Abstract: A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.

Abstract: According the present invention there is provided a method for adjusting a component handling assembly, the component handling assembly comprising, a plurality of stations at least some of which have a nest which can receive a component, and a rotatable turret having a plurality of component handling heads, and wherein the turret can rotate to transport components between the plurality of stations, the method comprising the steps of, capturing a first image of a reference element located at a first station, using a camera which is located on the rotatable turret; identifying the position in the first image of the center of the reference element; rotating the turret so that the camera on the turret is in a position where it can capture a second image of nest of a second station; capturing a second image of the nest of the second station, using said camera; identifying the position in the second image of the center of the nest of the second station; superimposing a marker on the second image at the same positio

Abstract: The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.

Abstract: An optimizing method for a relational structure is presented. Firstly, a zone controller (ZC) receives a relational structure information related to a located zone and executes a classification for multiple sub-relational structure information thereof. The ZC then executes searching and calculation respectively based on different types of the sub-relational structure information, and receives multiple optimum solutions for each type of the sub-relational structure information respectively. Finally, the ZC establishes different types of sub-relational structures based on the multiple optimum solutions, wherein each sub-relational structure comprises at least one wireless node of the located zone, and connects with the multiple sub-relational structures for establishing the relational structure.

Abstract: The present invention provides an imprint apparatus including an amplifier configured to amplify a signal of displacement between a mold and a substrate, and a control unit configured to perform alignment between the mold and the substrate based on the amplified signal, wherein the control unit performs the alignment through a first operation of moving the substrate with respect to the mold in a first direction and a second operation of moving the substrate with respect to the mold in a second direction that is opposite to the first direction, and in the first operation, the control unit sets the gain of the amplifier to a first gain and changes the gain of the amplifier from the first gain to a second gain.

Abstract: A reconfigurable mobile device is provided. The reconfigurable mobile device includes a first body, a second body that is disposed at a side of the first body and is movable with respect to the first body, a multistage supporter that is provided between the first body and the second body and comprises at least two supporting members that are inserted and received in at least one of the first body and the second body according to movement of the first body and the second body, a screen that is provided in the multistage supporter and is wound or unwound according to the movement of the first body and the second body, and a projector that is provided in at least one of the first body and the second body and configured to project an image toward the screen.

Abstract: An exposure apparatus exposes a peripheral portion of a substrate to light, and includes an optical system configured to irradiate the substrate with the light, a stage configured to hold the substrate and be moved in a direction to position the substrate in a direction perpendicular to the optical axis of the optical system, and a controller configured to cause the stage to be moved. The controller moves the stage based on information about a distance between the optical system and the peripheral portion in a direction parallel to the optical axis and a telecentricity of the optical system so that a predetermined portion of the substrate is irradiated with the light from the optical system.

Abstract: The present invention provides an exposure apparatus which exposes a substrate, comprising a substrate stage configured to be movable while holding the substrate, a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate, and a control unit configured to control the measurement unit, wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform measurement by the measurement unit to equally space a plurality of measurement portions on the substrate measured by the measurement unit in a state in which an acceleration of the substrate stage is nonzero.

Abstract: A pellicle mounting method is provided. The method includes aligning a mounting apparatus with a top surface of a pellicle frame, the mounting apparatus having a continuous duct extending therethrough and a plurality of contact pins projecting from the mounting apparatus. The method also includes introducing a pressurizing fluid into the continuous duct that causes each of the plurality of contact pins to engage the top surface of the pellicle frame with a substantially equal force, a combined force of the plurality of contact pins urging a bottom surface of the pellicle frame against a top surface of a photomask, the combined force being adjustable based on a pressure within the continuous duct. Further, the method includes adjusting the pressure within the continuous duct until the pressure is approximately equal to a pre-determined optimal pressure.

Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

Abstract: Systems and methods are provided for modifying blemished image intensifier tubes that otherwise would be inappropriate for use in strictly specified night vision equipment. The systems include masks and display elements designed and structured to be oriented in a variety of directions so as to cover over and hide blemishes within an image intensifier tube. Masks may be provided utilizing glass discs that are ground, polished, and etched with particular geometric masking elements and fixed over the display end of the image intensifier tube. Electronic components may be presented as display elements over the opaque portions of the masks. Methods for manufacturing the masks are described that detect and characterize the location and size of the blemishes and select mask type, size, and orientation for manufacture and use.

Abstract: The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.

Abstract: A mask box having a buckling structure includes a base, a cover and a plurality of buckling elements. The base is configured to support a mask and has a plurality of troughs. The cover covers the base and has a plurality of pivotal portions. The buckling elements are positioned to correspond to the troughs. Each buckling element includes an engaging block and an elastic arm connected to the pivotal portion. The engaging block moves away from the periphery of the cover when the engaging block is subjected to an external force. The engaging block is buckled into the trough via an elastic restoring force of the at least one elastic arm when the external force is removed. By this arrangement, the assembly of the buckling elements is simplified and its product cost is reduced. Further, the present invention conforms to the requirements for environmental protection.

Abstract: The present invention provides an exposure apparatus for intermittently irradiating light from a light source to a TFT substrate through a photomask while conveying the TFT substrate in one direction, and forming an exposure pattern on the TFT substrate corresponding to a plurality of mask patterns formed on the photomask. On one surface of the photomask, electrode wiring patterns and signal wiring patterns requiring different resolutions are formed and an electrode wiring pattern group including a plurality of electrode wiring patterns and a signal wiring pattern group including a plurality of signal wiring patterns are formed in front and back in the conveying direction of the TFT substrate, and on the other surface of the photomask, micro-lenses which reduce and project the electrode wiring patterns requiring a high resolution onto the TFT substrate are formed. The photomask is disposed so that the micro-lenses face the TFT substrate.

Abstract: The present invention provides an exposure apparatus which transfers a pattern of a mask to a substrate, including a measurement unit configured to measure, at a first measurement point and a second measurement point, a height of a measurement target portion in a shot region of the substrate held by a stage, and a control unit configured to move the stage in a direction of height of the substrate based on a correction result of correcting, by a set correction value, a measured height of the measurement target portion at the first measurement point in a acceleration period of the stage, and when a measured height of the measurement target portion at the second measurement point in the constant speed period of the stage deviates from an allowable range, obtain a new correction value instead of the set correction value.

Abstract: A magnetic supporting mechanism which comprises first to fourth magnets having first to fourth magnetic poles, in which the third magnet is partially inserted into a gap between the first and second magnets so that the first and third magnetic poles face each other and the second and fourth magnetic poles face each other, and which supports a supporting target to be movable in a second direction, in which the third magnet is inserted, of two directions perpendicular to a first direction in which the first and second magnetic poles face each other, wherein the third magnet is formed such that an effective width across which a magnetic force acts in a third direction perpendicular to both the first and second directions is narrower at a second end thereof opposite to a first end thereof inserted between the first and second magnets than at the first end.

Abstract: A lithography system may include a wafer stage. The wafer stage may include a wafer mounting part configured to carry a wafer and configured to oscillate along a plane that is parallel to a top surface of the wafer in a wafer exposure process. The wafer stage may further include a driving device configured to affect an oscillatory movement of the wafer mounting part in the wafer exposure process.

Abstract: A mask support frame for supporting a mask is provided. The frame is configured to secure both ends of a mask and apply tension to the mask in a first direction. The frame includes a frame main body defining an opening for exposing a patterned opening area of the mask and an end tensioner coupled to the frame main body, and configured to apply tension to one of both ends of the mask in a second direction crossing the first direction.

Abstract: A mask blank container adapted to house a mask blank with a resist film. The container comprises a container body 5 for receiving the mask blank; a cap member 6 to be put on the container body; and a fixing member 9 adapted to fix the container body and the cap member to each other when the cap member is put on the container body. The container body and the cap member have fitting portions 51 and 61 made of a resin material and fitted to each other, respectively. The fixing member comprises a first member 91 having an engaging portion 91 a to be engaged with the fitting portion of the cap member, and a second member 92 having an engaging portion 93 to be engaged with the fitting portion of the container body. A distance between the engaging portions of the first and the second members is desired to be variable.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.

Abstract: The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.

Abstract: A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.

Abstract: A positioning apparatus includes a stage, a base, a supporting mechanism which is arranged between the stage and the base and supports the stage with a supporting portion having a spring characteristic, an actuator which is arranged between the stage and the base so as to drive the stage, and a controller which controls the actuator so as to reduce a position error of the stage relative to a target position and cancel at least part of a force acting on the stage due to the spring characteristic of the supporting portion, based on the position error of the stage and a variation of a relative position between the stage and the base.

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

Abstract: An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of the workpiece; and a first moving mechanism that relatively moves the alignment stage and the first alignment microscope in an 1-axis direction by a width of the workpiece. The exposure processing unit includes: a mask stage that holds a mask having mask marks thereon; a second alignment microscope that detects the mask marks of the mask; and an exposure stage that holds the workpiece. The workpiece moving mechanism moves the workpiece from the alignment stage unit to the exposure processing unit.

Abstract: The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.

Abstract: A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second alignment signal by a second detector using a different alignment measurement than the first detector; receiving the first alignment signal from the first detector; calculating a first position of the at least first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further first position of the at least first mark based on the second alignment signal.

Abstract: An illumination optical apparatus of the present invention includes an illumination optical system having a plurality of reflection mirrors arranged to guide illumination light flux to an irradiated plane. A first partial field stop is arranged in an optical path of the illumination optical system to form a first profile line of an illumination region that is to be formed on the irradiated plane. A second partial field stop is arranged between the illumination optical system and the irradiated plane to form a second profile line of the illumination region. The illumination optical system includes a relay optical system for substantially optically conjugating the position of the first partial field stop and the position of the second partial field stop.

Abstract: The present invention provides an exposure apparatus for intermittently irradiating light from a light source to a TFT substrate through a photomask while conveying the TFT substrate in one direction, and forming an exposure pattern on the TFT substrate corresponding to a plurality of mask patterns formed on the photomask. On one surface of the photomask, electrode wiring patterns and signal wiring patterns requiring different resolutions are formed and an electrode wiring pattern group including a plurality of electrode wiring patterns and a signal wiring pattern group including a plurality of signal wiring patterns are formed in front and back in the conveying direction of the TFT substrate, and on the other surface of the photomask, micro-lenses which reduce and project the electrode wiring patterns requiring a high resolution onto the TFT substrate are formed. The photomask is disposed so that the micro-lenses face the TFT substrate.

Abstract: A clamping apparatus capable of fixing a roll film is disclosed. The clamping apparatus includes: a carrier comprising a slot; a cover positioned in the slot; and a cannelure formed between the cover and the carrier, for guiding the film inserted from the first film door to a predetermined position. The cover includes: an upper ramp, positioned on one side of the cannelure opening, for guiding the film from the first film door to the cannelure opening, wherein a first edge of the upper ramp is near the cannelure opening, and a second edge of the upper ramp is away from the slot opening and inclines to the first edge of the upper ramp.

Abstract: A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.

Abstract: The present invention provides a mask alignment mechanism which reduces the occurrence of particles and which aligns a mask with high accuracy, and a vacuum processing apparatus including such a mask alignment mechanism. A mask alignment mechanism according to one embodiment of the present invention includes a substrate holder which is movable up and down when a substrate is transferred and on which four taper pins are formed, and a mask in which grooves are formed. The taper pins can be inserted into the grooves, respectively. The taper pins include a pair of long taper pins and a pair of short taper pins. The taper pins in each pair are disposed to face each other across the substrate. Tapered surfaces formed in the long taper pins and tapered surfaces formed in the short taper pins are located at different heights.

Abstract: Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the encoder is performed. Accordingly, by using measurement values of the interferometer, correction information for correcting the measurement values of the encoder whose short-term stability of the measurement values excels the interferometer is obtained. Then, based on the measurement values of the encoder and the correction information, the movable body is driven in the Y-axis direction with good precision.

Abstract: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract: A mask case which accommodates a mask therein includes a reinforcing member which has a strength corresponding to a load of the mask and which is provided at a contact portion contacting with a transporting vehicle and a transporting apparatus each of which is an external apparatus on which the mask case is placed. Each of the transporting vehicle and the transporting apparatus transporting the mask includes a plurality of ball transfers which support the reinforcing member of the mask case accommodating the mask therein and which serve as a case support portion suppressing friction which is generated with respect to the reinforcing member.

Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.

Abstract: In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.

Abstract: A substrate table for a lithographic apparatus includes a mask constructed and arranged to prevent exposure of a peripheral exposure region of a substrate on the substrate table. The mask is attached to a moveable carrier. The moveable carrier has a range of movement which at least partially circumnavigates the substrate table.

Abstract: A positioning apparatus of the present invention performs a positioning of an object with a predetermined number of degrees of freedom. The positioning apparatus comprises a plurality of drivers whose number is more than that of the degrees of freedom, which are configured to drive the object, a calculator configured to calculate target positions of the plurality of drivers from a target position of the object using a measurement result of a shape of the object previously measured, and a controller configured to control the plurality of drivers so as to come close to the target positions of the plurality of drivers.

Abstract: Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

Abstract: An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of the workpiece; and a first moving mechanism that relatively moves the alignment stage and the first alignment microscope in an 1-axis direction by a width of the workpiece. The exposure processing unit includes: a mask stage that holds a mask having mask marks thereon; a second alignment microscope that detects the mask marks of the mask; and an exposure stage that holds the workpiece.

Abstract: A lithographic apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation to form a patterned beam of radiation; a positioning device configured to move the support in a first direction; a measurement device configured to measure a relative position of the patterning device with respect to the support and to generate a measuring signal, the measurement device including a reference unit constructed and arranged to be coupled to the patterning device at a fixed relative position, and a position sensor configured to measure the position of the reference unit with respect to the support, wherein the positioning device is constructed and arranged to correct a position of the support based on the measuring signal.

Abstract: At a time of aligning a thin plate-shaped work of which both front and rear surfaces are subjected to work, a deflection caused at a central portion of the thin plate-shaped work is corrected and the thin plate-shaped work is controlled to be parallel state with respect to a photomask.

Abstract: A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.

Abstract: An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.