Abstract: A method of quickly and accurately inspecting the stitching accuracy at which regions of a lithographic pattern are stitched at boundaries. The numerous regions of the lithographic pattern are exposed or delineated, one at a time. Inspected regions are scanned with a charged-particle beam to detect secondary electrons. The obtained signal is stored as an inspected image in an image memory, together with positional data about the inspected regions. After completion of acceptance of images from all the inspected regions, the inspected image is compared with a separately prepared reference image by an image processing unit. Pattern elements in the inspected regions corresponding to the reference image are extracted. Deviations at field boundaries or the like can be detected from the relative positions of these pattern elements, if any.

Abstract: A checking machine for being used in a fabricating process of a display module and checking a position of a tape automated bonding (TAB) region is provided. The checking machine includes a main holder having an inclined panel positioned at an inclination &bgr; relative to the horizontal, wherein the range of the inclination &bgr; is 0°<&bgr;≦90°, a test plate having a first hollow portion for suiting a size of the display module and a circuit plate disposed around the first hollow portion for suiting the position of the tape automated bonding region, and a fixing device for fixing the test plate to the inclined panel, thereby the tape automated bonding region is electrically connected with the circuit plate.

Abstract: An apparatus for evaluating distinguishing authenticity features comprising diffraction elements on a document which is illuminated by an illumination source. The distinguishing authenticity element which is to be examined, diffracts the beam of the illuminating source and projects it onto an evaluating unit in the device. In order to be independent of the nature and location of the diffraction pattern, the diffraction pattern derived from the document to be examined is projected onto a screen and the image of the pattern recorded and evaluated by a camera (matrix or cells).

Abstract: Apparatus for spatial filtering includes a Fourier lens, adapted to collect radiation emitted from a point and to separate the collected radiation into spatial components in a Fourier plane of the lens, and a programmable spatial filter, positioned at the Fourier plane. An image sensor is optically coupled to capture an image of the spatial components of the collected radiation in the Fourier plane, while the components are incident on the filter. A filter controller is coupled to receive and analyze the image captured by the image sensor and, responsive thereto, to control the spatial filter so as to block one or more of the spatial components.

Abstract: The ability to inspect photomasks for errors or defects in phase-shifters is greatly enhanced using optical techniques based on multiple modified radiation collection techniques. In particular, the apparatus and methods of the invention allows for errors in phase-shifters to be more accurately detected, even in the presence of regular amplitude objects such as grid lines. In one embodiment, the intensities of two slightly defocused images of phase objects corresponding to the same photomask location are compared. In a second embodiment, radiation having two Zernike point spread functions is used to obtain two slightly different phase sensitive images. Data collected and analyzed using this method provides much greater sensitivity to phase objects and errors in phase objects than prior art inspection systems. Embodiments include both scanning-type and projector-type optical architectures and may utilize radiation transmitted or reflected by a sample.

Abstract: A reticle has a transparent substrate, mask shapes on the substrate, a transparent material covering the mask shapes and an optional anti-reflective material over the transparent material.

Abstract: An image processor wherein, with respect to pixels included in a pattern image and in a plural directions from a selected pixel among pixels, a number of same kind of pixels which consecutively continues from the selected pixel is counted. A processing recognition area effective signal that shows a range in which an area to be processed exists is produced. Whether the selected pixel is a processing candidate pixel is determined based on a determination whether the number is larger, in the plural directions, than a reference value. A processing image is made by comparing the processing candidate pixel and the processing recognition area effective signal.

Abstract: The present invention includes molding additives and molded materials. This invention also includes machines or electronic apparatus using these aspects of the invention. The present invention also includes methods and processes for making and using these devices and systems. In a preferred embodiment, a dye that fluoresces via ultraviolet absorption is dispersed in an organic additive. The additive is mixed with a molding material that is then formed into a shaped article by compaction. The resultant shaped article is then observed under an ultraviolet lamp to determine fluorescence variation, such variation corresponding to density gradients in the article.

Abstract: There is disclosed a method of automatically analyzing many repeating patterns. One typical pattern is first selected. On the typical pattern, analysis points, analysis methods and analysis conditions are determined. On the other patterns, automatic analysis is performed at points having the same positional relation as the analysis points determined on the typical pattern with the analysis methods and analysis conditions determined for the typical pattern.

Abstract: The present invention provides a mask for measuring an optical aberration, the mask including at least a measuring pattern comprising plural pattern parts being separated from each other, wherein the plural pattern parts provide individual widths which are simply increased on first and second directional axes non-parallel to each other and vertical to a plane of the mask, provided that the width of each of the plural pattern parts is unchanged at least on the first and second directional axes.

Abstract: A measuring instrument and a method for measuring patterns on substrates of various thicknesses are described. The measuring instrument comprises an X-Y carriage in which an opening is defined by a peripheral rim. An illumination optical system and multiple optical compensation elements serve to illuminate the measurement region. Multiple storage compartments for the optical compensation elements are shaped on the peripheral rim of the opening of the X-Y carriage. The optical compensation element needed in each case can be removed by the illumination optical system from the associated storage compartment.

Abstract: An apparatus and method for measuring in real time the rotational or linear position, direction or velocity of a rotating or linear moving body, particularly an encoded optical disk or strip attached to such rotating or linear moving body. A position measurement pattern comprising a plurality of spaced apart rows of “lands” and “pits” are included on the encoded disk or strip. A position read head with a plurality of laser beams is positioned to reflect laser light off the position measurement pattern on the disk or strip. The relative spacing of the laser beams on the position read head is adjusted to a non-integral multiple of the spacing of the rows. Output signals from the position read head are generated according to reflected laser light from the position measurement pattern which is detected by the error read head. The output signals are converted to position, direction and velocity information.

Abstract: Apparatus and method for measuring an aerial image whereby influences of various defects existing on patterns formed on a photomask as well as the surface of the photomask substrate can be inspected. The aerial image measuring apparatus includes an optical transmitting device, an optical reflecting device and an aerial image forming device. The optical reflecting device includes a beam splitter and a reflecting mirror. The reflecting mirror switches the path of light so that the light transmitted along the reflected light path is irradiated to the surface of the photomask on which the patterns are formed. According to an aerial image measuring method of the present invention, either transmitted light or reflected light is selected for analysis, the selected light is converted into an electrical signal to form an aerial image, and the aerial image is measured.