Abstract: The temperature measuring apparatus includes a data input portion, a peak interval calculation portion, an optical path length calculation portion, and a temperature calculation portion. The data input portion inputs a spectrum of interference light that is obtained when measuring light is irradiated onto a surface of the object and the measuring light reflected from the surface and the measuring light reflected from a rear surface interfere with each other. The peak interval calculation portion calculates a peak interval of the input spectrum. The optical path length calculation portion calculates an optical path length based on the peak interval. The temperature calculation portion calculates the temperature of the object based on the optical path length.

Abstract: The temperature measuring system using optical interference includes a light source which generates measuring light; a spectroscope which measures an interference intensity distribution that is an intensity distribution of reflected light; optical transfer mechanisms which emit light reflected from a surface and a rear surface of the object to be measured to the spectroscope; an optical path length calculation unit which calculates an optical path length by performing Fourier transformation; and a temperature calculation unit which calculates a temperature of the object to be measured on the basis of a relation between optical path lengths and temperatures. The light source has a half-value and half-width of a light source spectrum that satisfies conditions based on a wavelength span of the spectroscope. The spectroscope measures the intensity distribution by using the number of samplings that satisfies conditions based on the wavelength span and a maximum measurable thickness.

Abstract: An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates.

Abstract: A method for characterizing a surface comprises rotating a carrier about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer with a major surface of the wafer extending generally transverse to the axis of rotation. A surface characterization tool is moved over a plurality of positions relative to the top surface of the carrier, where a measurement location over the top surface of the carrier is changed while said top surface of the carrier is heated to a predetermined temperature. Characterization signals over the plurality of positions with the surface characterization tool are produced and contain information about the heated top surface of the carrier, or when semiconductor wafers are held on the carrier, information about the semiconductor wafer can also be obtained.

Abstract: A regulation system for a compressor comprises a fiber-optic lattice sensor which makes it possible to determine a flow temperature of a fluid to be compressed by means of the compressor. Another aspect of the invention relates to a use of a fiber-optic Bragg lattice sensor as a temperature sensor in a regulation system.

Abstract: A temperature sensor, capable of operating in electromagnetic and/or electric environments such as electrical generators, motors and transformers and/or in environments where vibratory conditions are frequent or continuous, contains at least one light emitting optic fiber and one light receiving optic fiber and an electrically non-conductive dilatable object which variably occults the emitted light as the object's temperature varies. The light receiving optic fiber transmits light intensity and light intensity changes to an electronic device that may include a photometer and light-to-temperature computing equipment.

Abstract: A measuring device is provided for measurement of parameters, in particular for measuring the temperature, in molten masses, in particular in molten metal or molten cryolite masses having a melting point above 500° C. The measuring device has an optical fiber for receiving radiation from the molten mass and a cable reel having an external circumference for winding up the optical fiber and an internal space surrounded by the external circumference. A distributor and a mode filter for the optical fiber are arranged in the internal space.

Abstract: A linear array fiber-optic temperature sensor based upon fluorescence-decay technology allows for optical cabling to employ multiple, individually optically addressed optical fibers with sensing tips located in a single sensing tube. The sensing tips are arranged with a pre-determined, fixed relative spacing to form a linear array of temperature measurement points. Multiple such linear array sensors may be further arranged.

Abstract: An imaging temperature sensing system having at least one imaging component and at least one temperature sensing component, thus providing means for implementing temperature sensing and imaging within a single device.

Abstract: A method and apparatus are disclosed that reduces variation in radiation therapy treatment planning among plurality of users within the same or different geographic locations. The system includes a method and an apparatus that provide users with the knowledge information and utilizing the knowledge information to contour target volumes for radiation treatment planning. The mode of operation includes utilizing a stand-alone workstation or a server computer connected to the plurality of thin client workstations.

Abstract: A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes an attenuator that attenuates the reference beam reflected from the reference beam reflector to thereby make an intensity thereof closer to an intensity of the measurement beam reflected from the temperature measurement object.

Abstract: The systems and methods described herein provide for fast and accurate image segmentation through the application of a multi-stage classifier to an image data set. An image processing system is provided having a processor configured to apply a multi-stage classifier to the image data set to identify a distinctive region. The multi-stage classifier can include two or more component classifiers. The first component classifier can have a sensitivity level configured to identify one or more target regions in the image data set and the second component classifier can have a specificity level configured to confirm the presence of the distinctive region in any identified target regions. Also provided is a classification array having multiple multi-stage classifiers for identification and confirmation of more than one distinctive region or for the application of different classification configurations to the image data set to identify a specific distinctive region.

Abstract: A method of improving sampling resolution in a distributed temperature measurement system using a fiber optic distributed sensor by means of programmed delayed trigger signals to a laser light source in order to improve the spatial resolution of such systems.

Abstract: Methods and apparatus for wafer temperature measurement and calibration of temperature measurement devices may be based on determining the absorption of a layer in a semiconductor wafer. The absorption may be determined by directing light towards the wafer and measuring light reflected from the wafer from below the surface upon which the incident light impinges. Calibration wafers and measurement systems may be arranged and configured so that light reflected at predetermined angles to the wafer surface is measured and other light is not. Measurements may also be based on evaluating the degree of contrast in an image of a pattern in or on the wafer. Other measurements may utilize a determination of an optical path length within the wafer alongside a temperature determination based on reflected or transmitted light.

Abstract: A method for monitoring the operating conditions of an electric generator including the entire stator core and all winding components for conditions of mechanical strain and temperature throughout the machine by means of distributive fiber optic sensors based on both Rayleigh back scattering techniques and Brillouin frequency shift fiber optic sensor analysis both of which do not have the gaps and limitations associated with standard fiber Bragg grating fiber optic point sensors, by virtue of the fact that both Rayleigh and Brillouin scans and allow accurate strain and temperature determinations at all points along standard fiber optic cables of considerable length, approximately two kilometers in the case of the Brillouin, which effectively yields many tens of thousands of sensors throughout the entire standard fiber optic cable. Raman distributive temperature sensing also has a limited application.

Abstract: Silicon Carbide (SiC) probe designs for extreme temperature and pressure sensing uses a single crystal SiC optical chip encased in a sintered SiC material probe. The SiC chip may be protected for high temperature only use or exposed for both temperature and pressure sensing. Hybrid signal processing techniques allow fault-tolerant extreme temperature sensing. Wavelength peak-to-peak (or null-to-null) collective spectrum spread measurement to detect wavelength peak/null shift measurement forms a coarse-fine temperature measurement using broadband spectrum monitoring. The SiC probe frontend acts as a stable emissivity Black-body radiator and monitoring the shift in radiation spectrum enables a pyrometer. This application combines all-SiC pyrometry with thick SiC etalon laser interferometry within a free-spectral range to form a coarse-fine temperature measurement sensor.

Abstract: Methods and apparatus are provided to determine the emissivity, temperature and area of an object. The methods and apparatus are designed such that the emissivity and area of the object may be separately determined as functions dependent upon the temperature of the object derived from a three or more band infrared measurement sensor. As such, the methods and apparatus may only require a regression analysis of the temperature of the object without any regression analysis of the emissivity and area of the object.

Abstract: The invention is a system for monitoring a plurality of cold cases located in a retail food establishment. The system employs a wireless mesh network, which uses monitoring computers in communication with the cold cases for sending temperature data to a master control computer located in a retail establishment, by the most efficient route, even if the most efficient route is first through a second monitoring computer and secondly to the main computer. The invention also employs an inventive microprocessor-controlled temperature monitoring and display device which mounts on each cold case and which emits various colored lights to serve as a visible indicator of the temperature condition of a cold case. The emitted, colored, light is visible from both the front and side of the display device, which allows untrained store personnel to readily determine the temperature condition of a cold case by referring to a color coding chart.

Abstract: A materials processing system comprises a thermal processing chamber including a heating source, a first noncontacting thermal measurement device positioned to measure temperature on a first area of the material being processed, and, a second noncontacting thermal measurement device positioned to measure temperature on a second area of the material being processed, the first device being relatively more sensitive to changes in surface emissivity than the second device. By comparing the outputs of the two devices, emissivity changes can be detected and used as a proxy for some physical change in the workpiece and thereby determine when the desired process has been completed. The system may be used to develop a process recipe, or it may be part of a system for real-time process control based on emissivity changes. Applicable processes include heating, annealing, dopant activation, silicide formation, carburization, nitridation, sintering, oxidation, vapor deposition, metallization, and plating.

Abstract: The present invention provides a dual-probe thermally compensated fluorescence decay rate temperature sensor capable of measuring the true temperature of a sample surface and its associated method of use.

Abstract: The invention relates to a method for optically monitoring the progression of a physical and/or chemical process taking place on a surface of a body in which the surface radiation which emanates from part of the surface during the physical and/or chemical process, is measured with the aid of a measuring device, in particular a sensor. In order to develop a method of this kind such that sintering processes can also be monitored in a firing furnace having thermal radiation equilibrium, the invention proposes to emit the radiation (14) having a radiation spectrum that differs from the surface radiation, to the surface (10) by means of a radiation source (15) and to measure the radiation with the aid of a measuring device (16).

Abstract: A method and apparatus for measuring the insertion loss of a fiber optic connection is provided. The invention generally comprises a light source providing light to a test connector which contains a juncture of two fiber optic cables. The test connector has one or more opaque portions surrounding the fiber optic juncture. A pyrometer or other heat detection means is then used to measure any temperature increase as a result of light scattered into the opaque portions of the test connector.

Abstract: The invention relates to a method and a device for sintering objects by means of time-resolved detection of two- or three-dimensional surface profiles and, optionally, by means of temperature measurement in a high temperature furnace on the basis of optical measurement methods. During sintering, each surface point on an object can be measured for its position and, optionally, its temperature, and a change can be determined by successive measurements. The measured change additionally permits control of the sintering regime. The method comprises the steps of: placing an object 4 into a high temperature furnace 5; heating the furnace 5; generating a two- or three-dimensional surface profile at least of a subregion of the object 4 by: irradiating the object 4 with light from a light source 2a; detecting the light scattered by the object 4 with the aid of a detector 2b; determining the geometric surface profile from the detected light.

Abstract: The present invention provides a dual-probe thermally compensated fluorescence decay rate temperature sensor capable of measuring the true temperature of a sample surface and its associated method of use.

Abstract: Methods and systems are provided for monitoring a solid-liquid interface, including providing a vessel configured to contain an at least partially melted material; detecting radiation reflected from a surface of a liquid portion of the at least partially melted material that is parallel with the liquid surface; measuring a disturbance on the surface; calculating at least one frequency associated with the disturbance; and determining a thickness of the liquid portion based on the at least one frequency, wherein the thickness is calculated based on L = f 2 ? w 2 g , where g is the gravitational constant, w is the horizontal width of the liquid, and f is the at least one frequency.

Abstract: A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

Abstract: A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.

Abstract: A calorimeter is provided for measuring a quantity of heat. The calorimeter has a liquid constrained so as to allow expansion of the liquid solely in one dimension along a single axis such that liquid expansion may be measured on the basis of light impinging along the single axis of liquid expansion by means of a non-contact displacement transducer. Interferometric optical means for remote measurement of multiple microcalorimeters permits parallel monitoring of multiple chemical reactions and the performance of parallel biochemical assays.

Abstract: Temperature measurement using a pyrometer in a processing chamber is described. The extraneous light received by the pyrometer is reduced. In one example, a photodetector is used to measure the intensity of light within the processing chamber at a defined wavelength. A temperature circuit is used to convert the measured light intensity to a temperature signal, and a doped optical window between a heat source and a workpiece inside processing chamber is used to absorb light at the defined wavelength directed at the workpiece from the heat source.

Abstract: To detect a wavelength drift of laser light with no error, an optical transmission module (10) includes: a laser diode (20); a laser temperature calculation section (52) for detecting the temperature of the laser diode (20) that monotonously increases with respect to a wavelength of the laser light; a wavelength calculation section (44) for detecting a transmittance of the laser light incident on an etalon filter (36) whose transmittance periodically varies with respect to the wavelength of the incident light, and a laser wavelength corresponding to the transmittance; and a wavelength error obtaining section (54) for detecting a wavelength error (wavelength drift), from a target wavelength, of the laser light output from the laser diode (20), based on the temperature detected by the laser temperature calculation section (52) and the laser wavelength detected by the wavelength calculation section (44).

Abstract: A method and apparatus for measuring the insertion loss of a fiber optic connection is provided. The invention generally comprises a light source providing light to a test connector which contains a juncture of two fiber optic cables. The test connector has one or more opaque portions surrounding the fiber optic juncture. A pyrometer or other heat detection means is then used to measure any temperature increase as a result of light scattered into the opaque portions of the test connector.

Abstract: Methods and apparatus allowing distributed temperature sensing (DTS) measurements to be compensated for differential and/or varying loss between Raman Stokes and anti-Stokes signals are provided. By irradiating an optical waveguide with signals at wavelengths at or near the Raman Stokes and anti-Stokes bands, a distributed loss profile for the waveguide may be generated. This distributed loss profile may be used to adjust the amplitudes or amplitude ratios of Raman Stokes and anti-Stokes signals used in DTS measurements, which may lead to more accurate DTS profiles.

Abstract: This invention relates to an optical power monitor based on thermo-chromic material. The incident light produces a temperature change in the thermo-chromic material, causing a change in its color which is utilized to monitor the power level of the incident light.

Abstract: Methods and apparatus for wafer temperature measurement and calibration of temperature measurement devices may be based on determining the absorption of a layer in a semiconductor wafer. The absorption may be determined by directing light towards the wafer and measuring light reflected from the wafer from below the surface upon which the incident light impinges. Calibration wafers and measurement systems may be arranged and configured so that light reflected at predetermined angles to the wafer surface is measured and other light is not. Measurements may also be based on evaluating the degree of contrast in an image of a pattern in or on the wafer. Other measurements may utilize a determination of an optical path length within the wafer alongside a temperature determination based on reflected or transmitted light.

Abstract: An apparatus (10) for measuring temperature using luminescence thermometry, comprising: a photon emitter (42) for providing photons (3) of at least a first frequency; photoluminescent material (30) that produces photons (5) of at least a second frequency in response to the incidence of photons (3) of the first frequency; one or more photon receivers (44); and an optically dispersive element (50) for directing photons (5) of at least a second frequency produced by the photoluminescent material (30) into the photon receiver(s).

Abstract: A thermal imaging apparatus comprises a housing defining an entrance pupil for ingress of imaging radiation. At least one light sensor is positioned forward of the entrance pupil. An electronic imaging device such as a focal plane array is located in the housing rearward of the entrance pupil for converting imaging radiation to electrical signals for further processing. The apparatus further includes a shutter having an open position and a closed position. In the closed position, the shutter is located between the entrance pupil and the electronic imaging device so as to inhibit exposure of the electronic imaging device to incident radiation. Circuitry is provided for selectively operating the shutter to be in the closed position based on signals produced at the light sensor.

Abstract: The invention provides an apparatus for measuring the temperature of a molten bath comprising a) a refractory mounting sleeve (1,1?) having an outer surface (2) for contacting the molten bath and an inner cavity (3), said inner cavity having an inner surface (4), an outer opening (6) and an inner closed end (5); and b) an optical pyrometer (7) attached to the mounting sleeve and adapted to measure the thermal radiation emitted by a measurement zone (10) located inside the inner cavity of the mounting sleeve and under the molten bath level. The inner cavity outer opening (6) is adapted to receive fixedly the optical pyrometer (7). The apparatus is characterized in that the mounting plate (8) is adapted to engage in a complementary recess located at the inner cavity outer opening (6) of the mounting sleeve (1,1?). Thereby, the accuracy and reproducibility of the measure is greatly increased.

Abstract: A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

Abstract: Disclosed is a method of forming an optical monitoring or transmitting light guide and a resulting apparatus that begins by bonding a bundle of optical fibers together using an epoxy and polishing the distal end of the bundle of optical fibers to create an optical aperture. The ratio of fiber size to binder particulate size of the epoxy used in the bonding process is sufficient to maintain the integrity of the bundle of optical fibers during the polishing of the distal end. The method positions the bundle of optical fibers into a protective sheath and a connector. The coefficient of thermal expansion of the epoxy used in the bonding process matches that of the connector. Once assembled, the invention positions the connector through the opening in the surface of a device, such that the distal end of the bundle of optical fibers is either recessed in, substantially flush with, or extends from the surface of the device through which the connector extends, depending on field-of-view requirements.

Abstract: A method is provided for measuring a temperature of a molten metal bath by an optical fiber surrounded by a cover. The optical fiber is immersed in the molten bath, and the radiation absorbed by the optical fiber in the molten bath is fed to a detector, wherein the optical fiber is heated when immersed in the molten bath. The heating curve of the optical fiber has at least one point P(t0, T0), wherein the increase ?T1 in the temperature T of the optical fiber over the time ?t in a first time interval t0??t up to the temperature T0 is smaller than the increase ?T2 in the temperature of the optical fiber over the time ?t in an immediately following second time interval t0+?t.

Abstract: A method for the determination of characteristic layer parameters by means of spectral-optical measurements, that allow for precise measurements of the sample temperature even under the conditions of industrial growth processes and furthermore avoids the detection of thermal radiation and reflected radiation by means of twofold phase sensitive frequency modulation by using so called chopper and lock-in amplifier respectively. The wobbling and/or rotating of the sample to be measured is compensated and/or the pyrometer optical path and the optical path of the spectral-optical system are guided separately of each other and/or a separation of the radiation signal for the temperature measurement and the radiation signal for the spectral-optical measurement is implemented by blanking of the irradiated light.

Abstract: An electronically surveying apparatus of the present invention includes a storing portion for storing positional information of a surveying apparatus body and design data; an angle-measuring portion for electronically measuring an angle between a reference direction and an aimed direction; an arithmetic processing portion for obtaining a model of an expected arrangement at completion of an object which is expected to be seen from the surveying apparatus body in the aimed direction by calculation, based on the angle measured by the angle-measuring portion and the design data; and a displaying portion for displaying the model of the expected arrangement at completion of the object.

Abstract: An apparatus for continuously monitoring a photopolymerization reaction in real time by optical pyrometry includes a housing having a chamber; a sample mount that may be disposed within the chamber; a light source for supplying light to induce a photopolymerization reaction in a monomer sample disposed on the sample mount; and an optical pyrometer that may be attached to the housing for measuring temperature of the monomer sample. The temperature of the sample with respect to time is used to monitor progress of the reaction. Another apparatus for monitoring a photopolymerization reaction combines optical pyrometry and infrared spectroscopy. The apparatus includes a sample mount disposed in a beam of an infrared spectrometer a light source for supplying light to induce a photopolymerization reaction in a monomer sample disposed on the sample mount and an optical pyrometer for measuring temperature of the monomer sample.

Abstract: A pyrometer having at least two detectors and at least two band-pass filters near each to limit the detectable wavelength band emitted by an object, and a device to exchange their filters to eliminate detector output ratio errors. The detector output ratio is then used to derive the color temperature of the object, which may have fast changes in emission intensity output.

Abstract: An emissivity probe for measuring reflected energy from interior wall surfaces of large scale boilers. The emissivity probe uses a pair of light guides which respectively receive light energy from the interior of the boiler and that reflected off a wall surface. Using appropriate photo detectors sensitive to a desired light wavelength range, a ratio of the reflected and incident radiation is provided. This provides a measure of the reflectivity of the wall surface. The reflectivity values are used to control boiler cleaning systems.

Abstract: This invention relates to metallocene compositions and their use in the preparation of catalyst systems for olefin polymerization, particularly propylene polymerization.

Abstract: A method is provided wherein a temperature reading error of a pyrometer is avoided. An upper pyrometer is used to detect infrared radiation from a test layer formed on a test substrate under standard processing conditions. The infrared radiation from the test layer has a period having a length which is indicative of growth rate of the layer. The period is generally inversely proportional to the growth rate. The growth rate is directly related to the temperature.

Abstract: A lamp house storing a plurality of flash lamps and a chamber storing and holding a semiconductor wafer are fitted to each other in an openable/closable manner. The lamp house and the chamber are fixed to a closed state with male screws. In order to process a semiconductor wafer, a shutter plate is drawn out to open an irradiation window. In this state, the shutter plate shields a space located above the male screws so that the male screws cannot be detached for opening the lamp house and the chamber. In order to open the lamp house and the chamber, the shutter plate must be inserted for shielding the irradiation window while opening the space located above the male screws. Thus, a thermal processing apparatus capable of preventing the lamps from breaking during maintenance thereof is provided.

Abstract: It is the object of the invention to provide a method for the determination of characteristic layer parameters by means of spectral-optical measurements, that allow for precise measurements of the sample temperature even under the conditions of industrial growth processes, i.e. wobbling samples and/or fast changes between sample carrier and sample and furthermore avoids the detection of thermal radiation and reflected radiation by means of twofold phase sensitive frequency modulation by using so called chopper and lock-in amplifier respectively several pyrometer.

Abstract: A pyrometer having at least two detectors and at least two band-pass filters near each to limit the detectable wavelength band emitted by an object, and a device to exchange their filters to eliminate detector output ratio errors. The detector output ratio is then used to derive the color temperature of the object, which may have fast changes in emission intensity output.