Abstract: An SEM wherein the entire imaging apparatus of the SEM is supported on air bearings. A multi-stage differentially pumped vacuum seal area provides a localized vacuum zone for wafer examination. A wafer leveling mechanism insures that the top surface of the wafer being examined is placed and maintained in a position level with the surface upon which the air bearing supported SEM rests. The SEM can move on its air bearings such that any portion of the wafer can be examined. A voltage-isolating passageway for providing high voltage isolation between a component maintained at high DC voltage and a component maintained at a substantially lower voltage is described. The voltage-isolating passageway incorporates a transverse magnetic field across its passageway. The voltage-isolating passageway includes at least two magnets that are positioned along opposite and exterior surfaces of the passageway. A semi-conductive coating can be applied to the interior passageway surface.

Abstract: This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.

Abstract: The present invention is directed to a scanning apparatus and method for processing a substrate, wherein the scanning apparatus comprises a first link and a second link rigidly coupled to one another at a first joint, wherein the first link and second link are rotatably coupled to a base portion by the first joint, therein defining a first axis. An end effector, whereon the substrate resides, is coupled to the first link. The second link is coupled to a first actuator via at least second joint. The first actuator is operable to translate the second joint with respect to the base portion, therein rotating the first and second links about the first axis and translating the substrate along a first scan path in an oscillatory manner. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.

Abstract: The invention provides a semiconductor fabrication apparatus capable of preventing increase of carriage time of samples, deterioration of sample output, increase of footprint and increase of investment costs. The vacuum processing apparatus comprises a plurality of vacuum processing chambers for subjecting a sample to vacuum processing; a vacuum carriage for carrying the sample into and out of the vacuum processing chamber; a switchable chamber capable of being switched between atmosphere and vacuum for carrying the sample into and out of the vacuum processing chamber; a cassette support for supporting a plurality of cassettes and a controller for controlling carrying of the sample from a cassette through the switchable chambers, the vacuum carriage means into and out of the vacuum processing chamber. The vacuum processing chamber is equipped with an etching chamber and a critical dimension measurement chamber for critical dimension inspection of the sample.

Abstract: A detection apparatus, a detection method and an electron beam irradiation apparatus for detecting deflection electrons in order to precisely focus even if a vacuum seal valve is provided. An electron beam irradiation apparatus including a vacuum seal valve mechanism which is provided in a static pressure floating pad, and opens/closes an electron beam passage with a piston so as to switch between an electron beam irradiation state and a vacuum seal state, and a deflection electron detector which is provided between the vacuum seal valve mechanism and a master disk and detects a deflection electron signal generated from the master disk with electron beam irradiation.

Abstract: Disclosed is a chamber having a static-pressure bearing disposed therein, the chamber including an inside pressure gauge for detecting an inside pressure of said chamber, and a pressure controller for decreasing the inside pressure of the chamber on the basis of the detection made through the inside pressure gauge. This arrangement effectively prevents unwanted increase of the chamber inside pressure and avoids local breakage of the chamber.

Abstract: One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a specimen into said main vacuum chamber; (c) a minicolumn non-translatably positioned inside said main chamber; and (d) a vacuum pump situated inside the main vacuum chamber and external to and connected to the minicolumn.

Abstract: A lithographic projection apparatus in which a vacuum chamber provided with a vacuum generator constructed and arranged to generate a vacuum beam path for the projection beam, wherein the apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with another object table. These collisions may occur during a power failure or an error in a programmed control logic in a controller of the apparatus.

Abstract: A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.

Abstract: A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.

Abstract: A pressure sensing port includes an inner block airtightly attached to an inside of a port attachment opening and having a first through hole extending along the axis of the port attachment opening and an intermediate block airtightly attached adjacently to an axially outer surface of the inner block. The intermediate block has a second hole extending through axially in a position where the second through hole is not superposed on the first through hole and communicating with the first through hole through a gap formed between the inner block and the intermediate block. An outer block is airtightly attached between the inner block and intermediate block and has a third through hole extending axially in a position where the third through hole is not superposed on both the first and the second through hole and communicating with the first and the second through hole.

Abstract: A work piece transfer apparatus for use with an ion beam implanter for treating a work piece at sub-atmospheric pressure. The work piece transfer apparatus includes an evacuable load lock system in fluid communication with an interior region the implantation chamber interior region. The load lock system includes a support surface for supporting the work piece with an opening aligned with the work piece. The work piece transfer apparatus further includes a work piece support within the implantation chamber having a pedestal supported by a linkage with two degrees of freedom. The linkage moves the pedestal transversely through the load lock support surface opening to pick up the work piece from the support surface prior to treatment. The pedestal holds the work piece in position in the implantation chamber for treatment. The linkage then moves the pedestal transversely through the load lock support surface opening to deposit the work piece on the support surface subsequent to treatment.

Abstract: Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.

Abstract: A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floati

Abstract: Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion.

Abstract: A charged particle detector is provided for use in an electron microscope. The detector has a chamber for receiving charged particles generated by the interaction between a particle beam generated by the microscope and the sample. The chamber is maintained at at least a partial vacuum and contains an impact responsive sensor for detecting particles incident thereon. An accelerating electrode field is set up in the chamber by one or more electrodes, and the chamber is sealed by an electronically conductive barrier so as to prevent gas leaking into the chamber, whilst being sufficiently thin to enable charged particles to travel across the barrier and thereby be detected by the detector. The electrically conductive barrier enables a very large accelerating voltage to be used without causing discharge through any gaseous medium in the microscope sample chamber.

Abstract: A coupling in a metrology system for placement between a floating inspection chamber and a fixed transfer chamber. The coupling prevents transfer of vibrations between the chambers and seals a passage between the chambers. The coupling includes a first flange attached to the inspection chamber, a second flange not in contact with the first flange and attached to the transfer chamber, and a looped diaphragm having an outer peripheral edge region secured to the first flange and an inner peripheral edge region secured to the second flange to thereby couple the flanges together and close a space between the flanges. Clamps are provided for securing the outer and inner peripheral edge regions of the diaphragm to the first and second flanges, respectively.

Abstract: A device is proposed for the precision rotation of samples on a diffractometer, especially for X-ray or synchrotron radiation diffraction experiments, comprising: a centering element (26) which is held at one end of a motor-driven rotating shaft (22) and can be displaced in a plane orthogonal to the axis of rotation of the rotating shaft (22), a sample holder (30) which is fixed to the centering element (26) or integral with the latter for holding a sample (32) substantially centrally with respect to the axis of rotation in an X-ray or synchrotron radiation beam (S), at least one micrometer finger (36) which is arranged in the region of the centering element (26) and can be positioned orthogonally with respect to the axis of rotation of the rotating shaft (22) by means of a micrometer finger drive device.

Abstract: A mechanical scanning stage for high speed image acquisition in a focused beam system. The mechanical scanning stage preferably is a combination of four stages. A first stage provides linear motion. A second stage, above the first stage, provides rotational positioning. A third stage above the rotational stage is moveable in a first linear direction, and the fourth stage above the third stage is positionable in a second linear direction orthogonal to the first direction. The four stages are responsive to input from a controller programmed with a polar coordinate pixel addressing method, for positioning a specimen mounted on the mechanical stage to allow an applied static focus beam to irradiate selected areas of interest, thereby imaged by collecting signals from the specimen using a polar coordinate pixel addressing method.

Abstract: An ion implanting system and a wafer holding apparatus therefor are provided. The ion implanting system includes x- and y-axis rotating parts; first and second angle measuring circuits; and a controller. The x-axis rotating part rotates a main surface of a wafer about an x-axis, and the y-axis rotating part rotates the main surface of the wafer about a y-axis. The first angle measuring circuit is rotated along with the main surface of the wafer and measures a tilt angle of the main surface of the wafer with respect to the x-axis. The second angle measuring means is rotated along with the main surface of the wafer and measures a rotating angle of the main surface of the wafer with respect to the y-axis. The controlling part, when the measured tilt angles are different from target tilt angles, controls the x- and y-axis rotating parts such that the measured tilt angles are equal to the target tilt angles.

Abstract: We have developed a particular combination of elements and devices which enables the portability of a scanning electron microscope (SEM). In particular the combination enables a small size, typically less than about 50 liters, a manageable weight, typically less than about 15 kg, and a low power requirement, typically less than about 100 W, which permits operation using power supplied from a portable source such as a battery. Higher performance versions may exhibit increased volume in the range of about 150 liters, increased weight, in the range of 45 kg, and a power requirement in the range of 300 W. The higher performance version of the portable scanning electron microscope may be portable with the assistance of a dolly (rolling cart) or with the assistance of attached wheels and pulling appendage.

Abstract: The present invention relates generally to methods, apparatus and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam energy deposited in the substrate during patterning. Heating of the substrate is exacerbated by radiative transfer of infrared energy from the substrate to other nearby components of the e-beam apparatus followed by reflection or re-radiation of a portion of the energy back to the substrate. The present invention provides useful materials and methods for reducing such reflection or re-radiation effects, leading to temperature stability of the substrate, reduced thermal distortion and the possibility of increased patterning accuracy.

Abstract: On an upper surface of a main body configuring a holder main body, a plurality of pins and a rim portion which upper end surface is set at almost the same height with a surface formed by the tip portions of the pins are provided. In addition, the main body has a honeycomb structure. Also, through holes formed in the honeycomb core are arranged corresponding to the arrangement of the plurality of pins. And, by a vacuum chucking mechanism, a wafer is vacuum chucked with respect to the tip portions of the plurality of pins and the upper end surface of the rim portion. In addition, among the plurality of pins arranged, the pins arranged closed to the rim portion are spaced more densely than the pins arranged elsewhere on the main body.

Abstract: A cascade type pump arrangement for a particle beam device has first and second turbomolecular pumps, wherein an outlet of the second turbomolecular pump is forepumped by an intermediate pressure region situated between a main pump port and an outlet of the first turbomolecular pump. The particle beam device has a particle beam source operated in ultra high vacuum and a specimen chamber operated at pressures from high vacuum at least up to 1 hPa.

Abstract: A device manufacturing method capable of imaging structures on both sides of a substrate, is presented herein. One embodiment of the present invention comprises a device manufacturing method that etches reversed alignment markers on a first side of a substrate to a depth of 10 ?m, the substrate is flipped over, and bonded to a carrier wafer and then lapped or ground to a thickness of 10 ?m to reveal the reversed alignment markers as normal alignment markers. The reversed alignment markers may comprise normal alignment patterns overlaid with mirror imaged alignment patterns.

Abstract: The disclosure is concerned with an electron microscope comprising a casing for encasing an assembly and a display disposed to the casing. The assembly comprises a vacuum container, a vacuum pump for evacuating the vacuum container, an electron emitter disposed at the upper position of the vacuum vessel, a sample chamber disposed at the lower position of the vacuum container and capable of projecting from the casing and a detector for detecting an electron beam emitted from a sample placed in the sample chamber.

Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

Abstract: An exposure apparatus to be used with an excimer laser as a light source includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predetermined gas, a gas circulation mechanism having a gas circulation path for connecting a gas discharging port for discharging a gas from the chamber and a gas supplying port for supplying a gas into the chamber, and a switching device for selectively using plural purifiers disposed in the gas circulation path.

Abstract: The apparatus of the invention consists of two module, one of which carries an sample plate handling device, which is docked to the mass spectrometer in a working position for loading ionized samples from the atmospheric pressure environment to the vacuum chamber of the mass spectrometer, while the other one is used for picking up the sample plate carrier with preliminarily prepared and inserted sample plates into and from the storage cassette and for transferring the sample plates carriers to a stand-by position. The sample plate handling device is moveable between the aforementioned working position and the stand-by position and is provided with means for taking the stand-by sample plate from the carrier and for holding it during delivery of the ionized samples to the mass spectrometry, as well as with means for shifting the sample plate inside the sample plate handling device in the X-Y coordinate system for arranging a selected sample cell coaxially with the center of the ion-sampling orifice.

Abstract: A coupling in a metrology system for placement between a floating inspection chamber and a fixed transfer chamber. The coupling prevents transfer of vibrations between the chambers and seals a passage between the chambers. The coupling includes a first flange attached to the inspection chamber, a second flange not in contact with the first flange and attached to the transfer chamber, and a looped diaphragm having an outer peripheral edge region secured to the first flange and an inner peripheral edge region secured to the second flange to thereby couple the flanges together and close a space between the flanges. Clamps are provided for securing the outer and inner peripheral edge regions of the diaphragm to the first and second flanges, respectively.

Abstract: A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.

Abstract: In the context of charged-particle-beam (CPB) microlithography systems, robotic manipulators are disclosed for conveying objects such as reticles and substrates simultaneously with performing exposures without causing significant perturbation of the charged particle beam. To such end, the subject manipulators comprise moving members that are made of substantially non-magnetic materials. As the moving members move in the vicinity of a magnetic field controlling exposure-beam trajectory, the beam trajectory is less affected by stray magnetic fields that otherwise would be generated if the moving members were made of magnetic materials. Hence, for better throughput, reticle and/or substrate conveyance can be conducted while exposures are being performed, without adversely affecting exposure accuracy.

Abstract: The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.

Abstract: One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a specimen into said main vacuum chamber; (c) a minicolumn non-translatably positioned inside said main chamber; and (d) a vacuum pump situated inside the main vacuum chamber and external to and connected to the minicolumn.

Abstract: A magnetic shunt assembly (12) for an exposure apparatus (10) includes a magnetic shunt assembly (12). The apparatus (10) includes an optical assembly (24)(26), a stage (44), a first mover assembly (16) that moves the stage (44) in a first gap (37). The first mover assembly (16) is surrounded by a magnetic field. The magnetic shunt assembly (12) is positioned near the optical assembly (24)(26) approximately between the optical assembly (24)(26) and the mover assembly (16). The magnetic shunt assembly (12) is made of a material having a relatively high magnetic permeability. The magnetic shunt assembly (12) can provide a low magnetic reluctance path that redirects at least a portion of the magnetic field from the first mover assembly (16) away from the gap (37).

Abstract: An apparatus in combination with a load lock of an ion implanter comprises a cover adjacent an isolation valve slot of the load lock. The cover defines an aperture generally conforming to the size and shape of the load, or wafer, within the load lock with sufficient clearance for a robot arm to pick the wafer from within the load lock and transfer the wafer to the implant chamber. The cover masks a portion of the slot so as to reduce the opening between the load lock and the implant chamber of the ion implanter. The smaller opening reduces the pressure burst from the load lock to the implant chamber when the isolation valve and slot is opened. By reducing the pressure burst, the cover can shorten the recovery time for the implant chamber to reach operating pressure.

Abstract: A mechanical scanning stage for high speed image acquisition in a focused beam system. The mechanical scanning stage preferably is a combination of four stages. A first stage provides linear motion. A second stage, above the first stage, provides rotational positioning. A third stage above the rotational stage is moveable in a first linear direction, and the fourth stage above the third stage is positionable in a second linear direction orthogonal to the first direction. The four stages are responsive to input from a controller programmed with a polar coordinate pixel addressing method, for positioning a specimen mounted on the mechanical stage to allow an applied static focus beam to irradiate selected areas of interest, thereby imaged by collecting signals from the specimen using a polar coordinate pixel addressing method.

Abstract: A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floati

Abstract: The disclosure is concerned with an electron microscope comprising a casing for encasing an assembly and a display disposed to the casing. The assembly comprises a vacuum container, a vacuum pump for evacuating the vacuum container, an electron emitter disposed at the upper position of the vacuum vessel, a sample chamber disposed at the lower position of the vacuum container and capable of projecting from the casing and a detector for detecting an electron beam emitted from a sample placed in the sample chamber.

Abstract: A vacuum chamber includes chamber walls separating a chamber interior and a chamber exterior, with one or more access ports defined in the chamber walls. A viewing tube extends from the chamber exterior into the chamber interior and terminates in a window. A positioner for imaging devices is then provided within the viewing tube, and is thus situated at least partially within the chamber interior with its imaging device(s) oriented towards the window of the viewing tube to allow imaging of areas within the vacuum chamber. The positioner preferably allows translation and/or rotation of an imaging device within the viewing tube within two perpendicular planes oriented along the axis of the viewing tube, thereby allowing the imaging device to view an area of interest from more angles oriented about the area of interest than would otherwise be possible if the imaging device was situated outside the vacuum chamber.

Abstract: A rotary shaft and a rotating body are connected in such a way as to stably control the tilt of a wafer platen in an ion implanter. The rotary shaft has a key way and the rotating body has a boss into which the rotary shaft extends. A key integrates the rotary shaft and the rotary body so that they rotate together without slipping relative to each other. An end cap is screwed onto the rotary body over the end of the rotary shaft and the key. As a result, the wafer platen can be maintained at an accurate orientation or tilt relative to the ion beam produced by the implanter.

Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

Abstract: A charged particle beam microscope is described, which is equipped with a minicolumn. Various embodiments are disclosed, suitable for various uses. According to one embodiment the minicolumn is situated inside a mini-environment and can be introduced into and withdrawn from the main vacuum chamber. According to other embodiments, the minicolumn is situated inside the main vacuum chamber. According to further embodiments, a turntable stage is used and the minicolumn is attached to an arm movable in the radial direction of the turntable.

Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.

Abstract: An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.

Abstract: An electron beam lithography apparatus has a first chamber for holding a workpiece with the first chamber having an outer wall with an opening therein. A second chamber has an electron beam column mounted therein, with the second chamber positioned adjacent the first chamber and having an outer wall having a portion in common with the portion of the outer wall of the first chamber containing the opening. An electron beam column in the second chamber includes an aperture and generates an electron beam through the aperture and the opening at the workpiece. The apparatus includes a first pump for creating a vacuum in the first chamber, a second pump for creating a vacuum in the second chamber, a first vent for permitting gas to enter the first chamber for increasing the pressure in the first chamber, and a second vent for permitting gas to enter the second chamber for increasing the pressure in the second chamber.

Abstract: An apparatus in combination with a load lock of an ion implanter comprises a cover adjacent an isolation valve slot of the load lock. The cover defines an aperture generally conforming to the size and shape of the load, or wafer, within the load lock with sufficient clearance for a robot arm to pick the wafer from within the load lock and transfer the wafer to the implant chamber. The cover masks a portion of the slot so as to reduce the opening between the load lock and the implant chamber of the ion implanter. The smaller opening reduces the pressure burst from the load lock to the implant chamber when the isolation valve and slot is opened. By reducing the pressure burst, the cover can shorten the recovery time for the implant chamber to reach operating pressure.

Abstract: An actuator comprises a magnet yoke (10a, 10b) and a carrier member (2) movable relative to the magnet yoke. The magnet yoke (10a, 10b) has at least one permanent magnet (14) and the carrier member (20) is positioned in the magnetic field produced by this magnet. The carrier member (20) has an auxiliary magnetic member (28) that produces a relative bias force between the carrier member (20) and the magnet yoke (10a, 10b). The bias force will be used to compensate for a weight applied to the device and acts as a bearing with a very large compliance. The carrier member (2) also comprises a coil (26). Passing current through the coil (26) produces a Lorentz force for further control of the actuator; alternatively, the device provides a velocity transducer by sensing the EMF generated in the coil by relative motion of the carrier member (20) and magnet yoke (10a, 10b).

Abstract: An embodiment of the present invention comprises a SEM wherein the entire imaging apparatus of the SEM is supported on air bearings. A multi-stage differentially pumped vacuum seal area provides a localized vacuum zone for wafer examination. A wafer leveling mechanism insures that the top surface of the wafer being examined is place and maintained in a position level with the surface upon which the air bearing supported SEM rests. In use, wafers being examined are loaded into the wafer leveling mechanism, which places and then holds their top surface flush with an examination table. The SEM is then moved on its air bearings and placed in appropriate position over the wafer. Any portion of the wafer can be examined simply by moving the SEM column in the appropriate direction.

Abstract: In the context of charged-particle-beam (CPB) microlithography systems, robotic manipulators are disclosed for conveying objects such as reticles and substrates simultaneously with performing exposures without causing significant perturbation of the charged particle beam. To such end, the subject manipulators comprise moving members that are made of substantially non-magnetic materials. As the moving members move in the vicinity of a magnetic field controlling exposure-beam trajectory, the beam trajectory is less affected by stray magnetic fields that otherwise would be generated if the moving members were made of magnetic materials. Hence, for better throughput, reticle and/or substrate conveyance can be conducted while exposures are being performed, without adversely affecting exposure accuracy.