Secondary Emissive Type Patents (Class 250/399)
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Patent number: 4843246Abstract: The invention concerns apparatus for detecting the position of incidence (2) of a beam (1) of charge carriers on a target (3) wherein X-rays (4) starting from the position of incidence (2) are detected by detector (7) connected to an analyzing circuit (9) An imaging system (5, 50; 10, 11, 12) is provided which can cover all the positions (P.sub.1 . . . P.sub.8) that the positions of incidence (2) can take up and projects them on the sensing surface of a position-sensitive detector (7), wherein the projected coordinates (x', y') are directly proportional to the coordinates (x, y) of the position of incidence (2). In addition, a filter (6) highly transparent to the X-ray radiation range emitted from the position of incidence (2) is arranged between the target surface (3) and the position-sensitive sensor (7). The position-sensitive detector (7) emits electric signals which depend from the coordinates (x, y) of the position of incidence (FIG. 1).Type: GrantFiled: December 3, 1987Date of Patent: June 27, 1989Assignee: Leybold-Heraeus GmbHInventors: Ewald Benes, Franz Viehbock, Herbert Stori, Friedrich-Werner Thomas, Gernot Thorn
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Patent number: 4841143Abstract: A charged particle beam apparatus is disclosed, which comprises a charged particle source; focusing means for focusing a charged particle beam emitted by the charged particle source on a sample and irradiating it therewith; deflecting means for deflecting the charged particle beam so as to scan the sample therewith; secondary ion separating means disposed approximately symmetrically with respect to the axis of the charged particle beam at the proximity of said sample and separating positive and negative secondary ions generated by the irradiation of the sample into positive and negative ions; and mass analyzers for analyzing the mass of the separated positive and negative secondary ions, respectively.Type: GrantFiled: February 25, 1988Date of Patent: June 20, 1989Assignee: Hitachi, Ltd.Inventors: Hifumi Tamura, Hiroyasu Shichi, Kaoru Umemura
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Patent number: 4803369Abstract: On a charged particle beam disphragm for confining the angular aperture of a charged particle beam striking a sample, contamination is caused by the impact of the charged particles. A metal material is sputtered by the ion sputtering technique, and the sputtered metal particles are attached over the surface of the contamination incurred on the charged particle beam diaphragm to cover the surface of the contamination. As a result, the charged particle beam diaphragm is substantially purified.Type: GrantFiled: January 6, 1987Date of Patent: February 7, 1989Assignee: Hitachi, Ltd.Inventor: Tadashi Otaka
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Patent number: 4746571Abstract: An X-ray detector efficiency standard is formed of multiple spherical particles of various materials distributed over the surface of a substrate. The particles are preferably formed of pure materials, such as pure elements and stoichiometric compounds, having characteristic X-ray emission energies which span a range sufficient to determine the efficiency of the X-ray detector substantially over its operating range. The spherical particles may be formed by an electrohydrodynamic spraying process and have a diameter preferably in the range of 10 nanometers to 1 micron.Type: GrantFiled: August 1, 1986Date of Patent: May 24, 1988Assignee: Wisconsin Alumni Research FoundationInventor: Thomas F. Kelly
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Method and apparatus for analyzing positron extinction and electron microscope having said apparatus
Patent number: 4740694Abstract: This invention relates to a method and apparatus for positron extinction analysis which irradiates a positron beam to a sample to be analyzed through a convergent lens system consisting of a magnetic lens and measures the extinction .gamma.-rays generated from the sample for the positron extinction analysis. The invention utilizes the property of the magnetic lens of an electron microscope that the magnetic lens has the same focal distance for both the positron and the electron having mutually the same energy. If the magnetic lens of the electron microscope is used as a convergent lens system for a positron beam, the positron beam can be radiated highly accurately to a very small, local position of the sample which is being observed through the electron microscope. For instance, in the case of a transmission type electron microscope, the convergent lens system of the electron beam is used as a convergent lens system of the positron beam.Type: GrantFiled: June 4, 1986Date of Patent: April 26, 1988Assignee: Hitachi, Ltd.Inventors: Eiichi Nishimura, Kazumichi Suzuki -
Patent number: 4717826Abstract: Intracellular mineral concentrations are obtained from very small tissue samples, such as sublingual tissue smears. The tissue smears are subjected to excitation radiation, typically a scanning electron beam, and mineral analyses may be based on the profile of emitted x-ray fluorescence. A number of correlations are made between various diseased states, susceptibility to diseased states, metabolic status based on the elevated and depressed levels of some or all of the mineral concentrations.Type: GrantFiled: June 26, 1986Date of Patent: January 5, 1988Assignee: Spectro-Scan, Inc.Inventor: Burton B. Silver
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Patent number: 4694170Abstract: A sample (EC) is mounted on a sample carrier (PO). Vertically thereabove a common optical portion (5) receives a beam of primary ions derived from an ion source (S10) together with a beam of primary electrons derived from an electron source (S30). The secondary electrons and ions due to the sample (EC) being bombarded by said primary ions and electrons are retrieved by said common optical portion (5). The electrons are detected by electron detection means (D40). The secondary optical system (2) transmits the secondary ions to a mass spectrometer (SP20). This instrument is capable of providing ion and electron images of a single sample simultaneously.Type: GrantFiled: December 24, 1985Date of Patent: September 15, 1987Assignees: Office National d'Etudes et de Recherches Aerospatiales, Universite de ParissudInventors: Georges Slodzian, Bernard Daigne, Francois Girard
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Patent number: 4680468Abstract: A detector for charged particles, i.e. secondary electons ir ions emitted from a bombardment area of a specimen in an instrument such as a scanning electron microscope or analytical instrument, consists of a collector, e.g. a scintillation surface highly charged with a voltage of the opposite polarity from that of the particles, for receiving the particles and providing an output proportional to the number thereof. A grid, charged with a voltage of the same sign as the scintillation surface, but to a lower value, is located between the scintillation surface and the bombardment area, and a probe in the form of a wire electrically connected to the grid projects into the vicinity of the bombardment area which is in a confined space between the specimen and the instrument. The result is to set up an electrostatic field around the wire, causing a significant number of the charged particles to orbit the wire and travel to the scintillation surface.Type: GrantFiled: August 5, 1985Date of Patent: July 14, 1987Assignee: Canadian Patents and Development Limited-Societe Canadienne des Brevets et d'Exploitation LimiteeInventors: Claude Bouchard, Pierre Boulanger
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Patent number: 4635282Abstract: A gas injection type plasma X-ray source has a gas plenum for storing a discharging gas at a pressure in the range of 150 Torr and 1000 Torr, the stored gas being injected between a pair of electrodes through a gas valve. The electrodes are opposed to each other in a vacuum vessel, so that a gas jet for the production of a plasma is formed. A voltage is applied between the electrodes, so that a discharge plasma is produced between said electrodes. A linear plasma with a high temperature and a high density is produced by the pinch of the plasma due to its own magnetic field produced by the current flowing through the plasma, so that X-rays are emitted from the linear plasma. The X-ray source has a high conversion efficiency and a high discharge timing margin, and accordingly the stability and reproducibility of discharges are improved and the X-ray output is increased.Type: GrantFiled: February 7, 1985Date of Patent: January 6, 1987Assignee: Nippon Telegraph & Telephone Public Corp.Inventors: Ikuo Okada, Yasunao Saitoh, Hideo Yoshihara, Satoshi Nakayama
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Patent number: 4484341Abstract: An apparatus and system is provided for utilizing an electron beam machine to selectively and alternatively irradiate materials with electrons of X-rays; the conversion between electron radiation and X-radiation being achieved by interposing a plate of low Z material such as aluminum between the beam and the material to be irradiated, the plate having its surface facing the electron beam covered with an X-ray generating or high Z material. The plate serves as a mechanical support for the high Z material, an electron capture body and to some extent as a heat sink. Materials to be irradiated are disposed in a cart and are conveyed under the beam with the plate being interposed whenever a material to receive X-rays passes thereunder; the carts being employed to readily permit multiple passes of the material to be treated with X-rays under the beam whereby heat build up in the X-ray generating target placed over each cart may be maintained at acceptable levels.Type: GrantFiled: October 2, 1981Date of Patent: November 20, 1984Assignee: Radiation Dynamics, Inc.Inventor: Robert Luniewski
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Patent number: 4472634Abstract: The invention relates to an apparatus for determining the electron states of a material. This apparatus comprises an enclosure containing a material, means for producing electrons of energy E.sub.i such, that on then penetrating the material, they acquire an energy E.sub.f below E.sub.i, accompanied by an emission of photons having different wavelengths. The apparatus also comprises another enclosure equipped with a tube entering the vacuum enclosure and provided with an entrance slit and another tube provided with a regulatable exit slit. The apparatus also comprises a grating located in the other enclosure and etched with lines, whilst being able to rotate about an axis parallel to these lines in order to select photons of the same wavelength. The apparatus finally has means for detecting the selected photons.Application to the determination of the forbidden band of a semiconductor.Type: GrantFiled: April 29, 1982Date of Patent: September 18, 1984Assignee: Commissariat a l'Energie AtomiqueInventors: Robert Baptist, Gerard Chauvet
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Patent number: 4442352Abstract: A method and a device for irradiating a confined volume of material, generally situated at a substantial depth below surface, with a beam of high energy charged or uncharged (neutral) particles have a characteristic feature that a beam of charged particles (e.g., electrons, protons, or deuterons) coming from a radiation source is scanned electrically in two orthogonal directions. To obtain a scanned beam of neutral particles, for example photons, a scanned beam of electrons is directed into a target which then emits the scanned beam of neutral particles to be incident into the confined volume. The emerging neutral particles will be emitted from the target predominantly in the direction as the incoming charged particles.Type: GrantFiled: March 9, 1982Date of Patent: April 10, 1984Assignee: Instrument AB ScanditronixInventor: Anders Brahme
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Patent number: 4439680Abstract: A particle beam, such as that generated by a scanning electron microscope, impinges upon the specimen to be analyzed. The beam produces X-rays, the energy of which enables the various elements contained in the specimen to be identified. The detected X-ray energy is converted to rectangular electrical pulses, the height of which is proportional to the detected X-ray energy and hence characteristic of the element or elements present in the specimen. The pulse signals are coded so as to trigger or energize the several guns of a conventional color cathode ray tube, such as that used in a color televison receiver. The resulting multicolor map displayed on the screen of the cathode ray tube thus visually indicates to the observer the presence of certain elements and their relative position in the specimen being investigated.Type: GrantFiled: June 28, 1982Date of Patent: March 27, 1984Assignee: Regents of the University of MinnesotaInventor: John H. Broadhurst
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Patent number: 4426722Abstract: An arrangement for generating x-ray microbeams includes an electron source for generating an electron beam. The electron beam is directed toward a target comprising discrete x-ray emissive spots. X-rays from the spots are formed into microbeams and directed through an examination field.Type: GrantFiled: March 12, 1981Date of Patent: January 17, 1984Assignee: Bell Telephone Laboratories, IncorporatedInventor: Osamu Fujimura
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Patent number: 4398090Abstract: Panoramic detector of ions spatially distributed in different beams, comprising a plane symmetry diaphragm having an opening permitting the passage of the beams and which is brought to earth potential, an electrode for converting ions into electrons having an opening facing the diaphragm opening, the conversion electrode having the same plane of plane symmetry and being brought to a negative potential relative to the earth potential, and a planar electrode facing the conversion electrode and brought to a positive potential relative to the potential of the conversion electrode, the face of the conversion electrode facing the planar electrode having a predetermined shape in such a way that the electron beams formed retain the same spatial distribution as the beams of ion to be detected in the presence of an applied magnetic field.Type: GrantFiled: October 13, 1981Date of Patent: August 9, 1983Assignees: Commissariat a l'Energie Atomique, Gesellschaft fur Strahlen und Umweltforschung mbHInventors: Jean-Francois Eloy, Eberhard Unsold
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Patent number: 4331872Abstract: In a method for the measurement of the distribution of the inclusions in a slab by electron beam irradiation, an electron beam of relatively large diameter is irradiated onto a relatively large specimen of the slab and a spectrum analysis of the characteristic X-rays is effected by using planar analyzing crystals, in order to obtain the data of the two-dimensional distribution of the elements of the inclusions in the surface of the specimen.Type: GrantFiled: June 17, 1980Date of Patent: May 25, 1982Assignees: Nippon Steel Corporation, Kabushiki Kaisha Daini SeikoshaInventors: Hiromu Soga, Koichi Kitamura, Tomio Sasaki, Mitsuyoshi Sato, Hiroshi Ishijima
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Patent number: 4322629Abstract: Mass spectrograph comprising an ion source, means for analyzing the ions emitted by this source and a panoramic ion detector, wherein the analysis means are of the type with magnetic separation and measurement of the time of flight and the ion source is a pulsed source.The panoramic ion detector comprises an ion inlet diaphragm, means facing the diaphragm which permit the conversion of ions into electrons, means facing the means for converting the ions into electrons and permitting the conversion of electrons into photons, a photon detector facing the means for converting the electrons into photons and photon guidance means located between the means for converting electrons into photons and the photon detector whereby the photon guidance means have a monoblock structure.Type: GrantFiled: August 13, 1980Date of Patent: March 30, 1982Assignees: Commissariat a l'Energie Atomique, Gesellschaft fur Strahlen und Umweltforschung mbHInventors: Jean-Francois Eloy, Eberhard Unsold
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Patent number: 4288692Abstract: X-ray spectral data are normalized to beam current by basing data accumulations upon a fixed beam current integral rather than a fixed acquisition time. A current proportional to beam current is obtained from an aperture in an electron column instrument to provide a continuous monitor of beam current during data accumulation. The current is applied to a digital current integrator producing output pulses at a frequency proportional to the current. Connected to the digital current integrator is a one-shot producing a pulse of fixed width for each integrator pulse. The interval between one-shot pulses is defined as "delay time," and a signal representative of that time interval is produced and utilized to control the actual analysis time such that a prescribed beam current integral is obtained.Type: GrantFiled: August 6, 1979Date of Patent: September 8, 1981Assignee: Tracor Northern, Inc.Inventors: Frederick H. Schamber, Jon J. McCarthy
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Patent number: 4280049Abstract: An X-ray spectrometer which is arranged inside an evacuatable housing and which comprises a wavelength dependent X-ray detection system and, for irradiating the specimen to be examined, an electron source with an electron deflection system for generating an electron beam and an X-ray source for generating an X-ray beam. The X-ray source consists of an anticathode on which the electron beam can be directed by the electron deflection system in order to generate the X-ray beam.Type: GrantFiled: May 24, 1979Date of Patent: July 21, 1981Assignee: U.S. Philips CorporationInventors: Helmut W. W. Werner, Antonius W. Witmer, Wilhelmus F. Knippenberg
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Patent number: 4264822Abstract: A method and an apparatus for testing a mask by an electron beam are disclosed in which the electron beam probe is first incident upon a predetermined point on a mask pattern of a photomask used to fabricate a semiconductor integrated circuit, the mask pattern is scanned by the electron beam probe from the predetermined point in a direction, the scanning operation is stopped when the electron beam probe reaches an edge of the mask pattern, the position of the edge or the distance between the predetermined point and the edge is determined by the number of pulse required to deflect the electron beam probe by a desired amount, and the position or distance thus determined is compared with the design data of the mask pattern to examine the dimensions of the mask pattern.Type: GrantFiled: November 21, 1979Date of Patent: April 28, 1981Assignee: Hitachi, Ltd.Inventors: Yukichi Ueno, Teiji Katsuta
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Patent number: 4229657Abstract: The invention relates to a .gamma.-ray irradiation head for panoramic irradiation comprising a tungsten target revolving about an axis, and means for deflecting electrons around the same axis for producing photons in several directions either successively or simultaneously. When the beam of electrons is deflected in its entirety and when the impact zone moves on the target about the axis, the axis of the radiation lobe moves in the same way and permits irradiation according to a variable azimuth.Type: GrantFiled: March 30, 1978Date of Patent: October 21, 1980Assignee: CGR-MeVInventors: Andre Bensussan, Guy Azam
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Patent number: 4198565Abstract: A charged particle beam scanning apparatus includes a deflector for a beam of charged particles which includes a magnetic field generator to supply an incoming electron beam with a magnetic field whose intensity grows higher in the opposite direction to that in which the beam is deflected.Type: GrantFiled: November 21, 1977Date of Patent: April 15, 1980Assignee: Tokyo Shibaura Electric Co., Ltd.Inventor: Katsuhiro Ono
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Patent number: 4117323Abstract: Cathodoluminescence is detected either in the transmitted or emitted mode in a scanning electron microscope by means of a photodiode mounted to the specimen base in the sample stage of the system, thereby permitting a broader spectral response. Preferably, the photodiode is mounted together with its feedback amplifier resistor and capacitor in a metallic housing secured to the sample base beneath the sample (in the transmitted mode) or above and to the side of the sample (in the emitted mode). The response signal is thus coupled from the vacuum chamber in electrical, not optical form.Type: GrantFiled: March 7, 1977Date of Patent: September 26, 1978Assignee: Iowa State University Research FoundationInventors: Raymond Thomas Greer, Bradley Harold Vale, David Michael Martin
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Patent number: 4101772Abstract: The present invention enables a decrease in etching velocity in an ion-beam etching system without decreasing the current density of the ion beam. The ion-etching is performed at a constant value of ion-beam current density and an increased partial pressure of oxygen or other suitable gas in the specimen chamber. The partial pressure of oxygen is increased until the intensity of a secondary ion-beam from the specimen reaches a saturation value. Under these conditions a stable reduced etching velocity is obtained, the value of which is determined by the ion-beam current density, the partial pressure of oxygen and the previously determined characteristics of the specimen.Type: GrantFiled: January 17, 1977Date of Patent: July 18, 1978Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Fumiya Konishi, Kenji Kusao, Yoshiaki Yoshioka
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Patent number: 4100410Abstract: Electric pulses are counted, and are converted into an electric signal proportional to the number of the counted pulses. An electron beam for irradiating a sample is deflected in response to the electric signal. The counting can be voluntarily stopped with a switch.Type: GrantFiled: December 22, 1976Date of Patent: July 11, 1978Assignee: Hitachi, Ltd.Inventors: Yukichi Ueno, Toshiaki Nakata
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Patent number: 3974381Abstract: Welding method and apparatus for detecting the penetration depth of an electron beam weld, in which X-rays which occur are guided through several plates of an absorption device to a ray receiver, the plates comprising of plurality of bores of equal diameter, which are arranged in their position to one another in such a way that the center lines of corresponding bores on the same level are in exact alignment and that the ray receiver, absorption device and workpiece are aligned in parallel with one another and are co-ordinated to one another in height.Type: GrantFiled: October 21, 1974Date of Patent: August 10, 1976Assignee: Mahle GmbHInventors: Manfred Rohrle, Hagen Hummel
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Patent number: 3963923Abstract: An ion microprobe has an ion extraction arrangement formed by a pair of cone-shaped guard electrodes. The guard electrodes are positioned to lie tangentially to each other and to a planar surface from which ions are extracted with their apexes coinciding at the point of extraction. They have equal apex angles of preferably 90.degree.. An aperture is provided at the common apex and electric fields oppositely polarized with respect to each other are provided within each guard electrode for ion and electron beam extraction.Type: GrantFiled: April 1, 1975Date of Patent: June 15, 1976Assignee: National Research Development CorporationInventors: John Neil Coles, James Victor Percival Long
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Patent number: 3955089Abstract: In a high energy X-ray therapy machine, an accelerator accelerates a beam of electrons to energies of several MEV. The electron beam is directed, generally via a beam deflector, onto an X-ray target to produce X-rays for treating a patient. The accelerator and beam deflector are often carried within a rotatable gantry structure, movable for radiating the patient through a series of angular positions or ports. A plurality of ionization chamber radiation detectors are disposed in the radiation field surrounding the beam path of the accelerated electron beam. Ionization current signals are compared from a plurality of the detectors to derive an error signal determinative of a deviation of the beam from an intended beam path. The error signal is utilized to energize beam steering coils for steering the beam along the predetermined beam path.Type: GrantFiled: October 21, 1974Date of Patent: May 4, 1976Assignee: Varian AssociatesInventors: Raymond D. McIntyre, Jay D. Wood