With Fluidizing Of Treated Material Patents (Class 34/323)
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Patent number: 9429362Abstract: Provided is a drying apparatus with which, in the case where rotating vane assemblies are vertically arranged in a plurality of stages, and a spacing (clearance) between stages is to be set depending upon a specific one of the various types of materials to be dried, always allows an optimum dimension to be easily provided, thereby an extremely high drying efficiency based on the advantage of the vertical type can be easily implemented. With a drying apparatus 10, rotating vane assemblies 21, 210 each constituted by a plurality of circular-arc vane sections 22, 220 are disposed in a plurality of stages vertically arranged along a rotating axle 20 in a vertical cylindrical drying vessel 11. The clearance F between any two adjoining stages of the plurality of stages of the rotating vane assembly 21, 210 is set at 0 to 15% of the diameter of a circle connecting between the outermost peripheral edges of the adjacent flat surfaces 23, 230 of the circular-arc vane sections 22, 220.Type: GrantFiled: May 20, 2013Date of Patent: August 30, 2016Inventor: Masao Kanai
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Patent number: 8584374Abstract: The invention relates to a method for removing water from a mixture containing at least one compound having at least one group reactive towards isocyanate and containing water, the mixture being applied to the surface of a rotating body A, the mixture flowing over the surface of the rotating body A to an outer region of the surface of the rotating body A and water evaporating from the mixture. In particular, this method is suitable for removing water from alcohols and amines.Type: GrantFiled: May 28, 2009Date of Patent: November 19, 2013Assignee: Construction Research & Technology GmbHInventors: Simone Klapdohr, Burkhard Walther, Helmut Mack, Zhizhong Cai, Laurent Marc, Jochen Mezger, Tobias Austermann, Silke Flakus
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Patent number: 8316557Abstract: A screen assembly for a shale shaker comprising a panel (500) and a support structure (600), the panel (500) having an area provided with a multiplicity of apertures and at least one layer of screening material arranged over the multiplicity of apertures, wherein said panel (500) is removable from said support structure (600).Type: GrantFiled: May 21, 2009Date of Patent: November 27, 2012Assignee: Varco I/P, Inc.Inventor: George Alexander Burnett
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Publication number: 20080052948Abstract: A spin head includes a rotatable plate, first chucking pins and second chucking pins for supporting a edge portion of a substrate loaded on the plate, and a driving unit for selectively driving the first and second chucking pins. The driving unit includes a first magnet connected to the first chucking pin and disposed at a first height, a second magnet connected to the second chucking pin and disposed at a second height, and a driving magnet for driving the first and second magnets. The driving magnet is elevated by means of an elevating member to selectively apply a magnetic force to the first or second magnet and moves in the radius outside direction of the first or second chucking pin due to a magnetic force.Type: ApplicationFiled: August 30, 2007Publication date: March 6, 2008Inventors: Hyun Jong Kim, Ju Won Kim, Jung Keun Cho
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Patent number: 6748672Abstract: A wafer dryer for use in a semiconductor cleaning apparatus includes an internal bath, an external bath, a solution supply line, a solution drain line, a pump, and drying means. The solution drain line has a first drain line and a second drain line. A pump for constantly maintaining a speed of a drained solution is installed on the first drain line. The drying means has an isopropyl alcohol (IPA) nozzle, a first gas spray nozzle for spraying N2 gas, and a second spray nozzle. The second spray nozzle is installed on all inner sidewalls of the external bath and has a plurality of holes. Thus, no wave is produced at a surface of the drained solution.Type: GrantFiled: November 27, 2002Date of Patent: June 15, 2004Assignee: DNS Korea Co., Ltd.Inventors: Sung-Hee Lee, Sang-Wha Lee
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Patent number: 6503335Abstract: A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.Type: GrantFiled: October 26, 1999Date of Patent: January 7, 2003Assignee: Wacker Siltronic Gesellschaft für Halbleitermaterialien AGInventors: Georg-Friedrich Hohl, Roland Brunner, Susanne Bauer-Mayer, Günther Brunner, Hans-Joachim Luthe, Franz Sollinger
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Patent number: 6408536Abstract: The present invention relates to a process for drying protein crystals starting from an aqueous protein crystal suspension, which comprises drying the protein crystal suspension in a centrifugal dryer, where the protein crystals, after they have been filtered off from the protein crystal suspension, are brought into contact with a drying medium which consists of a mixture of water and a nonaqueous solvent which is miscible with water in any ratio and which has a lower vapor pressure than water. In the process, a drying gas which has been moistened with water is advantageously used. The protein crystal suspension is advantageously converted into a fluidized bed for the purpose of drying.Type: GrantFiled: January 13, 2000Date of Patent: June 25, 2002Assignee: Aventis Pharma Deutschland GmbHInventors: Rolf Deusser, Peter Kraemer, Horst Thurow
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Patent number: 6161305Abstract: A process and apparatus for mechanical and thermal dewatering of solid-liquid mixture, particularly industrial and sewage sludges, feeds the sludge to a dewatering device to produce a dewatered material which is then dried in a thermal drier. The dewatered sludge is reduced to a granulate-like structure without any intermediate stage and is then dried immediately afterwards. An apparatus for implementing the process includes a mechanical dewatering device being directly connected to a feed unit to produce a granulate-like structure and which is permanently connected to the thermal drier.Type: GrantFiled: February 24, 1999Date of Patent: December 19, 2000Assignee: Andritz-Patentverwaltungs-Gesellschaft m.b.H.Inventors: Christian Maier, Erwin Brunnmair
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Patent number: 5655313Abstract: Apparatus for drying and/or treating powdered, granular, or flaked material in combination with a containment room or glove box under controlled atmospheric conditions, which may have an oven in the room with a chamber with a vessel therein to carry material, the chamber having a door to seal it off and vacuum creation and gas supplying features directly therefor, the vessel which carries material for drying and/or treating is supported on a frame with provisions for rotation by motor equipment, with heater elements around the outside of the chamber to provide heat if required, and vanes inside the vessel to fluidize the material upon rotation and the application to the vessel of vacuum, heat, and/or gas for drying and/or treating the material as required.Type: GrantFiled: May 31, 1994Date of Patent: August 12, 1997Inventors: Stephen F. Hope, Joseph B. Kejha