Gas Maintenance (e.g., Purification, Replenishment, Etc.) Patents (Class 372/59)
  • Patent number: 11949202
    Abstract: A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: April 2, 2024
    Assignee: Cymer, LLC
    Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
  • Patent number: 11949203
    Abstract: A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: April 2, 2024
    Assignee: Cymer, LLC
    Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
  • Patent number: 11052484
    Abstract: According to the present invention, a system (1; 1?) for processing at least one substrate (2) containing a dried fluid sample (21) is provided, the system (1; 1?) comprising a support (12) configured to position the substrate (2), a laser device (3) for directing a laser beam (31) to the substrate (2), configured to cut at least one area of the substrate (2) containing the dried fluid sample (21) by means of the laser beam (31), a container holder (4; 4?) configured to hold and position a container (5) for receiving the cut area, the container holder (4; 4?) being arranged below the substrate (2), and an extraction subsystem (6) for extracting fume and/or dust generated when laser cutting the substrate (2), wherein the extraction subsystem (6) consists of at least two extraction components (61, 62) sandwiching the substrate (2) there between. Furthermore, a method for automated processing at least one substrate (2) containing a dried fluid (21) sample by means of such a system (1; 1?) is provided.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: July 6, 2021
    Assignee: Roche Molecular Systems, Inc.
    Inventors: Claudio Cherubini, Andreas Drechsler, Reto Huesser, Emad Sarofim
  • Patent number: 10971886
    Abstract: A laser apparatus includes a chamber accommodating a pair of discharge electrodes, a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber, and a controller. The controller performs first control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber at every first number of pulses or first elapsed time, and second control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber before the first control at every second number of pulses less than the first number of pulses or second elapsed time less than the first elapsed time.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: April 6, 2021
    Assignee: Gigaphoton Inc.
    Inventors: Takeshi Asayama, Hiroyuki Masuda
  • Patent number: 10892594
    Abstract: In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: January 12, 2021
    Assignee: Cymer, LLC
    Inventor: Tanuj Aggarwal
  • Patent number: 10703631
    Abstract: A neon recovering/purifying system including: a recovery vessel that is arranged on an exhaust gas route and stores exhaust gas, the exhaust gas route being branched and extending from a discharge line; a compressor that increases a pressure of the exhaust gas sent out from the recovery vessel, to a third pressure; an exhaust gas flow rate regulating unit that regulates a flow rate of the exhaust gas whose pressure has been increased by the compressor; a first impurity removing unit that removes a first impurity from the exhaust gas; a second impurity removing unit that removes a second impurity from the exhaust gas from which the first impurity has been removed; a pressure increasing vessel that stores purified gas that has been processed by the first impurity removing unit and the second impurity removing unit; a pressure reducing valve that reduces a pressure of the purified gas sent out from the pressure increasing vessel, to the first pressure; and a purified gas flow rate regulating unit that regulates
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: July 7, 2020
    Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
    Inventors: Sayaka Suzuki, Terumasa Koura, Fumikazu Nozawa
  • Patent number: 10675854
    Abstract: An additive processing apparatus includes a chamber and an irradiation device that together are operable to additively fabricate an article from a powder layer-by-layer in a work space in the chamber. A gas recirculation loop is connected at a first end thereof to an outlet of the chamber and at a second end thereof to an inlet of the chamber. The gas recirculation loop includes at least one purification device that is configured to remove impurities from a cover gas and generate a clean cover gas.
    Type: Grant
    Filed: January 16, 2015
    Date of Patent: June 9, 2020
    Assignee: RAYTHEON TECHNOLOGIES CORPORATION
    Inventor: Bart A. Van Hassel
  • Patent number: 10661223
    Abstract: A method and apparatus for thermally processing a substrate is described. The apparatus includes a thermal processing chamber having an interior volume which includes a top portion and a side wall. The apparatus also include a getter assembly comprising a getter configured as a wire disposed in the top portion and extending into the interior volume proximal to the side wall.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 26, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Joseph M. Ranish
  • Patent number: 9634455
    Abstract: One or more operating characteristics of a light source are adjusted by estimating a plurality of extreme values of operating parameters of the light source while operating the light source under a set of extreme test conditions. For each extreme test condition, a group of pulses of energy is supplied to a first gas discharge chamber of the light source while operating the first gas discharge chamber under the extreme test condition to produce a first pulsed amplified light beam; a group of pulses of energy is supplied to a second gas discharge chamber of the light source while operating the second gas discharge chamber under the extreme test condition to produce a second pulsed amplified light beam. An extreme value of an operating parameter for the extreme test condition is measured to thereby estimate the extreme value of the operating parameter.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: April 25, 2017
    Assignee: Cymer, LLC
    Inventor: Tanuj Aggarwal
  • Patent number: 9379511
    Abstract: A laser oscillator includes a blower for blowing laser gas to discharge tubes; a gas circulation path for connecting discharge tubes and a blower; a gear chamber pressure detector for detecting the pressure of the gear chamber disposed in the blower; and an alarm part for issuing an alarm when the pressure detected in the gear chamber pressure detector is higher than a predetermined pressure. The predetermined pressure is set based on the average value of the pressure on the laser gas inlet side and the pressure on the laser gas outlet side of the blower. This configuration can prevent the entry of the oil mist generated from the blower into the gas circulation path and an increase in the gas consumption, while maintaining stable laser output for an extended period of time without increasing the running cost.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: June 28, 2016
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Satoshi Eguchi, Hidefumi Omatsu, Hiroyuki Hayashikawa
  • Patent number: 9356414
    Abstract: An apparatus to automatically refill a gas laser is disclosed. The apparatus includes a computing device coupled to a memory. The memory storing instructions that when executed by the computing device cause the computing device to monitor a time elapsed since a last recorded gas refill and when a predetermined time interval is reached since the last recorded gas refill, effectuate a gas refill process to refill the gas laser with gas from a gas supply coupled to the gas laser by automatically controlling the gas laser and the gas supply; and upon completing the gas refill process, record a time stamp of the completed gas refill process. A method and system to automatically refill a gas laser also are disclosed.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: May 31, 2016
    Assignee: TELEDYNE INSTRUMENTS, INC.
    Inventor: John Roy
  • Patent number: 9209595
    Abstract: An extreme ultraviolet light system includes an optical amplifier system and a catalytic conversion system. Each optical amplifier of the optical amplifier system includes a gain medium in the form of a gas mixture that produces an amplified light beam. The optical amplifier system includes a fluid input and a fluid output through which the gas mixture flows. The catalytic conversion system is fluidly connected to the fluid output of the optical amplifier system and to the fluid input of the optical amplifier system. The catalytic conversion system includes a catalytic converter that includes a housing; a substrate within the housing including openings through which the gas mixture can flow; and a catalyst applied as a coating to the interior surfaces of the openings of the substrate, the catalyst including particles of metal. The particles of metal can be nanoparticles of precious metal.
    Type: Grant
    Filed: January 9, 2015
    Date of Patent: December 8, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Kevin Zhang, Christo Liebenberg, Alexander Schafgans
  • Patent number: 9116445
    Abstract: Systems and methods to improve the performance of nonlinear crystals in a resonant cavity are presented. A humidified purge gas is supplied to a resonant cavity of a laser based illumination source that includes a nonlinear crystal. A small amount of water vapor is added to a clean, dry purge gas to prevent excessive drying of the nonlinear crystal during storage or operation. In some embodiments, a humidity injection system includes at least two parallel flow paths. One flow path includes a humidity injector and another does not include humidity injection. The amount of water vapor added to the purge gas flow is determined at least in part by the relative flow rate between the parallel flow paths. In some embodiments, the amount of water vapor added to the purge gas flow is regulated based on a measurement of humidity in the resonant cavity.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: August 25, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Igor N. Germanenko, Marc Shiraki, Stephen Richard Friberg
  • Patent number: 9008143
    Abstract: The present invention aims to prevent, in a gas laser resonator, the deterioration in quality of discharge by reduction of the change of the pressure in a discharge chamber and the inflow of impurity gases, such as air, into the discharge chamber. A bracket 6 is attached to one end of a tube 1 interposing a gasket 13 only for sealing an opening of the discharge chamber 2 only and a gasket 14 for sealing both openings of the discharge chamber 2 and a buffer chamber 12. Also, a glass plate 8 and further a bracket 9 are attached to the other end of the tube 1 interposing a gasket 15 only for sealing the opening of the discharge chamber 2 and a gasket 16 for sealing both openings of the discharge chamber 2 and the buffer chamber 12. The pressure in the buffer chamber 12 is set lower than that of the discharge chamber 2 or set higher than the atmospheric pressure to decrease the inflow of the impurity gases to the discharge chamber 2.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: April 14, 2015
    Assignee: Via Mechanics, Ltd.
    Inventors: Hideho Yamamura, Goichi Ohmae, Nobuyoshi Ohtani
  • Publication number: 20150063397
    Abstract: The present invention aims to prevent, in a gas laser resonator, the deterioration in quality of discharge by reduction of the change of the pressure in a discharge chamber and the inflow of impurity gases, such as air, into the discharge chamber. A bracket 6 is attached to one end of a tube 1 interposing a gasket 13 only for sealing an opening of the discharge chamber 2 only and a gasket 14 for sealing both openings of the discharge chamber 2 and a buffer chamber 12. Also, a glass plate 8 and further a bracket 9 are attached to the other end of the tube 1 interposing a gasket 15 only for sealing the opening of the discharge chamber 2 and a gasket 16 for sealing both openings of the discharge chamber 2 and the buffer chamber 12. The pressure in the buffer chamber 12 is set lower than that of the discharge chamber 2 or set higher than the atmospheric pressure to decrease the inflow of the impurity gases to the discharge chamber 2.
    Type: Application
    Filed: August 27, 2014
    Publication date: March 5, 2015
    Inventors: Hideho YAMAMURA, Goichi OHMAE, Nobuyoshi OHTANI
  • Publication number: 20150055672
    Abstract: A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber.
    Type: Application
    Filed: November 3, 2014
    Publication date: February 26, 2015
    Applicant: GIGAPHOTON INC.
    Inventors: Akihiko KUROSU, Junichi FUJIMOTO, Yosuke ISHIZUKA, Takashi MATSUNAGA, Osamu WAKABAYASHI
  • Patent number: 8942271
    Abstract: A blower apparatus includes a blower casing; an elastic member for mounting a mounting portion that projects on an outer circumferential portion of the blower casing, to a blower support member disposed on the inlet side of the mounting portion; and a flange portion provided on the inlet side of the mounting portion. At least three elastic members are disposed in the same plane that is almost orthogonal to a rotation shaft, and adhesion surfaces are provided on both ends, in the rotation shaft direction, of each elastic member. The mounting portion is fixed to one of the adhesion surfaces, and the blower support member is fixed to the other of the adhesion surfaces. The flange portion is provided so as to oppose the blower support member through a gap having a thickness less than a thickness, in the rotation shaft direction, of the elastic member.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: January 27, 2015
    Assignee: Mitsubishi Electric Corporation
    Inventors: Kouji Funaoka, Takayuki Nakayama, Tomohiro Kyoto
  • Patent number: 8929419
    Abstract: An excimer laser system in which the expensive noble gases are reclaimed, while the halogen gas is sacrificed, and the impurities developed during operation of the excimer laser are removed. In the approach disclosed a multi-stage gas purifier is used with a single, premix gas bottle containing a halogen-rich laser gas mixture comprising noble, buffer and halogen gas, to maintain the optimum halogen content of the laser, while also maintaining a consistent ratio of noble, buffer and halogen gases without complicated control apparatus.
    Type: Grant
    Filed: August 13, 2013
    Date of Patent: January 6, 2015
    Assignee: LightMachinery Inc.
    Inventors: Jesse Dean, Ian J. Miller, Edward S. Williams, John H. Hunter
  • Patent number: 8913642
    Abstract: In a slab laser, a gas mixture containing carbon dioxide CO2 is formed as a laser-active medium in a discharge space which is formed between two plate-shaped metal electrodes, the flat faces of which are located opposite one another. A resonator mirror is arranged on each of the mutually opposite end faces of the discharge space, the mirrors forming an unstable resonator parallel to the flat faces. At least one of the mutually facing flat faces is provided either on the entire flat face with a dielectric layer the thickness of which is greater on at least one sub-surface than in the remaining area of the flat face, or the at least one flat face is provided with a dielectric layer exclusively on at least one sub-surface.
    Type: Grant
    Filed: July 25, 2013
    Date of Patent: December 16, 2014
    Assignee: Rofin-Sinar Laser GmbH
    Inventors: Florian Engel, Stefan Ruppik, Volker Scholz, Hermann Hage
  • Patent number: 8873600
    Abstract: Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.
    Type: Grant
    Filed: June 30, 2011
    Date of Patent: October 28, 2014
    Assignee: Cymer, LLC
    Inventors: Rui Jiang, Joshua Jon Thornes, Daniel Jason Riggs, Kevin Michael O'Brien
  • Patent number: 8867583
    Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: October 21, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Tooru Abe, Takeshi Ohta, Hiroaki Tsushima, Osamu Wakabayashi
  • Patent number: 8842704
    Abstract: An RF power-supply for driving a carbon dioxide CO2 gas-discharge laser includes a plurality of power-oscillators phase-locked to a common reference oscillator. Outputs of the phase-locked power-oscillators are combined by a power combiner for delivery, via an impedance matching network, to discharge-electrodes of the laser. In one example the powers are analog power-oscillators. In another example, the power-oscillators are digital power-oscillators.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: September 23, 2014
    Assignee: Coherent, Inc.
    Inventors: David P. Schmelzer, W. Shef Robotham, Jr., Frederick W. Hauer, Joel Fontanella
  • Patent number: 8831057
    Abstract: In a laser device having at least one gas-purged laser resonator which is arranged in a purging gas circuit which has upstream of the laser resonator both a low pressure generator for generating a purging gas excess pressure in the purging gas circuit and, between the low pressure generator and the laser resonator, a cleaning device for cleaning the purging gas, the purging gas being air, according to the invention the purging gas circuit has downstream of the laser resonator between the laser resonator and the low pressure generator an intake opening which is permanently open towards the atmosphere, the purging gas pressure (p1) generated by the low pressure generator being greater than the atmospheric air pressure (p0).
    Type: Grant
    Filed: April 19, 2012
    Date of Patent: September 9, 2014
    Assignee: TRUMPF Laser GmbH + Co. KG
    Inventors: Sven Schad, Lutz Schuler, Jürgen Mösner
  • Patent number: 8811446
    Abstract: The gas laser oscillator apparatus of the present invention has laser gas sealed in a vacuum chamber under a decompressed condition lower than atmospheric pressure; a discharge means for exciting the laser gas; a blower means for blowing the laser gas; a laser-gas flow passage as a circulation passage of the laser gas between the discharge means and the blower means; and a gas compression means for discharging a predetermined amount of the laser gas from the laser-gas flow passage. The gas decompression means is structured on the application of Bernoulli's principle. The gas decompression means has a sequence for decreasing the ratio of air mixed into the laser gas below a predetermined level with use of a part of pressurized gas used in a laser processing machine or the gas laser oscillator apparatus.
    Type: Grant
    Filed: January 17, 2013
    Date of Patent: August 19, 2014
    Assignee: Panasonic Corporation
    Inventors: Hiroyuki Hayashikawa, Hitoshi Hongu, Takayuki Yamashita
  • Patent number: 8767791
    Abstract: Methods and systems for controlling the gas concentrations in the chambers of a two chamber gas discharge laser such as an excimer laser are disclosed. A first set of inject opportunities is selected for the laser chamber of the master oscillator, and a second set of inject opportunities is selected for the laser chamber of the power amplifier. At each selected inject opportunity for the master oscillator, its laser chamber receives an inject containing a fixed amount of a non-halogen containing gas, and a calculated amount of a halogen containing gas. At the selected inject opportunities for the power amplifier, its laser chamber receives a fixed amount of the halogen containing gas, and may also receive a fixed amount of the non-halogen containing gas.
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: July 1, 2014
    Assignee: Cymer, LLC
    Inventor: Daniel J. Riggs
  • Patent number: 8756976
    Abstract: Embodiments of the present invention provide improved systems and methods for providing an atomic sensor device. In one embodiment, the device comprises a sensor body, the sensor body enclosing an atomic sensor, wherein the sensor body contains a gas evacuation site located on the sensor body, the gas evacuation site configured to connect to a gas evacuation device. The device also comprises a getter container coupled to an opening in the sensor body, an opening in the getter container coupled to an opening in the sensor body, such that gas within the sensor body can freely enter the getter container. The device further comprises an evaporable getter enclosed within the getter container, the evaporable getter facing away from the sensor body.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: June 24, 2014
    Assignee: Honeywell International Inc.
    Inventors: Christina M. Schober, Jennifer S. Strabley, Rodney H. Thorland, Chad Langness, Delmer L. Smith, Terry D. Stark
  • Patent number: 8681832
    Abstract: Systems and methods for automatically performing a high accuracy gas inject in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. A mathematical model relates the amount of halogen gas in the laser chamber after an inject to the amount of halogen gas present prior to the inject, the amount of halogen gas injected, and the consumption rate of halogen gas in the chamber. A fixed amount of halogen gas is added to the chamber in an initial number of injects to allow transients to settle out, after which the amount of halogen gas to be injected is that calculated to result in a desired amount of halogen gas after the inject according to the model. Measurements are taken after injects to update the actual amount of halogen gas present and the consumption rate of the halogen gas.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: March 25, 2014
    Assignee: Cymer, Inc.
    Inventor: Daniel J. Riggs
  • Publication number: 20140064316
    Abstract: Systems and methods for lasing molecular gases, and systems and methods of detecting molecular species are provided. The systems and methods can include the use of an excitation laser tuned to a wavelength associated with oxygen or nitrogen. The lasing can occur in both the forward and reverse directions relative to the excitation laser beam. Reverse lasing can provide a laser beam that propagates back toward the excitation laser source, and can provide a method for remote sampling of molecular species contained in the air. For example, systems and methods of detecting a molecular species of interest can be achieved by using the properties of the backward or forward propagating air laser to indicate a change in a pulse from the source of laser pulses caused by a modulation laser tuned to interact with the molecular species of interest.
    Type: Application
    Filed: July 11, 2012
    Publication date: March 6, 2014
    Inventors: Richard B. MILES, Arthur Dogariu, James B. Michael
  • Patent number: 8649413
    Abstract: A high-powered laser beam focusing apparatus for use in laser welding applications that includes a laser having a beam delivery fiber for generating a laser beam and a housing adapted to receive the beam delivery fiber. The housing further includes a first internal chamber adapted to receive a flow of pressurized gas; a second internal chamber; and an aerodynamic window positioned between the first chamber and the second chamber.
    Type: Grant
    Filed: July 19, 2012
    Date of Patent: February 11, 2014
    Inventor: Stanley L. Ream
  • Patent number: 8585224
    Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Grant
    Filed: February 10, 2013
    Date of Patent: November 19, 2013
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands b.V.
    Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
  • Patent number: 8576891
    Abstract: The sealed gas laser oscillator that includes the airtight vessel, the laser gas supply source that supplies a laser gas to the airtight vessel, and the vacuum pump that performs evacuation until a pressure of an inside of the airtight vessel reaches a target reached pressure every predetermined interval between laser gas exchanges and is connected to the airtight vessel, and that performs laser oscillation in a state where the airtight vessel is filled with the laser gas. The gas laser oscillator includes a unit that determines the target reached pressure on the basis of the interval between laser gas exchanges, a leakage rate of an impurity gas from the outside to the airtight vessel after evacuation, and an allowable impurity gas pressure at which the gas laser oscillator is capable of being operated.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: November 5, 2013
    Assignee: Mitsubishi Electric Corporation
    Inventors: Naoki Miyamoto, Mototoshi Kumaoka
  • Publication number: 20130186476
    Abstract: The sealed gas laser oscillator that includes the airtight vessel, the laser gas supply source that supplies a laser gas to the airtight vessel, and the vacuum pump that performs evacuation until a pressure of an inside of the airtight vessel reaches a target reached pressure every predetermined interval between laser gas exchanges and is connected to the airtight vessel, and that performs laser oscillation in a state where the airtight vessel is filled with the laser gas. The gas laser oscillator includes a unit that determines the target reached pressure on the basis of the interval between laser gas exchanges, a leakage rate of an impurity gas from the outside to the airtight vessel after evacuation, and an allowable impurity gas pressure at which the gas laser oscillator is capable of being operated.
    Type: Application
    Filed: September 13, 2011
    Publication date: July 25, 2013
    Inventors: Naoki Miyamoto, Mototoshi Kumaoka
  • Publication number: 20130089118
    Abstract: A manufacturing method for an excimer laser that includes a reflective Echelle diffraction grating includes obtaining information of a wavelength of a light source, a blazed order, a repetitive pitch of the grating, a material of the grating, and a predefined orientation ratio B/A that is a ratio between that a diffraction efficiency A of the blazed order and a diffraction efficiency Bb of an order lower by one order than the blazed order, and determining an initial value of a blaze angle based upon these pieces of information.
    Type: Application
    Filed: October 2, 2012
    Publication date: April 11, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: CANON KABUSHIKI KAISHA
  • Patent number: 8416828
    Abstract: An array of discrete catalyst elements is contained in a heated module external to the main laser vessel with an auxiliary gas flow loop connecting them so as to provide independent control of catalyst temperature and gas flow rate to achieve high CO+1/2O2 to CO2 recombination under high pulse repetition frequency operation for a sealed laser. Catalyst elements in the form of cylinders with holes through their centers are mounted on multiple parallel rods or catalysts in the form of small spherical or cylindrical elements are contained in multiple packets arranged in the module so as to minimize flow impedance and maximize laser gas recycling throughput. The cylindrical catalyst module is constructed so as to allow for rapid heating to operating temperature while withstanding atmospheric differential pressures during laser processing.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: April 9, 2013
    Assignee: DBC Technology Corp.
    Inventor: David B. Cohn
  • Publication number: 20130083818
    Abstract: Systems and methods for automatically performing a high accuracy gas inject in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. A mathematical model relates the amount of halogen gas in the laser chamber after an inject to the amount of halogen gas present prior to the inject, the amount of halogen gas injected, and the consumption rate of halogen gas in the chamber. A fixed amount of halogen gas is added to the chamber in an initial number of injects to allow transients to settle out, after which the amount of halogen gas to be injected is that calculated to result in a desired amount of halogen gas after the inject according to the model. Measurements are taken after injects to update the actual amount of halogen gas present and the consumption rate of the halogen gas.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: CYMER, INC.
    Inventor: Daniel J. Riggs
  • Patent number: 8382301
    Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: February 26, 2013
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
  • Publication number: 20130034118
    Abstract: An excimer laser includes a laser housing containing a lasing-gas mixture including a halogen. Contaminants including particulate matter and a metal halide vapor are generated in the lasing-gas mixture during operation of the laser. A gas-cleaning arrangement extracts lasing-gas mixture from the housing and passes the lasing-gas mixture through an electrode assembly. A repeatedly pulsed gas discharge is created in the electrode assembly by driving the electrode assembly with repeated high-power short-duration pulses. The pulsed discharge causes disintegration of the metal halide vapor and electrostatic trapping in the electrode assembly of the particulate matter and products of the metal halide disintegration.
    Type: Application
    Filed: August 4, 2011
    Publication date: February 7, 2013
    Applicant: Coherent GmbH
    Inventors: Igor Bragin, Oleg Melnikov, Timur Misyuraev, Andreas Targsdorf, Kai Schmidt
  • Publication number: 20120275481
    Abstract: Methods and systems for controlling the gas concentrations in the chambers of a two chamber gas discharge laser such as an excimer laser are disclosed. A first set of inject opportunities is selected for the laser chamber of the master oscillator, and a second set of inject opportunities is selected for the laser chamber of the power amplifier. At each selected inject opportunity for the master oscillator, its laser chamber receives an inject containing a fixed amount of a non-halogen containing gas, and a calculated amount of a halogen containing gas. At the selected inject opportunities for the power amplifier, its laser chamber receives a fixed amount of the halogen containing gas, and may also receive a fixed amount of the non-halogen containing gas.
    Type: Application
    Filed: April 29, 2011
    Publication date: November 1, 2012
    Inventor: Daniel J. Riggs
  • Patent number: 8295316
    Abstract: A laser light source experiencing an EOL condition, which might otherwise cause an unscheduled shutdown, is instead operated in a diminished capacity in one or more predetermined or calculated increments. Operating in such diminished capacity continues until the laser system can undergo appropriate maintenance either during a regularly scheduled shutdown or a newly scheduled shutdown. In the meantime, the diminished capacity of the laser system is accommodated by the utilization tool, as appropriate.
    Type: Grant
    Filed: March 24, 2010
    Date of Patent: October 23, 2012
    Assignee: Cymer, Inc.
    Inventors: Robert P. Akins, Richard L. Sandstrom, Daniel J. W. Brown, Matthew R. Graham, Kevin W. Zhang, Patrick L. Nelissen
  • Publication number: 20120087388
    Abstract: An array of discrete catalyst elements is contained in a heated module external to the main laser vessel with an auxiliary gas flow loop connecting them so as to provide independent control of catalyst temperature and gas flow rate to achieve high CO+1/2O2 to CO2 recombination under high pulse repetition frequency operation for a sealed laser. Catalyst elements in the form of cylinders with holes through their centers are mounted on multiple parallel rods or catalysts in the form of small spherical or cylindrical elements are contained in multiple packets arranged in the module so as to minimize flow impedance and maximize laser gas recycling throughput. The cylindrical catalyst module is constructed so as to allow for rapid heating to operating temperature while withstanding atmospheric differential pressures during laser processing.
    Type: Application
    Filed: October 8, 2010
    Publication date: April 12, 2012
    Inventor: David B. Cohn
  • Patent number: 8130810
    Abstract: A laser apparatus comprises a laser having a lasing chamber an inlet to the lasing chamber for a lasing gas containing a heavy noble gas and an outlet from the lasing chamber for the discharge of a flow of lasing gas, wherein the outlet is able to be paced in communication with the atmospheric through an adsorptive trap containing a selective adsorbent of the heavy noble gas. In operation, the heavy noble gas (xenon or krypton) is adsorbed in the trap. The trap may be taken to a remote site for the recovery of the heavy noble gas when it is approaching saturation.
    Type: Grant
    Filed: April 20, 2010
    Date of Patent: March 6, 2012
    Assignee: Linde Aktiengesellschaft
    Inventors: Wilhelm Bayerl, Jim Fieret
  • Publication number: 20110274133
    Abstract: Systems and methods for improved ring laser gyroscope devices through mix ratio optimization are provided. In one embodiment, a ring laser gyroscope device comprises: a laser block assembly having a cavity therein that defines a ring shaped laser beam path around the laser block assembly, the cavity containing a fill gas mixture comprising Helium and Neon, wherein the laser block assembly is characterized as having a Neon depletion life limiter; and a readout assembly optically coupled to the laser block assembly. The readout assembly outputs a laser intensity monitor (LIM) voltage that represents optical energy within the cavity. The fill gas mixture has a Helium to Neon ratio richer in Neon than a ratio that would produce a peak LIM voltage from the readout assembly.
    Type: Application
    Filed: May 5, 2010
    Publication date: November 10, 2011
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Christina M. Schober, Timothy J. Callaghan, Daniel L. Sittler, Leroy O. Thielman
  • Patent number: 7873093
    Abstract: A method and apparatus for carrying out a laser operation, wherein a laser source is provided, wherein lasing gas is supplied from at least one lasing gas source to the laser source for the formation of a laser beam, wherein, with the aid of the laser beam, an operation is carried out, such as for instance a welding, a drilling, a cutting or a lighting operation, wherein the lasing gas which comes from the at least one lasing gas source is fed through at least one lasing gas filter before the gas is supplied to the laser source. The invention further relates to the use of a quick-change filter for cleaning gases consumed in laser processing apparatuses.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: January 18, 2011
    Assignee: Scientific Glass Technology Singapore Pte Ltd.
    Inventor: Marinus Frans van der Maas
  • Patent number: 7835414
    Abstract: A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern.
    Type: Grant
    Filed: April 25, 2007
    Date of Patent: November 16, 2010
    Assignee: Cymer, Inc.
    Inventors: Wayne J. Dunstan, Kevin M. O'Brien, Robert N. Jacques, Herve A. Besaucele, Aravind Ratnam
  • Patent number: 7819945
    Abstract: A method for making a metal fluoride trap including: assembling a precipitation tube assembly including a plurality of precipitation tubes supported between a first tube end support and a second tube end support; assembling a precipitation tube, flowsheet and filter media assembly including: wrapping a flowsheet around at least one full circumference of the plurality of precipitation tubes, wherein the flowsheet has a width less than a length of the plurality of precipitation tubes between the first tube end support and the second tube end support; and wrapping a filter media around the wrapped flowsheet, wherein the filter media and the flowsheet are wrapped so as to have a diameter less than an inner diameter of an outer casing of the metal fluoride trap; inserting the precipitation tube, flowsheet and filter media assembly into the outer casing of the metal fluoride trap; allowing the flowsheet to expand; and pressing the filter media between the flowsheet and an inner surface of the outer casing of the me
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: October 26, 2010
    Assignee: Cymer, Inc.
    Inventors: Richard Morton, Yoshiho Amada
  • Patent number: 7664154
    Abstract: A pressure of a laser gas in an enclosure (7) is detected by a gas pressure sensor (12), and a pressure comparison circuit (13) determines whether the thus-detected pressure is normal or anomalous. An electric current output from an inverter (10) that drives a blower (5) to cause a laser gas to flow back, is detected by a current detection circuit (9). A current comparison circuit (11) determines whether or not the output current is normal or anomalous. A result of a pressure comparison circuit (13) and a result of the current comparison circuit (11) are sent to an AND circuit (15) and performed AND processing. A result of the AND circuit (15), a result of the current detection circuit (9), and a result of the gas pressure sensor (12) are sent to a comparison operation section (17) in a controller (14). A determination is made as to whether or not the blower is anomalous.
    Type: Grant
    Filed: April 21, 2004
    Date of Patent: February 16, 2010
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hiroshi Kurushima, Hitoshi Kidokoro, Masato Matsubara
  • Patent number: 7595463
    Abstract: A laser processing machine includes a measuring cell into which gas to be analyzed can flow, a means for decoupling diagnostic radiation from the laser radiation provided for material processing of a workpiece, and a sound detector for detecting the photo-acoustical effect produced in the measuring cell due to absorption of the diagnostic radiation by gas in the cell.
    Type: Grant
    Filed: August 1, 2003
    Date of Patent: September 29, 2009
    Assignee: TRUMPF Werkzeugmaschinen GmbH + Co. KG
    Inventors: Jürgen-Micheal Weick, Marc Dimiter
  • Patent number: 7580439
    Abstract: A gas laser oscillator appropriately detecting a clogging of a laying pipe of a sub ejection apparatus is disclosed. The gas laser oscillator according to the present invention includes a laser gas flow pipe, a driving part, a divide wall, a main ejection apparatus, a sub ejection apparatus, a detect portion, and a clogged laying pipe judge part. The laser gas flow pipe constitutes a circulating route of the laser gas. The driving part drives the air blower for blowing the laser gas. The divide wall separates the air blower and the driving part. The main ejection apparatus has a valve, and ejects laser gas from the laser gas flow pipe. The sub ejection apparatus ejects laser gas from the driving part. The detector detects an amount of laser gas ejected from the main ejection apparatus and the sub ejection apparatus.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: August 25, 2009
    Assignee: Panasonic Corporation
    Inventors: Hiroyuki Hayashikawa, Hitoshi Hongu, Atsuki Yamamoto
  • Patent number: 7551661
    Abstract: A gas laser oscillator (2) that excites a laser gas to generate laser light includes a circulation path (9) for the laser gas, a circulation means (14) for circulating the laser gas through the circulation path, a pressure detection means (16) for detecting the pressure of the laser gas in the circulation path, an electric power detection means (11) for detecting electric power to drive the circulation means, a storage means (35) for storing the relationship between the pressure of the laser gas and the electric power of the circulation means during the period of normal operation of the circulation means for each kind of the laser gas, and a laser gas determination means (31).
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: June 23, 2009
    Assignee: Fanuc Ltd
    Inventors: Akra Egawa, Eiji Kobayashi, Takeshi Watanabe
  • Patent number: 7529285
    Abstract: A method for the frequency stabilization of a gas laser with a laser tube (1), in stable operation includes a continuous operation control procedure with the following steps: Operating the gas laser for the radiation of laser light; measuring an intensity of one component of the radiated laser light with a detector (8); adjusting a tube temperature of the laser tube (1) by means of a control system (7), so that the measured intensity is controlled to a set-point value. During a startup phase, the procedure includes the following steps: Measuring an ambient temperature; controlling the condition of the laser tube (1) by means of the control system (7) to a set-point state, wherein the set-point state corresponds to a temperature of the laser tube (1) at the measured ambient temperature in the steady condition without any further heating or cooling; and switching over to the continuous operation control.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: May 5, 2009
    Assignee: Leica Geosystems AG
    Inventor: Dietrich Meier