For Causing Complex Ion Path Patents (Class 250/297)
  • Patent number: 6294781
    Abstract: A device for segregating high-mass particles in a multi-species plasma from lower-mass particles has a chamber surrounded by a hollow annular shaped enclosure which defines a central axis. In a radial direction outwardly from the axis, the chamber includes a light mass collection section that is in fluid communication, through an intermediate section, with a filter section. A magnetic field, Bz, is oriented parallel to the central axis in the filter section, and the filter section has an outer wall which is at a distance slightly greater than a distance “a” from the central axis. An electric field is crossed with the magnetic field and is perpendicular to the central axis in the filter section. Further, there is zero potential on the outer wall of the filter section while there is a positive potential “V” on the inner wall of the filter section.
    Type: Grant
    Filed: April 23, 1999
    Date of Patent: September 25, 2001
    Assignee: Archimedes Technology Group, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 5689112
    Abstract: Surface contamination of silicon wafers is detected by a combined beam-deflecting magnet and magnetic spectrometer system. Heavy ions are directed onto the surface of a silicon wafer through the beam-deflecting magnet, and ions back-scattered from contaminants in the surface of the wafer pass through the magnetic spectrometer onto a focal-plane detector. One or more Einzel lenses prevent ions back-scattered from the silicon in the wafer from reaching the detector.
    Type: Grant
    Filed: April 12, 1996
    Date of Patent: November 18, 1997
    Inventors: Harald A. Enge, William A. Lanford
  • Patent number: 5180919
    Abstract: An electron beam exposure system having a capability of checking a pattern to be written on an object comprises an electron beam source for producing an electron beam along an optical axis toward the object, a block mask provided on the optical axis and having selectable aperture patterns therein for correspondingly shaping the electron beam, an addressing deflector fixture for selectively passing the electron beam through a desired aperture on the block mask, an electron optical system for focusing the electron beam shaped by the block mask on the object such that an image of the aperture of the block mask is projected on the object, a screen provided along the optical axis between the block mask and the object for interrupting the electron beam when the electron beam is offset from the alignment with the optical axis, the screen having a through-hole in alignment with the optical axis for passing the electron beam therethrough a controller for controlling the electron optical system such that an image of th
    Type: Grant
    Filed: September 18, 1991
    Date of Patent: January 19, 1993
    Assignee: Fujitsu Limited
    Inventors: Yoshihisa Oae, Kiichi Sakamoto, Hiroshi Yasuda
  • Patent number: 5166518
    Abstract: A mass spectrometer comprising ion source means (1) for producing ions characteristic of a sample to be analysed; ion detector means (14) for receiving at least some of said ions; magnetic sector analyzing means (18) and electrostatic analyzing means (8) disposed in any order between said ion source means (1) and said ion detector means (14); wherein said magnetic sector analyzing means (18) comprises means for dispersing ions according to their mass-to-charge ratios and for transmitting ions whose mass-to-charge ratios lie within a predetermined range and have a first kinetic energy; said electrostatic analyzing means (8) comprises means for generating an electrostatic field for deflecting ions having different kinetic energies around different curved trajectories such that ions having a second kinetic energy, lower than said first kinetic energy, are deflected around a central curved trajectory (15) and transmitted through said electrostatic analyzing means (8), and the strength of said electrostatic field
    Type: Grant
    Filed: December 9, 1991
    Date of Patent: November 24, 1992
    Assignee: Fisons Plc
    Inventor: Philip A. Freedman
  • Patent number: 4952803
    Abstract: A double focusing mass spectrometer is used as the second mass analyzer of a Mass Spectrometry/Mass Spectrometry Instrument comprising a uniform electric field and a magnetic sector. Fragment ions produced from precursor ions of a certain ionic species are introduced into a uniform electric field. The fragment ions travel along parabolic orbits and are separated according to their respective energy levels. The separated fragment ions are introduced into a magnetic sector and are dispersed according to their mass by the magnetic sector. A two-dimensional ion detector is disposed along a focal plane of the magnetic sector in order to simultaneously detect the fragment ions and to obtain a spectrum of the fragment ions.
    Type: Grant
    Filed: December 11, 1989
    Date of Patent: August 28, 1990
    Assignee: Jeol Ltd.
    Inventor: Hisashi Matsuda
  • Patent number: 4829179
    Abstract: A surface analyzer for analyzing physical properties of the surface of a sample by means of PELS (Proton energy loss spectroscopy) in which accelerated ion beams such as proton beams impinge on the sample in the vertical direction to the surface of the sample and ion beams scattered from the sample are decelerated and then detected by an analyzer to analyze the energy loss of the ion beams. The surface analyzer comprises an ion beam source for generating ion beams, deflecting means for deflecting the ion beams from the ion beam source, irradiating the surface of the sample with the ion beams from the ion beam source in the vertical direction to the surface of the sample, and deflecting scattered ion beams from the sample, accelerating and decelerating means for accelerating the ion beams before the ion beams impinge on the sample and decelerating the scattered ion beams, and analyzing means for detecting the scattered beams and analyzing energy loss of the ion beams.
    Type: Grant
    Filed: July 6, 1987
    Date of Patent: May 9, 1989
    Assignee: Nissin Electric Company, Limited
    Inventors: Masahiko Aoki, Masashi Konishi, Yasuhiro Matsuda, Naoto Okazaki
  • Patent number: 4723076
    Abstract: There is provided a mass spectrometer having at least three analyser sectors of the electrostatic or magnetic types, at least one sector being of the electrostatic type and at least one further sector being of the magnetic type. The spectrometer includes a focusing sector array having at least three analyzer sectors, the sectors of the array being dimensioned and positioned so as to cooperate to form a velocity- and direction- focused image. The sectors of the array are dimensioned and positioned as to form no velocity focused image within the array. One sector of said array is disposed adjacent to and between two sectors of the other type.
    Type: Grant
    Filed: May 13, 1986
    Date of Patent: February 2, 1988
    Assignee: VG Instruments Group Limited
    Inventor: Robert H. Bateman
  • Patent number: 4644161
    Abstract: A mass spectrograph combining one or more magnetic deflections with the action of electrostatic fields, characterized by the fact that the system is circularly symmetrical; by the fact that the ions are injected radially from a source constituted by a heated circular filament and a pair of small ring-shaped magnets which confine the ionizing electrons to the interior or exterior periphery of the analyzer system per se; by the fact that the first pair of deflection magnets of the analyzer system is ring shaped; and by the fact that the selective action of the other fields, in particular the electrostatic fields, is due to the prior dispersion obtained by the first magnetic induction.
    Type: Grant
    Filed: November 1, 1985
    Date of Patent: February 17, 1987
    Assignee: Compagnie Industrielle des Telecommunications Cit-Alcatel
    Inventor: Robert Evrard