Control Systems Patents (Class 219/121.54)
  • Patent number: 7071441
    Abstract: A cutting system is disclosed for a plasma cutting torch movable by a driver relative to a work piece along a Z-axis. During cutting, the torch provides an arc voltage proportional to a distance between the torch and the work piece. A height control feedback circuit is connected to the torch and includes sensor circuitry providing an electrical signal proportional to the arc voltage and an analog-to-digital converter for converting the proportional signal to a digital signal. A computer and controller, including controls for selecting a desired height of the plasma torch, receive the digital signal, compare the actual height to the desired height, and actuate the driver to move the torch to within a preset limit of the desired height.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: July 4, 2006
    Inventor: Jason Bulle
  • Patent number: 7045737
    Abstract: A glass-processing method adjusts the range of the heating region according to the work piece and processing condition, and a glass-processing apparatus implements the method. The method incorporates the heating of a glass body with a thermal plasma torch comprising (a) a main body provided with a plurality of ports from which a gas issues and (b) a device for applying a high-frequency electric field to the gas fed into the main body. The method comprises the steps of (1) adjusting the plasma flame's size perpendicular to the center axis of the main body by controlling the flow rate of the gas fed into each port according to the size of the glass body, the processing condition, or both and (2) heating the glass body.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: May 16, 2006
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Masashi Onishi, Masaaki Hirano, Tetsuya Nakanishi
  • Patent number: 7041935
    Abstract: A torch lead extension is provided that comprises a conduit having a distal end and a proximal end. The torch lead extension further comprises a distal connector member disposed at the distal end of the conduit and a proximal connector member disposed at the proximal end of the conduit. The distal connector member is engageable with a torch lead connector member secured to a proximal end of a torch lead. The proximal connector member is engageable with a power supply connector member of a power supply. Generally, the distal connector member and the torch lead connector member comprise a distal quick disconnect, and the proximal connector member and the power supply connector member comprise a proximal quick disconnect. Accordingly, the torch lead extension may be quickly assembled between or disassembled from the torch lead and the power supply.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: May 9, 2006
    Assignee: Thermal Dynamics Corporation
    Inventors: Terry N. Raymond, Fred A. Rogers, Christopher J. Conway, Kevin D. Horner-Richardson
  • Patent number: 7034245
    Abstract: The systems and methods of the present invention provide a circuit for controlling the magnitude of the main and pilot arc current provided to an arc cutting or welding machine. In one embodiment, the circuit allows the user to set the pilot arc current such that it automatically tracks the main arc current setting. The pilot arc current is set to a value that is proportional to the main arc current, such that the pilot arc current value is tailored to the specific cutting operation to be performed and/or the specific nozzle and electrode being used. In an alternative embodiment, the circuit allows the user to select from different pilot arc current levels, such as low, medium, and high current levels. This allows the user to override the pilot arc control in instances where the plasma arc cutting or welding machine is operated under conditions not optimal for the selected nozzle and electrode.
    Type: Grant
    Filed: June 29, 2004
    Date of Patent: April 25, 2006
    Assignee: The ESAB Group, Inc.
    Inventor: Richard A. Eldridge
  • Patent number: 7022937
    Abstract: A plasma processing method is used to process a linear portion of an object to be processed by generating a linear plasma by supplying an electric power to an electrode provided at a plasma source or the object to be processed while supplying gas to the plasma source arranged in the neighborhood of the object to be processed and making activated particles generated by the plasma act on the object to be processed. The method includes detecting an inclination of the plasma source along a direction of an x-axis when the x-axis is taken in a linear direction of the linear portion of the object to be processed, and processing the linear portion of the object to be processed by the generated linear plasma by moving the plasma source along the x-axis direction while maintaining relative positions of the plasma source and the object to be processed so that the detected inclination of the plasma source becomes approximately zero.
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: April 4, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomohiro Okumura, Mitsuo Saitoh
  • Patent number: 7022935
    Abstract: The present invention is directed to a system including a plasma cutting torch having an output electrode and a plasma cutter starting circuit configured to generate a pilot arc at the output electrode.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: April 4, 2006
    Assignee: Illinois Tool Works Inc.
    Inventors: Tim A. Matus, Troy A. Sommerfeld, Joseph C. Schneider, James F. Ulrich
  • Patent number: 7002097
    Abstract: The present invention obtains an automatic mode switching of DC plasma torches through, which easily switches DC plasma torches to be run between a transmitting mode and a non-transmitting mode and put the switching device under the monitor and the control of a current sensor and a current level controller; the heat generated by the current passing through can be transferred by a non-combustible liquid driven by a pump and be cooled down through a heat exchanger; and, electric arcs is prevented from happening between two electrodes by the non-combustible liquid.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: February 21, 2006
    Assignee: Atomic Energy Council-Institute of Nuclear Energy
    Inventor: Chin-Ching Tzeng
  • Patent number: 6992262
    Abstract: The present invention is directed to a system and method for a plasma cutting system including a plasma cutting power source and a plasma torch operationally connected to the plasma cutting power source. A processing unit is disposed within the plasma torch and is configured to control the plasma cutting power source during a plasma cutting process based on operational feedback gathered of the plasma cutting process.
    Type: Grant
    Filed: October 9, 2003
    Date of Patent: January 31, 2006
    Assignee: Illinois Tool Works Inc.
    Inventors: Tim A. Matus, David Lambert, Joseph C. Schneider, James F. Ulrich
  • Patent number: 6967305
    Abstract: Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.
    Type: Grant
    Filed: August 18, 2003
    Date of Patent: November 22, 2005
    Assignee: MKS Instruments, Inc.
    Inventor: Jeff C. Sellers
  • Patent number: 6960737
    Abstract: A system for controlling gas flow from a gas source, through a gas conduit, and to a plasma arc torch during a transition from a cold flow when no arc is present to a hot flow when an arc is provided by the present invention. The system comprises a first solenoid in communication with the gas source, a second solenoid disposed proximate the plasma arc torch, and a bypass circuit in communication with the gas source and the second solenoid. The bypass circuit comprises a bypass solenoid that controls the gas pressure within the gas conduit to reduce gas flow fluctuations when transitioning from cold flow to hot flow. Additional gas control systems and methods are also provided that cause the gas pressure to be higher during cold flow, prior to arc ignition, which overcomes the rapid drop in flow that typically occurs during the transition to hot flow.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: November 1, 2005
    Assignee: Thermal Dynamics Corporation
    Inventor: David A. Tatham
  • Patent number: 6933462
    Abstract: A plasma processing apparatus capable of making an accurate lifetime assessment for each of plural consumable parts (the definition of “the consumable part” is an electrode and/or a nozzle) so that effective use of the consumable parts becomes possible leading to reduced running cost. In the plasma processing apparatus, a plasma arc is generated from a plasma torch composed of an electrode and a nozzle to perform plasma work on a workpiece. Such a plasma processing apparatus includes a plurality of consumable parts, each consumable part being an electrode and/or a nozzle, and further comprises a memory for storing consumption data on every consumable part, the consumption data being used for calculation of consumption; and a display unit for displaying consumption calculated by a CPU for selecting the consumption data corresponding to a consumable part in use.
    Type: Grant
    Filed: January 13, 2004
    Date of Patent: August 23, 2005
    Assignee: Komatsu Industries Corporation
    Inventors: Takahiro Iriyama, Yoshihiro Yamaguchi, Tetsuya Kabata
  • Patent number: 6924455
    Abstract: A material processing apparatus having an integrated toroidal plasma source is described. The material processing apparatus includes a plasma chamber that comprises a portion of an outer surface of a process chamber. A transformer having a magnetic core surrounds a portion of the plasma chamber. The transformer has a primary winding. A solid state AC switching power supply comprising one or more switching semiconductor devices is coupled to a voltage supply and has an output that is coupled to the primary winding. The solid state AC switching power supply drives an AC current in the primary winding that induces an AC potential inside the chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and dissociates the gas.
    Type: Grant
    Filed: January 26, 2001
    Date of Patent: August 2, 2005
    Assignee: Applied Science & Technology, Inc.
    Inventors: Xing Chen, Donald K. Smith, William M. Holber
  • Patent number: 6914209
    Abstract: Not only damage to a nozzle caused by spatter generated during piercing is prevented but also the deterioration of the nozzle owing to a pilot arc is restrained, whereby the service life of the nozzle is significantly increased. To this end, the plasma torch is positioned at an initial level which is the distance between the plasma torch and a steel plate when generating a plasma arc to start piercing operation and which has been set equal to a cutting level which is the distance between the plasma torch and the steel plate when carrying out cutting operation. After generation of the plasma arc, the plasma torch is immediately raised to a piercing level which is more distant from the steel plate W than the initial level and piercing operation is performed at the piercing level. After completion of the piercing operation, the plasma torch is lowered to the cutting level to start cutting operation. Just after transfer from a pilot arc into a main arc, a pilot current is cut off by turning a transistor off.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: July 5, 2005
    Assignee: Komatsu Industries Corporation
    Inventors: Yoshihiro Yamaguchi, Tetsuya Kabata, Takahiro Iriyama
  • Patent number: 6903300
    Abstract: A thermal working tool (1) is movable along a workpiece surface (7) and includes a torch head (2) which has exchangeably mounted thereon cutting or welding tools (3; 4; 5) extending between the torch head (2) and the workpiece surface (7). A distance control for setting a predetermined working distance (A) between the working tool (1) and the workpiece surface (7) is carried out by a magnetic system, an alternating magnetic field being produced in a sensor body with ferromagnetic properties above the workpiece surface (7). The torch head (2) and at least one of the cutting or welding tools (3; 4; 5) contain ferromagnetic material and form at least part of the sensor body (2; 3; 4; 5). The magnetic field produced is sensed by two measuring coils, and is used for controlling the working distance (A).
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: June 7, 2005
    Assignee: Messer Cutting & Welding GmbH
    Inventors: Josef Faust, Burkhard Fenner, Hans-Joachim Albert
  • Patent number: 6891124
    Abstract: A method and system for using transmission spectroscopy to measure a temperature of a substrate (135). By passing light through a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the wafer. This in-situ method and system can be used as a feedback control in combination with a variable temperature substrate holder (182) to more accurately control the processing conditions of the substrate. By utilizing a multiplicity of measurement sites the variation of the temperature across the substrate (135) can also be measured.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: May 10, 2005
    Assignee: Tokyo Electron Limited
    Inventors: Medona B. Denton, Wayne L. Johnson, Murray D. Sirkis
  • Patent number: 6888094
    Abstract: A plasma processing method of processing a substrate by controlling the application of a bias to the substrate independently of generation of plasma. The method includes modulating periodically an output value of a high-frequency voltage applied to a substrate base and changing a duty ratio of the periodic modulation for one of each processed substrate and for each of a plurality of processed substrates. The duty ratio is defined as a ratio of a sub-period of a period of the period modulation, during which a large voltage of the output value of the high-frequency voltage is applied, to the period of the periodic modulation.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: May 3, 2005
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tetsuo Ono, Katsumi Setoguchi, Hideyuki Yamamoto
  • Patent number: 6881922
    Abstract: The present invention uses as a detector for adjustment measurement, monodyne interference between a microwave for plasma generation and the reflected wave. Analysis of the interference wave that is obtained using monodyne interference allows finding of the phase difference between the incident and the reflected wave and the amplitude of that reflected wave; and controlling of an excited microwave generation/control system based on them allows impedance matching between the excited microwave and the plasma. This method allows very high precision phase detection, and calculation of the characteristics of the plasma based on the detected phase shift. Therefore, it is possible to distinguish noises even in the vicinity of the matched region.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: April 19, 2005
    Assignee: Japan Science & Technology Corporation
    Inventors: Yasushi Nishida, Hiroaki Ito, Noboru Yugami
  • Patent number: 6855906
    Abstract: The invention is a plasma-generating device useful in a wide variety of industrial processes. The plasma is formed in a chamber having a toroidal topology, and is heated inductively. As with all inductive plasmas, a primary coil carries an applied AC current, which, in turn, generates a corresponding applied AC magnetic flux inside the plasma. This flux induces current to flow through the plasma in closed paths that encircle the flux, thereby heating and maintaining the plasma. In this invention, the applied AC current flows through the primary coil around substantially the short poloidal direction on the torus. Accordingly, the applied magnetic flux is caused to circulate through the plasma along the larger toroidal direction. Finally, the current induced within the plasma will flow in the poloidal direction, anti-parallel to the applied primary current.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: February 15, 2005
    Inventor: Adam Alexander Brailove
  • Patent number: 6852943
    Abstract: The present invention relates to a strain relief mechanism for a plasma arc torch. In particular, the invention relates to a strain relief system including a positive axial restraint component for restraining axial movement of a lead relative to a housing and a positive rotational restraint component for restraining rotational movement of the lead relative to the housing, wherein the positive axial restraint component and the positive rotational restraint component are independent components arranged in a spaced relationship relative to each other.
    Type: Grant
    Filed: October 28, 2002
    Date of Patent: February 8, 2005
    Assignee: Hypertherm, Inc.
    Inventors: Stephen T. Eickhoff, Ronald E. Morris
  • Patent number: 6825617
    Abstract: A semiconductor processing apparatus that processes a semiconductor wafer disposed in a process chamber of a processing apparatus main unit includes a setting unit for enabling a user to set a temperature of the semiconductor wafer and control unit for controlling a processing of the semiconductor wafer based on the temperature of the semiconductor wafer set by the setting unit.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: November 30, 2004
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Seiichiro Kanno, Ryoji Nishio, Ken Yoshioka, Saburou Kanai, Hideki Kihara, Hideyuki Yamamoto
  • Patent number: 6825437
    Abstract: When determining the presence of foreign particles in a processing chamber by radiating a laser beam inside a processing chamber and detecting scattered light from foreign particles within the processing chamber, the detection of scattered light is performed using a detecting lens having a wide field angle and deep focal depth. Accordingly, the detection of foreign particles floating in the processing chamber can be performed across a wide range, and with uniform sensitivity, with a detecting optical system having a simple constitution.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: November 30, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Nakano, Takeshi Arai, Toshihiko Nakata
  • Patent number: 6815633
    Abstract: Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding.
    Type: Grant
    Filed: March 12, 2001
    Date of Patent: November 9, 2004
    Assignee: Applied Science & Technology, Inc.
    Inventors: Xing Chen, William M. Holber, Andrew Barnett Cowe, Eric Georgelis, Ilya M. Bystyak, Andrzej Bortkiewicz
  • Patent number: 6806438
    Abstract: A plasma processing apparatus comprising a plurality of plasma processing units is provided. Each of the plasma processing units has a matching circuit connected between a radiofrequency generator and a plasma excitation electrode. Among these plasma processing units, a variation <RA> between the maximum and minimum values of input-terminal-side AC resistances RA of the matching circuits defined by <RA>=(RAmax−RAmin)/(RAmax+RAmin) is adjusted to be less than 0.5. A variation between the maximum and minimum values of output-terminal-side AC resistances RB of the matching circuits defined by <RB>=(RBmax−RBmin)/(RBmax+RBmin) is also adjusted to be less than 0.5. The plasma processing units can be adjusted to achieve substantially uniform plasma results in a shorter period of time.
    Type: Grant
    Filed: November 6, 2001
    Date of Patent: October 19, 2004
    Assignee: Alps Electric Co., Ltd.
    Inventors: Akihiro Nakano, Tadahiro Ohmi
  • Patent number: 6794601
    Abstract: A plasma arc torch system, a circuit, and a method for controlling a pilot arc is disclosed. A rate of change sensor, such as a dv/dt sensor, monitors an output current signal or an output voltage signal to determine whether to close a switch to re-attach a pilot arc before a transferred arc becomes extinguished. The switch selectively connects a tip into a circuit path with an electrode and a power supply to allow the pilot arc to form between the tip and the electrode. A power supply preferably regulates the output current or voltage to a first level when a pilot arc is present, and to a second mode when a transferred arc is present.
    Type: Grant
    Filed: September 5, 2002
    Date of Patent: September 21, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Stephen W. Norris, Roger Chamberlin, David Morrie
  • Patent number: 6781085
    Abstract: The present invention is directed to a method and apparatus for coordinating the idle mode of a plasma cutter with the idle mode of a power supply so as to prevent lock-out of the plasma cutter when the power supply is in an idle operating state. By putting the plasma cutter in a non-lock-out or “sleep” mode, fuel consumption as well as noise generated by the power supply are reduced. Additionally, by placing the plasma cutter in sleep mode, the user need not turn the power switch of the plasma cutter on and off in order to save power. User input to the plasma cutter kicks the power supply out of idle. The power supply will remain at a non-idle, full operating run mode during the cutting process. However, once the cut is complete and the current draw of the plasma cutter is at a level lower than the power supply idle mode, the plasma cutter will return to sleep mode.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: August 24, 2004
    Assignee: Illinois Tool Works Inc.
    Inventors: James F. Ulrich, Joseph Schneider
  • Patent number: 6777638
    Abstract: There are provided a plasma arc torch and associated methods for selectively switching between a working mode and a standby mode. An electric arc is established between an electrode and a workpiece, and the torch is operated selectively in the working and standby modes. In the working mode, the arc extends between the electrode and the workpiece, the arc has a working arc current, and a plasma gas flows through a nozzle at a working flow rate. In the subsequent standby mode, the arc extends between the electrode and the nozzle and has a current less than the working arc current. The gas flow rate in the standby mode can be reduced to less than the working flow rate, and the plasma gas can be switched from an oxidizing gas to a non-oxidizing gas.
    Type: Grant
    Filed: November 14, 2002
    Date of Patent: August 17, 2004
    Assignee: The ESAB Group, Inc.
    Inventor: Valerian Nemchinsky
  • Patent number: 6770836
    Abstract: An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network including; a second coil grounded having a second voltage, the second voltage being lower than the first voltage; first and second reactive elements, one end portion of the first and second reactive elements being connected to each end portion of the second coil, respectively; and a load connected to the other end portions of the first and second reactive elements, phases at two end portions of the load being different from each other.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: August 3, 2004
    Assignee: Jusung Engineering Co., Ltd.
    Inventors: Gi-Chung Kwon, Hong-Sik Byun, Sung-Weon Lee, Hong-Seub Kim, Sun-Seok Han, Bu-Jin Ko, Joung-Sik Kim
  • Patent number: 6753497
    Abstract: Methods and apparatus for initiating a welding arc by directing a plasma jet into the space between the tip of the welding electrode and the workpiece. This is done while an electrical potential is applied between the electrode and the workpiece. The ionized plasma gas renders the space between the electrode and the workpiece more conductive, thereby reducing the voltage threshold needed to initiate an arc between the electrode and the workpiece. When the voltage threshold reaches the level of the applied electrical potential, the arc will be initiated.
    Type: Grant
    Filed: March 17, 2003
    Date of Patent: June 22, 2004
    Assignee: Illinois Tool Works Inc.
    Inventors: Tim A. Matus, Lin Zhang
  • Patent number: 6753496
    Abstract: On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed to be slidable by linear guides with respect to a process chamber. In this way, a plasma processing apparatus can be provided that performs a highly uniform plasma process and is excellent in terms of plasma generation property.
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: June 22, 2004
    Assignees: Sharp Kabushiki Kaisha
    Inventors: Takamitsu Tadera, Tatsushi Yamamoto, Masaki Hirayama, Tadahiro Ohmi
  • Patent number: 6740843
    Abstract: An apparatus and method are disclosed whereby if the arc in a DC or long-pulse AC vacuum arc plasma process (eg in vacuum deposition) starts to extinguish, this is automatically detected and a re-ignition process is activated. Detection of a tendency for the arc to extinguish is detected by monitoring the main power supply voltage, which will increase if the arc is extinguished.
    Type: Grant
    Filed: September 12, 2002
    Date of Patent: May 25, 2004
    Assignee: City University of Hong Kong
    Inventors: Paul K. Chu, Liuhe Li
  • Patent number: 6740842
    Abstract: A system for converting DC power (22) into an RF electromagnetic field in a processing chamber, the system being composed of: a coil (16) constructed to surround the processing chamber; and an RF power generator (20) including a free-running oscillator (26) having a DC power input and an RF power output, the power output connected to a load impedance which includes the coil for supplying RF current to the coil at a frequency which is dependent on the load impedance.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: May 25, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Wayne L. Johnson, Leonard G. West
  • Patent number: 6713711
    Abstract: A quick disconnect for use in a plasma arc torch is provided that comprises a plug housing and a mating socket housing, a locking ring disposed around the plug housing secures the plug housing to the socket housing. A negative lead gas carrying pin is disposed within the plug housing, and a mating main power socket is disposed within the socket housing for the purpose of conducting both gas and electricity from a power supply to a plasma arc torch. Further, the negative lead gas carrying pin and mating main power socket are positioned off-center in order to provide additional volume for a plurality of signal conductors disposed within each housing, along with a pilot return conductor. Additionally, both the plug housing and the socket housing define a D-configuration in order to properly align the housings and conductors disposed therein, among other novel features of the present invention.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: March 30, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Christopher J. Conway, Fred Rogers, Darrin H. MacKenzie, Douglass A. Demers, Stewart Trent Adams, Joseph P. Jones
  • Patent number: 6707001
    Abstract: The present invention is directed to an overvoltage protection control that includes a combination of hardware and software that together detect and determine an average voltage of a power signal being supplied by a power source to a welding-type device. The determined average voltage is then compared to a “trip” voltage. If the average voltage is greater than or equal to the trip voltage then the welding-type device is disabled. The present invention may also be implemented as an undervoltage control wherein the detected average voltage is compared to a minimum acceptable average voltage. If the average voltage of the power signal being supplied to the welding-type device is less than the minimum acceptable average voltage, the welding-type device is prevented from being operated.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: March 16, 2004
    Assignee: Illinois Tool Works Inc.
    Inventors: James F. Ulrich, Joseph C. Schneider
  • Publication number: 20040045942
    Abstract: A plasma arc torch system, a circuit, and a method for controlling a pilot arc is disclosed. A rate of change sensor, such as a dv/dt sensor, monitors an output current signal or an output voltage signal to determine whether to close a switch to re-attach a pilot arc before a transferred arc becomes extinguished. The switch selectively connects a tip into a circuit path with an electrode and a power supply to allow the pilot arc to form between the tip and the electrode. A power supply preferably regulates the output current or voltage to a first level when a pilot arc is present, and to a second mode when a transferred arc is present.
    Type: Application
    Filed: September 5, 2002
    Publication date: March 11, 2004
    Inventors: Stephen W. Norris, Roger Chamberlin, David Morrie
  • Patent number: 6703581
    Abstract: A contact start plasma torch and method of starting the torch includes a negatively charged cathode body and a positively charged anode body. A conductive element in the torch is constructed of an electrically conductive material and is free from fixed connection with the cathode body and the anode body. The torch is operable between an idle mode wherein the conductive element provides an electrically conductive path between the cathode body and the anode body and an pilot mode wherein a pilot arc is formed between the conductive element and at least one of the cathode body and the anode body. The pilot arc is blown by working gas flowing through the torch toward an exit orifice of the torch whereby the working gas is exhausted from the torch in the form of an ionized plasma.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: March 9, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Joseph P. Jones, Roger W. Hewett, Kevin D. Horner-Richardson, David A. Small
  • Patent number: 6703579
    Abstract: A thermal spraying system includes thermal spray material, an electrical energy thermal spraying device atomizing and spraying the thermal spray material, a power supply supplying electrical power to the spraying device, a sensor monitoring a power characteristic of the supplied electrical power, and a feed rate control module adjusting a feed rate of the thermal spray material based on the monitored power characteristic.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: March 9, 2004
    Assignee: Cinetic Automation Corporation
    Inventor: Edwin E. Rice
  • Patent number: 6700092
    Abstract: A method of controlling an output of a generator is provided. The output provides an output signal having a settling time to a load having an impedance. The settling time of the output signal is determined. The output signal is amplitude modulated with a modulation waveform. A sense signal is generated that is representative of the modulated output signal. The sense signal is sampled at a sampling time based upon the settling time of the output signal. A digital representation of the sampled sense signal is generated. The amplitude modulation of the output is controlled based upon the digital representation of the sampled sense signal.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: March 2, 2004
    Assignee: ENI Technology, Inc.
    Inventors: Daniel J. Vona, Jr., Aaron T. Radomski, Kevin P. Nasman, William R. Pulhamus, Jr.
  • Patent number: 6696663
    Abstract: An inductively coupled plasma apparatus which is capable of performing etching processing steps in a stable manner and consecutively. Shield plates are provided in a reaction tube in the vicinity of an inner surface thereof. The shield plates prevent a conductive material generated by etching a wafer from sticking to the overall inner surface of the reaction tube. A portion of the inner wall covered by the shield plate, that is, a region where no conductive material is deposited serves as a high-frequency window, through which high-frequency electric power is efficiently fed from a coil antenna into the reaction tube. The conductive materials thus stuck separately from each other exhibit the Faraday shield effect, thereby stabilizing plasma potential.
    Type: Grant
    Filed: October 7, 2002
    Date of Patent: February 24, 2004
    Assignee: Fujitsu Limited
    Inventor: Yuichi Tachino
  • Patent number: 6696661
    Abstract: A method and apparatus for sealing a package over/around a circuit is presented. A pressurized directional flow of plasma is applied between metal bonding edges of the package and a metal surface surrounding circuitry to be enclosed in the package. During the application of plasma between the bonding surfaces, a bonding devices direct contact fusion/diffusion bonds the metal bonding edges of the package to the metal bonding surface surrounding the circuitry to be enclosed.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: February 24, 2004
    Assignee: GeoMat Insights, LLC
    Inventor: Ronald J. Barnett
  • Patent number: 6689983
    Abstract: Devices and methods are provided that control gas flow to a plasma arc torch local to a torch handle. Generally, a plasma arc torch is provided that comprises a gas control device operable with a torch lead and a torch head, and an activation member operable with the gas control device. Accordingly, the activation member activates the gas control device such that gas flow is supplied from the torch lead to the torch head, and the activation member deactivates the gas control device such that the gas flow is terminated. Further, the activation member may comprise a trigger system, a button, or a safety member, among others. Moreover, the gas control device may comprise a gas control valve or a switch that activates a gas control device disposed within a power supply, among others.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: February 10, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Kevin D. Horner-Richardson, Shiyu Chen, Roger W. Hewett, Joseph P. Jones, Kevin J. Kinderson, Darrin H. MacKenzie, Fred Rogers
  • Patent number: 6683273
    Abstract: A quick disconnect for use in a plasma arc torch is provided wherein a plurality of connections disposed therein are configured such that the connections break in a specific order when the quick disconnect is disengaged. Preferably, the quick disconnect comprises a plurality of signal pin connections, a pilot return connection, a fluid connection, and a main power connection. Accordingly, the signal pin connections break before the pilot return connection, the fluid connection, and the main power connection. Further, the pilot return connection breaks before the fluid connection and the main power connection, and the fluid connection breaks before the main power connection as the quick disconnect is disengaged. As a result, a safer quick disconnect in which both gas and electric power are conducted is provided by the present invention.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: January 27, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Christopher J. Conway, Fred Rogers
  • Patent number: 6677551
    Abstract: A process for operating a plasma torch having an improved start up and shut down sequence to substantially increase electrode element life. The first shut down mode is controlled such that plasma gas flow through the swirl ring and nozzle prevents the formation of an oxide layer upon the electrode. The shut down method is especially useful for torches which operate at 100 amps or greater. The inclusion of an aluminum jacket surrounding the electrode outer walls has been found to contribute to the ability to avoid formation of oxide layers on the electrode.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: January 13, 2004
    Assignee: InnerLogic, Inc.
    Inventor: Steven F. Hardwick
  • Patent number: 6670572
    Abstract: A solenoid control and safety circuit suitable for use in connection with contact start, plasma-arc torches. The system monitors a voltage to determine when to open an air control solenoid as part of a contact starting process. If a proper voltage is sensed, a gas solenoid is opened to allow airflow to separate the contact starting elements. The system also includes a circuit that monitors a gas pressure switch to determine whether sufficient pressure exists to separate the contact start elements after a contact start process has been initiated. The circuit removes power if it senses insufficient pressure. Also disclosed is a circuit that monitors a differential voltage between the electrode and the tip to determine if the elements remain in contact after airflow has been provided to the torch head.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: December 30, 2003
    Assignee: Thermal Dynamics Corporation
    Inventors: Stephen W. Norris, David A. Tatham, Roger W. Hewett
  • Patent number: 6664497
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: December 16, 2003
    Assignee: Applied Science and Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Patent number: 6646224
    Abstract: A plasma-assisted processing system has a lifting mechanism capable of vertically moving a microwave power unit and a waveguide to adjust the level of a planar slot antenna disposed on an expanded lower end part of the waveguide. A space extending under the antenna is surrounded by a shielding member. An optical sensor having an array of photosensors is disposed on the outer side of a window formed in the side wall of a vacuum vessel to monitor the lower limit level of a cease region for a plasma (cease level). An ideal distance between the cease level and the antenna is determined beforehand and the level of the antenna is adjusted on the basis of a measured cease level so that the antenna is spaced the ideal distance apart from the cease level. Since the difference between the cease level and a level X0 for the cutoff density of an X-wave is fixed, the level X0 may be monitored instead of the cease level.
    Type: Grant
    Filed: February 3, 2003
    Date of Patent: November 11, 2003
    Assignees: Tokyo Electron Limited
    Inventors: Nobuo Ishii, Yasuyoshi Yasaka, Makoto Ando, Naohisa Goto
  • Patent number: 6633017
    Abstract: An improved system of igniting a plasma using a rapid voltage rise and thus causing ions that may be pre-existing to create secondary electron emission or the like is provided. In one embodiment, the voltage rise can be timed to be comparable to the transit time of the electrons across the plasma. It can also be arranged to achieve a voltage rise in less than 1000 microseconds, to result in a transition time that is less than one hundred times the transit time, to maximize the emission of secondary electrons, or even to merely result in collision energies ranging from 5 to 500 electron volts. The transition time can be controlled through an ignition control that may be programmable, may involve charging output storage devices, or may involve delayed switching to supply the increased voltage to the plasma after the storage elements have been more fully charged.
    Type: Grant
    Filed: April 12, 2000
    Date of Patent: October 14, 2003
    Assignee: Advanced Energy Industries, Inc.
    Inventors: Geoffrey N. Drummond, George McDonough, Richard A. Scholl, Tim Kerr, John G. Harpold
  • Publication number: 20030164359
    Abstract: A solenoid control and safety circuit suitable for use in connection with contact start, plasma-arc torches. The system monitors a voltage to determine when to open an air control solenoid as part of a contact starting process. If a proper voltage is sensed, a gas solenoid is opened to allow airflow to separate the contact starting elements. The system also includes a circuit that monitors a gas pressure switch to determine whether sufficient pressure exists to separate the contact start elements after a contact start process has been initiated. The circuit removes power if it senses insufficient pressure. Also disclosed is a circuit that monitors a differential voltage between the electrode and the tip to determine if the elements remain in contact after airflow has been provided to the torch head.
    Type: Application
    Filed: March 4, 2002
    Publication date: September 4, 2003
    Applicant: Thermal Dynamics Corporation
    Inventors: Stephen W. Norris, David A. Tatham, Roger W. Hewett
  • Publication number: 20030160031
    Abstract: A trigger system for operating a plasma arc torch is provided that comprises a selector that operates between at least a first operating position and a second operating position, wherein the first operating position operates the plasma arc torch in a first mode to deliver gas to the plasma arc torch, and the second operating position operates the plasma arc torch in a second mode to deliver the gas and electric power to the plasma arc torch. Further, the selector comprises a neutral position that selects a neutral mode in which delivery of gas and electric power to the plasma arc torch is inhibited. The selector is preferably disposed within a housing of the plasma arc torch and is slidably operable between the first operating position, the second operating position, and the neutral position.
    Type: Application
    Filed: February 26, 2002
    Publication date: August 28, 2003
    Inventors: Joseph P. Jones, Kevin D. Horner-Richardson, Kevin J. Kinnerson
  • Publication number: 20030141285
    Abstract: An inductively coupled plasma apparatus which is capable of performing etching processing steps in a stable manner and consecutively. Shield plates are provided in a reaction tube in the vicinity of an inner surface thereof. The shield plates prevent a conductive material generated by etching a wafer from sticking to the overall inner surface of the reaction tube. A portion of the inner wall covered by the shield plate, that is, a region where no conductive material is deposited serves as a high-frequency window, through which high-frequency electric power is efficiently fed from a coil antenna into the reaction tube. The conductive materials thus stuck separately from each other exhibit the Faraday shield effect, thereby stabilizing plasma potential.
    Type: Application
    Filed: October 7, 2002
    Publication date: July 31, 2003
    Applicant: FUJITSU LIMITED.
    Inventor: Yuichi Tachino
  • Publication number: 20030094443
    Abstract: A method and apparatus for sealing a package over/around a circuit is presented. A pressurized directional flow of plasma is applied between metal bonding edges of the package and a metal surface surrounding circuitry to be enclosed in the package. During the application of plasma between the bonding surfaces, a bonding devices direct contact fusion/diffusion bonds the metal bonding edges of the package to the metal bonding surface surrounding the circuitry to be enclosed.
    Type: Application
    Filed: November 19, 2001
    Publication date: May 22, 2003
    Inventor: Ronald J. Barnett