Ultra Pure Water (e.g., Conductivity Water) Patents (Class 210/900)
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Patent number: 6494223Abstract: A wet cleaning apparatus can remove trace heavy metals, colloidal matter or other impurities contained in ultra-pure water to be used as rinse water in semiconductor cleaning processes and suppress deposit of trace impurities such as heavy metals or other particles that would otherwise cause characteristics of such devices to deteriorate. A wet cleaning apparatus for rinsing with ultra-pure water as a rinse liquid by supplying ultra-pure water through a piping to a rinse location inside the apparatus. The rinse location is a point of use of the ultra-pure water. The wet cleaning apparatus includes a module filled with porous film in which polymer chains having at least one of an anion exchange group, a cation exchange group, and a chelating group are held in the middle of the piping positioned inside the apparatus. The wet cleaning apparatus further includes a means for adding hydrogen gas to the rinse liquid.Type: GrantFiled: September 22, 2000Date of Patent: December 17, 2002Assignees: Organo CorporationInventors: Tadahiro Ohmi, Kazuhiko Kawada, Toshihiro II, Masatoshi Hashino, Noboru Kubota
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Publication number: 20020179508Abstract: There is disclosed a system capable of purifying water to a laboratory grade level that uses redox media, high energy catalytic activated carbon, ultraviolet radiation and high purity ion exchange media in series filtration. The system produces purified water having a specific resistance of at least 18.2 megohm·cm at 25° C. with low organic carbon content. The system is designed to be fabricated on a sufficiently small scale to fit on a lab bench top.Type: ApplicationFiled: June 1, 2001Publication date: December 5, 2002Inventors: Charles T. Nachtman, William P. Johll, Helmut R.H. Gideon, Timothy T. Dunwoody, Jamie C. Carr, Thomas Scholz
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Patent number: 6488271Abstract: A method for increasing the quantity of a gas, e.g., ozone, dissolved in a liquid, e.g., ultrapure deionized water, are provided. The gas to be dissolved is introduced to the liquid under pressure and the resulting admixture delivered to the end-use station under pressure. Once at the end-use station, the admixture including the liquid and dissolved gas is subjected to controlled dispensing to maintain a high concentration of gas in the dispensed admixture.Type: GrantFiled: February 11, 1999Date of Patent: December 3, 2002Assignee: FSI International, Inc.Inventors: Steven L. Nelson, Kurt K. Christenson
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Patent number: 6485649Abstract: Input water is preheated in a heat exchanger (2), pumped (4) through another heat exchanger (5) into a heating unit (6). The heating unit heats the water to a temperature of above 100° C., preferably 140-150° C., while maintaining the water in a liquid state without vaporization. A pump (8) feeds the heated water under sufficient pressure to prevent vaporization to at least one crossflow filtration unit (9). A portion of the heated water passes through a thermally stable filtration material having a pore size of 1-20 nanometers for filtering endotoxins and pyrogens, 4-10 nanometers for filtering viruses, or 100 nanometers−30 &mgr;m for filtering bacteria. Heated water which has passed through the filtration material is fed through a pure water product outlet of the filtration unit to a pure water outlet (16). A retenate portion of the heated water flows past the filtration material to carry filtered impurities through a retenate output line (10).Type: GrantFiled: May 9, 2000Date of Patent: November 26, 2002Assignee: Steris Europe, Inc.Inventors: Jorma Terävä, Teppo Nurminen
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Patent number: 6464867Abstract: An apparatus for producing water containing dissolved ozone which comprises (A) a piping for supplying ultrapure water through which ultrapure water is supplied, (B) a catalytic reaction portion which is connected with the piping for supplying ultrapure water and in which the ultrapure water is brought into contact with an oxidation-reduction catalyst, (C) a filtration apparatus by which the ultrapure water treated in the catalytic reaction portion is filtered and (D) an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water discharged from the filtration apparatus; and an apparatus for producing water containing dissolved ozone which comprises an apparatus for producing ultrapure water which is equipped with an apparatus for irradiating with ultraviolet light, an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water produced in the apparatus for producing ultrapure water and a catalytic reaction portion which is packed with an oxidation-reduction catType: GrantFiled: October 12, 2001Date of Patent: October 15, 2002Assignee: Kurita Water Industries Ltd.Inventors: Hiroshi Morita, Osamu Ota, Tetsuo Mizuniwa, Kazumi Tsukamoto
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Patent number: 6461519Abstract: A process and a configuration for producing ultra-pure water for a semiconductor manufacturing plant containing a plurality of manufacturing units. In a first purification step, untreated water undergoes preliminary purification in amounts required for the plant. In a plurality of final purification units, which are each assigned to at least one manufacturing unit, ultra-pure water of a stipulated quality is obtained from a treated water in a second purification step as a function of the process parameters of the associated manufacturing unit.Type: GrantFiled: January 12, 2000Date of Patent: October 8, 2002Assignee: Infineon Technologies AGInventor: Martin Weltzer
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Patent number: 6447684Abstract: The invention pertains to a method for simultaneously removing metallic ions and particulate material from a pH neutral solution using particle-removing membranes (e.g., ultra high molecular weight polyethylene) having immobilized ligands that possess the capacity and high equilibrium binding constants for ion removal. The method is particularly useful for simultaneously filtering/purifying deionized water.Type: GrantFiled: May 14, 2001Date of Patent: September 10, 2002Assignees: Mykrolis Corporation, IBC Advanced Technologies, Inc.Inventors: Bipin S. Parekh, Anthony J. DiLeo, Edward Deane, Ronald L. Bruening
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Patent number: 6420185Abstract: An apparatus and methods of utilizing a semi-permeable membrane to concentrate contaminants in a portion of an Ultra Pure Water stream to levels which are detectable by an on-line analyzer. This allows the use of analyzers that would not be able to accurately detect contaminant concentrations in the Ultra Pure Water stream. Thus, by knowing the concentration factor and the level of contaminants in the concentrated stream indicated by the analyzer the real level of contamination can be back calculated.Type: GrantFiled: September 28, 1999Date of Patent: July 16, 2002Assignee: Intel CorporationInventor: Gregory E. Carr
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Patent number: 6416676Abstract: In microelectronics (semiconductor) processing, pitting and voiding of aluminum and aluminum alloys by deionized (DI) water is prevented. The present method and apparatus degasifies the DI water to remove the dissolved oxygen gas. The oxygen gas concentration of the DI water is thus reduced from the saturation levels typically present to vastly less than saturation. It has been found that oxygen gas serves as the oxidizing agent in an electro-chemical reaction that includes the aluminum metal as the anode. The degasified DI water can be used at high temperatures and for long exposure times to rinse wafers without problematic aluminum etching. The present method is applicable to any semiconductor wafer fabrication or integrated circuit assembly process that uses DI water in contact with aluminum metallization.Type: GrantFiled: June 27, 1996Date of Patent: July 9, 2002Assignee: National Semiconductor CorporationInventor: Rodney L. Hill
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Patent number: 6409918Abstract: An ozonated ultrapure water supply system that prevents reduction of the dissolved ozone concentration in the supply pipe system and maintains the dissolved ozone at points of use along the supply system at desired concentrations. This permits the system to supply ozonated water in long pipes. The system includes a sequential arrangement of a circulatory main pipe 3 for supplying ultrapure water, an ozonated gas supplying device 4, and at least two output branch lines 8 each having a gas/liquid separation device 9 and an ultimate point of use 7. The output branch lines are spaced downstream from the ozonated gas supplying device such that the ozone concentration in the ultrapure water has increased to a stable level and the ozonated ultrapure water at each output branch line is at this same stable ozone concentration.Type: GrantFiled: November 4, 1998Date of Patent: June 25, 2002Assignee: Kurita Water Industries Ltd.Inventors: Hiroshi Morita, Tetsuo Mizuniwa, Junichi Ida
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Patent number: 6398965Abstract: A water treatment system and process for removing weakly ionized and/or organic materials from the water by intra-system pH adjustment. An exemplary embodiment of the system includes an inlet through which a feedstream passes into a first chemical treating unit wherein the pH of the feedstream is maintained below about 7 to substantially reduce a concentration of weakly basic components in the water by chemical conversion to a more ionized state. A first water treatment unit is positioned downstream of the first chemical treating unit to substantially remove ionized components in the stream, and produce a first product stream. In various embodiments, the first water treatment unit can be selected from the group consisting of a media filter unit, a water softener unit, a dechlorination unit, and combinations thereof.Type: GrantFiled: March 31, 1998Date of Patent: June 4, 2002Assignee: United States Filter CorporationInventors: John W. Arba, Gary V. Zoccolante, Jonathan H. Wood, Gary C. Ganzi
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Patent number: 6312597Abstract: The invention relates to a wafer rinsing system for rinsing chemicals and particles off of wafers without introducing contaminants. The system reduces the particle count on wafers by filtering the water and the gas used during rinsing at the wet bench. The system includes a rinsing unit, a local water filter bank, a local gas filtering system, an H2O2 injection unit, an auxiliary chemical injection unit, and a controller for operating the other components. The water filter bank provides a multiple stage filtering system to eliminate particles without a substantial drop in water pressure. The H2O2 injection unit provides a local source of H2O2 to clean the filter and rinser and to provide a mechanism for controlling the formation of native oxide on the wafer during rinsing. The auxiliary chemical injection unit provides a chemical additive to the rinsing unit to enhance the wafer cleaning process. The gas filtering system provides clean gas to the rinsing unit and to the injection units.Type: GrantFiled: December 1, 1995Date of Patent: November 6, 2001Assignee: SCD Mountain View, Inc.Inventors: Raj Mohindra, Abhay K. Bhushan, Rajiv Bhushan, Suraj Puri
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Patent number: 6303037Abstract: A reverse osmosis treatment of feed water containing at least silica and hardness ions for separating the feed water into permeate water and concentrate is effected while maintaining the pH of the concentrate at a level of at most 6. According to the foregoing process, silica can be prevented from precipitating, and a high recovery of permeate water can be secured.Type: GrantFiled: December 14, 1994Date of Patent: October 16, 2001Assignee: Organo CorporationInventors: Makio Tamura, Akitoshi Shinbo
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Patent number: 6274040Abstract: There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.Type: GrantFiled: March 6, 1997Date of Patent: August 14, 2001Assignee: Alps Electric Co., Ltd.Inventors: Kenichi Mitsumori, Yasuhiko Kasama, Akira Nakano, Akira Abe, Tadahiro Ohmi
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Patent number: 6267891Abstract: A method of producing high purity water using weak acid cation exchange for dealkalization and a double pass reverse osmosis membrane system having enhanced membrane life.Type: GrantFiled: July 30, 1999Date of Patent: July 31, 2001Assignee: Zenon Environmental Inc.Inventors: Anthony A. Tonelli, Eric Harrison, Susan Leanne Wesno, Hadi Husain, Andrew Benedek
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Publication number: 20010009238Abstract: Apparatus and method for controlling the resistivity of water. The apparatus includes a diffuser injector for mixing water and a water soluble gas such as carbon dioxide gas and that defines an inlet conduit through which water to be treated is communicated and an output conduit from which treated water is discharged. A diffuser tube is disposed within one of the conduits for injecting carbon dioxide gas into the water. A proportional control valve provides carbon dioxide gas from a carbon dioxide tank to the carbon dioxide diffuser tube. Downstream from the diffuser injector are a static mixer for further intermingling the water and carbon dioxide gas and a serially connected contact chamber for enhancing the stability in the resistivity level of the water. A resistivity monitor measures the resistivity of the water and carbon dioxide mixture and transmits a signal to a controller.Type: ApplicationFiled: October 2, 1998Publication date: July 26, 2001Applicant: KINETICO INCORPORATEDInventors: JOHN A. MOSHEIM, WILLIAM S. BANHAM
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Patent number: 6261456Abstract: Waste water containing fluorine, nitrogen and organic matter is treated by introducing the waste water into a water tank filled with calcium carbonate mineral and anaerobic microorganic sludge. An upper portion of the water tank is occupied by the anaerobic microorganic sludge concurrently with natural precipitation of the calcium carbonate mineral toward a lower portion of the water tank. Calcium ions dissolving from the calcium carbonate mineral precipitated in the lower portion of the water tank are made to chemically react with the fluorine in the waste water. At the same time, the organic matter in the waste water is treated by utilizing anaerobic microorganisms in the anaerobic microorganic sludge in the upper portion of the water tank. The nitrogen in the waste water is treated to be reduced by reducibility that the anaerobic microorganisms in the waste water own.Type: GrantFiled: June 29, 1999Date of Patent: July 17, 2001Assignee: Sharp Kabushiki KaishaInventors: Kazuyuki Yamasaki, Kazuyuki Sakata
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Patent number: 6258278Abstract: A method of producing high purity water using dealkalization and a double pass reverse osmosis membrane system having enhanced membrane life.Type: GrantFiled: June 11, 1999Date of Patent: July 10, 2001Assignee: Zenon Environmental, Inc.Inventors: Anthony A. Tonelli, Eric Harrison, Susan Leanne Wesno, Hadi Husain, Andrew Benedek
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Patent number: 6187201Abstract: A system for producing ultra-pure water having an electrodialysis unit 1, which has a membrane selectively permeable to monovalent cations and a membrane selectively permeable to monovalent anions, and a reverse osmosis unit 5 which is connected after the electrodialysis unit 1 in series.Type: GrantFiled: November 4, 1996Date of Patent: February 13, 2001Assignee: Nomura Micro Science Co., Ltd.Inventors: Mitsugu Abe, Yoshiaki Noma
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Patent number: 6177005Abstract: Ultrapure water having a reduced amount of TOC and a low electrical conductivity is produced in correspondence with a variation in water quality of raw water. A first water tank has an anaerobic organic matter treatment chamber and an aerobic organic matter treatment chamber which are communicated with each other at their bottom portions. Activated carbon bags are arranged in upper portions of both the chambers, and Bincho charcoal is stowed in the lower portion of the chambers. With this arrangement, carbon compounds and organic nitrogen compounds in the water to be treated are biologically treated by microbes, thereby reducing the TOC. Furthermore, nitrate nitrogen generated through the organic nitrogen compound treatment process is denitrified by the anaerobic microbe, thereby reducing the electrical conductivity of the water to be treated.Type: GrantFiled: October 6, 1998Date of Patent: January 23, 2001Assignee: Sharp Kabushiki KaishaInventors: Kazuyuki Yamasaki, Toyoichi Nasu, Takahide Miyamoto, Seiji Okamoto, Kazuyuki Sakata, Masami Sera, Atsushi Yokotani
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Patent number: 6129845Abstract: A photo-oxidation device of a water treatment system photo-oxidizes organic material, in particular, aromatic organic material, in the water to facilitate its removal from the water. The photo-oxidation device includes a UV lamp, a flow channel in which the UV lamp is disposed, and a catalyst of an oxidation reaction between an organic material and the UV radiation emitted by the UV lamp. The UV radiation emitted from the UV lamp illuminates the flow channel while the water passes through the flow channel. The catalyst, on the other hand, is fixed to an inner wall of the flow channel to foster the oxidation of the organic material by the UV radiation. The water treatment system in which the photo-oxidation device is incorporated, includes a pre-treatment unit having particle filters, a first treatment section, and a second treatment section.Type: GrantFiled: October 7, 1998Date of Patent: October 10, 2000Assignee: Samsung Electronics Co., Ltd.Inventors: Sue-ryeon Kim, Hyeon-jun Kim, Youn-chul Oh, Seung-un Kim
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Patent number: 6126834Abstract: An adaptive control method for producing high purity water, the method having the ability to produce high purity water on a continuous basis having a resistivity in the range of 0.8 to 4 megohm-cm. The method comprises the steps of providing a feedwater to be purified and providing a first reverse osmosis unit having a first high pressure side and a first low pressure side and having a first permeate produced at the first low pressure side. The pH of the feedwater to be introduced to the high pressure of the first reverse osmosis unit is monitored before introducing the feedwater to the high pressure side of the first reverse osmosis unit. Also, the feedwater is maintained in a temperature range of 45.degree. to 80.degree. F. A second reverse osmosis unit is provided having a second high pressure side and a second low pressure side for producing high purity product water.Type: GrantFiled: December 10, 1997Date of Patent: October 3, 2000Assignee: Zenon Environmental Inc.Inventors: Anthony A. Tonelli, Eric Harrison, Ake Deutschmann
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Patent number: 6110375Abstract: Water to be purified is passed through a reverse osmosis step to produce a pure water stream and a waste water stream. The waste water is directed to a deionization step to produce purified deionized water which is recycled to the reverse osmosis step. The process directs far less water to waste as compared to conventional reverse osmosis processes. The process also produces water of higher organic and inorganic purity than can be obtained by either reverse osmosis or deionization alone.Type: GrantFiled: January 11, 1994Date of Patent: August 29, 2000Assignee: Millipore CorporationInventors: Mohammed F. Bacchus, Bruce M. Dawson, Gary A. O'Neill
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Patent number: 6080316Abstract: An adaptive control method for producing high purity water, the method having the ability to produce high purity water on a continuous basis having a resistivity in the range of 0.8 to 4 megohm-cm. The method comprises the steps of providing a feedwater to be purified and providing a first reverse osmosis unit having a first high pressure side and a first low pressure side and having a first permeate produced at the first low pressure side. The pH of the feedwater to be introduced to the high pressure of the first reverse osmosis unit is monitored before introducing the feedwater to the high pressure side of the first reverse osmosis unit. A second reverse osmosis unit is provided having a second high pressure side and a second low pressure side for producing high purity product water.Type: GrantFiled: March 3, 1997Date of Patent: June 27, 2000Inventors: Anthony A. Tonelli, Eric Harrison
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Patent number: 6015493Abstract: A remote filtration unit for liquid distribution systems (LDS) used for delivering ultra-pure liquids for semiconductor manufacturing processes is provided. The filtration unit includes a plurality of filtration systems enclosed in separate compartments, wherein each compartment is served by an input and an output lead line. Using quick connect/disconnect fittings, the liquid distribution system (LDS) channel is tapped at desired locations and bypass loops are inserted in the channel. A bypass loop includes an input lead line, an associated filtration unit compartment including a filtration system, and an output lead line. Using bypass loops, LDS liquid is routed into the remote filtration system, cleaned, and then channeled back into the liquid distribution system or target product or process area.Type: GrantFiled: July 14, 1997Date of Patent: January 18, 2000Assignee: Teleparts International, Inc.Inventors: Kenneth Smith, Brent Krick, Alejandro Garcia
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Patent number: 6001238Abstract: A method of reducing the concentration of metal ions in pure water or ultrapure water and thereby obtaining pure water or ultrapure water. Such purified pure water or purified ultrapure water is used, for example, when washing semiconductor wafers, as a starting material of electrolytic ionic water, or for diluting washing water. A pair of carbon electrodes is disposed in an ultrapure water storage tank containing pure water or ultrapure water or in a purifying tank disposed in a line leading from an ultrapure water storage tank. A D.C. voltage is applied across the electrode pair. A carbon electrode material having a large specific surface area is chosen, and an electrode structure with which there is little detachment of carbon fragments is used. After the carbon electrode is molded, a carbon layer is formed on the surface of the molding by dipping the molding in an amorphous carbon bath.Type: GrantFiled: September 30, 1997Date of Patent: December 14, 1999Assignee: Kabushiki Kaisha ToshibaInventors: Jun Takayasu, Naoto Miyashita
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Patent number: 5997752Abstract: A water treating apparatus for raising oxygen solubility in high-purity drinking water includes a high pressure pump for conveying high-purity drinking water treated by an R. O. treatment, or a U. F. treatment, or a distillation treatment, or a purity treatment into a closed container. An ozone injecter injects ozone in the drinking water conveyed by the high pressure pump. A cooler affixed around the closed container cools the water stored therein to a preset value. A supersonic vibrator stirs the stored drinking water so as to raise oxygen solubility in the drinking water stored in the closed container, and to prolong period of time for sterilization.Type: GrantFiled: September 27, 1996Date of Patent: December 7, 1999Inventors: Sheng-I Leu, Shun-Chen Chen, Sheng-Shih Cheng, Kuo-Chi Ko
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Patent number: 5972293Abstract: Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.Type: GrantFiled: April 17, 1998Date of Patent: October 26, 1999Assignee: Samsung Electronics Co., Ltd.Inventors: Seung-uhn Kim, Yun-chul Oh, Sue-ryeon Kim, Jung-sung Hwang
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Patent number: 5954965Abstract: The present invention relates to a process for producing pure water having a total organic carbon content of not more than 200 ppb instantly after start of the operation of a high purity water system, comprising using as an ion exchange resin a specific strongly basic anion exchange resin and passing raw water through the high purity water system at a space velocity of not less than 20. The produced pure water is capable of producing tasteless and odorless pure water instantly after start of the operation of the high purity water system.Type: GrantFiled: March 26, 1997Date of Patent: September 21, 1999Assignee: Mitsubishi Chemical CorporationInventors: Hirohisa Kubota, Katsuhiko Yano, Junya Watanabe, Keiko Kudo
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Patent number: 5951859Abstract: An acid water obtained by electrolysis is used for wash disinfection inside an artificial dialyzer, thereby completely eliminating the bacteria, fungi, viruses, and other deposits inside the dialyzer.Type: GrantFiled: December 19, 1997Date of Patent: September 14, 1999Assignees: Miura-denshi Kabushiki-kaisha, Toshiyuki Miura, Kouken Kabushiki-kaishaInventors: Toshiyuki Miura, Tetsurou Miura
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Patent number: 5935441Abstract: Ultrapure water containing less than 10 ppt total ions, other than hydrogen ion and hydroxide ion is produced by passing deionized water through a system comprising an ultrafiltration step, an oxidizing step where water is exposed to ultraviolet light and ion exchange step. The treated water is recirculated through the oxidizing step and the ion exchange step. Product water from the system can be recovered on a continuous basis so long as the ratio of volume of water circulated within the system to volume of water drawn from the system is at least 10 and preferably at least 20.Type: GrantFiled: September 5, 1996Date of Patent: August 10, 1999Assignee: Millipore CorporationInventors: Gary A. O'Neill, Kitty K. Siu, Jeffrey P. Denoncourt
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Patent number: 5833846Abstract: A high-purity water producing apparatus has an excellent effect of environmental protection and is also capable of effectively removing boron. It comprises a pretreatment unit, and a double pass RO unit an EDI unit or a distillation unit or any combination thereof as principal deionization unit(s) but does not comprise any chemical-regeneration type ion exchanger. It further comprises a boron removing unit and the water treated by the principal deionization unit(s) is brought into contact with a boron-selective ion exchange resin.Type: GrantFiled: January 17, 1997Date of Patent: November 10, 1998Assignee: Orango CorporationInventors: Madoka Tanabe, Sakae Kaneko
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Patent number: 5811012Abstract: A deionized or high purity water producing method is describing wherein ions and non-ionic substances are removed. The method includes pretreating feed water to remove suspended non-ionic substances, containing the pretreated water with first and second ion exchange resins that include a boron selective ion exchange resin, and stratifying or mixing together the first and second resins within an ion exchange column. The boron selective ion exchange resin is included to remove boron ions contained in the pretreated water.Type: GrantFiled: January 24, 1996Date of Patent: September 22, 1998Assignee: Organo CorporationInventors: Madoka Tanabe, Sakae Kaneko, Ikuo Shindo
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Patent number: 5807486Abstract: There is disclosed a portable assembly for treating hazardous waste water having a plurality of paired filter units having filter mediums and operated at high filter rates to minimize solids build up wherein solids are caused to be smashed and broken by shear forces and wherein chemicals are sequentially added to facilitate solids reduction, to oxidize organic compounds and to precipitate dissolved solids and wherein the process stream is subjected to ultraviolet light to reduce organic loading and downstream ultra filtration units to further reduce solids followed by reverse osmosis and/or ionization treatment.Type: GrantFiled: September 18, 1996Date of Patent: September 15, 1998Assignee: Joseph B. Busch, Sr. et al.Inventor: Joseph B. Busch, Jr.
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Patent number: 5766479Abstract: A process for purifying water by removing dissolved materials therefrom, the process capable of producing purified water having a resistivity in the range of 2 to 10 megohm-cm. The process comprises providing a water feed stream to be purified and adjusting the pH of the water feed stream to a basic water solution to drive the equilibrium of a first weakly ionized material to become ionized in the basic solution. The basic water solution is introduced to a high pressure side of a first reverse osmosis membrane module and water is passed through the first reverse osmosis membrane to provide a first retentate having ions therein from the first weakly ionized material concentrated therein and a first permeate depleted in ions from the first weakly ionized material. The pH of the first permeate is adjusted to an acidic water solution to drive the equilibrium of a second weakly ionized material to become ionized in an acidic solution.Type: GrantFiled: August 7, 1995Date of Patent: June 16, 1998Assignee: Zenon Environmental Inc.Inventors: William V. Collentro, Andrew W. Collentro
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Patent number: 5722442Abstract: A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility (front end). Anhydrous ammonia is purified by scrubbing in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.Type: GrantFiled: July 1, 1996Date of Patent: March 3, 1998Assignee: Startec Ventures, Inc.Inventors: Joe G. Hoffman, R. Scot Clark
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Patent number: 5707514Abstract: A water treating apparatus is provided which can treat waste water for use as raw water in an ultrapure water producing system without addition of various kinds of chemicals. The apparatus includes a first water tank for receiving acid waste water, a second water tank for subjecting the waste water from the first water tank to solid-liquid separation and discharging supernatant liquid, an ion exchange tank including ion exchange resin and an aeration tube for generating treated water through a membrane filter, a precipitation tank for settling ion exchange resin, an air lift pump for introducing ion exchange resin from the precipitation tank into the first water tank, and a return air lift pump for returning ion exchange resin from the second water tank to the ion exchange tank. The ion exchange resin acts to exchange ions with fluorine ions of treated water in the ion exchange tank and is regenerated by acid waste water in the first water tank.Type: GrantFiled: June 6, 1996Date of Patent: January 13, 1998Assignee: Sharp Kabushiki KaishaInventors: Kazuyuki Yamasaki, Yoshihiro Hamaguchi, Shigeki Matumoto
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Patent number: 5674431Abstract: A method for preparing a stable colloid in water in which water is enriched with respect to para water by condensing water vapor on a surface which does not decompose water into H and OH, dispersing a water insoluble material in colloidal form therein, whereby excess parawater acts as a stabilizer for the colloid, and storing the colloid in a vessel having a wall which does not decompose water into H and OH. The stability of the colloidal can be later broken by contacting it with a surface that decomposes water into H and OH.Type: GrantFiled: January 18, 1996Date of Patent: October 7, 1997Inventor: Tore Gustaf Owe Berg
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Patent number: 5670053Abstract: A process for purifying water including removing cations, anions and carbon dioxide and/or ammonia from water feed stream to produce high purity water having a resistivity of greater than 1 megohm-era comprising the steps of providing a water feed stream to be purified, the stream containing cations, anions and carbon dioxide and/or ammonia; introducing the water feed stream to a high pressure side of a first reverse osmosis membrane module; passing water through the first reverse osmosis membrane to provide a first retentate having cations and anions concentrated therein and a first permeate depleted in cations and anions and containing carbon dioxide and/or ammonia; adding the first permeate to a high pressure side, of a gas permeable hydrophobic membrane module; passing carbon dioxide and/or ammonia through the gas-permeable membrane from the first permeate in the high pressure side of the gas-permeable hydrophobic membrane to provide a carbon dioxide and/or ammonia permeate on a low pressure side of the hType: GrantFiled: August 7, 1995Date of Patent: September 23, 1997Assignee: Zenon Environmental, Inc.Inventors: William V. Collentro, Andrew W. Collentro
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Patent number: 5645727Abstract: Particle filtration of a feed of highly corrosive ultra pure water and contaminants is disclosed through a metal oxide membrane on ceramic support in combination with on-line ozonation. In one aspect, the filtering of ultra pure water includes passing the feed cross-flow through a multichannel sintered monolithic metal oxide membrane on ceramic support to form a permeate of particle-free ultra pure water. Although high recoveries per pass rates were used, no detectable metal ions including aluminum, zirconium, or yttrium ions were found in the ultra pure water permeate. The apparatus and process of the present invention for filtering ultra pure water include cross-flow filtration using multichannel monolithic ceramic membranes at suitable pore sizes in a total chemical process system including elevated temperatures and on-line ozonation sterilization of the ceramic membrane particle filter in high purity water applications for electronics manufacturing.Type: GrantFiled: May 16, 1996Date of Patent: July 8, 1997Assignee: Illinois Water Treatment, Inc.Inventors: Ramesh R. Bhave, James L. Filson
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Patent number: 5595662Abstract: A water purification device comprises a compartment for holding a supply of impure water; a purified water collection zone; and a dense hydrophilic membrane between the compartment and the purified water collection zone. The membrane is capable of functioning by membrane distillation. A water vapour condensing surface is provided in the purified water collection zone. The condensing surface is spaced from the membrane.Type: GrantFiled: August 21, 1995Date of Patent: January 21, 1997Assignee: Water Research CommissionInventor: Ronald D. Sanderson
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Patent number: 5589005Abstract: A method of washing a substrate, wherein even traces of impurities in minute and high-aspect-ratio trenches or holes can be washed and removed free from contamination by washing solution and a system and a method for producing ultrapure water, capable of producing ultrahigh pure water for using in the washing. At the intermediate portions of a piping for supplying a predetermined ultrapure water to a use point, there are provided: a first steam generating means for heating a ultrapure water for conversion into a first steam; a steam heating means for further heating the first steam for conversion into a second steam higher in temperature than the first steam; and cooling means for cooling the second steam for conversion into a second ultrahigh water.Type: GrantFiled: May 31, 1994Date of Patent: December 31, 1996Inventor: Tadahiro Ohmi
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Patent number: 5573662Abstract: An apparatus for the treatment of a low-concentration organic waste water for relaim a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm and obtaining an ultra pure water having a TOC concentration of not more than 1 ppb is characterized by the fact that a first treating system comprising a reverse osmosis unit for transforming a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm into a low-concentration organic waste water having a TOC concentration of from 60 to 200 ppb and a vacuum degasifier adapted to admit an inert gas at a volumetric feed flow rate in the range of from 0.001 to 1.0 based on the volume of the waste water under treatment at a vacuum rate of not more than 35 Torrs and a second treating system comprising a low-pressure ultraviolet decomposition unit for emitting an ultraviolet light of a wavelength of 184.Type: GrantFiled: September 12, 1994Date of Patent: November 12, 1996Assignee: Nomura Micro Science Co., Ltd.Inventors: Mitsugu Abe, Senri Ojima
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Patent number: 5571419Abstract: Raw water is made acidic so that the pH is not more than 4.5 and heated in the presence of an oxidizing agent to decompose TOC components in the raw water, and then deionized, thereby producing ultrapure water having a greatly low concentration of organic matters.Type: GrantFiled: October 6, 1994Date of Patent: November 5, 1996Assignee: Kurita Water Insustries Ltd.Inventors: Yoshinobu Obata, Nobuhiro Orita, Hiroshi Kurobe
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Patent number: 5558775Abstract: There is disclosed a portable assembly for treating hazardous waste water having a plurality of paired filter units having filter mediums and operated at high filter rates to minimize solids build up wherein solids are caused to be smashed and broken by shear forces and wherein chemicals are sequentially added to facilitate solids reduction, to oxidize organic compounds and to precipitate dissolved solids and wherein the process stream is subjected to ultraviolet light to reduce organic loading and downstream ultra filtration units to further reduce solids followed by reverse osmosis and/or ionization treatment.Type: GrantFiled: November 1, 1994Date of Patent: September 24, 1996Assignees: Joseph Busch, Jr., Joseph Busch, Sr.Inventor: Joseph B. Busch, Jr.
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Patent number: 5536411Abstract: A water and energy recovery process for an ice rink is disclosed. The process includes softening and carbon filtering water for use as flood water on an ice rink. The water is then demineralized by reverse osmosis to produce flood water having a specific conductance of about 2 to 30 micromhos/cm. The demineralized water is heated to 90.degree. F. and utilized in a resurfacer to flood the surface of the ice rink. The ice shavings removed from the surface of the ice by the resurface are deposited into a holding means and melted by utilizing recovered heat from the ice rink's refrigeration unit. The melted water from the holding means is used as a coolant in the ice rink's refrigeration unit. The steps of the process are then repeated, utilizing the warmed water from the refrigeration unit.Type: GrantFiled: November 10, 1994Date of Patent: July 16, 1996Assignee: Bassai LimitedInventor: Russell W. Blades
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Patent number: 5518620Abstract: An apparatus for biological treatment of water in which a water containing organic matter (e.g. waste water, recovered water, or untreated water in water treatment works) is biologically treated to decompose and remove the organic matter, which apparatus comprises a formed material comprising a felt-like activated carbon fiber cloth, accomodated in the treatment vessel as a packing medium, which has a ratio of surface area (cm.sup.2) of felt-like activated carbon fiber cloth to effective volume (cm.sup.3) of the treatment vessel, of 0.5-50 cm.sup.2 /cm.sup.3, and which is arranged so that the cloth surface is vertical and the cloth-to-cloth distance is 0.5-2.0 cm, thereby shortening the rise time from operation start to stable operation, and efficiently operating over a long period of time.Type: GrantFiled: March 17, 1994Date of Patent: May 21, 1996Assignee: Organo CorporationInventors: Masahiro Eguchi, Haruki Myoga, Masaki Shimohara, Teruo Sugizaki
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Patent number: 5518627Abstract: A method for demineralizing water or an aqueous solution, which comprises contacting the water or the aqueous solution to be treated to a strongly basic anion exchanger made of a crosslinked polymer having a constituting unit of the following formula (I): ##STR1## wherein A is a C.sub.1-2 linear alkylene group, B is a C.sub.4-8 linear alkylene group, each of R1, R2 and R3 which may be the same or different, is a C.sub.1-4 alkyl group or a C.sub.2-4 alkanol group, X is a counter ion coordinated on the ammonium group, and the benzene ring D may have an alkyl group or a halogen atom as a substituent.Type: GrantFiled: March 1, 1995Date of Patent: May 21, 1996Assignees: Mitsubishi Chemical Corporation, Tohoku Electric Power Co., Inc.Inventors: Masao Tomoi, Teruo Onozuka, Manabu Shindo, Hideaki Kiniwa, Hirohisa Kubota, Shintaro Sawada
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Patent number: 5518624Abstract: Ceramic filtration of a feed solution of ultra pure water and particle contaminants is disclosed through a metal oxide membrane on ceramic support. In one aspect, the filtering of ultra pure water from a feed solution containing ultra pure water and contaminant particles includes passing the feed solution cross-flow through a multi-channel sintered monolithic metal oxide membrane on ceramic support to form a permeate of particle-free ultra pure water. The sintered metal oxide membrane has a nominal pore size in the range of about 50 to 200 Angstroms. Although high recoveries per pass rates were used, no detectable aluminum ions were found in the ultra pure water.Type: GrantFiled: May 6, 1994Date of Patent: May 21, 1996Assignee: Illinois Water Treatment, Inc.Inventors: James L. Filson, Wesley R. Carrera, Ramesh R. Bhave
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Patent number: 5516429Abstract: A fluid dispensing system is provided which has first diaphragm pump means, a filter connected to receive the discharge of said first pump, and accumulator/second diaphragm pump means connected to receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid.Type: GrantFiled: August 18, 1993Date of Patent: May 14, 1996Assignee: FAStar, Ltd.Inventors: Ocie T. Snodgrass, Michael K. Farney, Gregory M. Gibson