Current- And/or Potential-actuated Switch Patents (Class 314/18)
  • Patent number: 7420668
    Abstract: A wafer surface inspection method and apparatus of high sensitivity, and free from performance degradation in terms of cleanliness, coordinate repeatability of foreign particles and the like. Gas for cooling is sprayed onto a laser irradiation position on the wafer surface to prevent an increase in temperature of the foreign particles and to suppress break-down of the foreign particles.
    Type: Grant
    Filed: August 10, 2006
    Date of Patent: September 2, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazuhiro Zama, Masayuki Hachiya