Abstract: This charged particle beam device comprises: an electron beam source (1); a charged particle optical system that includes an object lens (9) and that irradiates a sample (10) with electrons emitted from the electron beam source (1) as an electron beam (2); an aberration corrector (6) that corrects aberrations in the charged particle optical system; and a control unit (24) that controls the components of the charged particle optical system and the aberration corrector (6). The charged particle beam device further comprises an automatic aberration-correcting device (17) that autonomously acquires, through leaning, optimum adjustment procedures in order to reduce the time required for correcting parasitic aberrations that arise in the aberration corrector (6).

Abstract: An oil level sensor comprises a body having a probe extending away from a nominal body portion. The probe receives a resistance thermal device and extends for a height away from the nominal surface. The probe has an outer dimension. The ratio of the outer dimension to the height is between 0.1 and 0.2. The RTD is connected to lead wires through splices, the lead wires leaving the nominal housing. A fastener tab extends away from the nominal body, and generally perpendicularly to the probe. The lead wires are anchored within a chamber, which is filled with a potting material.

Abstract: An energy analyzer for a charged-particle spectrometer may include a top deflection plate and a bottom deflection plate. The top and bottom deflection plates may be non-symmetric and configured to generate an inhomogeneous electrostatic field when a voltage is applied to one of the top or bottom deflection plates. In some instances, the top and bottom deflection plates may be L-shaped deflection plates.

Abstract: A method of operating a particle beam microscope includes: directing a particle beam onto a sample and detecting particles emanating from the sample during a first period for generating an image of the sample; generating electrons having a first distribution of kinetic energies and directing these electrons onto the sample during a second period for reducing a charge of the sample being generated while the directing the particle beam onto the sample; and generating electrons having a second distribution of their kinetic energies and directing these electrons onto the sample during a third period for further reducing the charge of the sample being generated while the directing of the particle beam onto the sample. An average value of the kinetic energy of the first distribution of the kinetic energy is greater than an average value of the kinetic energy of the second distribution of kinetic energies.

Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

Abstract: The present disclosure includes devices and methods for spectroscopic identification of molecules. One device includes a topological insulator layer oriented either above or below two metallic contacts and wherein the contacts are oriented such that a voltage can be applied across the contacts and a current-voltage characteristic can be measured.

Abstract: Systems and methods for performing X-ray Photoelectron Spectroscopy (XPS) measurements in a semiconductor environment are disclosed. A reference element peak is selected and tracked as part of the measurement process. Peak shift of the reference element peak, in electron volts (eV) is tracked and applied to other portions of acquired spectrum to compensate for the shift, which results from surface charge fluctuation.

Abstract: A magnetic immersion lens apparatus includes an outer pole piece and an inner pole piece with a gap therebetween proximate a common axis of the first and second pole pieces. The outer pole piece has an opening that permits energetic particles from a target in front of the immersion lens to pass through the outer pole piece to an external detector. The outer or inner pole piece has one or more notches near the gap, including at least one notch that expands cone of acceptance through which the energetic particles can pass from the target to the external detector. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

Abstract: A detector (100) is used to detect a charged particle beam (EB), and includes a first light emission portion (10) for converting the charged particle beam into light, a second light emission portion (20) for converting the charged particle beam transmitted through the first light emission portion (10) into light, and a light detector (30) for detecting the light produced by the first light emission portion (10) and the light produced by the second light emission portion (20). The first light emission portion (10) is a powdered scintillator. The second light emission portion (20) is a single crystal scintillator.

Abstract: A method for measuring a film thickness of an SOI layer of an SOI wafer including at least an insulator layer and the SOI layer which is formed on the insulator layer and is formed of a silicon single crystal, wherein a surface of the SOI layer is irradiated with an electron beam, characteristic X-rays are detected from a side of the SOI layer surface irradiated with the electron beam, the characteristic X-rays being generated by exciting a specific element in the insulator layer with the electron beam that has passed through the SOI layer and has been attenuated in the SOI layer, and the film thickness of the SOI layer is calculated on the basis of an intensity of the detected characteristic X-rays.

Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.

Abstract: A charged particle detector arrangement is described. The detector arrangement includes a detection element and a collector electrode configured to collect charged particles released from the detection element upon impact of signal charged particles.

Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.

Abstract: An electron beam inspection apparatus includes an electron beam irradiating unit, an electric field generating unit, an energy analyzing unit, and a detection unit. The electron beam irradiating unit irradiates an electron beam on a sample. The electric field generating unit generates an electric field in an irradiation direction of the electron beam. The energy analyzing unit analyzes energy of electrons emitted from the sample caused by emission of the electron beam, where the electrons are accelerated by the electric field. The detection unit detects a depth position of a portion to which the electrons are emitted in the irradiation direction of the electron beam based on a result of the energy analysis.

Abstract: A method for measuring the population of atoms in a vapor cell comprises collecting a sample of atoms, applying radio frequency (RF) spectroscopy to the sample such that a first portion of the atoms are in an upper ground state and a second portion of the atoms are in a lower ground state, and applying light to the sample to produce a first fluorescence such that all atoms are left in the lower ground state. The method further comprises measuring a population of the atoms in the upper ground state based on the first fluorescence, applying an RF pulse to the sample to transfer the atoms in the lower ground state to the upper ground state, and applying light to the sample after the RF pulse is applied to produce a second fluorescence. A population of all the atoms in the sample is then measured based on the second fluorescence.

Abstract: A sample analyzer is offered which creates a ternary scatter diagram representing a concentration ratio distribution of three elements out of several elements to be analyzed. This three-dimensional graph is created by adding an axis to the ternary scatter diagram and representing concentration information about the two additional elements on the added axis. The sample analyzer performs elemental analysis of a sample by scanning a primary beam over the sample and detecting a signal emanating from the sample. The added axis intersects the plane of the ternary scatter diagram.

Abstract: An apparatus for detecting one or each of Kikuchi and Kossel diffraction patterns is provided. The apparatus comprises an electron column adapted in use to provide an electron beam (101) directed to wards a sample (102), the electron beam (101) having an energy in the range 2 keV to 50 keV, and a particle detector (111) for receiving and counting particles (103) from the sample (102) due to interaction of the electron beam (101) with the sample (102), the detector comprising an array of pixels (109) and having a count rate capability of at least 1000 particles per second for each pixel. The particle detector (111) is further adapted to provide electronic energy filtering of the received particles in order to count the received particles which are representative of the said diffraction pattern.

Abstract: Provided is a technique to automatize a synthesis function of signal charged particles having different energies.

Abstract: In exemplary embodiments, an apparatus, includes a first electrode, a second electrode, a first polygonal channel extending between the electrodes, the first channel having a first side having a center, and a second polygonal channel extending between the electrodes, the second channel having a second side contacting the first side, the second side having a center, wherein the center of the first side and the center of the second side are non-collinear in a direction perpendicular to a surface of the first side, and wherein the first and second channels do not have square cross sections perpendicular to longitudinal axes of the channels.

Abstract: A surface charge measuring distribution method includes the steps of irradiating a sample with a charged particle beam and charging a sample surface in a spot-like manner, irradiating the charged sample with the charged particle beam to measure a potential at a potential saddle point formed above the sample, selecting one of preset multiple structure models and a tentative space charge distribution associated with the selected structure model, calculating a space potential at the potential saddle point by electromagnetic field analysis using the selected structure model and tentative space charge distribution, comparing the calculated space potential and measured value to determine the tentative space charge distribution as a space charge distribution of the sample when an error between the space potential and the measured value is within a predetermined range, and calculating a surface charge distribution of the sample by electromagnetic field analysis based on the determined space charge distribution.

Abstract: Systems and methods for performing X-ray Photoelectron Spectroscopy (XPS) measurements in a semiconductor environment are disclosed. A reference element peak is selected and tracked as part of the measurement process. Peak shift of the reference element peak, in electron volts (eV) is tracked and applied to other portions of acquired spectrum to compensate for the shift, which results from surface charge fluctuation.

Abstract: Various embodiments of the present invention provide systems and methods for determining an characteristic of a material. The characteristics may include, but are not limited to, crystallographic and chemical composition characteristics of a material.

Abstract: A substrate inspection apparatus 1-1 (FIG.

Abstract: Systems, methods, and computer-readable media for temperature measurement of a sample, using new temperature measurement and mapping techniques, are provided. The technique employs a temperature sensitive electron signal in a scanning electron microscope (SEM) and provides both high spatial resolution and non-contact temperature measurement capabilities. An electron beam of the SEM can be initiated to interact with a sample, and a temperature sensitive signal can be collected from the sample and analyzed.

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract: A spectrum analysis method is provided in which a composition distribution of a sample in the depth direction is analyzed based on an energy spectrum of scattered particles scattered at the sample by irradiation with ion beams, the sample being composed of a single layer or multiple layers. In the spectrum analysis, the thickness of an object layer of the sample is obtained by the steps of measuring an energy spectrum of scattered particles scattered in a scattering angle (specific scattering angle) direction at which an energy spectrum corresponding to the object layer independently appears, extracting an independent energy spectrum of the object layer which independently appears in the measured energy spectrum, and calculating the thickness of the object layer based on a spectrum area surrounded by the waveform of the independent energy spectrum thus extracted.

Abstract: Provided is an apparatus for preparing a sample including: a sample stage that supports a sample; a focused ion beam column that applies a focused ion beam to the same sample and processes the sample; and an irradiation area setting unit that sets a focused-ion-beam irradiation area including a first irradiation area used to form an observation field irradiated with an electron beam in order to detect backscattered electrons and a second irradiation area used to form a tilted surface tilted with respect to the normal line of the observation field with an angle of 67.5° or more and less than 90°.

Abstract: A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer.

Abstract: A sample processing apparatus (102) includes a reference carrier region (106) that supports a reference carrier (108), which includes one or more reference substances that emit radiation with unique and known spectral characteristics in response to being irradiated with radiation having a wavelength in a predetermined range of interest. The sample processing apparatus further includes a carrier receiving region (110) configured to alternatively receive a sample carrier (104) or the reference carrier for processing by the apparatus. The sample processing apparatus further includes an optical component (114, 116, 118) that emits radiation, having a wavelength in a predetermined range of interest, that irradiates the carrier in the carrier receiving region, and that detects the radiation emitted from the carrier. The apparatus moves the reference carrier from the reference carrier region to the carrier receiving region for processing by the apparatus.

Abstract: An apparatus includes an irradiation device configured to irradiate an object with charged particle beams, a measurement device configured to measure a characteristic of each of charged particle beams, and a controller. The measurement device includes a plate including knife edges, and a sensor configured to detect a charged particle beam incident thereon via the plate. The controller causes one charged particle beam, selected from the charged particle beams, to perform a scan relative to the measurement device so that the one charged particle beam traverses at least two knife edges among the plurality of knife edges, and to generate correction information for correcting a measurement error of the measurement device due to deformation of the plate, based on an output from the sensor upon the scan.

Abstract: An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract: Information from multiple detectors acquiring different types of information is combined to determine one or more properties of a sample more efficiently than the properties could be determined using a single type of information from a single type of detector. In some embodiments, information is collected simultaneously from the different detectors which can greatly reduce data acquisition time. In some embodiments, information from different points on the sample are grouped based on information from one type of detector and information from the second type of detector related to these points is combined, for example, to create a single spectrum from a second detector of a region of common composition as determined by the first detector. In some embodiments, the data collection is adaptive, that is, the data is analyzed during collection to determine whether sufficient data has been collected to determine a desired property with the desired confidence.

Abstract: One embodiment relates to an apparatus for correcting aberrations introduced when an electron lens forms an image of a specimen and simultaneously forming an electron image using electrons with a narrow range of electron energies from an electron beam with a wide range of energies. A first electron beam source is configured to generate a lower energy electron beam, and a second electron beam source is configured to generate a higher energy electron beam. The higher energy beam is passed through a monochromator comprising an energy-dispersive beam separator, an electron mirror and a knife-edge plate that removes both the high and low energy tail from the propagating beam. Both the lower and higher energy electron beams are deflected by an energy-dispersive beam separator towards the specimen and form overlapping illuminating electron beams. An objective lens accelerates the electrons emitted or scattered by the sample.

Abstract: A sequential radial mirror analyzer (RMA) (100) for facilitating rotationally symmetric detection of charged particles caused by a charged beam incident on a specimen (112) is disclosed. The RMA comprises a 0V equipotential exit grid (116), and a plurality of electrodes (119, 120a, 120b, 120c) electrically configured to generate corresponding electrostatic fields for deflecting at least some of the charged particles of a single energy level to exit through the exit grid (116) to form a second-order focal point on a detector (106). The second-order focal point is associated with the single energy level, and the detector (106) is disposed external to the corresponding electrostatic fields. A related method is also disclosed.

Abstract: Mineral definitions each include a list of elements, each of the elements having a corresponding standard spectrum. To determine the composition of an unknown mineral sample, the acquired spectrum of the sample is sequentially decomposed into the standard spectra of the elements from the element list of each of the mineral definitions, and a similarity metric computed for each mineral definition. The unknown mineral is identified as the mineral having the best similarity metric.

Abstract: A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

Abstract: The invention relates to a method of performing tomographic imaging involving repeatedly directing a charged particle beam through a sample for a series of sample tilts to acquire a corresponding set of images and mathematically combining the images to construct a composite image. The latter of which consists of, at each of a second series of sample tilts, using a spectral detector to accrue a spectral map of said sample, thus acquiring a collection of spectral maps; analyzing said spectral maps to derive compositional data of the sample; and employing said compositional data in constructing said composite image.

Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.

Abstract: According to one embodiment, a mask inspection apparatus includes a decompression chamber, a holder, a light irradiation unit, a detection unit, an electrode, and a control unit. The holder is provided in the decompression chamber and holds a mask. The light irradiation unit irradiates a major surface of the mask held by the holder with a light. The detection unit is provided in the decompression chamber to detect electrons generated when the major surface of the mask is irradiated with the light. The electrode is provided between the holder and the detection unit and guides the electrons in a direction from the holder toward the detection unit. The control unit compares a detection result of the electrons detected by the detection unit with a reference value.

Abstract: System and methods for decomposing an Auger electron spectrum into elemental and chemical components, includes conditioning and input spectrum to generate a normalized input spectrum; determining statistical correlation between the normalized input spectrum and stored elemental spectral signatures; and characterizing elemental or chemical species in the input spectrum from the statistical correlation, wherein said conditioning the input spectrum includes estimating a background signal of non-Auger electrons in the input spectrum and subtracting the estimated background signal from the input spectrum.

Abstract: A transmission electron microscope comprises a high-voltage source for outputting a high voltage at two high-voltage outputs and outputting a control signal at a controller output; a focusing lens for focusing a beam; a monochromator which allows only those particles of the particle beam to pass whose kinetic energy is within an adjustable energy interval; an energy-dispersive component which deflects particles of different kinetic energies differently; a detector; and a controller connected to the controller output, which controls a beam deflector, arranged between the energy-dispersive component and the detector, the monochromator, or the energy-dispersive component in dependence on the control signal, or superposes plural of intensity distributions detected by the detector with an offset relative to one another, which offset is set in dependence on the control signal.

Abstract: An ultrafast electron diffraction device for irradiating a sample with a bunch of electrons in an ultrashort pulse in order to perform an ultrafast analysis of the sample. The ultrafast electron diffraction device includes: a) a laser emitter for delivering an ultrashort pulse laser having a pulse width of not more than 1 ps onto a target which is a material for generating electrons at an intensity of not less than 1017 W/cm2; and b) a pulse compressor for rotating, in a magnetostatic field, a bunch of electrons generated from the target onto which the ultrashort pulse laser has been delivered so as to suppress the spread of the bunch of electrons in their traveling direction. The pulse compressor is composed of an entrance-side parallel-plate static magnet, one end of which is placed on the course of the bunch of electrons, and an exit-side parallel-plate static magnet.

Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.

Abstract: System and methods for decomposing an Auger electron spectrum into elemental and chemical components, includes conditioning and input spectrum to generate a normalized input spectrum; determining statistical correlation between the normalized input spectrum and stored elemental spectral signatures; and characterizing elemental or chemical species in the input spectrum from the statistical correlation, wherein said conditioning the input spectrum includes estimating a background signal of non-Auger electrons in the input spectrum and subtracting the estimated background signal from the input spectrum.

Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.

Abstract: A particle beam system comprises a particle beam source for generating a particle beam, an objective lens for focusing the particle beam onto an object plane, wherein the objective lens comprises a focal length and an optical axis, and a scintillator arrangement, which comprises an electron receiving surface facing the object plane and which is arranged such that it is exposed to electrons, which emanate from the object plane. The scintillator arrangement further comprises a light exit face, wherein the scintillator arrangement is configured such that light rays which are generated by electrons, which are incident on the electron receiving surface leave the scintillator arrangement at the light exit face.

Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.