Abstract: A system for conveying dishware through a cleaning cycle. The system includes a conveyance assembly having a receiving surface to receive and retain dishware. The conveyance assembly rotates the receiving surfaces about an axis to convey the dishware to each of at least two unique locations. A corresponding system and method are also disclosed and claimed herein.

Abstract: A drying apparatus of the present invention includes a drying tank for performing drying processing of a workpiece, a fixture for the workpiece, heating means opposed to a front surface of the workpiece, and heating means opposed to a back surface of the workpiece, wherein each heating means is inclined from a horizontal line in its longitudinal direction.

Abstract: The present invention provides a method, apparatus, and system for efficient, high throughput, consistent cleaning of soil from the root system of a plant. In one embodiment, the method generally comprises positioning a plant adjacent a sprayer assembly having at least one nozzle angled so as to impact the root system at a predetermined position, providing a stream of water from a reservoir through the nozzle of the sprayer assembly, and rotating at least one of the root system and the nozzle relative to the other to remove the soil from the root system. The present invention further describes a recycling system adapted to recycle water expended during the cleaning process to minimize losses and to capture and return dislodged soil to the field from which the plant is extracted.

Abstract: The present invention provides an ultraviolet light based cleansing method and cleansing device. The method includes: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to be cleansed within an irradiation time period to be less than electron excitation energy that breaks down TFT component patterns; (2) cleansing the substrate to be cleansed with an alkaline solution; (3) cleansing the substrate to be cleansed with water/gas dual-fluid; (4) cleansing the substrate to be cleansed with deionized water; (5) drying the substrate to be cleansed with an air knife; and (6) subjecting the substrate to be cleansed to dehydration and drying to complete the cleansing operation, thereby improving product yield rate and cleanness.

Abstract: A household appliance, particularly a household dishwasher, washing machine, clothes dryer, or the like, includes an air drying device and/or fluid heating device, connected to an electrical energy supply network. At least one control/monitoring unit is provided to detect any deviation of an actual value of at least one characteristic of the electrical energy supply network from a target value and to generate at least one control signal for setting an electrical component of the member in response to a detected deviation of the actual value.

Abstract: A laser cleaning device, and a laser cleaning method using the same, for removing an electrolyte solution stuck to an electrolyte tab during a process of injecting the electrolyte solution are disclosed. The laser cleaning device for an electrode tab of a battery includes: a cleaning housing, in which a battery case for receiving an electrode group, an electrolyte solution and an electrode tab exposed to the outside are embedded; a laser generator which includes a laser source for generating a laser beam and an output controller for controlling output of the laser beam; a laser transmitter which transmits the laser beam generated by the laser generator; and a laser emitting unit which is installed inside the cleaning housing, and which irradiates the laser beam transmitted by the laser transmitter onto the electrode tab so as to remove liquid pollutants stuck to the electrode tab. The laser cleaning method comprises steps generally corresponding to the latter functions of the laser cleaning device.

Abstract: An in-line parts washing system comprising concatenated modules of two discrete lengths where certain of the modules have a self-contained tank of parts cleaning chemical along with a motor-driven pump for forcing the cleaning chemical through spray heads enclosed in a shroud through which the parts to be cleaned are transported via a conveyor. Other modules disposed in-line with the wash modules provide zones where the cleaning chemical dripping from the parts is collected and redirected back into the tanks from which it originated. The ability to swap modules of differing length allows a user to easily alter the cleaning process.

Abstract: Disclosed is a method and a respective apparatus for ultrasonic wet treatment of a plate-like article, which comprises: bringing a solid element, which is connected to a transducer in close proximity to a surface of a plate-like article so that a gap is formed between the solid element and the plate-like article, the gap having a distance d2 between 0.1 mm and 5 mm, dispensing liquid for filling the gap between the solid element and the plate-like article, and detecting ultrasonic waves and/or controlling the distance d2, by measuring the distance d2, comparing the measured distance with a desired distance d0 and adjusting the distance accordingly.

Abstract: A multi-chamber heat treatment device (S1) includes a plurality of treatment chambers having a heat treatment chamber, the device including: a cooling chamber (3) serving as the heat treatment chamber configured to cool a treatment target by latent heat of liquid particles; treatment chambers (1, 2) different from the cooling chamber (3); and drying devices (11, 19) configured to dry the cooling chamber (3).

Abstract: A vertical dish washing machine is disclosed to include a dish basket for carrying dishes for washing and a vertical loop conveyer system including a first transmission mechanism adapted to carry the dish basket vertically front a front top location to a front bottom location, a second transmission mechanism adapted to carry the dish basket horizontally from the front bottom location to a rear bottom location, a third transmission mechanism adapted to carry the dish basket vertically from the rear bottom location to a rear top location, and a fourth transmission mechanism adapted to carry the dish basket from the rear top location to the front top location.

Abstract: An apparatus (1) to process used materials for input into a manufacturing process. The apparatus includes a housing (10) having a top surface (15) and providing a plurality of chambers arranged in descending order. A series of locations (20) are positioned under said top surface and through which used materials are to pass. Each said location being provided for receipt of a predetermined used material. A descending path (25) extends from each said location and provides for the transfer of used material from the respective location successively through the chambers. The chambers include a sensing chamber (30) downstream of said locations and having sensing means (35) operable to sense the composition of used material located within said sensing chamber. The sensing means being operable to activate an alarm if the used material has been placed by a user in an opening for receipt of a different material.

Abstract: A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

Abstract: A portable machine and process is described for covering all sides of an elongated object with a liquid without the use of brushes. The machine is particularly useful with manufactured building products such as a fence picket, trim, molding, or any other type of board. The machine generally has four stations, an entry station that drives the object down a track, a liquid application station where the object is covered by liquid that is poured over the object, a blower station where the fluid is spread evenly over the object and excess fluid is blown off, and an exit station that continues to pull the object down the track and directs the object as the object leaves the exit station. Finally, the object may enter a releasably attached drop track.

Abstract: In one embodiment, a method for cleaning a substrate in a cleaning module is disclosed. The method includes an operation that receives the substrate into a first level of the cleaning module. In another operation, the substrate is spun while contemporaneously applying a cleaning fluid to top and bottom surfaces of the substrate. In yet another operation, the substrate is spun at a second level of the cleaning module. The method also includes an operation to dry the substrate in an enclosed cavity at a third level of the cleaning module.

Abstract: A substrate having a liquid film formed by pre-processing unit is transported by a substrate transport robot from the pre-processing unit to a freeze processing unit disposed away from the pre-processing unit. In the freeze-processing unit, the liquid film is frozen. This causes the adhesion power of contaminants adhering to the surface of the substrate reduce, and therefore the contaminants is detached from the surface of the substrate. Subsequently, the substrate which was subjected to the freezing process, is transported from the freeze processing unit to a post-processing unit which is disposed away from the pre-processing unit and the freeze processing. In the post-processing unit, a cleaning liquid is supplied to the frozen film on the rotating substrate, thereby easily removing the contaminants adhering to the substrate together with the frozen film.

Abstract: An imprint lithography apparatus including a service station.

Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

Abstract: The invention relates to an apparatus (1) for washing and drying leaf products and more generically vegetables, comprising a frame (2), a centrifugation basket (3), a container (tank) (4) within which said centrifugation basket (3) is provided, a basin (6), communicating with said container (4) for inlet and discharge of washing water, said centrifugation basket (3) being pivoted on said frame (2) so as to rotate of about 180° from a working position to a discharge position, and vice versa, and means (7) for collection and removal of washed and dried product, said means being provided raised with respect to said centrifugation basket (3), in a position corresponding to the discharge position of the same centrifugation basket (3), being further provided driving means for said centrifugation basket permitting driving said basket (3) at at least two rotation speeds, respectively a washing speed and a drying speed.

Abstract: A device as well as method for removing the overcoat without developing an imagewise exposed lithographic printing plate is disclosed. The device comprises a structure for providing water or an aqueous solution and a transfer means for transporting said plate through said structure. The plate comprises a substrate, an ink and/or fountain solution developable photosensitive layer, and an overcoat. The exposed plate is transported through the structure to remove the overcoat by contacting with said water or aqueous solution, preferably under a brushing or rubbing action. The overcoat removal device is preferably connected to a laser imager so that the plate can be imaged on the laser imager and then directly transferred to the overcoat removal device to remove the overcoat. The overcoat-removed plate is further mounted on press to develop with ink and/or fountain solution to remove the non-hardened areas of the photosensitive layer.

Abstract: Contaminants from surfaces of temperature sensitive substrates, such as glass substrates are removed by exposing the surfaces to a hydrogen Surface-mixed diffusion flame for a predetermined duration of time. The predetermined duration of time being insufficient to heat up the surfaces substantially thereby causing damage to the temperature sensitive substrates.

Abstract: Embodiments of the present invention improve the efficiency of a cleaning process for cleaning a component part of a magnetic disk drive in a magnetic disk drive manufacturing line. According to one embodiment, a magnetic disk part cleaning apparatus is included in a head stack assembly (HSA) cleaning line for cleaning head stack assemblies of magnetic disk drives included in a magnetic disk drive manufacturing line. The magnetic disk part cleaning apparatus is disposed between a HSA assembly line for assembling a head stack assembly, and head disk assembly (HDA) assembly line for assembling a head disk assembly including the head stack assembly and is connected directly to at least either of the HSA assembly line and the HDA assembly line.

Abstract: Provided is an apparatus for cleaning a substrate. The substrate cleaning apparatus includes a spin head for supporting the substrate, a first cleaning unit for cleaning the substrate by a polishing process, and a second cleaning unit for cleaning the substrate by injecting a treating solution. Initially, the polishing pad is in contact with the substrate to polish the substrate and then the polishing pad is removed from contact with the substrate so that the treating solution can be supplied to the substrate to clean the substrate.

Abstract: The present invention includes embodiments that generally relate to a parts washer and methods for making and using the same. According to some embodiments a parts washer can include a plurality of cleaning stations arranged in series and adapted to automatically wash and transfer parts to the next cleaning station. Furthermore, in some embodiments the parts washer is adapted to minimize contact between a plurality of parts being washed. Some embodiments can include a rotatable cleaning station divided into substations and can include an aperture for transferring a part from the cleaning station to an adjacent cleaning station.

Abstract: [Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark.

Abstract: The invention is directed to a method and an arrangement for cleaning optical surfaces of reflection optics which are arranged in a plasma-based radiation source or exposure device arranged downstream and contaminated by debris particles emitted by a hot plasma of the radiation source. It is the object of the invention to find a novel possibility for in-situ cleaning of the optical surfaces of reflection optics which are contaminated by debris in plasma-based radiation sources so as to allow an integrated generation of known gas radicals and the isotropic distribution thereof on the contaminated optical surfaces. According to the invention, this object is met in that the gas radicals are generated by dielectrically impeded discharge between two surface electrodes along the entire optical surface.

Abstract: Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.

Abstract: A system and method are provided for sanitizing portable devices (14) without introducing waterborne contaminants and pollution into the environment. A sanitizing system (200) loads, washes, irradiates, and treats with an antimicrobial agent, portable devices (14), such as shopping carts, that are likely microbial transmitters, and recovers substantially all used fluid for recycling or environmentally safe disposal. The sanitizing system (200) can be mobile or stationary to one location, and may be fully or partially automated.

Abstract: A substrate processing apparatus that is arranged adjacent to an exposure device includes a processing section including a first processing unit and a second processing unit. The first processing unit includes a development region, a first cleaning region, and a first transport region. The development region and the first cleaning region are arranged opposite to each other with the first transport region interposed therebetween. The second processing unit includes a reversing region, a second cleaning region, and a second transport region. The reversing region and the second cleaning region are arranged opposite to each other with the second transport region interposed therebetween. The second processing unit is arranged between the first processing unit and the exposure device. The substrate processing apparatus also includes a transfer section coupled to the processing section and an interface configured to receive and transfer the substrate between the processing section and the exposure device.

Abstract: The present invention related to a semiconductor wafer cleaning system comprising a preliminary cleaning station for removing particles on a wafer in advance by spraying deionized water thereon; a first cleaning station for cleaning remaining particles firstly by rotating frictionally a pair of brushes disposed to be contacted with a front surface and a back surface of the wafer and by spraying chemicals thereon through a chemical sprayer being provided independently; a first rinsing station for rinsing by spraying a cleaning liquid onto the firstly cleaned wafer at the first cleaning station; a second cleaning station for cleaning particles secondly remained on the front surface and the back surface of the wafer by spraying the chemicals onto the firstly rinsed cleaned wafer at the first rinsing station through a chemical sprayer being provided independently using the same structure and manner as those of the first cleaning station; a second rinsing station for rinsing by spraying the cleaning liquid onto th

Abstract: A method of cleaning a semiconductor device. The method includes: A chemical cleaning using an organic solvent without using deionized water. An iso propyl alcohol cleaning using the iso propyl alcohol. Drying by inserting the semiconductor device into a dryer and then ejecting an inert gas thereto to dry and clean simultaneously. A method may clean a semiconductor device without using deionized water, so that corrosion of the semiconductor device can be substantially prevented by avoiding the use of deionized water, while substantially removing containments from the semiconductor device.

Abstract: A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the treating tank and a transfer position above the treating tank, a transport device for supporting the substrates and transferring the substrates to and from the holding device in the transfer position, a detecting device for detecting a posture variation of the holding device, and a correcting device for correcting a position of the holding device or the transport device. The correcting device performs a correction according to the posture variation of the holding device detected by the detecting device in time of transfer of the substrates between the holding device and the transport device.

Abstract: The present invention is a method, apparatus and process for an improved substrate mounting and processing technique for various substrate treatments comprising cleaning, dicing, sawing, polishing, and planarization, among others.

Abstract: A bracket is provided for mounting an object to a tub of a dishwasher. The bracket is mounted on the annulus edge of the pump opening in the bottom of the tub adjacent the pump seal ring. No other fasteners are used to secure the bracket to the tub. The bracket is mounted on the tub before the pump is installed. In one embodiment a thermostat is pivotally mounted on the bracket so as to maintain substantially flush engagement with the tub. In a second embodiment, a wire harness extends through a loop of the bracket for support adjacent the tub.

Abstract: A method and system for cleaning collector optics in a light source chamber. In producing, for example, extreme ultraviolet light for lithography, debris such as tungsten can accumulate on optical components near a light source in the light source chamber. An etchant, such as a fluorine-containing gas, can be introduced into the light source chamber. The etchant is ionized via electrodes to generate free fluorine. The electrodes can be, for example, existing light source chamber components including the optical components. The fluorine can then react with the debris, forming gaseous compounds, which are pumped out of the light source chamber.

Abstract: A method for removal of post reactive ion etch sidewall polymer rails on a Al/Cu metal line of a semiconductor or microelectronic composite structure comprising: 1) supplying a mixture of an etching gas and an acid neutralizing gas into a vacuum chamber in which said composite structure is supported to form a water soluble material of sidewall polymer rails left behind on the Al/Cu metal line from the RIE process; removing the water soluble material with deionized water; and removing photo-resist from said composite structure by either a water-only plasma process or a chemical down stream etching method; or 2) forming a water-only plasma process to strip the photo-resist layer of a semiconductor or microelectronic composite structure previously subjected to a RIE process; supplying a mixture of an etching gas and an acid neutralizing gas into a vacuum chamber on which said structure is supported to form a water soluble material of saidwall polymer rails left behind on the Al/Cu metal line from the RIE proc

Abstract: A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute particles (for example, micrometer and nanometer sizes) and assure that they will not redeposit.

Abstract: A painting apparatus includes a conveyor having incrementally spaced attachment structures configured to secure objects thereon for painting and being movable to move the attachment structures between consecutive incremental positions in a downstream direction. The distance between consecutive incremental positions is generally equal to an incremental spacing between consecutive attachment structures. A washing station is disposed beneath the conveyor and is operable to clean objects disposed therein. A painting station downstream of the washing station includes a paint reservoir disposed beneath the conveyor and which contains a volume of paint. The reservoir can be raised to dispose the object within the volume of paint and lowered to thereby allow the object to be conveyed downstream from the painting incremental position. A heating station downstream of the paint reservoir applies heat to objects in a heating incremental position.

Abstract: An apparatus for attaching a tube segment to a bag by fusing them together in an aseptic form, fill and seal operation is provided. The apparatus includes a sterile processing chamber in which a sterilized tube segment and a pair of opposing wall portions of a flexible bag are to be located. The sterilized tube segment has an open end which is to be placed in communication with an interior space of the bag. A tube inserter is at least partially located within the processing chamber and arranged to grip the tube segment and place the tube segment between the wall portions of the bag. At least one member is provided for fusing the tube segment between the wall portions of the bag so that the open end of the tube segment is in communication with the interior space in the bag. A bag formed using the apparatus and a method of forming the fused tube-on-bag are also provided.

Abstract: A system for recycling reusable resin mold products recovered from discarded apparatuses is disclosed. This recycling system includes a crushing system for crushing resin mold products one kind by one kind into crushed resinous pieces and packing the same in a bag, a classification system for irradiating a light beam to the resin in the bag and classifying the bags into respective kinds of resins based on a reflected beam therefrom, a cleaning system for separately cleaning the respective kind of crushed resinous pieces taken out of the bag to remove foreign matters adhered onto the surfaces of the crushed resinous pieces therefrom, and a recovery system for recovering the cleaned crushed resinous pieces.

Abstract: A vacuum debris removal system for an integrated circuit manufacturing device is disclosed. The vacuum debris removal system comprises at least one vacuum tube. An opening is formed in the at least one vacuum tube at a selected location to cause air flow away from an element of the integrated circuit manufacturing device.

Abstract: Dirt, particularly of inorganic matter, attached to a substrate, such as a glass substrate for liquid crystal devices, is effectively removed by irradiating the substrate with ultraviolet rays including 184.9 nm and 253.7 nm in an oxygen-containing atmosphere in advance of wet cleaning with pure water. As a result, the wet cleaning time and the amount of pure water can be reduced.

Abstract: A system and methods for substrate preparation are provided. In one example, a wafer processing system includes a system enclosure that contains wafer processing apparatus within an isolated wafer processing environment. The wafer processing apparatus include a pair of immersion tanks in the lower front region of the system with a pair of wafer pickers behind the immersion tanks to extract wafers from the tanks. In the rear of the system, a pair of brush boxes are located in a lower region with a pair of dryer units positioned above the brush boxes. A robot arm is positioned between the pair of immersion tanks and the pair of brush boxes in a middle region of the system, and is configured to transition wafers between the processing apparatus. A pair of output shelves holding output cassettes is positioned over the immersion tanks. The output cassettes receive clean wafers after processing.

Abstract: In a post chemical-mechanical polishing (CMP) procedure for cleaning a workpiece, a cleaning solution is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the workpiece. The cleaning solution is uniformly applied to the workpiece. The volumes of solutions used in the scrubbing process is reduced. A thin oxide layer is etched. A hydrophilic surface state is maintained. The workpiece is then rinsed and dried in a centrifugal processing between upper and lower rotors. A high level clean is achieved while consumption of rinsing and drying fluids is reduced.

Abstract: A method of washing a container,including charging a material to be contained into a container body having a mouth-and-neck portion; mounting a container closure on the mouth-and-neck portion of the container body, the container closure having a top panel wall, a cylindrical skirt wall extending downwardly from a peripheral edge of the top panel wall, and a washing liquid passage formed in at least one of an upper portion of the skirt wall and a peripheral edge portion of the top panel wall; and jetting a washing liquid at the container closure so that the washing liquid passes through the washing liquid passage and enters a space between the mouth-and-neck portion of the container body and the skirt wall of the container closure, thereby washing an outer peripheral surface of the mouth-and-neck portion of the container body and an inner peripheral surface of the skirt wall of the container closure. The washing liquid is at a temperature of 65° C. to 70° C.

Abstract: A method and apparatus is provided for removing material from the edge of a disk. In one embodiment, the edge of the disk is contacted with etchant via an etchant containing swab or trough (which may contain one or more transducers) and is rotated such that successive portions of the disk edge are scanned through the trough or past the swab. To prevent etchant from contacting the major surface of the substrate, and/or to prevent excessive etching, the edge of the disk is contacted with a rinsing fluid (e.g., a rinsing fluid nozzle or a trough filled with rinsing fluid). In a further embodiment material such as residue or particles may be removed via a trough containing sonically energized rinsing fluid.

Abstract: A label removal system for removing a label with a stock portion and an adhesive from a product includes a stripper, an applicator, a remover, and a transportation system. The stripper sprays a first liquid at the label to strip at least a portion of the stock portion of the label off of the product. The applicator applies a chemical substance on at least a portion of the adhesive and any remaining portion of the label on the product. The remover removes at least a portion of the adhesive and any remaining portion of the label on the product. The transportation system moves the product sequentially from the stripper to the applicator and then to the remover. A method for removing a label with a stock portion and an adhesive from a product includes a number of steps. First, at least a portion of the stock portion of the label off is stripped off of the product by spraying a first liquid at the label.

Abstract: The present invention provides an improved finishing process and apparatus. In one embodiment, a method and apparatus are provided for finishing a metal article. The method includes cavitationally eroding the metal article to form pits in its external surface. The metal article is also corroded with a corrosion chemical to corrode the pitted metallic surface. In this manner, substantially homogeneously distributed micro-pits can be formed about the article to create a desired matte finish, as well as a surface that is amenable for sealing. In a preferred embodiment, the corrosion chemical is part of a finishing bath that is ultrasonically cavitated for eroding the metal article.

Abstract: Disclosed is a process of recycling and reusing an aqueous degreasing solution for further use as a component of a coolant solution which is itself recycled and reused in metal cutting machines. Also disclosed is a method of degreasing parts, and a degreasing apparatus which is controlled such that an appropriate amount of the aqueous degreasing solution is introduced into the coolant solution. Finally, disclosed herein is a method and system for preparing a coolant in which an aqueous degreasing solution is further utilized as a feeder solution for a coolant solution, with the resulting solution being able to be separated into its component parts and reused in the cutting and cleaning of metals to form metal parts.

Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

Abstract: Disclosed is a process of recycling and reusing an aqueous degreasing solution for further use as a component of a coolant solution which is itself recycled and reused in metal cutting machines. Also disclosed is a method of degreasing parts, and a degreasing apparatus which is controlled such that an appropriate amount of the aqueous degreasing solution is introduced into the coolant solution. Finally, disclosed herein is a method and system for preparing a coolant in which an aqueous degreasing solution is further utilized as a feeder solution for a coolant solution, with the resulting solution being able to be separated into its component parts and reused in the cutting and cleaning of metals to form metal parts.