Abstract: In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

Abstract: A Hi Flow Air Fan Filter Cleaner Machine comprising of a retainer nut 1 that will lock the used air filter 2 to the air flow tube 3 which communicates with the high pressure air flow tube 4 attached to the hi flow fan 7 also a switch 8 to turn on and off the machine a vibrator 6 and a base 5 that supports this machine.

Abstract: An apparatus and method useful for removing potential wafer-contaminating particles from semiconductor wafer pods. The apparatus includes a rotatable air sprinkler which is mounted in a housing and connected to a source of clean, dry air (CDA) . The air sprinkler rotates as the air is distributed under pressure through the sprinkler and ejected from nozzles in the sprinkler. The ejected air impinges against a semiconductor wafer pod placed on the housing, above the air sprinkler to dislodge or remove particulate contaminants from the pod and prevent or at least significantly reduce the likelihood of particle contamination during transport of the pod and/or processing of the wafers in the pod.

Abstract: A vacuum debris removal system and method for an integrated circuit manufacturing device is disclosed. The vacuum debris removal system comprises at least one vacuum tube. An opening is formed in the at least one vacuum tube at a selected location to cause air flow away from an element of the integrated circuit manufacturing device.

Abstract: A dry cleaning device, wherein a pad is moved towards a surface of a wafer, cleaning gas is injected into a space formed between the pad and the wafer to generate a high-speed gas flow along the surface of the wafer whereby particles left on the surface of the wafer are removed with the high-speed gas flow. In addition, in order to assist this physical cleaning action, either a chemical or an electrical cleaning method such as a plasma additionally may be used.

Abstract: A cleaning apparatus for cleaning solder paste off the bottom side of a printed circuit board stencil includes a container of cleaning solution therein and a blade holder that is movable between a wiping position and the container of cleaning solution. A wiping blade is mounted in the blade holder. The blade holder, with the blade mounted thereon, is reciprocated back and forth when in communication with a stencil to be cleaned. The blade is moved from the wiping position in communication with the stencil into the cleaning solution in the container. A pneumatic piston and rotary actuator provides controlled movement of the wiping blade. The wiping blade may be vibrated during wiping to improve removal of solder paste from the stencil and the cleaning solution may be ultrasonically vibrated to improve removal of solder paste from the wiping blade. The wiping blade may also be pulsed into a sponge to remove excess cleaning solution prior to the next cleaning cycle.

Abstract: A particle capture system includes a container sized to receive a structural disc drive component. A fixture is able to maintain the disc drive component within a spray zone in the container, and a first nozzle in the container is connected to a fluid source and is oriented to direct fluid at the spray zone. A particle trap is connected to a fluid outlet of the container and is able to trap particles from fluid exiting the container through the fluid outlet.

Abstract: In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

Abstract: A system and process for removing unwanted fibers from a forming fabric during a wet papermaking process is disclosed. The system includes a scarfing shower configured to emit a cleaning fluid that contacts the forming fabric. In particular, the cleaning fluid tangentially contacts the forming fabric while the forming fabric is being guided around a turning roll. Preferably, the cleaning fluid is emitted in a direction that is opposite to the direction at which the forming fabric is moving.

Abstract: An apparatus is disclosed for drying wafer substrates in a process tank having an object supporting member for supporting one or more wafer substrates, the object supporting member having apertures through which “vacuum force” can be applied to essentially remove trace amounts of liquid from object contact points formed by the support of the wafer substrate by the object supporting member. Also disclosed is a method of implementing the disclosed apparatus comprising transferring a wafer substrate from an object transporting member to the object supporting member, providing an aperture at or near each contact point, and applying a “vacuum force” through the apertures to remove any trace amounts of liquid. Also disclosed and claimed are wafer substrates resulting from application of the disclosed drying process and apparatus.

Abstract: For depositing fluid dots in an array, e.g., for microscopic analysis, a deposit device, e.g. a pin, cooperating with a fluid source defines a precisely sized drop of fluid of small diameter on a drop carrying surface. Transport mechanism positions the device precisely over the receiving surface and drive mechanism moves the deposit device toward and away from the surface. By repeated action, minute drops of fluid can be deposited precisely in a dense array, preferably under computer control. A mobile-fluid storage device resupplies the deposit device along the array, e.g. in the immediate vicinity of the deposit locations. Mobile annular storage rings are lowered and raised to obtain a supply of fluid, or a mobile multiwell plate is used. Cleaning mechanism is shown, in particular a jet arrangement that directs a jet from a pin or tool axis portal to deeper into the confinement chamber, to scrub along a pin or pin-like structure while inducing an air flow from the working zone to prevent back contamination.

Abstract: There is disclosed a dry cleaning technology in which the particles left on the surface of the ultra-fine structure such as a semiconductor device and the like can be cleaned and removed totally in a vacuum environment without being dependent on a wet cleaning method performed in the surrounding atmosphere. In the dry cleaning device of the present invention, the pad is approached to the surface of the wafer such as a semiconductor wafer and the like, cleaning gas is injected into a fine clearance formed between both members to generate a high-speed gas flow along the surface of the wafer and the particles left on the surface of the wafer are physically cleaned and removed with the high-speed gas flow. In addition, in order to assist this physical cleaning action, either a chemical or an electrical cleaning method such as a plasma or the like can be used together.

Abstract: An apparatus for cleaning vehicular floor mats and the like includes a support member in a container having an opening for receiving dirt and other matter that is removed from a floor mat. A generally horizontal screen is positioned above the container such that the dirt and other matter falls into the container. At least one resilient member connects the screen to the support member, such that the screen shifts when a floor mat positioned on the screen is impacted by a user to thereby dislodge dirt and other matter from the floor mat.

Abstract: A method for dry cleaning a wafer container such as a SMIF pod that is equipped with a bottom mounting plate covered with contaminating particles. In the method, the wafer containers are mounted in openings of the enclosure such that the bottom mounting plates with the contaminating particles are exposed to an air-tight cavity of the enclosure. A purge gas flow is then directed to the bottom of the plate to dislodge the contaminating particles which are then picked up by a vacuum conduit positioned juxtaposed to the purge gas conduit and connected to a factory vacuum source such that contaminating particles dislodged are immediately removed. The present invention novel method can be carried out without using wet bench cleaning while achieving desirable and efficient cleaning results.

Abstract: A cleaning apparatus for cleaning cylindrical articles includes a container that defines a process chamber. The process chamber is adapted to receive cylindrical articles that have been soiled by dust. The process chamber is substantially closed except for an inserting/removing opening formed in the container. A dust duct is connected to the container so as to communicate with the process chamber. A device is provided for producing a gas-liquid mixture jet within the dust duct so as to induce airflow directed from the process chamber toward the dust duct. Therefore, dust will be drawn into the dust duct and will not scatter to the surrounding environment. The liquid may further wet the dust suspended within the dust duct in order to simplify the process for disposing of the dust removed from the article.

Abstract: A jet-cleaning device for a developing station is proposed, which jet-cleaning device is capable of removing chemical solution from the back surface of a silicon wafer without the need to perform time-consuming adjustment of knife ring position. The jet-cleaning device has a spin suction pad, a plurality of air nozzles and knife ring. The spin suction pad is used to support a silicon wafer. The spin suction pad has an external diameter smaller than the silicon wafer so that an peripheral portion of the wafer back surface is exposed. The plurality of air nozzles are positioned under the spin suction pad and mounted on a substrate plate. The air nozzles send out air jets directing at the exposed back surface of the wafer so that any dripping chemical solution can be blown away. The knife ring is installed under the wafer around the spin suction pad to prevent the sputtering of chemical solution back into the spin suction pad.

Abstract: A jet-cleaning device for a developing station is described, which jet-cleaning device is capable of removing chemical solution from the back surface of a silicon wafer without the need to perform time-consuming adjustment of knife ring position. The jet-cleaning device has a spin suction pad and a knife ring. The spin suction pad is used to support a silicon wafer. Inside the suction pad is a groove capable of delivering a jet of air onto the exposed wafer back surface so that dripping chemical solution can be blown away. The knife ring is erected under the wafer around the suction pad so that the sputtering of chemical solution back into the suction pad area is prevented.

Abstract: This invention concerns a process for removing liquid and/or solid impurities adhering to a workpiece (6), in particular oils, emulsions and/or chips, the workpiece (6) being secured in an apparatus and made to oscillate. The new process is characterized in that at least one nozzle (4) simultaneously applies suction to the workpiece (6) by means of a stream of directed air. Moreover, the invention also concerns devices for carrying out this process.

Abstract: A particulate removal and lens bond test device includes a base for receiving a waffle pack holding a plurality of optical subassemblies (OSAs) to be tested and an associated applicator for applying a predetermined flow of gas across the OSAs to remove loose particulates and to test the bond strength of the lens on the OSA. The applicator includes a flow regulator and a plurality of orifices arranged to direct the flow of gas onto each individual OSA in the waffle pack.

Abstract: A vacuum box having features ideal for utilization with an overlock sewing machine housed in a flat-bed table in a garment factory setting. The vacuum flat-bed table of an overlock sewing machine. The vacuum box is a receptacle having bottom, top, left, right, front, and rear walls. A portion of the front wall can have an opening covered by a hingably mounted door panel. The receptacle has a first compartment and a second compartment. The first compartment is sealed-off from the first compartment and has a electric outlet placed therein placed along the left or right wall. A suction fan is located in the second compartment. A horizontally sliding top panel is placed above the top surface of the top wall. The top panel is pivotally connected to guide slots placed along the front and back wall of the receptacle in a manner which allows the top panel to be extended horizontally to increase the top surface and drawn in to reduce the top surface.

Abstract: A jewelry cleaning device is disclosed comprising a neck portion and a body portion each formed by a wall of fine, flexible mesh material which collectively define a hollow interior having an open top in the neck portion and a closed bottom in the body portion. A support located at the open top of the neck portion is effective to mount the device to the steam pipe of a steam cleaning device so that the nozzle at the end of the steam pipe extends into the hollow interior. The body portion is formed with an access opening fitted with a closure device which is movable between an open position to permit the insert of an item of jewelry within the hollow interior, and a closed position wherein the access opening is substantially closed against the tweezers or other gripping device used to hold the jewelry item during the steam cleaning operation.

Abstract: A workbench includes a hollow base member formed with a lower chamber and an upper chamber that is disposed above and in fluid communication with the lower chamber. A tabletop is mounted on top of the base member and is formed with a plurality of apertures for access into the upper chamber. An air filtering device is mounted in the upper chamber. A motor-operated suction device is mounted in the lower chamber and is operable to create a downward air stream for drawing air to flow in a direction from above the tabletop into the base member such that woodworking waste on the tabletop can be drawn into the base member via the apertures so as to be entrapped by the air filtering device.

Abstract: A cleaning and waste management system comprises a cleaning chamber substantially isolatable from the ambient and including at least one openable closure for accomplishing said isolation, the cleaning chamber for accommodating objects to be cleaned being connected to a collector for waste and contaminants from cleaning, and a cleaning member insertable into the chamber without substantially affecting the isolation of the interior of the cleaning chamber from the ambient. The cleaning member generates superheated vapor such as steam and to dispense such superheated vapor directed to an object to be cleaned so that the object may be hand-held in the cleaning chamber.

Abstract: A semiconductor cleaning method for removing particles that have adhered to the back side of a semiconductor wafer. The semiconductor wafer is placed on a support. Inert gas is blown against the back of the semiconductor wafer by a plurality of nozzles, each of which is positioned at a predetermined angle to the back of the semiconductor wafer and inclined in a first direction. An air exhaust is located near the periphery of the semiconductor wafer and arranged so as to suck in the particles removed from the semiconductor wafer with the nozzles.

Abstract: Paint applied to a wheel electrostatically in the dry state is removed subsequently from the hub by a method of which the first step is to block the hub from one side with a plate, offered to a first face of the wheel and of shape such that it combines with the substantially cylindrical bore of the hub to create a chamber which remains accessible from the opposite face of the wheel. A jet of air is then generated close to the hub and introduced into the chamber, investing the cylindrical surface directly or indirectly or obliquely and creating a turbulence sufficient to remove the unwanted layer of paint; at the same time, suction is generated at least in the part of the chamber flooded with air, in such a way as to aspirate and recover the particles of paint removed from the hub and held in suspension by the resulting swirl.

Abstract: A dry cleaner easily and rapidly eliminates particles and dirt adhered to interior surfaces of the wafer carrier. The dry cleaner has a housing with a table mounted thereon, and an assembly for cleaning the wafer carriers disposed on the table. The cleaning assembly sprays a cleaning gas simultaneously into the carrier box and the cover of the wafer carrier. Dirt and particles separated from the carrier box and the cover are collected, by vacuum pressure through openings in the table, into a dirt-collector disposed in the housing, and then discharged through an exhaust tube. A controller controls a quantity of cleaning gas supplied and a time of cleaning by the cleaning assembly.

Abstract: A semiconductor cleaning apparatus for removing particles that have adhered to the back side of a semiconductor wafer. The semiconductor wafer is placed on a support. Inert gas is blown against the back of the semiconductor wafer by a plurality of nozzles, each of which is positioned at a predetermined angle to the back of the semiconductor wafer and inclined in a first direction. An air exhaust is located near the periphery of the semiconductor wafer and arranged so as to suck in the particles removed from the semiconductor wafer with the nozzles.

Abstract: An injection molding compound pellet cleaner 10 removes broken pellets and eliminates excessive dust from molding compound pellets for preparation of the pellets for processing in an automatic molding machine. The pellet cleaner includes a vacuum chamber 22 and a perforated canister 50 for holding the pellets 80. A vacuum is generated within the chamber to clean dust from the pellets and to remove broken pellets.

Abstract: A waste collecting/removal apparatus having a bin with a forward waste outlet opening, a rearward air flow inlet, a plurality of adjustable inclined louvres spaced from the bottom of the bin and an air flow plenum below the louvres to cause air flow between the louvres to move the waste material in the bin upwardly and forwardly toward the outlet opening.

Abstract: An apparatus for cleaning porcelain workpieces such as cast dolls' heads has at least one work station having an opening in a workplate above a column communicating with that opening and provided with a support basket in which a filter bag is received. The suction duct communicates with the column below the filter bag and above a bottom plate to draw dust through said opening into the column for collection on the filter. The workplate can be separated from the column for replacement of the filter bag.

Abstract: A method of cleaning window furnishings while located in their place of use, in which the furnishings are pushed together to form a vertically hanging block and a wetting medium is circulated from above. A cleaning washing medium is thereafter circulated from above, followed by a rinsing liquid also from above and over the window furnishings. The furnishings are then dried, and surplus fluids are collected at a base of the furnishings. All procedures are carried out while the window furnishings are hanging vertically in their locations of normal use. The wetting medium, washing medium and the rinsing liquid flow downward due to gravity with uniform velocity and cover the furnishings uniformly.

Abstract: The present invention concerns a procuedure for washing off flux residues subsequent to soldering from a circuit board or equivalent component. The circuit board washing procedures of prior art have either been detrimental to the environment or poor in their washing result. These problems have in the present invention been solved by including at least one step in the procedure in which steam is sprayed on the circuit board or equivalent. The steam spraying step is advantageously combined with preceding water washing and rinsing steps. A circuit board or equivalent component rinsed with hot steam is recovered in a cleaner condition than before, and moreover, entirely dry.

Abstract: In a cleaning system for cleaning venetian blinds, the blinds are stretched with their slats extending vertically on a carrier belt that is mounted to rotate about longitudinally separated drive and idler assemblies. One run of the carrier belt forms a station for loading and unloading of the blinds, and the other run of the carrier belt passes through successively arranged chambers in which both sides of the blinds to be cleaned are sprayed with washing liquid followed by various rinse solutions, whereafter the blind is passed through a drying chamber in which hot air is blown to effect drying. The vertical arrangement of the slats of the blind enable the washing and rinse liquids to drain rapidly and substantially completely so that the energy required for drying is reduced.

Abstract: A vacuum box is for collecting small particles or the like. the vacuum box includes a cabinet having a front, a rear and a hollow interior. The front of the cabinet includes a substantially horizontal working surface at a lower region thereof. The working surface includes an air inlet opening therethrough. A motor and fan are disposed within the hollow interior of the cabinet at the rear thereof for the discharge of air from the hollow interior of the cabinet. A collection compartment is disposed below the working surface and the air inlet opening therethrough with a rear portion of the collection compartment being disposed within the interior of the cabinet. A filter is disposed within the interior of the cabinet between the collection compartment and the fan. The fan causes the air including the particles produced at the working surface to be drawn downwardly through the air inlet opening into the collection compartment, upwardly from the rear portion of the collection compartment, and through the filter.

Abstract: Method and apparatus for removing fibres and other particles from the surfaces of compressible mineral wool products, for instance, mineral wool plates (2), by means of one or more suction slot nozzles (5) which suck air from adjacent the surfaces of the mineral wool products. The mineral wool products, while being exposed to the suction of slot or slots (5), are subjected to a quick compression so that a part of the air enclosed in the mineral wool is forced out towards the suction slot or slots (5) thereby bringing loose fibres and other particles at and adjacent the surfaces into the suction slot or slots (5).

Abstract: A method and apparatus for cleaning blinds which have a plurality of parallel, spaced slats where the method comprises the steps of (1) drawing the slats of the blind together, (2) immersing the blind in a container of liquid detergent, (3) rinsing the drawn blind with a rinsing liquid and (4) blowing the blind with a gas until it is substantially dry. The apparatus comprises a container containing a liquid detergent and capable of receiving the blind, a rinsing means for propelling rinsing liquid over the blind and drying means for blowing a gas over and through the blind until it is substantially dry.

Abstract: Producing a concrete object by first pouring an uncured mixture into a mold and then removing undesired uncured concrete using a suctioning apparatus having a liquid supply and a suction nozzle attached to a suction channel. The concrete mixture is loosened and diluted by liquid supplied through the liquid supply. This liquid and loosened diluted concrete are suctioned through the suction nozzle and the suction channel into a tank.

Abstract: A magnetic recording disk accommodated in a casing is rotated and air in the casing is drawn through air sucking openings formed in the upper and lower sides of the casing.

Abstract: A kit for cleaning phonograph records including cleaning fluid, a brush and a record vacuum cleaning attachment apparatus. The record vacuum cleaning attachment apparatus is adapted to attach to a wet/dry shop vacuum cleaner which causes a suction to emanate from a longitudinal slot in the lower surface of the record vacuum cleaning attachment apparatus. The suction emanating from the longitudinal slot of the record vacuum cleaning attachment apparatus safely removes the dirt, dust, grease, grime and chemicals which are suspended in the cleaning fluid applied to the playing surface of the phonograph record.

Abstract: A surgical instrument is especially adapted for use in various surgical procedures including use in removing disk material between vertebrae. The instrument has a handle and a flat working portion or body. The edges adjacent to the corners at the forward end of the body are sharpened to provide the cutting edges. The instrument is placed between the vertebrae and rotated back and forth to remove disk material.

Abstract: A system for cleaning material from a surface of an object, such as an MLC mask, having movable support member having extended along its length a line of liquid dispensing nozzles and a line of gas dispensing ports for respectively cleaning and drying the surface. The liquid dispensing nozzles and said gas dispensing ports are arranged to respectively provide a continuous line of liquid spray and a continuous line of gas at an angle with respect to the surface so as to form a wedge therewith in the direction of motion of the movable support member. The nozzles and ports are preferably arranged on both sides of the object to simultaneously clean both sides. The support member is moved vertically with respect to the surface by an air cylinder.

Abstract: A device is described for vacuum cleaning phonograph records. The device includes a suction head with an elongated slot that is positioned immediately above the grooves on the record during use. A flexible adapter is provided for securing the suction head to the cleaning tool of a household vacuum cleaner. The suction head includes a valve for turning on and off the applied vacuum.

Abstract: A film cleaning apparatus cleans photographic film while the film is clamped at the print gate aperture of a photographic printer. When the film is clamped at the print gate, and before a print exposure is initiated, high velocity ionized air is directed onto both the top and bottom surfaces of the film to remove dust and other foreign materials from the film surfaces. When the exposure is commenced, the flow of ionized air is reduced to a low velocity which is sufficient to prevent dust from settling on the film surfaces during exposure.

Abstract: This invention relates to an installation for the removal of surplus matel, especially from a block of cellular concrete utilizing suction means which includes a lever mechanism for lowering a suction nozzle controlled by means of a tension-member sensor consisting of a tension member stretched beneath a net of the suction nozzle, one end of said tension member being provided with a barrel cam co-operating with a limit switch designed for switching off the lever mechanism for lowering the suction nozzle, and simultaneously switching on fans.Moreover, the lever mechanism for lowering the suction nozzle is equipped with an additional emergency switch controlled automatically by means of a shock absorber, switching off the lever mechanism for lowering the suction nozzle in the case of the tension-member sensor being inoperative.

Abstract: An anvil having a working end away from a mounting shank, has compressed air flowing through the anvil to feed outward to the working end. An insert fastened to a panel is secured to the panel by forming on one end of the insert and by bonding with an adhesive on the other end. The working end of the anvil presses against the insert during forming and the flowing compressed air blows excess adhesive from the contacted surface of the insert.

Abstract: An apparatus for separating particulate solids from liquids includes a blower which is mounted for rotation between two upright walls. A sieve surrounds the rotor with a spacing therefrom and a solid-liquid mixture to be separated is introduced onto a portion of the sieve. The flow of gaseous medium advanced by the blower is directed onto the sieve by an elongated curved guide element having one end close to the portion of the sieve, another end close to the blower in the region of the first-mentioned end, and a curved portion extending from the one to the other end around the blower opposite to the direction of rotation of the blower at a decreasing distance from the latter. The guide element bounds with the sieve a passage the flow-through cross section of which decreases in the direction of advancement of the gaseous medium which thus partly propagates along the passage and partly escapes therefrom through the sieve and thus entrains and expels the liquid from the mixture through the sieve.

Abstract: This invention is directed to an apparatus for developing printing plates by stripping away uncured material using a carefully controlled gas stream. An optional supplemental blotting system is provided.

Abstract: An air blast dust removal machine has a jet of air projected from at least one slot-like nozzle inclined at an obtuse angle towards an oncoming sheet material which is held to a moving permeable conveyor belt. The sheet material is held to the conveyor belt by at least one suction device desposed on the opposite side of the conveyor belt as the sheet material passes adjacent the jet of air. A second conveyor belt holds the sheet material from its top side by a suction device; and an obtusely projected jet of air blasts dust from the bottom side of the sheet material.

Abstract: A film support member having a rectangular aperture is provided in contact with the surface of a film to be dried. A compressed air supply device is provided to supply air along the surface of the film from one edge of the reactangular aperture of the film support member. The edge of the aperture is tapered at an angle of 45.degree. or less to guide the air from the air supply device along the surface of the film to have the air uniformly distributed over the film.