Abstract: An endoscope leak test connector includes: a rotating body configured to cause a ventilation member to project from a leak test pipe sleeve by rotating in a positive direction and cause the ventilation member to be buried into the leak test pipe sleeve by rotating in a negative direction; a gas inlet configured to be connected with a gas supply source; a facing member configured to face the ventilation member projecting from the leak test pipe sleeve; a gas outlet that is open on the facing member; and a seal portion configured to seal the gas outlet and the ventilation member so that the gas outlet and the ventilation member liquid-tightly communicate with each other.

Abstract: A vertical dish washing machine is disclosed to include a dish basket for carrying dishes for washing and a vertical loop conveyer system including a first transmission mechanism adapted to carry the dish basket vertically front a front top location to a front bottom location, a second transmission mechanism adapted to carry the dish basket horizontally from the front bottom location to a rear bottom location, a third transmission mechanism adapted to carry the dish basket vertically from the rear bottom location to a rear top location, and a fourth transmission mechanism adapted to carry the dish basket from the rear top location to the front top location.

Abstract: In a method and an apparatus for cleaning a substrate using a laser beam, an inner chamber is disposed in a process chamber to define a space in which a laser-induced shock wave is generated. The laser beam is focused on a laser focus positioned in the inner chamber, and thus the laser-induced plasma shock wave is generated around the laser focus. The plasma shock wave is reflected from inner surfaces of the inner chamber and is irradiated on the substrate through a lower portion of the inner chamber. As a result, the intensity of the plasma shock wave irradiated on the substrate is increased, and thus the contaminants on the substrate may be effectively removed.

Abstract: A cleaning device for cleaning an object includes an inner vessel configured to contain a first liquid and the object. The cleaning device also includes an external vessel configured to contain a second liquid and the inner vessel. The second liquid is acoustically coupled to the first liquid. At least one transducer is acoustically coupled to the external vessel and configured to generate acoustical energy which is transferred to the object through the external vessel, a second liquid, the inner vessel and the first liquid. The first liquid has a dissolved gas concentration of a first gas and the second liquid has a dissolved gas concentration of a second gas.

Abstract: A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating device at outside of the chamber such that a state of the substrate held by the holder changes between vertical and horizontal, and a position adjusting mechanism for relatively adjusting the positions of the chamber and the substrate rotating device together with the posture changing mechanism such that the holder is housed in the chamber. The substrate is taken out from the container and held by the holder in a horizontal state. After the posture of the holder was changed to vertical, a process liquid is supplied to the substrate of vertical state.

Abstract: A developer and a method of a developing process which improve upon uniformity in a size of a resist pattern are provided. The developer includes a wafer rotating system (10) and a wafer oscillating system (20) which oscillates whole of the wafer rotating system (10) in one-dimensional direction, and the wafer oscillating system (20) has a motor supporting part (4) which mounts and fixes a motor part (1), a rail (5) which engages a rail groove (41) formed on a bottom side of the motor supporting part (4) and also enables the motor supporting part (4) to slide smoothly in one-dimensional direction, a guide bar (6) which is coupled with the motor part (1) and transmits a propulsion which enables the motor part (1) to slide along the rail (5) and a linear motor part (7) which engages the guide bar (6) and is a propulsion supplying source which supplies the propulsion with the wafer rotating system (10) by sliding the guide bar (6) in the axial direction of the guide bar (6).

Abstract: A method and apparatus comprising a wafer platform which rotates a semiconductor wafer at a predetermined speed while being moved in a linear motion with respect to a stationary water jet nozzle spraying a water or fluid jet onto the wafer during a wafer scrubbing process. The coupled rotary and linear motions of the wafer facilitates through washing or rinsing of the wafer surface and spreads impact energy of water or fluid sprayed onto a wafer surface over a large surface area on the wafer, resulting in a substantial reduction of particles remaining at the center of the wafer after the wafer scrubbing operation and preventing or minimizing the likelihood of impact damage to the wafer during the wafer scrubbing process. In another embodiment, the water or fluid jet nozzle moves along a horizontal axis while the spinning wafer remains stationary.

Abstract: A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping mechanism can include a container to hold a chemical, such as a photoresist stripping chemical, a wafer cleaning chemical, or another type of chemical. The mechanism can also include a component to move semiconductor wafers through the chemical in the container in a Ferris wheel-like motion. The component may include wafer holders for the wafers that are swivably mounted about an axis of rotation. As the one or more wafer holders rotate about the axis of rotation through the chemical in the container, the wafer holders remain in a substantially constant vertical and horizontal orientation.

Abstract: A fluid delivery system (20) for an automated processor (A) includes spray nozzles (102, 104, 106, 108, 110) for sequentially spraying washing, microbial decontaminant and rinsing solutions over a lumened device (B), such as an endoscope. The fluid delivery system also includes connection ports (150, 152, 154) for connecting with internal passages (187) of the device to deliver the washing and microbial decontaminant solutions thereto. A removable rack (21), specially configured for the particular device, positions the device within a chamber (12). The spray nozzles are located on rear and side walls (114, 116, 118) and on a door (18) of the chamber, such that the device is impinged with spray from all directions. Sets (102, 104) of the spray nozzles are pulsed in sequence so that the spray jets (122) do not cancel each other out.

Abstract: An apparatus for cleaning dirty roller bearings having inner and outer rings finds particular applicability for on the spot washing of bearings used on sports and leisure equipment such as, for example, skateboards and inline skates, after being dismantled from the equipment. A circular head plate is receivable on a container for containing a volume of cleaning fluid. Accommodating axes are disposed circularly on the head plate for accommodating the roller bearings that arc to be cleaned, with the inner rings of the roller bearings in frictional contact therewith. A drive shaft including an external hand wheel is rotatably connected through the head plate to permit rotation of the drive shaft relative to the head plate and the accommodating axes when the hand wheel is turned.

Abstract: An apparatus for processing or drying a semiconductor wafer includes a rotor for holding a wafer and for spinning the wafer about a first axis. A pivot arm supports the rotor, so that the rotor can pivot about a second axis that is substantially perpendicular to the first axis. A basin holding a processing fluid is located below the rotor, with the rotor vertically movable into and out of the processing fluid via an elevator supporting the pivot arm. The rotor is pivotable into a position where it holds the wafer at an inclined angle so that the wafer may be withdrawn from the processing fluid at said inclined angle to facilitate drying of the wafer.

Abstract: A method and kit are disclosed for removing or alleviating the severity or intensity of stains from aldehyde-based sterilizing solutions through the use of reducing agents. This invention is effective even for porous surfaces such as filter paper and porous nylon films as well as for smooth surfaces such as glass, aluminum, copper, brass and stainless steel. Also, the invention may be used in a variety of formats such as a kit useful for making or using solutions or gels to treat the aldehyde-based stained surfaces of, for example, medical devices, hospital bench or table tops, hospital floors and skin (if in appropriate pH range), etc.

Abstract: In a method of processing or drying a semiconductor wafer, the wafer is withdrawn from a fluid bath at an inclined angle, and at a selected withdrawal speed. A solvent vapor is provided at the surface of the bath, to create a surface tension gradient and promote drying, or removal of the fluid from the wafer surface. After the wafer is entirely withdrawn from the rinsing liquid, the wafer is rotated briefly, to remove any remaining fluid via centrifugal force, without the fluid drying on the wafer. The wafer is held onto a rotor assembly which rotates the wafer within an enclosed chamber, and which is also pivoted within the chamber, to position the wafer at the incline angle.

Abstract: An industrial parts cleaning system including immersion and spraying which provides epicycloidic parts movement (a plurality of revolutions per rotation, wherein the revolution is supersposed the rotation), rotating spray which synchronously follows the parts rotation, and a purge system for evacuating from the common plumbing the respective wash or rinse solution of a current cycle before commencement of the next cycle.

Abstract: An apparatus for cleaning semiconductor wafers includes a tank for containing a liquid and receiving a wafer holder with at least a portion of the wafers immersed in the liquid in the tank. A sonic energy generator imparts sonic energy to the liquid. A wafer-moving mechanism in the tank reciprocates and rotates the semiconductor wafer so that at least a portion of the wafer repeatedly passes through an upper surface of the liquid. The wafer-moving mechanism comprises a camming mechanism rotatably received in the tank and a drive for rotating the camming mechanism about a fixed central longitudinal axis of the camming mechanism to reciprocate and rotate the wafer. The camming mechanism includes a cam body having opposing flats spaced apart on opposite sides of its longitudinal axis and opposing gripping surfaces extending between the flats. The cam body has a cross-section defining a major axis and a minor axis, with the major axis of the cam body cross-section being greater than the minor axis.

Abstract: A method of cleaning a semiconductor wafer comprises placing liquid in a bath with a gas-liquid-interface defined at the surface of the liquid. A semiconductor wafer is placed in the bath so that it is oriented in a generally upright position with at least part of the wafer being in the liquid and below the gas-liquid-interface. Sonic energy is directed through the liquid. At least one of the position of the semiconductor wafer and the level of liquid in the bath relative to the semiconductor wafer is varied so that the entire surface of the wafer repeatedly passes through the gas-liquid-interface.

Abstract: A cleansing/sterilizing apparatus which is a transportable apparatus and method for inside-outside and sterilization of various complex reusable medical/dental instruments, including but not limited to laparoscopic instruments and dental handpieces. The apparatus avoids the use of heat, pressure, severe agitation, or corrosive chemicals which might damage delicate equipment. The apparatus preserves each processed instrument hermetically sealed in a sterile dry environment within a detachable/portable capsule until its next use.

Abstract: An improved automated agitating immersion washer includes a wash and rinse station which operates by triple-action to agitate and rotate a basket of dirty parts with respect to fluid in a tank and further turbulates the fluid with respect to the basket to more effectively clean the parts. The washer has a two state blow-off drying station wherein one stage the basket is rotated in the presence of forced heated air while in the second stage, the basket sits stationary in the presence of forced heated air to complete the drying cycle. While the washer has an indexing mechanism which moves individual baskets through each successive stage, and each stage operates independently of the other stages so that baskets may be continually loaded and unloaded from the wash without waiting for one basket to complete all cycles of the washing sequence.

Abstract: A container is held between a conveyor and guide means provided around the conveyor and the guide means come in frictional contact with the container to rotate the container around its own axis as the conveyor runs in its circumferential path. The conveyor is partially water-immersed within a water tank and the container being rotated by cooperation of the conveyor and the guide means within the water tank is applied on its side wall with ultrasonic waves from ultrasonic vibrators serving to flush the container.The conveyor is provided on its outer peripheral surface with fin-like projections vertically extending and circumferentially spaced from one another at regular intervals and there are provided around the conveyor upper rails, sloped rails and lower rails serving to support the bottom of the container. There may be provided guide means associated with the respective rails. Only the lower rails are immersed in water.

Abstract: The present invention is an apparatus and method for immersing at least one contaminated part in a fluid, wherein the contaminated parts are moved through the fluid with both a rotational and reciprocal movement. The compound movement of the contaminated parts cause the parts to be repeatedly lifted from, and immersed within, the fluid, thereby improving the interaction of the fluid on all surfaces of the contaminated parts regardless to the shape or orientation of the contaminated parts.

Abstract: An instrument (28) or other item to be sterilized is supported on a hanger (26) in a decontamination chamber (10). A container such as a sleeve (92), is supported at adjacent ends between supporting rings (90) such that the container surrounds and is displaced from the instrument. A pump (40) recirculates a sterilant or other antimicrobial solution that collects in a lower drain (48) and a reservoir (50) through spray nozzles (70, 96) and connectors (44) which are connected to interior passages of the instrument. In this manner, the internal passages of the instrument are sterilized by the flowing liquid and exterior surfaces are sterilized by sterilant solution mist which condenses on and coats the exterior surface. After the instrument is sterilized, a sterile rinse is sprayed on the instrument and interior of the container. The container and instrument are removed as a unit and the container is closed at its ends to prevent the instrument from becoming microbially contaminated from the ambient air.

Abstract: A brush holder mounted on a container of cleaning fluid includes clips engaging the handles of one or more brushes to support the brushes with the bristles thereof extending vertically into the cleaning fluid. Two vertically-spaced motor-driven cranks, rotatable in synchronism with each other about vertically spaced horizontal axes, have a horizontally extending crank pin, the lower crank pin being received in a hole in the brush holder, and the upper crank pin being received in a slot in the brush holder.

Abstract: With a cleaning device that uses high-voltage discharges in liquids, it is possible to safely clean even clusters of precision castings if a tubular processing chamber serves as shock wave reflector and the position of the component and of the electrode are variable. Casting elements encrusted both with thin ceramic layers and with more ductile deposits are safely cleaned after they are lowered into the tubular chamber with sealable apertures on both sides, and after shock waves have been generated via the electrode positioned in the chamber. The tubular configuration of the chamber, which is preferably positioned endwise, makes it possible in particular to utilize the reflection waves to clean the individual components. By way of a hoist, the component configured as a cluster as well as any other configured component is passed by the electrode, turned, and if necessary swivelled in order to thus ensure a uniform and rapid cleaning.

Abstract: A high pressure solventless mask washer. A mask holder is slidably and rotatably mounted on a shaft within a vessel having a door through which the mask may be inserted and mounted to the holder. A rotatable output extending into the vessel is connected telescopically slides causing rotation of the holder. A spline between the holder and shaft causes vertical movement of the holder as the holder is rotated. Washing liquid is directed outwardly from the shaft against the mask with the liquid then being circulated through a filter to a main reservoir. A doctor blade removes solid materials from the filter and deposits same in a solids accumulator. A pump removes any liquid from the accumulator compartment directing the liquid back through the filter salvaging same.

Abstract: There is disclosed a cleaning device for cleaning a semiconductor wafer. According to the present invention, ech of the steps of the cleaning process used a separate carrier, so that none but the wafers need be washed, saving washing time. When drying, the surfaces of the wafers are kept from being contaminated by residual cleansers, thereby improving the yield rate.

Abstract: A contact lens cleaning device provides a mechanical apparatus for the thorough agitation and cleaning of contact lenses immersed in a disinfecting solution. The device comprises a base portion bearing a reservoir for containing a measured amount of disinfecting solution, and a main housing portion including a lens holder portion for releasable capture of the contact lenses to be cleaned. The lens holder is connected to rotating crankshafts by connecting rods, and the crankshafts are connected to a knob on the outside of the main housing, so that rotary motion of the crankshafts is translated to reciprocating motion of the lens holder.

Abstract: Power spray parts washing machine having mounted therein a perforated rotating drum which rotates on a horizontal axis and is provided with air operated means for projecting a door of the drum outwardly of the door opening of the machine for loading or unloading the parts into the drum. Sprays of hot water containing detergent are located above and below the drum.

Abstract: A rinsing apparatus is provided for a contact lens cleaning system. This rinsing apparatus comprises a container for receiving a quantity of rinsing fluid, receptacles for receiving contact lenses and an agitator mounted in the container for a compound agitating motion and coupled to the receptacles for agitating the receptacles. A base unit includes a platform for mounting the container in a stationary position and a drive assembly for driving the agitator to achieve the desired compound agitating motion. Advantageously, this drive assembly is operatively coupled with the agitator only by a magnetic coupling arrangement, obviating the need for any mechanical connection or coupling therebetween, or for extending any rotating members through the container.

Abstract: The apparatus is capable of being immersed in a liquid bath and supports at least two dowels or rods on which are mounted apertured discs in spaced apart relationship. Each rod has a gear fixed near one end and has a plurality of axially spaced circumferential grooves in each of which respective apertured discs are disposed. A pair of spaced wheels are provided to rotate in unison about a fixed axle. Each wheel has a plurality of radially disposed slots into which respective rods are disposed so that each dowel is capable of rotating about its own axis. The axle supports a fixed sun gear disposed near one wheel and each rod has at one end a planet gear that meshes with the sun gear whenever the respective rod is nested within a respective pair of slots on the wheels. Means are provided to rotate said pair of wheels about said axle. To prevent the rods from falling out of their respective slots as the wheels rotate, a C-shaped keeper device is disposed around each wheel and in a fixed position.

Abstract: This developer station comprises a developing tank arranged with a centrally located rotatable and vertically translatable shaft carrying a workpiece platform at the upper end thereof. Initially, the platform is located above the tank for ease in loading a workpiece, for example an exposed photoresist coated semiconductor device component. The workpiece is then lowered into developing solution in the tank where it is rotated and oscillated vertically for agitational action during a predetermined time period after which it is raised up out of the solution and delayed at a drying station for another predetermined time period. Thereafter, the workpiece is returned to the initial position for unloading.

Abstract: Centrifuge for degreasing and washing objects, particularly industrially manufactured pieces having blind holes, comprises a housing provided with a tilting device for tilting the centrifuge into an inclined position and returning it into an upright position. A rotary centrifuge drum is located within the housing and is equipped with a drive ring connected to an additional drive arrangement having a friction wheel adapted to be pressed against the drive ring to reduce the rotational speed of the centrifuge drum.

Abstract: A plant for cleaning intricate workpieces such as investment castings comprises a blast cabinet in which a workpiece to be cleaned is supported on a tiltable turntable with a fully enclosed drive mechanism. A cabinet wall provided with a viewing window has a gimbal through which a high-pressure water gun projects toward the turntable. The position of the turntable can be adjusted with the aid of a control panel outside the cabinet within reach of an operator handling the water gun. Solids dislodged by the water blast are collected in a settling cart underneath the cabinet which has an overflow trough for water to be recirculated to a supply tank by way of a system of pumps and filtering devices. A safety switch responsive to unlatching of the cabinet door cuts off the water supply to the gun as long as that door is not properly closed.

Abstract: The invention relates to drum processing apparatus for in the treatment of photographic material. The apparatus comprises a stand, a processing drum rotatably mounted on the stand, and means for intermittently axially displacing processing liquid in the drum causing the liquid to oscillate axially in waves traversing the length of the drum. The drum is axially slidable relative the support. During rotation of the drum, it is variably axially displaced against drum biasing means to cause processing liquid in the drum to oscillate axially. The present apparatus, which is simple and convenient to construct, ensures uniform and continuous contact of the processing liquid over the photographic material treated in the drum.

Abstract: Apparatus for cleaning objects, especially root crops such as sugar beet, comprises first and second members defining first and second surfaces respectively arranged for cleaning objects by relative movement between the surfaces and the objects to be cleaned. The first and second surfaces are arranged to converge towards each other over at least a part of the extent of each surface and are preferably in generally cylindrical form. Driving means drive the first member in a reciprocatory movement such that the first surface moves towards and away from the region of convergence of the surfaces, and drive the second members in a motion such as to effect at least an average movement of the second surface towards the region of convergence of the surfaces. Preferably the first and second members are rotary members positioned generally side by side with the axes of rotation thereof substantially parallel.

Abstract: An immersion cleaner for parts and other articles. The cleaner includes a receptacle for articles, a cover unit for a container of cleaning liquid, a cam plate unit disposed on the cover and including a circumferentially extending cam track surface having axially undulating portions, and a combination receptacle support and cam follower unit. The follower rotates about a vertical axis and is disposed in the use above the cam plate. The receptacle support unit includes means adapted to engage the cam track and to ride thereover upon oscillation of said support unit about its axis. A rod is attached to a portion of the support unit and forms an operative connection between the receptacle and the support unit. The support unit is driven in an oscillating mode. This causes the receptacle to swing through an arc and to rise and fall simultaneously.

Abstract: A degreasing apparatus comprises a container for liquid or gaseous solvent, a basket-holder arranged to receive open baskets containing the goods to be degreased, a lifting means to lower the basket-holder into and lift it out of the solvent, a rotary means to set the basket-holder in rotation, and a lid fitted in the basket-holder to close the basket during the degreasing operation. The basket-holder is provided with levers to open and close the basket automatically. One end of the levers engages the lid to lift it and to lower it. The other end of the levers are arranged to come into contact with a stationary stop as the basket-holder approaches its highest position. This contact makes the levers turn, thus lifting the lid.

Abstract: An immersion cleaner for parts and other articles. The cleaner includes a receptacle for articles, a cover unit for a container of cleaning liquid, a cam plate unit disposed on the cover and including a circumferentially extending cam track surface having axially undulating portions, and a combination receptacle support and cam follower unit. The follower rotates about a vertical axis and is disposed in the use above the cam plate. The receptacle support unit includes means adapted to engage the cam track and to ride thereover upon oscillation of said support unit about its axis. A rod is attached to a portion of the support unit and forms an operative connection between the receptacle and the support unit. The support unit is driven in an oscillating mode. This causes the receptacle to swing through an arc and to rise and fall simultaneously.

Abstract: An arrangement for surface treating workpieces has a pair of rotary conveyors each rotatable about a respective vertical rotation axis and provided with a plurality of angularly spaced holders each of which can grip a respective workpiece and advance it angularly stepwise through a plurality of respective working stations. In addition each of these holders can be rotated about an axis generally radial of the respective rotation axis for the rotary conveyor for treatment on all sides of each workpiece as it is stepped through the various surface treatment stations. A line conveyor extends tangentially passed the two conveyors and is of the walking-beam type. This line conveyor feeds workpieces to the upstream conveyor so that they then move around the working stations of this upstream rotary conveyor, then takes them off the upstream rotary conveyor and feeds them to the downstream rotary conveyor where they are stepped through the respective working stations of this conveyor.

Abstract: In fabricating sealed contacts, often their axially extending leads are solder coated to protect them from contamination and to enhance their solderability into circuits. An apparatus for solder coating the leads, which minimizes their bending, includes a conveying apparatus that moves the contacts through various stages of the solder coating apparatus to form layers of solder on the leads. These layers, which are carefully controlled, are no greater than a certain maximum thickness, and are thinner on the ends of the leads than on the side surfaces thereof.To coat the leads, the contacts are individually mounted in a plurality of holders, each of which is fixed to an individual bead of an endless bead chain of the conveying apparatus.