Abstract: A method and device for generating hydrogen and oxygen from water using the heterodyning or impacting of two radio frequencies on the surface of water in a shielded and grounded enclosure, with separation and collection of gases accomplished by a superimposed manifold. One radio frequency is higher than the other, one typically in the ultra high radio frequency bandwidth (UHF) and the other typically in the very high radio frequency bandwidth (VHF). The heterodyning creates two additional radio frequencies that are also used to fracture the water's molecular bonds. The method is clean, odorless, silent, and environmentally friendly, with no residue, fumes, or other unwanted byproducts. Optionally, water filtering means, water heating means, saltwater, and/or fresh water can be used. A water spray can also be used to increase the water surface area available for bond fracture by the radio frequency disturbance.

Abstract: A method and system for material processing employing extracting equivalent fluxes of positive and negative ions at two surfaces from an ion-ion plasma without substantially altering the plasma potential. The extraction is achieved by applying a continuously applied bias to the substrate being processed, in order to attract the ions to the substrate surface to facilitate materials processing such as etching, deposition and chemical modification at the surface. The continuously applied bias is applied via a power source coupled to the plate, also referred to as a stage or chuck, holding the substrate.

Abstract: An integrated getter structure and a method for its formation and installation in a circuit module enclosure (24). The integrated structure includes a hydrogen getter structure (10) and selected quantities of a material (20) that is formulated to provide both a particle getter function and an RF absorber function. In one embodiment, the material (20) is placed in discrete quantities over the hydrogen getter structure (10). In another embodiment, the hydrogen getter structure (10) is formed over a sheet of the material (20) and is provided with apertures (30) to expose the material (20).

Abstract: An apparatus subjects water to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than ?350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 l/hr to about 2000 l/hr. Activated water can be used for many purposes, including antimicrobial cleaning of worktable, floor, wall, knife, transport and other surfaces, for example, in meat processing facilities and hospitals.

Abstract: An apparatus that introduces rapidly spinning vortices in a fluid with a vortex cration device (2) and a frequency generation device (26).

Abstract: An apparatus subjects water to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, substantially bacteria free water and controlled pH. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 35 kHz. Flow rates typically range from 20 l/hr to about 2000 l/hr. Activated water can be used for many purposes, including antimicrobial treatment of drinking water, antimicrobial cleaning of worktables, floors, walls, knives, and other surfaces, for example, in meat processing facilities and hospitals.

Abstract: A plasma reactor (11) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material (34) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material.

Abstract: A reactor including a rotatable disc (3) having first (5, 19) and second (20, 30) surfaces. Reactant (15) is supplied to the first surface (5, 19) by way of a feed (4), the disc (3) is rotated at high speed, and the reactant (15) forms a film (17) on the surface (5, 19). As the reactant (15) traverses the surface (5, 19) of the disc (3), it undergoes chemical or physical processes before being thrown from the periphery of the disc (3) into collector means (7). Means for supplying a heat transfer fluid (35) to the second surface (20, 30) are also provided so as to allow the first surface (5, 19) and hence the reactant (15) to be cooled or heated.

Abstract: The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.

Abstract: A multilayered microfluidic DNA analysis system includes a cell lysis chamber, a DNA separation chamber, a DNA amplification chamber, and a DNA detection system. The multilayered microfluidic DNA analysis system is provided as a substantially monolithic structure formed from a plurality of green-sheet layers sintered together. The substantially monolithic structure has defined therein a means for heating the DNA amplification chamber and a means for cooling the DNA amplification chamber. The means for heating and means for cooling operate to cycle the temperature of the DNA amplification chamber as required for performing a DNA amplification process, such as PCR.

Abstract: The present invention includes an improved electrostatic device for energizing fluids, in particular water based fluids, which will be used to provide a benefit to living organisms, machinery, processes and substances. The improved device of the invention will include an electrostatic voltage spike signal generator, two or more radio frequency signal generators, one or more antennas, optional one or more signal boosters and a fluid conduit. When fluid is treated with the improved device of the invention, the fluid will become energized and can be used to provide significant benefits in applications such as milk production, flower production, fruit production, crop production, vegetable production, shrimp production, egg production, meat production, gasoline combustion, waste fluid combustion, scale removal, water purification, fluid tracking, fluid sterilization and more.

Abstract: The present invention provides a power feedback control system for controllably maintaining a predetermined average power value of a power applied to a plasma of a sterilization system. The power has a frequency of from 0 to approximately 200 kHz. The power feedback control system includes a power monitor including a current monitor and a voltage monitor. The current monitor is adapted to produce a first signal indicative of a current applied to the plasma. The voltage monitor is adapted to produce a second signal indicative of a voltage applied to the plasma. The power monitor is adapted to produce a third signal in response to the first signal and second signal. The third signal is indicative of the power applied to the plasma. The power feedback control system further includes a power control module adapted to produce a fourth signal in response to the third signal from the power monitor and to a reference signal corresponding to the predetermined average power value.

Abstract: A high frequency plasma source includes a support element, on which a magnetic field coil arrangement, a gas distribution system and a unit for extraction of a plasma beam are arranged. Additionally a high frequency matching network is arranged within the plasma source.

Abstract: A device for purifying an exhaust gas contains at least one first and one second component with a respective shell and core through which the exhaust flows, as well as with two front faces each. At least one of the front faces of the first component and at least one front face of the second component has a predetermined profile with elevations and depressions. The elevations of the front face of the first component extend into the depressions of the front face of the second component and vice versa, thereby configuring a penetration section. The first component is disposed electrically insulated from the second component. The components have a potential difference between them and plasma is generated in the penetration section. The compact plasma reactor reduces the pollutant concentration in the exhaust gas of an internal combustion engine operated in the lean mode, especially when combined with an oxidation catalyst.

Abstract: An apparatus subjects fluid waste to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than −350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 1/hr to about 2000 1 hr.

Abstract: A plasma generator includes several plasma sources distributed in an array for plasma treatment of surfaces. Each plasma source includes first and second conductive electrodes. Each second electrode has a gas passage defined therein, and one of the first electrodes is situated within the gas passage in spaced relation from the second electrode, with each gas passage thereby constituting the free space for plasma generation between each pair of first and second electrodes. An insulating layer is interposed between the first and second electrodes to facilitate plasma formation via dielectric barrier discharge (DBD) in the gas passages between the first and second electrodes. The first electrodes may be provided in a monolithic structure wherein they all protrude from a common bed, and similarly the second electrodes may be monolithically formed by defining the gas passages within a common second electrode member.

Abstract: An electrostatically shielded radio frequency (ESRF) plasma apparatus includes a process chamber which encloses a plasma area and a resonator assembly which surrounds the plasma area and includes a coil. The ESRF plasma apparatus also includes a clamping plate which secures the resonator assembly to at least the process chamber. In this manner, the geometry of the resonator chamber can be altered while maintaining the plasma area in an evacuated state. Additionally, an electrostatic shield may be provided and the ESRF plasma apparatus may also be configured such that the electrostatic shield can be replaced while maintaining the plasma area in an evacuated state. Additionally, the resonator assembly may be constructed of sheet metal and may be assembled using standard flanges. Additionally, seals, which are used to seal the plasma area and the resonator assembly, are standard seals.

Abstract: A method and apparatus for maintaining a plasma in a plasma region, by supplying RF power at a fundamental frequency to the plasma region together with a gas in order to create an RF electromagnetic field which interacts with the gas to create a plasma that contains electromagnetic energy components at frequencies that are harmonics of the fundamental frequency. The energy components at frequencies that are harmonics of the fundamental frequency are monitored and controlled by placing a harmonic multiplexer containing a matching network and RF filter elements in energy receiving communication with the plasma.

Abstract: Apparatus for delivering electromagnetic energy into a solution comprises a power source (11), an oscillator crystal (12) and an antenna (14) for transmitting the generated signal into the solution. The solution is water which is used to irrigate plants and flowers for which can be used for consumption by humans or animals or for use in domestic applications.

Abstract: A plasma reactor including a first dielectric having at least one slot defined therethrough, and a segmented electrode including a plurality of electrode segments, each electrode segment is disposed proximate an associated slot. Each electrode segment may be formed in different shapes, for example, a plate, bar, rim, or plug. The electrode segment may be hollow, solid, or made from a porous material. The reactor may include a second electrode and dielectric with the first and second dielectrics separated by a predetermined distance to form a channel therebetween into which the plasma exiting from the slots defined in the first dielectric is discharged. The fluid to be treated is passed through the channel and exposed to the plasma discharge. If the electrode segment is hollow or made of a porous material, then the fluid/gas to be treated may be fed into the slots defined in the first dielectric and exposed therein to the maximum plasma density.

Abstract: An RF driver circuit and an orthogonal antenna assembly/configuration, are disclosed as part of a method and system for generating high density plasma. The antenna assembly is an orthogonal antenna system that may be driven by any RF generator/circuitry with suitable impedance matching to present a low impedance. The disclosed RF driver circuit uses switching type amplifier elements and presents a low output impedance. The disclosed low-output impedance RF driver circuits eliminate the need for a matching circuit for interfacing with the inherent impedance variations associated with plasmas. Also disclosed is the choice for capacitance or an inductance value to provide tuning for the RF plasma source. There is also provided a method for rapidly switching the plasma between two or more power levels at a frequencies of about tens of Hz to as high as hundreds of KHz.

Abstract: A segmented chuck provides uniform processing of a workpiece (e.g., a wafer) with a plasma in a process chamber. The segmented chuck includes a segmented electrode having a plurality of sub-electrodes where the sub-electrodes are electrically isolated from one another by insulating connections and the segmented electrode defines a process surface that is adapted to receive the workpiece. The segmented chuck also includes a plurality of RF drivers for driving the sub-electrodes with RF biases, where the RF biases couple the workpiece with the plasma in the process chamber. By allowing the workpiece to be placed on the chuck, the coupling between the plasma and the workpiece is enhanced. By allowing the sub-electrodes to be independently driven by RF drivers, more uniform processing can be achieved with larger workpieces.

Abstract: A fuel cell cartridge including a thermally-initiated hydrogen fuel source where the fuel cell cartridge is configured to receive radio frequency energy for thermally initiating the fuel source to produce hydrogen gas.

Abstract: A process to prepare stoichiometric-nanostructured materials comprising generating a plasma, forming an “active volume” through introduction of an oxidizing gas into the plasma, before the plasma is expanded into a field-free zone, either (1) in a region in close proximity to a zone of charge carrier generation, or (2) in a region of current conduction between field generating elements, including the surface of the field generation elements, and transferring energy from the plasma to a precursor material to form in the “active volume” at least one stoichiometric-nanostructured material and a vapor that may be condensed to form a stoichiometric-nanostructured material. The surface chemistry of the resulting nanostructured materials is substantially enhanced to yield dispersion stable materials with large zeta-potentials.

Abstract: A process to prepare stoichiometric-nanostructured materials comprising generating a plasma, forming an “active volume” through introduction of an oxidizing gas into the plasma, before the plasma is expanded into a field-free zone, either (1) in a region in close proximity to a zone of charge carrier generation, or (2) in a region of current conduction between field generating elements, including the surface of the field generation elements, and transferring energy from the plasma to a precursor material to form in the “active volume” at least one stoichiometric-nanostructured material and a vapor that may be condensed to form a stoichiometric-nanostructured material. The surface chemistry of the resulting nanostructured materials is substantially enhanced to yield dispersion stable materials with large zeta-potentials.

Abstract: A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulatorcoupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.

Abstract: An electrode assembly connected to a radio frequency electrical power source transforms process gas into plasma for processing a semiconductor substrate. The electrode assembly includes a first and a second electrode made of aluminum (Al), and a third electrode made of silicon (Si). A plurality of first bolts connect the first electrode to the second electrode, and a plurality of second bolts connect the second electrode with the third electrode. The bolts are either mad of or coated with a metal having an electric conductivity that is no less than that of the aluminum (Al). Furthermore, a conductive film and/or adhesive is interposed between the first electrode and the second electrode. The conductive film includes metal having an electric conductivity more than the aluminum (Al). The conductive film and the bolts reduce the electrical resistance throughout the assembly, and the adhesive fills minute apertures in the surfaces of the electrodes.

Abstract: The invention is comprised of an apparatus in form of a single transportable unit, a chamber for the main treatment, with the necessary dimensions to fit the canister drum containing the waste which is to be eliminated, and with the capacity to create and manipulate the direction of the RF plasma flows at a temperature higher than 10.000° K so that it totally surrounds the container, in order to carry out its complete dissociation. The chamber has the capacity to individually collect and select the various materials by species resulting from the dissociation, transporting them by means of the plasma flow generated by an argon gas or other gasses which are injected into the chamber at the far end, where the gas conditioning/separator is situated.

Abstract: Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radicals to form the chemical species at the point of use.

Abstract: A reactor including a rotatable disc (3) having a region (13) in an upper surface (5) thereof. Reactant (15) is supplied to the region (13) by way of a feed (4), the disc (3) is rotated at high speed, and the reactant (15) moves from the region (13) so as to form a film (17) on the surface (5). As the reactant (15) traverses the surface (5) of the disc (3), it undergoes chemical or physical processes before being thrown from the periphery of the disc (3) into collector means (7).

Abstract: An RF driver circuit and an orthogonal antenna assembly/configuration, are disclosed as part of a method and system for generating high density plasma. The antenna assembly is an orthogonal antenna system that may be driven by any RF generator/circuitry with suitable impedance matching to present a low impedance. The disclosed RF driver circuit uses switching type amplifier elements and presents a low output impedance. The disclosed low-output impedance RF driver circuits eliminate the need for a matching circuit for interfacing with the inherent impedance variations associated with plasma. Also disclosed is the choice for capacitance or an inductance value to provide tuning for the RF plasma source.

Abstract: A gas treatment system and method for using the same is disclosed. The gas treatment system, comprises: a non-thermal plasma reactor; and a catalyst composition disposed within said non-thermal plasma reactor, said catalyst composition comprising a MZr4(PO4)6, wherein M is a metal selected from the group consisting of platinum, palladium, ruthenium, silver, rhodium, osmium, iridium, and combinations comprising at least one of said foregoing metals. The process comprises exposing said gas to a plasma field and to the catalyst composition.

Abstract: A system for synthesizing a nano-scaled powder material, including several sub-systems: (A) a chamber for containing nano-scaled cluster generating devices from a material selected from the group consisting of a metal, a metal compound, and a ceramic; (B) a twin-wire electrode device disposed within this chamber with this electrode device including: (i) two wires made up of this material, each having a leading tip and each being continuously or intermittently fed into the chamber in such a fashion that the two leading tips are maintained at a desired separation; and (ii) power supply for providing electric current and gas supply for providing a working gas flow for creating an ionized arc between the two leading tips for melting and/or vaporizing the material to generate nano-scaled clusters; (C) devices for injecting a quench gas and/or a reaction gas into a quenching/reaction zone inside the chamber at a point downstream from the arc to produce nano-scaled powder particles; and (D) devices such as a cyclone

Abstract: A segmented electrode apparatus for use in plasma processing in a plasma chamber or as part of a plasma processing system. The apparatus is composed of a plurality of electrode segments each having an upper surface, a lower surface and a periphery. The lower surfaces of the electrode segments define an electrode segment plane. Further included in the electrode is a plurality of displaceable insulating ring assemblies with a conductive shielding layer in each of them. Each assembly has an insulating body with an upper and lower portion and surrounds a corresponding one of the electrode segments at the electrode segment periphery. Each insulating ring assembly is arranged adjacent another insulating ring assembly and is displaceable with respect thereto and to the corresponding electrode segment. Also included in the electrode apparatus is a plurality of displacement actuators connected to the chamber and to the plurality of insulating ring assemblies at the insulating body upper portions.

Abstract: A multilayered microfluidic device having a substantially monolithic structure is formed by sintering together a plurality of green-sheet layers. The substantially monolithic structure has an inlet port for receiving fluid, an outlet port for releasing fluid, and an interconnection between the inlet port and the outlet port. The substantially monolithic structure may also include a variety of components to enable useful interaction with the fluid, such as electrically conductive pathways, heaters, fluid sensors, fluid motion transducers, and optically transmissive portions. The components are preferably fabricated using thick-film or green-sheet technology and are preferably co-fired with and sintered to the green-sheet layers to become integral with the substantially monolithic structure.

Abstract: A method and apparatus for generating and controlling a plasma formed in a capacitively coupled plasma source having a plasma electrode and a bias electrode, the plasma electrode being composed of a plurality of sub-electrodes that are electrically insulated from one another and the plasma being formed in a plasma region between the plasma electrode and the bias electrode, the plasma being generated and controlled by: coupling RF power to the plasma region via each sub-electrode; and causing the RF power coupled via one of the sub-electrodes to be able to differ in at least one of power, frequency, phase, and waveform from the RF power coupled via another one of the sub-electrodes.

Abstract: The invention relates to an irradiation system for disinfecting water comprising a conduit which is transparent to ultraviolet radiation, a chamber having an annular cross section, disposed around the conduit, the chamber containing an ionizable gas, and a coil disposed around the chamber for ionizing the ionizable gas to produce an ultraviolet emission which propagates into the conduit to disinfect the water flowing through the conduit.

Abstract: The present invention is a method and apparatus for altering a carbon-containing compound in an aqueous mixture. According to a first aspect of the present invention, it has been discovered that for an aqueous mixture having a carbon containing compound with an ozone reaction rate less than the ozone reaction rate of pentachlorophenol, use of corona discharge in a low or non-oxidizing atmosphere increases the rate of destruction of the carbon containing compound compared to corona discharge an oxidizing atmosphere. For an aqueous mixture containing pentachlorphenol, there was essentially no difference in destruction between atmospheres. According to a second aspect of the present invention, it has been further discovered that an aqueous mixture having a carbon-containing compound in the presence of a catalyst and oxygen resulted in an increased destruction rate of the carbon containing compound compared to no catalyst.

Abstract: Fischer-Tropsch (FT) products are formed in a plant utilizing a combination of a plasma reformer reactor (9) and an FT reactor (19). Feedstocks ranging from gases such as methane and natural gas to solids such as petroleum coke and coal are plasma reformed with water and/or CO2 to produce one or more of hydrogen, oils, liquid alkanes and oxygenated alkanes, oil and waxes.

Abstract: Diatomic hydrogen and unsaturated hydrocarbons are produced as reactor gases in a fast quench reactor. During the fast quench, the unsaturated hydrocarbons are further decomposed by reheating the reactor gases. More diatomic hydrogen is produced, along with elemental carbon. Other gas may be added at different stages in the process to form a desired end product and prevent back reactions. The product is a substantially clean-burning hydrogen fuel that leaves no greenhouse gas emissions, and elemental carbon that may be used in powder form as a commodity for several processes.

Abstract: An ozone processing apparatus for a semiconductor processing system includes an ozone generating unit and a reforming processing unit connected to each other through a connection piping section. The ozone generating unit includes an ozone generator and a pressure regulator connected to each other through a piping line. The connection piping section has a double-pipe structure consisting of an inner pipe and an outer pipe. The piping line and the inner pipe are made of a fluorocarbon resin. A branch line branches from the middle of the piping line, and is connected to a factory exhaust passageway. The branch line is provided with a flowmeter and an ozone densitometer. A controller is arranged to control the ozone generator with reference to the value of ozone concentration measured by the densitometer.

Abstract: A plasma dry scrubber may be constructed with a RF generator that applies a high frequency signal, via an impedance matching unit, to first and second antennas provided at upper and lower parts, respectively, of a plasma generator. Gas flowing into the plasma generator is decomposed by magnetic fields generated by the antennas, and the decomposed gas is discharged to a vacuum pump via a gas outlet pipe. The magnetic fields generated by the antennas are distributed more uniformly in a plasma generating chamber so that plasma discharge is accompanied uniformly. Non-conductive isolating plates made of ceramic of quartz isolate the antennas from the plasma generating chamber. The thickness of the isolating plates may be altered, if required, whereby any damage to the plasma dry scrubber due to the pressure from a vacuum pump, is prevented, even if it is used for a long time.

Abstract: Two methods and corresponding electrode designs are provided for the generation of a plasma, for example, at or about one atmosphere. Using these methods, various webs, films and three-dimensional objects are beneficially treated in a reduced amount of time. A first method utilizes a repetitive, asymmetric voltage pulse to generate a plasma discharge between two electrodes. An asymmetric voltage pulse is used to generate a discharge in which a substrate can be exposed predominately to either positive or negative plasma species depending on the voltage polarity used. A second method uses the gap capacitance of an electrode pair and an external inductor in shunt to form a resonant LC circuit. The circuit is driven by a high power radio frequency source operating at 1 to 30 MHz to generate a uniform discharge between the electrode pair. Both methods have temperature controlled discharge surfaces with supply gas temperature, humidity and flow rate control.

Abstract: Articles which it is intended to sterilize are placed into a confined volume and are subjected to neutral species of an electrical discharge while maintaining the volume glowless and substantially field free by interposing a barrier between the articles and the discharge, the barrier being transparent to neutral species and opaque to charged species emanating from the discharge.

Abstract: A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulting member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.

Abstract: A plasma dry scrubber for scrubbing gas comprises a plasma generator, an impedance matching unit, and an RF generator. A high frequency signal generated by the RF generator is fed, via the impedance matching unit, to first and second antennas, which are provided at the upper and lower parts, respectively, of the plasma generator. Gas flowing into the plasma generator is decomposed by means of magnetic fields generated by the first and second antennas, and the decomposed gas is discharged to a vacuum pump via a gas outlet pipe. The magnetic fields generated by first and second antennas are distributed more uniformly in a plasma generating chamber so that plasma discharge is accomplished uniformly. Furthermore, the non-conductive isolating plates are made of ceramic or quartz so as to isolate the first and second antennas, respectively, from the plasma generating chamber.

Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.

Abstract: The subject invention is a commercial device to effectively remove NOx and other pollutants from an exhaust gas stream. Microwave enhancement of oxidation/reduction catalysis is selectively employed as the exhaust gas stream traverses a bed of catalyst particles, which may operate as either a fixed or fluidized bed. An unique feature involves the conventional, non-microwave, conversion of NO to NO2; however, the subsequent reaction of reducing NO2 is microwave enhanced.

Abstract: A system for carrying out microwave assisted chemical reactions is disclosed. The system includes a source of microwave radiation; a cavity in communication with the source, an attenuator in communication with the cavity for providing access to the cavity while preventing microwaves from escaping through the attenuator, and a vessel positioned in the cavity and the attenuator and extending externally of the attenuator for holding materials in the cavity while microwaves from the source are applied thereto. The vessel includes a reaction chamber and a venting portion. The chamber portion is positioned entirely within the cavity, and the venting portion extends from the cavity and through the attenuator and externally of the attenuator and has a gas passage for permitting gases to flow to or from the reaction portion from gas sources external to the cavity, the attenuator, and the vessel.

Abstract: Electrically enhanced filter, includes a filter element, a pair of electrodes sandwiching the filter element, a DC, AC, pulse, or RF power supply coupled to the electrode to create an electrostatic field across the filter element and to produce attracting forces between micro-organisms contained in the air and the filter element, and a power supply creating a sterilizing electrical field, which may be either an RF, DC, pulse, or AC power supply coupled to the electrodes and creating discharging or non-discharging voltages on the filter element to destruct the micro-organisms at and in the vicinity of the filter element.