Abstract: Cutting tool inserts comprising a substrate selected from the group consisting of cemented carbide, cermet, ceramics, cubic boron nitride based material, and high speed steel; and a hard and wear-resistant coating comprising laminar polycrystalline metal nitrides layers are disclosed. Methods of making a cutting tool insert are also disclosed. In addition, methods for machining of stainless steel and super alloys using the cutting tool inserts are disclosed.

Abstract: A structural material of diamond like carbon (DLC) composite layers is provided. The structural material includes a composite material which is consisted of a metal layer, a first metal nitride layer, and a DLC thin film. The metal layer includes aluminum (Al), copper (Cu), zirconium (Zr), nickel (Ni), or vanadium (V). The first metal nitride layer includes aluminum nitride (Al—N), zirconium nitride (Zr—N), vanadium nitride (V—N), or nickel nitride (Ni—N). The DLC thin film of the structural material of DLC composite layers has high quality tetragonally bonded amorphous carbon (ta-C) with a sp3(C—C) bonding ratio of more than 30%. Therefore, it is suitable for the work pieces in the mechanical, chemical, electricity, photoelectric, and heat transfer fields.

Abstract: To provide a high-quality protection target by forming a protective film that is thin and excellent in corrosion resistance. Provided is a protective film forming method for forming a protective film at least on a surface of a protection target. The method comprises: a base film forming step for forming a base film on the surface of the protection target; and a DLC film forming step for forming a diamond-like carbon film on the base film. The base film forming step forms the base film on the surface of the protection target for a plurality of times by repeating a process of depositing the base film in a prescribed thickness and eliminating a part of or a whole part of the base film. Further, the method comprises, before the DLC film forming step, an insulating layer forming step for forming an insulating layer on the surface of the base film on which the diamond-like carbon film is to be formed.

Abstract: A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk.

Abstract: In a method of refurbishing a deposition target, a surface of the target is provided in a process zone. An electrical arc is generated in the process zone, and a consumable metal wire is inserted into the process zone to form liquefied metal. A pressurized gas is injected into the process zone to direct the liquefied metal toward the surface of the target to splatter the liquefied metal on the surface, thereby forming a coating having the metal on at least a portion of the surface of the target that exhibits reduced contamination from the environment.

Abstract: An apparatus for generating plasma includes a cathode having an evaporable surface configured to emit a material comprising plasma and macroparticles; oppositely directed output apertures configured to direct the plasma; a filter configured to transmit at least some of the plasma to the output apertures while preventing transmission of at least some of the macroparticles, the filter comprising at least one deflection electrode disposed generally parallel to and facing at least a portion of the evaporable surface; a first element for generating a first magnetic field component having a first polarity between the cathode and the at least one deflection electrode; and a second element for generating a second magnetic field component having a second polarity at the evaporable surface of the cathode that is opposite that of the first polarity such that a low-field region is created between the evaporable surface and the at least one deflection electrode.

Abstract: There is provided a device for removing droplets in a plasma generator by which droplets can be surely separated from a plasma traveling from an arc discharge section and can be certainly removed, so that it can be prevented for the droplets to reach an article being processed. A tubular traveling passage (3) through which plasma P and droplets D travel under mixed state is formed, an aperture (6) having a passing hole (6a) at an eccentric position is provided in the tubular traveling passage (3), and a magnetic field generating means for passing the plasma P through the eccentric passing hole (6a) of the aperture (6) is arranged on an outer circumference of the tubular traveling passage (3). The plasma P passes through the eccentric passing hole (6a) of the aperture (6) after being bent in the tubular traveling passage (3) by a magnetic field generated from the magnetic field generating means and the droplets D are removed by colliding against the wall face of the aperture (6) at the time of bending.

Abstract: A particle film deposition method provides ultrafine particles generated by arc heating. An electrode is employed with at least two sub-electrodes each radially aligned toward the same part of a material. The material is evaporated by an arc discharge via the electrode, particles are generated from the evaporated material and the particles collide against a substrate.

Abstract: A filtered cathodic-arc plasma source of lower plasma losses and higher output plasma current to input current efficiency is disclosed. Plasma filtering is accomplished in a right angle bend magnetic filter arranged to include the effects of at least three added magnetic coils located at the right angle bend of the filter path. These magnetic coils and other filter attributes, including an array of transverse fins and a magnetic cusp trap in the filter path, achieve desirable magnetic flux paths, lower plasma collision losses and reduced undesired particle output from the plasma filter. Multiple cathode sources, multiple plasma output ports, Larmour radius influence, equipotential magnetic flux lines and electron/ion interaction considerations are also included in the plasma source. Application of the plasma source to film coating processes is included.

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: The present invention provides adhesiveless copper clad laminates wherein there is formed a copper film layer having high adhesiveness and insulation reliability, and a method for manufacturing such adhesiveless copper clad laminates.

Abstract: A glazing coated with at least one layer having thermochromic properties comprising vanadium oxide, and also with at least one other layer having thermal properties, such as an infrared reflecting layer, and/or at least one other layer having optical properties, such as antireflection in the visible, and/or electrical conduction properties; and having a particular application for making solar control glazing.

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: A method of physical vapor deposition (PVD) is disclosed in which xenon is used as the operating gas in the vacuum chamber in the deposition of an adhesion layer, preferably silicon, which allows the adhesion layer to be ultra-thin with improved durability over prior art films. The use of argon as is typical in the prior art results in argon atoms being incorporated into the ultra-thin silicon film with deleterious results. In films that are only several angstroms thick, the contamination of the film with argon or other elements can yield a film with reduced adhesion performance and in some cases noble atoms such as argon can escape the film leaving voids or pinholes. The use of the larger and heavier xenon atoms in the vacuum chamber produces a substantially purer film with reduced risk of voids and pinholes.

Abstract: A process for coating a non-uniform, thin-film, dichroic pattern to a wheel rim or motorcycle part. The thin-film coating adds a colored or iridescent pattern to the wheel rim or motorcycle part, while maintaining other characteristics, such as brilliance, shine, durability and general appearance. The coating is intentionally non-uniform. It may be varied, and may have different patterns and color among different articles, and even among different areas on the same article. The thin-film coating may be added by various techniques known in the art, but is preferably applied by sputtering a silicon or titanium target to obtain the thin-film on a chromed wheel rim.

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: The invention relates to metallurgy and mechanical engineering, in particular to the development of methods for providing metallic pieces with protective coatings with a view to improving the performance characteristics thereof. In accordance with the inventive method, a multilayer coating is formed by combining and simultaneously or consecutively using of various technologies including ion-plasma evaporation diffusive metallization and controlled atmosphere thermal treatment. The obtained coatings possess superior characteristics with respect to overall properties and are used for gas turbine construction, in particular, for manufacturing gas turbine vanes of aircraft engines.

Abstract: The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the like with an adhesion layer to be arranged on a substrate, a transition layer to be arranged on the adhesion layer and a covering layer of diamond-like carbon, wherein the adhesion layer comprises at least one element of the group of elements that contains the elements of the fourth, fifth and sixth subgroup of the periodic table and silicon, the transition layer comprises carbon and at least one element of the aforesaid groups and covering layer consists essentially of diamond-like carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF according to VDI 382l, Sheet 4.

Abstract: A surface-coated cutting tool member exhibiting a superior tool life due to a hard coating layer thereof is provided. The surface-coated cutting tool member includes a tungsten carbide based cemented carbide substrate, a titanium carbonitride based cermet substrate, or a cubic boron nitride based sintered substrate; and a hard coating layer of a nitride compound containing titanium and yttrium, which is formed on a surface of the substrate using a physical vapor deposition method in an overall average thickness of 1 to 15 ?m.

Abstract: A method for reducing the loss of particles from the surface of porous getter bodies is taught herein. The method consists in producing on the surface of the porous getter a thin layer of a metal or metal alloy with a deposition technique selected among the deposition of materials from arc generated plasma, ionic beam deposition and cathodic deposition. The deposition technique allows for granular or columnar surface of the covering material but still allowing access to the surface of the getter material, resulting in a reduced getter particle loss.

Abstract: A surface-coated cutting tool member includes a tungsten carbide based cemented carbide substrate, a titanium carbonitride based cermet substrate, or a cubic boron nitride based sintered substrate; and a hard coating layer of a nitride compound containing aluminum and titanium, formed on a surface of the substrate using a physical vapor deposition method in an overall average thickness of 1 to 15 ?m. The hard coating layer has a component concentration profile in which maximum aluminum containing points and minimum aluminum containing points appear alternatingly and repeatedly at a distance from 0.01 to 0.1 ?m in a direction of thickness of the hard coating layer. The amount of contained aluminum (or titanium) is changed from the maximum aluminum containing points to the minimum aluminum containing points. The maximum aluminum containing points satisfy a formula: (AlXTi1?X)N, wherein X is between 0.70 to 0.95. The minimum aluminum containing points satisfy a formula: (AlYTi1?Y)N, wherein Y is between 0.

Abstract: A method of manufacturing a carbon nanotube device including an inner electrode, having connecting step, connecting a carbon nanotube to the inner electrode, wherein the connecting step comprises: attaching a conductor to an end or periphery thereof of a needle-shaped or rod-shaped carrying electrode; arranging the carbon nanotube in contact or close to a predetermined connection part of the inner electrode; approaching the end of the carrying electrode on which the conductor is carried to the connection part; and transferring the conductor carried on the carrying electrode to the connection part or periphery thereof to connect the carbon nanotube to the inner electrode.

Abstract: A vacuum arc vapor deposition apparatus can form a film of good quality without uselessly increasing a time from start of film deposition to completion thereof even when a trigger electrode induces vacuum arc discharge in response to turn-off of the vacuum arc discharge during deposition of the film onto the deposition target object. For example, the vacuum arc vapor deposition apparatus includes a shield member moved to and away from a position between a vapor source and a holder for supporting the deposition target object, a drive device for locating the shield plate selectively in a shield position between the vapor source and the holder, and a retracted position shifted from the shield position, a detector (e.g.

Abstract: A method for manufacturing a magnetic recording medium includes forming a first protective layer of first material over a magnetic film provided on a substrate. The first protective layer has a thickness of about 0.2 nm to about 2 nm. A second protective layer of second material is formed over the first protective layer by driving ions of the second material into the first protective layer. The first protective layer is configured to prevent the ions of the second material from penetrating into the magnetic film.

Abstract: To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the other end of duct and specified magnets. The terminal magnet located closest to plasma injection hole may be set to incline to a plasma injection plane of the plasma injection hole. Further, at lease one of specified magnets may be inclined to the plasma injection plane. Further more, at least one of magnetic field generating coils may be formed with a plurality of electromagnetic coils, which are inclined at different angles with respect to a cross section of the duct. One of electromagnetic coils may be selectively energized by current on a basis of setting and controlling of deflection magnetic field generated by the magnetic filter.

Abstract: A vacuum system for the treatment of work pieces has an evacuatable treatment chamber having a centrally disposed low voltage arc discharge arrangement and laterally disposed loading opening. A coupling device between the work piece support and a receiving device on the system side allows simplified loading and removal of the work pieces to be treated along with the support by simply lifting onto or lowering from the receiving device.

Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.

Abstract: An arc evaporation source constituting this vacuum arc deposition apparatus has a plurality of cathodes, a trigger electrode, a trigger drive unit, a shutter, and a shutter drive unit. The trigger drive unit changes over the position of the trigger electrode to thereby position the trigger electrode in front of a desired cathode, and connects/disconnects the trigger electrode to/from the desired cathode in the changed-over position. The shutter covers the fronts of all the cathodes except the desired cathode. The shutter drive unit moves the shutter to thereby change over the cathode not covered with the shutter. Further, the vacuum arc deposition apparatus has a changeover control unit for controlling the shutter drive unit and the trigger drive unit to thereby change over the cathode not covered with the shutter and to thereby position the trigger electrode in front of the cathode not covered with the shutter.

Abstract: A graphite cathode and a graphite anode are placed opposite each other through an insulating plate having a notch. A voltage is applied between both of the electrodes to generate arc discharge at the notch of the insulating plate. A given area of the graphite anode is evaporated from an electrode point of the arc discharge, and simultaneously an arc jet is generated from the notch. Thereby, a carbon nanoparticle comprising soot of carbon nanomaterial containing carbon nanohorn is generated. The soot is deposited on a recovering plate for recovery.

Abstract: A coated article includes formed of an alloy having a composition including nickel and aluminum, and a protective coating overlying and contacting the substrate. The protective coating is a mixture of a quasicrystalline metallic phase, and a non-quasicrystalline metallic phase comprising nickel and aluminum. The aluminum is present in an amount of from about 3 to about 35 percent by weight of the non-quasicrystalline metallic phase.

Abstract: A method and apparatus used for the application of plating/coating in a cathodic arc process to improve coating uniformity, deposition rates, quality, cost, packaging, arc triggering, target wear and other improvements is described in the patent. The process improvements utilize a cathode with external current switching to two or more electrical cathode contacts, employment of magnets on the backside of the cathode, a non-mechanical arc initiation trigger, patterned target surfaces, adjustable cathode insulation, current modulation, and new packaging schemes.

Abstract: Powder of a simple substance or a combination of a plurality of carbides of metals belonging to the IVa, Va and Via families in the Periodic Table is mixed with a ferrous-family metal powder or non-ferrous metal powder having the same composition as the treatment target (2) as a simple substance or a combination of a plurality of metals, and this is compressed and molded, and incompletely sintered to form an electrode (12) serving as a discharge processing electrode; and said device is provided with a switching unit which alters electrical conditions at the time when the base member of the treatment target (2) is directly subjected to a discharging surface treatment and the electrical conditions at the time when a coating film (13) that has been formed is subjected to a discharging surface treatment according to the characteristics of the treatment target material.

Abstract: The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors disposed along the short sides of a rectangular target behind the target, and a magnetic focusing system disposed along the long sides of the target in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides of the target. The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor can be controlled independently. In a further embodiment, electrically independent steering conductors are disposed along opposite long sides of the cathode plate, and by selectively varying a current through one conductor, the path of the arc spot shifts to widen an erosion corridor. The invention also provides a plurality of internal anodes, and optionally a surrounding anode for deflecting the plasma flow and preserving a high ionization level of the plasma.

Abstract: A method is provided for coating objects in a vacuum chamber in which a physical vapor deposition (PVD) can be carried out. The chamber has at least one anode means, at least one cathode and at least one magnetic field source. An arc can be ignited between the at least one anode means and the at least one cathode, and the cathode separates material. The at least one magnetic field can be turned relative to the at least one cathode and the objects to be coated are arranged in the chamber. The magnetic field is turned before the beginning of the coating process so that the separated material does not coat the objects to be coated in the coating process.

Abstract: A method for forming a conductive region on a first portion of a substrate, the method being constituted by exposing the first portion to a filtered beam of substantially fully ionised metallic ions under a pulsed, modulated electrical bias. The method uses FCVA (Filtered Cathodic Vacuum Arc) techniques to generate the filtered ion beam and permits the formation of a conformal metal coating, even in high aspect ratio visa and trenches. The method also permits the in-filling of vias and trenches to form conductive interconnects. Particular examples concern the deposition of copper ions. An adapted FCVA apparatus deposits metals on substrates. A control apparatus controls ion beams impacting upon substrates, the control apparatus being suitable for incorporation within existing filtered ion beam sources.

Abstract: The invention relates to an arc source or a source for vaporizing or sputtering of materials and a method for operating a source. The source comprises an insulated counter-electrode and/or an AC magnet system. Thereby, dependent on the requirement, any desired potential can be applied to the counter-electrode and/or the source can be operated with different magnet systems, in particular as arc or sputter source.

Abstract: A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil power source for reversing a coil current to be fed to the magnetic coils, and a control unit for controlling the coil power source to reverse the flowing direction of the coil current.

Abstract: A method for providing an ultra thin electrical circuit integral with a portion of a surface of an object, including using a focal Vacuum Arc Vapor Deposition device having a chamber, a nozzle and a nozzle seal, depressing the nozzle seal against the portion of the object surface to create an airtight compartment in the chamber and depositing one or more ultra thin film layer(s) only on the portion of the surface of the object, the layers being of distinct patterns such that they form the circuit.

Abstract: The present invention provides a pulsed carbon plasma apparatus to produce a diamond-like carbon coating over an extended object, the coating having a high degree of thickness uniformity achieved by scanning the plasma flow over the surface of the object. The pulsed carbon plasma apparatus of the invention comprises a carbon plasma flow scanning device having at least one pair of deflecting coils, where the deflecting coils have, in the scanning plane, a different number of turns on opposite sides. The object may be made of metal, ceramic, glass or plastic. The coatings may be used to improve life and operating performance of tools and machine parts, and as decorative coatings.

Abstract: A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e.g. between 0.1 and 1.0 nm thick. A lubricant layer (e.g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.

Abstract: A cutting tool 1 includes a hard coating formed on the surface of a substrate formed of, for example, a hard material of cemented carbide (WC-Co-type cemented carbide) equivalent to JIS K10 and polished into the shape of ISO SPGN120312. The cutting tool 1 has a plate-shape with a rake face (the main surface side) that is wider than the opposite face. The hard coating has a thickness in the range of from 1 ?m to 5 ?m, is formed of a TiAlN material, and has a Ti/Al ratio of 1. Coarse grains present in the hard coating and having a size not less than coating thickness occupy an area percentage not greater than 5% by area. The hard coating has a surface roughness Ra of not greater than 0.1 ?m and a surface roughness Rz of not greater than 1 ?m.

Abstract: A method for manufacturing a tool or machine component increases wear resistance by providing a base body made of a metal or of a hard metal and having a surface. At least a portion of the surface is vacuum coated with a hard solid layer system having at least one layer of a material selected from the group consisting of nitrides, carbides, oxides, carbonitrides, oxynitrides, and oxycarbonitrides of at least one metal. A metallic intermediate layer having the at least one metal is vacuum deposited on the hard solid layer system, and a sliding layer system is vacuum deposited on the metallic intermediate layer.

Abstract: A hard film for cutting tools which is composed of

Abstract: A magnetic recording medium comprising a magnetic layer and a protective carbon-containing overcoat comprising a first carbon density, preferably of a low-density carbon, and a second carbon density different from the first carbon density, preferably of a high-density carbon, and a method of making and using the magnetic recording medium are disclosed.

Abstract: A discharge electrode comprising a material having solid lubricant effect, such as molybdenum, is used to generate discharge in a pulse form between the discharge electrode and a workpiece, the surface of which is to be treated, in working liquid containing carbon components, such as water. Material consumed or melted from the discharge electrode, generated because of the electric discharge energy based on the pulse form discharge, gets adhered to and deposited onto a surface of the workpiece thereby forming a coat having lubricant effect on the surface of the workpiece.

Abstract: An apparatus for cathodic arc coating. The apparatus includes: a vacuum chamber which includes: an anode; a power supply; and a cathode target assembly connected to the power supply. The cathode target assembly includes a cathode target having an interference fit stud with a threadless distal end. In the preferred embodiment, the distal end of the threadless cathode target also includes a pre-determined surface texture and a cooling block in contact with the cathode target.

Abstract: Disclosed is an element using a piezoelectric characteristic, and in particular, an SAW filter and a method for manufacturing the same. The SAW filter according to the invention is resistant to input wave of high power by employing ta-C or CNT as an acoustic wave transmission medium. The method for manufacturing the SAW filter according to the invention simplified the manufacturing process and reduced a transmission loss as well noise.

Abstract: A method and apparatus for forming a coating on a sputter chamber workpiece. The apparatus generally includes a sputter chamber having at least one workpiece. The at least one workpiece generally includes one or more trenches formed therein, the trenches being configured to define an arc spray coating region. The method generally includes forming one or more trenches in the workpiece, the trenches defining a coating region and applying a metal coating to the coating region by arc spraying.

Abstract: A green-compact electrode (1) for discharge surface treatment for use in a discharge surface treatment operation for forming a hard coating film (9) on the surface of an object (2) which must be machined by performing a discharging operation in working fluid (4) is structured such that powder (11) made of metal, such as W or Ti, and fluid (12) which is the same as working fluid are mixed with each other, and the mixed substance is compression-molded so that the green-compact electrode (1) for the discharge surface treatment is obtained.

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.