Conversion Of Se Or Te To Conductive State (epo) Patents (Class 257/E21.072)
  • Patent number: 8436445
    Abstract: A method for processing a thin-film absorber material with enhanced photovoltaic efficiency includes forming a barrier layer on a soda lime glass substrate followed by formation of a stack structure of precursor layers. The method further includes subjecting the soda-lime glass substrate with the stack structure to a thermal treatment process with at least H2Se gas species at a temperature above 400° C. to cause formation of an absorber material. By positioning the substrates close together, during the process sodium from an adjoining substrate in the furnace also is incorporated into the absorber layer.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: May 7, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8138009
    Abstract: Disclosed is a method of fabricating a thin film solar cell including introducing a reaction solution into a reaction chamber, fixing a supporter onto a loader, disposing the loader in the reaction chamber to immerse the supporter into the reaction solution, and heating the supporter and coating a buffer layer. In addition, an apparatus of fabricating a thin film solar cell including a reaction chamber mounted with an inlet of a reaction solution and an outlet of waste water, and a loader disposed in the reaction chamber and being capable of moving up and down, is disclosed.
    Type: Grant
    Filed: April 15, 2010
    Date of Patent: March 20, 2012
    Assignees: Samsung SDI Co., Ltd., Samsung Electronics Co., Ltd.
    Inventor: Donggi Ahn
  • Patent number: 7598113
    Abstract: A phase change memory device and fabricating method are provided. A disk-shaped phase change layer is buried within the insulating material. A center via and ring via are formed by a lithography. The center via is located in the center of the phase change layer and passes through the phase change layer, and the ring via takes the center via as a center. A heating electrode within the center via performs Joule heating of the phase change layer, and the contact area between the phase change layer and the heating electrode is reduced by controlling the thickness of the phase change layer. Furthermore, a second electrode within the ring via dissipates the heat transmitted to the contact interface between the phase change layers, so as to avoid transmitting the heat to the etching boundary at the periphery of the phase change layer.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: October 6, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Wei-Su Chen, Yi-Chan Chen, Wen-Han Wang, Hong-Hui Hsu, Chien-Min Lee, Yen Chuo, Te-Sheng Chao, Min-Hung Lee