Abstract: A light control film is described comprising alternating transmissive regions and absorptive regions disposed between a light input surface and a light output surface. The absorptive regions have an aspect ratio of at least 30. In some embodiments, the alternating transmissive regions and absorptive regions have a transmission as measured with a spectrophotometer at a viewing angle of 0 degrees of at least 35, 40, 45, or 50% for a wavelength of the range 320-400 nm (UV) and/or at least 65, 70, 75, or 80% for a wavelength of the range 700-1400 nm (NIR). In another embodiment, the absorptive regions block light at the light input surface and light output surface and the maximum surface area that is blocked is less than 20% of the total alternating transmissive regions and absorptive regions. Also described are various optical communication systems comprising the light control films described herein and methods.

Abstract: A laser module is provided and includes a laser unit, a focusing lens, an electric device, and a temperature control device. The laser unit is configured to emit a laser light. The focusing lens corresponds in position to the laser unit, and the focusing lens is configured to converge the laser light emitted from the laser unit so as to outwardly output the laser light. The electric device includes a focusing ring, a voice coil motor, and a motor base. The voice coil motor is configured to drive and move the focusing lens in a straight line toward or away from the laser unit with the focusing ring. The temperature control device is mounted on the laser unit and includes a thermoelectric cooling module and a thermistor. The thermoelectric cooling module is configured to cooperate with the thermistor to adjust a working temperature of the laser unit.

Abstract: An edge position detecting apparatus for detecting a position of an edge of a disk-shaped workpiece includes a chuck table having a holding surface for holding the workpiece thereon, a laser displacement gage having a laser applying unit including a light source, for applying a linear laser beam shaped into a linear shape perpendicular to a direction of travel from the light source toward the holding surface, across the edge of the workpiece, and a beam detecting unit including a plurality of photoelectric transducers arrayed at predetermined spaced intervals along a direction for detecting a reflection of the linear laser beam, a moving mechanism for moving the laser displacement gage and the chuck table relatively to each other along the longitudinal direction, and a calculating unit for calculating the position of the edge on the basis of information of a change in an amount of the detected reflection.

Abstract: A spindle arrangement for a machine tool comprising a spindle housing, which can be inserted and fixed in the machine tool, a spindle shaft being accommodated in the spindle housing, and a spindle head projecting from the spindle housing. At least one optical element is located on or near the spindle head, the optical element emits light in the region of the spindle head and/or to optically capture the region near the spindle head. At least one recess is provided on or near the spindle head, the optical element being insertable into the recess. The optical element is provided with at least two contacts arranged on the front face on different radial levels or in different axial regions relative to the screw axis on the end of the optical element which is screwed into the recess.

Abstract: A surveying instrument includes a distance measuring unit which irradiates an object with the distance measuring light and measures a distance to the object based on the reflected distance measuring light from the object, wherein the distance measuring unit includes a distance measuring light projecting module configured to project the distance measuring light and a distance measuring light receiving module configured to receive the reflected distance measuring light, the distance measuring light receiving module includes a dichroic prism and a light receiving module, and the dichroic prism is configured in such a manner that the reflected distance measuring light is internally reflected in the dichroic prism at least three times and then received by the light receiving module.

Abstract: Disclosed is a system, method, and devices as system elements to recognize an object by an object recognizing system including an imaging device and a moving assembly to move the imaging device around the object, to form a certified visual model of the object to be recognized. Especially the disclosure relates to gemstone imaging by an imaging method including photographing a target, in an illumination, by a camera, to obtain at least one image of the targeted object to be recognized.

Abstract: An apparatus, system, and method for performing an efficient luminescence measurement are disclosed. The apparatus comprises a nozzle for dispensing a luminescent reagent into a well W in a microplate M, a luminescence measurement unit for measuring luminescence occurring in the well W caused by mixing of the luminescent reagent and a specimen, and a stage (moving unit) for moving the nozzle and the luminescence measurement unit together vertically and horizontally, wherein the nozzle is secured to the stage and the luminescence measurement unit is mounted to be movable vertically with respect to the stage through a holder and springs interposed between the luminescence measurement unit and the holder.

Abstract: A system includes a laser displacement sensor which is provided on a shoulder of a roadway, emits a laser beam which scans a roadway space in a height direction thereof, receives a beam reflected by an object which is present in the roadway space, and measures a distance up to a reflection point on the object, at which the laser beam was reflected; and a vehicle window detection device that detects a window of the vehicle based on the distance measured by the laser displacement sensor. The vehicle window detection device detects the window of the vehicle based on a change in a distance in a horizontal direction from the laser displacement sensor to the reflection point after the vehicle in the roadway space was detected.

Abstract: This disclosure presents systems and methods to adapt an interactive experience based on user height. Presence of a beacon within a real-world environment may be detected. A set of vertical displacements between the beacon and a presentation device installed on a head of a user may be determined over a period of time. An average vertical displacement may be determined from the set of vertical displacements. A value of a height dimension of a virtual object may be specified based on the average vertical displacement.

Abstract: This document describes a method of determining an overlay error during manufacturing of a multilayer semiconductor device. Manufacturing of the semiconductor device comprises forming a stack of material layers comprising depositing of at least two subsequent patterned layers of semiconductor material, the patterned layers comprising a first patterned layer having a first marker element and a second patterned layer having a second marker element. The determining of the overlay error comprises determining relative positions of the first and second marker element in relation to each other, such as to determine the overlay error between the first patterned layer and the second patterned layer. In addition an imaging step is performed on at least one of said first and second patterned layer, for determining relative positions of the respective first or second marker element and a pattern feature of a device pattern comprised by said respective first and second patterned layer.

Abstract: A system for contactless measurement of circular geometrical parameters of a turbine engine component, comprising a contactless measurement module comprising a support, having a fixed position, for supporting the turbine engine component; an optical measurement device for transmitting a plurality of light beams onto at least the internal surface of the internal side wall, and for acquiring a plurality of reflections coming from the plurality of light beams, mechanically coupled to the support and comprising: an electronic conversion unit for converting a plurality of signals of the first optical sensor into a plurality of values of the plurality of circular geometrical parameters.

Abstract: An execution unit executes a derivation process of deriving an imaging position distance, on the basis of a plurality of pixel coordinates which are present in the same planar region as an irradiation position where the directional light is emitted on the real space and which are equal to or more than three pixels specifiable at positions corresponding to each other in respective first and second captured images, irradiation position real space coordinates, a focal length, and dimensions of imaging pixels, in a case where the position of a pixel specified by the irradiation position pixel coordinates is the position of a pixel different from a pixel which is specifiable at positions corresponding to each other in the respective first and second captured images.

Abstract: The invention relates to a system for determining the position of a test object comprising the following features: an autocollimation telescope having a beam source for emitting a beam; a beam splitter; a detector unit and an objective lens; and an optical element embodied as a focusing device, wherein the test object, the beam source and the focusing device are arranged along a common optical axis (z), and a control device for controlling the focusing device, which is designed in such a way that the beam can be focused onto a center of curvature of a first test surface of the test object with the coordinates (x1, y1) and at least onto a center of curvature of a second test surface of the test object with coordinates (x2, y2).

Abstract: An instrument and a method for the automated thermal treatment of liquid samples are disclosed. An inter-distance between a temperature-controlled receptacle for loading with a plurality of vessels for containing the samples and end portions of optical fibers can be varied, wherein the receptacle is configured to form a thermal communication with the loaded vessels and wherein the optical fibers have first and second end portions. The first end portion and the second end portion of each optical fiber is fixed with respect to each other for transmitting light, wherein the variation of the in-ter-distance allows the vessels to be loaded to or unloaded from the receptacle and to enable detection of light from the samples contained in the one or more receptacle-loaded vessels.

Abstract: The invention relates to an automatic response/light measurement device and a method therefor, and the purpose is to effectively and quickly perform an optical measurement relating to a reaction with high reliability without increasing a device size. The device is configured to have: a container group in which a plurality of reaction containers are arranged; a measurement mount provided with a plurality of coupling ends that are joinable with apertures of the reaction containers, and have light guide portions that optically connect with the interior of the joined reaction containers; a mount transfer mechanism; a measuring device having a measuring end having at least one light guide portion that is optically connectable to the light guide portions of the coupling ends, that is able to receive light based on an optical state within the reaction containers; an on-mount measuring end transfer mechanism; and a measurement control portion.

Abstract: A spectrophotometer in which a normal plane to a diffraction grating is inclined with respect to an optical axis of an incident light passing through a slit, the normal plane to the diffraction grating passing through an intersection point between the optical axis of the incident light i and a grating surface of the diffraction grating. The diffraction grating and a photodiode array PDA are placed such that the photodiode array PDA is parallel to the normal plane to the diffraction grating and that a normal plane to the photodiode array PDA includes a line that is symmetrical to the optical axis of the incident light i about the normal plane to the diffraction grating.

Abstract: The present invention generally relates to sub-diffraction limit image resolution and other imaging techniques, including imaging in three dimensions. In one aspect, the invention is directed to determining and/or imaging light from two or more entities separated by a distance less than the diffraction limit of the incident light. In some cases, the position of the entities can be determined in all three spatial dimensions (i.e., in the x, y, and z directions), and in certain cases, the position in all three dimensions can be determined to an accuracy of less than about 1000 nm. In some cases, the z positions may be determined using one of a variety of techniques that uses intensity information or focal information (e.g., a lack of focus) to determine the z position. Non-limiting examples of such techniques include astigmatism imaging, off-focus imaging, or multi-focal plane imaging.

Abstract: The present invention generally relates to sub-diffraction limit image resolution and other imaging techniques, including imaging in three dimensions. In one aspect, the invention is directed to determining and/or imaging light from two or more entities separated by a distance less than the diffraction limit of the incident light. In some cases, the position of the entities can be determined in all three spatial dimensions (i.e., in the x, y, and z directions), and in certain cases, the positions in all three dimensions can be determined to an accuracy of less than about 1000 nm. In some cases, the z positions may be determined using one of a variety of techniques that uses intensity information or focal information (e.g., a lack of focus) to determine the z position. Non-limiting examples of such techniques include astigmatism imaging, off-focus imaging, or multi-focal-plane imaging.

Abstract: An apparatus (10) for microlithographic projection exposure, which includes: an optical system (18) for imaging mask structures (16) onto a surface (21) of a substrate (20) by projecting the mask structures (16) with imaging radiation (13) onto an exposure area of the substrate surface, and various structure defining a measurement beam path (36) for guiding measurement radiation (34). The measurement beam path (36) extends within the optical system (18) such that the measurement radiation (34) impinges on a measurement area on the substrate surface that is offset from the exposure area.

Abstract: The present invention provides apparatus for a non-contact method of obtaining accurate three-dimensional measurements of a dry contact lens, more specifically, using dry lens metrology to know the exact thickness of a contact lens.

Abstract: Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

Abstract: A three-dimensional distance measuring method includes: projecting at least one beam set forming a projection plane onto a surface of an object, the beam set including multiple beams transmitted according to a predetermined first path function and linearly arranged to form detection points on the surface of the object; rendering the beams reflected by the surface of the object to pass through a focus of a focusing element to form a sense image on a photosensitive memory element; obtaining a corresponding second path function according to an image formation position of each beam on the photosensitive memory element and a position of the focus of the focusing element; and calculating an intersection position of each first path function and the corresponding second path function to obtain a spatial position of each detection point on the object.

Abstract: Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.

Abstract: An objective is to achieve a positional change measurement device which measures positional change of a dynamic measured surface by using speckle patterns while easily reducing influence of fluctuations in a measurement environment temperature. Provided is a positional change measurement device including: a light source; an illuminating optical system configured to guide light from the light source to a measured surface; an imaging optical system; an image pickup device configured to acquire a speckle pattern by receiving reflection light from the measured surface via the imaging optical system; and detected-length compensation means for compensating for fluctuations in a detected length caused by temperature fluctuations. Positional change of the measured surface is measured based on a result of cross-correlation computation performed on multiple speckle patterns acquired at predetermined time intervals.

Abstract: In a displacement detecting device, an objective lens condenses the outgoing light coming from a light source toward a surface-to-be-measured. The optical path of the reflected light coming from the surface-to-be-measured is separated from the optical path of the outgoing light coming from the light source by a separation optical system. The reflected light passing through the separation optical system is condensed by a collimator lens and has astigmatism generated therein by an astigmatism generator, and the reflected light in such a state is incident on a light receiving section. A position information generator generates the position information of the surface-to-be-measured using a focus error signal obtained based on the amount of light detected by the light receiving section.

Abstract: A vision measuring device includes: a camera which images a workpiece and transfers image information of the workpiece; a position control unit which controls an in-focus position of the camera and outputs the in-focus position as position information representing a position in a Z-axis direction; and a vision measuring machine which performs vision measurement on the workpiece based on image information and position information. The position control unit acquires and retains position information in response to a trigger signal output from the camera or the position control unit to the other at a certain timing of an imaging period during which the camera images the workpiece. The vision measuring machine calculates position information representing a position of image information in the Z-axis direction based on image information transferred from the camera and position information output from the position control unit, and performs auto-focusing control.

Abstract: The present invention provides an exposure apparatus including an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis.

Abstract: A vision measuring device includes: a camera which images a workpiece and transfers image information of the workpiece; a position control unit which controls an in-focus position of the camera and outputs the in-focus position as position information representing a position in a Z-axis direction; and a vision measuring machine which performs vision measurement on the workpiece based on image information and position information. The position control unit acquires and retains position information in response to a trigger signal output from the camera or the position control unit to the other at a certain timing of an imaging period during which the camera images the workpiece. The vision measuring machine calculates position information representing a position of image information in the Z-axis direction based on image information transferred from the camera and position information output from the position control unit, and performs auto-focusing control.

Abstract: A device for measuring movement of a mobile element moving in at least one direction, includes: a light source adapted to emit a light beam; at least one optical member intercepting the light beam and attached to the mobile element to track its movement; pixel type sensors capturing the transmitted beam determined by the relative position of the optical member relative to the light source, the pixels being disposed so that at least some of them receive illumination that varies with the position of the mobile element as it moves; a comparator module comparing the values obtained from the pixels of the sensors with two distinct thresholds in order to assign some of them a logic value; a calculation module determining the position of the mobile element from the data from the comparator module.

Abstract: The attenuation and other optical properties of a medium are exploited to measure a thickness of the medium between a sensor and a target surface. Disclosed herein are various mediums, arrangements of hardware, and processing techniques that can be used to capture these thickness measurements and obtain dynamic three-dimensional images of the target surface in a variety of imaging contexts. This includes general techniques for imaging interior/concave surfaces as well as exterior/convex surfaces, as well as specific adaptations of these techniques to imaging ear canals, human dentition, and so forth.

Abstract: A proximity detection system is described among devices in a unified communications network. A narrow beam LED and a diffuse beam LED, both located near a first object, such as a computer monitor, provide a light illumination pattern detected by a narrow beam light detector and a broad beam light detector, both located near a second device, such as a headset. A processor calculates the ratio of measured intensity from the narrow beam LED compared to the broad beam LED as measured by the broad beam detector to provide an estimate for how far off axis the second object (e.g., a user of the headset) is with respect to the centerline in front of the second object (e.g., the computer monitor). The processor also calculates the ratio of measured intensity of the narrow IR beam detector to the broad IR beam detector to provide an estimate of the second object's orientation (e.g., the headset user's head) with respect to the first object to determine if the second object is facing the first object.

Abstract: A system for inspecting a depth relative to a layer using a sensor with a fixed focal plane. A focus sensor senses the surface of the substrate and outputs focus data. In setup mode the controller scans a first portion of the substrate, receives the focus data and XY data, and stores correlated XYZ data for the substrate. In inspection mode the controller scans a second portion of the substrate, receives the focus data and XY data, and subtracts the stored Z data from the focus data to produce virtual data. The controller feeds the virtual data plus an offset to the motor for moving the substrate up and down during the inspection, thereby holding the focal plane at a desired Z distance.

Abstract: The present invention provides an exposure apparatus including a projection optical system configured to project a pattern of a reticle located on an object plane onto a substrate located on an image plane, a phase shift type mark mounted on a stage which holds the substrate, an image sensor which is set at one of a position of the object plane and a position optically conjugate to the object plane, and is configured to capture an image of the mark via the projection optical system, and a controller configured to control the stage based on an interval between edge images, formed by a pair of edge portions, in the image of the mark captured by the image sensor.

Abstract: In an apparatus and system for focusing optics an objective lens is configured to collect light from a region of an object to be imaged, said region having a feature with a known geometric characteristic, wherein the geometric characteristic is known before the feature is imaged by the optical device. A focusing sensor is configured to observe a shape of the feature and a splitter is configured to split the collected light into a first portion and a second portion, and directing said first portion through a weak cylindrical lens to the focusing sensor. A processor is configured to analyze the observed shape and determine whether the observed shape of the feature has a predetermined relationship to the known geometric characteristic and a mechanism is configured to autofocus the optical device by moving at least one of the objective lens and the object to be imaged in response to the analysis and determination of the processor. In some embodiments, the feature can be a fluorescent bead.

Abstract: A system and method of determining a focal position for an objective positioned at a measurement location of a sample holder in a microscopy imaging system are provided. The objective is moved to a position relative to the sample holder that corresponds to a distance between the objective and the sample holder. The sample holder has a conditioned upper surface. A focusing light beam is projected onto the sample holder when the objective is located at the position, and the objective focuses the focusing light beam on the sample holder. A reflected light beam resulting from reflection of the focusing light beam off the conditioned upper surface is observed. The focal position for the objective is determined based on the reflected light beam such that the objective produces an in focus image of a microscopy sample when the objective is located at the focal position.

Abstract: The present invention generally relates to sub-diffraction limit image resolution and other imaging techniques, including imaging in three dimensions. In one aspect, the invention is directed to determining and/or imaging light from two or more entities separated by a distance less than the diffraction limit of the incident light. In some cases, the position of the entities can be determined in all three spatial dimensions (i.e., in the x, y, and z directions), and in certain cases, the positions in all three dimensions can be determined to an accuracy of less than about 1000 nm. In some cases, the z positions may be determined using one of a variety of techniques that uses intensity information or focal information (e.g., a lack of focus) to determine the z position. Non-limiting examples of such techniques include astigmatism imaging, off-focus imaging, or multi-focal-plane imaging.

Abstract: To the end of three-dimensionally localizing light emitting marker entities of unknown orientation and unknown position in a sample, the light emitted by each single marker entity is imaged in at least two different ways onto at least one detection plane which corresponds to a focal plane (13) in the sample resulting in at least two images of the marker entity. Virtual x- and y-positions of the marker entity in parallel to the focal plane (13) are separately determined from the emitted light intensity distribution over each image of the marker entity. Further, the z-position of the marker entity normal to the focal plane is determined from the emitted light intensity distributions over the images of the marker entity. The real x- and y-positions of the marker entity in parallel to the focal plane (13) are determined based on its virtual x- and y-positions and on its z-position.

Abstract: A system and method of autofocusing an optical system uses transforms of images or portions of images formed by the optical system. A detector is used to capture images at different positions relative to the optical system. Transforms and blur spread parameters are calculated for the images for use in determining a position to which the detector should be moved to autofocus the system.

Abstract: An apparatus for observing the optical appearance of a surface (2) of a sample (1) of semitransparent material, in particular the surface (2) of a human skin, the apparatus comprising a light source (11,12,13,16,17) for illuminating at least a region of interest of the surface (2) of the sample (1) from a predetermined direction, a camera (14) for observing a response to the illumination of the region of interest and an optical focus device (21,31) for determining if the camera (14) is in focus with the surface (2) of the region of interest. The invention also relates to a method for observing the optical appearance of the surface (2) of a sample (1) of semitransparent material, in particular the surface (2) of a human skin.

Abstract: A focal position detecting apparatus, for detecting a focusing condition and a tilting condition of an object, includes a planar beam generating module, an optical system, an optical sensor and a cylindrical lens. The planar beam generating module generates a planar light beam along a first path. The optical system is disposed on the first path, wherein the planar light beam, reflected by the object, passes through the optical system along a second path. The optical sensor is disposed on the second path. The cylindrical lens is disposed on the second path between the optical system and the optical sensor and an axis of the cylindrical lens is perpendicular to the second path. The planar light beam passes through the optical system and the cylindrical lens along the second path, before it is incident on the optical sensor to form a linear light spot for determining defocusing degree.

Abstract: The present invention relates to a device for measuring defects of an imaging instrument with a sensor that is accurate, simple to produce and implement and inexpensive. According to the invention, this device comprising at least one second sensor, similar to the first, inclined relative thereto and imaging the same region as the first sensor, and a device for calculating the defocusing of each element of this other sensor.

Abstract: An apparatus (10) for microlithographic projection exposure, which includes: an optical system (18) for imaging mask structures (16) onto a surface (21) of a substrate (20) by projecting the mask structures (16) with imaging radiation (13), the optical system (18) being configured to operate in the EUV and/or higher frequency wavelength range, and various structure defining a measurement beam path (36) for guiding measurement radiation (34), the measurement beam path (36) extending within the optical system (18) such that the measurement radiation (34) only partially passes through the optical system (18) during operation of the apparatus (10).

Abstract: Optical navigation modules and methods of operating the same to sense relative movement between the optical navigation module and a tracking surface are provided. In one embodiment, the optical navigation module comprises: (i) a light source to illuminate at least a portion of a surface relative to which the optical navigation module is moved; (ii) an integrated circuit (IC) including a photo-detector array (PDA) to detect a light pattern propagated onto the PDA from the surface, and a signal processor to translate changes in the light pattern propagated onto the PDA into data representing motion of the optical navigation module relative to the surface; and (iii) a substrate to which the light source and IC are mounted, the substrate including an aperture in a light path between the surface and the PDA. Other embodiments are also disclosed.

Abstract: A proximity detection system is described among devices in a unified communications network. A narrow beam LED and a diffuse beam LED, both located near a first object, such as a computer monitor, provide a light illumination pattern detected by a narrow beam light detector and a broad beam light detector, both located near a second device, such as a headset. A processor calculates the ratio of measured intensity from the narrow beam LED compared to the broad beam LED as measured by the broad beam detector to provide an estimate for how far off axis the second object (e.g., a user of the headset) is with respect to the centerline in front of the second object (e.g., the computer monitor). The processor also calculates the ratio of measured intensity of the narrow IR beam detector to the broad IR beam detector to provide an estimate of the second object's orientation (e.g., the headset user's head) with respect to the first object to determine if the second object is facing the first object.

Abstract: The invention relates to a system for determining a position by emitting a first laser beam (7) by a laser source (6) positioned in a reference system onto a detector (1) and simultaneously detecting the first laser beam (7) by the detector (1), thus defining an emission direction of the laser source (7). The detector (1) has a segmented detection area comprising a plurality of discrete partial detection areas (17), each having a defined partial detection direction and at least two partial detection directions thereof being different. When detecting the first laser beam (7), an impingement point (9) of the first laser beam (7) on the detector (1) is detected by means of at least one partial detection area (17), and when determining the incidence direction (10), said direction is derived from the at least one partial detection direction. The location of the detector (1) relative to the laser source (6) and the reference system is then determined using the emission direction and the incidence direction (10).

Abstract: A plurality of spots forming an M×N matrix can be used in a focus system. Specifically, a plurality of identical spots can be simultaneously projected onto the sample. A V(z) curve can be generated for each spot. A robust focus can be determined based on the generated V(z) curves. Using the spot matrix significantly increases the probability that at least one of the plurality of spots in the matrix can provide an unambiguous V(z) curve. Thus, the spot matrix eliminates the need to search for an appropriate site because the spot matrix increases the probability of landing on a “good” location by a factor of M×N.

Abstract: The present invention provides apparatus for a non-contact method of obtaining accurate three-dimensional measurements of a dry contact lens, more specifically, using dry lens metrology to know the exact thickness of a contact lens.

Abstract: A focal position determining method determines a focal position of an objective lens focused on an observed target region in a specimen. The focal position determining method includes measuring any one of the focal position of the objective lens at a near point and the focal position of the objective lens at a far point or both so as to determine the focal position of the objective lens focused on the observed target region based on the measured focal position.

Abstract: There is provided an exposure condition determining method for determining an exposure condition for an exposure-objective substrate having a plurality of semiconductor pattern features formed by predetermined exposure on a surface thereon, the method including, irradiating an illumination light onto a surface of a substrate, which has the pattern features, detecting a diffracted light from the plurality of semiconductor pattern features of the substrate irradiated with the illumination light, and determining the exposure condition based on a variation in brightness of the detected diffracted light.

Abstract: An apparatus and a method for ascertaining a gap between a stationary member and a rotating member are disclosed. At least a reference beam and a signal beam, which have different focal lengths or which diverge/converge at different rates, are fixed to the stationary member and proximate to each other. The beams are projected across a gap between the stationary member and the rotating member toward the rotating member. The reference and signal beams are reflected by the translating member when it intersects the reference and signal beam, and the reflected reference and signal pulses are obtained. One or more features of the reflected reference pulse and the reflected signal pulse, such as a rise time of the pulses, a fall time of the pulses, a width of the pulses and a delay between the reflected reference pulse and the reflected signal pulse, among other factors, are obtained. The width of the gap is obtained using at least one of these factors.