Abstract: An image-formation optical system is disclosed which is an off-axial optical system configured using reflective surfaces, with which the performance deterioration with respect to manufacturing discrepancies is reduced, and which can be made sufficiently compact. The image-formation optical system comprises a reflective optical unit including a plurality of reflective surfaces. Each of the reflective surfaces has a curvature and a rotationally asymmetric shape. Moreover, L/{Er(S?1)} is smaller than 2.2 and L/{Eo (S?1)} is larger than 3.

Abstract: A display optical system for guiding light from an image to an observer or a surface projecting an image thereon with a first optical system and second optical system. The first optical system having a first surface formed on a transparent body with a reflecting action, a second surface reflecting light reflected on the first surface toward the first surface again, and a third surface formed on the transparent body transmitting light from the image. The light transmitted through the third surface travels toward the first surface and is reflected for the first time. In addition, a principal ray, central angle of view to be reflected for the last time on the first surfaces is reflected to a side opposite a side of the first reflection on the first surface with respect to a normal line of a surface on a hit point thereof.

Abstract: A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric imaging group (5) having a concave mirror (6) and a beam-deflector (7), and a dioptric imaging lens group (20) that commences after the beam-deflector. The system is configured such that the intermediate image follows the first lens (17) of a dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflector helps to avoid imaging aberrations.

Abstract: The present embodiments provide methods and apparatuses for providing prescribed illumination. Some embodiments provide lenses that include a two-dimensional beam-forming lens-profile where the profile acts to deflect light rays from a light source into a relatively narrow output beam. A zone of higher refractive index than that of the area outside the profile is enclosed where the higher refractive-index zone admits the light rays, a transverse axis of revolution is further included and extends transversely across and outside of the lens-profile so that the transverse axis extends generally laterally with respect to a luminous centroid-direction of the output beam. The lens further includes a surface of revolution formed by circularly sweeping the lens-profile about the axis of revolution forming a circumferential beam from the output beam emitted by said surface of revolution.

Abstract: A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

Abstract: The optical system disclosed in this specification is a variable power optical system for enlarging and projecting a reduction side object onto an enlargement side image plane, or reducing and projecting an enlargement side object onto a reduction side image plane. This variable power optical system includes a first optical component having a reflecting curved surface, and a second optical component disposed more toward the reduction side than the first optical component. The second optical component has a plurality of movable lens units, and the variable power optical system effects a variable power operation by movement of the plurality of lens units. If ray was traced from the reduction side toward the enlargement side, the second optical component forms an image of a reduction side conjugate point on the enlargement side than an optical surface of the first optical component that is most adjacent to the reduction side.

Abstract: An apparatus for focusing electromagnetic radiation comprises a planar solid immersion mirror including edges for reflecting an electromagnetic wave toward a focal point adjacent to a truncated end of the planar solid immersion mirror, and an interface for diverting a portion of the electromagnetic wave from a central portion of the planar solid immersion mirror to the edges for subsequent reflection toward the focal point.

Abstract: The invention concerns a system for achieving an optical image of an object (136), and/or for achieving optical collimation (137) of light from a light source (130), comprising a concave mirror (131: 134), the surface normal of which forms an angle with the incident light in a beam. A negative lens (132, 133) that co-operates with the concave mirror is arranged in the incident and/or exit beam paths such that an image with eliminated or reduced imaging aberrations is achieved in a focal plane (135), and/or that the exit light from a light sources (130) is collimated (137).

Abstract: In a method for correcting oscillation-induced imaging errors in an objective, in particular a projection objective in microlithography for fabricating semiconductor elements, an at least first objective part and a second objective part are provided. In this case, the first objective part has a first optical axis and the second objective part has an optical axis which deviates from the first optical axis. Beam deflection takes place between the two objective parts via at least one optical beam deflection element. The oscillations occurring in the second objective part are measured and evaluated by means of a sensor system. The results are used as input data for a device, which adjusts the beam direction in the objective, in such a way that imaging errors occurring as a result of the oscillations of the second objective part are compensated for.

Abstract: An optical device has a plurality of optical elements lined up in a row laterally. The optical elements in each case have a light entry surface, a light exit surface, and an associated optical axis. The light entry surfaces are in each case formed convexly in the manner of a lens in a central region surrounding the optical axis. The central region is in each case surrounded by an annular reflector, which is preferably composed of a plurality of individual reflectors.

Abstract: An electronic imaging apparatus includes an optical system that has a reflecting surface for bending an optical path, and a variable-transmittance optical element placed in the optical system. The variable-transmittance optical element is constructed so that a ray of light passes through the optical element a plurality of times. Whereby, a slim-design electronic imaging apparatus can be provided which is small in size and extremely small in depth and in which the amount of light can be adjusted in a wide range.

Abstract: A line producing system includes an input beam of radiant energy that enters a side of a low cost, radiant energy altering device. The radiant energy emerges from the light altering device radiating in a nearly 360 degree disc pattern forming a ring of ever expanding light.

Abstract: An optical element formed from a transparent optical material includes two refraction surfaces, a first reflection surface group having a plurality of internal reflection surfaces arrayed in a predetermined direction, a second reflection surface group opposing the first reflection surface group and having at least one internal reflection surface and two side surfaces opposing each other in parallel to the predetermined direction. Light incident from one of the refraction surfaces is alternately reflected by the internal reflection surfaces of the first reflection surface group and the internal reflection surface of the second reflection surface group and guided to the other refraction surface.

Abstract: An eyepiece (2) for viewing a flat image, which eyepiece (2) has a wide field of view and which eyepiece (2) comprises a cemented doublet of reflecting and refracting optical components, the reflecting and refracting optical components being such that they are each of a different refractive index whereby chromatic aberrations and spherical aberrations are reduced.

Abstract: An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

Abstract: An imaging device includes a convex mirror for reflecting incident light representing an object, the convex mirror having a shape of solid of revolution; an imaging mechanism for taking an image represented by reflected light from the convex mirror; and an optical member for guiding the incident light toward the convex mirror and guiding the reflected light toward the imaging mechanism, the optical member being in close-contact with the convex mirror.

Abstract: A reflecting microoptical system is formed of only two optical surfaces having a continuous configuration, and has a simple configuration suitable for glass molding. Different combinations of convex, planar and concave surfaces are disclosed for the two optical surfaces, to provide different advantageous properties. In preferred embodiments of the invention, at least one, and in some cases both, of the optical surfaces have an aspherical shape to correct for aberrations.

Abstract: A projection exposure apparatus for microlithography using a wavelength?193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.

Abstract: This invention provides a relay imaging optical system which is composed of a small number of lenses and can be miniaturized and reduced in weight with maintaining required optical characteristics. This relay imaging optical system is provided for forming an image of a first plane (10) on a second plane (M), and comprises a first lens group G1 which is constructed so that an image plane thereof is positioned within a limited range, a second lens group G2, and a third lens group G3, from the first plane side. At least two lens groups of the first lens group through the third lens group have at least one aspheric surface respectively; and the total number of lenses which constitute this optical system are ten or fewer.

Abstract: The present invention relates to providing enhanced panoramic images with an improved panoramic mirror. A panoramic mirror is provided with a controlled vertical field of view. The controlled vertical field of view improves the resolution of a viewable panoramic image by eliminating portions of unwanted images from the viewable panoramic image.

Abstract: A projector optic assembly is disclosed for use with various light emitting sources to collect direct the rays of light into a high gradient beam pattern. The projector optic assembly includes a light pipe and a projector lens. The light pipe is segregated into several regions including a reflecting region, a funneling region and a transition plane separating the two regions. At the first end of the reflecting region, closest to the light emitting source, is a connecting lens. At the second end of the funneling region is an emitting aperture that is designed to refract light into the high gradient beam pattern.

Abstract: An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

Abstract: An optical device for routing a plurality of optical signals between a first port and a second port is disclosed. The optical device includes a mirror array having a plurality of reflective elements. Each optical input signal is directed by a reflective element in a direction designated by a control signal. The optical device further includes a curved mirror for receiving each directed optical signal from the respective reflective element, and for reflecting each directed optical signal to the first or second port.

Abstract: A line producing system includes an input beam of radiant energy that enters a side of a low cost, radiant energy altering device. The radiant energy emerges from the light altering device radiating in a nearly 360 degree disc pattern forming a ring of ever expanding light.

Abstract: An oblique projection optical system is compact as compared with the size of the image it presents, offers high imaging performance, produces satisfactorily small distortion, and has a small f-number. The oblique projection optical system is composed of a plurality of powered reflection surfaces, of which the one closest to the projection surface is positively powered and the one second closest thereto is negatively powered. At least one of these two reflection surfaces is a free-form surface, and the one closest to the projection surface has a size larger than half the size of the projection surface.

Abstract: A line producing system includes an input beam of radiant energy that enters a side of a low cost, radiant energy altering device. The radiant energy emerges from the light altering device radiating in a nearly 360 degree disc pattern forming a ring of ever expanding light.

Abstract: A method of fabricating a catadioptric lens system, the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion, both the convex and concave portions sharing a common axis of symmetry; cutting apart the catadioptric lens element to form 2n pie-shaped segments, wherein n is an integer; and reassembling the 2n pie-shaped segments to form the catadioptric lens system with n of the 2n pie-shaped segments being located above a common plane and the rest of the 2n pie-shaped elements being below the common plane.

Abstract: An optical element includes first and second members. The first member has a first surface including a first concave portion. The second member has a second surface including a second concave portion and transmits incoming light therethrough. The first and second members are disposed so that the first and second surfaces are opposed to each other. First and second reflective regions have been formed on the first and second concave portions, respectively. At least part of the incoming light that has been transmitted through the second member is reflected from at least one of the first and second reflective regions.

Abstract: An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens group having a positive subgroup of elements that includes at least a plano-convex element and a negative subgroup that includes at least a negative meniscus element. The lens subgroups are separated by a small air space. The positive and negative subgroups constitute a main lens group arranged adjacent to but spaced apart from a concave mirror along the mirror axis. The system also includes a variable aperture stop so that the system has a variable NA. A projection photolithography system that employs the optical system is also disclosed.

Abstract: Disclosed is a diffuse reflector comprising a reflective layer and a transparent polymeric film comprising a plurality of complex lenses on a surface thereof.

Abstract: An optical imaging system (100) has a Cassegrain-like front end (1) with a substantially spherical concave primary mirror (3) and a substantially spherical convex secondary mirror (4), a Cassegrain-like rear end (2) with a substantially spherical concave primary mirror (7) and a substantially spherical convex secondary mirror 8, and a field lens system (5) to image the aperture stop of the rear end to a position where it forms the entrance pupil of the optical imaging system (100). An aberration corrector (6) may be provided to correct selected aberrations.

Abstract: The projection aligner for transferring an image of a mask pattern of a mask onto an object to be exposed comprises a projection optical system that forms the image of the mask pattern onto the object, an expansion ratio determiner that measures lengths of the object in first and second directions and determines first and second expansion ratios, which are expansion ratios of the object in the first and second directions, respectively, based on those lengths, and a magnification controller that adjusts the magnification of the projection optical system to a value between the first and second expansion ratios.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: A catoptric projection optical system for projecting a pattern on an object surface onto an image surface includes plural mirrors, wherein a second mirror from the image surface through the optical path receives convergent pencil of rays, and has a paraxial magnification of −0.14 or smaller.

Abstract: An optical element comprising an object-side imaging element for imaging an object on an intermediate image plane in an optical path before a final image plane and an image-side imaging element for reimaging an object image formed on the intermediate image plane, on the final image plane, wherein at least one of the object-side imaging element and the image-side imaging element comprises an off-axial curved surface, and wherein aberration is generated by both of the object-side imaging element and the image-side imaging element, thereby flattening (disturbance of) a light intensity distribution caused on the final image plane by a noise source at or near the intermediate image plane.

Abstract: A catadioptric projection lens for projecting a pattern located in an object plane onto an image plane without an intermediate image includes the following components between the object plane and the image plane in the given order: a first lens part for creating a beam that is directed at a physical beam splitter, a physical beam splitter with a beam splitter surface, a mirror group with a concave mirror, and a second lens part with positive focal power to create an image of the pattern on the image plane. The mirror group preferably has no free-standing lens, and the focal power of the mirror group is largely determined by the magnification of the concave mirror. The focal power of the mirror group is large enough to convert the incident divergent beam into a convergent beam. The system aperture is located on the image side behind of the concave mirror, preferably at the exit of the beam splitter.

Abstract: A dispersion compensator is formed by an angular dispersion element, a diffracting optical element, and a reflecting mirror. By forming a reflecting surface in free-formed surfaces which are different between Y-Z plane and X-Z plane and shifting a reflecting position on a reflecting surface per wavelengths, dispersion and dispersion slope are compensated by having an optical path length difference per wavelengths. By doing this, it is possible to realize a dispersion compensator which can compensate dispersion and dispersion slope simultaneously with low loss.

Abstract: A catadioptric system includes: a first image forming optical system that includes at least two reflecting mirrors and forms a first intermediate image of a first plane with light originating from the first plane; a second image forming optical system that includes at least two reflecting mirrors and forms a second intermediate image of the first plane with light having traveled via the first image forming optical system; and a refractive type of third image forming optical system that forms a final image of the first plane onto a second plane with light having traveled via the second image forming optical system, and optical members constituting the first image forming optical system, the second image forming optical system and the third image forming optical system are all disposed along a single linear optical axis.

Abstract: A subject for the invention is to provide a lens which is lightweight and inexpensive and, despite this, which is large and has a high-precision aspherical reflecting surface reduced in distortion. The invention provides: a projection lens comprising a resin base having a given curved surface and a reflecting layer formed over the surface of the resin base, characterized in that the average of in-plane birefringent phase differences per unit thickness as measured with incident light from the direction perpendicular to the curved optical functional surface of the resin base is 30 nm/mm or less in a region accounting for at least 60% of the area of the optical functional surface; or a projection lens having a reflecting layer on an optical-function-imparted surface, wherein at least 60% of the optical-function-imparted surface has a surface roughness (Ra) of 200 Å or lower.

Abstract: A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric first section (5) having a concave mirror (6) and a beam-deflection device (7), and a dioptric second section (8) that commences after the beam-deflection device. The system is configured such that the intermediate image follows the first lens (17) of the dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflection device helps to avoid imaging aberrations.

Abstract: The invention is a dual function laser device for use in night vision systems. The invention uses lenses to cause one portion of a laser beam to converge to a target point and another portion of the beam to diverge. The divergent portion is variable in size and illuminates a viewable area around the target point. Rather than use two lasers to create an illuminated view area around an illuminated target point, the invention uses a combination of a lens and a sub-aperture lens arrangement to create two illuminations from a single laser.

Abstract: A reading optical system for projecting a document image on a CCD in an image reading device, providing, sequentially from the document side, a symmetrical lens group rotatable about the optical axis, and a free curved mirror. Reflective surface shape of the free curved mirror is symmetrical in a plane perpendicular to the linear layout direction of the line CCD and includes the intersection of the optical axis of the lens group and the reflective surface of the free curved mirror. The reflective surface shape of the free curved mirror is asymmetrical in a plane parallel to the linear layout direction of the line CCD and includes the normal line (NL) at the intersection. The number of lenses of the lens group structure can be reduced to three lenses while maintaining a high optical performance by using such a free curved mirror.

Abstract: An optical system has a correction half-sphere lens having multiple secondary mirrors mounted on an outer periphery of the correction half-sphere lens. A primary half-sphere mirror is coaxial and shares a same curvature center with the correction half-sphere lens. The primary half-sphere mirror has multiple through holes each corresponding to one of the secondary mirrors and having a second correction lens received therein to receive light from the corresponding secondary mirror. A cap is provided on top of the primary half-sphere mirror and has a shutter in a center of the cap to control incident light coming to the system.

Abstract: An optical reduction system with polarization dose sensitive output for use in the photolithographic manufacture of semiconductor devices having variable compensation for reticle retardation before the long conjugate end. The variable compensation component(s) before the reticle provides accurate adjustment of the polarization state at or near the reticle. The variable compensation components can be variable wave plates, layered wave plates, opposing mirrors, a Berek's compensator and/or a Soleil-Babinet compensator. The catadioptric optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

Abstract: An optical architecture for observation telescopes, in particular for telescopes intended to be installed on board a vehicle, such as a space satellite, for observing terrestrial areas, includes a concave and off-axis mirror which is aspherical or possibly spherical and reflects in the form of a convergent beam a beam consisting of radiation that it receives from a terrestrial area that it is observing, a dioptric and achromatic aperture correction plate inserted on the path of the convergent beam reflected by the mirror, a dioptric and achromatic field correction plate inserted on the path of the convergent beam reflected by the mirror on the downstream side of the aperture correction plate relative to the mirror, and a pupil on the path of the reflected convergent beam to obtain an off-axis field of view preventing central obscuration. It constitutes a simple way of imaging stereoscopically.

Abstract: A stationary solar photovoltaic array module design, which constitutes four steps of optical concentrations of photovoltaic electric power generation systems. A compound parabolic concentrator (CPC) is mounted under a first and second optical concentrating fresnel lenses that concentrates the intensity of sunlight. Then the focused sunlight is further concentrated twenty times by the third optical concentrator CPC. The high mirror quality of CPC allows 98% of the reflected rays to be focused at the bottom of the CPC. At this point, the intensified sunlight is homogenized as it passes through a fourth optical concentrator glass lens, which with anti-reflection coating on the top of the glass lens' surface, incident on the multi-junction solar cell accomplish the fourth optical concentration for the photovoltaic electric energy conversion.

Abstract: A lens design having two concave mirrors or Mangins and a turning mirror is disclosed. The optical axis of the concave elements are approximately coplanar and intersect on a turning mirror, and the normal to the surface of the turning mirror bisects the angle between the two optical axis.

Abstract: To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.

Abstract: A catadioptric projection optical system is provided, which can use a beam splitting optical system smaller in size than a conventional polarizing beam splitter, can set a long optical path from a concave reflecting mirror to an image plane, allows easy adjustment of the optical system, and has excellent imaging performance. A light beam from an object surface forms a first intermediate image through a refracting lens group. A light beam from the first intermediate image passes through a polarizing beam splitter and is reflected by a concave reflecting mirror to form a second intermediate image in the polarizing beam splitter. A light beam from the second intermediate image is reflected by the polarizing beam splitter means to form a final image on the image plane via a refracting lens group. The polarizing beam splitter means is arranged near the positions at which the intermediate images are formed.