Ultra Pure Water (e.g., Conductivity Water) Patents (Class 210/900)
  • Patent number: 6494223
    Abstract: A wet cleaning apparatus can remove trace heavy metals, colloidal matter or other impurities contained in ultra-pure water to be used as rinse water in semiconductor cleaning processes and suppress deposit of trace impurities such as heavy metals or other particles that would otherwise cause characteristics of such devices to deteriorate. A wet cleaning apparatus for rinsing with ultra-pure water as a rinse liquid by supplying ultra-pure water through a piping to a rinse location inside the apparatus. The rinse location is a point of use of the ultra-pure water. The wet cleaning apparatus includes a module filled with porous film in which polymer chains having at least one of an anion exchange group, a cation exchange group, and a chelating group are held in the middle of the piping positioned inside the apparatus. The wet cleaning apparatus further includes a means for adding hydrogen gas to the rinse liquid.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: December 17, 2002
    Assignees: Organo Corporation
    Inventors: Tadahiro Ohmi, Kazuhiko Kawada, Toshihiro II, Masatoshi Hashino, Noboru Kubota
  • Publication number: 20020179508
    Abstract: There is disclosed a system capable of purifying water to a laboratory grade level that uses redox media, high energy catalytic activated carbon, ultraviolet radiation and high purity ion exchange media in series filtration. The system produces purified water having a specific resistance of at least 18.2 megohm·cm at 25° C. with low organic carbon content. The system is designed to be fabricated on a sufficiently small scale to fit on a lab bench top.
    Type: Application
    Filed: June 1, 2001
    Publication date: December 5, 2002
    Inventors: Charles T. Nachtman, William P. Johll, Helmut R.H. Gideon, Timothy T. Dunwoody, Jamie C. Carr, Thomas Scholz
  • Patent number: 6488271
    Abstract: A method for increasing the quantity of a gas, e.g., ozone, dissolved in a liquid, e.g., ultrapure deionized water, are provided. The gas to be dissolved is introduced to the liquid under pressure and the resulting admixture delivered to the end-use station under pressure. Once at the end-use station, the admixture including the liquid and dissolved gas is subjected to controlled dispensing to maintain a high concentration of gas in the dispensed admixture.
    Type: Grant
    Filed: February 11, 1999
    Date of Patent: December 3, 2002
    Assignee: FSI International, Inc.
    Inventors: Steven L. Nelson, Kurt K. Christenson
  • Patent number: 6485649
    Abstract: Input water is preheated in a heat exchanger (2), pumped (4) through another heat exchanger (5) into a heating unit (6). The heating unit heats the water to a temperature of above 100° C., preferably 140-150° C., while maintaining the water in a liquid state without vaporization. A pump (8) feeds the heated water under sufficient pressure to prevent vaporization to at least one crossflow filtration unit (9). A portion of the heated water passes through a thermally stable filtration material having a pore size of 1-20 nanometers for filtering endotoxins and pyrogens, 4-10 nanometers for filtering viruses, or 100 nanometers−30 &mgr;m for filtering bacteria. Heated water which has passed through the filtration material is fed through a pure water product outlet of the filtration unit to a pure water outlet (16). A retenate portion of the heated water flows past the filtration material to carry filtered impurities through a retenate output line (10).
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: November 26, 2002
    Assignee: Steris Europe, Inc.
    Inventors: Jorma Terävä, Teppo Nurminen
  • Patent number: 6464867
    Abstract: An apparatus for producing water containing dissolved ozone which comprises (A) a piping for supplying ultrapure water through which ultrapure water is supplied, (B) a catalytic reaction portion which is connected with the piping for supplying ultrapure water and in which the ultrapure water is brought into contact with an oxidation-reduction catalyst, (C) a filtration apparatus by which the ultrapure water treated in the catalytic reaction portion is filtered and (D) an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water discharged from the filtration apparatus; and an apparatus for producing water containing dissolved ozone which comprises an apparatus for producing ultrapure water which is equipped with an apparatus for irradiating with ultraviolet light, an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water produced in the apparatus for producing ultrapure water and a catalytic reaction portion which is packed with an oxidation-reduction cat
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: October 15, 2002
    Assignee: Kurita Water Industries Ltd.
    Inventors: Hiroshi Morita, Osamu Ota, Tetsuo Mizuniwa, Kazumi Tsukamoto
  • Patent number: 6461519
    Abstract: A process and a configuration for producing ultra-pure water for a semiconductor manufacturing plant containing a plurality of manufacturing units. In a first purification step, untreated water undergoes preliminary purification in amounts required for the plant. In a plurality of final purification units, which are each assigned to at least one manufacturing unit, ultra-pure water of a stipulated quality is obtained from a treated water in a second purification step as a function of the process parameters of the associated manufacturing unit.
    Type: Grant
    Filed: January 12, 2000
    Date of Patent: October 8, 2002
    Assignee: Infineon Technologies AG
    Inventor: Martin Weltzer
  • Patent number: 6447684
    Abstract: The invention pertains to a method for simultaneously removing metallic ions and particulate material from a pH neutral solution using particle-removing membranes (e.g., ultra high molecular weight polyethylene) having immobilized ligands that possess the capacity and high equilibrium binding constants for ion removal. The method is particularly useful for simultaneously filtering/purifying deionized water.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: September 10, 2002
    Assignees: Mykrolis Corporation, IBC Advanced Technologies, Inc.
    Inventors: Bipin S. Parekh, Anthony J. DiLeo, Edward Deane, Ronald L. Bruening
  • Patent number: 6420185
    Abstract: An apparatus and methods of utilizing a semi-permeable membrane to concentrate contaminants in a portion of an Ultra Pure Water stream to levels which are detectable by an on-line analyzer. This allows the use of analyzers that would not be able to accurately detect contaminant concentrations in the Ultra Pure Water stream. Thus, by knowing the concentration factor and the level of contaminants in the concentrated stream indicated by the analyzer the real level of contamination can be back calculated.
    Type: Grant
    Filed: September 28, 1999
    Date of Patent: July 16, 2002
    Assignee: Intel Corporation
    Inventor: Gregory E. Carr
  • Patent number: 6416676
    Abstract: In microelectronics (semiconductor) processing, pitting and voiding of aluminum and aluminum alloys by deionized (DI) water is prevented. The present method and apparatus degasifies the DI water to remove the dissolved oxygen gas. The oxygen gas concentration of the DI water is thus reduced from the saturation levels typically present to vastly less than saturation. It has been found that oxygen gas serves as the oxidizing agent in an electro-chemical reaction that includes the aluminum metal as the anode. The degasified DI water can be used at high temperatures and for long exposure times to rinse wafers without problematic aluminum etching. The present method is applicable to any semiconductor wafer fabrication or integrated circuit assembly process that uses DI water in contact with aluminum metallization.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: July 9, 2002
    Assignee: National Semiconductor Corporation
    Inventor: Rodney L. Hill
  • Patent number: 6409918
    Abstract: An ozonated ultrapure water supply system that prevents reduction of the dissolved ozone concentration in the supply pipe system and maintains the dissolved ozone at points of use along the supply system at desired concentrations. This permits the system to supply ozonated water in long pipes. The system includes a sequential arrangement of a circulatory main pipe 3 for supplying ultrapure water, an ozonated gas supplying device 4, and at least two output branch lines 8 each having a gas/liquid separation device 9 and an ultimate point of use 7. The output branch lines are spaced downstream from the ozonated gas supplying device such that the ozone concentration in the ultrapure water has increased to a stable level and the ozonated ultrapure water at each output branch line is at this same stable ozone concentration.
    Type: Grant
    Filed: November 4, 1998
    Date of Patent: June 25, 2002
    Assignee: Kurita Water Industries Ltd.
    Inventors: Hiroshi Morita, Tetsuo Mizuniwa, Junichi Ida
  • Patent number: 6398965
    Abstract: A water treatment system and process for removing weakly ionized and/or organic materials from the water by intra-system pH adjustment. An exemplary embodiment of the system includes an inlet through which a feedstream passes into a first chemical treating unit wherein the pH of the feedstream is maintained below about 7 to substantially reduce a concentration of weakly basic components in the water by chemical conversion to a more ionized state. A first water treatment unit is positioned downstream of the first chemical treating unit to substantially remove ionized components in the stream, and produce a first product stream. In various embodiments, the first water treatment unit can be selected from the group consisting of a media filter unit, a water softener unit, a dechlorination unit, and combinations thereof.
    Type: Grant
    Filed: March 31, 1998
    Date of Patent: June 4, 2002
    Assignee: United States Filter Corporation
    Inventors: John W. Arba, Gary V. Zoccolante, Jonathan H. Wood, Gary C. Ganzi
  • Patent number: 6312597
    Abstract: The invention relates to a wafer rinsing system for rinsing chemicals and particles off of wafers without introducing contaminants. The system reduces the particle count on wafers by filtering the water and the gas used during rinsing at the wet bench. The system includes a rinsing unit, a local water filter bank, a local gas filtering system, an H2O2 injection unit, an auxiliary chemical injection unit, and a controller for operating the other components. The water filter bank provides a multiple stage filtering system to eliminate particles without a substantial drop in water pressure. The H2O2 injection unit provides a local source of H2O2 to clean the filter and rinser and to provide a mechanism for controlling the formation of native oxide on the wafer during rinsing. The auxiliary chemical injection unit provides a chemical additive to the rinsing unit to enhance the wafer cleaning process. The gas filtering system provides clean gas to the rinsing unit and to the injection units.
    Type: Grant
    Filed: December 1, 1995
    Date of Patent: November 6, 2001
    Assignee: SCD Mountain View, Inc.
    Inventors: Raj Mohindra, Abhay K. Bhushan, Rajiv Bhushan, Suraj Puri
  • Patent number: 6303037
    Abstract: A reverse osmosis treatment of feed water containing at least silica and hardness ions for separating the feed water into permeate water and concentrate is effected while maintaining the pH of the concentrate at a level of at most 6. According to the foregoing process, silica can be prevented from precipitating, and a high recovery of permeate water can be secured.
    Type: Grant
    Filed: December 14, 1994
    Date of Patent: October 16, 2001
    Assignee: Organo Corporation
    Inventors: Makio Tamura, Akitoshi Shinbo
  • Patent number: 6274040
    Abstract: There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: August 14, 2001
    Assignee: Alps Electric Co., Ltd.
    Inventors: Kenichi Mitsumori, Yasuhiko Kasama, Akira Nakano, Akira Abe, Tadahiro Ohmi
  • Patent number: 6267891
    Abstract: A method of producing high purity water using weak acid cation exchange for dealkalization and a double pass reverse osmosis membrane system having enhanced membrane life.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: July 31, 2001
    Assignee: Zenon Environmental Inc.
    Inventors: Anthony A. Tonelli, Eric Harrison, Susan Leanne Wesno, Hadi Husain, Andrew Benedek
  • Publication number: 20010009238
    Abstract: Apparatus and method for controlling the resistivity of water. The apparatus includes a diffuser injector for mixing water and a water soluble gas such as carbon dioxide gas and that defines an inlet conduit through which water to be treated is communicated and an output conduit from which treated water is discharged. A diffuser tube is disposed within one of the conduits for injecting carbon dioxide gas into the water. A proportional control valve provides carbon dioxide gas from a carbon dioxide tank to the carbon dioxide diffuser tube. Downstream from the diffuser injector are a static mixer for further intermingling the water and carbon dioxide gas and a serially connected contact chamber for enhancing the stability in the resistivity level of the water. A resistivity monitor measures the resistivity of the water and carbon dioxide mixture and transmits a signal to a controller.
    Type: Application
    Filed: October 2, 1998
    Publication date: July 26, 2001
    Applicant: KINETICO INCORPORATED
    Inventors: JOHN A. MOSHEIM, WILLIAM S. BANHAM
  • Patent number: 6261456
    Abstract: Waste water containing fluorine, nitrogen and organic matter is treated by introducing the waste water into a water tank filled with calcium carbonate mineral and anaerobic microorganic sludge. An upper portion of the water tank is occupied by the anaerobic microorganic sludge concurrently with natural precipitation of the calcium carbonate mineral toward a lower portion of the water tank. Calcium ions dissolving from the calcium carbonate mineral precipitated in the lower portion of the water tank are made to chemically react with the fluorine in the waste water. At the same time, the organic matter in the waste water is treated by utilizing anaerobic microorganisms in the anaerobic microorganic sludge in the upper portion of the water tank. The nitrogen in the waste water is treated to be reduced by reducibility that the anaerobic microorganisms in the waste water own.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: July 17, 2001
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuyuki Yamasaki, Kazuyuki Sakata
  • Patent number: 6258278
    Abstract: A method of producing high purity water using dealkalization and a double pass reverse osmosis membrane system having enhanced membrane life.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: July 10, 2001
    Assignee: Zenon Environmental, Inc.
    Inventors: Anthony A. Tonelli, Eric Harrison, Susan Leanne Wesno, Hadi Husain, Andrew Benedek
  • Patent number: 6187201
    Abstract: A system for producing ultra-pure water having an electrodialysis unit 1, which has a membrane selectively permeable to monovalent cations and a membrane selectively permeable to monovalent anions, and a reverse osmosis unit 5 which is connected after the electrodialysis unit 1 in series.
    Type: Grant
    Filed: November 4, 1996
    Date of Patent: February 13, 2001
    Assignee: Nomura Micro Science Co., Ltd.
    Inventors: Mitsugu Abe, Yoshiaki Noma
  • Patent number: 6177005
    Abstract: Ultrapure water having a reduced amount of TOC and a low electrical conductivity is produced in correspondence with a variation in water quality of raw water. A first water tank has an anaerobic organic matter treatment chamber and an aerobic organic matter treatment chamber which are communicated with each other at their bottom portions. Activated carbon bags are arranged in upper portions of both the chambers, and Bincho charcoal is stowed in the lower portion of the chambers. With this arrangement, carbon compounds and organic nitrogen compounds in the water to be treated are biologically treated by microbes, thereby reducing the TOC. Furthermore, nitrate nitrogen generated through the organic nitrogen compound treatment process is denitrified by the anaerobic microbe, thereby reducing the electrical conductivity of the water to be treated.
    Type: Grant
    Filed: October 6, 1998
    Date of Patent: January 23, 2001
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuyuki Yamasaki, Toyoichi Nasu, Takahide Miyamoto, Seiji Okamoto, Kazuyuki Sakata, Masami Sera, Atsushi Yokotani
  • Patent number: 6129845
    Abstract: A photo-oxidation device of a water treatment system photo-oxidizes organic material, in particular, aromatic organic material, in the water to facilitate its removal from the water. The photo-oxidation device includes a UV lamp, a flow channel in which the UV lamp is disposed, and a catalyst of an oxidation reaction between an organic material and the UV radiation emitted by the UV lamp. The UV radiation emitted from the UV lamp illuminates the flow channel while the water passes through the flow channel. The catalyst, on the other hand, is fixed to an inner wall of the flow channel to foster the oxidation of the organic material by the UV radiation. The water treatment system in which the photo-oxidation device is incorporated, includes a pre-treatment unit having particle filters, a first treatment section, and a second treatment section.
    Type: Grant
    Filed: October 7, 1998
    Date of Patent: October 10, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sue-ryeon Kim, Hyeon-jun Kim, Youn-chul Oh, Seung-un Kim
  • Patent number: 6126834
    Abstract: An adaptive control method for producing high purity water, the method having the ability to produce high purity water on a continuous basis having a resistivity in the range of 0.8 to 4 megohm-cm. The method comprises the steps of providing a feedwater to be purified and providing a first reverse osmosis unit having a first high pressure side and a first low pressure side and having a first permeate produced at the first low pressure side. The pH of the feedwater to be introduced to the high pressure of the first reverse osmosis unit is monitored before introducing the feedwater to the high pressure side of the first reverse osmosis unit. Also, the feedwater is maintained in a temperature range of 45.degree. to 80.degree. F. A second reverse osmosis unit is provided having a second high pressure side and a second low pressure side for producing high purity product water.
    Type: Grant
    Filed: December 10, 1997
    Date of Patent: October 3, 2000
    Assignee: Zenon Environmental Inc.
    Inventors: Anthony A. Tonelli, Eric Harrison, Ake Deutschmann
  • Patent number: 6110375
    Abstract: Water to be purified is passed through a reverse osmosis step to produce a pure water stream and a waste water stream. The waste water is directed to a deionization step to produce purified deionized water which is recycled to the reverse osmosis step. The process directs far less water to waste as compared to conventional reverse osmosis processes. The process also produces water of higher organic and inorganic purity than can be obtained by either reverse osmosis or deionization alone.
    Type: Grant
    Filed: January 11, 1994
    Date of Patent: August 29, 2000
    Assignee: Millipore Corporation
    Inventors: Mohammed F. Bacchus, Bruce M. Dawson, Gary A. O'Neill
  • Patent number: 6080316
    Abstract: An adaptive control method for producing high purity water, the method having the ability to produce high purity water on a continuous basis having a resistivity in the range of 0.8 to 4 megohm-cm. The method comprises the steps of providing a feedwater to be purified and providing a first reverse osmosis unit having a first high pressure side and a first low pressure side and having a first permeate produced at the first low pressure side. The pH of the feedwater to be introduced to the high pressure of the first reverse osmosis unit is monitored before introducing the feedwater to the high pressure side of the first reverse osmosis unit. A second reverse osmosis unit is provided having a second high pressure side and a second low pressure side for producing high purity product water.
    Type: Grant
    Filed: March 3, 1997
    Date of Patent: June 27, 2000
    Inventors: Anthony A. Tonelli, Eric Harrison
  • Patent number: 6015493
    Abstract: A remote filtration unit for liquid distribution systems (LDS) used for delivering ultra-pure liquids for semiconductor manufacturing processes is provided. The filtration unit includes a plurality of filtration systems enclosed in separate compartments, wherein each compartment is served by an input and an output lead line. Using quick connect/disconnect fittings, the liquid distribution system (LDS) channel is tapped at desired locations and bypass loops are inserted in the channel. A bypass loop includes an input lead line, an associated filtration unit compartment including a filtration system, and an output lead line. Using bypass loops, LDS liquid is routed into the remote filtration system, cleaned, and then channeled back into the liquid distribution system or target product or process area.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: January 18, 2000
    Assignee: Teleparts International, Inc.
    Inventors: Kenneth Smith, Brent Krick, Alejandro Garcia
  • Patent number: 6001238
    Abstract: A method of reducing the concentration of metal ions in pure water or ultrapure water and thereby obtaining pure water or ultrapure water. Such purified pure water or purified ultrapure water is used, for example, when washing semiconductor wafers, as a starting material of electrolytic ionic water, or for diluting washing water. A pair of carbon electrodes is disposed in an ultrapure water storage tank containing pure water or ultrapure water or in a purifying tank disposed in a line leading from an ultrapure water storage tank. A D.C. voltage is applied across the electrode pair. A carbon electrode material having a large specific surface area is chosen, and an electrode structure with which there is little detachment of carbon fragments is used. After the carbon electrode is molded, a carbon layer is formed on the surface of the molding by dipping the molding in an amorphous carbon bath.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: December 14, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Jun Takayasu, Naoto Miyashita
  • Patent number: 5997752
    Abstract: A water treating apparatus for raising oxygen solubility in high-purity drinking water includes a high pressure pump for conveying high-purity drinking water treated by an R. O. treatment, or a U. F. treatment, or a distillation treatment, or a purity treatment into a closed container. An ozone injecter injects ozone in the drinking water conveyed by the high pressure pump. A cooler affixed around the closed container cools the water stored therein to a preset value. A supersonic vibrator stirs the stored drinking water so as to raise oxygen solubility in the drinking water stored in the closed container, and to prolong period of time for sterilization.
    Type: Grant
    Filed: September 27, 1996
    Date of Patent: December 7, 1999
    Inventors: Sheng-I Leu, Shun-Chen Chen, Sheng-Shih Cheng, Kuo-Chi Ko
  • Patent number: 5972293
    Abstract: Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.
    Type: Grant
    Filed: April 17, 1998
    Date of Patent: October 26, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-uhn Kim, Yun-chul Oh, Sue-ryeon Kim, Jung-sung Hwang
  • Patent number: 5954965
    Abstract: The present invention relates to a process for producing pure water having a total organic carbon content of not more than 200 ppb instantly after start of the operation of a high purity water system, comprising using as an ion exchange resin a specific strongly basic anion exchange resin and passing raw water through the high purity water system at a space velocity of not less than 20. The produced pure water is capable of producing tasteless and odorless pure water instantly after start of the operation of the high purity water system.
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: September 21, 1999
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hirohisa Kubota, Katsuhiko Yano, Junya Watanabe, Keiko Kudo
  • Patent number: 5951859
    Abstract: An acid water obtained by electrolysis is used for wash disinfection inside an artificial dialyzer, thereby completely eliminating the bacteria, fungi, viruses, and other deposits inside the dialyzer.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: September 14, 1999
    Assignees: Miura-denshi Kabushiki-kaisha, Toshiyuki Miura, Kouken Kabushiki-kaisha
    Inventors: Toshiyuki Miura, Tetsurou Miura
  • Patent number: 5935441
    Abstract: Ultrapure water containing less than 10 ppt total ions, other than hydrogen ion and hydroxide ion is produced by passing deionized water through a system comprising an ultrafiltration step, an oxidizing step where water is exposed to ultraviolet light and ion exchange step. The treated water is recirculated through the oxidizing step and the ion exchange step. Product water from the system can be recovered on a continuous basis so long as the ratio of volume of water circulated within the system to volume of water drawn from the system is at least 10 and preferably at least 20.
    Type: Grant
    Filed: September 5, 1996
    Date of Patent: August 10, 1999
    Assignee: Millipore Corporation
    Inventors: Gary A. O'Neill, Kitty K. Siu, Jeffrey P. Denoncourt
  • Patent number: 5833846
    Abstract: A high-purity water producing apparatus has an excellent effect of environmental protection and is also capable of effectively removing boron. It comprises a pretreatment unit, and a double pass RO unit an EDI unit or a distillation unit or any combination thereof as principal deionization unit(s) but does not comprise any chemical-regeneration type ion exchanger. It further comprises a boron removing unit and the water treated by the principal deionization unit(s) is brought into contact with a boron-selective ion exchange resin.
    Type: Grant
    Filed: January 17, 1997
    Date of Patent: November 10, 1998
    Assignee: Orango Corporation
    Inventors: Madoka Tanabe, Sakae Kaneko
  • Patent number: 5811012
    Abstract: A deionized or high purity water producing method is describing wherein ions and non-ionic substances are removed. The method includes pretreating feed water to remove suspended non-ionic substances, containing the pretreated water with first and second ion exchange resins that include a boron selective ion exchange resin, and stratifying or mixing together the first and second resins within an ion exchange column. The boron selective ion exchange resin is included to remove boron ions contained in the pretreated water.
    Type: Grant
    Filed: January 24, 1996
    Date of Patent: September 22, 1998
    Assignee: Organo Corporation
    Inventors: Madoka Tanabe, Sakae Kaneko, Ikuo Shindo
  • Patent number: 5807486
    Abstract: There is disclosed a portable assembly for treating hazardous waste water having a plurality of paired filter units having filter mediums and operated at high filter rates to minimize solids build up wherein solids are caused to be smashed and broken by shear forces and wherein chemicals are sequentially added to facilitate solids reduction, to oxidize organic compounds and to precipitate dissolved solids and wherein the process stream is subjected to ultraviolet light to reduce organic loading and downstream ultra filtration units to further reduce solids followed by reverse osmosis and/or ionization treatment.
    Type: Grant
    Filed: September 18, 1996
    Date of Patent: September 15, 1998
    Assignee: Joseph B. Busch, Sr. et al.
    Inventor: Joseph B. Busch, Jr.
  • Patent number: 5766479
    Abstract: A process for purifying water by removing dissolved materials therefrom, the process capable of producing purified water having a resistivity in the range of 2 to 10 megohm-cm. The process comprises providing a water feed stream to be purified and adjusting the pH of the water feed stream to a basic water solution to drive the equilibrium of a first weakly ionized material to become ionized in the basic solution. The basic water solution is introduced to a high pressure side of a first reverse osmosis membrane module and water is passed through the first reverse osmosis membrane to provide a first retentate having ions therein from the first weakly ionized material concentrated therein and a first permeate depleted in ions from the first weakly ionized material. The pH of the first permeate is adjusted to an acidic water solution to drive the equilibrium of a second weakly ionized material to become ionized in an acidic solution.
    Type: Grant
    Filed: August 7, 1995
    Date of Patent: June 16, 1998
    Assignee: Zenon Environmental Inc.
    Inventors: William V. Collentro, Andrew W. Collentro
  • Patent number: 5722442
    Abstract: A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility (front end). Anhydrous ammonia is purified by scrubbing in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.
    Type: Grant
    Filed: July 1, 1996
    Date of Patent: March 3, 1998
    Assignee: Startec Ventures, Inc.
    Inventors: Joe G. Hoffman, R. Scot Clark
  • Patent number: 5707514
    Abstract: A water treating apparatus is provided which can treat waste water for use as raw water in an ultrapure water producing system without addition of various kinds of chemicals. The apparatus includes a first water tank for receiving acid waste water, a second water tank for subjecting the waste water from the first water tank to solid-liquid separation and discharging supernatant liquid, an ion exchange tank including ion exchange resin and an aeration tube for generating treated water through a membrane filter, a precipitation tank for settling ion exchange resin, an air lift pump for introducing ion exchange resin from the precipitation tank into the first water tank, and a return air lift pump for returning ion exchange resin from the second water tank to the ion exchange tank. The ion exchange resin acts to exchange ions with fluorine ions of treated water in the ion exchange tank and is regenerated by acid waste water in the first water tank.
    Type: Grant
    Filed: June 6, 1996
    Date of Patent: January 13, 1998
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuyuki Yamasaki, Yoshihiro Hamaguchi, Shigeki Matumoto
  • Patent number: 5674431
    Abstract: A method for preparing a stable colloid in water in which water is enriched with respect to para water by condensing water vapor on a surface which does not decompose water into H and OH, dispersing a water insoluble material in colloidal form therein, whereby excess parawater acts as a stabilizer for the colloid, and storing the colloid in a vessel having a wall which does not decompose water into H and OH. The stability of the colloidal can be later broken by contacting it with a surface that decomposes water into H and OH.
    Type: Grant
    Filed: January 18, 1996
    Date of Patent: October 7, 1997
    Inventor: Tore Gustaf Owe Berg
  • Patent number: 5670053
    Abstract: A process for purifying water including removing cations, anions and carbon dioxide and/or ammonia from water feed stream to produce high purity water having a resistivity of greater than 1 megohm-era comprising the steps of providing a water feed stream to be purified, the stream containing cations, anions and carbon dioxide and/or ammonia; introducing the water feed stream to a high pressure side of a first reverse osmosis membrane module; passing water through the first reverse osmosis membrane to provide a first retentate having cations and anions concentrated therein and a first permeate depleted in cations and anions and containing carbon dioxide and/or ammonia; adding the first permeate to a high pressure side, of a gas permeable hydrophobic membrane module; passing carbon dioxide and/or ammonia through the gas-permeable membrane from the first permeate in the high pressure side of the gas-permeable hydrophobic membrane to provide a carbon dioxide and/or ammonia permeate on a low pressure side of the h
    Type: Grant
    Filed: August 7, 1995
    Date of Patent: September 23, 1997
    Assignee: Zenon Environmental, Inc.
    Inventors: William V. Collentro, Andrew W. Collentro
  • Patent number: 5645727
    Abstract: Particle filtration of a feed of highly corrosive ultra pure water and contaminants is disclosed through a metal oxide membrane on ceramic support in combination with on-line ozonation. In one aspect, the filtering of ultra pure water includes passing the feed cross-flow through a multichannel sintered monolithic metal oxide membrane on ceramic support to form a permeate of particle-free ultra pure water. Although high recoveries per pass rates were used, no detectable metal ions including aluminum, zirconium, or yttrium ions were found in the ultra pure water permeate. The apparatus and process of the present invention for filtering ultra pure water include cross-flow filtration using multichannel monolithic ceramic membranes at suitable pore sizes in a total chemical process system including elevated temperatures and on-line ozonation sterilization of the ceramic membrane particle filter in high purity water applications for electronics manufacturing.
    Type: Grant
    Filed: May 16, 1996
    Date of Patent: July 8, 1997
    Assignee: Illinois Water Treatment, Inc.
    Inventors: Ramesh R. Bhave, James L. Filson
  • Patent number: 5595662
    Abstract: A water purification device comprises a compartment for holding a supply of impure water; a purified water collection zone; and a dense hydrophilic membrane between the compartment and the purified water collection zone. The membrane is capable of functioning by membrane distillation. A water vapour condensing surface is provided in the purified water collection zone. The condensing surface is spaced from the membrane.
    Type: Grant
    Filed: August 21, 1995
    Date of Patent: January 21, 1997
    Assignee: Water Research Commission
    Inventor: Ronald D. Sanderson
  • Patent number: 5589005
    Abstract: A method of washing a substrate, wherein even traces of impurities in minute and high-aspect-ratio trenches or holes can be washed and removed free from contamination by washing solution and a system and a method for producing ultrapure water, capable of producing ultrahigh pure water for using in the washing. At the intermediate portions of a piping for supplying a predetermined ultrapure water to a use point, there are provided: a first steam generating means for heating a ultrapure water for conversion into a first steam; a steam heating means for further heating the first steam for conversion into a second steam higher in temperature than the first steam; and cooling means for cooling the second steam for conversion into a second ultrahigh water.
    Type: Grant
    Filed: May 31, 1994
    Date of Patent: December 31, 1996
    Inventor: Tadahiro Ohmi
  • Patent number: 5573662
    Abstract: An apparatus for the treatment of a low-concentration organic waste water for relaim a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm and obtaining an ultra pure water having a TOC concentration of not more than 1 ppb is characterized by the fact that a first treating system comprising a reverse osmosis unit for transforming a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm into a low-concentration organic waste water having a TOC concentration of from 60 to 200 ppb and a vacuum degasifier adapted to admit an inert gas at a volumetric feed flow rate in the range of from 0.001 to 1.0 based on the volume of the waste water under treatment at a vacuum rate of not more than 35 Torrs and a second treating system comprising a low-pressure ultraviolet decomposition unit for emitting an ultraviolet light of a wavelength of 184.
    Type: Grant
    Filed: September 12, 1994
    Date of Patent: November 12, 1996
    Assignee: Nomura Micro Science Co., Ltd.
    Inventors: Mitsugu Abe, Senri Ojima
  • Patent number: 5571419
    Abstract: Raw water is made acidic so that the pH is not more than 4.5 and heated in the presence of an oxidizing agent to decompose TOC components in the raw water, and then deionized, thereby producing ultrapure water having a greatly low concentration of organic matters.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: November 5, 1996
    Assignee: Kurita Water Insustries Ltd.
    Inventors: Yoshinobu Obata, Nobuhiro Orita, Hiroshi Kurobe
  • Patent number: 5558775
    Abstract: There is disclosed a portable assembly for treating hazardous waste water having a plurality of paired filter units having filter mediums and operated at high filter rates to minimize solids build up wherein solids are caused to be smashed and broken by shear forces and wherein chemicals are sequentially added to facilitate solids reduction, to oxidize organic compounds and to precipitate dissolved solids and wherein the process stream is subjected to ultraviolet light to reduce organic loading and downstream ultra filtration units to further reduce solids followed by reverse osmosis and/or ionization treatment.
    Type: Grant
    Filed: November 1, 1994
    Date of Patent: September 24, 1996
    Assignees: Joseph Busch, Jr., Joseph Busch, Sr.
    Inventor: Joseph B. Busch, Jr.
  • Patent number: 5536411
    Abstract: A water and energy recovery process for an ice rink is disclosed. The process includes softening and carbon filtering water for use as flood water on an ice rink. The water is then demineralized by reverse osmosis to produce flood water having a specific conductance of about 2 to 30 micromhos/cm. The demineralized water is heated to 90.degree. F. and utilized in a resurfacer to flood the surface of the ice rink. The ice shavings removed from the surface of the ice by the resurface are deposited into a holding means and melted by utilizing recovered heat from the ice rink's refrigeration unit. The melted water from the holding means is used as a coolant in the ice rink's refrigeration unit. The steps of the process are then repeated, utilizing the warmed water from the refrigeration unit.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: July 16, 1996
    Assignee: Bassai Limited
    Inventor: Russell W. Blades
  • Patent number: 5518620
    Abstract: An apparatus for biological treatment of water in which a water containing organic matter (e.g. waste water, recovered water, or untreated water in water treatment works) is biologically treated to decompose and remove the organic matter, which apparatus comprises a formed material comprising a felt-like activated carbon fiber cloth, accomodated in the treatment vessel as a packing medium, which has a ratio of surface area (cm.sup.2) of felt-like activated carbon fiber cloth to effective volume (cm.sup.3) of the treatment vessel, of 0.5-50 cm.sup.2 /cm.sup.3, and which is arranged so that the cloth surface is vertical and the cloth-to-cloth distance is 0.5-2.0 cm, thereby shortening the rise time from operation start to stable operation, and efficiently operating over a long period of time.
    Type: Grant
    Filed: March 17, 1994
    Date of Patent: May 21, 1996
    Assignee: Organo Corporation
    Inventors: Masahiro Eguchi, Haruki Myoga, Masaki Shimohara, Teruo Sugizaki
  • Patent number: 5518627
    Abstract: A method for demineralizing water or an aqueous solution, which comprises contacting the water or the aqueous solution to be treated to a strongly basic anion exchanger made of a crosslinked polymer having a constituting unit of the following formula (I): ##STR1## wherein A is a C.sub.1-2 linear alkylene group, B is a C.sub.4-8 linear alkylene group, each of R1, R2 and R3 which may be the same or different, is a C.sub.1-4 alkyl group or a C.sub.2-4 alkanol group, X is a counter ion coordinated on the ammonium group, and the benzene ring D may have an alkyl group or a halogen atom as a substituent.
    Type: Grant
    Filed: March 1, 1995
    Date of Patent: May 21, 1996
    Assignees: Mitsubishi Chemical Corporation, Tohoku Electric Power Co., Inc.
    Inventors: Masao Tomoi, Teruo Onozuka, Manabu Shindo, Hideaki Kiniwa, Hirohisa Kubota, Shintaro Sawada
  • Patent number: 5518624
    Abstract: Ceramic filtration of a feed solution of ultra pure water and particle contaminants is disclosed through a metal oxide membrane on ceramic support. In one aspect, the filtering of ultra pure water from a feed solution containing ultra pure water and contaminant particles includes passing the feed solution cross-flow through a multi-channel sintered monolithic metal oxide membrane on ceramic support to form a permeate of particle-free ultra pure water. The sintered metal oxide membrane has a nominal pore size in the range of about 50 to 200 Angstroms. Although high recoveries per pass rates were used, no detectable aluminum ions were found in the ultra pure water.
    Type: Grant
    Filed: May 6, 1994
    Date of Patent: May 21, 1996
    Assignee: Illinois Water Treatment, Inc.
    Inventors: James L. Filson, Wesley R. Carrera, Ramesh R. Bhave
  • Patent number: 5516429
    Abstract: A fluid dispensing system is provided which has first diaphragm pump means, a filter connected to receive the discharge of said first pump, and accumulator/second diaphragm pump means connected to receive the discharge of said filter. Hydraulic fluids pumped by cylinder/piston/stepper assemblies independently actuate each of the diaphragm pumps, providing accurate, controllable and repeatable dispense of the subject fluid.
    Type: Grant
    Filed: August 18, 1993
    Date of Patent: May 14, 1996
    Assignee: FAStar, Ltd.
    Inventors: Ocie T. Snodgrass, Michael K. Farney, Gregory M. Gibson