Abstract: The present invention provides a measuring apparatus which measures a shape of an object to be measured, comprising an emitting unit configured to emit pattern light, an optical system configured to irradiate the object with the pattern light emitted from the emitting unit, a deflection unit configured to deflect light emitted from the optical system, an image sensing unit configured to sense an image of the object irradiated with the pattern light, and a processing unit configured to determine the shape of the object based on the image of the object sensed by the image sensing unit, wherein the deflection unit includes a deflection element, wherein the measuring apparatus irradiates the object with light deflected by the deflection element, and a direction deflected by the deflection element differs depending on a polarization state of incident light in the deflection element.

Abstract: A biosensor system for the detection of particles includes a biosensor cartridge having a sensor surface. A biosensor magnet assembly is disposed on one side of the cartridge for generating a magnetic field effective at the cartridge and the sensor surface. The biosensor magnet assembly includes at least two magnetic sub-units separated by a gap. A first optical detection system detects the particles arranged at the same side of the cartridge as the magnet assembly. The magnet assembly and the first optical sensor are disposed such that the optical detection is accomplished through the gap of the magnet assembly.

Abstract: A surface plasmon resonance sensor element includes a thin metallic layer, an optical construction disposed on the thin metallic layer for directing light to and away from the thin metallic layer, and an absorptive layer disposed on the thin metallic layer opposite the optical construction. The absorptive layer includes a polymer of intrinsic microporosity having an average pore volume of at least 0.4 cubic nanometers.

Abstract: A technique for forming 3D structures is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for forming 3D structures. The method may comprise providing a substrate comprising at least two vertically extending fins that are spaced apart from one another to define a trench; depositing a dielectric material in the trench between the at least two vertically extending fins; providing an etch stop layer within the dielectric material, the etch stop layer having a first side and a second opposite side; removing the dielectric material near the first side of the etch stop layer.

Abstract: There is provided an image processing device including a body hair detection unit that detects a body hair region corresponding to body hair from a process target image that includes skin, a texture structure estimation unit that estimates a structure of skin texture in the process target image, and an interpolation unit that interpolates the body hair region detected by the body hair detection unit based on the structure of the skin texture estimated by the texture structure estimation unit.

Abstract: Methods and systems are provided to avoid the rotation action with the polarizer and the analyzer in complex ellipsometric measurement and repeated processes. In particular, methods and systems are provided which polarize the incident light in a fixed azimuthal angle then illuminate the polarized light onto the target surface, analyze the surface polarized characteristics light in a fixed azimuthal angle, and obtain the light intensity and phase information corresponding to the target surface. Then, based on the relationship between the characteristic information detected by electromagnetic wave and the light intensity information, the disclosed methods and systems obtain the characteristic information of the target surface.

Abstract: Disclosed are methods, apparatuses, and lithographic systems for calibrating an inspection apparatus. Radiation is projected onto a pattern in a target position of a substrate. By making a plurality of measurements of the pattern and comparing the measured first or higher diffraction orders of radiation reflected from the pattern of different measurements, a residual error indicative of the error in a scatterometer may be calculated. This error is an error in measurements of substrate parameters caused by irregularities of the scatterometer. The residual error may manifest itself as an asymmetry in the diffraction spectra.

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

Abstract: A sensor device is disclosed, including a database, and a processing apparatus. The database includes, for multiple different first types of objects, a first output data which are output data of an optical system acquired beforehand for each of the first objects in a case in which a surface of one side of the first object is set as the detection surface; and a second output data which are output data of the optical detection system acquired beforehand for each of the first objects in a case in which a surface of an other side opposite to the one side of the first object is set as the detection surface. The processing apparatus matches measurement data with the database, the measurement data being the output data of the optical detection system which is acquired with respect to a second object, and determines a type of the second object.

Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

Abstract: An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine at least one parameter of a sample. The metrology device focuses light on the sample using an optical system with a large numerical aperture, e.g., 0.2 to 0.9. Multiple channels having multiple AOIs and/or multiple azimuth angles are selected simultaneously by passing light reflected from the sample through a plurality of pupils in a pupil plate. Beamlets produced by the plurality of pupils are detected, e.g., with one or more spectrophotometers, to produce data for the multiple AOIs and/or multiple azimuth angles. The data for multiple AOI and/or multiple azimuth angles may then be processed to determine at least one parameter of the sample, such as profile parameters or overlay error.

Abstract: An optical sensor includes an irradiation system emitting linearly polarized light of a first polarization direction toward a surface of an object from an incident direction inclined with respect to a normal to the surface; a first light detection system including a first light detector placed on a light path of light emitted from the irradiation system and specularly reflected by the object; and a second light detection system including a separation optical element placed on a light path of light diffusely reflected by the object, on a plane of incidence of the object, and extracting a linearly polarized light component of the first polarization direction included in the light diffusely reflected by the object, a second light detector receiving the linearly polarized light component of the first polarization direction extracted by the separation optical element and a third light detector receiving the light diffusely reflected by the object.

Abstract: Embodiments of the invention include a method and/or system for determining the relative location of light sources in a video clip. The relative location of a light source can be determined from information found within the video clip. This can be determined from specular reflection on a planar surface within the video clip. An ellipse can be fit to glare that is indicative of specular reflection on the planar surface. An outgoing light angle can be determined from the ellipse. From this outgoing light angle, the incident light angle can be determined for the frame. From this incident light angle, the location of the light source can be determined.

Abstract: A system, apparatus and method for analysis of a specimen using ellipsometric analysis. Polarization distortions caused by the propagation of polarized light within a substrate upon which a specimen is located are reduced by directing light at selected polarizations at the substrate alone and the specimen on the substrate. Image data is collected for each of the selected polarizations and processed to remove errors due to birefringence. Fourier transform processing is used to obtain polarization phase data for correcting polarization caused by any birefringence in the substrate, and optionally amplitude data.

Abstract: Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

Abstract: In a self-calibration method of an angle detector, an angle interval between first and second scale reader heads are set, so that a single rotation is not equally divided into an integer number of portions by a value of the angle interval and that a plurality of rotations N are equally divided into M equal portions by the value of the angle interval. Readings by the scale reader heads during N rotations of the divided circle are obtained at a pre-set data sampling interval. From differences in readings by these scale reader heads, data of the sequential two-point method relating to an angle scale error of the divided circle are obtained at the data sampling interval. The scale error of the divided circle at the data sampling interval is calculated by synthesizing the data using the fact that an average of the data for the rotations N reaches approximately zero.

Abstract: An integrated system operation method is disclosed that includes the following steps: the film of a substrate is measured by a metrology apparatus to obtain a film information. The substrate is moved from the metrology apparatus to a process apparatus adjacent to the transfer apparatus. The film information is sent to the process apparatus. A film treatment is applied to the substrate in accordance with the film information.

Abstract: A device for detecting a surface plasmon and polarization includes: a topological insulating layer formed on a substrate; first and second electrodes formed on the topological insulating layer; and a waveguide connected to the topological insulating layer between the first and second electrodes.

Abstract: An instrument for measuring and analyzing surface plasmon resonance (SPR) and/or surface plasmon coupled emission on an electro-optic grating-coupled sensor surface is described herein. The sensor chip achieves SPR through a grating-coupled approach, with variations in the local dielectric constant at regions of interest (ROI) at the sensor surface detected as a function of the intensity of light reflecting from these ROI. Unlike other grating-based approaches, the metal surface is sufficiently thin that resonant conditions are sensitive to dielectric constant changes both above and below the metal surface (like the Kretschmann configuration). Dielectric constant shifts that occur as mass accumulates on the surface can be returned to reference intensities by applying voltage across the underlying electro-optic polymer.

Abstract: A method for detecting ultra-fine features of an integrated circuit (IC) on a semiconductor substrate is disclosed. The semiconductor substrate comprises an IC fabricated by 22 nanometer or smaller scale semiconductor micro-fabrication process. The integrated circuit includes circuit features parallel to a circuit horizontal direction or a circuit vertical direction. The method includes focusing an incident light to produce a focused light spot on a portion of the IC. The incident light is linearly polarized in a linear polarization substantially parallel to the circuit horizontal direction. The method includes detecting reflected light from the portion of the IC, producing a relative movement between the focused light spot and the IC to allow the focused light to illuminate different portions of the IC, obtaining an image of the IC using signals of the reflected light detected from different locations of the integrated circuit, and detecting IC features in the image.

Abstract: Light from a light source device is polarized through a polarizer and is caused to impinge obliquely onto an object to be inspected. The resulting scattered light is received by a CCD imaging device having an element for separating scattered polarized light disposed in a dark field. Component light intensities are worked out for an obtained P-polarized component image and an obtained S-polarized component image and a polarization direction is determined as a ratio of them. The component light intensities and the polarization directions are determined from images obtained by imaging of the light scattering entities in a state where static stress is not applied to the object to the inspected and in a state where static load is applied thereto so as to generate tensional stress on the side irradiated by light. The component light intensities and the polarization directions are compared with predetermined threshold values.

Abstract: Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.

Abstract: Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.

Abstract: A system that incorporates teachings of the present disclosure may include, for example, a method for generating from a light source a light signal operating in a region of the light spectrum, modifying the light signal with a first polarization device having a first polarization state to generate a polarized light signal directed to a target, modifying a substantially specular reflection and a substantially diffused reflection of the polarized light signal generated from the target with a second polarization device having a second polarization state to generate mixed polarized light signals having a mixed polarization state, and adjusting the mixed polarization state to modify an observable range of subsurfaces of the target. Other embodiments are disclosed.

Abstract: Representative implementations of devices and techniques provide selectivity for imaging devices and systems. Polarization may be applied to emitted light radiation and/or received light radiation to select a desired imaging result. Using polarization, an imaging device or system can pass desired light radiation having desired information and reject unwanted or stray light radiation.

Abstract: A position detection system is able to detect the three dimensional position of at least one target (10). Each target (10) is configured to act as a retro-reflector for light incident from any direction. At least one light emitter illuminates the at least one target (10) and at least one detector (24) is provided for detecting and taking measurements of light retro-reflected from a target (10). There is also provided a processor for processing measurements taken by each detector (24) to determine the three dimensional position of the at least one target (10).

Abstract: An optical inspection system suitable for inspecting a thin film is provided, in which a computer controls a controller to rotate angles of at least two of a polarization device, a phase compensation device and an analyzer at various incident wavelengths and incident angles of a light source, such that the intensities of a first image corresponding to the incident wavelengths and the incident angles of the light source are zero. The computer further records the rotated angles of at least two of the polarization device, the phase compensation device and the analyzer and intensities of a second image corresponding to the incident wavelengths and the incident angles when the intensities of the first image are zero, thereby obtaining a profiling diagram and a maximum intensity of the second images, in which the maximum intensity corresponds to a maximum grey level.

Abstract: An inspection system includes: an automated optical inspection device detecting a defect of an inspection object by using a light; a scanning electron microscope device for inspecting the defect of the inspection object by using an electron beam and including a vacuum chamber; a stage positioned below and spaced from the scanning electron microscope device and supporting the inspection object; and a transferring device connected to the scanning electron microscope chamber and the automated optical inspection and transferring the scanning electron microscope device and the automated optical inspection device to positions over the stage. Air is in a gap between the chamber and the inspection object. Accordingly, an inspection object of a large size may be inspected for analysis without damage to the inspection object.

Abstract: Methodology for determining uncertainty in a data set which characterizes a sample involving elimination of the influence of sample alteration drift caused by data set acquisition, and/or elimination of the influence of system drift during data acquisition.

Abstract: An analysis device is provided with an optical element having a structure in which the end portions of the upper surface and the lower surface of second metal layers are capable of having contact with a measurement object, and hotspots are exposed on the element surfaces. Therefore, it is easy for the substance that is the analysis object to be located at the hotspot. Further, since a first metal layer is disposed in the vicinity of the second metal layers, a resonance effect of a localized surface plasmon and a propagating surface plasmon can be generated. Therefore, the enhancement degree of light based on the plasmon is extremely high, and it is possible to analyze the substance with extremely high sensitivity.

Abstract: A sensor apparatus includes an irradiation system with a light source configured to emit linearly polarized light of a first polarization direction onto a sheet-like object, in a direction oblique to a direction orthogonal to a surface of the object, a first photodetector arranged on an optical path of light that is emitted from the irradiation system and then is reflected at the object by regular reflection, a first optical element, arranged on an optical path of light reflected by diffuse reflection from an incidence plane of the object, configured to transmit linearly polarized light of a second polarization direction that is orthogonal to the first polarization direction, a second photodetector configured to receive light that has passed through the first optical element, and a detection unit configured to detect at least one of basis weight and thickness of the object.

Abstract: An optical sensor is disclosed. The optical sensor includes an irradiating system which irradiates a linearly polarized light; a first photodetecting system including a first photodetector which is arranged on an optical path of a light which is specularly reflected from a subject; a second photodetecting system including an optical element which is arranged on an optical path of a light which is diffuse reflected from the subject within an incident face in the subject and which separates a linearly polarized component in a second polarizing direction which is orthogonal to a first polarizing direction and a second photodetector which receives a light separated by the optical element, wherein an angle of taking in the light in the first photodetector and an angle of taking in the light in the second photodetector are mutually different.

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract: There is provided an inspection apparatus which inspects a substrate supporting portion configured to support a substrate during an exposure performed by an exposure apparatus. The apparatus includes: a irradiation unit configured to irradiate, with an illumination light beam, a surface of the substrate on which a pattern has been formed by an exposure by the exposure device; a detecting unit configured to detect reflected light from a pattern in the irradiated surface; a focusing state computation unit connected to the detection unit and configured to determine a focusing state of the pattern of the substrate, based on a detection result of the reflected light beam detected by the detection unit; and an inspection unit connected to the focusing state computation unit and configured to inspect the substrate supporting portion based on the focusing state determined by the focusing state computation unit.

Abstract: A system for a laser-scanning microscope includes an optical element configured to transmit light in a first direction onto a first beam path and to reflect light in a second direction to a second beam path that is different from the first beam path; a reflector on the first beam path; and a lens including a variable focal length, the lens positioned on the first beam path. The lens and reflector are positioned relative to each other to cause light transmitted by the optical element to pass through the lens a plurality of times and in a different direction each time. In some implementations, the system also can include a feedback system that receives a signal that represents an amount of focusing of the lens, and changes the focal length of the lens based on the received signal.

Abstract: A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light.

Abstract: A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.

Abstract: A resonant optical cavity ellipsometer system is provided. The system can be used to conduct time-dependent arid sensitive measurement of ellipsometric parameters of matter. In a particular use, the system can provide time resolution of better than 1 microsecond. In a particular implementation, matter can be probed within the evanescent wave generated by intra-cavity total reflection.

Abstract: A sensor device is disclosed, including a database, and a processing apparatus. The database includes, for multiple different first types of objects, a first output data which are output data of an optical system acquired beforehand for each of the first objects in a case in which a surface of one side of the first object is set as the detection surface; and a second output data which are output data of the optical detection system acquired beforehand for each of the first objects in a case in which a surface of an other side opposite to the one side of the first object is set as the detection surface. The processing apparatus matches measurement data with the database, the measurement data being the output data of the optical detection system which is acquired with respect to a second object, and determines a type of the second object.

Abstract: The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator; a Smith-Purcell cell; a free electron laser, or an FTIR source and a solid state device; and a detector such as a Golay cell; a bolometer or a solid state detector; and preferably including at least one odd-bounce polarization state image rotating system, and optionally including a polarizer, at least one compensator and/or modulator, in addition to an analyzer.

Abstract: A sample support structure comprising a sample support manufactured from a semiconductor material and having one or more openings therein. Methods of making and using the sample support structure.

Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.

Abstract: Described are methods and systems for vicarious polarimetric calibration and performance validation of a remote sensor. The system includes a plurality of reflective mirrors configured and arranged to reflect radiation from a source of radiation onto the remote sensor with accurately known polarimetric properties. Each of the reflective mirrors are located so that the target images do not overlap. The remote sensor is configured to receive the radiation reflected from the plurality of reflective mirrors and store the received radiation as image data (e.g., the image of each mirror appears as a point target). The system includes a processor configured to process the received data to provide direct calibration and performance validation for each polarimetric or spectral channel of the remote sensor. In addition, the calibration method removes all atmospheric effects except for transmittance and provides reference targets that have high polarimetric contrast, full spectrum performance and easy to deploy.

Abstract: A polarimetric measurement device and method with microscopic resolution include a polarization conversion device to modify the polarization of a beam so as to switch from a spatially uniform distribution to a distribution that is cylindrically symmetric about the optical axis, and vice versa. The conversion device is positioned on the axis of a focusing objective for focusing the cylindrically symmetric polarized beam onto the surface of a sample to be measured. The device may be incorporated into a microellipsometer, or an interference contrast microscope, or used as a polarimetric accessory for a microscope.

Abstract: The present invention provides a prism. The prism includes a lower surface, an upper surface, a first side surface and a second side surface. The first side surface and the second side surface are disposed between the upper surface and the lower surface. The first side surface and the second side surface of the prism are one-dimensional parabolic surfaces. The lower surface is used to receive light. The first side surface is used to reflect the light from the lower surface to the upper surface. The second side surface is used to reflect the light from the upper surface to the lower surface for further analysis in the process unit afterwards.

Abstract: Provided herein is an apparatus, including at least two photon emitters, each with a preselected polarization orientation, and configured to emit polarized photons onto a surface of an article, and a processing means configured to process photon-detector-array signals corresponding to photons scattered from surface features of the article, and generate one or more surface features maps for the article from the photon-detector-array signals corresponding to the photons scattered from the surface features of the article.

Abstract: A localized surface plasmon resonance (LSPR) sensing system with anisotropic particles is revealed. The anisotropy of nanoparticles spectrally splits the phase spectra of two perpendicular polarizations thus inducing a phase difference between the two polarizations. An apparatus of ellipsometry is used to measure the phase difference. The simulated results demonstrate that the full width at the half maximum of the spectrum of phase difference is much narrower than the spectrum of transmittance. Therefore the figure of merit is dramatically increased and the performance of the refractive index sensor is improved.

Abstract: A localized surface plasmon resonance (LSPR) sensing system with particles arranged in anisotropic periodic manner is revealed. The anisotropy of the nanoparticle array spectrally splits the phase spectra of two perpendicular polarizations thus inducing a phase difference between the two polarizations. An apparatus of ellipsometry is used to measure the phase difference. The simulated results demonstrate that the full width at the half maximum of the spectrum of phase difference is much narrower than the spectrum of transmittance.