Methods Patents (Class 355/132)
  • Patent number: 4159177
    Abstract: The bridges between apertures located at the edge of the shadow mask of a color display tube are made at least 20% wider than the others. The width of the bridges increases linearly from row to row from the center to the edge of the mask whereby a continuously varying brightness distribution is obtained. The reproduction mask used in the fabrication of such a shadow mask can be made photographically by exposing photosensitive material through a pattern of bridges, rotating the pattern and repeating the exposure.
    Type: Grant
    Filed: July 8, 1977
    Date of Patent: June 26, 1979
    Assignee: U.S. Philips Corporation
    Inventors: Leonardus A. M. Elshof, Herman F. Van Heek
  • Patent number: 4147429
    Abstract: Process and apparatus for duplicating on microfiche the intelligence appearing on a photoplastic microfiche master by irradiating the duplicate through the master with high intensity moderately collimated light. Photoplastic film having a relatively thick thermoplastic layer is used as the master. The master and the duplicate are separated by a gap of predetermined size, which gap can be filled by air, plastic, glass or any other transparent medium. Multiple light sources isolated from one another, are used and provision is made for absorbing and dissipating some of the heat before the light reaches the master. Means are provided for assuring relatively uniform light intensity across the entire recording face and for assuring consistent irradiation of the duplicate irrespective of lamp age or line voltage variations.
    Type: Grant
    Filed: January 31, 1978
    Date of Patent: April 3, 1979
    Assignee: Microx Corporation
    Inventor: Gordon Lysle
  • Patent number: 4123157
    Abstract: Light reflected from hard copy is reduced to microimage size and applied at an imaging and developing station to a dry-process mask film strip which is photosensitive to the reflected light and which is developed by heat to provide microimaged transparencies therein. Such microimaged transparencies in the mask film strip are transferred in an image transferring station to a dry-process microform film to provide imaged microform records therein which conform to the transparent microimages in the mask film strip and which have archival properties. The imaging and developing station includes a platform for receiving the hard copy and a projection means for applying the reduced microimage of the hard copy to the mask film strip. Projection means are provided for expanding and projecting an image of said desired imaged microform record in the microform film in expanded normal size onto the platform for viewing the same.
    Type: Grant
    Filed: November 17, 1976
    Date of Patent: October 31, 1978
    Assignee: Energy Conversion Devices, Inc.
    Inventors: Peter H. Klose, Stanford R. Ovshinsky
  • Patent number: 4120583
    Abstract: A machine and a control system are provided for generating high registration photomasks with a contact printing arrangement. Further, a unique control arrangement is provided for controlling a machine such as a high registration contact print machine or other type of machine. In a preferred embodiment, a control system generates signals to a step and repeat contact printing machine that exposes many prints of master die images on a photographic film, where these prints have a high registration characteristic. In a further embodiment a unique control arrangement is provided for machine control operations.
    Type: Grant
    Filed: December 20, 1976
    Date of Patent: October 17, 1978
    Inventor: Gilbert P. Hyatt
  • Patent number: 4118123
    Abstract: A microfiche editing device for copying images contained in several microfiche frames on a first microfiche simultaneously onto a second at least partly unexposed microfiche; the device includes an array of illuminating means which can be selectively brought into use each to project light through a selected frame on the first microfiche so as to expose frames of the second microfiche placed in contact with the first microfiche; the illuminating means may include either a hinged mirror arrangement or a fibre optic arrangement which feed light into a collimating array of cells each of which correspond to a microfiche frame of the first microfiche.
    Type: Grant
    Filed: June 21, 1977
    Date of Patent: October 3, 1978
    Assignee: Harry Arthur Hele Spence-Bate
    Inventors: Harry Arthur Hele Spence-Bate, Michael Edwin Wilson
  • Patent number: 4115003
    Abstract: A graphic aid and method and system associated therewith are provided for producing aligned patterns in registry such as circuit board patterns and portions thereof. Certain features of the invention make it especially useful in fabricating multiple patterns which are discrete but in registry and in which one pattern represents a portion common with all the rest. Such a system is exemplified by two sided or multilayer circuit boards. The aid includes a diaphanous layout sheet whereon one or more sets of light absorptive pattern elements and reflective marks are arranged to conform to desired circuit patterns for the surfaces of a printed circuit board. A light absorptive background sheet is also provided and it is selectively positioned behind the layout sheet, to produce visible contrast with the reflective pattern marks thereon.
    Type: Grant
    Filed: July 6, 1976
    Date of Patent: September 19, 1978
    Assignee: Fotel Inc.
    Inventor: Robert W. Nachtrieb
  • Patent number: 4105331
    Abstract: An apparatus and method to position a moving continuous strip master and a moving continuous strip duplicate for copying film images from the master to the duplicate. A vacuum is applied to a housing, the walls of which are partially formed by surfaces of longitudinally extending adjacent rollers. The master and duplicate are inserted through adjacent roller pairs and both sides exposed to a vacuum within the housing. The master and duplicate are removed from the housing with confronting surfaces in contact through a third adjacent roller pair. As a result of the vacuum created between the confronting strip surfaces and atmospheric pressure on opposite strip surfaces the relative position of the master to the duplicate is maintained until exposure to a light source is complete.
    Type: Grant
    Filed: May 26, 1977
    Date of Patent: August 8, 1978
    Assignee: Extek Microsystems, Inc.
    Inventors: Charles E. Wallace, Donald J. Farmer
  • Patent number: 4105329
    Abstract: A printing tank contains a body of transparent liquid within which a main printing sprocket is totally immersed. Mechanism is provided for feeding one edge of a master strip of film onto the sprocket and in a curved path around a portion of the circumference of the sprocket. A curved support is provided to support the other edge of the master strip of film in a parallel relationship. An illuminated window is positioned between the sprocket and the curved support. A space between the window and the master strip of film is filled with the transparent liquid.In operation, the master strip of film is sprocket-registered while passing the printing aperture effected by the illuminated window. Means are also provided for transporting an unexposed strip of film in sprocket registry with the master strip of film at the aperture.PRIOR ARTContinuously driven printing machines for transferring photographic images from one moving strip of film to another are well-known, one being shown, for example, in the Jeapes Pat. No.
    Type: Grant
    Filed: April 26, 1977
    Date of Patent: August 8, 1978
    Assignee: Carter Equipment Co., Inc.
    Inventors: William D. Carter, Martin S. Mueller
  • Patent number: 4097147
    Abstract: A tray assembly to be used with a blueprint-type print machine includes an originals/print-paper tray interconnected with a copies tray. The tray assembly is constructed to position mouths of the original/print-paper tray and the copies tray at respective inlets and outlets of the print machine, with the trays being in substantially vertical attitudes. The originals/print-paper tray further includes a flat, sheet-like divider positioned therein which is freely movable between front and rear sides thereof. Adjustable guides are included at the mouths of the respective trays. A telescoping adjustable arm is connected between the lower ends of the respective trays under the print machine.
    Type: Grant
    Filed: June 1, 1977
    Date of Patent: June 27, 1978
    Inventor: J. Milton Portewig
  • Patent number: 4088403
    Abstract: A reproducing machine in which successive photosensitive members are advanced from storage to the operative location therein. Each photosensitive member is used in the reproducing machine a predetermined interval and then automatically removed therefrom with the next successive photosensitive member being advanced thereto.
    Type: Grant
    Filed: August 27, 1976
    Date of Patent: May 9, 1978
    Assignee: Xerox Corporation
    Inventor: William Kingsley
  • Patent number: 4088406
    Abstract: A semiconductor wafer vacuum chuck used as part of a photographic wafer-alignment machine for performing contactless photolithography has integral spacer means disposed on a substantially planar surface thereof for mechanically maintaining a fixed distance between portions of a wafer positioned adjacent the spacer means and the surface of the wafer chuck, whereby a controlled separation is provided between a surface of the wafer and a photographic mask overlying the surface of the wafer upon the application of a vacuum to the surface of the wafer chuck.
    Type: Grant
    Filed: November 15, 1976
    Date of Patent: May 9, 1978
    Assignee: RCA Corporation
    Inventors: Joel Ollendorf, Frank J. Cestone
  • Patent number: 4087182
    Abstract: Process and apparatus for producing a photopolymer plate having relief images thereon. Successive portions of a continuous length of a protective film material are travelled in a horizontal elongated plane defined by a pair of parallel and spaced guide rollers. A layer of liquid photosensitive material is applied to a length of the horizontal web of the protective film material. A length of backing material is then laminated onto the upper surface of the layer to form an assembly. The assembly is moved by the protective film material into a relief exposure station for the exposure of the lower surface of the layer through an image-bearing transparency and the protective film material to an actinic radiation. The laminated portion of the backing material is separated from the remaining continuous web of the backing material. The image-bearing transparency is fed to the relief exposure station by a continuous length of another film material.
    Type: Grant
    Filed: March 29, 1976
    Date of Patent: May 2, 1978
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hiroaki Aiba, Toshiie Matsui, Shu Yoshida
  • Patent number: 4082455
    Abstract: Automatic equipment is described for making multiple plate copies for an offset printing process from a single negative. A stack of plates having prepunched locating openings is provided with the emulsion side facing down and with the pile being automatically raised so that the top plate is at a particular location. A parallelogram linkage makes vacuum connection to the back of the plate, and moves the plate immediately on top of and in registry with a negative which is installed on a negative carrier plate. The plate is then exposed through the negative, and the parallelogram linkage and plate carrier then move back to the plate stack to pick up a new plate. A plate transfer mechanism then makes vacuum connection to the back surface of the exposed plate and rotates the plate, and inverts it onto a delivery belt system for delivering the exposed plate to a plate processor.
    Type: Grant
    Filed: June 2, 1977
    Date of Patent: April 4, 1978
    Assignee: Sun Chemical Corporation
    Inventor: Ward E. Brigham
  • Patent number: 4082453
    Abstract: By providing a given thickness for a positive photoresist layer on a substrate which, if unexposed, after development has a maximum depth just equal to the sum of the individual depths of two, at least partly superimposed, rectangular relief-profile diffraction gratings in the developed photoresist layer, it is possible to make a single master recording, which can be used to provide a stamper for embossing two of the three primary colors in a single surface of a transparent plastic sheet in the fabrication of diffractive subtractive filters.
    Type: Grant
    Filed: June 9, 1976
    Date of Patent: April 4, 1978
    Assignee: RCA Corporation
    Inventor: Karl Knop
  • Patent number: 4080072
    Abstract: A novel device for use as an additive lamphouse in contact printing. White light is emitted by a source, collimated and then passed through a dispersion element to form a spectrum. The light is then selectively attenuated by wavelength to allow exact control of the color mixture of the light which falls on the negative and the positive contact. The use of a dispersion element rather than the dichroic principle of the prior art allows selective control of the color mixture of the light incident to the negative and thus to the contact by providing an improved control of the homogenuity of the color across the illuminated field. Also the problem of "color wedging" has been markedly reduced. The contact printer according to the present invention is more compact than those of the prior art and may be produced at a reduced cost.
    Type: Grant
    Filed: January 12, 1976
    Date of Patent: March 21, 1978
    Assignees: Canadian Instrumentation and Research Limited, Film Opticals of Canada Limited
    Inventor: Michael Failes
  • Patent number: 4054383
    Abstract: A jig for positioning an image mask and image receiving medium which includes a housing having a central bore, first means within the bore for supporting a mask or image receiving medium, a flexible diaphragm, second means for drawing vacuum, and a third means for applying superatmospheric pressure on one side of the diaphragm to deform it towards the first means to ensure proper positioning of the mask and image receiving medium. Also, the process for positioning the mask and image receiving medium is provided.
    Type: Grant
    Filed: February 2, 1976
    Date of Patent: October 18, 1977
    Assignee: International Business Machines Corporation
    Inventors: Burn Jeng Lin, John Sebastian Mentesana, William Godfrey Santy, Janusz Stanislaw Wilczynski
  • Patent number: 4033695
    Abstract: A process and apparatus for exposing light-sensitive printing plates through an original to be copied, which includes forming a cassette-type, vacuum frame assembly by superimposing the printing plate and the original upon one another and disposing them in a cavity formed between an elastic blanket and a light-permeable plate, and evacuating the assembly, to improve contact between the printing plate and the original, at a position removed from a light means, thereafter temporarily placing the assembly in a position to be exposed to the light means and finally removing the assembly from the exposure position. A vacuum frame assembly is provided having a connect-disconnect means for temporary attachment both to the evacuation means removed from the light source and, if desired, to an evacuation means at the exposure position.
    Type: Grant
    Filed: May 27, 1975
    Date of Patent: July 5, 1977
    Assignee: Hoechst Aktiengesellschaft
    Inventors: George Sader, Dieter Osswald
  • Patent number: 4028107
    Abstract: Process and apparatus for printing a plurality of imposed pages in which proofs of said pages are manufactured, the proofs then being confined in co-planar, predetermined relation by engaging the sheets solely along selected edges thereof, and while holding the sheets thus confined manufacturing a printing plate or other reproductions therefrom. In one embodiment the proofs are on opaque or light impermeable sheets, while in a second embodiment they are on light permeable sheets. In the case of the opaque proofs used to make a printing plate, the plate is produced from a photo negative of the proof, whereas if the proofs are on light permeable material a plate may be produced directly by passing light through said proofs onto the sensitized surface of the plate material.
    Type: Grant
    Filed: May 19, 1971
    Date of Patent: June 7, 1977
    Inventor: John C. Henley, III
  • Patent number: 4026653
    Abstract: A predetermined small spacing or gap between a semiconductor wafer and a mask is defined by projecting a cushion of air through a central mask aperture toward the wafer. The wafer is supported on a sponge rubber member which is designed, along with the air flow paths, to maintain a uniform small separation as is desirable in the photolithographic printing of semiconductor mask patterns.
    Type: Grant
    Filed: May 9, 1975
    Date of Patent: May 31, 1977
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: Jacob Appelbaum, Martin Feldman
  • Patent number: 4023904
    Abstract: A process is disclosed for exposing to ultraviolet light a semi-conductor or hybrid substrate coated with photo-resist, in back of a mask having bars and very narrow slits, the diffraction patterns ordinarily experienced at the substrate being virtually eliminated through use, between the light source and the mask, of a light integrator comprised of two successive matrixes of very small lenses or lenticules. The lenticules form a large number of magnified, superimposed, slightly displaced images of the light source in the plane of the substrate; and when the slitted mask is interposed, this light forms a large number of diffraction patterns on the substrate which, because of their large number, superimposition, and slight displacement, results in extreme uniformity of light intensity and sharp resolution throughout the pattern of light on the substrate.
    Type: Grant
    Filed: January 12, 1976
    Date of Patent: May 17, 1977
    Assignee: Tamarack Scientific Co. Inc.
    Inventor: Ronald E. Sheets
  • Patent number: 4019817
    Abstract: A color image carrier such as positive film is brought into contact with a monochrome recording medium such as silver salt film. The color image carrier is illuminated with red, green and blue beams. These three color beams respectively can project coded information about diffraction gratings or slits which are different in angle or pitch in accordance with the respective colors. Thus, each color image carrier containing the coded information about each diffraction grating or slit is recorded on the monochrome recording medium.
    Type: Grant
    Filed: May 7, 1975
    Date of Patent: April 26, 1977
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kazuya Matsumoto
  • Patent number: 4007987
    Abstract: There is disclosed a vacuum contact printer and process for printing copy plates from master photomask plates depicting electronic circuitry.The printer embodies a vacuum-tight enclosure or casing, containing three vacuum chambers, two outside master and copy plate plenum chambers, and an intermediate main chamber. Retainers for the master and copy chambers hold and frame the master photomask and copy plates, respectively, and these retainers are mounted in confronting printing frames. The one of these printing frames which supports the master photomask plate is carried by a mounting plate fixed to an outside casing, and the other of the printing frames is carried by a swinging door of this casing. The master and copy photomask plates form partitions across the interior of the casing, and are positioned against flexible elastomeric framing seals, which complete these partitions.
    Type: Grant
    Filed: January 12, 1976
    Date of Patent: February 15, 1977
    Assignee: Tamarack Scientific Co. Inc.
    Inventor: Ronald E. Sheets
  • Patent number: 3984187
    Abstract: An original bears a pictorial image, or the like. The original is illuminated with first and second light and the image on the original is projected onto a copy carrier. The spatial variation of the intensity of the first light after the first light has been modulated in intensity by the image on the original is detected. The contrast of the image projected onto the copy carrier compared to the contrast of the image on the original is changed by changing the spatial variation of the second light in dependence upon the detected spatial variation of the intensity of the modulated first light.
    Type: Grant
    Filed: February 13, 1975
    Date of Patent: October 5, 1976
    Assignee: AGFA-Gevaert, A.G.
    Inventors: Friedrich Bestenreiner, Josef Helmberger, Reinhold Deml
  • Patent number: 3970386
    Abstract: In a bidirectional continuous contact printer for sprocketed film, sprocket holes in a raw film and a master film engage teeth in a sprocket wheel located at an exposure aperture. Between one storage reel and the sprocket wheel, the raw film and the master film pass over tensioning means that draw one edge of the sprocket holes of the raw film and the master film that engage the teeth of the sprocket wheel against such teeth to align the sprocket holes of the films. The tensioning means draw the same edge of the sprocket holes against the teeth in the sprocket wheel during both directions of film transport. In one direction of film transport, the sprocket wheel pulls the film past the exposure aperture, and in the other direction of film transport, the tensioning means pull the film past the exposure aperture. In both directions of film transport, the relative film position is controlled well enough to meet high quality film printing standards.
    Type: Grant
    Filed: March 17, 1975
    Date of Patent: July 20, 1976
    Assignee: PSC Technology, Inc.
    Inventor: Hans Chr. Wohlrab
  • Patent number: 3955163
    Abstract: A non-planar semiconductor wafer chuck having a plurality of outwardly extending channels in the chuck face and a plurality of vacuum/pressure ports extending through the chuck and communicating with the face thereof. When a semiconductor wafer is positioned with respect to an overlying photomask by the chuck, atmospheric pressure is applied to the centrally located port or ports and a vacuum is applied to the peripheral ports of the chuck. The resulting pressure differentials acting in concert with a surrounding vacuum chamber causes the central portion of the wafer to rise against the photomask while the peripheral portions of the wafer are drawn down into the channels. At this point in the operational sequence, the normally trapped nitrogen can escape through breaks in the peripheral seal between the mask and wafer which are formed by the downwardly extending wafer surface in each channel.
    Type: Grant
    Filed: June 24, 1974
    Date of Patent: May 4, 1976
    Assignee: The Computervision Corporation
    Inventor: Walter Thomas Novak
  • Patent number: 3941475
    Abstract: A system is disclosed for exposing to ultraviolet light a semi-conductor or hybrid substrate coated with photo-resist, in back of a mask having bars and very narrow slits, the diffraction patterns ordinarily experienced at the substrate being virtually eliminated through use, between the light source and the mask, of a light integrator comprised of two successive matrixes of very small lenses or lenticules. The lenticules form a large number of magnified, superimposed, slightly displaced images of the light source in the plane of the substrate; and when the slitted mask is interposed, this light forms a large number of diffraction patterns on the substrate which, because of their large number, superimposition, and slight displacement, results in extreme uniformity of light intensity and sharp resolution throughout the pattern of light on the substrate.
    Type: Grant
    Filed: July 1, 1974
    Date of Patent: March 2, 1976
    Assignee: Tamarack Scientific Co., Inc.
    Inventor: Ronald E. Sheets
  • Patent number: 3937579
    Abstract: The invention concerns a process for the two-sided exposure of a semiconductor or substrate plate, especially exposure of a wafer, through exposure masks which are arranged in plane parallel, parallel and rotational alignment to either side of a semiconductor plate. The invention further concerns an apparatus for parallel and rotational alignment to either side of a semiconductor plate. The invention further concerns an apparatus for parallel and rotational alignment of a semiconductor or substrate plate, especially alignment of a wafer, in relation to two exposure masks, operating on either of the two surfaces of the semiconductor or substrate plate, for the purpose of a two-sided exposure, in accord with the process established by the invention.
    Type: Grant
    Filed: November 15, 1973
    Date of Patent: February 10, 1976
    Assignee: Karl Suss KG
    Inventor: Jean Schmidt