With Inorganic Alkaline Material Treating Agent Patents (Class 134/22.17)
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Patent number: 6524397Abstract: A method for removing an acidic deposit containing a sulfur compound, which comprises contacting the acidic deposit with an aqueous solution of an alkali metal carbonate and/or an alkali metal hydrogencarbonate to remove it.Type: GrantFiled: April 5, 2001Date of Patent: February 25, 2003Assignee: Asahi Glass Company, LimitedInventors: Shigeru Sakurai, Masaharu Emoto, Hachiro Hirano, Makoto Yoshida, Hiroaki Noda, Michihiro Kawano
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Patent number: 6514352Abstract: The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and fluorine compound to flow on a surface of a material to be treated at a high speed to thereby clean the above surface according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.Type: GrantFiled: October 9, 2001Date of Patent: February 4, 2003Assignees: Tokyo Electron Limited, Mitsubishi Gas Chemical Company Inc.Inventors: Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara, Yoshiya Kimura, Ryuji Sotoaka, Takuya Goto, Tetsuo Aoyama, Kojiro Abe
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Publication number: 20030004081Abstract: A composition and method for the removal of scale from a substrate are disclosed. The composition and method are more specifically utilized for the in situ removal of silicate-containing scale from interior surfaces of boilers and other heat exchange equipment. The silicate-containing scale is deposited in the boilers as silicate-sulfate complexes of calcium, magnesium, aluminum, and other metal atoms that are present in water. The composition, which is circulated throughout the boiler to contact the interior surfaces, such as the boiler tubes, includes a chelating agent having at least two carboxylic acid functional groups, preferably citric acid. The composition also includes an alkali metal hydroxide basic agent. The preferred alkali metal hydroxides are either potassium or sodium hydroxide. The basic agent establishes an overall basic pH of from 7 to 14 in the composition to enable precipitation of the metal atoms from the composition after interaction with the chelating agent.Type: ApplicationFiled: May 24, 2001Publication date: January 2, 2003Inventors: Gary D. Ellis, Matthew T. Lusher
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Publication number: 20020195126Abstract: Plant parts which are used for the production or processing of (meth)acrylic esters are cleaned byType: ApplicationFiled: April 18, 2000Publication date: December 26, 2002Inventors: HEINRICH AICHINGER, HOLGER HERBST, GERHARD NESTLER, JURGEN SCHRODER
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Patent number: 6475289Abstract: A chemical cleaning method for cleaning an internal passage of an engine-run gas turbine engine airfoil wherein the airfoil is immersed in an inorganic hydroxide medium at superambient temperature and atmospheric pressure for a short time to remove accumulated oxides and dirt from the internal passage. The hydroxide medium can comprise molten KOH and immersion times of the engine-run airfoil not exceeding 10 minutes are involved.Type: GrantFiled: December 19, 2000Date of Patent: November 5, 2002Assignee: Howmet Research CorporationInventors: John E. Schilbe, Rebecca J. Boczkaja, Bruce M. Warnes
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Publication number: 20020144718Abstract: Paint residues may be removed from spraying equipment and the like by flushing with aqueous compositions containing alkoxylated aromatic alcohols wherein the aromatic ring moieties of such alcohols do not bear any alkyl substituent containing more than 4 carbon atoms. Preferably, the aqueous compositions also contain an alkanolamine or other base. The alkoxylated aromatic alcohols contain an average of at least about 2 oxyalkylene moieties (preferably, oxyethylene moieties) per molecule.Type: ApplicationFiled: December 20, 2001Publication date: October 10, 2002Inventor: Neil R. Wilson
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Patent number: 6450183Abstract: A composition and apparatus and method of using the composition for aqueous spray descaling or conditioning of scale or oxide on metal surfaces, especially stainless steel strip or the like, in one embodiment, although it can be used to descale or condition oxide or scale on other work pieces such as metal bar, or even discrete objects. An aqueous solution having a base composition of an alkali metal hydroxide, such as sodium hydroxide, potassium hydroxide, or a mixture of alkali metal hydroxides such as sodium hydroxide and potassium hydroxide is used. The aqueous solution may contain certain additives to improve the descaling performance of the salt. In one embodiment, the solution is used to condition the scale or surface oxide on a strip of stainless steel. The strip of steel is at a temperature between the melting point of the alkali metal hydroxide in anhydrous form and a temperature at which the Leidenfrost effect appears.Type: GrantFiled: December 22, 1999Date of Patent: September 17, 2002Assignee: Kolene CorporationInventors: John M. Cole, James C. Malloy, John F. Pilznienski, William G. Wood
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Patent number: 6432210Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing sodium persulfate.Type: GrantFiled: February 28, 2001Date of Patent: August 13, 2002Assignee: The Ford Meter Box Company, Inc.Inventors: Edward L. Cote, Andrew D. Wenzel, Lance E. Agness
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Patent number: 6428628Abstract: A paint-removing method comprises the steps of putting dimethyl sulfoxide into a tank, raising the dimethyl sulfoxide at a temperature of approximately 35° C. to 189° C. in the tank; and soaking a member to be removed of paint into the dimethyl sulfoxide in the tank. The dimethyl sulfoxide is applying or blowing to a member to be removed of paint.Type: GrantFiled: August 22, 2000Date of Patent: August 6, 2002Inventor: Masao Umemoto
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Publication number: 20020074017Abstract: A chemical cleaning method for cleaning an internal passage of an engine-run gas turbine engine airfoil wherein the airfoil is immersed in an inorganic hydroxide medium at superambient temperature and atmospheric pressure for a short time to remove accumulated oxides and dirt from the internal passage. The hydroxide medium can comprise molten KOH and immersion times of the engine-run airfoil not exceeding 10 minutes are involved.Type: ApplicationFiled: December 19, 2000Publication date: June 20, 2002Inventors: John E. Schilbe, Rebecca J. Boczkaja, Bruce M. Warnes
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Publication number: 20020074018Abstract: A method of prevention maintenance preventing parts of an etcher from being eroded is disclosed. First, a layer of hydrogen-free chemical compound is formed on surface of the parts of the etcher according to one embodiment of the present invention. Otherwise, the parts of the etcher are immersed into a tank containing hydrogen-free chemical compound according to another embodiment of the present invention. After that, a standard process of prevention maintenance is performed by a cleaning agent.Type: ApplicationFiled: June 26, 2001Publication date: June 20, 2002Inventors: Wen-Peng Chiang, Ching-Ho Hsu
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Publication number: 20020066465Abstract: The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and a fluorine compound to flow on a surface of a material to be treated at a bigh speed to thereby clean the above surface. according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.Type: ApplicationFiled: October 9, 2001Publication date: June 6, 2002Inventors: Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara, Yoshiya Kimura, Ryuji Sotoaka, Takuya Goto, Tetsuo Aoyama, Kojiro Abe
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Patent number: 6398876Abstract: Stainless steel is pickled by a chemical and/or electrochemical pickling process using an acid liquid, containing substantially no nitric acid. The process uses a spent electrolyte solution from an electrochemical, neutral salt pickling tank, such as a sodium sulfate pickling tank. The spent electrolyte solution is added to an acid solution to form a pickling acid capable of pickling stainless steel, oxidizing Fe2+ to Fe3+ and reducing Cr6+ to Cr3+.Type: GrantFiled: December 21, 1999Date of Patent: June 4, 2002Assignee: Andritz—Patentverwaltungs-Gesellschaft m.b.H.Inventors: Jovan Starcevic, Dietfried Gamsriegler
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Patent number: 6397862Abstract: A method for cleaning garbage disposals comprises the steps of: mixing the starting materials in order to form an effervescent tablet; packaging the tablet in a moisture resistant pouch; placing the tablet in a garbage disposal unit; running warm water into the garbage disposal unit and turning on the garbage disposal for about 20 seconds; turning off the water and the garbage disposal, permitting the foam generated to maintain contact with all surfaces for about five minutes; and followed by rinsing away any left-over residue with generous amounts of water.Type: GrantFiled: September 7, 2001Date of Patent: June 4, 2002Inventors: Richard A. DeSenna, Hilton G. Dawson, Ryan Giffin Moore
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Patent number: 6387187Abstract: The invention relates to compositions having an alkylene carbonate and a primary hydroxyl functional capping agent selected from the group consisting of methoxypolyoxyethylene monol, polyoxyethylene-polyoxypropylene monol, and mixtures thereof for treating materials fouled with isocyanate. The invention also relates to decontamination of materials fouled with isocyanate, and to methods for decontamination of solvent fouled with isocyanate.Type: GrantFiled: January 18, 2001Date of Patent: May 14, 2002Assignee: Huntsman Petrochemical CorporationInventor: James A. Yavorsky
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Publication number: 20020043271Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing sodium persulfate.Type: ApplicationFiled: February 28, 2001Publication date: April 18, 2002Inventors: Edward L. Cote, Andrew D. Wenzel, Lance E. Agness
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Patent number: 6368419Abstract: In the non-destructive recovery of oil or other petroleum hydrocarbon from a contaminated substrate, the hydrocarbon is separated intact from the substrate by applying a hydrocarbon removing agent to the substrate and collecting the hydrocarbon separated from the substrate. The separation of the hydrocarbon is effected by applying a separation agent, such as an alkali, to the substrate to effect adhesion failure of the hydrocarbon, thereby to release the hydrocarbon intact from the substrate and applying a surfactant to suspend the hydrocarbon removed from the substrate. The separation agent and the surfactant collectively constitute the hydrocarbon removing agent which can be applied as an aqueous solution.Type: GrantFiled: April 30, 1999Date of Patent: April 9, 2002Inventor: George Kevin Daum
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Publication number: 20020033184Abstract: A method and kit are disclosed for removing or alleviating the severity or intensity of stains from aldehyde-based sterilizing solutions through the use of reducing agents. This invention is effective even for porous surfaces such as filter paper and porous nylon films as well as for smooth surfaces such as glass, aluminum, copper, brass and stainless steel. Also, the invention may be used in a variety of formats such as a kit useful for making or using solutions or gels to treat the aldehyde-based stained surfaces of, for example, medical devices, hospital bench or table tops, hospital floors and skin (if in appropriate pH range), etc.Type: ApplicationFiled: June 28, 2001Publication date: March 21, 2002Inventors: Peter Zhu, Henry Hui, Les Feldman
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Patent number: 6357453Abstract: An improved chemical wash is used to cleanse the interior of an open Cathode Ray Tube (“CRT”) funnel before a coating of a carbon material is applied. The traditional ammonium bifloride wash for CRT funnels can be replaced with an aqueous solution of trisodium phosphate (“TSP”). The TSP solution is preferably sprayed under pressure into the open CRT funnels to cleanse each funnel before the interior coating of carbon material is applied. The TSP solution cleanses the funnels as well as the ammonium bifloride wash previously used, but does not tend to clog the wash sprayers. Moreover, the TSP solution does not need to be treated before it is released as waste and costs significantly less that the previous ammonium bifloride wash.Type: GrantFiled: June 4, 2001Date of Patent: March 19, 2002Assignees: Sony Corporation, Sony Electronics, Inc.Inventors: David Allen Murtishaw, Michael Gerald King, David Cataldo
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Patent number: 6344090Abstract: An inhibitor especially useful for aqueous solutions being used at high temperatures to remove scale from boiler tubes and the like contains (1) amines including a substituent group with an abietyl nucleus, (2) organic compounds or polymers that contain at least 2—OH moieties per molecule and at least 0.4 —OH moieties per carbon atom, (3) organic molecules that contain a carbon-sulfur bond, and (4) surfactant.Type: GrantFiled: September 20, 1999Date of Patent: February 5, 2002Assignee: Henkel CorporationInventor: William G Johnston
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Patent number: 6340395Abstract: A wet spray cleaning process for removing thick organic layers including hardened photoresist from the surface of silicon wafers yields low residual particle counts for photoresist thicknesses up to 3 microns, and maintains low residual particle density for oxide-covered wafer regions. The cleaning process uses multiple cycles of SPM/DI/APM/DI, without an intervening drying step therebetween.Type: GrantFiled: March 16, 2000Date of Patent: January 22, 2002Assignee: Advanced Micro Devices, Inc.Inventors: Jacques Bertrand, Barry Dick, Shu Tsai Wang, Weiwen Ou, Lynne A. Okada, Yen C. Chu
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Publication number: 20020000239Abstract: A stripping composition and a method of using the stripping composition to remove cured resins such as elastomeric silicone adhesive deposits from ceramic and metal surfaces of electronic modules to provide reworkability options in assembly processes including diagnostic parts, parts replacement and recovery of substrates from test vehicles is provided. The stripping compositions comprise a base preferably an organic base such as a quaternary ammonium hydroxide, a surfactant and a high boiling environmentally and chemically safe solvent such as di- or tri-propylene glycol alkyl ether. In another stripping composition, the base is used in combination with a mixture of N-alkyl pyrrolidone components, preferably an N-alkyl pyrrolidone and a N-cycloalkyl pyrrolidone. The stripping compositions are used to contact an electronic module having a cured resin such as a silicone adhesive residue deposit on the module surface to dissolve, remove or strip the deposit.Type: ApplicationFiled: September 27, 1999Publication date: January 3, 2002Inventors: KRISHNA G. SACHDEV, UMAR M. AHMAD, FAREED Y. AUDI, DANIEL G. BERGER, JOHN U. KNICKERBOCKER, CHON C. LEI
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Patent number: 6306223Abstract: The present invention relates to a process for removing fatty substances. According to this process, the following steps are carried out:1) at least a first degreasing operation is carried out on the article to be treated, in the presence of a solvent mixture comprising at least one compound (a) chosen from C1-C4 dialkyl esters of at least one C4-C6 aliphatic diacid, and at least one compound (b) which is miscible in the compound (a) and which at least partially dissolves the fatty substance contaminating the article, 2) at least a second degreasing operation is optionally carried out, in the presence of a solvent mixture comprising at least one compound (a) and at least one compound (b) as defined above, with a compound (a)/compound (b) volume ratio of greater than or equal to 1, 3) a third degreasing operation is carried out in the presence of compound (a), 4) the article thus treated is rinsed with water.Type: GrantFiled: April 17, 2000Date of Patent: October 23, 2001Assignee: Rhodia ChimieInventor: Jean-Luc Joye
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Publication number: 20010025016Abstract: A water-free solution and method for dissolving and removing thermal grease from a high frequency logic device (e.g. a microprocessor in the form of a BGA and ASIC in the form of Quad Flat Pack component) assembled onto an electronic card which needs to be reworked. The method and solution of the present invention allow the complete removal of the grease by a simple and fast process, using an alcoholic, inert and cheap solution, without needing a mechanical action (e.g. brushing) and without damaging the card components. Furthermore, given the low surface tension of the alcoholic solution a good diffusion within the small holes and spaces of the card is ensured.Type: ApplicationFiled: December 4, 2000Publication date: September 27, 2001Inventors: Paul Joseph Hart, Vittorio Sirtori, Sergio Varinelli, Marino Verderio, Franco Zambon
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Publication number: 20010018922Abstract: In a method for cleaning a copper surface of a semiconductor wafer or article, nitrogen gas is bubbled or dissolved into a strong alkaline solution, displacing dissolved oxygen from the solution. A nitrogen gas environment is provided over the copper surface. The alkaline solution is then applied to the copper surface. The copper etch rate is greatly reduced. The method is useful in removing residual polishing slurry after a chemical-mechanical polishing step, and for removing residues left in via holes after plasma etching.Type: ApplicationFiled: March 23, 2001Publication date: September 6, 2001Applicant: Semitool, Inc.Inventor: Michael Jolley
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Patent number: 6273102Abstract: A repairing method of a petroleum refining plant for efficiently conducting cleaning process of process equipment and pipings, unloading process of agglomerated catalyst, rinsing work of the process equipment and the pipings, thereby reducing plant shutdown time, preventing stress-corrosion cracking by polythionic acid, improving production efficiency, ensuring work safety and reducing production cost, is provided. For the object, the repairing method of the petroleum refining plant of the present invention has a first step of cleaning the process equipment and the pipings and softening agglomerated catalyst inside the process equipment, second step of rinsing the process equipment and the pipings and coating a surface of the softened catalyst by a coating agent, and third step of dumping the coated catalyst from the process equipment and re-rinsing the process equipment and the pipings.Type: GrantFiled: June 14, 1999Date of Patent: August 14, 2001Assignees: Softard Industries Co., Ltd., Nicca Chemical Co., Ltd.Inventors: Katsuhiko Kawakami, Junichi Takano, Guiqing Xu
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Publication number: 20010008877Abstract: A cleaning medium for use in cleaning printing forms includes either an acid solution having a pH of from 1 to 4 or a basic solution having a pH of from 10 to 14. A dispersible abrasive agent in a concentration of from 1 to 15 grams per 100 grams of the cleaning composition, a surfactant in a concentration of from 1 to 50 grams per 100 grams of the cleaning composition, an organic solvent in a concentration of from 10 to 50 grams per 100 grams of the cleaning composition, and additional water if needed are added to the acid or basic solution to form the cleaning medium. A cleaning medium in concentrate form is also provided.Type: ApplicationFiled: December 21, 2000Publication date: July 19, 2001Applicant: MAN Roland Druckmaschinen AGInventors: Thomas Hartmann, Hans-Christoph Beltle, Andrea Fuchs, Roland Dietrich
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Patent number: 6248178Abstract: A method is disclosed for removing pad nodules. The method provides a wafer comprising pads and pad nodules which are formed on said pads, wherein said pads are made from a metal selected from the group consisting of aluminum and an aluminum-copper alloy. Then, the method dips the wafer into deionized water for removing the pad nodules. Thereafter, the method spin-dries the wafer and coats an alkaloid developer on the wafer for further removing the pad nodules. Finally, the method removes the alkaloid developer from the wafer and bakes the wafer.Type: GrantFiled: April 4, 2000Date of Patent: June 19, 2001Assignee: United Microelectronics Corp.Inventors: Cheng-Tzung Tsai, Cheng-Chih Kung, Lien-Sheng Chung, Tai-Yuan Li
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Patent number: 6245157Abstract: The present invention relates to cleaning compositions which, as powder or as aqueous formulation, comprise sodium bicarbonate and, as dispersants, polyaspartic acids and/or salts thereof, to the use of these cleaning compositions for the abrasive cleaning of hard surfaces, and also to a method of cleaning surfaces contaminated with deposits using these cleaning compositions.Type: GrantFiled: September 14, 1999Date of Patent: June 12, 2001Assignee: Bayer AktiengesellschaftInventors: Manfred Gerlach, Bernhard Lehmann, Hartwig Wendt, Herbert Emde, Urban Recht
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Patent number: 6245155Abstract: A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.Type: GrantFiled: April 6, 1998Date of Patent: June 12, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Vincent G. Leon, Kenji Honda, Eugene F. Rothgery
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Patent number: 6240935Abstract: A process for descaling, derusting, dissolving, and removing machining lubricants coated on steel and other iron alloy objects, the process comprising the steps of: (a) providing an alkaline cleaning solution consisting of: water; about 2.5% to 25% by weight of a water-soluble alkali; about 2% to 8% by weight of sodium gluconate; about 5% to 20% by weight of sodium xylene sulfonate; and about 2% to 20% by weight of a water-soluble surfactant consisting of C9-C11 alcohol ethoxylates and 6 ppm of ethylene oxides; and (b) contacting the soiled object with the alkaline cleaning solution at a temperature of about 60° F. to 200° F. for about 3 to 30 minutes, wherein the object is descaled, derusted, and the machining lubricant is dissolved and removed.Type: GrantFiled: March 30, 2000Date of Patent: June 5, 2001Assignee: The Boeing CompanyInventor: Cathleen H. Chang
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Patent number: 6235125Abstract: An industrial sponge device and a method of manufacturing the same. The sponge is made from a polyvinyl acetal material with a process in which the pores are formed by gas to provide an open pore structure having no fibrils. Additionally, the sponge is purified by an extracting process which includes alternating exposure of the partially cross-linked sponge to solutions of high pH and low pH. The sponge is sterilized by electron beam radiation to destroy micro organisms that can cause contamination of the final product. The resulting sponge material is formed into an industrial sponge having a cylindrical body and a plurality of projections extending from the body. The projections are tapered truncated cones having a cross-sectional radius that decreases with distance from the body. The extracting process permits residual amounts of calcium, zinc, and other elements to be 2 ppm or less preferably 1 ppm or less.Type: GrantFiled: November 25, 1998Date of Patent: May 22, 2001Assignee: Xomed Surgical Products, Inc.Inventors: Ronald J. Cercone, Gerald D. Ingram, Leon C. Nunier, Scott J. Quaratella
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Patent number: 6234183Abstract: A method and composition for removing deposits of heavy hydrocarbonaceous materials and finely divided inorganic particulate matter from wellbore and flowline surfaces using a composition containing an alkyl polyglycoside, an ethoxylated alcohol, a caustic and an alkyl alcohol.Type: GrantFiled: July 10, 2000Date of Patent: May 22, 2001Assignee: Atlantic Richfield CompanyInventors: Albert F. Chan, William Mark Bohon, David J. Blumer, Kieu T. Ly
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Patent number: 6235124Abstract: A solution for mildew removal, which includes an aqueous solution of 1-2%(weight by volume) sodium perborate and a non-ionic detergent added as a surfactant. A method for mildew removal, which includes mixing sodium perborate in an aqueous solution wherein the sodium perborate is 1-2% weight by volume, adding a non-ionic detergent to the solution, applying the solution to an infected area, and rinsing the infected area.Type: GrantFiled: April 10, 2000Date of Patent: May 22, 2001Assignee: The United States of America as represented by the Secretary of the NavyInventor: Lynn J. Rubin
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Patent number: 6217667Abstract: In a method for cleaning a copper surface of a semiconductor wafer or article, nitrogen gas is bubbled or dissolved into a strong alkaline solution, displacing dissolved oxygen from the solution. A nitrogen gas environment is provided over the copper surface. The alkaline solution is then applied to the copper surface. The copper etch rate is greatly reduced. The method is useful in removing residual polishing slurry after a chemical-mechanical polishing step, and for removing residues left in via holes after plasma etching.Type: GrantFiled: September 24, 1999Date of Patent: April 17, 2001Assignee: Semitool, Inc.Inventor: Michael Jolley
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Patent number: 6204231Abstract: An aqueous alkaline composition for cleaning equipment used in the food industry wherein the composition contains potassium hydroxide or a mixture of potassium hydroxide and sodium hydroxide and wherein the potassium hydroxide is present in an amount of at least 20% by weight, based on the weight of hydroxide present in the composition. A process for regenerating the cleaning solution is also disclosed.Type: GrantFiled: September 1, 1998Date of Patent: March 20, 2001Assignee: Henkel Kommandigesellschaft Auf AktienInventors: Anja Patten, Ralf Krack, Dietmar Rossner
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Patent number: 6197738Abstract: A nontoxic sanitizing cleaner comprising an organic acid having a pH less than 3, a chelating agent, and a surfactant. The invention also contemplates a buffering agent in the cleaner. In a preferred embodiment, the sanitizing cleanser is in the form of a solution containing 94% citric acid, 4% EDTA, 1% sodium laurel sulfate, and 1% monosodium phosphate, by weight. The invention also contemplates using the nontoxic sanitizing cleaner in a cosmetic lotion, and in processes for cleaning and sanitizing food processing equipment.Type: GrantFiled: April 30, 1997Date of Patent: March 6, 2001Inventor: Robert R. Regutti
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Patent number: 6182323Abstract: The present invention provides a novel porous polymeric device (101) (103) (105) (107) (109) (111) (113), e.g., an ultraclean brush. The device includes an elongated foam member (101, 103), which has an outer surface for removing residual particles from a surface of a substrate. Among other features, the elongated foam member includes a polyvinyl alcohol bearing compound, where the elongated foam member has a calcium ion impurity concentration of less than about 1 part per million. Accordingly, the present device is much cleaner than conventional devices.Type: GrantFiled: November 16, 1998Date of Patent: February 6, 2001Assignee: Rippey CorporationInventor: Kristan G. Bahten
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Patent number: 6179927Abstract: A method for decontaminating the copper surfaces (e.g. circuits) of an electronic card from copper salts which can be formed after the soldering of the electronic components onto the substrate employing a water free solution which comprises an alcohol and at least one neutral ammonium salt of an organic acid.Type: GrantFiled: May 30, 2000Date of Patent: January 30, 2001Assignee: International Business Machines CorporationInventors: Vittorio Sirtori, Giovanni Cattaneo, Fabio Mauri
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Patent number: 6176937Abstract: Aqueous acidic solutions of hydrogen peroxide used for metal surface treatments suffer from an increased decomposition rate of the hydrogen peroxide, caused by the dissolved metals such as iron, copper or titanium. A method is provided wherein stabilization can be achieved by employing a combination of a) a hydroxybenzoic acid, preferably p-hydroxybenzoic acid; b) a hydrotropic sulphonic acid, preferably p-toluene sulphonic acid; and c) a hydrophobic alkaryl sulphonic acid, preferably dodecylbenzene sulphonic acid.Type: GrantFiled: March 20, 2000Date of Patent: January 23, 2001Assignee: Solvay Interox LimitedInventors: Sarah J. Colgan, Neil J. Sanders, Colin F. McDonogh