Etching Or Trimming Patents (Class 219/121.19)
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Patent number: 11145483Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: December 10, 2018Date of Patent: October 12, 2021Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Patent number: 10919078Abstract: A lamination cylinder includes a surface structure, on which a plurality of craters is defined having a different geometry and a random distribution. Some of the craters are partially superimposed with respect to each other.Type: GrantFiled: May 28, 2014Date of Patent: February 16, 2021Inventors: Giovanni Boselli, Massimo Cavallari, Paolo Gaboardi, Rick McWhirter, Massimo Perassolo, Claudio Trevisan
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Patent number: 9909218Abstract: A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chromium materials on lithography masks. In one embodiment, a polar compound, such as ClNO2 gas, is activated by the electron beam to selectively etch a chromium material on a quartz substrate. By using an electron beam in place of an ion beam, many problems associated with ion beam mask repair, such as staining and riverbedding, are eliminated. Endpoint detection is not critical because the electron beam and gas will not etch significantly the substrate.Type: GrantFiled: January 12, 2010Date of Patent: March 6, 2018Assignee: Ecole Polytechnique Federales de LausanneInventors: Tristan Bret, Patrik Hoffmann, Michel Rossi, Xavier Multone
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Patent number: 9895787Abstract: Systems and methods are disclosed herein for adding surface features to grinding wheels. A laser may be directed substantially perpendicular to a grinding surface of a grinding wheel. The laser may be pulsed and may ablate material from the grinding surface. The laser may move relative to the grinding wheel in order to ablate shaped surface features into the grinding surface.Type: GrantFiled: December 8, 2014Date of Patent: February 20, 2018Assignee: UNITED TECHNOLOGIES CORPORATIONInventors: John P. Rizzo, Gordon M. Reed
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Patent number: 9764445Abstract: Systems and methods are disclosed herein for dressing and trueing grinding wheels. A laser may be directed substantially tangential to a grinding surface of a grinding wheel. The laser may be a continuous wave laser and may ablate material from the grinding surface. The laser may move relative to the grinding wheel in order to ablate shaped surface profiles into the grinding surface.Type: GrantFiled: December 8, 2014Date of Patent: September 19, 2017Assignee: UNITED TECHNOLOGIES CORPORATIONInventors: John P. Rizzo, Gordon M. Reed
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Patent number: 9694473Abstract: A rotary tool (21) working surface (23) includes a plurality of cutting bodies (24). The rotary tool (21) can be driven about a rotational axis (R). The actual enveloping surface (HF) of the working surface (23) is ascertained by an optical measuring arrangement (29). At least one other target variable (GS) is detected, which describes a microscopic parameter of the working surface (23). The actual variable (GI) corresponding to each specified target variable (GS) is detected by the measuring arrangement (29), and the deviation between the target variable (GS) and the actual variable (GI) is determined. If the actual enveloping surface (HF) lies outside of a specified target enveloping area (HR) or if a deviation (D) between an actual variable (GI) and the corresponding target variable (GS) is unacceptably large, selected first and/or second cutting bodies (24a, 24b) are machined and/or removed by a laser device (35).Type: GrantFiled: October 19, 2011Date of Patent: July 4, 2017Assignee: WALTER MASCHINENBAU GMBHInventors: Christoph Plüss, Heinrich Mushardt, Oliver Wenke
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Patent number: 9685273Abstract: A chip capacitor according to the present invention includes a substrate, a pair of external electrodes formed on the substrate, a capacitor element connected between the pair of external electrodes, and a bidirectional diode connected between the pair of external electrodes and in parallel to the capacitor element. Also, a circuit assembly according to the present invention includes the chip capacitor according to the present invention and a mounting substrate having lands, soldered to the external electrodes, on a mounting surface facing a front surface of the substrate.Type: GrantFiled: February 23, 2016Date of Patent: June 20, 2017Assignee: ROHM CO., LTD.Inventors: Hiroki Yamamoto, Keishi Watanabe, Hiroshi Tamagawa
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Patent number: 9616523Abstract: A laser processing device has a laser source and a high speed vibration unit. The laser source has a laser-emitting end being capable of emitting a laser beam adapted to process a workpiece. The high speed vibration unit is located on a moving path of the laser beam and is capable of vibrating periodically along a direction parallel to the moving path of the laser beam such that the focusing point of the laser beam moves periodically on the workpiece at high speed. The laser processing device with the fast moving focusing point is able to efficiently process parts of the workpiece at specific depths. Therefore, product quality and production rate are increased.Type: GrantFiled: October 23, 2014Date of Patent: April 11, 2017Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTREInventors: Chen-Bin Chou, Chao-Yung Yeh
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Patent number: 9000325Abstract: A phenomenon where a depicted pattern becomes unclear owing to a rotational runout of a roller mold in the direction of a rotary shaft is suppressed while restraining an increase in the cost.Type: GrantFiled: June 8, 2011Date of Patent: April 7, 2015Assignee: Asahi Kasei Kabushiki KaishaInventors: Naoto Ito, Toshio Kitada, Hidenari Kiguchiya
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Patent number: 8969753Abstract: A plasma treatment installation including at least two stationary workpiece holders adapted for controlled rotation about their respective axis and having supporting plates for supporting workpieces for the treatment thereof, at least one hood to be set on a workpiece holder that is adapted to enclose each of a plurality of workpiece holders to form a sealed treatment space, and a manipulator for automatically equipping the supporting plates of a workpiece holder with workpieces, while the other workpiece holder is covered by the hood to perform the plasma treatment of the workpieces.Type: GrantFiled: May 17, 2007Date of Patent: March 3, 2015Inventor: Siegfried Straemke
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Patent number: 8696920Abstract: A method of fabricating a case for a portable electronic device includes: preparing a case preform; processing the inner surface of the case preform using a laser; and surface-treating the outer surface of the case preform, wherein the outer surface of the case preform shows fine prominences and depressions formed by the surface-treating of the outer surface of the case preform, and patterns formed by processing the inner surface of the case preform appear bumpily on the outer surface of the case preform.Type: GrantFiled: April 21, 2011Date of Patent: April 15, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-Chul Jin, Yong-Wook Hwang, Seung-Chang Baek, Jong-Woo Kim, Hoon-Soo Park
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Publication number: 20140016083Abstract: A spectacle lens has a colored mark, a colored graphics image with a predeterminable color and brightness impression. The spectacle lens includes a lens body having a light-refracting effect and having a surface with an interference layer system arranged on the surface.Type: ApplicationFiled: July 11, 2013Publication date: January 16, 2014Inventors: Frank Macionczyk, Simon Holtmann
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Publication number: 20130248486Abstract: A highly polished surface on an aluminum substrate is formed using any number of machining processes. During the machining process, intermetallic compounds are typically generated at a top surface area of the aluminum substrate caused by spot heat generated between the tool edge and the cut tip of the aluminum substrate during the cutting process. The intermetallic compounds can leave surface imperfections after conventional mechanical polishing operations that render the surface of the aluminum substrate difficult to obtain a desired high glossiness due to exfoliation of the intermetallic compounds from the top surface. In order to remove the effect of the intermetallic compounds, an electron beam is applied to the surface resulting in Joule heating to melt down a top surface zone. In this way, any tooling traces and intermetallic compounds are eliminated.Type: ApplicationFiled: September 26, 2012Publication date: September 26, 2013Applicant: Apple Inc.Inventors: SIMON R. LANCASTER-LAROCQUE, Purwadi RAHARJO, Kensuke UEMURA
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Patent number: 8410392Abstract: The invention relates to a machining device (10) comprising at least one machining head (16) designed to provide at least one high-energy machining beam (22), especially an electron or laser beam. Such a machining device is used to remove material from workpieces (28) or for connecting workpieces (28) by bonding, especially by means of welding. According to the invention, at least one scanning device (32) designed as an optical coherence tomograph and provided for surface scanning is associated with the machining head (16). The invention also relates to a method for machining material using a high-energy machining beam for scanning surface areas of a workpiece which is machined, not yet machined, or being machined, by means of an optical coherence tomograph.Type: GrantFiled: March 4, 2008Date of Patent: April 2, 2013Assignee: Precitec Optronik GmbHInventors: Markus Kogel-Hollacher, Christoph Dietz
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Patent number: 8319145Abstract: A gemstone micro-inscription system, comprising an energy source, a spatial light modulator, and a control, the control controlling a spatial light pattern modulation of the spatial light modulator, wherein the spatial light modulator exposes a photoresist on the gemstone, which selectively impedes an etching process to produce a pattern on the gemstone corresponding to the spatial light modulation pattern.Type: GrantFiled: July 9, 2007Date of Patent: November 27, 2012Assignee: Lazare Kaplan International, Inc.Inventors: Charles Rosario, William H. Moryto
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Patent number: 8314357Abstract: A method of using Joule heating to regenerate nanowire based biosensors. The nanowire based biosensor contains various detection molecules, such as nucleic acids, bound to the surface of the nanowire. Binding of analyte nucleic acids to the detection molecules alters the electrical properties of the nanowire, producing a detectable signal. By passing a Joule heating effective amount of electrical current through the nanowire, the nanowire may be heated to a temperature sufficient to dissociate the bound analyte from the detection molecule, without damaging the detection molecules or the bond between the detection molecules and the nanowire surface. The Joule heated nanowires may thus be regenerated to an analyte-free “fresh” state and used for further sensing. In alternate embodiments, the specificity of the nanowire for a particular analyte may be modulated by using Joule heating to heat the nanowire to an intermediate temperature where some analytes bind and some do not.Type: GrantFiled: September 14, 2009Date of Patent: November 20, 2012Assignee: Children's Hospital and Research Center at OaklandInventor: Frans A. Kuypers
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Patent number: 7897055Abstract: The present inventions relates to a method for manufacturing a multilayer FPCB having different number of layers in different areas. The method includes the steps of: providing a binder layer; removing a portion of the binder layer thereby defining an opening in the binder layer; forming a multilayer FPCB which having a first copper clad laminate structure and a second copper clad laminate structure disposed on two opposite sides of the binder layer respectively using the binder layer; cutting the first copper clad laminate structure; cutting the multilayer FPCB in manner that a portion of first copper clad laminate structure that is exposed to the opening is separated from the first copper clad structure thereby obtain a multilayer FPCB having different number of layers in different areas.Type: GrantFiled: October 1, 2007Date of Patent: March 1, 2011Assignee: Foxconn Advanced Technology Inc.Inventors: Chih-Yi Tu, Cheng-Hsien Lin, I-Hsien Chiang
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Publication number: 20100282720Abstract: An exposure device engraves an image on the surface of a recording medium by scanning and exposing the recording medium with a light beam emitted from an exposure head. The exposure head comprises a light source for emitting a light beam, an exposure lens for causing the light beam to form an image on or close to the surface of the recording medium, a direction changer disposed upstream or downstream of the exposure lens in the direction in which the light beam travels, and/or inside of the exposure lens on the optical path of a light beam having a numerical aperture higher than a given numerical aperture to change the direction of the light beam having a numerical aperture higher than a given numerical aperture in such a manner as not to affect the process of engraving an image on a surface of the recording medium.Type: ApplicationFiled: March 25, 2010Publication date: November 11, 2010Applicant: FUJIFILM CorporationInventor: Ichirou Miyagawa
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Patent number: 7386937Abstract: A method of making a biosensor is provided. The method includes providing an electrically conductive material on a base and partially removing the conductive material using laser ablation from the base so that less than 90% of the conductive material remains on the base and at least one electrode pattern is formed from the conductive material. The at least one electrode pattern has an edge extending between two points. A standard deviation of the edge from a line extending between two points is less than about 6 ?m along the length of the edge.Type: GrantFiled: May 1, 2006Date of Patent: June 17, 2008Assignee: Roche Diagnostics Operations, Inc.Inventors: Raghbir S. Bhullar, Eric R. Diebold, Brian S. Hill, Nigel A. Surridge, Douglas P. Walling
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Patent number: 7237334Abstract: A method of providing a printed circuit board, a printed circuit board formed according to the method, and a system comprising the printed circuit board. The method comprises: providing a microelectronic substrate; providing a via-defining substrate by providing via openings in the substrate using laser irradiation; providing a laser activatable film on the via-defining substrate; and providing interconnects on the via-defining substrate. Providing interconnects comprises providing a patterned build-up layer on the via-defining substrate comprising exposing the laser activatable film to laser irradiation to selectively activate portions of the film according to a predetermined interconnect pattern; and metallizing the patterned build-up layer according to the predetermined interconnect pattern to yield the interconnects to provide the printed circuit board.Type: GrantFiled: August 18, 2005Date of Patent: July 3, 2007Assignee: Intel CorporationInventor: Islam A. Salama
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Patent number: 7001709Abstract: A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam on a first pattern-drawn field; shifting at least one of the beam source and the base material to scan the beam on a second pattern-drawn field located next to the first pattern-drawn field in such a way that a boundary between the first pattern-drawn field and the second pattern-drawn field is positioned at a joint portion between a slope portion and a side wall portion of the ring-shaped zones; and drawing the pattern on the second pattern-drawn field by scanning a beam so that the joint portion between the slope portion and the side wall portion is drawn at the boundary between the first pattern-drawn field and the second pattern-drawn field.Type: GrantFiled: March 20, 2003Date of Patent: February 21, 2006Assignee: Konica CorporationInventors: Osamu Masuda, Kazumi Furuta
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Patent number: 6698097Abstract: A method for manufacturing a tool to form a dynamic pressure bearing in which at least one of the bearing surfaces has a plurality of pressure generating grooves defined by projections and in which lubricating fluid is contained in the grooves to provide lubrication between the bearing surfaces when they rotate relative to one another. A flat bevel is created at one or more of the corners of each of the projections that define the grooves thereby generating a wedge-shaped space that communicates between the grooves and the gap between the bearing surfaces. This wedge-shaped space facilitates passage of lubricating fluid from the groove to the gap when movement, normally rotation, occurs between the two bearing surfaces thereby minimizing wear between the surfaces.Type: GrantFiled: April 5, 2000Date of Patent: March 2, 2004Assignee: Sankyo Seiki Mfg. Co., Ltd.Inventors: Kazushi Miura, Masato Gomyo
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Publication number: 20040016116Abstract: Disclosed herein are methods for modifying an inner-layer circuit feature of a printed circuit board. A trimming point on the inner-layer circuit feature is identified using an x-ray inspection system. The coordinates of the trimming point are then related to the coordinates of a visible reference marker on the printed circuit board. Next, the relationship between the visible reference marker and the trimming point is used to position a cutting tool over the trimming point. Finally, the cutting tool is used to make one or more cuts into the printed circuit board, until the inner-layer circuit feature is acceptably modified at the trimming point.Type: ApplicationFiled: July 24, 2002Publication date: January 29, 2004Inventors: Albert An-Bon Yeh, Regina Nora Pabilonia, Thomas James Weaver, Arthur Fong
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Patent number: 6530317Abstract: In accordance with the present invention a gravure cylinder is engraved by means of an electron beam which is modulated to create upon the surface of the gravure cylinder the desired gravure cells, the required vacuum being maintained only in a limited volume around the electron gun by the use of a conformal high vacuum ferrofluid seal that is substantially free of mechanical friction.Type: GrantFiled: December 5, 2000Date of Patent: March 11, 2003Assignee: Creo SrlInventor: Daniel Gelbart
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Patent number: 6492647Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. The bias on the Wehnelt aperture is reversed from the conventional bias so that it is biased positively with respect to the cathode. The Wehnelt opening is tapered with a disk emitter inserted into the taper. The result of these modifications is an electron beam output with low brightness which is highly uniform over the beam cross section.Type: GrantFiled: May 7, 1999Date of Patent: December 10, 2002Assignee: Agere Systems, Inc.Inventors: Victor Katsap, James Alexander Liddle, Warren Kazmir Waskiewicz
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Publication number: 20020170887Abstract: A method of working an optical element for producing an optical element having a microscopic pattern, comprising a pattern drawing step for forming a specified pattern corresponding to said optical element on a base material including a layer of pattern drawing object, wherein said layer of pattern drawing object has a curved surface, and said specified pattern is drawn by the application of an electron beam to said layer of pattern drawing object.Type: ApplicationFiled: February 21, 2002Publication date: November 21, 2002Applicant: Konica CorporationInventors: Kazumi Furuta, Yuichi Akanabe, Masahiro Morikawa, Osamu Masuda, Koji Horii, Tomohide Mizukoshi
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Publication number: 20020063114Abstract: The surface of an article with a metallic base body is cleaned. A plasma comprising electrically positively charged ions is generated, and the ions are accelerated toward the article, so that they come into contact with the base body for cleaning purposes. To do this, an electron beam is directed onto the base body. The outgoing flux of electrons which come into contact with the base body is controlled by the base body being connected to a reference potential via a switch of at a fixed, adjustable or regulated frequency.Type: ApplicationFiled: January 10, 2002Publication date: May 30, 2002Applicant: Siemens AktiengesellschaftInventor: Gebhard Dopper
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Patent number: 6277659Abstract: A substrate removal approach involves sensing acoustic energy in a semiconductor device as a function of substrate thickness in the device as substrate is being removed. According to an example embodiment of the present invention, a semiconductor chip having substrate at a back side that is opposite circuitry at a circuit side is analyzed. Some or all of the substrate in the back side of the semiconductor chip is removed, and a thinned region having a bottom area is formed. A laser is directed to the bottom area, and a thermal parameter characterizing target circuitry in the device is detected in response to the laser. The detected parameter is used and an indication of the remaining substrate thickness between the bottom area and the circuitry is determined. In response to the indicated thickness, the substrate removal process is controlled, making possible effective control of the substrate removal process.Type: GrantFiled: September 29, 1999Date of Patent: August 21, 2001Assignee: Advanced Micro Devices, Inc.Inventors: Rama R. Goruganthu, Jeffrey D. Birdsley, Michael R. Bruce, Brennan V. Davis, Rosalinda M. Ring