Abstract: A method for taking heat away from the photomask includes driving a working fluid to flow between a photomask and a fluid retaining structure and through a first slit of the fluid retaining structure, such that a boundary of the working fluid is confined between the photomask and the fluid retaining structure; and generating a light to irradiate the photomask through a light transmission region of the fluid retaining structure.

Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

Abstract: A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element.

Abstract: A spectroscopic scatterometer detects both zero order and higher order radiation diffracted from an illuminated spot on a target grating. The apparatus forms and detects a spectrum of zero order (reflected) radiation, and separately forms and detects a spectrum of the higher order diffracted radiation. Each spectrum is formed using a symmetrical phase grating, so as to form and detect a symmetrical pair of spectra. The pair of spectra can be averaged to obtain a single spectrum with reduced focus sensitivity. Comparing the two spectra can yield information for improving height measurements in a subsequent lithographic step. The target grating is oriented obliquely so that the zero order and higher order radiation emanate from the spot in different planes. Two scatterometers can operate simultaneously, illuminating the target from different oblique directions. A radial transmission filter reduces sidelobes in the spot and reduces product crosstalk.

Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.

Abstract: A microlens exposure system includes a microlenses array and a mask fixed in place a predetermined space apart, wherein the gap between the microlens array and an exposure substrate can easily be adjusted with high precision to an aligned focal point position of the microlenses. Laser light for exposure is irradiated onto a resist film by microlenses of a microlens array. Light from a microscope passes through a hole in a Cr film of a mask, and the light is transmitted through a microlens and radiated onto the resist film. Whether or not the light transmitted through the microlens has an aligned focal point on the resist film is observed through the microscope, whereby the aligned focal point of exposure light made to converge by the microlenses on the resist film can be distinguished.

Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.

Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.

Abstract: An automatic temperature compensation method that automatically adjusts trip point thresholds of a motor circuit protector in response to changes in temperature. The relationship between two curves is exploited to match temperature sensor readings from a temperature sensor circuit with burden resistor percentage values derived from a burden resistor circuit. A temperature inflection point is determined from the intersection of (1) the temperature sensor curve plotting the voltage output of the temperature sensor versus temperature and (2) the burden resistance curve plotting burden resistance versus temperature. A temperature value along the temperature sensor curve is transformed into the corresponding burden resistance on the burden resistance curve. The burden resistance is expressed as a percentage variance from a burden resistance at an ambient temperature.

Abstract: A display device or an input device includes: a display section for simultaneously displaying (i) a first image in a first direction and (ii) a second image, which is different from the first image, in a second direction different from the first direction; and a reflecting section. The reflecting section reflects the second image, which is displayed on the display section, toward a viewing position where the first image is viewable and recognizable. This allows a user to simultaneously view (i) the first image displayed in the first direction by the display device or the input device and (ii) the second image displayed in the second direction by the display device or the input device.

Abstract: An exposure apparatus is equipped with a laser unit that emits a laser beam, a memory that stores a first information which shows a first relation indicating a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from the laser unit, and a main controller that controls the spectral width of the laser beam via a laser controller, based on the first information and on information related to a reticle that is to be used. Main controller performs spectral width control of the laser beam so as to suppress linewidth error, based on the first information and on the information related to the reticle that is to be used.

Abstract: A process for curing photopolymer which comprises exposing the photopolymer to an image produced by a mask-free imaging apparatus. The image may be generated by a monochromatic display screen, e.g. a liquid crystal display, light emitting diodes, a cathode ray tube or plasma screen.

Abstract: An outer ring (21) is arranged in a barrel unit (14c). A driving mechanism (25) provided on the outer ring shifts an optical element (M), and adjusts the position and the tilt of the optical element. A damper mechanism (31) for suppressing propagation of vibration to the optical element is attached to the outer ring.

Abstract: A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.

Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.

Abstract: In a method of adjusting an optical parameter of an exposure apparatus, a photolithographic projection is performed using an exposure apparatus and using a layout pattern so as to provide measured layout data with different focus settings of the exposure apparatus. An optical model is provided including at least one optical parameter and a simulated image is created by using the optical model and the layout pattern. The optical model is optimized by modifying the optical parameter.

Abstract: A lithographic method is provided and comprises using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode is adjusted after the radiation beam has been projected onto one or more substrates. The adjustment is arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates.

Abstract: A radiation source for generating electromagnetic radiation includes an anode, a cathode, and a discharge space. The anode and the cathode are configured to create a discharge in a substance in the discharge space to form a plasma so as to generate the electromagnetic radiation. The radiation source also includes a fuel supply constructed and arranged to supply at least a component of the substance to a location near the discharge space. The fuel supply is located at a distance from the anode and the cathode. The radiation source also includes a further supply constructed and arranged to create and/or maintain a cooling and/or protective layer on or near the anode and/or cathode.

Abstract: A method is provided for positioning a target portion of a substrate with respect to a focal plane of a projection system. The substrate may include one or more target portions. The method includes performing height measurements of at least part of the substrate to generate height data. The at least part of the substrate is at least partially outside the target portion that is to be positioned with respect to the projection system. The method further includes using predetermined correction heights to compute corrected height data for the height data corresponding to the at least part of the substrate outside the target portion, and positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.

Abstract: 1. Method for patterning a substrate using multiple exposure. 2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate. 2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this. 2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.

Abstract: A multiple resolution sensing apparatus comprises first and second arrays of photosensor elements and an image processing system. The first array exhibits a first signal-to-noise (S/N) ratio and a first input sampling rate (ISR). The first array also is operative to generate color information, corresponding to an image, that comprises at least one of red, green and blue information. The second array exhibits a second S/N ratio lower than the first S/N ratio and a second ISR higher than the first ISR. The second array is operative to generate luminance information corresponding to the image. The image processing system is communicatively coupled to the first array and the second array and is operative to receive the color information from the first array and the luminace information from the second array.

Abstract: Disclosed are image scanning systems and methods including an imaging apparatus having a first image capture area with an image scannable area that is smaller than the image to be scanned, a second platen on which the image to be scanned is disposed, and an optical element to focus the image to be scanned within the image scannable area of the first image capture area.

Abstract: The present invention provides an optical system that includes an array of opto-electronic devices, an array of micro lenses, and a fore optic. The array of opto-electronic devices lie substantially along a plane, but the fore optic has a non-planar focal field. To compensate for the non-planar focal field of the fore optic, each opto-electronic device has a corresponding micro lens. Each micro lens has a focal length and/or separation distance between it and it respective opto-electronic device, which compensates for the non-planar focal field of the fore optic. The focal lengths of these lenses may differ relative to one another. As a result, light that is provided by the fore optic is reconfigured by the micro lenses having various focal lengths to be substantially focused along the plane of the array of opto-electronic devices.

Abstract: The invention relates to an exposure apparatus, in particular for wavelength-dependent light outcoupling, in which at least one preferably wavelength-dependent mirror layer is located within an exposure beam path of a lamp, which mirror layer is used to divide the beam path into a spectral portion used for exposure, and into an unused spectral portion. The object of the invention is to provide an exposure apparatus and a method with which the quality of exposure can be optimized using simple means. The object on which the invention is based is attained according to the invention by locating a mirror in the beam path of the unused region of the spectrum that reflects the unused spectral range in the direction of a mirror layer, and a portion of this is projected onto a viewing screen for adjustment purposes.

Abstract: A microlithograpic tool, such as a projection stepper, for manufacturing integrated circuits, shapes light that illuminates a photomask with a chevron illumination system. The system uses either a chevron aperture mask of diffractive optical elements to shape a light source into four chevrons (110b, 120b, 130b, 140b). The chevrons are located in the corners of the circular pupil of the condenser lens. The chevrons may be a small a square poles at the corners or as large as an annular square ring. The chevrons provide superior performance for illuminating conventional X and Y oriented features of a photomask.

Abstract: A method, exposure apparatus, and printed wafer such that a design is printed within a peripheral portion of the wafer. The peripheral portion of the wafer is between an outer boundary of an active portion of the wafer and an outer boundary of the wafer. The exposure apparatus comprises a lens, a reticle that includes a pattern, and a reticle blind. The reticle blind blocks a first portion of light that is passed through the exposure apparatus. A transparent portion of the reticle transmits a remaining portion of the light. The lens focuses the remaining portion of the light onto the wafer such that an image of a portion of the pattern is printed as the design within the peripheral portion of the wafer. The printed design is a function of where the reticle blind is positioned relative to the pattern.

Abstract: A photolithography system includes a photolithography tool 32 that includes a stage upon which a semiconductor wafer is mounted. The tool is operable to move the stage to automatically focus a pre-determined image on a surface of the semiconductor wafer. The tool is further operable to log movements of the stage. The system also includes an automation host computer 36 operable to poll the photolithography tool 32 to obtain data reflecting the logged movements of the stage. The automation host computer 36 is further operable to analyze the data and compare the data to pre-determined error conditions. The host computer also takes a pre-determined action, including sending an electronic mail message to the personal computers 38 of relevant line personnel, in the event the data meets the pre-determined error conditions.

Abstract: The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using etching and deposition techniques. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for photo stimulated etching of objects in a liquid solution, patterning glass, and photoselective metal deposition. For photo stimulated etching of objects in a liquid solution, the invention provides a system and method for immersing a substrate in an etchant solution, exposing the immersed substrate to patterned light, and etching the substrate according to the pattern of incident light.

Abstract: The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for creating molecular imprinted array devices, integrated microsensors and fluidic networks on a substrate, integrated circuits of conducting polymers, and patterns on substrates using photochemical vapor deposition.

Abstract: Provided are a photomask, a method for manufacturing the photomask and a method for measuring optical characteristics of a wafer exposure system, the measuring method using the photomask during manufacture. The photomask includes a substrate and a measuring pattern including a light opaque region pattern formed on the substrate and a plurality of light transmitting region patterns that are formed in regions divided by the light opaque region pattern and provoke phase shifts to provide phase differences to light transmitted through light transmitting regions. Precise measurements of the degree of a focus and lens aberrations of an exposure system using the photomask are obtained.

Abstract: The invention relates to a system for projecting or displaying images comprising a valve exhibiting a plurality of image-forming elements having a light transmission coefficient which can be controlled so as to present the image, and a means of illuminating the valve comprising a light source and an integrator having two lens arrays associated in such a way that each lens of the second array distributes over the valve the light received from a corresponding lens of the first array. This system comprises a means for focusing the illuminating beam onto the integrator. The dimensions of the integrator are thus minimized. The focusing means comprises, for example, a reflector which reflects the light produced by the source, the integrator being arranged substantially in the focal plane of the reflector.

Abstract: A document scanning system includes a preview sensor that is dedicated to document previewing and distinct from any other sensor that is involved in the document scanning process. The preview sensor is preferably a two-dimensional sensor array that captures the outline of an entire document in parallel. The captured document outline is previewed on a display device relative to an actual image area that is defined by the scanning system. In an enhanced embodiment of the scanning system, the preview sensor captures an image that is printed on the document in addition to the outline of the document, so that the image of the document is also previewed relative to the image area. Providing a dedicated preview sensor that captures document position and image data in parallel enables real-time display of a document relative to the image area.

Abstract: A multi-stage microlens array with an array of compound lenses, each compound lens having a sequence of progressively smaller, higher-power lens elements. The array can have a high fill factor over the first-stage lens array, but still provide sufficient space between the terminal lens elements to accommodate structural support and components such as lens focus actuators. The microlens array can be incorporated into a printing system that includes an optical projection system, a scanning mechanism, an array of light-modulating image source elements providing an image source, and an image modulation mechanism that controls the image source as the printing surface is scanned. The microlens array can also be incorporated into an imaging system that includes an optical projection system, a scanning mechanism, an array of light-sensing detector elements, and a data acquisition system that records the detector response as the scanning mechanism operates.

Abstract: An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern, wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a pattern or a boundary between adjacent patterns as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location, and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.

Abstract: An optical apparatus is provided with storage means for storing captured images taken beforehand within a range of directional variability of an optical imaging system. The direction of the optical imaging system is detected and an image obtained in the detected direction is read from the storage means and displayed in place of an image actually being taken by the optical imaging system. When the scene desired to be viewed is not clearly visible or hard to find owing to cloudiness or the like, the user can view a corresponding simulated scene and, based on the simulated scene, can quickly find and view the actual scene. The real or simulated scene can be displayed for a predetermined period of time in response to insertion of a coin.

Abstract: A spatial light modulator pixel includes a flexible reflective surface that is electrostatically actuated to control the surface shape and thereby phase-modulate reflected light. The reflected light is filtered by a projection aperture, wherein the phase modulation controls the amount of light from the pixel that is filtered through the aperture. The spatial light modulator includes and array of such pixels, which are imaged onto a conjugate image plane, and each pixel controls the image brightness at a corresponding conjugate image point. High image contrast is achieved by using a dual-flexure pixel design in which two flexure elements operate conjunctively to maintain well-defined diffraction nodes at or near the projection aperture edges over the full modulation range.

Abstract: The invention relates to an apparatus for producing a photographic picture on a copy material, whereby an exposure arrangement with a projection optics is provided for the production of the photographic picture which includes a mirror matrix with individually movable mirrors, whereby the exposure arrangement includes a wide-band light source, for example a halogen light source, whereby a filter arrangement is positioned in the light beam between the light source and the mirror matrix in order to filter out or let pass specific spectral regions or specific amounts of light.

Abstract: A method of exposure while gradually reducing the exposure at peripheral parts when transferring patterns to a plurality of areas on a substrate where the peripheral parts are partially superposed, including exposing one shot area of the substrate through a density filter set so that the energy at the peripheral parts becomes a predetermined first distribution, measuring the distribution of exposure at portions corresponding to the peripheral parts on the substrate, determining a second distribution where the exposure at the peripheral parts becomes a target value based on the measured distribution of exposure, and exposes the shot areas adjoining the one shot area through a density filter set to give the second distribution.

Abstract: The invention relates to a system for projecting or displaying images comprising a valve exhibiting a plurality of image-forming elements having a light transmission coefficient which can be controlled so as to present the image, and a means of illuminating the valve comprising a light source and an integrator having two lens arrays associated in such a way that each lens of the second array distributes over the valve the light received from a corresponding lens of the first array.

Abstract: A digital copier includes an image reading part and a printing part. The image reading part includes reading means for electrically scanning lines of image information of a document in a primary scanning direction at a predetermined cycle to output image signals for the lines; secondary scanning means for mechanically moving a primary scanning position with respect to the document at a constant secondary scanning speed V in a secondary scanning direction perpendicular to the primary scanning direction; and line thinning means for thinning out lines for the image signals to 1/N where N is an integer. The printing part prints an image on a printing medium based on the image signals supplied from the image reading part. The lines of image information of the document are copied at an arbitrary zoom ratio in the secondary scanning direction by combining a value of the integer N and a value of the secondary scanning speed V.

Abstract: A microscopy and/or lithography system uses a comparatively low-resolution image projection system, which has a very small numerical aperture but large image field, in conjunction with a microlens array comprising miniature lens elements, each of which has a large numerical aperture but very small field. The projection system contains a small aperture stop which is imaged by the microlenses onto an array of diffraction-limited microspots on the microscope sample or printing surface at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the source of much of the complexity and expense of conventional wide-field, high-NA microscopy and microlithography systems.

Abstract: A document copy system includes a preview sensor that is dedicated to document previewing and distinct from any other sensor that is involved in the document copying process. The preview sensor is preferably a two-dimensional sensor array that captures the outline of an entire document in parallel. The captured document outline is previewed on a display device relative to an actual print area that is defined by the copy system. In an enhanced embodiment of the copy system, the preview sensor captures an image that is printed on the document in addition to the outline of the document, so that the image of the document is also previewed relative to the print area. Providing a dedicated preview sensor that captures document position and image data in parallel enables real-time display of a document relative to the print area.

Abstract: An apparatus for making a lithographic printing plate according to the silver salt diffusion transfer process image-wise exposes an imaging element with a high intensity short time scanning exposure. The imaging element comprises on a support in the order given a silver halide emulsion layer and a layer containing physical development nuclei. A thus obtained image-wise exposed imaging element is subsequently developed in the presence of a developing agent and silver halide solvent. The image-wise exposure is focused substantially within the silver halide emulsion layer of the imaging element.

Abstract: A method of processing color photographs to render the final image such that it will portray to an individual of normal color vision the image as it actually appears to the individual with color-deficient vision is described.

Abstract: A device for converting the picture displayed on a screen (3) of a microfilm- or microfiche-reading device (1) into electric signals. In order to permit complete electronic reading of the screen, a bar (4) is provided which has a plurality of juxtaposed picture sensors (5) and which is movably guided by a guide element (6). For the purpose of fitting out the device subsequently, the device also has means for securing the guide element (6) in a specific position in relation to the screen (3).

Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.