Abstract: Portable/transportable apparatuses, methods, and systems for generating and delivering sulfur trioxide on-site or near an item to be treated is provided. A method for extracting hydrocarbons from deposits containing a clathrate hydrate such as methane hydrates includes a step of delivering sulfur trioxide to an ice deposit containing a clathrate hydrate and subsequently extracting linear or branched hydrocarbons.

Abstract: An apparatus includes at least one storage tank configured to store a disinfectant/sanitization solution, at least one pump connected to the at least one storage tank to distribute the disinfectant/sanitization solution via a piping system, at least one valve in communication with the piping system to open and close to control flow of the disinfectant/sanitization solution, at least one device to control the flow of the disinfectant/sanitization solution for a particular period of time to at least one misting nozzle, and the at least one misting nozzle in communication with the piping system and the at least one valve to mist a particular area with the disinfectant/sanitization solution.

Abstract: A coated component of a gas turbine engine includes a substrate defining a surface, a thermal barrier coating deposited on the surface of the substrate, a region of the component where the thermal barrier coating has spalled from the substrate, a layer of environmental contaminant compositions formed on one or more of the thermal barrier coating or the region of the component where the thermal barrier coating has spalled from the substrate in response to an initial exposure of the component to high operating temperatures of the gas turbine engine, and a thermal barrier coating (TBC) restoration coating deposited at least on the region of the component where there thermal barrier coating has spalled from the substrate.

Abstract: A polycarbonate headlight lens cleaning and restoring kit has a lens cleaning composition, an applicator wipe; and a lens restoring composition comprising a coating component. The polycarbonate cleaning composition contains only liquid components and is free of water. The cleaning composition has a first solvent that softens a Control Polycarbonate Substrate and has a flash point of from ?58 F to 220 F; and a second solvent that does not soften a Control Polycarbonate Substrate. The first solvent and the second solvent are present in an amount effective to substantially remove discoloring contaminants from a polycarbonate headlight lens and the polycarbonate lens, and also in an amount so that, after removal of the discoloring contaminants, the polycarbonate headlight lens can be restored to a clear condition. A method of cleaning and restoring a polycarbonate headlight lens that is at least partially discolored from discoloring contaminants is also provided.

Abstract: A method of manufacturing a photoelectric conversion element according to the present disclosure includes: a first placement step in which a first semiconductor substrate on which a first thin film and a second thin film are not formed is placed in a first film forming place (81) in a first film forming chamber (61); a second placement step in which a second semiconductor substrate on which the first thin film is formed on a first-principal-surface side and the second thin film is not formed on a second-principal-surface side is placed in a second film forming place (82) in the chamber (61); and a first film forming step in which forming of the first thin film on the first-principal-surface side of the first semiconductor substrate and forming of the second thin film on the second-principal-surface side of the second semiconductor substrate are executed in the same period in the chamber (61).

Abstract: A filter membrane includes a membrane having through holes that selectively separates specific material in processing medium, the membrane including first, second and third layers such that the first layer has first surface that is supplied with processing medium, the third layer has second surface on the opposite side of the first surface, and the second layer is formed between the first and third layers. The first layer includes first convex and concave portions, the third layer includes second convex and concave portions each having a larger area than each first concave portion, the second convex portions are formed to surround the second concave portions and connected to one another, the second layer has through holes connecting the second concave portions and first set of the first concave portions, and the first concave portions include second set in regions opposing the second convex portions that is connected to each other.

Abstract: A polishing platform of a polishing apparatus includes a platen, a polishing pad, and an electric field element disposed between the platen and the polishing pad. The polishing apparatus further includes a controller configured to apply voltages to the electric field element. A first voltage is applied to the electric field element to attract charged particles of a polishing slurry toward the polishing pad. The attracted particles reduce overall topographic variation of a polishing surface presented to a workpiece for polishing. A second voltage is applied to the electric field element to attract additional charged particles of the polishing slurry toward the polishing pad. The additional attracted particles further reduce overall topographic variation of the polishing surface presented to the workpiece. A third voltage is applied to the electric field element to repel charged particles of the polishing slurry away from the polishing pad for improved cleaning thereof.

Abstract: A support for dip coating, wherein the inner peripheral surface at an end in the axial direction of the support has an arithmetic average roughness Ra of 0.26 ?m or less and a maximum height roughness Rz of 2.3 ?m or less.

Abstract: The invention relates to an arrangement for implanting in a human or animal body, comprising a carrier device which provides a receiving means and which is made from a synthetic mesh or fabric material, and an electronic element which is fixed to the carrier device in the region of the receiving means. Also provided is a method for implanting the arrangement in a human or animal body.

Abstract: A method of removing ink from a film includes unrolling the film from a first roll, exposing the film to a cleaning composition, and scraping the cleaning composition from the film. The film and the cleaning composition pass adjacent a first nonabrasive cloth to spread the cleaning composition over a width of the film, and adjacent at least one additional nonabrasive cloth to scrub the ink from the film. The film may be polymeric, metallic, or a metalized polymer. A system includes a means for unrolling a film, at least one nozzle configured to expose the film to a cleaning composition, and a blade configured to scrape the cleaning composition from the film. The system also includes a first nonabrasive cloth configured to spread the cleaning composition over a width of the film, and at least one additional nonabrasive cloth configured to scrub the ink from the film.

Abstract: Compositions and methods for removing surface deposits in situ from filtration media contained in water filtration beds may include a solid acid component, a solid oxidizer, low temperature activator, a dessicant, an anti-caking agent, a pH indicator, a corrosion inhibitor, a surfactant, a chelating agent, and/or a defoaming agent. A granular acid component may include sodium bisulfate, and a granular oxidizing component may include at least one of sodium percarbonate, sodium perborate, potassium percarbonate, and potassium perborate. Compositions may be applied to top surface and/or subsurface regions of a filter bed, in wetted or dry form. A kit includes a container with dry composition and instructions or indicia for cleaning water filtration media using the composition.

Abstract: The present invention relates to the depolymerization of polymers and the recovery of the starting materials used for the production of the polymer. The present invention also relates to the depolymerization of polyethylene terephthalate (PET) and the recovery of terephthalic acid and ethylene glycol.

Abstract: A system and method for generating and dispensing a diluted sodium hydroxide solution, the system including an electrolysis unit configured to electrochemically generate a concentrated sodium hydroxide solution from an anolyte solution formed with a non-chlorinated electrolyte. The system also including a dosing pump configured to receive dilution water and the concentrated sodium hydroxide solution at a high dilution ratio to produce the diluted sodium hydroxide solution, and a dispenser configured to dispense the diluted sodium hydroxide solution.

Abstract: Embodiments of the present disclosure generally relate to a composition, system, and method of unclogging and maintaining a drain or conduits that deliver fluids such as water. The system includes delivering a predetermined amount of drain cleaning composition to an obstruction wherein the predetermined amount may be delivered by a single-use packet. The composition for clearing a clogged drain may include sodium bisulfate, moisture, sodium sulfate, potassium, calcium, or iron.

Abstract: In a manufacturing method of a semiconductor device, a depression is formed in a semiconductor substrate made of silicon or silicon compound semiconductor, and foreign substances including a protection layer in the depression is removed with a cleaning solution. The cleaning solution includes a mixed solution of hydrogen peroxide water to which a chelator is added, a basic solution, and water.

Abstract: A method for operating a water-conducting domestic appliance, including a domestic dishwasher, wherein the water-conducting domestic appliance includes a program controller for performing a plurality of sequential program steps and the program controller operatively interacts with at least a detergent-dosing system, the method including the step of adding at least one cleaning substance having a function during at least one program step.

Abstract: A method for cleaning a surface of a plate-like article includes the steps of: treating the surface with free flow cleaning, wherein liquid is dispensed through a dispense nozzle onto the surface in a continuous liquid flow, and treating the surface with spray cleaning, wherein liquid is directed through a spray nozzle towards the surface in form of droplets. The surface is treated with a spray cleaning step before the free flow cleaning step and a spray cleaning step after the free flow cleaning step.

Abstract: Methods are presented for cleaning and removing powder or other substances which may result from a Color Run™-style event or from other events or circumstances. In one embodiment, a contamination area, i.e., an area where powder or some other substance has been disseminated, is cleaned by plugging one or more storm drains, using water to wash the powder into the storm drain(s), and then relocating the contaminated water from the storm drain(s) into one or more sewer drain(s) or other acceptable location(s). Additional steps may include pre-cleaning the anticipated contamination area, using a sweeper vacuum to clean up the powder, pre-washing the anticipated contamination area, pre-cleaning the storm drain(s), closing access to storm drains that will not be used, pre-treating with a sodium hypochlorite solution, and/or pretreating with a brine solution.

Abstract: A system for preliminary treatment of a surface to prepare the surface for application of a coating includes a plurality of process tanks, each of which contains a heated liquid into which the surface is immersed to prepare it for coating, and a dedicated hot water generator associated with each of the plurality of process tanks. Each dedicated hot water tank directly or indirectly heats only the liquid contained in the associated process tank, eliminating hot water distribution and return piping, heat exchangers, and control valves used in conventional systems.

Abstract: A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a first mixture of ozone and one of an acid and a base, followed by a second mixture of ozone and the other one of the acid and the base. The cleaning mixtures may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface. The acid may be HF; the base may be NH4OH.

Abstract: The invention relates to a non-aqueous stripping composition for removing cured organic paint from substrates comprising i. a source of hydroxide ions; ii. a high-boiling alcohol having a boiling point of at least 100° C.; and iii. at least one surfactant represented by the following formula R—O—(CH2CH2O)nH and wherein R is an alkyl chain, linear or branched having a 2 to 24 carbon atom chain length.

Abstract: A solid controlled release composition according to the present invention includes at least one cellulosic material, water, at least one active ingredient, and optionally at least one of a saccharide, sugar alcohol or salt. The active ingredient can be a polycarboxylic acid.

Abstract: An object is to reduce changes in mechanical properties of a gas turbine blade base material during repair or regeneration of a gas turbine blade. For this purpose, a gas turbine blade after being operated is washed by being immersed into a strong alkaline washing solution, and the gas turbine blade after being washed with the strong alkaline washing solution is washed with water. The gas turbine blade after being washed with water is then washed by being immersed into a weak acid washing solution, and the gas turbine blade after being washed with the weak acid washing solution is subjected to heat treatment. The gas turbine blade after the heat treatment is then immersed into a strong acid washing solution, whereby the coating formed on the surface of the gas turbine blade is removed.

Abstract: Disclosed is a method of washing ware in an automatic institutional warewashing machine wherein the method includes contacting ware with a cleaning composition containing a surfactant and further includes contacting the washed ware in a rinse step with a potable aqueous rinse, the aqueous rinse being substantially free of an intentionally added rinse agent. A surfactant is employed in the wash step in an amount not to exceed 15 wt % based on weight of the detergent. The amount of surfactant is sufficient to provide a layer of surfactant on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: A method for in-line cleaning of ultrasonic welding tools is described. The method includes applying cleaning solution onto a work surface of a welding tool to be cleaned using an application device. Then the method involves removing residue dissolved in the cleaning solution from the work surface using a cleaning device. Next, the work surface is neutralized and rinsed using purified water and polished with a cleaning cloth. Finally, the work surface is rinsed using cleaning alcohol and blow-dried with compressed air.

Abstract: Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is an alkaline aqueous solution, which is sprayed onto the package surface simultaneously with the friction thereof with a soft and non abrasive element. In a preferred embodiment, said friction results in the rotation of the package around the longitudinal axis thereof, which is mounted on a rotative support, and the soft non abrasive element in contact with the surface thereof keeps motionless.

Abstract: A dishwasher is provided that has a door and a wash compartment that is closed off by the door. The wash compartment receives items to be treated and has a movable dish rack in which items to be cleaned are supported. The movable dish rack is moved from a treatment position in which the wash compartment is closed to an access position in which loading and unloading of dishes into the dishwasher is facilitated. The dishwasher further includes a visual display facility for visual notification of operation information and/or program information of the dishwasher. The visual display facility is assigned to the dish rack.

Abstract: A method for cleaning objects made of organic or inorganic materials, wherein the relevant material is brought into contact with a composition in the form of a fluid nanophase system, comprising a) at least one water-insoluble substance having a water solubility of less than 4 grams per liter, b) at least one amphiphilic substance (NP-MCA) which has no surfactant structure, is not structure-forming on its own, the solubility of which in water or oil ranges between 4 g and 1000 g per liter and which does not preferably accumulate at the oil-water interface, c) at least one anionic, cationic, amphoteric and/or non-ionic surfactant, d) at least one polar protic solvent, in particular having hydroxy functionality, e) if necessary one or more auxiliary substance.

Abstract: A method and device for wet treating a peripheral area of a wafer-shaped article uses rollers for driving the wafer-shaped article at its edge. First and second liquid treatment units supply liquid towards the peripheral area. Each of the liquid treatment units comprises a liquid carrier, a liquid supply nozzle for supplying liquid to the liquid carrier and a liquid discharging channel for removing liquid from the liquid carrier. The second liquid treatment unit includes a gas treatment section with a gas supply nozzle for removing most of the second liquid from the peripheral area, and with a gas discharge channel for discharging gas and removed liquid.

Abstract: A method for cleaning process apparatus used for production of liquids, especially for cleaning filters, for example membrane filters. The apparatus is contacted with a solution of periodate. It is especially preferred that the cleaning process is carried out at a temperature between 15 and 95° C.

Abstract: High purity cyclohexasilane and a method for increasing the purification efficiency thereto are provided. The method for producing cyclohexasilane of the present invention is characterized in that, in distilling crude cyclohexasilane to obtain purified cyclohexasilane, the absolute pressure during distillation is set to 2 kPa or less, and the heating temperature of crude cyclohexasilane is set to 25 to 100° C. The cyclohexasilane of the present invention contains pure cyclohexasilane at a rate of 98% by mass or more and 100% by mass or less.

Abstract: Methods of acidic warewashing are disclosed. The compositions can include other materials including surfactants and chelating agents, and are preferably phosphorous free. Methods of using the acidic compositions are also disclosed. Exemplary methods include using the acidic compositions together with other compositions, including alkaline compositions and rinse aids employed in an alternating alkaline/acid/alkaline manner. The methods also include acidic compositions that serve multiple roles.

Abstract: Methods and systems are provided for preparing a ruthenium containing liner/barrier for metal deposition, and are useful in the manufacture of integrated circuits. In accordance with one embodiment, a borohydride solution having a pH greater than 12 is mixed with DI water at the place of application to form a pretreatment solution. The pretreatment solution is applied to reduce a ruthenium-containing surface of a substrate. Following reduction of the ruthenium containing surface, copper deposition may be initiated.

Abstract: A process for treating the surface of a substrate in the manufacture of a semiconductor device. The process comprises providing a concentrated acid or base, a peroxide and water, and delivering the acid or base, the peroxide and the water to the surface of the substrate. The acid or base and the water are delivered separately to the surface of the substrate and allowed to mix on the surface, and the water is delivered in pulses. The present invention also provides an apparatus adapted to carry out this process.

Abstract: A process/method for cleaning wafers that eliminates and/or reduces pitting caused by standard clean 1 by performing a pre-etch and then passivating the wafer surface prior to the application of the standard clean 1. The process/method may be especially useful for advanced front end of line post-CPM cleaning. In one embodiment, the invention is a method of processing a substrate comprising: a) providing at least one substrate; b) etching a surface of the substrate by applying an etching solution; c) passivating the etched surface of the substrate by applying ozone; and d) cleaning the passivated surface of the substrate by applying an aqueous solution comprising ammonium hydroxide and hydrogen peroxide.

Abstract: [PROBLEM] There is provided a method for regenerating a filter, by which deterioration of the color tone of purified acrylic acid can be prevented. [SOLUTION] There is provided a method for regenerating a filter which has been used in a filtration step in the process for producing an acrylic acid, comprising a step (A) wherein the filter is washed with an aqueous alkaline solution, a step (B) wherein the filter is washed with water after the step (A) , and a step (C) wherein the filter is brought into contact with the acrylic acid for regeneration for at least one hour after the step (B).

Abstract: A method of warewashing for the removal of starch is described herein. The method includes applying an alkaline composition to a dish, then applying an acidic composition to a dish, and then applying a second alkaline composition to the dish. The method may include additional steps. Compositions for using with the method are also disclosed. Finally, dish machines that may be used in accordance with the method are disclosed.

Abstract: A composition effective for removing contaminates from a manufactured product either as a concentrated material or when diluted with water. The composition designed for effective removal of all types of undesirable contaminates from a manufactured product, including but not limited to, solder flux, oils, greases, soil, and particulate matter. Depending on the nature of the process the cleaning composition maybe used in a multistep process. The composition contains propylene glycol phenyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

Abstract: A process for cleaning a compound semiconductor wafer; the compound semiconductor wafer comprises, taking gallium arsenide (GaAs) as a representative, a group III-V compound semiconductor wafer. The process comprises the following steps: 1) treating the wafer with a mixture of dilute ammonia, hydrogen peroxide and water at a temperature not higher than 20° C.; 2) washing the wafer with deionized water; 3) treating the wafer with an oxidant; 4) washing the wafer with deionized water; 5) treating the wafer with a dilute acid solution or a dilute alkali solution; 6) washing the wafer with deionized water; and 7) drying the resulting wafer. The process can improve the cleanliness, micro-roughness and uniformity of the wafer surface.

Abstract: An aqueous cleaning composition and method for post-CMP cleaning of a semiconductor device which contains a copper interconnect wherein the cleaning composition contains (A) N,N,N?-trimethyl-N?-(2-hydroxyethyl)ethylenediamine; and (B) at least one corrosion inhibitor selected from the group consisting essentially of uric acid, xanthine, theophyline, paraxanthine, theobromine, caffeine, guanine, hypoxanthine, adenine, and combinations thereof.

Abstract: A method of simultaneously cleaning and disinfecting an industrial water system is described and claimed. The method involves the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. This cleaning and disinfecting method works in a variety of industrial water systems including cooling water systems.

Abstract: A method for dispensing a liquid or pasty cleaning agent and a liquid or pasty bleaching agent into a wash tub of a household dishwasher that includes a housing and a dispensing system disposed in the housing. The dispensing system separately stores and discharges the cleaning agent and bleaching agent. The method includes providing the dispensing system with respective reservoirs for each of the cleaning agent and the bleaching agent that have different capacities from each other. Each of the capacities are larger than needed for a single wash cycle. A first quantity of the cleaning agent and a second quantity of the bleaching agent are dispensed during a wash cycle, and the ratio of the dispensed quantities corresponds to the ratio of the capacities of the respective reservoirs.

Abstract: There is disclosed a coated-type silicon-containing film stripping process for stripping off to remove a coated-type silicon-containing film obtained by coating a silicon-containing film composition used in a lithography on a substrate, comprising, at least: a first step of treating the silicon-containing film with an acidic stripping solution containing sulphate ion and/or fluoride ion; and a second step of treating the silicon-containing film with an alkaline stripping solution containing a nitrogen compound. There can be provided a process for allowing a silicon-containing film, which has not been conventionally removed unless dry stripping is adopted, to be removed by a stripping process based on a stripping solution (wet stripping).

Abstract: A method of cleaning an automatic biochemical analyzer, wherein the cleaning solution includes: at least one anionic surfactant, at least one nonionic surfactant, an alkali metal hydroxide, an alkali metal citrate, and a buffering agent stabilizing the pH value above 13.0. In some embodiments, the cleaning solution provides low residual rate of proteins, low residual rate of lipids, desirable within-batch repeatability in clinical testing, low level of cross-contamination, and low level of reactant deposit after cleaning, without affecting test results of the biochemical analyzer. In some embodiments, the cleaning solution has no corrosive effects on the liquid path and reaction cup of the analyzer. The ingredients of the cleaning solution may also be biodegradable.

Abstract: Cleaning processes for cleaning semiconductor devices or semiconductor tooling during manufacture thereof generally include contacting the semiconductor devices or semiconductor tooling with an antioxidant to form an insoluble adduct followed by solubilizing the adduct with a basic aqueous cleaning solution.

Abstract: Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.

Abstract: A method for cleaning a substrate is provided. The method initiates with applying an activation solution to a surface of the substrate. The activation solution and the surface of the substrate are contacted with a surface of a solid cleaning surface. The activation solution is absorbed into a portion of the solid cleaning element and then the substrate or the solid cleaning surface is moved relative to each other to clean the surface of the substrate. A method for cleaning the surface of the substrate with a solid cleaning element that experiences plastic deformation is also provided. Corresponding cleaning apparatuses are also provided.

Abstract: The present invention relates to a method for the purification of substrates, characterized in that the purification is carried out by at least one oxidation agent, selected from the group consisting of permanganate and ferrate (VI), and subsequently by a reduction agent. Organic residue, such as legionella or extracellular polymer substances (EPS) can be removed from surfaces of filtration or classification devices and from transport and storage devices utilizing said method. The use of oxidation agents further relates to the oxidation of extracellular polymer substances (EPS).

Abstract: A method of cleaning a food plant of the type which produces an aseptic product or a product with extended shelf life involves at least one circulation with an alkaline detergent solution and at least one circulation with an acidic cleaning solutions. The circulations take place alternatively with the alkaline detergent solution and the acidic cleaning solution. Prior to the first circulation, between each circulation and after the last circulation, rinsings with water take place. Simultaneously with the last circulation with alkaline detergent solution the plant is sterilized, and after the last circulation with the acidic cleaning solution the two last rinsings with water take place with sterile liquid.

Abstract: A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.