Abstract: A high-power microwave (HPM) vacuum tube source and method of precise coaxial alignment of the field emission (FE) cathode, cylindrical RF generating tube and magnet field includes positioning a low-power thermionic emission (TE) cathode inside the FE cathode in a “cathode-in-cathode” arrangement. With the HPM source under vacuum and the FE cathode deactivated, the TE cathode emits a surrogate electron beam through the generating tube. Measurement circuits measure the surrogate electron beam's position with respect to a longitudinal axis fore and aft of the generating tube. The measurements circuits may, for example, be a repositionable fluorescent target or electric field sensors embedded in the cylindrical RF generating tube. The coaxial alignment of the primary cathode, cylindrical RE generating tube and magnet is adjusted until the position of the surrogate electron beam satisfies a coaxial alignment tolerance.

Abstract: The present invention provides an accelerating structure capable of increasing a degree of vacuum at a middle part inside the accelerating structure while confining an alternating electric field to the inside. An accelerating structure 1 is formed of a plurality of annular discs 2 and 3 serially connected into a cylindrical shape. At least one of the discs 3 disposed at a middle part of the accelerating structure 1 includes: a choke structure formed by a choke filter 7; and a vacuum port 8 opened in an outer circumferential surface of the disc on an outer circumferential side radially outward from the choke structure, and the vacuum port 8 is connected to an external exhaust device.

Abstract: Problems to be solved: To obtain higher brightness than Langmuir limit. Adjust brightness to the optimum value. Method of resolution: To obtain such beams, the following means and methods are effective. A charged particles beam apparatus consisting of a charged particle source, a beam drawing electrode, and a beam control electrode, wherein; after the charged particles beam source a condenser lens is designed, and brightness of the charged particles beam is adjusted by adjusting a magnification factor of said condenser lens.

Abstract: A coaxial cavity gyrotron with two electron beams includes an electron gun (magnetron injection gun, “MIG,” with two beams), a coaxial beam-wave interaction cavity and an outer magnetic field tube. The coaxial beam-wave interaction cavity consists of two parts: an outer conductor and an inner conductor. The two hollow electron beams produced by the MIG are located between the outer conductor and the inner conductor. The MIG includes inner and outer anodes, with a single cathode located between the anodes. The cathode further includes two emitter rings which produce the two hollow electron beams. The entire gyrotron is immersed in the magnetic field tube such that the magnetic field profile is the same or similar to that for a coaxial gyrotron with one electron beam.

Abstract: A mode-selective interactive structure for gyrotrons includes a plurality of metal tubes, wherein an inner wall of each metal tube forms a waveguide; and between each adjacent pair of the metal tubes exists a slice with a first interface and a second interface and when an electromagnetic wave comprising an operating mode and a competing mode propagates through the slice, the competing mode is partially reflected upon, partially transmitted through and/or absorbed at the first interface and the second interface of the slice so that the power loss of the competing mode is larger than the operating mode and the production of the competing modes is suppressed progressively thereby achieving mode selection.

Abstract: An electron gun that generate an electron flow and the application of this gun to produce rf energy or for injectors. The electron gun includes an electrostatic cavity having a first stage with emitting faces and multiple stages with emitting sections. The gun also includes a mechanism for producing an electrostatic force which encompasses the emitting faces and the multiple emitting sections so electrons are directed from the emitting faces toward the emitting sections to contact the emitting sections and generate additional electrons and to further contact other emitting sections to generate additional electrons and so on then finally to escape the end of the cavity. A method for producing a flow of electrons.

Abstract: Apparatus and methods are disclosed for charged-particle-beam (CPB) microlithography using a hollow beam. The hollow beam is produced by passing the charged particle beam through a scattering aperture. However, passage of the beam is performed in a manner by which the scattering aperture is prevented from overheating. Also, the scattering aperture can be made from a material that is micro-machined easily. The scattering aperture can be configured as a beam-scattering aperture plate defining voids that collectively define an annular aperture. The scattering aperture is situated at a beam-crossover plane. As the charged particle beam strikes the scattering aperture, particles pass readily through the voids as a “transmitted beam.” Particles incident on the scattering aperture plate are scattered and become a “scattered beam.” The transmitted beam passes readily through a downstream blocking aperture, whereas most particles of the scattered beam are absorbed by the blocking aperture.

Abstract: An electron gun for a color cathode ray tube includes a cathode which is a source for emitting an electron beam, a control electrode, through which the electron beam emitted from the cathode passes, having first electron beam passing holes each including a first vertically elongated indented portion formed at an output side surface of the control electrode and a first electron beam passing hole portion formed in the first indented portion, a screen electrode installed adjacent to the control electrode and having second electron beam passing holes formed in the screen electrode, a plurality of focusing electrodes for forming a plurality of quadrupole lenses, sequentially installed from the screen electrode and respectively having electron beam passing holes having a predetermined shape.

Abstract: For use in a beam index color cathode ray tube (CRT), a multi-beam group electron gun directs first and second groups of vertically aligned electron beams on respective parallel, horizontally aligned color phosphor stripes on the CRT's display screen. Each group of electron beams includes three beams, one for each of the three primary colors of red, green and blue. The first and second electron beam groups are horizontally offset from one another, with the upper, intermediate and lower electron beams in each group tracing the same horizontal phosphor stripe as the beams scan the display screen and with a time delay provided to synchronize the video information of both electron beam groups. A color video signal is provided either to a respective cathode or to a respective segmented conductive portion containing a beam passing aperture in the electron gun's G1 control grid for individually modulating each beam with color video image information.

Abstract: Charged-particle-beam (“CPB”; e.g., electron-beam) apparatus are disclosed that exhibit reduce image blur due to space-charge effects. With such apparatus, a reticle pattern can be imaged on a substrate with greater accuracy and higher throughput. Such results can be achieved using a charged-particle source having comparatively low emittance. An illumination-optical system directs an illumination beam from a CPB source to a reticle defining a pattern to be transferred to a substrate. A projection-optical system projects, onto the substrate, imaging the beam that has passed through and has been patterned by the reticle. The illumination-optical system includes a beam-shaping aperture that causes the illumination beam to have an annular transverse profile. The reticle is illuminated with an image of a crossover of the illumination beam. The CPB source desirably emits the illumination beam from an annular region of a cathode.

Abstract: Charged-particle-beam (“CPB”; e.g., electron-beam) apparatus are disclosed that exhibit reduce image blur due to space-charge effects. With such apparatus, a reticle pattern can be imaged on a substrate with greater accuracy and higher throughput. Such results can be achieved using a charged-particle source having comparatively low emittance. An illumination-optical system directs an illumination beam from a CPB source to a reticle defining a pattern to be transferred to a substrate. A projection-optical system projection-images, on the substrate, an imaging beam that has passed through and been patterned by the reticle. The illumination-optical system includes a beam-shaping aperture that causes the illumination beam to have an annular transverse profile. The reticle is illuminated with an image of a crossover of the illumination beam. The CPB source desirably emits the illumination beam from an annular region of a cathode.