Etching To Produce Porous Or Perforated Article Patents (Class 216/56)
  • Publication number: 20030150791
    Abstract: An anti-microbial filter (105) for a micro-fluidic system (100) includes a silicon-based filter membrane (213) having holes (218) formed therein. The membrane (213) is formed on a substrate (211). One side of the filter membrane (213) has an anti-microbial coating (216) between the holes (218) on the filter membrane (213) and the other side can include filter supports formed from a silicon substrate. A method for making the anti-microbial filter (105) includes forming a filter membrane (213) on a substrate (211), forming holes (218) in the membrane (213) by providing a filter mask (215) and etching holes (218) through holes (222) in the mask (215). Then portions of the substrate (211) are removed from the filter membrane (213) using a masking and etching process to expose the holes (218). An anti-microbial coating is applied to the membrane (213) adjacent the holes (218).
    Type: Application
    Filed: February 13, 2002
    Publication date: August 14, 2003
    Inventors: Steven T. Cho, Harlow B. Christianson
  • Patent number: 6605229
    Abstract: The invention relates to a method for producing an element comprising a substrate and at least one anti-reflection coating with pores. The dimensions of the anti-reflection coating are below the wavelength of visible light or the neighboring spectral ranges. The invention also relates to an element produced according to this method with at least one anti-reflection coating, for example optical lenses, mirrors or other optical components. The optical anti-reflection coating of these elements is essentially improved.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: August 12, 2003
    Assignee: Universitat Konstanz
    Inventors: Ullrich Steiner, Stefan Walheim, Erik Schäffer, Stefan Eggert, Jürgen Mlynek
  • Publication number: 20030146145
    Abstract: The present invention provides improved synthetic polymer hydrogel permeation layers for use on active electronic matrix devices for biological assays. The permeation layers have a defined porous character, with mesopores in a size range between about 100 nanometers and about 1000 nanometers, and may also have micropores in the micrometer size range. The mesoporous synthetic hydrogel permeation layers demonstrate improved signal intensity and linearity characteristics as compared to nanoporous synthetic hydrogel permeation layers on active electronic matrix devices. In addition, the present invention also provides synthetic polymer hydrogel permeation layers which contain copolymerized attachment sites for nucleic acid probes or other biomolecules.
    Type: Application
    Filed: December 10, 2001
    Publication date: August 7, 2003
    Inventors: Jainamma Krotz, Daniel D. Smolko, Howard R. Reese, Thomas J. Onofrey, Daguang Wang, Theodore M. Winger, John R. Havens
  • Patent number: 6598750
    Abstract: A micromachined membrane particle filter is formed by making holes in a silicon and coating over the holes with Parylene.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: July 29, 2003
    Assignee: California Institute of Technology
    Inventors: Yu-Chong Tai, Xing Yang
  • Patent number: 6596184
    Abstract: An integrated lead suspension is formed from a laminate of three materials in a variety of configurations having from three to five layers. The materials are stainless steel, polyimide and copper. Each layer is essentially homogeneous, but may be formed with one or more holes or voids prior to the formation of the laminate. The voids can be used to eliminate the need for double-sided etching or to make small features which would otherwise be unavailable with conventional manufacturing processes.
    Type: Grant
    Filed: February 15, 1999
    Date of Patent: July 22, 2003
    Assignee: International Business Machines Corporation
    Inventors: Victor Wing-Chun Shum, Randall George Simmons
  • Patent number: 6596187
    Abstract: A method of forming a nano-supported sponge catalyst (10) on a substrate (12) is comprised of depositing an active catalytic metallic element (16) on the substrate (12) and depositing a structural metallic element (18) with the active catalytic metallic element (16) to form a mixed metal alloy layer (14). The method is further comprised of etching the mixed metal alloy layer (14) with an etchant to oxidize the active catalytic metallic element (16) and the structural metallic element (18) and to remove at least a portion of the structural metallic element (18) from a first sub-layer of the mixed metal alloy layer (14). The first sub-layer of the mixed metal alloy layer (14) is porous and comprised of nano-particles of the active catalytic metallic element (16) that are supported by a metal oxide structure derived from the structural metallic element (18).
    Type: Grant
    Filed: August 29, 2001
    Date of Patent: July 22, 2003
    Assignee: Motorola, Inc.
    Inventors: Bernard F. Coll, Yi Wei
  • Patent number: 6589457
    Abstract: An organic solvent-free process for deposition of metal oxide thin films is presented. The process includes aqueous solutions of necessary metal precursors and an aqueous solution of a water-soluble polymer. After a coating operation, the resultant coating is fired at high temperatures to yield optical quality metal oxide thin films.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: July 8, 2003
    Assignee: The Regents of the University of California
    Inventors: DeQuan Li, Quanxi Jia
  • Patent number: 6585902
    Abstract: An integrated lead suspension is formed from a five layer laminate of stainless steel, polyimide and copper. Prior to lamination, the steel layer has preformed voids which may have various configurations. The voids are provided for intentionally weakening high strain flexure areas in the suspension so that strain energy can be dissipated more effectively.
    Type: Grant
    Filed: February 27, 1999
    Date of Patent: July 1, 2003
    Assignee: International Business Machines Corporation
    Inventors: Victor Wing-Chun Shum, Randall George Simmons
  • Patent number: 6581640
    Abstract: A manifold for distributing a fluid. The manifold can be used to distribute a fluid to and from a microvalve. The manifold includes a first plate having a groove formed in one face thereof. A second plate is fixed to the first plate so as to cover the groove to form a fluid passage through the groove. First and second bores are formed through at least one of the first plate and the second plate to form an inlet and an outlet, respectively, of the fluid passage. According to a method of manufacturing, etching the first plate forms the groove. Preferably, an etching process also forms the first and second bores. Also, preferably, the first plate is one of a plurality of plates formed from a single sheet of material. Preferably the sheet of material is a standard sized sheet with locating indicia enabling assembly of the manifold with standard pick and place equipment.
    Type: Grant
    Filed: August 16, 2000
    Date of Patent: June 24, 2003
    Assignee: Kelsey-Hayes Company
    Inventor: Richard J. Barron
  • Publication number: 20030111440
    Abstract: A method of fabricating nanosized holes with controlled geometries employs tools and methods developed in the microelectronics industry. The method exploits the fact that epitaxially grown film thicknesses can be controlled within a few atomic monolayers and that by using etching techniques, trenches and channels can be created that are only a few nanometers wide. The method involves bonding two shallow channels at an angle such that a nanopore is defined by the intersection. Thus, a nanopore-defining device includes a nanopore with dimensions that are determined by the dimensions and orientations of the intersecting channels, with the dimensions being accurately controlled within a few monolayers.
    Type: Application
    Filed: December 19, 2001
    Publication date: June 19, 2003
    Inventors: Daniel B. Roitman, Dietrich W. Vook, Theodore I. Kamins
  • Publication number: 20030111441
    Abstract: The present invention is concerned with a miniature microdevice package and a process of making thereof. The package has a miniature frame substrate made of a material selected from the group including: ceramic, metal and a combination of ceramic and metal. The miniature frame substrate has a spacer delimiting a hollow. The package also includes a microdevice die having a microdevice substrate, a microdevice integrated on the microdevice substrate, bonding pads integrated on the microdevice substrate, and electrical conductors integrated in the microdevice substrate for electrically connecting the bonding pads with the microdevice. The microdevice die is mounted on the spacer to form a chamber. The microdevice is located within the chamber. The bonding pads are located outside of the chamber.
    Type: Application
    Filed: November 25, 2002
    Publication date: June 19, 2003
    Applicant: Institut National D'Optique
    Inventors: Hubert Jerominek, Christine Alain
  • Patent number: 6579462
    Abstract: A flat display device, preferably of the PALC type, in which the plasma channels are formed by etching laterally-spaced slots in a spacer plate, attaching a thin dielectric sheet over the etched spacer plate, and bonding the etched spacer plate to a transparent substrate such that each channel is formed by the portion of the substrate between flanking walls formed by the etched slots in the spacer plate, adjacent flanking walls in the spacer plate, and the overlying portion of the thin dielectric sheet. In a modification, strengthening crossbars are formed between adjacent flanking walls.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: June 17, 2003
    Assignees: Philips Electronics North America Corporation, Tektronix, Inc.
    Inventors: Babar A. Khan, Henri R. J. R. Van Helleputte, Adrianus L. J. Burgmans, Karel Elbert Kuijk, Petrus F. G. Bongaerts, Jacob Bruinink, Thomas Stanley Buzak, Kevin John Ilcisin, Paul Christopher Martin
  • Patent number: 6579463
    Abstract: A method of manufacturing an array of nanostuctures, such as quantum dots, having a controlled diameter and a substrate with an ordered array of nanostructures having a controlled diameter. In a preferred embodiment of the invention, nanoscale features are produced on a substrate by using a porous crystalline protein as a template for preparing an etch/deposition mask having a regular array of nanoscale pores of a diameter different from the protein template. The mask may be used to etch a regular array of nanoscale wells and/or deposit nanoclusters of adatoms on the surface of an underlying substrate. A further embodiment of the invention is a substrate including an ordered array of nanoscale features having a controlled size.
    Type: Grant
    Filed: August 18, 2000
    Date of Patent: June 17, 2003
    Assignee: The Regents of the University of Colorado
    Inventors: Thomas Andrew Winningham, Kenneth Douglas
  • Patent number: 6576148
    Abstract: An integrated lead suspension is formed from a laminate of three materials in a variety of configurations having from three to five layers. The materials are stainless steel, polyimide and copper. Each layer is essentially homogeneous, but may be formed with one or more holes or voids prior to the formation of the laminate. The voids allow dielectric material to be removed from the area beneath the conductors to simplify processing and reduce the cost of the suspensions. The voids can also form a window through which conductors can be shorted to other conductive layers to form an electrostatic discharge shunt. Alternatively, the shorting of conductors can be used as a cross-over for various conductors.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: June 10, 2003
    Assignee: International Business Machines Corporation
    Inventors: Victor Wing-Chun Shum, Randall George Simmons
  • Publication number: 20030102263
    Abstract: The present invention provides a nanostructured device comprising a substrate including nanotroughs therein; and a lipid bilayer suspended on or supported in the substrate. A separation method is also provided comprising the steps of supporting or suspending a lipid bilayer on a substrate; wherein the substrate comprises nanostructures and wherein the lipid bilayer comprises at least one membrane associated biomolecule; and applying a driving force to the lipid bilayer to separate the membrane associated biomolecule from the lipid bilayer and to drive the membrane associated biomolecule into the nanostructures.
    Type: Application
    Filed: January 9, 2003
    Publication date: June 5, 2003
    Inventors: Gabriel P. Lopez, Steven R. J. Brueck, Linnea K. Ista
  • Patent number: 6565763
    Abstract: A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
    Type: Grant
    Filed: June 7, 2000
    Date of Patent: May 20, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Asakawa, Toshiro Hiraoka, Yoshihiro Akasaka, Yasuyuki Hotta
  • Patent number: 6565764
    Abstract: Molded products may be made by a process comprising preparing a structure comprising a block copolymer or a graft copolymer having two or more phases, wherein each phase is comprised of polymer chains, decomposing the polymer chains of at least one phase of the structure, and cleaning the structure with a supercritical fluid or a sub-critical fluid, thereby removing the decomposed polymer chains from the structure. Molded products made by this method have very low levels of residual solvents, can be manufactured at a relatively low temperature in a short period of time without using large amounts of organic solvents, and without discharging large amounts of liquid waste.
    Type: Grant
    Filed: August 13, 2001
    Date of Patent: May 20, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toshiro Hiraoka, Koji Asakawa, Yasuyuki Hotta
  • Patent number: 6558733
    Abstract: An implantable prosthesis, for example a stent, is provided having one or more micropatterned microdepots formed in the stent. Depots are formed in the prosthesis via chemical etching and laser fabrication methods, including combinations thereof. They are formed at preselected locations on the body of the prosthesis and have a preselected depth, size, and shape. The depots can have various shapes including a cylindrical, a conical or an inverted-conical shape. Substances such as therapeutic substances, polymeric materials, polymeric materials containing therapeutic substances, radioactive isotopes, and radiopaque materials can be deposited into the depots.
    Type: Grant
    Filed: October 26, 2000
    Date of Patent: May 6, 2003
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventors: Syed F. A. Hossainy, Li Chen
  • Publication number: 20030080042
    Abstract: An adjustable nanopore is fabricated by placing the surfaces of two planar substrates in contact, wherein each substrate contains a hole having sharp corners and edges. A corner is brought into proximity with an edge to define a triangular aperture of variable area. Ionic current in a liquid solution and through the aperture is monitored as the area of the aperture is adjusted by moving one planar substrate with respect to the other along two directional axes and a rotational axis. Piezoelectric positioners can provide subnanometer repeatability in the adjustment process. The invention is useful for characterizing, cleaving, and capturing molecules, molecular complexes, and supramolecular complexes which pass through the nanopore, and provides an improvement over previous devices in which the hole size of nanopores fabricated by etching and/or redeposition is fixed after fabrication.
    Type: Application
    Filed: October 30, 2001
    Publication date: May 1, 2003
    Inventors: Philip W. Barth, Daniel B. Roitman, Joel Myerson
  • Publication number: 20030075526
    Abstract: The present invention relates to an improved apparatus for plasma treatment of golf ball surface. The improved apparatus comprises a cylindrical basket shaped rotating tumbler made from aluminum sheet metal that holds a plurality of golf balls within a sealed casing for surface preparation. A staggered hole pattern yields about 57% of open area in the tumbler surface to insure evacuation with minimum resistance. The holes are individually machined and have machined radiuses at each side of the sheet metal to allow for adequate coverage of a hard anodic coating which is necessary for protection of the sheet metal from the high intensity plasma. A two stage dry vacuum pumping system is used to reduce hydrocarbon impurities and improve print and paint adhesion.
    Type: Application
    Filed: February 8, 2002
    Publication date: April 24, 2003
    Inventor: William Brum
  • Publication number: 20030075525
    Abstract: The present invention relates to an improved apparatus for plasma treatment of golf ball surface. The improved apparatus comprises a cylindrical basket shaped rotating tumbler made from aluminum sheet metal that holds a plurality of golf balls within a sealed casing for surface preparation. A staggered hole pattern yields about 57% of open area in the tumbler surface to insure evacuation with minimum resistance. The holes are individually machined and have machined radiuses at each side of the sheet metal to allow for adequate coverage of a hard anodic coating which is necessary for protection of the sheet metal from the high intensity plasma.
    Type: Application
    Filed: October 23, 2001
    Publication date: April 24, 2003
    Inventor: William Brum
  • Patent number: 6537256
    Abstract: Apparatus and methods are provided for the delivery of molecules to a site via a carrier fluid. The apparatus include microchip devices which have reservoirs containing the molecules for release. The apparatus and methods provide for active or passive controlled release of the molecules. Embodiments include systems for release of fragrance molecules and beverage additives.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: March 25, 2003
    Assignee: MicroCHIPS, Inc.
    Inventors: John T. Santini, Jr., Charles E. Hutchinson, Scott A. Uhland, Michael J. Cima, Robert S. Langer, Dennis Ausiello
  • Publication number: 20030042226
    Abstract: A method of forming a nano-supported sponge catalyst (10) on a substrate (12) is comprised of depositing an active catalytic metallic element (16) on the substrate (12) and depositing a structural metallic element (18) with the active catalytic metallic element (16) to form a mixed metal alloy layer (14). The method is further comprised of etching the mixed metal alloy layer (14) with an etchant to oxidize the active catalytic metallic element (16) and the structural metallic element (18) and to remove at least a portion of the structural metallic element (18) from a first sub-layer of the mixed metal alloy layer (14). The first sub-layer of the mixed metal alloy layer (14) is porous and comprised of nano-particles of the active catalytic metallic element (16) that are supported by a metal oxide structure derived from the structural metallic element (18).
    Type: Application
    Filed: August 29, 2001
    Publication date: March 6, 2003
    Applicant: Motorola, Inc.
    Inventors: Bernard F. Coll, Yi Wei
  • Patent number: 6517735
    Abstract: A monolithic inkjet printhead formed using integrated circuit techniques is described. A silicon substrate has formed on its top surface a thin polysilicon layer in the area in which a trench is to be later formed in the substrate. The edges of the polysilicon layer align with the intended placement of ink feed holes leading into ink ejection chambers. Thin film layers, including a resistive layer, are formed on the top surface of the silicon substrate and over the polysilicon layer. An orifice layer is formed on the top surface of the thin film layers to define the nozzles and ink ejection chambers. A trench mask is formed on the bottom surface of the substrate. A trench is etched (using, for example, TMAH) through the exposed bottom surface of the substrate and to the polysilicon layer. The etching of the polysilicon layer exposes fast etch planes of the silicon. The TMAH then rapidly etches the silicon substrate along the etch planes, thus aligning the edges of the trench with the polysilicon.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: February 11, 2003
    Assignee: Hewlett-Packard Company
    Inventors: Kenneth E. Trueba, Charles C. Haluzak, David R. Thomas, Colby Van Vooren
  • Patent number: 6517763
    Abstract: This invention relates to processes for the assembly of three-dimensional structures having periodicities on the scale of optical wavelengths, and at both smaller and larger dimensions, as well as compositions and applications therefore. Invention embodiments involve the self assembly of three-dimensionally periodic arrays of spherical particles, the processing of these arrays so that both infiltration and extraction processes can occur, one or more infiltration steps for these periodic arrays, and, in some instances, extraction steps. The product articles are three-dimensionally periodic on a scale where conventional processing methods cannot be used.
    Type: Grant
    Filed: July 14, 2000
    Date of Patent: February 11, 2003
    Assignee: AlliedSignal, Inc.
    Inventors: Anvar Zakhidov, Ray Baughman, Changxing Cui, Ilyas I. Khayrullin, Lo-Min Liu, Igor Udod, Ji Su, Mikhail Kozlov
  • Publication number: 20030020024
    Abstract: The invention relates to a method for creating pores in a sheet polymer material. The invention more particularly relates to a method for creating nanoscale pores, typically of the order of less than 200 nm, in a polymer material such as sheet polycarbonate or any other equivalent material.
    Type: Application
    Filed: June 27, 2002
    Publication date: January 30, 2003
    Inventors: Etienne Ferain, Roger Legras, Henri Hanot
  • Publication number: 20030019344
    Abstract: A metal perforating stencil for use in making perforations in a film under vacuum comprises a metal support in which there are continuous openings which are separated by dykes. In this stencil, the ratio of the thickness of the stencil with respect to the maximum radius of an opening on the active side of the stencil is greater than 1.15. If desired, at least the active side of the stencil may be provided with a rough surface structure which is deposited by electrodeposition means. A stencil of this type has improved release properties, resulting in a long service life, which also has a beneficial effect on the production rate and the quality of the perforated film which is obtained using the stencil.
    Type: Application
    Filed: May 22, 2002
    Publication date: January 30, 2003
    Inventors: Peter Leerkamp, Cornelis Johannes Jeckmans
  • Patent number: 6508945
    Abstract: A lightweight cathode ray tube is formed by reducing a cross-sectional area on the apeture grill tapes in the aperture grill. One exemplary embodiment of the reduced cross-sectional area aperture grill tape includes a central longitudinal channel in a side of the aperture grill tape that faces away from the screen. The reduction in cross-sectional area reduces a linear density of the tape thereby decreasing the tension required by the frame. As each of the aperture grill tapes includes this central longitudinal channel, the weight of the overall aperture grill is significantly reduced and the aperture grill frame weight is reduced due to the lower aperture grill tension. A method for producing the reduced cross-sectional area aperture grill tape is possible without significantly increasing the cost of manufacturing the aperture grill tape.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: January 21, 2003
    Assignees: Sony Corporation, Sony Electronics Inc.
    Inventor: Paul A. Hollinger
  • Publication number: 20030010749
    Abstract: A mask for fabrication of semiconductor devices in which the membrane layer keeps high strength and is free of stress and distortion even though it is made thin. The mask has a membrane-supporting layer at the peripheral part of the mask pattern or the mask pattern region in the membrane layer constituting the mask.
    Type: Application
    Filed: May 14, 2002
    Publication date: January 16, 2003
    Inventors: Masaki Yoshizawa, Shigeru Moriya, Kumiko Oguni
  • Patent number: 6503409
    Abstract: A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: January 7, 2003
    Assignee: Sandia Corporation
    Inventor: James G. Fleming
  • Publication number: 20020195420
    Abstract: A method of manufacturing a slotted substrate includes forming a masking layer over a first surface of a substrate, and patterning and etching the masking layer to form a hole therethrough. The first layer is deposited over the masking layer and in the hole. The first layer is patterned and etched to form a plug in the hole. A second surface of the substrate that is opposite the first surface is continuously etched until a bottom surface of the plug is substantially exposed and a slot in the substrate is substantially formed.
    Type: Application
    Filed: June 22, 2001
    Publication date: December 26, 2002
    Inventors: Jeffrey Scott Obert, Eric L. Nikkel, Kenneth M. Kramer, Steven D. Leith
  • Patent number: 6491666
    Abstract: Apparati and methods are provided for the delivery of molecules to a site via a carrier fluid. The apparati include microchip devices which have reservoirs containing the molecules for release. The apparati and methods provide for active or passive controlled release of the molecules. Preferred embodiments include systems for intravenous administration of drugs, wherein drug molecules are released from the microchip devices into a carrier fluid ex vivo, such as a saline solution, forming a drug/saline solution mixture which is then delivered to a patient intravenously.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: December 10, 2002
    Assignee: MicroChips, Inc.
    Inventors: John T. Santini, Jr., Charles E. Hutchinson, Scott A. Uhland, Michael J. Cima, Robert S. Langer, Dennis Ausiello
  • Patent number: 6491831
    Abstract: A shadow mask for a cathode ray tube includes through-holes defined by first and second recessed formed at first and second surfaces of the shadow mask, respectively. Each through-hole has a first wall farther away from a center of the shadow mask than a second wall thereof. The second recess has a smaller size than that of the first recess. The first wall is formed of a first wall portion defined by an inner surface of the first recess and a second wall portion defined by an inner surface of the second recess. The second wall portion of through-holes located at a peripheral region of the first region has a configuration such that electron beams reflected therefrom are directed to an inner surface of the first recess to thereby reduce electron beams reflected therefrom in directions different from a direction in which the electron beams are originally directed before the electron beams enter the shadow mask.
    Type: Grant
    Filed: July 17, 2000
    Date of Patent: December 10, 2002
    Assignee: NEC Corporation
    Inventor: Nobumitsu Aibara
  • Patent number: 6478974
    Abstract: A method of fabricating a microfabricated filter. The method includes forming a frame structure and forming a plurality of openings through the frame structure. A permeable polysilicon membrane is formed over the plurality of openings through the frame structure. At least part of the sacrificial structure is etched with an etchant wherein the etchant passes through the permeable polysilicon membrane. The permeable polycrystal silicon membrane may have a thickness of between about 0.05 micrometers and about 0.30 micrometers.
    Type: Grant
    Filed: July 6, 1999
    Date of Patent: November 12, 2002
    Assignee: The Regents of the University of California
    Inventors: Kyle S. Lebouitz, Roger T. Howe, Albert P. Pisano
  • Publication number: 20020153348
    Abstract: An orthopedic implant has a porous surface with a plurality of pores, some of which are provided with a pores-within-a-pore structure. The pores-within-a-pore structure has a pore opening ranging in size between 10 and 800 microns. The present invention also discloses a process for making an orthopedic implant which is provided in the surface thereof with a pores-within-a-pore porous structure.
    Type: Application
    Filed: April 9, 2002
    Publication date: October 24, 2002
    Inventors: Wen-Ching Say, Chih-I Lin, Shengfu Lin
  • Patent number: 6461528
    Abstract: Lateral pores in a thin metal film as well as fabricating branching and expanding ore arrays can be fabricated by a method of growing long pores laterally underneath a ask by use of stress compliant masks or varying the anodization voltage. Applications range from use with scanning electron microscope (SEM-compatible single molecule probe stations), to nanowire fixtures and to the use with a “pixelating, nonscanning” near field optical microscope (NOM). Pores are defined by conventional anodization vertically into the underlying membrane of preporous material through any overlying masking layers. The general solution is to utilize mechanically stable masks that withstand the stress during anodization and counteract the pore formation stress to lead to good pore ordering and directed growth. Multilayer masks are well suited for this. With a composition of materials having different elastic properties, tensile stress can be matched to counteract compressive stress caused by porous material growth.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: October 8, 2002
    Assignee: California Institute of Technology
    Inventors: Axel Scherer, Theodore Doll, Thomas Hoffman
  • Patent number: 6447688
    Abstract: Disclosed is a novel method for fabricating a stencil mask comprising the formation of an absorber pattern, including an alignment key or target, on the topside of an SOI wafer having a transparent buried insulating layer. The formation of the absorber pattern is followed by the formation of an alignment window from the backside of the SOI wafer using the insulating layer as a lens. The alignment window allows the alignment between the absorber pattern and the frame pattern to be verified, using light passing through the window lens and illuminating the alignment key, before initiating the frame etch, thereby improving the quality and/or throughput of the stencil mask manufacturing process.
    Type: Grant
    Filed: April 2, 2001
    Date of Patent: September 10, 2002
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventor: Cheol Kyun Kim
  • Patent number: 6444135
    Abstract: A method and system for making a gas permeable shell in a micro electromechanical systems (MEMS) device is disclosed. The MEMS device is created with an internal sacrificial layer. The device is then coated with a slurry composition which, after drying, is later exposed to a solvent. As a result, the sacrificial layer is removed to produce interconnected voids.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: September 3, 2002
    Assignee: Ball Semiconductor, Inc.
    Inventors: Murali Hanabe, Risaku Toda
  • Patent number: 6444256
    Abstract: Nanometer-size wires having a cross-sectional dimension of less than 8 nm with controllable lengths and diameters are produced by infiltrating latent nuclear or ion tracks formed in trackable materials with atomic species. The trackable materials and atomic species are essentially insoluble in each other, thus the wires are formed by thermally driven, self-assembly of the atomic species during annealing, or re-crystallization, of the damage in the latent tracks. Unlike conventional ion track lithography, the inventive method does not require etching of the latent tracks.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: September 3, 2002
    Assignee: The Regents of the University of California
    Inventors: Ronald G. Musket, Thomas E. Felter
  • Patent number: 6444133
    Abstract: A method is provided for making a photonic band gap fiber including the steps of etching a preform and then drawing the preform into a photonic band gap fiber. Glass tubes are bundled and then formed into a photonic crystal perform having a number of passageways by reducing the cross-section of the bundle. One of the passageways is enlarged by flowing an etchant through it. After cleaning, the band gap fiber is made from the etched photonic preform, for example, by drawing.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: September 3, 2002
    Assignee: Corning Incorporated
    Inventors: James C. Fajardo, Thomas A. Cook, Michael T.. Gallagher
  • Publication number: 20020119079
    Abstract: Chemical microreators for chemical systhesis and their methods of manufacture are known, but have disadvantages such as extremely high manufacturing costs or poor flexibility for adaptation to various cases of application. These disadvantages are avoided by means of the microreators and manufacturing methods according to the invention. The microreators are characterized in that the reactors contain fluid ducts in at least one plane as well as feed and return lines for fluids, wherein the fluid ducts are defined by side walls of metal opposing each other and further side walls of metal or plastic extending between said side walls, and in which the planes are connected together and/or with a closure segment closing open fluid ducts by means of appropriate solder or adhesive layers. The manufacturing method is characterized by process sequences in which the individual reactor planes produced by means of electrolytic methods, are connected together by soldering or gluing.
    Type: Application
    Filed: April 22, 2002
    Publication date: August 29, 2002
    Inventors: Norbert Breuer, Heinrich Meyer
  • Publication number: 20020119176
    Abstract: An implantable biocompatible microchip drug delivery substrate is coated with a thin film of ultra-nanocrystalline diamond; assuring that the device is biocompatible and impermeably sealed, to prevent the substrate from being dissolved by the living tissue and to protect the drugs from premature release or undesired reaction with the body fluids. The coating is selectively patterned by doping to create electrically conductive areas that can be used as an electrically activated release mechanism for drug delivery. The conformal ultra-nanocrystalline diamond coating uniformly covers the device, providing relief from sharp edges and producing a strong, uniformly thick impermeable coating around sharp edges and on high aspect-ratio parts. The ultra-nanocrystalline diamond coating provides a conformal coating on the biocompatible device, which is of approximately uniform thickness around sharp corners and on high aspect-ratio parts.
    Type: Application
    Filed: October 26, 2001
    Publication date: August 29, 2002
    Inventors: Robert J. Greenberg, Brian V. Mech
  • Publication number: 20020104762
    Abstract: A method is disclosed for the manufacture of colloidal rod particles as nanobarcodes. Template membranes for the deposition of materials are prepared using photolithographic techniques.
    Type: Application
    Filed: October 2, 2001
    Publication date: August 8, 2002
    Inventors: Walter Stonas, Louis J. Dietz, Ian D. Walton, Michael J. Natan, James L. Winkler
  • Patent number: 6409907
    Abstract: A structure, e.g., a photonic band gap material, exhibiting substantial periodicity on a micron scale is provided. Fabrication involves the steps of providing a template comprising a colloidal crystal, placing the template in an electrolytic solution, electrochemically forming a lattice material, e.g., a high refractive index material, on the colloidal crystal, and then removing the colloidal crystal particles to form the desired structure. The electrodeposition provides a dense, uniform lattice, because formation of the lattice material begins near a conductive substrate, for example, and growth occurs substantially along a plane moving in a single direction, e.g., normal to the conductive substrate. Moreover, because the electrochemically grown lattice is a three-dimensionally interconnected solid, there is very little shrinkage upon subsequent treatment.
    Type: Grant
    Filed: February 11, 1999
    Date of Patent: June 25, 2002
    Assignee: Lucent Technologies Inc.
    Inventors: Paul VanNest Braun, Michael Louis Steigerwald, Pierre Wiltzius
  • Patent number: 6409072
    Abstract: Chemical microreactors for chemical systhesis and their methods of manufacture are known, but have disadvantages such as extremely high manufacturing costs or poor flexibility for adaptation to various cases of application. These disadvantages are avoided by means of the microreactors and manufacturing methods according to the invention. The microreactors are characterized in that the reactors contain fluid ducts in at least one plane as well as feed and return lines for fluids, wherein the fluid ducts are defined by side walls of metal opposing each other and further side walls of metal or plastic extending between said side walls, and in which the planes are connected together and/or with a closure segment closing open fluid ducts by means of appropriate solder or adhesive layers. The manufacturing method is characterized by process sequences in which the individual reactor planes produced by means of electrolytic methods, are connected together by soldering or gluing.
    Type: Grant
    Filed: October 25, 1999
    Date of Patent: June 25, 2002
    Assignee: Atotech Deutschland GmbH
    Inventors: Norbert Breuer, Heinrich Meyer
  • Publication number: 20020074310
    Abstract: A method of manufacturing an array of microstructures, such as a micromirror array assembly (10, 20) for use in optical modules (5, 17) in a wireless network system, is disclosed. The micromirror array assembly (10, 20) includes a plurality of mirrors (29) monolithically formed from a silicon wafer (70) with a frame (43), attached by way of hinges (55) and gimbal portions (45). The wafer is temporarily bonded to a support wafer (60) while permanent magnets (53) are attached to each of the gimbal portions (45) associated with the mirrors (29), through holes etched through the mounting wafer (60). The resulting frame (43) is then mounted to a coil driver assembly (50) so that coil drivers (34) can control the rotation of each mirror (29), under separate control from control circuitry (14, 24). The micromirror array assembly (10, 20) is able to support higher signal energy at larger spot sizes, and also enables multiplexed transmission and receipt, as well as sampling of the received beam for quality sensing.
    Type: Application
    Filed: August 29, 2001
    Publication date: June 20, 2002
    Inventor: Andrew S. Dewa
  • Publication number: 20020074314
    Abstract: A thin discontinuous layer of metal such as Au, Pt, or Au/Pd is deposited on a Group III-V material surface. The surface is then etched in a solution including HF and an oxidant for a preferably brief period, as little as a couple seconds to one hour. A preferred oxidant is H2O2. Morphology and light emitting properties of porous Group III-V material can be selectively controlled as a function of the type of metal deposited, doping type, doping level, metal thickness, whether emission is collected on or off the metal coated areas and/or etch time. Electrical assistance is unnecessary during the chemical etching of the invention, which may be conducted in the presence or absence of illumination.
    Type: Application
    Filed: November 20, 2001
    Publication date: June 20, 2002
    Applicant: The Board of Trustees of the University of Illinois.
    Inventors: Paul W. Bohn, Xiuling Li, Jonathan V. Sweedler, Ilesanmi Adesida
  • Patent number: 6403211
    Abstract: A flexible circuit comprising a liquid crystal polymer film having through-holes and related shaped voids formed therein using an etchant composition comprising a solution in water of from about 35 wt. % to about 55 wt. % of an alkali metal salt; and from about 10 wt. % to about 35 wt. % of a solubilizer dissolved in the solution to provide the etchant composition suitable for etching the liquid crystal polymer at a temperature from about 50° C. to about 120° C.
    Type: Grant
    Filed: July 18, 2000
    Date of Patent: June 11, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Rui Yang, Guoping Mao
  • Patent number: 6397467
    Abstract: The ink jet print head is formed with many parallel ducts, which are etched isotropically through openings in a first layer located above the ducts. After the etching operation, the openings of the first layer are closed by the deposition onto the first layer of a second layer, which covers the openings. The openings have a diameter of 1 &mgr;m, for instance. The openings, formed in the first layer by photolithography and ensuing dry etching, are disposed such that in an etching operation, the desired ducts underneath the first layer are laid bare. It is thus not necessary to adjust the relative positioning of two or more etched plates, closed ducts are formed without bonding or adhesive techniques, and the trigger circuit and the print head can be integrated on a single substrate.
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: June 4, 2002
    Assignee: Infineon Technologies AG
    Inventors: Wolfgang Werner, Thomas Zettler
  • Patent number: 6391219
    Abstract: A method for treating a film of material, which can be defined on a substrate, e.g., silicon. The method includes providing a substrate comprising a cleaved surface, which had a porous silicon layer thereon. The substrate may have a distribution of hydrogen bearing particles defined from the cleaved surface to a region underlying said cleaved surface. The method also includes increasing a temperature of the cleaved surface to greater than about 1,000 Degrees Celsius while maintaining the cleaved surface in a etchant bearing environment to reduce a surface roughness value by about fifty percent and greater. Preferably, the value can be reduced by about eighty or ninety percent and greater, depending upon the embodiment.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: May 21, 2002
    Assignee: Silicon Genesis Corporation
    Inventors: Sien G. Kang, Igor J. Malik