Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: A conveyance apparatus that is advantageous in terms of productivity is provided. The conveyance apparatus includes a holding unit configured to hold and convey a substrate, and an outlet unit which is disposed in the holding unit and includes a first outlet port configured to blow a gas in a first direction, which is a direction oblique to a first surface of the substrate held by the holding unit, toward the first surface.

Abstract: The present invention relates to a cleaner. In one aspect, the cleaner includes a nozzle assembly; a cleaner body connected to the nozzle assembly; and a water tank to which a cloth is attached, wherein the water tank is coupled to the nozzle assembly and is configured to supply water to the cloth. The water tank comprises: a water storage unit to store water and having a water inlet; a water flow adjuster configured to close or open the water inlet and to adjust a water flow amount from the water storage unit to the cloth when closing the water inlet; and a stopper formed on the water storage unit to limit a rotation of the water flow adjuster, wherein the water flow adjuster has a receiving groove to receive the stopper therein, wherein the receiving groove includes a delimitation portion to limit a rotation of the water flow adjuster in a first direction and having a tilted surface to allow the stopper to be exited out of the receiving groove.

Abstract: A substrate separation system configured to remove a substrate from a carrier is provided. The substrate separation system includes a stage, an upper fixing portion, a suction portion, a cutting portion and a blowing portion. The stage is configured to carry the carrier. The upper fixing portion is disposed above the stage so as to be movable up and down. The suction portion is disposed above the stage so as to be movable up and down, and has a hollow portion to accommodate the upper fixing portion. The cutting portion is disposed on one side of the stage. The blowing portion is disposed on another side of the stage, and is configured to provide a blowing force to a position between the substrate and the carrier.

Abstract: A camera module for a motor vehicle having a camera unit with a camera and a lens, wherein the camera unit is arranged in a housing, and wherein the camera unit is designed to be movable between a passive position, in which the camera unit is arranged at least partially in the housing, and an active position, in which the camera unit serves to visually detect an outer area of a motor vehicle, and with a drive unit which is coupled to the camera unit and is designed to move the camera unit between the passive position and the active position, and with a cleaning device for cleaning the lens of the camera unit with a jet of fluid, wherein the camera module has a deflection element for deflecting the jet of fluid onto the lens.

Abstract: A cleaning system including a motor, an impeller driven by the motor, a battery receptacle, and a motor controller. The battery receptacle is configured to receive a battery pack. The battery pack includes one or more battery cells and a battery controller. The motor controller is configured to receive from the battery controller one of a first type of data and a second type of data, and operate the motor at a defined speed, the defined speed being a first speed upon receiving the first type of data, and a second speed upon receiving the second type of data.

Abstract: A cleaning apparatus for an in-vehicle optical sensor includes a cleaning liquid nozzle and an air nozzle. The cleaning liquid nozzle jets out a cleaning liquid toward a lens surface of a lens of the in-vehicle optical sensor or a translucent surface of a translucent cover covering the lens surface when the translucent cover exists. The air nozzle jets out air toward a used cleaning liquid, which was jetted out from the cleaning liquid nozzle and cleaned the lens surface or the translucent surface, to prevent the used cleaning liquid from dropping from the lens surface or the translucent surface on a predetermined position by blowing away the used cleaning liquid.

Abstract: An image heating apparatus includes: first and second rotatable members configured to form a nip for heating a toner image on a recording material; rotatable rubbing member configured to rub the first rotatable member to substantially refresh a surface property of the first rotatable member; an air blowing mechanism, provided with a plurality of openings, configured to blow air toward different positions of the rotatable rubbing member with respect to an axial direction of the rotatable rubbing member; and a moving mechanism configured to reciprocate the air blowing mechanism with respect to the axial direction.

Abstract: An image heating apparatus includes: first and second rotatable members configured to form a nip for heating a toner image on a recording material; a rotatable rubbing member configured to rub the first rotatable member to substantially refresh a surface property of the first rotatable member; and a pipe member provided with an opening, formed at a peripheral surface thereof, for permitting air blowing toward the rotatable rubbing member, wherein said pipe member has an end portion hermetically sealed by collapse.

Abstract: In a processing of immersing substrates in a chemical solution, and agitating the chemical solution by as bubbles or liquid, the gas bubbles or liquid is supplied so as to bring about alternate occurrence of a first state and a second state. The first state is a state in which an amount of the gas bubbles or the liquid supplied to first side in one direction of each substrate is greater than an amount of the gas bubbles or the liquid supplied to a second side in the one direction of the substrate. The second state is a state in which the amount of the gas bubbles or the liquid supplied to the first side in the one direction of the substrate is smaller than the amount of the gas bubbles or the liquid supplied to the second side in the one direction of the substrate.

Abstract: Apparatus for drifting away loose items from an area, has a container with an outlet port and is rotatably supported on a base member. A top member is fixedly connected to the base member above the container. The top member has a fan that is adapted to draw air from the exterior through an inlet port and discharge the air into the interior of the container to exit from the outlet port. A motor is secured to the top member, the motor being adapted to engage with and rotate the container relative to the base member and the top member, such that the air exiting from the outlet port is driven in a circular direction.

Abstract: A process for quickly removing hydrocarbon contaminants and noxious gases in a safe and effective manner from catalytic reactors, other media packed process vessels and associated equipment in the vapor phase without using steam. The cleaning agent contains one or more solvents, such as terpenes or other organic solvents. The cleaning agent is injected into contaminated equipment, along with a carrier gas, in the form of a cleaning vapor.

Abstract: The present invention discloses a cleaning process, utilizing a gas flow to an interior of a hollow object in a fluid ambient. After capping the object to seal off the interior volume, gas is introduced to the object interior. The pressure is built up within the object interior, loosening the seal. The gas pressure is released, and the seal returns. The vibration caused by the cycling of gas pressure can be used to perform cleaning of particles adhering to the object. The cleaning process can be used in a combinatorial processing system, enabling in-situ cleaning of process reactor assemblies.

Abstract: The invention provides a method and apparatus for removing a blockage from a fluid conduit. An apparatus comprises a first portion containing a fluid volume separated from the fluid conduit via a controllable valve. The valve is cyclically opened and closed such that a pressure differential between the first portion and the fluid conduit causes a series of pressure pulses in the fluid conduit. The pressure differential is regulated to control the amplitude of the pressure pulses of the series.

Abstract: A manufacturing apparatus includes a chuck for contacting a peripheral portion of a workpiece. The apparatus includes a nozzle to eject a process fluid (liquid or gas) toward a first surface while the workpiece is in contact with the chuck. The apparatus also includes a plate having an opening configured such that a support fluid (liquid or gas) can be ejected toward a second surface of the workpiece while the workpiece is in contact with the chuck. In an example, the support fluid can be used to counteract a displacement of the interior portion in the direction perpendicular to the plane of the workpiece due to, for example, gravity and/or hydrostatic pressure of the process fluid.

Abstract: The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.

Abstract: A method for operating an electronic device manufacturing system is provided, including: introducing an inert gas into a process tool vacuum pump at a first flow rate while the process tool is operating in a process mode; and introducing the inert gas into the process tool vacuum pump at a second flow rate while the process tool is operating in a clean mode. Numerous other embodiments are provided.

Abstract: Disclosed is a dry-cleaning method for removing a metal film adhered to a film-formation apparatus by using ?-diketone, the dry-cleaning method being characterized by that a gas containing ?-diketone and NOx (representing at least one of NO and N2O) is used as a cleaning gas and that the metal film within a temperature range of 200° C. to 400° C. is reacted with the cleaning gas, thereby removing the metal film. According to this method, it is possible to make etching progress even if there occurs a temperature difference depending on the position of the adhered metal film.

Abstract: A combination of a disc-type yarn tensioner is proposed, comprising a pneumatic cleaning device, which is fixedly assigned thereto. The disc-type yarn tensioner comprises an axle on which two brake plates are rotatably mounted by means of one rotary bearing each. It further comprises a pressure mechanism for applying axial pressure forces to the brake plates, which pressure forces press the brake plates against each other. The pneumatic cleaning device comprises at least one nozzle whose flow axis is directed from the outside substantially towards one of the rotary bearings. The compressed air flow exiting from the nozzle cleans the disc-type yarn tensioner. It is thus ensured that the rotary bearings of the brake plates accumulate less dirt and the rotary movement of the brake plates is braked with the intended braking force.

Abstract: A gas bearing seal using porous materials for distribution of gas flow can provide site isolation during wet processing. In some embodiments, a flow cell comprises a porous media gas bearing surrounding a periphery of the flow cell, isolating the liquid inside the flow cell from the ambient air outside the flow cell. In some embodiments, a protective chuck comprises a porous media gas bearing disposed in a middle of the protective chuck, isolating the liquid outside the protective chuck with the gaseous ambient generated by the porous media gas bearing.

Abstract: The molecular etcher carbonyl fluoride (COF2) or any of its variants, are provided for, according to the present invention, to increase the efficiency of etching and/or cleaning and/or removal of materials such as the unwanted film and/or deposits on the chamber walls and other components in a process chamber or substrate (collectively referred to herein as “materials”). The methods of the present invention involve igniting and sustaining a plasma, whether it is a remote or in-situ plasma, by stepwise addition of additives, such as but not limited to, a saturated, unsaturated or partially unsaturated perfluorocarbon compound (PFC) having the general formula (CyFz) and/or an oxide of carbon (COx) to a nitrogen trifluoride (NF3) plasma into a chemical deposition chamber (CVD) chamber, thereby generating COF2. The NF3 may be excited in a plasma inside the CVD chamber or in a remote plasma region upstream from the CVD chamber.

Abstract: Interior parts of gasoline engines are readily cleaned by a method comprising the steps of connecting an a cleaning liquid supply pipe having a gas supply port thereon airtightly to a port of an intake pipe of the engine below a throttle valve-attached position of the engine; operating the engine to draw cleaning liquid in the form of liquid drop and simultaneously drawing continuously a gas having an oxygen concentration of less than 20 vol. % into the intake pipe; and exhausting the cleaning liquid having been brought into contact with the internal parts of the engine with an exhaust gas.

Abstract: A gas wiping apparatus includes a pair of wiping nozzles which are disposed so as to face each other and interpose a coated steel sheet therebetween in a thickness direction of the coated steel sheet, and each of which ejects a wiping gas along a width direction of the coated steel sheet; a gas shield plate that is disposed at a position which separates toward an outside from each end portion of the coated steel sheet so that the gas shield plate is interposed between the pair of wiping nozzles; and a side nozzle that ejects a gas to form a gas flow along each surface of the gas shield plate in a direction reverse to a direction in which the coated steel sheet is pulled upward.

Abstract: Pulse valves and methods of using pulse valves are provided. The pulse valves include a dampening mechanism to decrease mechanical stresses, decrease operating noise, decrease compressed air waste and increase operational life expectancy. Such dampening mechanism is arranged within an internal area of the pulse valve housing. Additionally, fluid within the internal area of the pulse valve provides cushioning effects during operation of the pulse valve.

Abstract: A relatively quiet pulse valve and a method of using the pulse valve are provided. The pulse valve includes a dampening mechanism to decrease mechanical stresses, decrease operating noise, decrease compressed air waste and increase operational life expectancy of the valve. Such dampening mechanism is arranged within an internal area of the pulse valve housing.

Abstract: A method for in-line cleaning of ultrasonic welding tools is described. The method includes applying cleaning solution onto a work surface of a welding tool to be cleaned using an application device. Then the method involves removing residue dissolved in the cleaning solution from the work surface using a cleaning device. Next, the work surface is neutralized and rinsed using purified water and polished with a cleaning cloth. Finally, the work surface is rinsed using cleaning alcohol and blow-dried with compressed air.

Abstract: Internal cleaning of inverted cans includes engaging a can's cylindrical wall with a wall-conforming vacuum or adhesive gripper, causing a spraying unit to travel axially in and out of the can's opening while the can is inverted on a circular conveyor, and using a supporting arm or bottom stop to subject the can to a counterforce against a flushing force from sprayed cleaning medium. This prevents the can from being pressed out of a receptacle in which it sits during cleaning.

Abstract: A method of cleaning a carbon work piece includes the step of applying an acetone cleaning agent to the carbon work piece to remove debris therefrom. The removal of debris promotes adhesion between the carbon work piece and a subsequently applied coating. For example, other steps may precede the acetone cleaning step, such as submersing the carbon work piece in deionized water. In one example, a subsequent coating process deposits an alumina coating on the carbon work piece.

Abstract: A machine for cleaning a head-disk assembly (HDA) of a hard disk drive (HDD) includes a nest that seals the HDA between an upper and lower portion during cleaning. An inlet port receives a gas and an exhaust port exhausts the gas and entrained particles. A shock drive delivers mechanical shocks to the nest and the HDA while the gas is flowing through the HDA. A blower may circulate the gas from the exhaust port to the inlet port. A filter may be coupled to the inlet port. The HDA nest may be movable along an axis of the mechanical shocks delivered by the shock drive. A blow tube may deliver gas to a screw hole and a coaxial vacuum tube may rest against a surface around the screw hole to encapsulate the blow tube during cleaning and remove the gas and particles from the screw hole.

Abstract: The invention relates to a method and to a device for treating containers relating especially to cleaning plastic bottles (1) preferably in the inverted position. Each container is thereby subjected to a treatment medium (16) applied and/or introduced thereto. Electrically charged ions introduced into the treatment medium (16) serve to balance the charge of each container. According to the invention, the treatment medium (16) is tested for the presence of ions.

Abstract: A method for using a heat processing apparatus of a batch type includes performing a preparatory process for removing aluminum present as a metal impurity from a quartz inner surface of a process container, and performing a main heat process on product substrates held on a holder member in the process container after the preparatory process. The preparatory process includes placing a plurality of dummy substrates for allowing the metal impurity to be deposited thereon inside a process container with no product substrates placed therein; then, supplying a chlorine-containing gas and water vapor into the process container and heating the quartz inner surface of the process container at a process temperature, thereby applying a baking process onto the quartz inner surface to discharge the metal impurity from the quartz inner surface and deposit the metal impurity onto the dummy substrates; and then, unloading the dummy substrates with the metal impurity deposited thereon from the reaction container.

Abstract: A cleaning mechanism includes: an airflow control chamber for receiving exhaust air from a cooling fan; a cleaning outlet for outputting the exhaust air to be used for cleaning; a flexible pipe having one end in communication with the cleaning outlet and one free end directable by a user for cleaning; and an activation component for activating a cleaning operation in which the exhaust air is directed through the flexible pipe. The activation component may include a switching mechanism for switching the direction of airflow in the airflow control chamber between the cleaning outlet and an exit out of the computer. The cleaning mechanism may include an airflow accelerator for increasing the airflow to the cleaning outlet.

Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.

Abstract: Provided is a thin film deposition device including a deposition-preventing unit and a method of removing deposits thereof. The method includes: separating a deposition-preventing unit including at least one deposition-preventing plate and a deformation unit coupled to an outer surface of the at feast one deposition-preventing plate from a chamber of the thin film deposition device; and removing a film formation layer from the deposition-preventing plate.

Abstract: Disclosed are various embodiments for purging various hearing aid devices. An enclosure may be used to encapsulate and/or affix a hearing aid device to the enclosure. Content from a purging source may be flushed throughout the enclosure to rid the enclosure and/or the hearing aid device of any debris. Similarly, modifications of hearing aid devices may facilitate the purging of various hearing aid devices by flushing content through the hearing aid device via one or more portals.

Abstract: A cleaning liquid is pressurized and superheated to a condition, in which temperature of the cleaning liquid is above an atmospheric boiling point. A product to be cleaned is interposed between a pair of liquid holding blocks, so that gaps are respectively formed between side surfaces of the product and the liquid holding blocks. The pressurized and superheated liquid is injected to the product so that layers of condensate of vapor of injected cleaning liquid are formed in the gaps. Contamination on the surface of the product is removed by the cleaning liquid and the surface is dried by latent heat of the condensate of the vapor of the cleaning liquid.

Abstract: A baler for baling a fibrous material includes a cleaning system for removing debris from the baler in a plurality of locations, the cleaning system including an air blower and a conduit system including an inlet and a plurality of outlets for delivering air from the blower to the plurality of locations. An air flow control mechanism is provided for controlling delivery of air from the inlet to the plurality of outlets, the air flow control mechanism being configured to deliver the air alternately to one or more of the outlets.

Abstract: A method for using a vacuum apparatus that includes a vacuum chamber and a pump, the vacuum chamber housing an object, the pump reducing an internal pressure of the vacuum chamber, the method including: ventilating inside the vacuum chamber by introducing a gas into the vacuum chamber and discharging the gas from the vacuum chamber by causing the pump to reduce the internal pressure of the vacuum chamber. In the ventilating, a discharge rate at which molecules of the gas per unit volume are discharged is at least 3.3×10?5 mol/(s·L), and the temperature in the vacuum chamber is at least 15° C. and at most 80° C.

Abstract: A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with hydrogen peroxide vapor. The hydrogen peroxide vapor is irradiated with electromagnetic radiation having a wavelength in the range of 100 nm to 350 nm forming hydroxyl radicals. The hydroxyl radicals react with the residue to remove the residue from the surface of the substrate.

Abstract: A method of cleaning a photolithographic mask or semiconductor wafer involves mixing a gas and water in a jetspray nozzle and discharging the gas and water jetspray stream from a nozzle onto the photolithographic mask or wafer. The water jetspray stream is made up of a cluster of micro water droplets entrained in the gas having a predetermined size sufficient to dislodge contaminant particles adhered to the surface of the mask. The step of mixing the gas and water includes radially injecting the gas from a first plurality of circumferentially spaced apart gas nozzles into a stream of the water and radially injecting the gas from a second plurality of circumferentially spaced apart gas nozzles into the stream of the water, wherein the second plurality of gas nozzles are spaced above or below the first plurality of gas nozzles and radially offset from the first plurality of gas nozzles.

Abstract: The invention pertains to a method for removing ice layers and/or snow layers and/or dirt layers from the rotor blades of axial fans in cooling installations for refrigerating and/or freezing products. At least one cleaning substance jet is directed toward the rotor blades of an axial fan within certain time intervals in such a way that ice layers and/or snow layers and/or dirt layers are at least separated from the surfaces of the rotor blades and transported away, wherein the rotor blades rotate with nominal speed while cleaning jets act upon their surfaces.

Abstract: A heat exchanger may be cleaned by introducing compressed nitrogen and a flushing composition through an injection device.

Abstract: A process is described to perform lift-off of a metal layer. A spray is applied to a patterned surface coated with the metal layer. An incidence angle and pressure of the spray are sufficient to separate the metal layer from a substance coated with the metal without separating the substance from an underlying substrate.

Abstract: There is provided a substrate processing method capable of preventing pattern collapse when a rinse solution is removed from a substrate on which a microscopic resist pattern is formed and also capable of reducing cost for processing the substrate by decreasing an amount of usage of a hydrophobicizing agent. The substrate processing method includes a rinse solution supply process (step S12) for supplying the rinse solution onto the substrate on which the resist pattern is formed; and a rinse solution removing process (steps S14 to S16) for removing the rinse solution from the substrate in an atmosphere including vapor of a first processing solution that hydrophobicizes the resist pattern.

Abstract: The present invention generally provides a processing chamber having shadow frame supports that direct cleaning gas flow to the corners of the chamber. The shadow frame supports are disposed along part of the chamber walls, thus leaving the corners unoccupied. During cleaning, the shadow frame is disposed in a way that it rests on both the substrate support and the shadow frame supports. Therefore, the cleaning gas flowing along the chamber walls is blocked by the shadow frame supports and the cleaning gas is forced to the corners since the shadow frame supports do not extend to the corners.

Abstract: A cleaning apparatus is provided that includes a first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the surface. At least one second nozzle is configured to direct a rinsing jet towards the contaminated surface to remove cleaning fluid therefrom, wherein the rinsing jet is directed at a pressure sufficient to isolate the cleaning jet from an ambient environment.

Abstract: An apparatus and process for isomerizing a hydrocarbon stream rich in a C4 hydrocarbon and/or at least one of a C5 and C6 hydrocarbon which includes a first drier and a second drier; and a reaction zone communicating with at least the first drier. The first drier operates at a first condition to dry the reactant and the second drier operates at a second condition during regeneration. The used regenerant remaining in the second drier after regeneration can (1) pass through a vent-to-flare assembly in a batch-wise manner; (2) pass through a downflow-depressure-to-low-pressure-device assembly in a batch-wise manner; (3) pass through a cross-over piping purge assembly to minimize upsets in the reaction and fractionation zones when the second drier is placed back in operation; or any combination of (1) (2) and/or (3) to minimize upsets in the reaction and fractionation zones when the second drier is placed back in operation.

Abstract: The present invention is in the field of household cleaning tools. The invention further relates to the use of an air-water jet for the cleaning of hardsurfaces. It is an object of the present invention to provide easier cleaning of hard surfaces. It is therefore an object of the present invention to provide a process of easier cleaning of hard surfaces, especially by means of a device that uses a relatively low water flow rate. Surprisingly it has been found that an external mix air-water jet device may be used for cleaning hard surfaces.

Abstract: Steam cleaning spray nozzle systems and methods of use are described herein. The spray nozzle includes a substantially rigid conduit a support member in fluid communication with a steam source. A portion of the conduit is angled. During use, sufficient eccentric force is produced by the steam to rotate the support member such that steam is ejected from the substantially rigid conduit at an oblique angle relative to the center to of the substantially rigid conduit.

Abstract: A method for treating a semiconductor device includes dissolving an inert gas species in a wet chemical cleaning solution and treating a material layer of a semiconductor device with the wet chemical cleaning solution in ambient atmosphere. The inert gas species is oversaturated in the wet chemical cleaning solution in the ambient atmosphere.