Abstract: A projection display 210 arranged to display an image to an observer 212 use waveguide techniques to generate a display defining a large exit pupil at the point of the observer 212 and a large field of view, while using a small image-providing light source device. The projection display 210 uses two parallel waveguides 214, 216 made from a light transmissive material. One waveguide 214 stretches the horizontal pupil of the final display and the other waveguide 216 stretches the vertical pupil of the final display and acts as a combiner through which the observer 212 views an outside world scene 220 and the image overlaid on the scene 220. In a color display, each primary color is transmitted within a separate channel R, G, B.

Abstract: A method for forming a color shifting film on a support, the film comprising a reflective stack disposed adjacent to the support and an image is disclosed. The reflective stack comprises an at least partially transparent spacer layer comprising a substituted acrylamide polymer disposed between a partially reflective first layer and a reflective second layer. The acrylamide layer has a thickness sufficient to produce an interference color.

Abstract: A system and method for uniform light generation in projection display systems. An illumination source comprises a light source to produce colored light, and a scrolling optics unit optically coupled to the light source, the scrolling optics unit configured to create lines of colored light from the colored light, and to scroll the lines of colored light along a direction orthogonal to a light path of the illumination source. The scrolling optics unit comprises a single light shaping diffuser to transform the colored light into the lines of colored light, an optical filter positioned in the light path after the light shaping diffuser, and a scrolling optics element positioned in the light path after the optical filter. The single light shaping diffuser is capable of simultaneously transforming colored light into lines of colored light having substantially uniform intensity to provide uniform illumination.

Abstract: An optical media is constructed by superimposing a Fourier transform lens film 3 including a Fourier transform lens 2 on which optical image 10 is formed, and a light permeating sheet 5 provided with a plurality of light permeating portions 4 through which light can pass in a point-like manner. Viewing incident light coming from the side of the light permeating sheet 5 through light permeating portions 4 with eyes on the side of Fourier transform lens film 3. Due to this, an optical image 10 can be formed on the Fourier transform lens 2.

Abstract: An active damping method for a stabilized mirror, and a corresponding active damper apparatus, comprising providing a tachometer measuring speed of a motor driving the mirror, employing compensation electronics receiving input from said tachometer and the motor, and employing drive electronics providing output to the motor.

Abstract: A metrology for determining bias or overlay error in lithographic processes. This metrology includes a set of diffraction test patterns, optical inspection techniques by using spectroscopic ellipsometer or reflectometer, a method of test pattern profile extraction. The invention uses a set of diffraction gratings as the test patterns, and thin film metrology equipment, such as spectroscopic ellipsometer or spectroscopic reflectometer. The profiles of the test patterns in the two successive layers are analyzed. Overlay information are obtained after processing the profile data. In a first aspect of the invention, a line-on-line overlay grating test patterns structure is disclosed in which a second layer mask is placed in the center of a clear line in a first layer mask. In a second aspect of the invention, a line-in-line overlay grating test patterns structure is disclosed in which a second layer mask is placed in the center of a dark line in the first mask.

Abstract: An improved microlithographic imaging system (100) is disclosed. The system comprises a filter (183) substantially aligned with a first image plane, adjacent to an aperture (185). The filter is formed in response to an image projected by a light source (110) through a reticle (160) onto the first image plane. The improved microlithographic imaging system has higher resolution and depth of focus than prior art imaging systems, due to the additional filtering performed by the filter (183). A filter in accordance with the invention can be fabricated easily and inexpensively, using conventional microlithography techniques. A filter in accordance with the invention can also be used to detect or correct flaws in the reticle (160).

Abstract: An optical system is provided with an adaptable window element at a Fourier plane for spatial filtering. Having a window element made up of individually addressable pixels provides a substantial improvement in the spatial filtering adaptability and precision. When combined with a computer and sensor, the window may become part of a negative feedback loop, thereby providing the optical system with more consistent reproducibility, higher reliability with graceful degradation, and more precise control over final results.

Abstract: A light exposure method for fabrication of a semiconductor device and a dummy mask used therefor, capable of forming an ultra-fine pattern by diffracting incident light while controlling or cutting off light components vertically incident on a mask formed with a pattern, thereby increasing the depth of focus and improving the resolution. The dummy mask includes a transparent substrate provided at its upper surface with a diffracting pattern for primarily diffracting light from a light source incident on the dummy mask and at its lower surface with a blocking pattern for removing vertically incident light not diffracted by the diffraction patterns.

Abstract: A semiconductor device manufacturing method is disclosed, which includes the steps of illuminating obliquely an original having a grating-like pattern, with a light beam having a main wavelength .lambda., and projecting a portion of diffraction light produced by the pattern onto a pupil plane of a projection optical system having a numerical aperture NA, so as to project the pattern onto a predetermined plane related to a photosensitive substrate, wherein the original has a partially isolated pattern and an auxiliary pattern, the partially isolated pattern is such a pattern having no adjoining pattern within a range of D.ltoreq.(.lambda./NA) where D is the distance from one side thereof as measured on the predetermined plane, the auxiliary pattern has a linewidth L which satisfies the relation L.ltoreq.0.2(.lambda.

Abstract: A dummy mask used in the fabrication of semiconductor devices, capable of forming an ultra-fine pattern by diffracting incident light while controlling or cutting off light components vertically incident on a mask formed with a pattern, thereby increasing the depth of focus and improving the resolution. The dummy mask includes a transparent substrate provided at its upper surface with a diffracting pattern for primarily diffracting light from a light source incident on the dummy mask and at its lower surface with a controlling pattern for removing vertically incident light not diffracted by the diffraction patterns.

Abstract: In a method of manufacturing a lithographic mask by generating a plurality of light-shielding or transparent pattern elements with respect to a predetermined energy beam on a predetermined original plate on the basis of design data defining shapes and layout of the respective pattern elements, it is determined whether an outer edge of a specific pattern element of a predetermined width or less in the plurality of pattern elements is spaced apart from other pattern elements adjacent thereto by a predetermined distance or more. The design data is corrected so as to complementarily expand the outer edge portion of the specific pattern element outward from other outer edge portions by a small amount when the outer edge portion of the specific pattern element is spaced apart from the other pattern elements by the predetermined distance or more. The plurality of pattern elements are generated on the original plate on the basis of the corrected design data.

Abstract: In an exposure method of illuminating a pattern formed on a mask with illumination light from an illumination optical system, and projecting/exposing an image of the pattern on a photosensitive substrate through a projection optical system, the pattern includes a transmission portion having a transmittance of about 1 with respect to the illumination light and a phase shift transmission portion which provides a phase difference of about (2n+1).pi. (n is an integer) with respect to the light transmitted through the transmission portion, and has a pattern width not more than a resolving limit of the projection optical system.

Abstract: A video color encoding apparatus (10 ) having a lens (14) for focusing an image (16) on an imaging element (20). The imaging element (20) has a monochromatic CCD imager (22) and a tricolor grating assembly (26) interposed between the CCD imager (22) and the lens (14) such that the image (16) is spatially and spectrally modulated onto the monochromatic CCD imager (22) in data compressed format. The image (16) can be reconstructed using conventional optical techniques with an optical reconstruction apparatus (46) or, alternatively, using mathematical means by a digital computer (42) to be displayed directly on a computer screen (54).

Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of .-+. first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.

Abstract: Method and apparatus for forming an image of an object by optical projection with a focusing system comprising the steps of collimating a set of at least two mutually incoherent light beams from the light source to fall on the object from directions that makes the non-diffracted components intersect the aperture stop at a set of points that are distributed over the surface of the stop, attenuating in a spatial filter the zero diffraction order of each beam relative to diffraction orders diffracted in directions towards the centre of the aperture stop, and adding the images formed by the light beams.

Abstract: A method of determining a feature-forming variant, such as focus or exposure, for a lithographic system or the like includes Fourier processing that extracts a figure of merit. In a preferred embodiment, the lithographic system fabricates a series of formations of a single pattern. An optical image of each exposure is formed. A Fourier power spectrum is determined for each optical image. An angular power function is extracted from each power spectrum by quantifying optical power along lines originating at various angles from an origin of the power spectrum. With regard to axes of maximum power, the distribution of on-axes and off-axes power is quantified for each angular power function. An optimum for the lithographic system is determined based upon the data extracted from the angular power functions.

Abstract: An exposure apparatus capable of making exposure for concentric circular periodic grating is provided with a quarter-wave plate (4), an ND filter (8a) having step-wisely different transmissions with boundaries of circle or a group of circles, an axially symmetric-shaped patterning mask (8b), an interference lens (9), before a sample substrate (10) having a photosensitive film (11). The interference lens (9) has a form of rotation symmetry with respect to optical axis (9L), and its incident surface (9P) is a flat plane, and its exit surface (9S) is a surface of revolution which is close to a circular cone.

Abstract: An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam is guided to a semiconductor wafer having a periodic pattern thereon by mirrors and a beam expander. The light scattered from the specimen is collected by a lens on a photographic plate. The reference beam is guided to the photographic plate via a second beam expander and another mirror. The intensity of the reference beam is adjusted to a level at which the reference beams interferes on the photographic plate with the light scattered from defects in the periodic pattern and collected by the lens. Thus, a hologram of the defects in the pattern is recorded on the photographic plate. After development, the photographic plate is returned to its original position and used to form a holographic image of the defects with a transmitted regeneration light beam.

Abstract: A method and apparatus for registering an image using coherent radiation. Spatial homodyne means are employed to generate component signals which comprise a homodyne equivalent of the image, and the component signals of the homodyne equivalent are registered at a registering medium. Using a new principle of construction, the invention achieves on standard registering media a substantial improvement in conrast resolution. Indeed, the number of contrast levels that can be registerd by the invention is the square of the number that can be registered by the prior art. The application of temporal submodulation in a device embodying the invention additionally provides tensor parasitic phase-shift invariance.

Abstract: A keyless holographic locking device that uses a matched optical filter to store in form of a hologram a unique identificaton such as a fingerprint of an authorized user, a source of coherent light that provides the illumination, and an input element for providing angle-invariance possessing the form of a transparent window against which the user places and rotates the same fingerprint, and a registering device for registering the correlation optical signal between the stored fingerprint and the presented fingerprint to generate a signal to unlock the device when, and only if, a positive correlation exists between the presented and the stored fingerprints.