Abstract: A cleaning apparatus of a substrate processing apparatus according to an exemplary embodiment includes a nozzle and a scanner. The nozzle ejects a gas toward in an inner wall surface of a processing chamber in which a substrate is processed. The scanner causes the nozzle to scan along the inner wall surface of the processing chamber in the processing chamber.

Abstract: Disclosed herein is an equipment front end module (EFEM) including: a transfer chamber; a load port module on which a wafer receiving container is seated; a wafer transfer robot positioned in the transfer chamber and configured to transfer a wafer in the wafer receiving container seated on the load port module toward a process equipment side; and a buffer module configured to store the wafer receiving container before or after the seating of the wafer receiving container on the load port module and inject an inert gas into the FOUP to purge the wafer.

Abstract: A fuser member having a substrate and a surface layer disposed on the substrate is described. The surface layer includes a polyimide aerogel having dispersed throughout a cross-linked fluoropolymer and a release agent wherein the release agent is a liquid at a temperature above about 100° C.

Abstract: An apparatus for delamination drying a substrate is provided. A chamber for receiving a substrate is provided. A chuck supports and clamps the substrate within the chamber. A temperature controller controls the temperature of the substrate and is able to cool the substrate. A vacuum pump is in fluid connection with the chamber. A tilting mechanism is able to tilt the chuck at least 90 degrees.

Abstract: The present invention provides methods and apparatus for a Marangoni vapor knife assembly. The assembly includes a base having a channel extending longitudinally through the base and a plurality of passages extending laterally from the channel toward an outer face of the base; a top plate adapted to be removeably coupled to the base with an outer face flush with the outer face of the base; and a shim adapted to be disposed between the base and the top plate and further adapted to form a plurality of spray orifices in the assembly. Numerous additional features are disclosed.

Abstract: What is described is a process and an installation for drying articles, in particular painted vehicle bodies, in which the articles are moved through a drying zone in which they are hardened in an inert-gas atmosphere. Inert gas is taken from the drying zone constantly or intermittently and is first of all conducted along a first face which is at a first temperature at which higher-boiling contaminants condense out. The condensate that forms in the process is discharged. After that, the inert gas which has been pre-cleaned in this way is conducted along at least one second face which is at a lower temperature than the first face. Lower-boiling contaminants are precipitated at this point. These condensates, too, are then discharged. This process and installation work more favorably, energy-wise, and with higher cleaning efficiency than known processes and installations of a similar type.

Abstract: An apparatus for purge to prevent AMC & natural oxide includes an FOUP configured to contain wafers and to have a receipt supply hole for supplying gas and a receipt discharge hole for discharging the gas at a lower part of the FOUP; stage units each configured to have the FOUP separated therefrom or seated therein, to support the seated FOUP, and to have a gas supply hole for supplying the gas at a position corresponding to the receipt supply hole and a gas discharge hole for discharging the gas at a position corresponding to the receipt discharge hole; a first gas supply port unit disposed in response to the gas supply hole and configured to supply the gas to the FOUP; and a first gas discharge port unit disposed in response to the gas discharge hole and configured to discharge the gas from the FOUP.

Abstract: A media drying system removes a moistening liquid from a moistened medium having first and second surfaces. A liquid reservoir contains a heating liquid heated above a moistening-liquid boiling point. A rotatable liquid-blocking member has a liquid-blocking layer with an inner surface and an outer surface. A media-transport system transports the medium entrained around the liquid-blocking member so that the first surface of the moistened medium is brought into contact with the outer surface of the liquid-blocking layer. An entrained portion of the moistened medium passes through the liquid reservoir and is submerged in the warmed heating liquid. The heating liquid contacts the inner surface of the liquid-blocking layer so that heat is transferred through the liquid-blocking layer from the warmed heating liquid to the moistening liquid, or heat is transferred from the warmed heating liquid to the second surface of the moistened medium.

Abstract: A heat processing apparatus includes a heating plate configured to heat the substrate; a cover configured to surround a space above the heating plate; an exhaust gas flow forming mechanism configured to exhaust gas inside the cover to form exhaust gas flows within the space above the heating plate; a downflow forming mechanism configured to form downflows uniformly supplied onto an upper surface of the substrate placed on the heating plate; and a control mechanism configured to execute mode switching control between a mode arranged to heat the substrate while forming the downflows by the downflow forming mechanism and a mode arranged to heat the substrate while forming the exhaust gas flows by the exhaust gas flow forming mechanism.

Abstract: A system for drying a surface of a substrate is provided. The system for drying a surface of a substrate comprising: a rotary support; a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate so as to be capable of applying a film of the liquid to the surface of the substrate; a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate so as to be capable of applying the drying fluid to the surface of the substrate; and a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.

Abstract: A fluid heater includes a duct pipe through which a fluid to be heated flows, and a heating part configured to heat the duct pipe. One or more fillers is provided inside the duct pipe. A substrate processing apparatus includes: a supply source configured to supply a liquid of a volatile organic solvent; the aforementioned fluid heater configured to heat the liquid of the organic solvent supplied by the supply source so as to generate a steam of the organic solvent; and a chamber configured to accommodate a substrate W and to dry the substrate W accommodated therein, to which the steam of the organic solvent generated by the fluid heater is supplied.

Abstract: Disclosed is an air knife chamber constructed such that water flowing down along a partition wall is allowed to fall in front of a slit. Due to this construction, the water can be effectively removed by air knives, thus contributing to a reduction in the defective proportion of substrates.

Abstract: In a first aspect, a method of drying at least a portion of a substrate located within a fluid is provided. The method includes contacting an edge of the substrate that is located within the fluid with a pusher pin. The pusher pin has (a) a shaft portion; and (b) a tip portion having a knife edge of a width of 0.42 inches or less, the tip portion adapted to contact and support the substrate with the knife edge. The method further includes lifting the substrate from the fluid with the pusher pin; and exposing the substrate to a drying vapor as the substrate is lifted from the fluid. Numerous other aspects are provided.

Abstract: A nozzle housing assembly, which is used in a convection heating furnace for a heat treatable glass sheet. The nozzle housing assembly comprises an elongated enclosure, at least one elongated heating resistance in the enclosure for heating convection air, and orifices in a bottom surface of the enclosure for blasting heated convection air against the glass sheet. The enclosure is divided with a flow-throttling partition into a top supply duct and a bottom nozzle box, the heating resistances being housed in the latter. Flow-throttling openings present in the partition are positioned to comply with the location and shape of the heating resistances.

Abstract: Described herein are devices and techniques for spray drying a fluid to produce a dried powder. Assemblies include a spray drying head attachable to a gas supplier and a liquid sample, such as a standard unit of blood product. The spray drying head can be adapted to provide an aerosolized flow of liquid sample exposed to a drying gas. The assembly also includes a drying chamber adapted to separate the aerosolized flow of liquid sample into a dried powder and humid air. The assembly can be disposable, provided in a sterilized kit and having simplified attachments allowing quick connect and disconnect from the gas and liquid sample. Separation of the powder from the humid air exiting the drying chamber occurs within a filtered collection bag. In some embodiments, one or more of the drying chamber and collection bag are formed form a thin-walled, collapsible material.

Abstract: A coating device for coating a medical device with a drug-eluting material uses an in-process drying station between coats to improve a drug release profile. The drying station includes a heat nozzle configured for applying a uniform drying gas. A coating process using the dryer includes a closed-loop control for the gas between drying steps and an improved nozzle for producing more consistent spray patterns.

Abstract: A household appliance includes a container for receiving objects to be treated, an ozone generator having an intake air conduit, and an ozone eliminating device arranged in an exhaust air conduit. The exhaust air conduit is connected to the container and includes a fan for removing exhaust air from the container. The exhaust air conduit is connected to the intake air conduit of the ozone generator.

Abstract: In a laundry washing/drying machine involving drying by a heat pump cycle, in an initial stage of the drying operation the heat within an air circulation path is deficient and therefore it is impossible to effect quick heating of air on a drum inlet side up to a sufficiently high temperature. According to the present invention there is provided a drying unit capable of raising the drum inlet air temperature quickly up to a sufficiently high temperature in an initial stage of the drying operation and thereby shortening the drying time.

Abstract: In one aspect, a substrate processing apparatus is provided. The apparatus comprises a mechanism for forming a meniscus on a surface of a substrate by moving the substrate through a fluid; an air knife apparatus positioned to apply an air knife to shorten the meniscus formed on the surface of the substrate; and a drying vapor nozzle positioned to direct a drying vapor to the meniscus shortened by the air knife. Numerous other aspects are provided.

Abstract: A cloth dryer includes heat-pump (30), rotary tub (5) for accommodating clothes (4) to be dried, blower (12) for supplying air heated by heat radiator (23) to rotary tub (5), and heat-exchange air flow paths (22, 24) for circulating the air stayed in rotary tub (5) through heat radiator (23) via heat absorber (21). Fins striding over heat absorber (21) and heat radiator (23) allow integrating absorber (21) and radiator (23) into one body which can be thus placed within air-flow paths (22, 24). Heat-transfer reducing section (32) is formed on the fins between heat absorber (21) and heat radiator (23) for reducing the heat transfer via the fins between heat absorber (21) and heat radiator (23). The foregoing structure can prevent frost and ice produced on heat absorber (21) from growing, so that a compact cloth dryer excellent in drying performance is obtainable.

Abstract: Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator.

Abstract: A method of drying a surface of a substrate is provided. The method includes supporting a substrate; rotating the substrate about a rotational center point; applying a liquid to the substrate via a liquid dispenser; applying a drying fluid to the substrate via a drying fluid dispenser; moving the drying fluid dispenser and the liquid dispenser in a direction toward an edge region of the substrate, the drying fluid being applied closer to the rotational center point than the fluid; upon the liquid being applied to the edge region of the substrate, discontinuing application of the liquid while continuing the manipulation of the drying fluid dispenser; and upon the drying fluid being applied to the edge region of the substrate, continuing to apply the drying fluid for a predetermined period of time.

Abstract: An air drying system for use in a concentrated solar power generation system using a fluid heat transfer medium includes a first vent pipe and a first desiccant pack. The first vent pipe extends from the concentrated solar power generation system and includes a first inlet open to ambient air, and a first outlet open to an interior of the solar power generation system in fluid communication with the fluid heat transfer medium. The first desiccant pack is positioned within the first vent pipe between the first inlet and first outlet and is positioned to reduce moisture content of ambient air flowing into the first vent pipe.

Abstract: Method and device for drying circuit substrates (13), in particular semiconductor substrates, in which a circuit surface (30) of the circuit substrate is flushed using a flushing liquid (10) in a flushing step and the circuit surface is dried in a subsequent drying step, the circuit substrate being moved in the flushing step in the direction of its planar extension transversely and in relation to a liquid level (28) of the flushing liquid in such a way that a liquid meniscus forms at a transition area between the circuit surface and the liquid level, which changes because of the relative movement, and thermal radiation (36) is applied to the transition area wetted by the liquid meniscus in the drying step.

Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.

Abstract: A reduced-pressure drying method includes: decompressing a second chamber communicated with a first chamber housing a base material coated with a liquid substance containing a solvent to predetermined operative pressure by a decompressing device; leaving the first chamber closed in response to reaching the predetermined operative pressure until the evaporated solvent raising the pressure in the first chamber to predetermined pressure; communicating the first chamber with the pressure raised to the predetermined pressure with the second chamber; and discharging the vapor of the solvent dispersed in the first and the second chambers by the decompressing device.

Abstract: A system and method is provided for vapor smoothing a rapid manufactured three-dimensional object. A cabinet housing has a sealable interior. A heated vapor chamber in the interior of the cabinet housing contains solvent that is vaporizable to fill the vapor chamber with vapor for smoothing the object when the object is placed in the vapor chamber. A drying chamber is also provided in the interior of the cabinet housing that is separate from the vapor chamber for drying the object when the object is moved from the vapor chamber to the drying chamber.

Abstract: A substrate processing apparatus includes a chamber, and a cleaning-liquid supply unit that supplies a cleaning liquid containing hydrofluoro ether onto a substrate to be processed placed in the chamber. In the chamber, there is further disposed a gas supply unit that supplies into the chamber a gas for preventing moisture from being adhered to a substrate to be processed, when a cleaning liquid containing hydrofluoro ether is supplied onto the substrate to be processed.

Abstract: A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and means for translating the assembly generally parallel to the surface of the substrate.

Abstract: A soil remediation apparatus for treating contaminated soil comprises an air deck unit and a remediation unit. The air deck unit comprises an enclosure with a contaminated soil inlet and a remediated soil outlet; at least one conveyor located inside the enclosure and operable to convey soil from the enclosure inlet to the enclosure outlet; and contaminated air extraction means having an inlet in fluid communication with the enclosure and an outlet, and operable to extract air from the air deck unit.

Abstract: A gas compressor unit according to the invention includes a single gas desiccant bed and condenser (which is inactive during the compression stage) inserted into the gas flow path of the compression cycle. In the case of a multistage compressor, the single gas desiccant bed is inserted between preferably the first and second stages. Moisture absorbed into this bed is periodically removed by exposing the bed to a regeneration cycle. The regeneration cycle employed is based on the closed re-circulation of gas present in the compressor and the desiccant bed itself, as well as other gas present in the re-circulation loop when the unit suspends delivery of compressed gas. Moisture removed from the desiccant bed is condensed and preferably evaporated into the environment through a semipermeable membrane. The motor and motor controller are located with the compressor in a common casing to minimize electromagnetic emissions.

Abstract: A disclosed heating apparatus for heating a substrate on which a film is coated includes a process chamber having a gas supply opening for supplying a first gas to the process chamber and a gas evacuation opening for evacuating the first gas from the process chamber; a heating plate that is arranged in the process chamber and includes a heating element for heating the substrate; plural protrusions arranged on the heating plate so as to support the substrate; plural suction holes formed in the heating plate so as to attract by suction the substrate toward the heating plate; and a gas inlet adapted to supply a second gas to a gap between the heating plate and the substrate supported by the plural protrusions.

Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.

Abstract: A substrate processing method is arranged to perform a heat process on a substrate with a coating film formed thereon to bake and cure the coating film. At first, the substrate, with the coating film formed thereon, is held at a preparatory temperature lower than a lower limit of temperature for baking and curing the coating film, to adjust distribution of a predetermined component in the coating film. Then, the substrate, with distribution of the predetermined component thus adjusted, is subjected to a heat process at a temperature not lower than the lower limit of temperature.

Abstract: A domestic appliance for the care of washed articles having with a container for receiving washed articles; a process air supply which is operationally connected to the container in fluid communication therewith whereby process air flows through the container during appliance operation; and a first heat exchanger which is in fluid communication with the process air supply for dehumidifying the process air exiting the container, the domestic appliance comprising a supplementary heat exchanger for lint filtering operationally disposed in the process air supply in fluid communication with the heat exchanger and the container.

Abstract: A clothes dryer includes a water tub, a rotating container located in the tub, a drive unit rotating the container, an air circulation blower circulating air in the tub, and a heat pump formed by circularly connecting an evaporator, a condenser, a compressor, a discharge airflow path leading to the outside of the clothes dryer, an airflow path switching unit switched so as to open the portion between the container and the evaporator in an airflow path in the drying operation, and to open the discharge airflow path in cooling a place where the clothes dryer is placed, an air inlet located in an upper wall between the evaporator and the condenser in the airflow path, an air discharge blower introducing air outside the airflow path from the air inlet to be passed through the evaporator, and a cooling device that cools down the condenser.

Abstract: A spin head includes a rotatable plate, first chucking pins and second chucking pins for supporting a edge portion of a substrate loaded on the plate, and a driving unit for selectively driving the first and second chucking pins. The driving unit includes a first magnet connected to the first chucking pin and disposed at a first height, a second magnet connected to the second chucking pin and disposed at a second height, and a driving magnet for driving the first and second magnets. The driving magnet is elevated by means of an elevating member to selectively apply a magnetic force to the first or second magnet and moves in the radius outside direction of the first or second chucking pin due to a magnetic force.

Abstract: A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carrying out the wafer; and a heating plates 44, 45 provided in the heating chamber 4 such that the wafer W can be heated from both above and below. A cooling plate 3 is provided in the housing 20 located in the vicinity of the opening of the heating chamber 4, for cooling the wafer W after being heated by the heating plates 44, 45. Additionally, a carrying means is provided in the housing 20 for carrying the wafer W between an upper position of the cooling plate 3 and the interior of the heating chamber 4 such that a heat treatment for the wafer W can be performed with the wafer W being held in the heating chamber 4.

Abstract: An apparatus serves for the treatment of particulate material and comprises a process chamber for the reception and treatment of the particulate material. The process chamber has a bottom provided with a passage orifice through which the process air can be introduced into said process chamber and an outlet for the discharge of said process air from said process chamber. A device for conditioning said process air and for circulating said process air in a circuit through said process chamber said outlet and back to said bottom has at least one fan for circulating said process air at least one condenser and at least one process air heater. A filter arrangement is provided for removing solids from said process air flowing out of said process chamber. A second chamber is arranged around said process chamber within said second chamber at least parts of said filter arrangement at least parts of said device for conditioning the process air are received.

Abstract: The present invention relates to an alignment film printing mask, and more particularly, to a jig for an alignment film printing mask. A jig according to the present invention includes a plurality of supporting members each having at least one bent portion, arranged at regular intervals along a width direction of the alignment film printing mask for supporting the alignment film printing mask, at l one connection member for connecting the supporting members, and fastening units for securing the alignment film printing mask supported by the supporting members.

Abstract: Gas drying device, consisting of a desiccant dryer (2) which makes use of a pressure tank (4) with a drying zone (5) and a regeneration zone (6), with an adsorption and/or absorption medium (7) which is alternately guided through the drying zone (5) and the regeneration zone (6); a primary circuit (8) in which the abovementioned desiccant dryer (2) is included, which makes it possible to guide the gas to be dried through the drying zone (5) of the desiccant dryer (2); a secondary circuit (9) which makes it possible for a part of the gas to be dried to be guided through the regeneration zone (6) of the desiccant dryer (2) and to absorb moisture there, characterized in that the device also contains a cooling dryer (1) which is inserted upstream the abovementioned desiccant dryer (2) in the primary circuit (8).

Abstract: A dishwasher and a controlling method thereof are provided. The dishwasher includes a tub, a door, a steam supplying unit, a fan, and a passage. The tub stores dishes. The door opens and closes the tub. The steam supplying unit supplies steam into the tub. The fan blows the steam. The passage forming unit is formed to circulate the steam blown by the fan inside the tub, or to discharge the steam to the outside of the tub.

Abstract: The invention provides a process for soldering in the vapor phase in which after the solder has melted onto the item to be soldered a vacuum is generated around the item to be soldered in the vapor phase. Also provided is a device for soldering in the vapor phase comprising a first chamber containing the vapor phase and, inside the first chamber within the vapor phase, a second chamber in which a vacuum can be generated and into which the item to be soldered can be introduced. A third chamber communicates with the first chamber to allow the item to be soldered to be transferred into the first chamber by means of a transporting system. The process and device according to the invention are advantageous in that they ensure soldered joints having a higher quality than those of the prior art.

Abstract: The present invention relates to a washer/dryer (1) with a high efficiency and wherein the noise generated during the drying cycle is decreased.

Abstract: A drying apparatus for drying articles such as clothing is provided. The drying apparatus includes a chamber for containing articles to be dried and a system for supplying heated dry air at a first temperature to the chamber. The air supplying system comprises an air flow pathway having an evaporator for removing moisture from air exiting the chamber and for decreasing the temperature of the air to below dew point temperature. The air supply system further has a condenser for increasing the temperature of the air exiting the evaporator to the first temperature. The drying apparatus further has a heat pump system having a refrigerant loop which includes a compressor, the condenser, a TEV valve, and the evaporator.

Abstract: A substrate processing method for a substrate processing system comprising at least a substrate processing apparatus that subjects a substrate to processing, and a substrate transferring apparatus having a transferring device that transfers the substrate, which enables the yield to be increased without bringing about a decrease in the throughput. The substrate processing method comprises a jetting step of jetting a high-temperature gas onto at least one of the transferring device and the substrate transferred by the transferring device.

Abstract: A method of drying a surface of a substrate is provided. The method includes supporting and rotating a substrate; applying a liquid to the substrate surface at or near a rotational center point via a liquid dispenser (so that a film of the liquid is formed on the surface); applying a drying fluid to the substrate surface at a predetermined distance from the rotational center point via one or more drying fluid dispensers; and manipulating the drying fluid dispenser(s) so that the location at which the drying fluid is applied to the substrate is moved in a direction toward the rotational center point, while at the same time manipulating the liquid dispenser so that the location at which the liquid is applied to the substrate is moved in a direction outward from the rotational center point. The liquid dispenser and drying fluid dispenser(s) noted above can be located on and/or within an assembly. The assembly can include a first dispenser, a second dispenser, and a third dispenser.

Abstract: A heating and blowing apparatus includes a main body housing having an inlet port and a discharge port. An air flow path extends from the inlet pod to the discharge port. A rotatingly driven fan and a heating unit are arranged on the air flow path. A bypass flow path branches off from the air flow path and leads to an ion emission port. An ion generator including a discharge electrode and an opposing electrode is arranged in the bypass flow path Further, the apparatus includes a cover arranged at the ion emission port and having an opening through which ions pass. One or more protrusions are provided on a rear surface of the cover. The protrusions make contact with the opposing electrode such that the cover is grounded through the opposing electrode.

Abstract: A vapor drying apparatus comprises a processing chamber 1a adapted to contain semiconductor wafers W; a supply nozzle 2 adapted to supply IPA vapor or N2 gas into the processing chamber 1a; a two-fluid nozzle 3 connected to both of an IPA supply source 8 and an N2 gas supply source 5 and adapted to produce a mixed fluid of IPA and N2 gas; a vapor generating apparatus 10 adapted to produce IPA vapor by heating the mixed fluid produced by the two-fluid nozzle 3; an N2 gas supply line 23 connected to the upstream side of the two-fluid nozzle 3; and a mixed fluid supply line 22 connected to the downstream side of the two-fluid nozzle 3. An open-and-close valve V2 is provided on a branch line 25 connecting the N2 gas supply line 23 and the mixed fluid supply line 22.

Abstract: A centralized device for the distribution and discharge of air causing the evaporation of a carrier in a number of user installations each having an intake channel and a discharge channel, comprising a single manifold for the reception, delivery and discharge of air-carrier mixture from and to the installations and a discharge fan connected to said manifold, and comprising for each installation: a device for air supply, connected to the single manifold and having a fresh air suction channel and an air supply channel, a fan connected to the air supply device, a heat exchanger connected to the fan and to the intake channel of the installation, a discharge device connected to the discharge channel of the installation and to the manifold and comprising a discharge channel, and a recirculation device comprising a recirculation channel connected to the air supply device and to the discharge device.