut on the application member. In addition, a storage device stores the liquid, a supply channel supplies the liquid in the storage device to the liquid retention space, a collection channel collects the liquid in the liquid retention space into the storage device, and a supply port is formed in the retention member and is connected to the supply channel. Also, a collection port is formed in the retention member and is connected to the collection channel, and a pump generates a flow of liquid in a liquid channel.

Abstract: A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

Abstract: An electroless plating apparatus is provided. The electroless plating apparatus includes a wafer holder; a chemical dispensing nozzle over the wafer holder; a conduit connected to the chemical dispensing nozzle; and a radiation source over the wafer holder.

Abstract: The invention provides a rotatable and optionally heatable device for holding a flat substrate. The device includes a supporting means for placing and holding the substrate on a supporting surface, optionally a heater, a means for rotating the supporting means and a means for applying a fluid, e.g. a solvent, onto the side of the substrate facing the supporting surface. The fluid is applied when the supporting device for supporting and holding the substrate is caused to rotate.

Abstract: A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.

Abstract: A fluid dispenser for use in the processing of substrates. The dispenser has a dome shaped body with a convex upper surface and has a number of conduits designed to supply fluid to the surface of a substrate at predetermined points.

Abstract: It is an object to provide a method for forming a thin film having a uniform thickness so as to follow asperities of a surface of a wafer to be processed and to provide a film-forming device used for the method. The film-forming device includes a treatment chamber for receiving a wafer and isolating the wafer from the air; a solvent-gas-supplying portion for supplying a solvent gas into the treatment chamber; a chuck for rotatably holding the wafer so that the downward-facing surface of the substrate is the surface on which a thin film is formed; a coating-solution-supplying portion for supplying a coating solution as a mist of charged particles toward the surface of the wafer; and a charging portion for charging the wafer with an electrical potential opposite to the charge of the particles.

Abstract: This manufacturing device for an optical disc includes: a disc-supporting base on which a disc substrate is mounted; a pin-shaped member arranged at a center of the disc-supporting base, and is movable in the vertical in a center hole of the disc substrate; and a capping member which is slidably placed on a top of the pin-shaped member, and closes the center hole of the disc substrate, wherein when the capping member placed on the top of the pin-shaped member is lowered such that a back face of the capping member contacts an around of the center hole of the disc substrate mounted on the disc-supporting base, the capping member slides on the top of the pin-shaped member.

Abstract: A carrying system includes first and second carrying machines each of which includes a holding unit, a base and a linkage having pivotally joined first and second links. The holding unit can be moved, by turning the second link relative to the first link which is turned relative to the base, along a substantially arc carrying route extending round the pedestal between a loading position and a processing position. The arc carrying route is closer to the pedestal with respect to an imaginary circle having its center on the pedestal and a radius corresponding to the distance between the pedestal and either of the loading position and the processing position.

Abstract: An apparatus for processing microelectronic topographies, a method of use of such an apparatus, and a method for passivating hardware of microelectronic processing chambers are provided. The apparatus includes a substrate holder configured to support a microelectronic topography and a rotatable case with sidewalls arranged on opposing sides of the substrate holder. The method of using such an apparatus includes positioning a microelectronic topography upon a substrate holder of a processing chamber, exposing the microelectronic topography to a fluid within the processing chamber, and rotating a case of the processing chamber. The rotation is sufficient to affect movement of the fluid relative to the surface of the microelectronic topography. A method for passivating hardware of a microelectronic processing chamber includes exposing the hardware to an organic compound and subsequently exposing the hardware to an agent configured to form polar bonds with the organic compound.

Abstract: An electroless deposition system is provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station includes an environmentally controlled processing enclosure, a first processing station configured to clean and activate a surface of a substrate, a second processing station configured to electrolessly deposit a layer onto the surface of the substrate, and a substrate transfer shuttle positioned to transfer substrates between the first and second processing stations. The system also includes a substrate transfer robot positioned on the mainframe and configured to access an interior of the processing enclosure. The system also includes a substrate a fluid delivery system that is configured to deliver a processing fluid by use of a spraying process to a substrate mounted in the processing enclosure.

Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.

Abstract: A substrate-processing apparatus includes a sample table which mounts thereon a to-be-processed substrate, a first line which supplies a chemical solution, a second line which supplies a cleaning liquid, a three-way valve connected to the first and second lines and configured to select one of the first and second lines, a filter provided across the first line upstream of the three-way valve, and configured to eliminate a foreign material from the chemical solution, and a nozzle provided downstream of the three-way valve and configured to discharge the chemical solution or the cleaning liquid when the first or second line is selected via the three-way valve. The three-way valve selects the first line when the substrate is coated with the chemical solution, and selects the second line in other cases.

Abstract: A coating device (42) for a coating solution and a light beam radiating device (151) which cures the coating solution are arranged in a clean room (7). Spectacle lenses (2) include a set of two lenses and are stored in a coating container (50). The coating device (42) applies the coating solution to coating target surfaces of the spectacle lenses (2) in the coating container (50). When the set of two spectacle lenses (2) coated with the coating solution are extracted from the coating container (50), they are stored in a lens rack (120) and sealed by a transparent plate of the light beam radiating device (151). After air in the lens rack (120) is purged with nitrogen gas, curing treatment for the coating solution is performed by the light beam radiating device (151).

Abstract: A coater for coating a material with a solution or a suspension includes an access door and a process port separately openable within a housing. A rotating coating drum is removably connected with respect to the coater and the coater is configured for exchange of drums having a wide range of production capacities.

Abstract: An apparatus for sensing a spin chuck for a spin coating unit includes a spin chuck which sucks a wafer with vacuum pressure to allow the wafer to be placed thereon, a rotary shaft which is rotated by driving of a motor below the spin chuck correspondingly thereto, and whose upper end is engaged with the spin chuck so as to interlock with the rotation of the spin chuck and a shaft guide shaped so as to surround a tubular stationary shaft of the spin chuck engaged with the rotary shaft. The apparatus further includes a sensing unit which senses whether or not the stationary shaft of the spin chuck is inserted into the shaft guide to a predetermined height a control unit which determines whether or not the spin chuck has been assembled normally from a signal sensed by the sensing unit and a notifying means which is controlled by the control unit to allow a user to recognize an assembled state of the spin chuck.

Abstract: It is an object to provide a method for forming a thin film which can be uniformly and precisely planarized without a high-loaded process as in a chemical mechanical polishing method and to provide a device used for the method. In a method for forming a thin film on a surface of a-semiconductor wafer as a substrate to be processed by supplying a coating solution to the wafer having asperities on the surface thereof, a thin film of a coating solution is planarized by placing the wafer having the thin film formed on the surface thereof in a solvent gas atmosphere generated in a treatment chamber, then spraying a solvent gas toward the surface of the wafer from a solvent-gas-supplying nozzle and, simultaneously, relatively moving the wafer and/or the solvent-gas-supplying nozzle in directions parallel to each other.

Abstract: An apparatus for coating the surface of a lens includes a carousel having a central hub and a plurality of arms. A drive shaft is mounted to each arm, with a magnetic clutch and a lens holder being operatively attached to the drive shaft. The carousel is configured to be raised, rotated, and lowered into a series of workstations for processing the lens in a predetermined sequence. A workstation has associated therewith a spin drive attached to a reciprocating arm assembly. The spin drive includes a magnetic clutch which may be coupled to the magnetic clutch of any one of the arms on the carousel, such that a rotation generated by the spin drive is transferred to the drive shaft, and the lens holder. The arm assembly is capable of being extended and retracted to selectively engage and disengage the carousel.

Abstract: The installation includes elements for the temporary injection of inert gas; and at least one individual and autonomous casing (6) provided with a window (13) and including receiving elements for a support (3) carrying an ophthalmic lens (2), and sealing elements (21) adapted to form around the ophthalmic lens (2) a sealed enclosure, that enclosure including a non-return inlet member adapted to cooperate with the elements for the temporary injection of inert gas.

Abstract: An exhaust monitoring cup which measures exhaust gas flowing through a top opening in a coater cup of a spin coating apparatus used in the deposition of photoresist coatings on semiconductor wafers. The exhaust monitoring cup includes a gas flow cup which is positioned in fluid communication with the top opening of the coater cup. The exhaust gas flows through a gas flow opening in the gas flow cup, and a flow rate measuring apparatus at the gas flow opening receives the exhaust gas and measures the flow rate thereof. The flow rate of the gas leaving the gas flow cup can be compared to the flow rate of the gas flowing from an exhaust conduit leading from the bottom of the coater cup, to facilitate detection of abnormal conditions in the coater cup or exhaust conduit.

Abstract: A system is provided for spray coating medical devices, comprising a rotary atomizer with one or more rotary heads and a plurality of holders to hold a plurality of medical devices, such as stents, wherein the holders are positioned around a longitudinal axis of the rotary head. A method of using such a system is also provided. The invention enables the use of rotary atomizers to coat small medical devices with reduced waste of coating material and allows increased production throughput by the coating of multiple devices simultaneously. The rotary atomizer may be an electrostatic rotary atomizer. The holders and/or a holding structure on which the holders are mounted may move relative to the rotary atomizer.