Abstract: A composition for copper plating and associated methods, a method of forming a copper wiring including forming an insulation layer having a recessed portion on a substrate, and forming a copper layer on the insulation layer to fill the recessed portion by performing an electroplating process using a composition that includes an aqueous electrolyte solution containing a copper ion and at least one of a disulfide compound represented by Formula 1, a betaine compound represented by at least one of Formulae 3 and 4, and a triblock copolymer of polyethylene oxide-polypropylene oxide-polyethylene oxide (PEO-PPO-PEO) having a weight average molecular weight of about 2,500 to about 5,000 g/mol and an ethylene oxide content (EO %, w/w) of about 30% to about 60%.

Abstract: A printed circuit board includes an insulating layer, a copper layer formed on the insulating layer and a reinforcing layer formed on the copper layer at opposite sides of the given portion. The copper layer includes a plurality of electrical traces at a given portion thereof. A thickness of the reinforcing layer increases in a direction away from the given portion. A method for manufacturing the printed circuit board is also provided in this disclosure.

Abstract: A sensor utilizing a non-leachable or diffusible redox mediator is described. The sensor includes a sample chamber to hold a sample in electrolytic contact with a working electrode, and in at least some instances, the sensor also contains a non-leachable or a diffusible second electron transfer agent. The sensor and/or the methods used produce a sensor signal in response to the analyte that can be distinguished from a background signal caused by the mediator. The invention can be used to determine the concentration of a biomolecule, such as glucose or lactate, in a biological fluid, such as blood or serum, using techniques such as coulometry, amperometry, and potentiometry. An enzyme capable of catalyzing the electrooxidation or electroreduction of the biomolecule is typically provided as a second electron transfer agent.

Abstract: A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.

Abstract: An electrode is described. The electrode includes a substrate having a first and a second surface, a conductive layer, multilayer structure having alternating layers of at least one polymer layer and at least one electroactive chemical bound nanoparticle layer. The conductive layer is disposed on the second surface of the substrate, and the multilayer structure is disposed on the conductive layer.

Abstract: A method of performing electrochemical deposition is provided to minimize overburden. A constant plating voltage (and a variable plating current) is applied across a semiconductor structure (e.g., patterned dielectric layer) and a metal electrode, which are both submerged in an electrolyte that contains both suppressor and accelerator molecules. The constant plating voltage is selected such that the suppressor molecules are predominantly active on the flat upper surface of the patterned dielectric layer, and the accelerator molecules are predominantly active within the patterned features of the patterned dielectric layer. As a result, metal is deposited at a relatively high rate within the patterned features, and at a relatively low rate on the flat upper surface areas of the patterned dielectric layer. Consequently, the patterned features are filled with metal before significant overburden can be formed over the flat upper surface areas of the patterned dielectric layer.

Abstract: Provided is a gas molecule sensor, characterized in that the sensing element is a polycrystalline tin oxide film having a thickness less than 1 ?m. The sensing element is produced by electrolytic deposit of a tin film on an insulating support in an electromechanical cell, where the anode is comprised of tin and the cathode is a conductive film applied on the surface of the insulating support at one of its ends, the two electrodes being separated by an electrolyte comprised of a tin salt solution, and by passing a constant current through said cell. The deposit step is followed by an oxidizing step.

Abstract: There is provided a semiconductor device comprising: a first plating layer formed on one surface of an interconnect pattern; a second plating layer formed within through holes in the interconnect pattern; a semiconductor chip electrically connected to the first plating layer; an anisotropic conductive material provided on the first plating layer; and a conductive material provided on the second plating layer, wherein the first plating layer has appropriate adhesion properties with the anisotropic conductive material, and the second plating layer has appropriate adhesion properties with the conductive material.

Abstract: A process is provided for coating metallic workpieces with a bearing material, wherein the workpiece first receives a hard chromium plating having a pearl or columnar structure type surface. A predominantly silver layer is then galvanically deposited, which fills in and smooths the pearl or columnar structure type surface of the hard chromium plating. Optionally, additional hard chromium platings and predominantly silver-containing layers may be applied, preferably galvanically. The predominantly silver layer may advantageously contain a graphite component.

Abstract: A two-layer copper polyimide substrate includes a modified layer on the surface of a polyimide film having a thickness of not more than 200 ?, and preferably not less than 50 ?, as evaluated by a method by dyeing a section thereof with a silver nitrate aqueous solution and observing it by a transmission electron microscope (TEM). A metal seed layer is formed on the polyimide film surface, followed by forming a copper layer thereon by copper electroplating or copper electroless plating or a combination of the both, providing a two-layer copper polyimide substrate in which any of an initial adhesion, a heat resistant adhesion after standing in air at 150° C. for 168 hours, and a PCT adhesion after PCT test at 121° C. and at a humidity of 95% under 2 atmospheres for 100 hours are 400 N/m or more.

Abstract: A low temperature method for forming a microcavity on a substrate and article having same are provided which utilize electroplated films. The method is particularly useful to package microelectromechanical systems (MEMS) in vacuum on the wafer level and provide sealed feedthroughs to the outside world. The method may be performed in a batch process to substantially reduce cost and to form metal diaphragms. Furthermore, the method is performed at near room temperature, which provides more flexibility in the manufacturing process. The method enables substantial cost savings in the production of vacuum-sealed MEMS. Many feedthroughs can be incorporated into the package to transfer signals in and out of the package. One significant advantage of this method is that it does not require bonding of a second substrate, which reduces the system cost.

Abstract: An electrode assembly arrangement for improving an electrodeposition process and method for using the same the electrode assembly arrangement including a first electrode assembly and a second electrode assembly positioned to carry a metal containing electrolyte from the first electrode assembly to the second electrode assembly for deposition of the metal upon applying an electrical potential therebetween; at least one additional electrode assembly including a means for selectively applying an electrical potential thereto the at least one additional electrode assembly positioned to attract an electrolyte flow upon applying an electrical potential between the at least one additional electrode assembly and the second electrode assembly.

Abstract: A single delivery channel is formed by, and between, inner wall 2 and baffle 3. Electrolyte 5 is pumped up the interior of channel 1 and is directed onto substrate 4 being a cathode maintained at −10 volts. The upper part of the inner wall 2 of channel 1 forms the anode such that electrote is forced between the substrate and the upper horizontal surface of the anode 6. A second baffle 7 is provided in order to assist in collecting and removing electrolyte 5 after impingement with substrate 4, possible for re-use. Contact between the electrolyte 5 and substrate 4 is optimised by providing the electrolyte with a swirling motion as it passes up channel 1. Anode 6 is a solid conducting bar 10, alternatively it is formed of solid rods 11 nor tubes 12.

Abstract: A multilayer engine bearing (10) includes a steel backing (12) having a liner (14) of bearing metal of either copper-lead or aluminum alloys formed on the backing (12). A multilayer overplate (24, 124) is formed on the base lining member (16) and includes at least a first layer (28, 128) electrodeposited from a bath at a first current density to a desired thickness, and at least one additional layer (26, 126) electrodeposited from the same bath but at a different current density and to a desired thickness to yield a composite lamellar overplate structure having layers with differing deposit characteristics, such as hard and soft layers, generated from the same bath at different current densities.

Abstract: An apparatus comprising an electrolyte cell, an anode, and a porous rigid diffuser. The electrolyte cell is configured to receive a substrate to have a metal film deposited thereon. An anode is contained within the electrolyte cell. A porous rigid diffuser is connected to the electrolyte cell and extends across the electrolyte cell. The diffuser is positioned between a location that the substrate is to be positioned when the metal film is deposited thereon and the anode.

Abstract: A multilayer engine bearing (10) includes a steel backing (12) having a liner (14) of bearing metal of either copper-lead or aluminum alloys formed on the backing (12). A multilayer overplate (24, 124) is formed on the base lining member (16) and includes at least a first layer (28, 128) electrodeposited from a bath at a first current density to a desired thickness, and at least one additional layer (26, 126) electrodeposited from the same bath but at a different current density and to a desired thickness to yield a composite lamellar overplate structure having layers with differing deposit characteristics, such as hard and soft layers, generated from the same bath at different current densities.

Abstract: Method for producing a nickel foam having a specific weight of between 200 and 400 g/m2, at least comprising the steps of:

Abstract: In electroplating a metal layer on a semiconductor wafer, the resistive voltage drop between the edge of the wafer, where the electrical terminal is located, and center of the wafer causes the plating rate to be greater at the edge than at the center. As a result of this so-called "terminal effect", the plated layer tends to be concave. This problem is overcome by first setting the current at a relatively low level until the plated layer is sufficiently thick that the resistive drop is negligible, and then increasing the current to improve the plating rate. Alternatively, the portion of the layer produced at the higher current can be made slightly convex to compensate for the concave shape of the portion of the layer produced at the lower current. This is done by reducing the mass transfer of the electroplating solution near the edge of the wafer to the point that the electroplating process is mass transfer limited in that region.

Abstract: Erosion of high density metallization areas associated with conventional damascene-CMP processing is avoided and greater planarity achieved by selectively increasing the metal overburden layer thickness at high density metallization regions. Embodiments include initially filling recesses formed in the substrate surface with a metal forming a blanket or overburden layer of the metal thereon. Regions of the blanket or overburden layer overlying regions of high density metallization are selectively electroplated to a greater thickness. The surface is then planarized by CMP, with the selectively increased thickness areas of the overburden layer compensating for greater erosion rates thereat during CMP, thereby resulting in greater planarity of the polished surface.

Abstract: An electrolytic process for metal-coating the pre-cleaned surface of a workpiece of an electrically conducting material, which process comprises:i) providing an electrolytic cell with a cathode comprising the workpiece and an anode comprising the metal for metal-coating of the surface of the workpiece;ii) introducing an electrolyte into the zone created between the anode and the cathode by causing it to flow under pressure through at least one opening in the anode impinge on the cathode; andiii) applying a voltage between the anode and the cathode and operating in a regime in which the electrical current decreases or remains substantially constant with increase in the voltage applied between the anode and the cathode, and in a regime in which discrete gas bubbles are present on the surface of the workpiece during treatment.

Abstract: A screen material is described which is formed by cladding, using electroplating, a structure composed of strands or fibers. The structure may incorporate a knit, woven or nonwoven material or, alternatively, of strands or fibres welded together, wound strands or fibers. The structure may be subjected to a calendering operation. The screen material, after having been provided, if required, with an electrically conductive cladding, is provided with a metal layer in an electroplating operation under conditions in which an overgrowth ratio R greater than 1 is achieved. The invention also describes a method for manufacturing such a screen material which preferably involves making use of an electroplating bath for depositing a metal cladding on a starting material in which a chemical compound is present which increases the overgrowth ratio R. The method can be implemented using a variety of conditions which can lead to an overgrowth ratio R of a desired value.

Abstract: A steel component is provided on its surface with an electroplated anti-corrosive coating of a metallic material and has a hardness of at least 650 HV, the anti-corrosive coating being thinner than the surface roughness which the hardened component had before the application of the protective coating. Advantageously, the component is a rolling bearing component with a surface roughness R.sub.z of 0.3 to 9.0 .mu.m and a coating thickness of 0.1 to 3.0 .mu.m. Preferably, the anti-corrosive coating comprises a zinc-cobalt alloy, a zinc-iron alloy or a zinc-nickel alloy coating. It is possible to add iron, tin, copper or chromium to the coating composition.

Abstract: A vacuum metallized polyimide film comprising an aromatic polyimide layer containing a hydrocarbyl tin compound in oxidation states (II) or (IV) as an additive and a metal plated layer bonded integrally with a high bonding strength or high adhesion through a vacuum deposited metal layer without the use of an adhesive. The metallized polyimide film can be used for flexible printed circuits and multilayer printed wiring boards, as well as for heaters, antennas and antistatic films.

Abstract: A method for forming solid electrolytic capacitors provides for anode lead and body surface with increased dielectric thickness as distinguished from a dielectric thickness formed within the inner anode body such that a capacitance value associated therewith is not substantially decreased. The method includes the steps of anodizing the anode to form a predetermined dielectric thickness on the anode and then soaking the anode in a solvent to impregnate an inner portion thereof with the solvent. The solvent is removed from surface areas desired to be coated by a further dielectric layer and thereafter again anodized whereby additional dielectric build-up is limited to the solvent free areas. The solvent is driven off resulting in a capacitor preform which is reinforced by thickened dielectric without capacitance loss which would result from depositing additional dielectric interiorly in the areas insulated from build-up by the solvent.

Abstract: A method is provided for improving the load distribution on a ramp-surface of a clutch mechanism, such as the camplate of an overrunning clutch for the turbocharger of a locomotive diesel engine. In addition, an improved camplate produced by such a method is also provided in accordance with this invention. The method involves an electroplating process in which the electrostatic field is uniquely shaped so as to concentrate the electrostatic flux at a central region of the ramp surface, such that a greater amount of plating metal is deposited in the central region of the ramp surface as compared to the edges of the ramp surface. As a result, the ramp surface has a crowned contour as defined by the plating alone, and does not require a pre- or post-plating crown grind operation. The crowned contour serves to advantageously distribute a load over the ramp surface, so as to promote a longer service life for the camplate.

Abstract: A cationically electrodepositable finely divided gelled polymer obtained by emulsion-polymerizing, in the presence of a water-soluble or water-dispersible cationic resin, a monomer component (A) comprising(a) a polymerizable unsaturated vinylsilane monomer having a vinylic double bond and a hydrolyzable akloxysilane group,(b) a polymerizable monomer having at least two radically polymerizable unsaturated groups in the molecule,(c) a polymerizable unsaturated monomer having a vinylic double bond and a hydroxyl group, and(d) other polymerizable unsaturated monomer, and a cationically electrodepositable finely divided gelled polymer obtained by emulsion-polymerizing, in the presence of the above finely divided gelled polymer, a monomer component (B) comprising(e) a blocked mono- or polyisocyanate in which the at least one isocyanate group in the molecule is blocked with a radically polymerizable monohydroxy compound,(f) a polymerizable unsaturated monomer having a vinylic double bond and a hydroxyl group, and(g)

Abstract: A contact member for thermocompression bonding in integrated circuit packaging has on a conductor end a uniform texture deformable layer with a hardness value in the range of that of soft gold which is approximately 90 on the Knoop scale and with a rough surface morphology having ridges with approximately 1 micrometer modulation frequency and a depth between ridges of from 1/4 to 1/2 that of the average integrated circuit pad. The deformable layer is produced by plating gold in a strong electronegative plating bath within a range of 0.03 to 0.05 mA/sq.mm. current density. Plating apparatus, for plating different areas, with different electronegative conditions, with separate independently powered anodes, is provided.

Abstract: A method of forming conductor lines of a semiconductor device comprises a step of depositing (electroplating) a gold (Au) layer on an underlying barrier conductive layer in a gold plating bath. According to the present invention, the plating bath is supplemented with an additive in amount such that a lead (iron or nickel) concentration of the bath is form 0.7 to 10 ppm, whereby a deposition rate of the gold near a patterned resist layer is lowered, in comparison with that at the center part of the uncovered conductive layer. The gold plated layer has round edges at the both corners thereof, and therefore, when a protective insulating layer is formed over the gold plated layer, the round edges improve the step coverage of and prevent the appearance of cracks in the protective layer.