Abstract: A thermally sensitive ionic redox transistor comprises a channel, a reservoir layer, and an electrolyte layer disposed between the channel and the reservoir layer. A conductance of the channel is varied by changing concentration of ions in the channel layer. The electrolyte layer is configured to undergo a state change at a state transition temperature. Below the state transition temperature, ions in the electrolyte layer are substantially immobile. Above the state transition temperature, ions can move freely between the reservoir layer and the channel across the electrolyte layer in response to a voltage being applied between the channel and the reservoir layer. When the device is cooled below the state transition temperature or temperature range, the ions are trapped in one or more of the layers because the electrolyte layer loses its ionic conductivity. A state of the redox transistor can be read by measuring the conductance of the channel.

Abstract: A manufacturing method is provided during which a preform component for a turbine engine is provided. The preform component includes a substrate and a locating feature at an exterior surface of the substrate. An outer coating is applied over the substrate. The outer coating covers the locating feature. At least a portion of the preform component and the outer coating are scanned with an imaging system to provide scan data indicative of a location of the locating feature. A cooling aperture is formed in the substrate and the outer coating based on the scan data.

Abstract: A method is provided comprising identifying an alignment point of a workpiece; positioning a first end of an electrode in the direction of the alignment point of the workpiece; applying a first voltage to the electrode wherein the applied first voltage generates a spark; rotating the electrode in a first direction; advancing the electrode toward the alignment point by a first distance wherein advancing the electrode and applying the first voltage creates a first orifice section; applying a second voltage to the electrode and modifying one or more operational parameters of the electrode; advancing the electrode toward the alignment point by a second distance wherein advancing the electrode and applying the second voltage causes formation of at least a second orifice section; wherein the first and second orifice sections cooperate to form an orifice comprising a first flow area and a second flow area.

Abstract: An electrochemical machining device includes a plurality of electrodes, a guiding member and a plate member. The electrodes are disposed around a workpiece. The guiding member is configured to limit and guide each of the electrodes to move. The plate member is configured to exert a force to each of the electrodes. The driving member is configured to rotate the workpiece. The plate member is connected to each of the electrodes. A force-exerting direction of the force from the plate member to each of the electrodes is parallel to a central axis of each of the electrodes or deflects off the central axis. Each of the electrodes is passed through the guiding member and configured to perform a machining on the workpiece which is rotated by the driving member, and each of the electrodes has an electrochemical machining direction which is perpendicular, oblique or parallel to the workpiece.

Abstract: Provided is an electrode capable of increasing a degree of freedom in machining shape with a simple structure, an electrochemical machining apparatus using the electrode, an electrochemical machining method, and a product machined by the method. An electrode 4 has a core tube 41 formed of a material by which a second hole 101b having a direction or a curvature different from that of a first hole 101a having a predetermined curvature can be formed continuously from the first hole 101a and a coating 42 fixed to an outer periphery of the core tube 41.

Abstract: Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown are provided. In one disclosed arrangement a plurality of apertures are formed. The membrane comprises a first surface area portion on one side of the membrane and a second surface area portion on the other side of the membrane. Each of a plurality of target regions comprises a recess or a fluidic passage opening out into the first or second surface area portion. The method comprises contacting all of the first surface area portion of the membrane with a first bath comprising ionic solution and all of the second surface area portion with a second bath comprising ionic solution. A voltage is applied across the membrane via first and second electrodes in respective contact with the first and second baths comprising ionic solutions to form an aperture at each of a plurality of the target regions in the membrane.

Abstract: According to an example, a fluid ejection device may include a substrate, a resistor positioned on the substrate, an overcoat layer positioned over the resistor, a fluidics layer having surfaces that form a firing chamber about the resistor, in which the overcoat layer is positioned between the resistor and the firing chamber, and a thin film membrane covering the surfaces of the fluidics layer that form the firing chamber and a portion of the overcoat layer that is in the firing chamber.

Abstract: A wafer contacting device may include: a receiving region configured to receive a wafer; and an elastically deformable carrier disposed in the receiving region and including an electrically conductive surface region.

Abstract: The membrane of a conventional solid-state nanopore device, which is believed to be promising for understanding the structural characteristics of DNA and determining a nucleotide sequence, has been thick, and the accuracy in determining a nucleotide sequence in the DNA chain has been insufficient. A method characterized by forming a membrane by forming a first film on a first substrate having a surface of Si, then forming a hole in the first film in such a manner that the surface of the first substrate is exposed, then forming a second film on the first film and on the surface of the first substrate and then etching the first substrate with a solution which does not remove the second film.

Abstract: Forming a porous layer on a silicon substrate is disclosed. Forming the porous layer can include placing a silicon substrate in a first solution and conducting a first current through the silicon substrate. It can further include conducting a second current through the silicon substrate resulting in a porous layer on the silicon substrate.

Abstract: Forming a porous layer on a silicon substrate. Forming the porous layer can include placing a first silicon substrate in a solution, where a first electrode is within a threshold distance to an edge of the silicon substrate. It can further include conducting a first current through the silicon substrate, where the first electrode can be positioned relative to the edge allowing for substantially uniform porosification along the edge of the first silicon substrate.

Abstract: A cold cathode field emission electron source capable of emission at levels comparable to thermal sources is described. Emission in excess of 6 A/cm2 at 7.5 V/?m is demonstrated in a macroscopic emitter array. The emitter is comprised of a monolithic and rigid porous semiconductor nanostructure with uniformly distributed emission sites, and is fabricated through a room temperature process which allows for control of emission properties. These electron sources can be used in a wide range of applications, including microwave electronics and x-ray imaging for medicine and security.

Abstract: The monolithic device comprises a plurality of scaffolding members and a mesh patterned members webbed between the scaffolding members; the mesh patterned member webbed between the scaffolding members surround a lumen and generally expands from a contracted state to an expanded state; and mesh patterned members including a plurality of openings traversing the thickness of the mesh patterned member, and the mesh patterned members including a surface on which a pattern of openings is formed.

Abstract: In a method for forming nanopores, two opposing surfaces of a membrane are exposed to an electrically conducting liquid environment. A nanopore nucleation voltage pulse, having a first nucleation pulse amplitude and duration, is applied between the two membrane surfaces, through the liquid environment. After applying the nanopore nucleation voltage pulse, the electrical conductance of the membrane is measured and compared to a first prespecified electrical conductance. Then at least one additional nanopore nucleation voltage pulse is applied between the two membrane surfaces, through the liquid environment, if the measured electrical conductance is no greater than the first prespecified electrical conductance.

Abstract: Methods of forming microelectronic structures are described. Embodiments of those methods may include forming an electrochemical capacitor device by forming pores in low-purity silicon materials. Various embodiments described herein enable the fabrication of high capacitive devices using low cost techniques.

Abstract: Embodiments of the invention describe energy storage devices, porous electrodes, and methods of formation. In an embodiment, an energy storage device includes a porous structure containing multiple main channels that extend into an electrically conductive structure at an acute angle. In an embodiment, an energy storage device includes a porous structure containing an array of V-groove or pyramid recesses.

Abstract: The invention refers to a method for the electrochemical machining of work pieces, such as, for example, nozzles, in particular nozzles with a blind hole. The invention also refers to a device for the electrochemical machining of work pieces. The invention is characterized by a relative movement, in particular a rotary movement during the machining between work piece and cathode. The device is characterized in that cathode and/or work piece are supported rotatably on bearings for a relative movement.

Abstract: Method for the electrochemical etching of macropores in n-type silicon wafers, using illumination of the wafer reverse sides and using an aqueous electrolyte, characterized in that the electrolyte is an aqueous acetic acid solution with the composition of H2O:CH3COOH in the range between 2:1 and 7:3, with an addition of at least 9 percent by weight hydrofluoric acid.

Abstract: An electrode for an electrochemical machining process is provided. The electrode comprises a curved, electrically conductive member, and an insulating coating covering at least a portion of a side surface of the curved, electrically conductive member. An electrochemical machining assembly is also provided for machining curved holes in a workpiece. The assembly includes at least one curved electrode and a power supply operatively connected to provide a pulsed voltage to the at least one curved electrode and to the workpiece. The assembly further includes a rotational driver operatively connected to move the at least one curved electrode along a curved path within the workpiece. The assembly is configured to remove material from the workpiece upon application of the pulsed voltage to the at least one curved electrode and to the workpiece. An electrochemical machining method is also provided for forming one or more curved holes in an electrically conductive workpiece.

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Abstract: A method for simultaneously detecting and separating a target analyte such as a protein or other macromolecule that includes providing a porous silicon matrix on the silicon substrate, exposing the porous silicon matrix to an environment suspect of containing the target analyte, observing optical reflectivity of the porous silicon matrix; and correlating the changes in the silicon substrate to the target analyte.

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The microfabricated body can be formed of a porous metal compatible (e.g., does not react or result in electrochemical decaying or corrosion) with an ionic liquid or a room-temperature molten salt. The microfabricated body can have a pore size gradient that decreases from the base of the body to the tip of the body, so that the ionic liquid can be transported through capillarity from the base to the tip.

Abstract: According to one embodiment, a catalyst-supporting substrate comprises a substrate and a catalyst layer including a plurality of pores, the catalyst layer being supported on the substrate. The average diameter of the section of the pore when the catalyst is cut in the thickness direction of the thickness is 5 nm to 400 nm, and the long-side to short-side ratio of the pore on the section is 1:1 to 10:1 in average.

Abstract: A method for processing a constructed, liquid-cooled piston of an internal combustion engine, the piston including an upper piston part and a lower piston part, which are supported by a joining plane and are connected to each other in a bonded manner. An electrochemical method, such as electrochemical machining, is used to produce a passage opening or a hole in the piston. By means of the method, material is selectively removed after the completion of the upper part piston, the lower piston part, or the piston after the two piston parts have been joined. The electrochemical machining allows an arbitrarily geometrically designed topography having at least one passage opening, a hollow, or an oil pocket in cooling areas or non-cooling areas to be created on the piston.

Abstract: In some embodiments, the present invention provides novel methods of preparing porous silicon films and particles for lithium ion batteries. In some embodiments, such methods generally include: (1) etching a silicon material by exposure of the silicon material to a constant current density in a solution to produce a porous silicon film over a substrate; and (2) separating the porous silicon film from the substrate by gradually increasing the electric current density in sequential increments. In some embodiments, the methods of the present invention may also include a step of associating the porous silicon film with a binding material. In some embodiments, the methods of the present invention may also include a step of splitting the porous silicon film to form porous silicon particles. Additional embodiments of the present invention pertain to anode materials derived from the porous silicon films and porous silicon particles.

Abstract: A porous metal article includes a substrate, a metal layer formed on the substrate, and a porous metal layer formed on the metal layer. The metal layer is a noble metal layer doped with M, M comprising an element selected from a group consisting of aluminum, magnesium and calcium, the content of M in the metal layer is between about 30 wt % and about 70 wt %. The metal layer has a thickness between about 1 micrometer and about 8 micrometers. The porous metal layer has a thickness between about 2 micrometers and about 4 micrometers.

Abstract: An electrode for an electrochemical machining process is provided. The electrode includes an electrically conductive member defining at least one passage and an insulating coating partially covering a side surface of the electrically conductive member. The insulating coating does not cover at least one of first and second exposed sections of the electrically conductive member, where the first and second exposed sections are separated by approximately 180 degrees and extend substantially along a longitudinal axis of the electrically conductive member. The insulating coating also does not cover an exposed front end of the electrically conductive member. An electrochemical machining method is also provided, for forming a non-circular hole in a workpiece using the electrode.

Abstract: Methods of fabricating porous silicon by electrochemical etching and subsequent coating with a passivating agent process are provided. The coated porous silicon can be used to make anodes and batteries. It is capable of alloying with large amounts of lithium ions, has a capacity of at least 1000 mAh/g and retains this ability through at least 60 charge/discharge cycles. A particular pSi formulation provides very high capacity (3000 mAh/g) for at least 60 cycles, which is 80% of theoretical value of silicon. The Coulombic efficiency after the third cycle is between 95-99%. The very best capacity exceeds 3400 mAh/g and the very best cycle life exceeds 240 cycles, and the capacity and cycle life can be varied as needed for the application.

Abstract: Silicon-based explosive devices and methods of manufacture are provided. In this regard, a representative method involves: providing a doped silicon substrate; depositing undoped silicon on a first side of the substrate; and infusing an oxidizer into an area bounded at least in part by the undoped silicon; wherein the undoped silicon limits an exothermic reaction of the doped silicon to the bounded area. Another representative method involves: providing a doped silicon substrate; depositing a masking layer of low-pressure chemical vapor deposited (LPCVD) Silicon nitride to the first side of the substrate; patterning the nitride mask and etching the porous silicon, and infusing oxidizer into an area bounded by the LPCVD nitride; wherein the silicon nitride limits an exothermic reaction of the doped silicon to the bounded area.

Abstract: A method of fabricating a component is provided. The fabrication method includes depositing a first layer of a structural coating on an outer surface of a substrate. The substrate has at least one hollow interior space. The fabrication method further includes machining the substrate through the first layer of the structural coating, to define one or more openings in the first layer of the structural coating and to form respective one or more grooves in the outer surface of the substrate. Each groove has a respective base and extends at least partially along the surface of the substrate. The fabrication method further includes depositing a second layer of the structural coating over the first layer of the structural coating and over the groove(s), such that the groove(s) and the second layer of the structural coating together define one or more channels for cooling the component. A component is also disclosed.

Abstract: A porous metal article includes a substrate; a metal layer formed on the substrate; and a porous metal layer formed on the metal layer. The metal layer is a noble metal layer doped with M that is at least one element selected from a group consisting of aluminum, magnesium and calcium, the content of M in the metal layer is between about 30 wt % and about 70 wt %.

Abstract: Technologies are generally described for an optical waveguide, methods and systems effective to form an optical waveguide, and an optical system including an optical waveguide. In some examples, the optical waveguide may include a silicon oxynitride region in a wall of the silicon substrate. The silicon oxynitride region may define an inner region of the optical waveguide. The wall may define a via. The optical waveguide may include a silicon oxide region in the substrate. The silicon oxide region may define an outer region of the optical waveguide adjacent to the inner region.

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The microfabricated body can be formed of a porous metal compatible (e.g., does not react or result in electrochemical decaying or corrosion) with an ionic liquid or a room-temperature molten salt. The microfabricated body can have a pore size gradient that decreases from the base of the body to the tip of the body, so that the ionic liquid can be transported through capillarity from the base to the tip.

Abstract: A method for forming a hole in an object is provided. The method includes forming a starter hole in the object, providing an electrochemical machining electrode that includes insulation that extends only partially around the electrode, and inserting the electrode into the starter hole to form a hole in the object that has an inlet defined by a first cross-sectional area and an outlet defined by a second cross-sectional area.

Abstract: The invention relates to a method for producing a composite material, to a composite material produced according to said method and to the use of said material.

Abstract: A method for forming holes in an object is provided. The method includes providing an electrochemical machining (ECM) electrode including a first section having insulation that circumscribes the first section, and a second section having insulation that extends only partially around the second section. The method also includes inserting the electrode into the object, such that in a single pass the electrode forms a hole that includes a first portion having a first cross-sectional area and a second portion having a second cross-sectional area.

Abstract: An object of the present invention is to provide a method for stably forming an artificial lipid membrane while suppressing the leakage and evaporation of an electrolytic solution. The present invention is an artificial lipid membrane forming method for forming an artificial lipid membrane using an artificial lipid membrane forming apparatus. The artificial lipid membrane forming apparatus comprises a first chamber, a second chamber, a dividing wall, and an artificial lipid membrane forming portion. Each of the first chamber and the second chamber has a capacity of not smaller than 10 pl and not larger than 200 ?l. The artificial lipid membrane forming method of the present invention comprises the steps of: preparing the artificial lipid membrane forming apparatus; adding to the first chamber a first electrolytic solution having a viscosity of not lower than 1.

Abstract: A membrane structure is provided. The membrane structure includes a first layer having a plurality of pores; and a second layer disposed on the first layer. The second layer has a plurality of unconnected pores. At least a portion of the plurality of unconnected pores of the second layer is at least partially filled with a filler such that the first layer is substantially free of the filler. At least a portion of the plurality of unconnected pores of the second layer is in fluid communication with at least one of the pores of the first layer. A method of making a membrane structure is provided. The method includes the steps of providing a first layer having a plurality of interconnected pores; disposing a second layer on the first layer, and filling at least a portion of the unconnected pores of the second layer with a filler such that the first layer is substantially free of the filler.

Abstract: An electrode for an electrochemical machining process is provided. The electrode comprises a curved, electrically conductive member, and an insulating coating covering at least a portion of a side surface of the curved, electrically conductive member. An electrochemical machining assembly is also provided for machining curved holes in a workpiece. The assembly includes at least one curved electrode and a power supply operatively connected to provide a pulsed voltage to the at least one curved electrode and to the workpiece. The assembly further includes a rotational driver operatively connected to move the at least one curved electrode along a curved path within the workpiece. The assembly is configured to remove material from the workpiece upon application of the pulsed voltage to the at least one curved electrode and to the workpiece. An electrochemical machining method is also provided for forming one or more curved holes in an electrically conductive workpiece.

Abstract: The invention relates to a method (3) of fabricating a mould (39, 39?, 39?) that includes the following steps: a) providing (10) a substrate (9, 9?) that has a top layer (21, 21?) and a bottom layer (23, 23?) made of electrically conductive, micromachinable material, and secured to each other by an electrically insulating, intermediate layer (22, 22?); b) etching (11, 12, 14, 2, 4) at least one pattern (26, 26?, 27) in the top layer (21, 21?) as far as the intermediate layer (22, 22?) to form at least one cavity (25, 25?) in said mould; c) coating (6, 16) the top part of said substrate with an electrically insulating coating (30, 30?); d) directionally etching (8, 18) said coating and said intermediate layer to limit the presence thereof exclusively at each vertical wall (31, 31?, 33) formed in said top layer. The invention concerns the field of micromechanical parts, in particular, for timepiece movements.

Abstract: Medical devices, such as stents, and methods of the devices are described. In some embodiments, the invention features a method of making a medical device including providing a body having an electrically insulating first member defining an elongated lumen, and an electrically conducting second member on a first surface of the first member, removing a portion of the second member, and forming the body into the medical device, e.g., a stent.

Abstract: An electrochemical machining process for forming a non-circular hole from a substantially circular hole within a workpiece using an electrode. The electrode is made of an electrically conductive material and has insulated areas in which the electrically conductive material is coated with an insulating material, and exposed areas of metal or conductive material. The insulated areas and exposed areas extending in rows substantially along a longitudinal axis of the electrode. The electrode is first positioned in a substantially circular hole. An electric current is then applied to the electrode to electrochemically remove a predetermined amount of material from the substantially circular hole to form a non-circular hole. A variety of different non-circular shapes are achievable using the process.

Abstract: A electrical discharge machining apparatus is disclosed. The apparatus may have an electrode, an actuator configured to advance the electrode, and a power supply. The apparatus may also have a controller in communication with the actuator and the power supply. The controller may be configured to negatively charge the electrode, and regulate the actuator to advance the negatively charged electrode toward a positively charged workpiece, thereby initiating erosion of the positively charged workpiece. The controller may also be configured to positively charge the electrode and negatively charge the workpiece to erode the electrode to a desired condition after workpiece erosion has been initiated. The controller may also be configured to continue advancing the electrode toward the workpiece after the electrode has been eroded to the desired condition.

Abstract: A method for forming holes in an object is provided. The method includes providing an electrochemical machining (ECM) electrode including a first section having insulation that circumscribes the first section, and a second section having insulation that extends only partially around the second section. The method also includes inserting the electrode into the object, such that in a single pass the electrode forms a hole that includes a first portion having a first cross-sectional area and a second portion having a second cross-sectional area.

Abstract: A composite component (1), such as a turbine airfoil, includes a conductive portion (2), and a non-conductive portion (5), such as a thermal barrier coating or a wear protection coating, or both. In machining the component, a laser machining step is applied for machining the non-conductive portion, and an electro-machining step is applied for machining the conductive portion. The laser machining step is performed by applying preferably a high-frequency pulsed laser. The focussed laser beam working diameter (DL) is essentially smaller than the size of the contour (16) to be machined. The contour is scanned by the laser beam (9) along a pre-defined trace (17) thus literally inscribing the desired contour into the workpiece.

Abstract: A method and apparatus for electro discharge machining a passage through a work piece using a hollow electro discharge machining electrode and a corresponding flushing agent supplied via the hollow electrode. A backing member is positioned abutting the exit face of the work piece so that at break through the path of the flushing agent is not disrupted. The backing member positioned such that it forms a fluid tight seal with the work piece.

Abstract: A method of manufacture for optical spectral filters with omnidirectional properties in the visible, near IR, mid IR and/or far IR (infrared) spectral ranges is based on the formation of large arrays of coherently modulated waveguides by electrochemical etching of a semiconductor wafer to form a pore array. Further processing of said porous semiconductor wafer optimizes the filtering properties of such a material. The method of filter manufacturing is large scale compatible and economically favorable. The resulting exemplary non-limiting illustrative filters are stable, do not degrade over time, do not exhibit material delamination problems and offer superior transmittance for use as bandpass, band blocking and narrow-bandpass filters. Such filters are useful for a wide variety of applications including but not limited to spectroscopy, optical communications, astronomy and sensing.

Abstract: In an electrolytic cell a membrane consisting of dielectric material such as an organic polymer, which separates two chambers of the electrolytic cell from each other is produced using an etching solution which is provided in one of the chambers, contains active etching ions, while the other chamber contains a solution, which does not have an etching action. An electrical field is generated through the membrane. The etching progresses along ion tracks in the membrane and first produces one funnel-shaped pore per ion track. Immediately prior to the breakthrough, the ions, which do not have an etching action, begin to penetrate the still existent thin layer with fine pores—the active layer—and displace the ions with an etching action. An intensified electric current, driven by the adjacent field, is established and the etching process at the bottom of the pore shifts sideways according to the concentration of etching ions still present. The process is stopped by deactivating the field and flushing the membrane.

Abstract: The present invention is directed to nanoporous metal membranes and methods of making nanoporous metal membranes from metal leaf. At least a portion of the metal leaf is freely supported by a de-alloying medium for a time effective to de-alloy the metal leaf. After the porous membrane is formed, the membrane may be re-adhered to a substrate and removed from the de-alloying medium. The de-alloying process may be thermally and electrically influenced.

Abstract: A structural body material layer is formed directly on a base substrate or via a sacrificing layer or a peeling layer, a groove is fabricated electrochemically along an outer configuration shape of a part constituting an object at the structural body material layer and thereafter, only the sacrificing layer or the base substrate is selectively removed or the part is mechanically separated from the peeling layer to thereby separate the part and the base substrate and provide the part constituting the object or fabricate a part having a movable portion by partially restricting a portion to be separated.