Abstract: An apparatus and method for producing a coated analytic substrate using a compact and portable automated instrument located in the laboratory setting at the point of use which can consistently produce one or a plurality of coated analytic substrates “on demand” for using the analytic substrate immediately after coating, preferably without a step of rinsing the coated analytic substrate before use. The apparatus preferably uses applicator cartridges having a reservoir containing the coating compositions used to form the coatings. Preferably the cartridges are removable and interchangeable to facilitate the production of individual analytic substrates having different coatings or different coating patterns. These coated analytic substrates have superior specimen adhesion characteristics due to the improved quality of the coatings applied by the coating apparatus and due to the quickness with which the coated analytic substrates can be used in the lab after production.

Abstract: There is provided a slit valve unit including: a body disposed on an outer side of a process chamber and having an entrance connected to an opening of the process chamber; a slit valve provided in an internal space of the body and selectively opening and closing the entrance; a plurality of packing members provided along the circumference of the entrance on an inner side of the body and tightly attached to the slit valve when the slit valve shields the entrance; and a connection pipe having one end exposed between the plurality of packing members on the inner side of the body so as to be connected to an airtight space formed among the plurality of packing members, the body, and the slit valve, and the other end exposed to the outer side of the body, the connection pipe penetrating the body.

Abstract: A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1).

Abstract: The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.

Abstract: A method of applying a coating solution onto an upper surface of a glass plate that is transported in a substantially horizontal attitude, according to the first aspect of the present invention, the method including the steps of transporting the glass plate into a coating chamber, and opening the plurality of coating nozzles which are positioned in a row at constant intervals therebetween along a curved shape of the upper surface of the glass plate in a width direction of the glass plate perpendicular to the direction of transporting the glass plate by the nozzle position adjusting means and the nozzle height adjusting means, to thereby inject the coating solution when the coating nozzles are located in a region of the upper surface of the glass plate which extends from the leading edge of the glass plate to the rear edge of the glass plate.

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).

Abstract: An apparatus for applying adhesive to the surface of expanded resin panels by means of a gluing roller, comprising a conveyor for feeding a panel, which is arranged upstream of the gluing roller, and a conveyor for receiving the panel, which is arranged downstream of the gluing roller, the conveyors being mutually aligned on a supporting framework so as to have adjacent ends, and means for moving the conveyors between a lowered position and a raised position, the means being controlled by an element for detecting a panel conveyed by the feeding conveyor so as to lift or lower the conveyors to a level at which the surface of the gluing roller is substantially in tangent contact with the panel in order to apply thereon a layer of adhesive.

Abstract: An apparatus and method for producing a coated analytic substrate using a compact and portable automated instrument located in the laboratory setting at the point of use which can consistently produce one or a plurality of coated analytic substrates “on demand” for using the analytic substrate immediately after coating, preferably without a step of rinsing the coated analytic substrate before use. The apparatus preferably uses applicator cartridges having a reservoir containing the coating compositions used to form the coatings. Preferably the cartridges are removable and interchangeable to facilitate the production of individual analytic substrates having different coatings or different coating patterns. These coated analytic substrates have superior specimen adhesion characteristics due to the improved quality of the coatings applied by the coating apparatus and due to the quickness with which the coated analytic substrates can be used in the lab after production.

Abstract: A droplet applying device (2) includes: application heads (2d) configured to eject an application liquid as multiple droplets toward to-be-coated subjects (K1, K2); a moving mechanism (2c) configured to move each of the to-be-coated subjects (K1, K2) and the application heads (2d) relative to each other; and a rotating mechanism (2b) configured to rotate the to-be-coated subjects (K1, K2) in a plane intersecting with an ejecting direction in which the multiple droplets are ejected.

Abstract: A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.

Abstract: An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon.

Abstract: The invention aims to provide substrate treatment equipment that can automatically collect a substrate in a normal condition without needing manual operation. The equipment includes a substrate holder 26 for holding substrates 12 in a multistage manner and a substrate transfer unit 34 for transferring the substrates 12 into the substrate holder 26, wherein a substrate holding condition of the substrate holder 26 is sensed by a sensing section 60. The sensing section 60 has photo-sensors 64a, 64b, and sensing waveforms sensed by the photo-sensors 64a, 64b are compared with a normal waveform. A control section 66 is provided, which controls a substrate transfer unit 34 such that substrates 12 other than at least a substrate 12 that was determined to be abnormal are transferred by the unit.

Abstract: Devices and methods for coating wheel rims for the production of both standard rims and special rims, are provided. An example of a device for coating wheel rims includes a pre-treating station that is followed by a powder priming station followed by a basecoat application station and a final coating station, in particular an acrylate powder station, with the final coating station being coupled to both the power priming station and the pre-treating station by at least one conveyor, respectively. The device permits a proportion of special rims to be introduced in addition to standard rims without any impairment of the spindle-synchronous operation of the device.

Abstract: A system is provided for heating or cooling discrete, linearly conveyed substrates having a gap between a trailing edge of a first substrate and a leading edge of a following substrate in a conveyance direction. The system includes a chamber, and a conveyor operably configured within the chamber to move the substrates through at a conveyance rate. A plurality of individually controlled temperature control units, for example heating or cooling units, are disposed linearly within the chamber along the conveyance direction. A controller is in communication with the temperature control units and is configured to cycle output of the temperature control units from a steady-state temperature output as a function of the spatial position of the conveyed substrates within the chamber relative to the temperature control units so as to decrease temperature variances in the substrates caused by movement of the substrates through the chamber.

Abstract: A paint line includes a plurality of modular manufacturing stations positioned in series and defining a forward transport direction. Each modular manufacturing station includes an article transportation device for moving at least one carrier through the modular manufacturing station. At least one of the modular manufacturing stations includes a piece of paint application equipment. A control system is in communication with each article transportation device and configured to independently move the carrier of each modular manufacturing station according to a unique operation pattern. The control system is also configured to index the carrier of each modular manufacturing station as the carrier traverses to a contiguous modular manufacturing station.

Abstract: The present invention provides film forming equipment that can reduce the space necessary for coating. The film forming equipment has an object conveyor for moving an object (50); a spray gun conveyor (41) for moving a spray gun (30) that sprays a coating material; and a controller for controlling operations of the object conveyor (41), the spray gun (30), and the spray gun conveyor, wherein the controller moves the object (50) in a specific direction while spraying a coating material from the spray gun (30) and reciprocates the object (50) so that partial layer coating can be sequentially conducted, and while coating the object (50), the controller shifts the object (50) and the spray gun (30) while keeping the relative positions of the object and the spray gun to each other constant.

Abstract: An apparatus and method for producing a coated analytic substrate using a compact and portable automated instrument located in the laboratory setting at the point of use which can consistently produce one or a plurality of coated analytic substrates “on demand” for using the analytic substrate immediately after coating, preferably without a step of rinsing the coated analytic substrate before use. The apparatus preferably uses applicator cartridges having a reservoir containing the coating compositions used to form the coatings. Preferably the cartridges are removable and interchangeable to facilitate the production of individual analytic substrates having different coatings or different coating patterns. These coated analytic substrates have superior specimen adhesion characteristics due to the improved quality of the coatings applied by the coating apparatus and due to the quickness with which the coated analytic substrates can be used in the lab after production.

Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.

Abstract: A system and method for use in applying a coating of a desired material onto one or more medical implant components. The system may include one or more thermal sprayers and a rotatable holding fixture having a plurality of mounting stations each operable to hold at least one medical implant component. The fixture may be operable to rotate about a central axis and each mounting station may be operable to rotate about a respective mounting station axis. The fixture may be arranged adjacent to one or more thermal sprayers so that during operation one or more desired materials may be sprayed by the one or more thermal sprayers upon an outer surface of each of the medical implant components while the fixture rotates about the central axis and while simultaneously therewith each of mounting stations having a respective medical implant component rotates about the respective mounting station axis.

Abstract: An apparatus is designed to apply a controlled adhesive bead to a workpiece as the workpiece is manually moved along a stationary adhesive dispensing mechanism. The apparatus comprises a worktable with a motion detection device mounted on a top surface of the table, the adhesive dispensing mechanism mounted to the worktable, an electronic control system mounted to the worktable and operatively connected to the motion detection device and the adhesive dispensing mechanism, and an adhesive source. The workpiece is manually moved under the dispensing mechanism. Regardless of the workpiece movement speed, a consistent sized adhesive bead is applied to the workpiece.

Abstract: An apparatus for applying adhesive to the surface of expanded resin panels by means of a gluing roller, comprising a conveyor for feeding a panel, which is arranged upstream of the gluing roller, and a conveyor for receiving the panel, which is arranged downstream of the gluing roller, the conveyors being mutually aligned on a supporting framework so as to have adjacent ends, and means for moving the conveyors between a lowered position and a raised position, the means being controlled by an element for detecting a panel conveyed by the feeding conveyor so as to lift or lower the conveyors to a level at which the surface of the gluing roller is substantially in tangent contact with the panel in order to apply thereon a layer of adhesive.

Abstract: A system and method for use in applying a coating of a desired material onto one or more medical implant components. The system may include a thermal sprayer and a rotatable holding fixture having a plurality of mounting stations each operable to hold at least one medical implant component. The fixture may be operable to rotate about a central axis and each mounting station may be operable to rotate about a respective mounting station axis. The fixture may be arranged adjacent to the thermal sprayer so that during operation the desired material may be sprayed by the thermal sprayer upon an outer surface of each of the medical implant components while the fixture rotates about the central axis and while simultaneously therewith each of mounting stations having a respective medical implant component rotates about the respective mounting station axis.

Abstract: The present invention provides a substrate carrying and processing apparatus which is intended to reduce the size of the space for storing substrates in each substrate storing section as much as possible so as to downsize the apparatus and increase the number of substrates to be stored therein as well as to enhance the throughput. The substrate carrying and processing apparatus comprises a carrier block S1 which is adapted to position carriers 20 each receiving wafers W therein, a processing block S2 including processing units U1 to U4, 31 used for processing each wafer, a main arms A1 adapted to transfer each wafer to each processing unit, a rack unit U5 which is disposed between the carrier block and the processing block and able to store wafers to be processed, and a transfer arm D adapted to transfer each wafer to the rack unit.

Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

Abstract: A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle, disposed to face a surface of the substrate supported by the substrate supporting unit, having a strip-shaped injection opening extended along a direction extending from a periphery of the substrate toward a central portion thereof, a moving unit for moving the developer nozzle from an outer portion of the substrate toward the central portion thereof, and a controller for controlling operations such that while the substrate is rotated forwardly by the rotation driving mechanism, a developer is supplied through the injection opening to the surface of the substrate by moving the developer nozzle and, then, the substrate is rotated backwardly by the rotation driving mechanis

Abstract: The present invention relates to a system and method of bonding garments with elastomers and particularly to a system and method to cut and hem in a garment in a continuous process and also a system and method to incorporate an elastic strip into a garment in a continuous process and a system and method to provide computer control of hemming, bonding, gathering and inserting an elastic strip into a garment.

Abstract: A spray application system for applying material to a surface of a rotating body such as a beverage can includes a detector that detects the actual speed of rotation of the surface during a spraying operation. This allows a controller to adjust trigger signals for the application device to be adjusted based on speed of rotation to minimize overcoat. A laser sensor may be used as an example. The use of the speed detector also allows for partial wraps as well as full wraps of applying material to the rotating surface.

Abstract: Described is a method for manufacturing a display including a substrate on which a structure, such as, for instance, a matrix structure in relief, is provided, which structure bounds a number of areas, wherein, with the aid of an inkjet printhead, substantially in each area an amount of liquid is deposited, wherein with the aid of at least one sensor a measurement is performed on the substrate to determine the position of a respective area, and on the basis of the thus determined position the printhead is controlled to deliver an amount of liquid at the correct place. Also described is an apparatus for carrying out the method, a substrate for use in the method and a display obtained with the method.

Abstract: A substrate processing apparatus is configured to provide in series a plurality of processing blocks, each block including a processing unit and a transport robot transporting a substrate. A substrate rest is provided in a connecting portion of adjacent processing blocks. A sensor plate with sensor coils is provided spanning over support pins of the substrate rest. Once a temperature-measurement substrate with temperature-measuring elements, each element formed by connecting a coil to a quartz resonator, is placed on the support pins, a transmitter-receiver transmits transmission waves corresponding to the characteristic frequencies of the quartz resonators to the temperature-measuring elements through the sensor coils. After the stop of the transmission, the transmitter-receiver receives electromagnetic waves from the temperature-measuring elements through the sensor coils, and the temperature computer computes the substrate temperature based on the frequencies of the electromagnetic waves.

Abstract: An automatic waxing apparatus and a method thereof are provided. The automatic waxing apparatus includes a movable door-shaped module, at least a waxing module and a controlling module. The movable door-shaped module includes a door-shaped structure capable of moving with respect to the vehicle. The waxing module disposed on the door-shaped structure includes a wax-supplying unit and a wax-polishing unit. The controlling module is coupled to the door-shaped structure, the wax-supplying unit and the wax-polishing unit. The controlling module, according to the information of the vehicle, determines a moving path of the door-shaped structure, a waxing path of the wax-supplying unit, and a polishing path of the wax-polishing unit with respect to the vehicle.

Abstract: A film forming apparatus by which uniform and large area films can be formed according to the AD method. The film forming apparatus includes: a film forming chamber; a substrate holder located in the film forming chamber, for holding a substrate on which a structure is to be formed; an exhaust pump for exhausting an interior of the film forming chamber; an aerosol generating unit for generating an aerosol by blowing up a raw material powder placed in a container with a gas; a carrier pipe for introducing the generated aerosol into the film forming chamber; a nozzle for spraying the aerosol introduced via the carrier pipe toward the substrate; and a control unit for chaotically changing a relative position of the substrate held by the substrate holder and the nozzle.

Abstract: A robotic pen includes a computer numerically controlled machine having a multiaxis stage for mounting a workpiece, and a cooperating elevator which translates relative thereto. A pen tip is rotatably mounted to the elevator. And, a dispenser is joined in flow communication with the pen tip for ejecting a stream of material atop the workpiece as the workpiece moves relative thereto for maintaining a substantially constant gap between said pen tip and the workpiece during relative movement therebetween.

Abstract: The invention concerns a contactless numerical printing machine for products of average fluidity, such as varnish, glue, and conducting or scratchable ink, onto a substrate of variable thickness and dimensions. The machine includes a special device for printing without contact by projection. The projected materials are materials of average fluidity or composed of large-dimension molecules. The process used includes an electro-acoustic device for control of the projection, and a multiplicity of projection nozzles, each controlled individually. The machine also includes a production chain with different work stations, whose printing devices are controlled by a computer management system. The production chain allows printing with a certain precision in given zones located during the processing by an appropriate work station.

Abstract: The present invention provides a seasoning apparatus capable of evenly seasoning each individual article, without seasoning any too heavily or too lightly. Therein, a screw having a helical blade is installed in a tube. The helical blade provides partitions that are provided upright between an article supply port and a discharge port. An article group, before seasoning, is accommodated in a section partitioned by the partitions, the motor rotates the screw, and the article group is transported from the supply port to the discharge port. Therein, each article group is transported to the discharge port separated from other article groups, and each individual article in the article group is seasoned evenly with the same seasoning processing time and the same seasoning supply ratio. In addition, the constitution of the seasoning apparatus is simplified because the screw simultaneously serves the two functions of separating and transporting the article groups.

Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.

Abstract: The present invention provides a method for making a color filter having a plurality of filter elements aligned in a dot-matrix on a substrate. The method has a first-scanning step of moving the inkjet head having a nozzle line including a plurality of nozzles relative to the substrate while selectively discharging a filter material from the plurality of nozzles so as to form filter elements on filter element forming regions of the substrate and a second-scanning step of moving the inkjet head by a second-scanning distance ? in a second-scanning direction. The plurality of nozzles are divided into a plurality of groups and the first-scanning step and the second-scanning step are repeated so that all the nozzle groups scan the same section of the substrate.

Abstract: In this invention a coating of unexposed photoresist is used to protect from semiconductor processing the area immediately above a zero layer alignment mark used for a wafer stepper alignment. The entire surface of a wafer is coated with photoresist and all shot sites on the surface of a wafer including those containing the zero layer alignment marks are exposed with circuit patterns. Before the exposed areas of photoresist are removed, a protective coating of unexposed photoresist is applied to the surface of the wafer immediately above the alignment marks but within the boundaries of the shot site. The wafer is processed in the areas outside of the protective coating of photoresist including the shot site containing alignment marks. The area under the protective coating is not processed. This maintains a clear and concise view of the alignment marks. The area beyond the protective coating is processed along with the other shot sites.

Abstract: An apparatus for controlling a speed of a motor of a metering pump providing pressurized fluid at a dispensing gun. The dispensing gun is opened and closed to dispense fluid onto a substrate being carried by a conveyor past the dispensing gun. The apparatus has a pressure control producing first motor speed signals as a function of changing speeds of the conveyor and changing fluid pressures in the dispensing gun when the dispensing gun is open. A flow control produces second motor speed signals as a function of the changing speeds of the conveyor. During changes in conveyor velocity, a motor speed control provides the first motor speed signal to the pump motor which operates the motor at speeds causing the pump to provide fluid to the dispensing gun at pressures changing at a rate tracking a rate of change of the speed of the conveyor.

Abstract: A system for controlled dispensing of a material onto an elongated window component. A nozzle dispenses the material into contact with a surface of the elongated window component at a delivery site located along a path of travel of the elongated window component. A conveyer moves the elongated window component along the path of travel relative to the nozzle at a controlled speed. A metering pump delivers controlled amounts of the material to the nozzle. A pressurized bulk supply delivers the material to an inlet to the metering pump. A controller regulates the speed of the metering pump to control the flow rate of the material dispensed by the nozzle.

Abstract: A film forming apparatus comprising a substrate holding section for holding a substrate to be processed, a nozzle unit arranged and opposing the substrate holding section, having a discharge hole for continuously applying film-forming solution, in the form of a slender stream, to a surface of a substrate held by the substrate holding section, and a drive mechanism for driving the substrate and the nozzle unit relative to each other, thereby to coat the surface of the substrate with the solution, while the nozzle unit is applying the solution, in the form of a slender stream, to the surface of the substrate.

Abstract: A system and method for setting up an applicator to treat a target blank traveling on a conveyor includes placing a mark on an example blank, where the mark represents a desired location for treatment of the target blank. The marked example blank is passed along the conveyor, and the location of the mark is sensed on the example blank. The applicator is programmed to treat the target blank at the sensed location. Further, a method and system for regulating an applicator for treating a desired location of a target blank traveling along a conveyor include passing the target blank along the conveyor and sensing an applied location of the treatment to the target blank. The applied location is compared with the desired location and responsive to the comparing, the applicator is adjusted to apply the treatment closer to the desired location.

Abstract: An apparatus for forming a film of a process liquid, comprising a mounting table for supporting the substrate to be processed substantially horizontally, a process liquid supply device for supplying a process liquid for processing the substrate, a linear nozzle having a header space which has a length substantially corresponding to a diameter of the substrate and a liquid discharge portion, the header space mutually communicating with the liquid discharge portion, a liquid inlet port which communicates with the process liquid supply device and whose opening is formed above the header space, a moving device for relatively moving the linear nozzle and the mounting table while the liquid discharge portion faces the substrate on the mounting table, and a control device for controlling a viscosity of the photoresist solution within the header space or controlling a temperature of the developing liquid in the header space.

Abstract: An apparatus for supplying a liquid resist into a through hole part of an electroconductive substrate comprises an application roll, rotating in a single rotational direction, for coating the electroconductive substrate carried by a carrier with a liquid resist. An opposing member opposed to the application roll enables the electroconductive substrate carried by the carrier to be held. A control unit controls the carrier so that the carrier moves the electroconductive substrate between the application roll and the opposed member in a first carrying direction, and subsequently in a second direction inverse to the first carrying direction.

Abstract: A coating apparatus which comprises a feeding means to feed a coating liquid, a coating liquid applicator having a slot extending in one direction to discharge the coating liquid fed by the feeding means, and a conveying means to move at least either the coating liquid applicator or a substrate to be coated with the coating liquid relatively one to the other, comprising: (a) a first control means which comprises (a-1) a position detecting means to detect positions of the coating liquid applicator or the substrate which is moved by the conveying means, and (a-2) a controller capable of stopping the coating liquid applicator or the substrate which is moved by the conveying means at a position detected by the position detecting means such that a start-of-coating line of the substrate is in register with the slot of the coating liquid applicator and capable of starting the movement of the coating liquid applicator or the substrate which is stopped at the position; and (b) a second control means which comprises a

Abstract: A system for monitoring an electrostatic powder painting process having a conveyor line adaptable for transporting articles to be electrostatically powder painted sequentially through a plurality of zones in the process. For monitoring the usage of powder paint particles, or "powder", applied to the articles, the system senses the weight of the powder in the powder delivery apparatus and displays it in real time as a powder-weight function over a period of time. For monitoring the operation of the conveyor line transporting the articles, the system senses the conveyor line speed and displays it in real time as a line-speed function over a period of time. For monitoring the precleaning-surface activation of the articles, the system senses the pH of the cleaning-surface activation solution and displays it in real time as a pH function over a period of time.

Abstract: A system for infiltrating, with active materials, a porous substrate to form electrodes, typically used for batteries, is described that features a vacuum device having a dynamic distribution assembly which allows for continuous and controlled deposition of electrochemical active materials onto a substrate, as the substrate moves therethrough, while preventing the active materials from leaving the vacuum chamber before infiltrating the substrate. The vacuum device includes a vacuum chamber, in fluid communication with a supply of active materials, and a vacuum pump, disposed within the vacuum chamber. The vacuum chamber includes an inlet and an outlet, positioned opposite to the inlet. The first and second opposed major surfaces and a plurality of voids extend therebetween. While disposed within the vacuum chamber, the vacuum pump creates a pressure differential between the first and second surfaces.

Abstract: A system for monitoring an electrostatic powder painting process having a conveyor line adaptable for transporting articles to be electrostatically powder painted sequentially through a plurality of zones in the process. The monitoring system dispenses powder paint particles from a delivery container through a conduit to an electrostatic powder paint spray gun used for applying the powder paint particles to the articles in a painting zone, and senses the weight of the delivery container and powder paint particles therein with a scale device. The scale device generates a paint weight signal corresponding to the real time weight of the delivery container and powder paint particles therein. The monitoring system transmits the paint weight signal from the scale device to a computer-monitor adaptable for displaying the real time weight of the delivery container and powder paint particles therein as a container weight function over a predetermined period of time.

Abstract: A semiconductor fabrication apparatus including a plurality of process units for sequentially processing a semiconductor wafer. A heating unit, a cooling unit, a resin coating unit, and a resin hardening unit are included. Also, a sender unit and a process control unit are included besides the process units. In the sender unit, a wafer size sensor is provided in order to detect the size of an original wafer. The wafer size data detected by the sensor is held and processed in the process control unit. Finding the original size of a wafer, the process control unit gives instructions to process units so as to set a correct stop position of the wafer and to select suitable wafer supporting means according to the detected wafer size. Thus, the apparatus is automatically set to a correct state for uniformly processing the semiconductor wafer. In some units, there are provided sensors to find the size of the supporting means, for example, carrier guides, forks, and stoppers.

Abstract: An apparatus (10) and method for reducing stringing of adhesive from a nozzle (20) of a dispensing apparatus (12) includes a pneumatically driven cylinder (50) which translates the source of adhesive co-linear with the translating substrate (100). The gun (14) is alternately translated at speeds equal to or greater than the substrate (100), with the object of causing the string (102) of adhesive to fall back onto the substrate (100) in a desired location rather than become airborne and fly away to undesirable locations.

Abstract: The invention concerns a contactless numerical printing machine for products of average fluidity, such as varnish, glue, and conducting or scratchable ink, onto a substrate of variable thickness and dimensions. The machine includes a special device for printing without contact by projection. The projected materials are materials of average fluidity or composed of large-dimension molecules. The process used includes an electro-acoustic device for control of the projection, and a multiplicity of projection nozzles, each controlled individually. The machine also includes a production chain with different work stations, whose printing devices are controlled by a computer management system. The production chain allows printing with a certain precision in given zones located during the processing by an appropriate work station.