Abstract: A method of drying an anesthesia breathing system includes removing a CO2 absorber from the anesthesia breathing system, when the CO2 absorber is connected to an absorber inlet port and an absorber outlet port. The method further includes moving a bag-to-vent flow diverter to an intermediate position so as to simultaneously open both a bag channel and a ventilator channel, and connecting an inspiratory port and an expiratory port of the anesthesia breathing system together. A dry gas source is connected to an absorber outlet channel, and then a dry gas flow is provided through the bag channel and the ventilator channel so as to dry out moisture from a bag circuit and a ventilator circuit of the anesthesia breathing system.

Abstract: A fake eyelash cleaning assembly includes a cleaning tank for containing a cleaning solution thereby facilitating fake eyelashes to be submerged in the cleaning solution for cleaning. An ultrasonic emitter is integrated into the cleaning tank to emit ultrasonic sound waves into the cleaning solution for dislodging makeup from the fake eyelashes to clean the fake eyelashes. Additionally, the cleaning tank is supported on a housing. A first drawer is slidably integrated into the housing and the first drawer is foraminous to pass air therethrough. A blower is positioned within the housing to blow air into the first drawer for drying the fake eyelashes when the fake eyelashes are positioned in the first drawer. A second drawer is slidably integrated into the housing to store the fake eyelashes when they have been dried.

Abstract: A mechanism that conveys a substrate is cleaned in a cleaning unit. A substrate processing apparatus that includes a substrate polishing device and a substrate cleaning unit is disclosed. The substrate cleaning unit includes a cleaning module and a cleaning unit conveyance mechanism. The cleaning unit conveyance mechanism includes a hand and a hand open/close mechanism. The substrate processing apparatus further includes a hand cleaning unit. The hand cleaning unit includes a hand cleaning tank and a cleaning liquid injection mechanism.

Abstract: A decontamination station that can include a head assembly and a first puck member provided on the head assembly. The core member inflow passage and the puck member inflow passage together can form an inflow passage for incoming gas. The core bore and the puck bore together can form a cleaning chamber for accepting a stylus to be de-contaminated. A gas flow can be provided into the inflow passage, through the cleaning chamber, and from the cleaning chamber out through the outlet port. The gas flow can be configured to provide decontamination of the stylus positioned in the cleaning chamber. The first puck member can be removably disposed upon the head assembly for supplementing the first puck member, for adjusting height of the cleaning chamber, by removing the first puck member or adding one or more additional puck members.

Abstract: A system includes a cooling plate coupled to a first disk holder and to a second disk holder. The first disk holder and the second disk holder are each shaped to be removably coupled to respective inner diameter surfaces of disks such that, when coupled, each disk is positioned a distance from the cooling plate.

Abstract: A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate holding mechanism with the heater in opposed relation to the upper surface. A heater cleaning method includes locating the heater at a position above a lower nozzle in opposed relation to a first spout of the lower nozzle, the lower nozzle being in opposed relation to a lower surface of the substrate held by the substrate holding mechanism, and a lower cleaning liquid spouting step of supplying a cleaning liquid to the lower nozzle to spout the cleaning liquid upward from the first spout with no substrate being held by the substrate holding mechanism to thereby supply the cleaning liquid to an outer surface of the housing of the heater located at the heater cleaning position.

Abstract: Disclosed is a heating circulation type drying module of a dishwasher using a fan module and PTC heaters. The dishwasher includes a cabinet defining the external appearance, a tub provided in the cabinet, a door for opening or closing the tub, a flow-path unit for circulating air inside the tub through a suction port and an exhaust port, which communicate with the tub, a suction duct for communicating with the suction port, an exhaust duct for communicating with the suction duct and the exhaust port, at least two heaters provided inside the exhaust duct for heating the air, and a fan for supplying the air to the heaters. The dishwasher may achieve improved drying performance via adjustment in the temperature of air to be discharged, and may reduce power consumption via omission of a rinsing water heating course.

Abstract: A tool cleaning device for a machine tool has a chip removing device which removes the chip, a moving device to which the chip removing device is attachable, a detecting device which detects a storing state of the chip to the tool of the machine tool, an information processing device which processes information according to the storing state of the chip acquired by the detecting device and judges a region where a chip removing is necessary, and a controller of the moving device which moves the chip removing device to the region where the chip removing is necessary judged by the information processing device. The chip stored on the tool is cleaned by the chip removing device.

Abstract: An automatic water faucet device 1 for automatically discharging water when an object to be detected is detected has: a sensor 14 that detects the object; a first water discharge part 12 that performs foamy water discharge; a second water discharge part 13 that performs spray water discharge; and a controller 40 that performs control for switching between the foamy water discharge from the first water discharge part 12 and the spray water discharge from the second water discharge part 13, wherein the controller 40 performs the foamy water discharge from the first water discharge part 12 while the sensor 14 detects the object, and when the sensor 14 no longer detects the object, the controller 40 stops this foamy water discharge, and thereafter performs spray water discharge from the second water discharge part 13 for a predetermined period.

Abstract: A dishwasher includes a tub having an air outlet, an airflow conduit fluidly coupling the tub air outlet to ambient air, a blower assembly forcing air to flow from the tub and through the tub air outlet into the airflow conduit, a first reservoir associated with the airflow conduit and collecting liquid condensed from the air forced through the airflow conduit, the first reservoir fluidly coupled to the tub for draining the collected liquid into the tub, and a second reservoir associated with the airflow conduit downstream of the first reservoir and collecting liquid condensed from the air prior to the exhaustion of the air to the ambient air, wherein any liquid not collected by the first reservoir is collected by the second reservoir for evaporation.

Abstract: A substrate liquid processing apparatus includes a liquid unit configured to process a liquid processing unit configured to process a substrate with multiple kinds of processing liquids, an exhaust pipe connected to the liquid processing unit, and configured to allow an exhaust gas from the liquid processing unit to flow therein, a plurality of individual exhaust pipes provided to correspond to at least one of the multiple kinds of processing liquids, and an exhaust switching unit connected to the exhaust pipe and the individual exhaust pipes, and configured to change a discharge destination of the exhaust gas flowing within the exhaust pipe to one of the individual exhaust pipes. The exhaust switching unit is positioned above the liquid processing unit.

Abstract: An EUV cleaner system and process for cleaning a EUV carrier. The EUV cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

Abstract: Wet abrasive blasting systems are described that have a slurry piping system and a gas piping system that have pipes and other piping components, such as valves and regulators, that have a more consistent internal cross-sectional area than conventional wet abrasive blasting systems. The more consistent flow area provides astonishing improvements in blasting efficiency and consistent and predictable slurry flow rates.

Abstract: A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate holding mechanism with the heater in opposed relation to the upper surface. A heater cleaning method includes locating the heater at a position above a lower nozzle in opposed relation to a first spout of the lower nozzle, the lower nozzle being in opposed relation to a lower surface of the substrate held by the substrate holding mechanism, and a lower cleaning liquid spouting step of supplying a cleaning liquid to the lower nozzle to spout the cleaning liquid upward from the first spout with no substrate being held by the substrate holding mechanism to thereby supply the cleaning liquid to an outer surface of the housing of the heater located at the heater cleaning position.

Abstract: A flexible copper-clad laminate for a vehicle LED lamp is provided and includes a copper-clad layer and a composite layer that are laminated. The composite layer includes a polyimide layer and thermoplastic polyimide layers. An outermost layer of the composite layer is formed as a thermoplastic polyimide layer. A total thickness of the thermoplastic polyimide layers and an entire thickness of the polyimide layer with respect to a total thickness of the composite layer is about 10 to 50% and 50 to 90%, respectively. The total thickness of the thermoplastic polyimide layers and the entire thickness of the polyimide layer with respect to the thickness of the composite layer is about 20 to 40% and 60 to 80%, respectively. A thickness of the copper-clad layer is about 30 to 80 ?m, and the total thickness of the composite layer is about 10 to 15 ?m.

Abstract: A device for disinfecting, sterilizing and/or maintaining medical, especially dental, instruments comprises a maintenance and cleaning chamber for accommodating instruments to be conditioned and means for supplying different cleaning or maintenance media for cleaning, disinfecting or sterilizing and/or maintaining the instruments in subsequent steps. The start times of the conditioning cycles for the different instruments are staggered.

Abstract: An apparatus, method, and system for collecting data related to effluent emitted from tools in semiconductor fabrication facilities using one or more sensors to take continuous real-time samples of the effluent to indicate one or more properties and characteristics of effluent, and based at least in part on the properties and characteristics indicated in the samples taken by at least one or more sensors, determining the proper processing, recyclability, and treatment of the effluent.

Abstract: A dishwasher, a door assembly for the dishwasher and a method of drying the dishware in the dishwasher are provided. The dishwasher may include a tub portion adapted to hold dishware, a heating element proximate a bottom of the tub portion and configured to heat air inside the tub portion during a drying cycle, and a blower configured to direct the air and vaporized water into a duct having an inlet proximate the top of the tub portion. The heat causes the air to rise toward a top of the tub and collect vaporized water from the dishware. The duct is configured to receive the air and the vaporized water. The dishwasher includes a sensor configured to measure a humidity level. A control unit is in communication with the sensor and selectively actuates and de-actuates at least one of the heating element and the blower, based on the humidity level.

Abstract: A load port for a processing tool includes a carrier, a carrier actuator, an input table, an input table actuator, and a controller. The carrier has a plurality of cassette buffering spaces. The carrier is movable relative to the processing tool. The carrier actuator is operably connected to the carrier. The input table is configured to receive at least one cassette. The input table is movable relative to the carrier. The input table actuator is operably connected to the input table. The controller is configured to control the carrier actuator to move the carrier, such that one of the cassette buffering spaces is aligned with the input table, configured to control the input table actuator to move the input table with the cassette into the aligned cassette buffering space, and configured to control the input table to load the cassette into the aligned cassette buffering space.

Abstract: A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

Abstract: The present dental tool cleaning device generally provides a possibility to clean the burrs and brushes (files) of the remained tooth material on them after operation on patient. An improved dental tool cleaning device includes a container, comprising a lower portion which includes a neck with an opening and a first lid with a first nozzle, and an upper portion which includes a second lid comprising a second nozzle and an inlet fluid connector with the fluid channel.

Abstract: A substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber.

Abstract: DIW in an excessively cooled state is supplied as a solidification liquid to a substrate W, and a solidified material of the DIW is formed by a landing impact on the substrate W. This makes the use of a gaseous refrigerant necessary to form a solidified material unnecessary, eliminates the need for a facility to generate the gaseous refrigerant, shortens a processing time and further enables running cost and the like to be suppressed.

Abstract: An apparatus and method for clearing a playing surface are provided. The apparatus preferably includes a chassis or frame, a sensor connected to the chassis to sense a location of a line on a playing surface that needs to be cleaned, a drive connected to the chassis to drive the chassis in a selected direction of travel, and a handle to facilitate handling by a user. The apparatus also preferably includes a controller connected to the chassis, in communication with the drive, and responsive to the sensor to control the drive to thereby direct the chassis to move along the line that needs to be cleaned in the selected direction of travel and a cleaning device connected to the chassis to clean the line with the chassis is being driven along the line. Associated software is provided as well.

Abstract: A method for meniscus processing a substrate is provided. The method initiates with generating a meniscus spanning at least a length of the substrate. A pre-wetting liquid or vapor is dispensed. A substrate is moved through the dispensed pre-wetting liquid or vapor and the meniscus. The dispensed pre-wetting vapor condenses a pre-wetting liquid over a region of the substrate adjacent to a region of the substrate where the meniscus is generated. The pre-wetting liquid is deposited without substantially generating surface flow of the pre-wetting liquid on the substrate, and the pre-wetting liquid prevents the leading edge of the meniscus from contacting a dry surface region of the substrate.

Abstract: A dishwasher includes a cabinet having a wash chamber defined therein, a tub positioned within the wash chamber, a door coupled to the cabinet, and a fan positioned within the cabinet. An air conduit is positioned within the dishwasher and includes a conduit body configured to be mounted onto the door. The conduit body includes an air inlet and an air outlet, the air inlet is configured to be coupled in flow communication with the fan. The air conduit body is configured to channel air from the wash chamber through the conduit to an outside of the dishwasher, isolate the air within the conduit body from contacting the door, and provide a receptacle for condensed water other than a wash chamber tub.

Abstract: A system and method for securing tokens to be cleaned includes a tray with a curved surface defining a channel extending along a first direction and spacers projecting from the curved surface into the channel. The spacers are disposed at regular intervals along the first direction. The curved surface also has at least one opening. The tokens may be inserted into the channel between adjacent spacers and the tray holding the tokens can be submerged into a cleaning liquid. Identical trays containing tokens can also be stacked and together submerged into the cleaning liquid. The tray holding the tokens can be placed on a drying surface that has a drainage hole, and wetness remaining on the tokens can be sucked through the hole in the channel and the drainage hole by a vacuum or blown through the hole in the channel and drainage hole by an air blower.

Abstract: A washing/drying machine according to the present invention is capable of efficiently performing a drying operation to reduce a drying period. The washing/drying machine includes a tank (11) for storing used water, and the water is circulated from the tank (11) for dehumidification of air circulated through a drying air duct (20). Since the water is circulated from the tank (11), a great amount of water can be supplied as dehumidification water for higher dehumidification efficiency. The amount of the circulated water (the amount of cooling water (dehumidification water)) is reduced in a first half of a drying process, and increased in a second half of the drying process. As a result, the drying efficiency is improved during the drying operation, thereby reducing the drying period.

Abstract: The present invention describes a drying system for a dishwasher having a washing tub (2). The drying system comprises: a first fan (3) for propelling a first air stream through the washing tub (2) to an air transporting space (9) situated in the dishwasher outside the washing tub (2), wherein the first air stream is propelled in such a way that humidity in the washing tub (2) is absorbed by the first air stream and propelled to the air transporting space (9); and a second fan (4) for propelling a second air stream received from an area outside the dishwasher to the air transporting space (9). The drying system is further arranged such that the first and the second air streams are mixed in the air transporting space (9), and in that the mixed air stream is propelled to an exhaust opening (10) leading out from the dishwasher. Thereby, an efficient drying process can be achieved wherein air leaving the dishwasher has an appropriate temperature and humidity.

Abstract: The surface treatment apparatus includes: a supply device for supplying an introduced workpiece to the inside of a treatment cell of a subsequent surface treatment device; a surface treatment device for supplying a surface treatment liquid to the inside of the treatment cell while rotating the treatment cell, thereby performing a surface treatment on the workpiece; a workpiece collection device for inverting the treatment cell, and squirting the inside of the treatment cell with water from below to flow out the workpiece, thereby collecting the workpiece into a collection vessel; a drying device for receiving the collection vessel from the workpiece collection device, and exposing the workpiece within the collection vessel to air, thereby drying the workpiece; and a carrying device for carrying the treatment cell between the surface treatment devices, and between the surface treatment device and the workpiece device, wherein the surface treatment apparatus includes the one or more surface treatment devices.

Abstract: An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as air, is circulated within the treatment chamber and a condensation dryer is provided for extracting moisture from the gas.

Abstract: A system for processing a substrate is described. The system includes a proximity head, a mechanism, and a liquid supply. The proximity head is configured to generate a controlled meniscus. Specifically, the proximity head has a plurality of dispensing nozzles formed on a face of the proximity head. The dispensing nozzles are configured to supply a liquid to the meniscus and the suction holes are added to remove a used liquid from the meniscus. The mechanism moves the proximity head or the substrate with respect to each other while maintaining contact between the meniscus and a surface of the substrate. The movement causes a thin layer of the liquid to remain on the surface after being contacted by the meniscus.

Abstract: Disclosed is a liquid processing apparatus to perform liquid processing by supplying a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally in a state where a back surface of the substrate faces downward. The liquid processing apparatus prevents droplets from remaining on the member. The liquid processing apparatus includes a nozzle member irrotationally provided below the substrate. The nozzle member includes a processing-liquid discharge nozzle to discharge the processing liquid and a gas discharge nozzle to discharge drying gas on a top surface of the nozzle member. The processing-liquid discharge nozzle includes a processing-liquid discharge port to discharge the processing liquid toward the substrate.

Abstract: A reactor for washing sand contaminated with hydrocarbons comprises a vessel having an aperture in a bottom portion thereof. A steam cleaning device is located near a top of the vessel for receiving contaminated sand and cleaning the contaminated sand as it is introduced into the vessel. A rinsing device is positioned below the steam cleaning device for rinsing the sand with water. A sand conveying device comprising an air injection device is positioned in the bottom portion of the vessel for urging sand out of the aperture using compressed air, such that the sand is partially dewatered as the sand is urged out of the aperture.

Abstract: An object is to smoothly clean a nozzle portion of a beverage dispenser, the beverage dispenser discharges and supplies beverage ingredients from beverage supplying nozzles, and comprises a cleaning device to clean the beverage supplying nozzles, and this cleaning device executes a cleaning operation including: a steam jetting step of jetting high-temperature steam to the beverage supplying nozzles; a water jetting step of jetting water or hot water to the beverage supplying nozzles; and a drying step of drying the surfaces of the beverage supplying nozzles.

Abstract: A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a plurality of vacuum ports formed on the face of the proximity head, the vacuum ports being arranged to completely surround the plurality of meniscus nozzles, and a plurality of gas nozzles formed on the face of the proximity head, the gas nozzles at least partially surrounding the vacuum ports. The proximity head further includes means for reducing a size and frequency of entrance and/or exit marks at a leading edge and a trailing edge on the substrate by aiding and encouraging liquid from the meniscus to evacuate a gap between the substrate and the carrier.

Abstract: An apparatus for foam-assisted cleaning comprising a closable container with a funnel-shaped working chamber formed between the surface of the semiconductor wafer and the tapered base plate. The apparatus is provided with a fluid supply unit that incorporates a foam generator in the form of conical body with a flat surface on a wider end face of the conical body. This flat surface functions as a deflector for jets of neutral gas ejected onto the deflector and reflected therefrom into the interior of the fluid supply body filled with a foamable liquid. The jets of neutral gas create a zone of reduced pressure that generates gas bubbles which form the foam. The latter is displaced from the foam generator into the working chamber through a Bernoulli nozzle formed by the tip of the conical body and the outlet opening of the foam generator. The foam is formed from de-ionized water, isopropyl alcohol, and, if necessary, a surfactant.

Abstract: A first proximity head is configured to define a meniscus of a photoresist developer solution on a substrate. The meniscus is to be defined between a bottom of the first proximity head and the substrate. A second proximity head is configured to define a rinsing meniscus on the substrate and remove the rinsing meniscus from the substrate. The second proximity head is positioned to follow the first proximity head relative to a traversal direction of the first and second proximity heads over the substrate. Exposure of the substrate to the meniscus of photoresist developer solution causes previously irradiated photoresist material on the substrate to be developed to render a patterned photoresist layer. The first and second proximity heads enable precise control of a residence time of the photoresist developer solution on the substrate during the development process.

Abstract: A substrate treating apparatus for drying substrates by moving the substrates out of a treating liquid into a solvent atmosphere.

Abstract: The invention is an automatic no contact machine for cleaning and drying tips, air caps, retainers and cups on spray apparatus when changing liquid or when the apparatus will be idle, or to remove build up of paint on applicators that cause spits and drips on surfaces and electrostatic arcing to spray apparatus while containing and recovering cleaning effluents to an environmental standard.

Abstract: A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first process window in a first portion of the manifold. A first fluid meniscus is capable of being defined within the first process windowl. Further included is a second process window in a second portion of the manifold. A second fluid meniscus is capable of being defined within the second process window. An arm is integrated with the housing, and the arm is coupled to the manifold, such that the arm is capable of positioning the manifold in proximity with the substrate during operation. The apparatus therefore provides for the formation of multi-menisci over the surface of a substrate using a single manifold.

Abstract: The present invention provides a spin cleaning and drying apparatus of single-wafer processing type which cleans a substrate with a cleaning liquid from a rinse nozzle while rotating the substrate and dries the substrate after cleaning while rotating the substrate, comprising: a spin chuck which holds and rotates the substrates; a cup which has an opening on an upper side, a water discharge port and an exhaust gas port in a bottom portion, and encloses the spin chuck; a flow regulating plate which has a gas injection port in a middle and is provided so as to be able to move backward and forward to a position opposed to the substrate and spaced therefrom at a prescribed distance and to an upward or sideward retracted position; and an exhaust cover, having multiple slit holes each with a hood which opens to an upper surface, is provided below the spin chuck.

Abstract: A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.

Abstract: A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in a drying chamber disposed over the cleaning tank. A shutter separates the cleaning tank from the drying tank. A wafer boat moves the wafer vertically between the cleaning tank and the drying tank. Nozzles for providing the cleaning solution onto the wafer are disposed at both inner sides of the drying tank. The nozzles are connected to a drying gas supply unit to alternately and periodically provide the drying gas onto the wafer.

Abstract: A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface and the first conduit region is defined in a center portion of the head. The head further includes a second conduit region on the head which surrounds the first conduit region, and includes a third conduit region on the head which is defined for delivery of a second fluid to the wafer surface. The third conduit region semi-encloses the first conduit region and the second conduit region. The second conduit region enables a removal of the first fluid and the second fluid. The delivery of the first fluid and the second fluid combined with the removal by the third conduit region of the head defines a controllable meniscus.

Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.

Abstract: An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

Abstract: A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface and the first conduit region is defined in a center portion of the head. The head further includes a second conduit region on the head which surrounds the first conduit region, and includes a third conduit region on the head which is defined for delivery of a second fluid to the wafer surface. The third conduit region semi-encloses the first conduit region and the second conduit region. The second conduit region enables a removal of the first fluid and the second fluid. The delivery of the first fluid and the second fluid combined with the removal by the third conduit region of the head defines a controllable meniscus.

Abstract: There are provided a substrate drying method and apparatus by which an attachment amount of particles to surfaces of substrates can be reduced when the substrates are exposed from pure water, and occurrence of non-uniform drying can be prevented by improving drying efficiency of the substrates. Air or an inert gas, and gaseous or droplet-like isopropyl alcohol (hereinafter, referred to as IPA) are supplied into a space on a liquid level of the pure water in a drying chamber, and pure water on a liquid level side is drained from the liquid level or the vicinity of the liquid level of the pure water, while raising the pure water in which the substrates are immersed together with the substrates, the substrates are exposed from the pure water above the liquid level in the drying chamber, and, at the same time, the pure water held on the exposed surfaces of the substrates is replaced by IPA, whereby the substrates are dried.

Abstract: An industrial dishwashing machine with at least one essentially closed water circuit in which washing water is circulated, and with at least one water inflow which makes rinsing water available which is received into the water circuit after a rinsing operation following a washing operation. An air circuit is provided for drying the batchwith the air circuit being dehumidified by means of the water of the water inflow.