Abstract: A method for plasma sterilization includes exposing an article to be sterilized to a plasma generated from a gas mixture. The gas mixture being either (a) argon, helium, nitrogen, or mixtures thereof, and oxygen and hydrogen; (b) argon, helium, nitrogen or mixtures thereof, and hydrogen; or (c) argon, helium, nitrogen or mixtures thereof, and oxygen. The exposure of the article to the plasma is carried out at a pressure of from 0.1 to 10 torr and a chamber temperature of less than 63.degree. C. for a time period sufficient to effect sterilization. Contaminated articles can be pretreated in a plasma generated from oxygen and optionally argon, helium and/or nitrogen at the same conditions for up to 5 minutes to remove protein. The apparatus for plasma sterilization of articles includes a plasma generator and a sterilizing chamber. The plasma generator includes a plurality of generator tubes positioned in one or more electromagnetic field zones defined by one or more waveguides.

Abstract: A plurality of workpieces are supported on a workpiece holder disposed over an opening defined in a horizontal base plate and connected to an evacuating device. A reaction chamber, which is supported on an arm of a lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber. A heating device, which is supported on an arm of another lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the heating device surrounds the reaction chamber and a lifted position in which the reaction chamber is exposed out of the heating device.

Abstract: A melting disposal apparatus for injection needles having a unit for generating electromagnetic microwave, unit for generating a plasma discharge with high temperature by being irradiated with the electromagnetic microwave, and moving unit for automatically inserting the injection needle into the zone in which said plasma discharge is produced, and automatically releasing the injection needle from the zone after the injection needle has been molten.

Abstract: A method for effecting sterilization in a plasma of low molecular weight aliphatic alcohol, preferably methanol at pressure levels of from 10 mTorr to 10 Torr at RF energy levels to establish and maintain a plasma for a time sufficient to achieve substantial total microbicidal effectiveness.

Abstract: A process for plasma sterilization including exposing an article in a sterilizing chamber to at least one combination sterilizing cycle. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposing the article to a plasma having essentially uncharged, highly reactive free radicals and atoms.

Abstract: A process for dry sterilization of medical or dental devices and materials in which these materials are subjected to an electrical discharge in a gaseous atmosphere to produce an active low temperature plasma for surface steriliaztion and treatment of the devices and materials.

Abstract: A method for plasma sterilization within a controlled temperature range includes exposing an article in a sterilizing chamber to a gas plasma flowing from a plasma generating chamber until the temperature in the sterilizing chamber rises to a preselected maximum temperature. The flow of the plasma gas to the sterilizing chamber is terminated until the temperature in the sterilizing chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature.

Abstract: A method for flash sterilization with a plasma gas includes exposing an unpackaged article in a sterilizing chamber to a gas plasma flowing from a plasma generating chamber until the temperature in the sterilizing chamber rises to a preselected maximum temperature of at least 100.degree. C. The flow of the plasma gas to the sterilizing chamber is terminated until the temperature in the sterilizing chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature.

Abstract: A process for dry sterilization of medical or dental devices and materials in which these materials are subjected to an electrical discharge in a gaseous atmosphere to produce an active low temperature plasma for surface sterilization and treatment of the devices and materials.

Abstract: A process is provided for sterlizing a web of packaging materials which is to be formed into containers for aseptic packaging. The process comprises contacting the web with aqueous solution of ozone and hydrogen peroxide and subsequently irradiating the surface with ultra-violet radiation.

Abstract: A process for dry sterilization of medical or dental devices and materials in which these materials are subjected to an electrical discharge in a hydrogen peroxide to produce an active low temperature plasma for surface sterilization and treatment of the devices and materials.

Abstract: A microtiter plate containing a plurality of reaction wells for conducting immunogenic reactions wherein the bottom wall of the reaction well has an inner surface which is substantially hydrophilic, and the side wall of the reaction well has an inner surface which is substantially hydrophobic and a process for producing said trays.

Abstract: A process for dry sterilization of medical or dental devices and materials in which these materials are subjected to an electrical discharge in a gaseous atmosphere to produce an active low temperature plasma for surface sterilization and treatment of the devices and materials.

Abstract: An ozone generator utilizes one or more cylindrical anodes having disposed centrally therein an elongated cylindrical dielectric tube. The dielectric tube is filled with an inert gas at low pressure and contains at a first end thereof beyond the encirclement of the anode a relatively short electrode. In a preferred embodiment, the electrode takes the shape of a cone having the small end thereof coupled through the first end of the dielectric envelope to a source of high energy alternating electric power. The large end of the cone is open and directed toward the far end of the dielectric envelope. Electrons are emitted from the electrode and focused down the length of the dielectric envelope, creating an electron haze which induces a variety of electron focusing phenomena in an annular reaction space between the dielectric envelope and the encircling anode.

Abstract: A process for dry sterilization of medical devices and materials in which these materials are subjected to an electrical discharge in a gaseous atmosphere to produce an active plasma for surface sterilization of the devices and materials.

Abstract: A process for dry sterilization of medical devices and materials in which these materials are subjected to an electrical discharge in a gaseous atmosphere to produce an active plasma for surface sterilization of the devices and materials.

Abstract: The fixation of nitrogen by electric arc process is made more efficient by this system which combines a low frequency electric discharge and a catalyst in such a way that an electric arc is formed entirely within a catalyst bed when the reactant gases to be reacted by the arc are admitted to the interior of the catalyst bed and form a cavity there as they expand outward, the bubble-like cavity formed within the mass of catalytic particles thereby providing a type of arc chamber from which plasma state gas particles immediately contact the catalyst particles as the plasma state, gas particles are thrust outwards from the arc zone. After the reactant gases react on catalyst particles, the outward pressure moves the product gases farther through the catalyst bed where the products are then shielded from destructive ultraviolet light from the arc.

Abstract: A compact load lock and processing chamber is disclosed in which a moveable member forms a closure for both a load lock volume and an article processing volume. The moveable member is connected to fixed members by a flexible diaphragm which provides a non-sliding seal.

Abstract: A low temperature plasma reactor for the treatment of particulate material. A housing is provided having an exit for treated material. Within the housing, the particulate material, and any desired additional reactants, undergo thermo-chemical reaction while being subjected to cyclonic action. The particulate material migrates or is driven toward the housing walls as it travels through the housing toward the housing exit. A plasma generator subjects that material that passes through the housing exit to plasma action. In a preferred embodiment, the housing includes a first portion wherein the cyclonic conditions are established, a throat portion through which treated material exits the housing and an adaptive portion extending between the first portion and the throat portion.

Abstract: A parallel plate plasma reactor is disclosed in which the lower electrode comprises a metal electrode having a central pedestal and an insert for surrounding the pedestal and holding wafers in contact with the pedestal or in position above the pedestal. The insert can comprise an insulator, such as ceramic, or a metal.

Abstract: A microtiter plate for blood typing consisting of a flat-bottomed plate of rigid transparent polystyrene having a plurality of wells, the polystyrene being surface treated by a corona and/or plasma method of applying high power electric energy at high frequency resulting in a permanently measurable negative ion-charge at the surface of the wells, and layers of substantially pure antiserums dried on the wells without any binder from a suspension or solution of the antiserums and tightly but releasably bound to the polystryene.

Abstract: The present invention relates to a plasma processing apparatus comprising a housing chamber which accommodates substances to be painted made of synthetic resin, a rotating support base which is provided in the housing chamber and rotates the substance to be painted, a plurality of hangers which are placed on the rotating support base and supports the substance to be painted, at least one plasma injection tube which is provided in the housing chamber and giving plasma processing to the surface of substance by injecting plasma gas thereto, and a variable speed drive means which rotates the rotating support base at the speed in accordance with a size and a number of substances to be painted.

Abstract: A plasma reactor is described in which radially outward and radially inward gas flows are adjusted to maintain uniformity for different wafer sizes and to compensate for loading effects. Inlet ports are provided about the sides of a reactor chamber and at a central position in the top of the chamber, the latter being provided with a flared, tubular structure. Exhaust ports are located about the sides of the chamber. The gas flow from the side inlet ports may have a tangential component.

Abstract: Disclosed ia a plasma etching apparatus in which an etching chamber accomodates a pair of parallel flat plate electrodes facing each other. The etching chamber is also provided with a device for applying high frequency power to one of the electrodes and a system for introducing a reactive gas. An after-treatment chamber is connected to the etching chamber and provided with a system for introducing a heated gas into the interior, a partition means for hermetically partitioning the etching chamber and after-treatment chamber, and a system for transporting the workpiece in the etching chamber into the after-treatment chamber.

Abstract: A method for removing photoresist from a substrate. A substrate to be stripped of photoresist is placed in a metal substrate holder or boat which is subsequently loaded into a plasma reactor. The holder is placed in contact with one electrode of the plasma reactor. The plasma reactor is evacuated and a hydrogen bearing gas is injected into the reactor at a rate to maintain the pressure between 0.1 and 10 Torr. The photoresist coated substrate is heated to a temperature between 100.degree. C. and 225.degree. C. Power is applied to the plasma reactor to create a hydrogen plasma which reacts with and removes the photoresist. During the removal operation the reflected power from the reactor is monitored to detect the end point of the plasma-photoresist reaction.

Abstract: The quality of a plasma etching process is improved by applying a DC potential (28') to one of the energizing electrodes (12') in the reaction chamber (11').The DC potential withdraws a small current from the plasma which causes the reaction to produce a uniform, controllable self-bias on the workpiece placed on the opposite (or second) electrode.

Abstract: Molecules are tritiated by depositing molecules of a substance to be tritiated on a supporting substrate in a vacuum chamber, and then subjecting the substance to low pressures of tritium gas. In a second embodiment of the invention, a substance is tritiated by placing the same near, but not in the path of, an electron beam which traverses a chamber; admitting tritium gas into the chamber; and subjecting the tritium to the electron beam thereby generating vibrationally excited tritium gas molecules which collide and react with the substance thus incorporating tritium atoms into the substance.