Abstract: The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.

Abstract: A milk supply device for supplying milk from a milk supply container to a milk dispensing device is provided. The milk supply device comprises a milk transport line which can be connected to the milk supply container and with which milk which has been taken from the milk supply container can be delivered to the milk dispensing device. The milk supply device further comprises a three-way junction, which can be operated such that optionally milk can be transported from the milk supply container to the milk dispensing device, whilst the milk transport line is sealed off by it, at the same time, relative to the cleaning agent transport line, in a fluid-impermeable manner, or cleaning agent can be conducted from the cleaning agent transport line in the direction towards the milk dispensing device and/or in the direction towards a discharge of the milk supply device.

Abstract: A vehicle disassembly system for disassembling a vehicle by moving the vehicle through a plurality of discrete workstations specifically adapted for select de-pollution and dismantling procedures encountered during the end-of-life vehicle recycling process. A vehicle disassembly system exemplifying the principles of the present invention may comprise a primary de-pollution and disassembly line and an engine disassembly line. The primary de-pollution and disassembly line may include one or more de-pollution stations, one or more intermediate, part removal stations, and a conveyor apparatus for transmitting the end-of-life vehicle from the de-pollution stations to the part removal stations. The engine disassembly line may include an overhead track support frame, a trolley assembly, one or more height adjustable loading tables, one or more height adjustable work tables, and one or more height adjustable un-loading tables.

Abstract: There is provided a substrate processing apparatus including: a transfer region communicating with a process chamber where substrates are processed; a first shelf region installed above the transfer region and having a first shelf storing transfer vessels accommodating the substrates; a second shelf region installed below a stage part where the vessels to be transferred to and from an external device are loaded, and having a second shelf stacking and storing the transfer vessels; and a transfer vessel transfer robot installed inside a housing accommodating the transfer region, the first shelf region and the second shelf region and transferring the vessels to and from the stage part, the first shelf, the second shelf, and the transfer region. The transfer vessel transfer robot includes: a main body base part; a first table part; a first driving part; a second table part; a second driving part; and a vessel support part.

Abstract: A dishwashing system includes: a dishwasher that washes tableware contained in a dishwashing rack, inside a washing chamber; a carry-in stand for placing the dishwashing rack that is to be carried into the washing chamber on; a carry-out stand for placing the dishwashing rack that is carried out from the washing chamber on; and a robot device including a robot arm mechanism. The carry-in stand and the dishwasher are arranged within a movable range of the robot arm mechanism. The robot arm mechanism transfers the dishwashing rack from the carry-in stand to the washing chamber, and also operates the dishwasher.

Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus including a spin head configured to support the substrate, a nozzle configured to discharge a chemical to the substrate located on the spin head, a first passage configured to supply a first chemical, a chemical property of which is the same as the chemical, a second passage configured to supply a second chemical, a chemical property of which is the same as the first chemical, and a discharge passage connecting the first passage and the second passage, and the nozzle.

Abstract: A substrate processing apparatus has a base part facing a surface of a rotation table, and the base part is equipped with a plate member which is rotated by a rotation drive unit together with the rotation table while the base member is being disposed between the rotation table and a substrate W held by a plurality of substrate holding members. The substrate processing apparatus is further equipped with: a heating fluid supply unit and a cooling fluid supply unit each of which is provided between the rotation table and the plate member and supplies a temperature regulating fluid for temperature regulation of the plate member; and a controller which controls supply of the temperature regulating fluids from the heating fluid supply unit and the cooling fluid supply unit.

Abstract: The invention relates to pallet changers and methods for processing sheet-like materials with at least two movably arranged pallets movably positioned in a main frame and having a support surface for receiving a sheet-like material. The pallets are moved in alternation with a drive from the main frame into a material processing machine and back to the main frame. The drive comprises a motor, which drives a drive element, which moves the pallets. A processing device is provided on the main frame to process sheet-like material positioned on the pallets in the main frame.

Abstract: A semiconductor apparatus is provided. The semiconductor apparatus includes a wafer carrier, and a cup surrounding the wafer carrier. The semiconductor apparatus also includes a bottom washing device located between the wafer carrier and the cup, and configured to spray washing liquid onto the cup. Therefore, the cup can be washed by the bottom washing device.

Abstract: A rotating spine board washer which utilizes a rotisserie style racking system that allows multiple spine boards to be configured into a tube shape. The tube shaped rack is connected to a motor that rotates the rack 360 degrees repeatedly. Located inside and outside of the hollow tube shaped rack are manifolds that run the length of the rack, with a plurality of spray nozzles located along the manifolds which direct wash solution at the inward facing surface and outward facing surface of the spine boards as they rotate around the fixed spray nozzles.

Abstract: Methods and tools for de-bonding and cleaning substrates are disclosed. A method includes de-bonding a surface of a first substrate from a second substrate, and after de-bonding, cleaning the surface of the first substrate. The cleaning comprises physically contacting a cleaning mechanism to the surface of the first substrate. A tool includes a de-bonding module and a cleaning module. The de-bonding module comprises a first chuck, a radiation source configured to emit radiation toward the first chuck, and a first robot arm having a vacuum system. The vacuum system is configured to secure and remove a substrate from the first chuck. The cleaning module comprises a second chuck, a spray nozzle configured to spray a fluid toward the second chuck, and a second robot arm having a cleaning device configured to physically contact the cleaning device to a substrate on the second chuck.

Abstract: A particle distributor assembly 10 for distributing the particles of a drill sample is described. The distributor assembly comprises a stationary inlet tube 14 through which particles enter the distributor assembly 10, and a rotatable distributor head 16. The rotatable distributor head 16 has an upwardly directed inlet 18 offset from a central axis of rotation of the distributor head 16 and a transversely directed outlet 22 wherein, in use, when the distributor head 16 is rotated at high speed particles entering the distributor head inlet are accelerated outwardly in a radial direction through the distributor head outlet. The particle distributor assembly 10 also has a distributor nozzle 24 having an inlet 26 and an outlet 28, the nozzle inlet 26 being aligned with the stationary inlet tube and the nozzle outlet 28 being aligned with the distributor head inlet.

Abstract: A sieve device (1) for untreated drilling mud being brought up from a well and a method for use is provided. The sieve device (1) has a filter device (3) to separate a share of the drilling liquid from the drill cuttings. The sieve device (1) connects to a first outlet that receives drilling cuttings held back on the filter device (3) and a second outlet (11) that receives drilling liquid flowing from the filter device (3). The sieve device (1) also has at least one secondary filter (13) to separate drill cuttings from drilling liquid, a filter guard (17) being arranged in connection with the secondary filter (12), and a bypass arrangement (19) by means of which the filter guard (17) is arranged to open for communication of untreated drilling mud held back on the secondary filter (13), into the second outlet (11) for drilling liquid.

Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

Abstract: A system for extraction of a pool cleaning robot from a pool, the system may include a pool cleaning robot interface that is arranged to be coupled to a pool cleaning robot during an exit process during which the pool cleaning robot is extracted from the pool; and a pool cleaning robot manipulator that is coupled to the pool cleaning robot interface, wherein the pool cleaning robot manipulator is arranged to move the pool cleaning robot interface between a first and second portion; wherein when the pool cleaning robot interface is at the first position and is coupled to the pool cleaning robot, the pool cleaning robot is within the pool; wherein when the pool cleaning robot interface is at the second position and is coupled to the pool cleaning robot, the pool cleaning robot is positioned outside the pool.

Abstract: An inventive cleaning device for cleaning washware. The cleaning device may be, in particular, a conveyor dishwasher. The cleaning device comprises at least one cleaning chamber and at least one transportation device. The transportation device is designed to transport the washware through the cleaning chamber in a transportation direction. The cleaning device has at least one final-rinse nozzle system for applying at least one final-rinse fluid, in particular fresh water, to the washware. The final-rinse nozzle system has at least two final-rinse nozzle units which are arranged in different positions transverse to the transportation direction. The final-rinse nozzle units can be switched independently of one another in order to apply the final-rinse fluid to the washware in the different positions independently of one another.

Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.

Abstract: In some embodiments, apparatus and methods are provided for improved handling of lithography masks including a mask inverter that includes a first contact pad dedicated to inverting masks that have not been cleaned; a second contact pad dedicated to inverting masks that have been cleaned; an actuator coupled to the first and second contact pads and operable to invert the first and second contact pads; and a controller coupled to the actuator and operative to control the actuator. Numerous other aspects are provided.

Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.

Abstract: A cleaning apparatus is provided for cleaning crops, such as potatoes or beets, with adhering particles of soil and the like. The apparatus comprises a charging and or supply hopper with an opening at its underside from which the crops enter for cleaning; a housing with a cleaning region, wherein the crops are cleaned; a rotating screen drum rotating about an axis of rotation wherein the crops are cleaned; wherein the screen drum is arranged in the cleaning region; the axis of rotation of the rotating screen drum is inclined at an acute angle.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: A system for controlling silica dust generated during the transfer of frac sand from a storage container through a conveyor system includes a system of conduits having a plurality of inlets for collecting silica dust generated at selected points along the conveyor system. An air system pneumatically coupled to the system of conduits generates a negative pressure at each of the inlets to induce the collection of silica dust at the selected points along the conveyor.

Abstract: A dishwasher, including a chamber for washing dishes and a chamber for storing dishes is provided. A mechanism is also provided allowing the dish racks to move the dishes from the washing chamber to the storage chamber of the dishwasher once the wash is completed.

Abstract: The technology of washing and treatment MWU (modular washing unit) is conceived to wash and treat fruits and vegetables in a confined environment, with progressively more and more clean water (counter-current) and with an optimal ratio between the quantities of water used and processed products. The system allows important savings of water, chemicals and energy. The technology of washing and treatment MWU (modular washing unit) is conceived to allow the transport and the treatment of the product in confined environment, with clean water (counter-current) In the MWU the product is submitted to sequence of filling and emptying with appropriated solutions, progressively cleaner, prior to subsequent discretionary treatments. A treatment plant can be equipped with a variable number of MWUs, with additional remote MWUs to meet the desired production capacity.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: The invention has an object to provide a foreign substance removing device that is capable of quickly and efficiently cleaning substrate surfaces regardless of the size thereof and preventing readhesion of once removed foreign substances as well as to provide a die bonder equipped with the same. The foreign substance removing device of the invention includes: a pickup device to which a dicing film carrying dies thereon is fixed; and a collet for picking up a die separated from the dicing film and placing the die on a substrate having an adhesive applied thereon, and operates to remove foreign substances on the substrate in preparation for application of the adhesive onto the substrate. The foreign substance removing device includes a cleaning nozzle integrating an air outlet orifice and an air inlet orifice.

Abstract: [Problem] Since a working chamber for performing an operation of washing an object to be washed is provided so as to move vertically in a washing tank and be separated from the washing tank and airtightly shut off, a minimal space required for an operation of washing the object to be washed such as drying under reduced pressure can be provided, and drying under reduced pressure can be efficiently performed in the presence of washing liquid or washing vapor in the washing tank without unnecessary burden on a reduced pressure system. [Solution] A pressure-resistant working chamber 2 which can move vertically in a washing tank 1, has an opening part 22 capable of opening and closing on the side face in a direction of vertical movement, and loads an object 12 to be washed is provided.

Abstract: The invention relates to a device for sterilizing caps or the like closures for closing bottles or the like containers. Said device comprises a conveyor system conveying the caps in a direction of conveyance through a treatment section having a plurality of successive treatment stations in the direction of conveyance.

Abstract: A dishwasher, including a chamber for washing dishes and a chamber for storing dishes is provided. The dishwasher has two main compartments, one for washing dishes and the other for storing the dishes. The mechanism moves the dishes from the cleaning side to the storage side of the dishwasher.

Abstract: The invention relates to a device for mechanized emptying of poultry holders and subsequent cleaning of a support structure of the emptied poultry holders on an underside only. The invention also relates to a method for mechanized emptying of poultry holders and subsequent cleaning of a support structure of the emptied poultry holders on an underside only.

Abstract: The present invention is a device that is for cleaning a porous hollow fiber membrane by running the porous hollow fiber membrane through a cleaning tank containing a cleaning liquid, thus eliminating residual substances in the porous hollow fiber membrane, wherein the inside of the cleaning tank is provided with a duct structure having a hollow fiber membrane running path at which the porous hollow fiber membrane can be continuously run through from an entrance at one end towards an exit at the other end; the duct structure comprises at least two structures that can separate; the duct structure has a running groove, which is formed to at least one structure of the at least two structures, and a branched duct, which pumps or sucks the cleaning fluid to cause the cleaning fluid to flow through; and the branched duct is a duct that is connected to the running groove.

Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

Abstract: A cleaning system and method for cleaning substrates having at least one semiconductor material thereon, which includes a transporting conveyor, an acid bath module and a hanging conveyor for suspending acid resistant blocks in the spaces between substrates as they are transported through the cleaning system. The acid resistant blocks shield the semiconductor materials from acid contact while a lower portion of the substrate is submerged in the acid cleaning solution.

Abstract: A device for removing dust from pharmaceutical tablets or capsules, comprising a dust removal column with a first ramp for controlled conveying in a helical shape; the first ramp is composed of a conveying conduit which has walls leak-light wiih respect to the tablets or capsules and which comprises an inlet in the lower part of the column and an outlet in the upper part of the column, this column comprising a chamber which aspirates dust from tablets or capsules and which has walls that are leak-tight with respect to the conveyed tablets or capsules, a passage for aspiration of dust from tablets or capsules is provided, and the whole assembly formed by the conveying conduit and the aspiration chamber is configured such that the column is leak-tight with respect to the dust from the tablets or capsules.

Abstract: Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is an alkaline aqueous solution, which is sprayed onto the package surface simultaneously with the friction thereof with a soft and non abrasive element. In a preferred embodiment, said friction results in the rotation of the package around the longitudinal axis thereof, which is mounted on a rotative support, and the soft non abrasive element in contact with the surface thereof keeps motionless.

Abstract: A tool for cleaning heat exchangers may include a fluid flow control valve, a hollow elongated stem attached to the valve and a hollow fan head attached to the hollow stem. The fan head may have a fan-head axis oriented at an oblique angle relative to a stem axis of the stem.

Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

Abstract: A loading apparatus (50; 50?) for a conveyor dishwasher (1), wherein the loading apparatus (50; 50?) has at least one stacking magazine (51;51?) by means of which washware (100) which is to be cleaned is received in a stackwise manner. The at least one stacking magazine (51; 51?) has a separating arrangement by means of which the items of washware (101) received in the stacking magazine (51; 51?) are discharged one by one. The loading apparatus (50; 50?) also has a conveying arrangement (55; 55?) by means of which the items of washware (101?) discharged one by one by the separating arrangement are fed to a transporting belt (62) of the conveyor dishwasher (1). The separating arrangement moves the items of washware (101) in the vertical direction and discharges a respectively lowermost item of washware (101) out of the stacking magazine (11, 11?).

Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.

Abstract: A first container treatment device includes a container feeding unit, a container removing unit, a feed line for a product, and a cleaning device for cleaning exterior surfaces using a cleaning fluid. The cleaning device has a track that runs at least in an angle range around an axis of rotation thereof. The track has a portion shaped as a hollow body such that some of said cleaning fluid can be guided along a section in the track. A robot is arranged on this track.

Abstract: A rapid and effective means for decontaminating fouled oil-control booms is provided. The process involves washing the boom with pressured washing fluid, reorienting the boom to facilitate full inspection, and drying the boom. This can be performed in an assembly-line manner, using one or more conveyors to transport the boom sequentially to a washing area, an inspection area, and a drying area. Consequently, contaminated oil-control booms can be cleaned and redeployed rapidly and inexpensively during an oil release accident.

Abstract: A treatment system for the surface treatment of workpieces, particularly vehicle bodies, includes a plurality of transport devices, on which at least one workpiece to be treated can be attached in a releasable manner. A conveying device moves the transport devices through the treatment system. At least one treatment bath is disposed in a first conveying plane of the treatment system and the transport devices with the workpieces arranged thereon are introduced into the treatment bath. At least one cleaning device, which is suitable and designed for cleaning the transport devices after the surface treatment of the workpieces, is disposed in a second conveying plane of the treatment system. The second conveying plane is offset in the vertical direction relative to the first conveying plane.

Abstract: An apparatus and method for recovery and cleaning of broken substrates, for fabrication systems using silicon wafers. A placing mechanism moves a suction head to a location of the broken substrate and a suction pump coupled to a flexible hose is used to remove the broken pieces. A hood is positioned at the inlet of the suction head, and setback extensions are provided at the bottom of the hood to allow air flow into the inlet and prevent thermal conductance from the tray to the hood. Pins are extendable about the inlet of the suction head to enable breakage of the substrate to smaller pieces for removal.

Abstract: A workpiece de-chucking device of a plasma reactor for dry-cleaning the inside of a reaction chamber and an ElectroStatic chuck (ESC) during workpiece de-chucking and a workpiece de-chucking method using the same are provided. The workpiece de-chucking device includes a lifting unit, an ICP source power unit, and a controller. The lifting unit lifts a workpiece mounted on a top surface of an ESC. The ICP source power unit forms a magnetic field in an inductive coil arranged outside a dielectric window. The controller outputs a source power control signal, a lift control signal, and a de-chucking control signal.

Abstract: An apparatus is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the apparatus includes a removing station for lifting from the base a strip of the artificial turf extending in a longitudinal direction, a separating station for separating filling material from the strip and a winding station for winding the strip onto a shaft. A method is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the method includes lifting a strip of the artificial turf extending in a longitudinal direction from the base, separating infill material from the strip and winding the strip onto a shaft.

Abstract: Provided is a substrate processing apparatus which can efficiently transfer substrates using a conveying mechanism including a plurality of substrate holding members. The substrate processing apparatus transfers a processed substrate to an intermediate conveying unit using a transport mechanism when the processed substrate returns to a substrate receiving unit.

Abstract: A cleaning method of cleaning a joint surface of a processing target substrate separated from a superposed substrate, while the processing target substrate is placed inside an annular frame and held by a tape bonded to a surface of the frame and a non-joint surface of the processing target substrate, the cleaning method including: a placement step of placing a cleaning jig to face the processing target substrate such that a supply surface of the cleaning jig for supplying a solvent for the adhesive onto the joint surface of the processing target substrate covers the joint surface and a distance between the supply surface and the joint surface is a predetermined distance; and a cleaning step of then supplying the solvent between the supply surface and the joint surface and diffusing the supplied solvent over the joint surface by a surface tension.

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the third chamber are disposed on top and on bottom.

Abstract: A substrate processing apparatus can prevent photo-corrosion of, e.g., copper interconnects due to exposure of a surface to be processed of a substrate to light, and can perform processing, such as cleaning, of a substrate surface while preventing photo-corrosion of, e.g., copper interconnects due to exposure to light. The substrate processing apparatus includes a plurality of processing areas housing therein processing units which have been subjected to light shielding processing; and at least one transfer area housing therein a transfer robot and disposed between two adjacent ones of the plurality of processing areas. A light shielding wall is provided between the transfer area and each of the two adjacent processing areas, and a light-shielding maintenance door is provided for the front opening of the transfer area. The processing units are coupled to the light shielding walls in a light-shielding manner.

Abstract: An apparatus for treating objects with a treatment gas comprises a treatment chamber, a chamber input through which objects enter the treatment chamber, and a chamber output (which may be the same as the chamber input) through which the objects leave the treatment chamber. The treatment chamber encloses the treatment gas, which can be steam. The chamber output and/or the chamber input include an intermediate medium, such as a liquid, through which the objects pass. The intermediate medium prevents escape of the treatment gas from the treatment chamber and the ingress of external gases into the treatment chamber, while facilitating input of the objects to the chamber, and output of the objects from the chamber.