Abstract: A method for making apertures in a web comprising providing a precursor web material; providing a pair of counter-rotating, intermeshing rollers, wherein a first roller comprises circumferentially-extending ridges and grooves, and a second roller comprises teeth being tapered from a base and a tip, the teeth being joined to the second roller at the base, the base of the tooth having a cross-sectional length dimension greater than a cross-sectional width dimension; and moving the web material through a nip of the counter-rotating, intermeshing rollers; wherein apertures are formed in the precursor web material as the teeth on one of the rollers intermesh with grooves on the other of the rollers.

Abstract: The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.

Abstract: An imprint apparatus that includes a holding unit, and performs an imprint process, including molding of an imprint material on a substrate held by the holding unit using a mold, curing of the molded imprint material, and releasing of the cured imprint material from the mold, to form a pattern on the substrate. The apparatus includes a first cure device configured to perform a first cure process for the imprint material molded by the mold prior to the releasing; and a second cure device configured to perform a second cure process for the imprint material on the substrate conveyed out from the holding unit after the releasing.

Abstract: An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.

Abstract: A method for forming a diffraction grating includes the steps of preparing a mold including a pattern portion having a pattern for forming a diffraction grating; forming a first semiconductor layer on a substrate; forming a resin layer on the first semiconductor layer; pressing the pattern portion of the mold against the resin layer; forming the pattern for the diffraction grating in the resin layer by curing the resin layer; and forming the diffraction grating in the first semiconductor layer by etching the first semiconductor layer using the patterned resin layer. The mold includes a first base and a plurality of second bases disposed on the first base. The first base is made of a flexible material. The second base is made of a rigid material. The plurality of second bases each include the pattern portion and are spaced apart from each other with a predetermined distance.

Abstract: According to one embodiment, a mold includes a base material, a pedestal portion and a pattern portion. The base material includes a first surface and a second surface. The pedestal portion protruded from the first surface of the base material and includes a side surface. The pattern portion is provided in the pedestal portion and includes an concave-convex pattern. The pedestal portion includes a first region and a second region. The first region is provided with the concave-convex pattern. The second region is provided between the first region and the side surface. The second region has maximum height equal to maximum height of the first region. The second region has a first height of the second region on the side surface side and a second height of the second region on the first region side. The first height is lower than the second height.

Abstract: A surface of a mold for an imprint apparatus on a side of a substrate includes a central region having the pattern, and a pair of first peripheral regions. The central region includes a pair of boundaries parallel to a first direction. The pair of first peripheral regions are located outside the pair of boundaries parallel to the first direction. The pair of first peripheral regions include first regions in which mold-side marks are formed and second regions in which no mold-side marks are formed. A gap between the first regions and the substrate is not filled with a resin upon an imprint process. A gap between the second regions and the substrate is filled with the resin upon an imprint process. The first regions and the second regions are opposed to each other on opposite sides of the central region.

Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.

Abstract: A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.

Abstract: The present invention is directed to a microstructure film comprising an area of microstructures and two edge areas, wherein the height of the highest part in the edge areas exceeds the height of the highest point in the microstructures, preferably by about 1 ?m to about 1 mm. The application also describes how such a film may be manufactured.

Abstract: According to one embodiment, a patterning method includes releasing the template from the cured imprint resist, aligning an alignment mark formed in the non-imprint portion of the template with the transfer pattern of the alignment pattern without causing the alignment mark to contact the imprint resist, and causing the main pattern and the alignment pattern of the template to contact an imprint resist that is supplied to a shot region adjacent to the cured imprint resist and uncured. The method includes curing the imprint resist of the adjacent shot region in the state of the template being in contact to form the transfer pattern of the main pattern and the transfer pattern of the alignment pattern in the imprint resist.

Abstract: The invention discloses a mold performing in the micro/nano imprint fabricating process, wherein the mold is utilized to imprint a pattern on a substrate via a material layer. The mold comprises an upper surface, a lower surface, a pre-determined structure and an overflow controlling device. The upper surface and the lower surface are corresponded to each other. The pre-determined structure is disposed on the lower surface of the mold. The overflow controlling device is utilized to maintain the pressure among the material layer and the substrate.

Abstract: A laminate nanomold includes a layer of perfluoropolyether defining a cavity that has a predetermined shape and a support layer coupled with the layer of perfluoropolyether. The laminate can also include a tie-layer coupling the layer of perfluoropolyether with the support layer. The tie-layer can also include a photocurable component and a thermal curable component. The cavity can have a broadest dimension of less than 500 nanometers.

Abstract: The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.

Abstract: A transfer device includes a holding body that holds a molded material; a first roller that holds, together with the holding body, a wound mold and the molded material held by the holding body so as to carry out a transfer, and rotates about a central axis to move with respect to the holding body; and a second roller on which the mold extending from the first roller is wound in a direction away from the molded material held by the holding body, the second roller rotating about a central axis to relatively move together with the first roller.

Abstract: A method of forming a template for use in imprint lithography. The method comprises providing an ultraviolet (“UV”) wavelength radiation transparent layer and forming a pattern in the UV transparent layer by photolithography. The pattern may be formed by anisotropically etching the UV transparent layer and may have feature dimensions of less than approximately 100 nm, such as dimensions of less than approximately 45 nm. An additional embodiment of the method comprises providing a UV opaque layer comprising a first pattern therein, forming a first UV transparent layer in contact with the first pattern of the UV opaque layer, forming a second UV transparent layer in contact with the first UV transparent layer, and removing the UV opaque layer to form the template. An intermediate template structure for use in imprint lithography is also disclosed. In other embodiments, a template that is opaque to UV wavelength radiation and a method of forming the same are disclosed.

Abstract: Positive and negative stamp masters derived from UV curable ink molds comprising ultraviolet (UV) curable inks and methods for digitally preparing those stamp masters. In particular, the digitally prepared molds provide a method of printing micropatterns of fine variable features or images in a more efficient manner than the methods currently available.

Abstract: The invention concerns a device for stiffening a flat component, a process for the production of a flat component, in particular a fiber composite component, and a fiber composite component. The device has a portion for producing a space for receiving a mold core for the transmission of a pressure for pressing the flat component and the device. It is characterised by means for positively lockingly and/or frictionally lockingly positioning the mold core in the space of the device. The process according to the invention includes the following steps: introducing the mold core into the portion of the device, positively lockingly and/or frictionally lockingly positioning the mold core in the portion of the device by means of the means, applying the device including the mold core to the non-hardened material layer or layers, pressing the material layers, and hardening the material layer or layers and joining the device to the material layer or layers.

Abstract: The embossing unit includes at least one embossing roller with a rotation axis and a substantially cylindrical surface with a plurality of embossing protuberances with linear extension; a pressure roller with a yielding surface; an embossing nip defined between the pressure roller and the embossing roller; a feed path of a web material extending through said the embossing nip. Along the linear extension thereof the embossing protuberances have a variable inclination with respect to the rotation axis of the embossing roller and a variable cross section along the longitudinal extension of the embossing protuberances.

Abstract: A template formed of an optically-transparent material according to an embodiment includes a contact surface which contacts a resist material, a concave portion for resist pattern formed on the contact surface in which the resist material is filled and cured so as to form a resist pattern part, and a concave portion for alignment mark formed on the contact surface which is used for an optical alignment of the template, includes an opening and a bottom portion and has a shape that an area of the opening is larger than that of the bottom portion or a shape that a depth thereof is deeper than that of the concave portion for resist pattern.

Abstract: Disclosed is an active energy ray-curable resin composition comprising 3 to 18 parts by mass of an alkyl (meth)acrylate (A) having an alkyl group of 12 or more carbon atoms, and 82 to 97 parts by mass of a multifunctional monomer (B) having 3 or more radical polymerizable functional groups in the molecule wherein the sp value as expressed by the Fedor's estimation method is 20 to 23, per 100 parts by mass of the total content of all monomers, and which gives a cured material having excellent water repellency and scratch resistance; and a molded article, a fine uneven structure body and a water-repellent article prepared by using the active energy ray-curable resin composition; and a method for producing a fine uneven structure body.

Abstract: A light guide pate includes: a light guide member with a light incident surface and first and second principal surfaces; and first and second protrusions formed on at least one of the first and second principal surfaces. When the first principal surface is viewed in a normal direction, a distance between the light incident surface and the second protrusion is larger than a distance between the light incident surface and the first protrusion; each of the first and second protrusions has a shape, a length of which in an orthogonal direction orthogonal to a propagation direction of light incident from the light incident surface increases monotonously in the propagation direction; and a minimum value of the length of the second protrusion in the orthogonal direction is larger than a maximum value of the length of the first protrusion in the orthogonal direction.

Abstract: A nano-imprint mold includes a mold body having a first surface provided with a pattern having projections and recesses, a second surface opposite the first surface and a side surface between the first surface and the second surface; and a mold base having a surface for fixing the mold body thereto. In addition, the second surface of the mold body is fixed to a part of the surface of the mold base, the second surface of the mold body being disposed away from at least a part of an edge of the surface of the mold base. Furthermore, the mold body has a shape such that a width thereof in a direction orthogonal to a direction extending from the first surface toward the second surface decreases from the first surface toward the second surface.

Abstract: Provided is an imprint product, which is for transcribing a fine pattern of a mold surface and which contains a fluorine-containing cyclic olefin polymer containing repeating unit represented by formula (1) and having a fluorine atom content rate of 40% to 75% by mass.

Abstract: A drum is provided having a peripheral surface with texture features thereon. The texture features may be a plurality of grooves for applying riblets to an airfoil surface. Methods of using the drum are also provided.

Abstract: A stamping apparatus for stamping a shading film includes a stamping head, at least one locking member and a sleeving ring. The sleeving ring defines an axial sleeving hole and includes a stamping portion formed on a distal end thereof and surrounding the axial sleeving hole. The sleeving ring is detachably sleeved on and locked to the stamping head via the at least one locking member. The stamping portion matches with the stamping head for cooperatively stamping the shading film.

Abstract: A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the template and/or substrate may be varied based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance.

Abstract: One embodiment of a method of manufacturing a textured surface may include providing a first thermally stable sheet, printing a pattern of material on the first sheet to form a three-dimensional textured surface, and curing the material, then using said first sheet to impart negative texture into Tedlar faced epoxy composite blanket, which is in turn used to impart texture into a decorative laminate.

Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.

Abstract: A nanoimprinting mold has a fine pattern of protrusions and recesses constituted by a plurality of linear protrusions and a plurality of recesses on the surface thereof. The pattern of protrusions and recesses includes at least one recess having an end portion of a predetermined shape. The predetermined shape is that which has a cross section with a smaller aspect ratio than an aspect ratio of a cross section of a connecting portion, which is a portion of the recess having the end portion other than the end portion and continuous therewith. Thereby, the collapse of the end portions of protrusions of a pattern on curable resin when a mold is pressed against the curable resin on a substrate then separated therefrom can be suppressed, in nanoimprinting that employs a mold having a predetermined fine pattern of protrusions and recesses on the surface thereof.

Abstract: In a nanoimprinting method, an assembly, of which the entire surface is directly exposable to the environment, is supported by a pressure vessel by a support member such that fluid pressure from the environment operates on the entire surface of the assembly. Gas is introduced into the pressure vessel, and fluid pressure exerted by the gas presses a mold and a substrate against each other. Thereby, pressing with uniform pressure onto a curable resin coated surface can be realized in nanoimprinting that employs a mesa type mold and/or a mesa type substrate to be processed, and the occurrence of residual film fluctuations can be suppressed.

Abstract: A microfluidic system, particularly suited as a cell culture system, is provided having a single monolithic biocompatible substrate with both a surface having an ordered array of nano-scale elements required for plasmonic response monitoring and a network of microchannels for precisely controlling cellular environment. The system has the additional advantages of low-volume consumption, rapid low-cost fabrication of molds with easily interchangeable microfluidic channel layouts, amenability to mass production, and in situ label-free real-time detection of cellular response, viability, behavior and biomolecular binding using plasmonic techniques. A ratio of greater than 0.2 between the cross-sectional dimension and the spacing distance of the nano-scale elements is useful for plasmonic response monitoring.

Abstract: A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.

Abstract: Disclosed herein is a medical elongate member including a elongate base material, a resin layer formed to coat or to be integral with the surface of at least a part of the base material, and a plurality of projections dispersed uniformly in a surface of the resin layer.

Abstract: Precision embossing press. The press includes a rigid symmetric box frame and upper and lower parallel embossing platens mounted within the box frame for movement towards one another to provide an embossing compressive force on a work piece between the platens while maintaining parallelism between the platens. A thermal system controls platen temperature to heat the work piece for embossing and to cool the work piece for de-molding. A pneumatic actuator moves the lower platen toward the upper platen to emboss the work piece. A closed loop control system employing feedback and feed forward control loops controls platen temperatures and embossing force.

Abstract: Nanoimprint molds for molding a surface of a material are provided. A nanoimprint mold includes a body with a molding surface that is formed by shaped nanopillars. The nanopillars may be formed on a substrate and shaped by performing at least a first partial oxidation of the nanopillars and then removing at least a portion of the oxidized material. Once shaped, a hard substance is deposited on the nanopillars to begin forming the molding surface of the nanoimprint mold. The deposition of a hard substance is followed by the deposition of carbon nanotube on the hard substance and then the removal of the substrate and nanopillars from the molding surface.

Abstract: The pattern transfer apparatus includes: a liquid ejection device having liquid ejection ports through which droplets of liquid are ejected and deposited onto a substrate surface while the liquid ejection device relatively moves to scan the substrate surface in a relative scanning direction; and a stamp having a stamp surface on which a pattern is formed, the stamp surface being applied to the droplets of the liquid on the substrate surface in a stamp application direction while the stamp is relatively moved with respect to the substrate, wherein when defining, on the substrate surface, strips which are straight and parallel to the stamp application direction and have widths substantially equal to diameters of the droplets deposited on the substrate surface, at least one of the strips includes the droplets which are ejected respectively from at least different two of the liquid ejection ports of the liquid ejection device.

Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.

Abstract: A demolding device (7) transfers a fine transfer pattern formed on a sheet-shaped mold to a molded product, and then detaches the sheet-shaped mold, which adheres to the molded product, from the molded product. The demolding device (7) includes a molded product holder (19) placed in a location away from a transfer device (5) and configured to hold a molded product (W) out of a mold (MA) and the molded product (W) adhering to each other, and a detaching roller unit (23) on which the mold (MA) adhering to the molded product (W) held by the molded product holder (19) is wound, and which is configured to move relative to the molded product holder (19) and thereby to detach the mold (MA) from the molded product (W).

Abstract: According to one embodiment, a pattern forming method is disclosed. The method can include forming an insulating layer on a major surface of a substrate. The method can include forming first and second openings on the insulating layer. The first opening has a first length in a first direction along the major surface, and the second opening has a second length longer than the first length in the first direction. The method can include forming a first pattern in the first opening. The method can include forming a second pattern in the second opening. The method can include forming a self-assembled material film contacting the insulating layer, the first pattern and the second pattern. The method can include forming a third pattern with guidance of the second pattern. In addition, the method can include forming a fourth pattern contacting the first pattern based on the third pattern.

Abstract: An imprint apparatus which brings a mold into contact with a resin coated on a substrate, and cures the resin, includes a substrate stage including a substrate chuck which holds the substrate, and a gas flow forming section arranged on the substrate stage so as to form a gas flow on the substrate. The gas flow forming section includes a blower which blows a gas in a direction which intersects with a plane parallel to an upper surface of the substrate, and a changing section which changes a direction, in which the gas blown by the blower flows, so that the gas flows along the upper surface of the substrate. The changing section has a maximum height higher than a height of the upper surface of the substrate held by the substrate chuck.

Abstract: A method of producing a nanopattern on an upper side and a lower side of a disc.

Abstract: Positive and negative stamp masters derived from UV curable ink molds comprising ultraviolet (UV) curable inks and methods for digitally preparing those stamp masters. In particular, the digitally prepared molds provide a method of printing micropatterns of fine variable features or images in a more efficient manner than the methods currently available.

Abstract: A filter element is disclosed having at least one mat-type or sheet-type filter web (3), which forms by its outside (5) at least in part a filter jacket (7) that is closed on the peripheral side, wherein along the outside (5) of the filter jacket (7) a surface configuration or modification takes place in such a manner that structures (11) that are delimited from the remaining surface (9) of the filter web (3), are joined to the filter jacket (7) and are of presentable contour and/or thickness are created, wherein the structures (11) are generated by spray-fibre application and shaping, in such a manner that in time sequence, first the structures (11) and then the filter jacket (7), or in reverse order in time sequence, first the filter jacket (7) and then the structures (11), or that simultaneously both the filter jacket (7) and the structures (11) are formed in negative or positive shape on the filter jacket (7).

Abstract: Optical films having anti-Moiré and anti-wetout features are described, along with systems and methods for making these optical films. A master used to make optical films is formed using a single axis actuator cutting along a trajectory that is out of plane with the surface of the master. Movement of the cutting tool along the trajectory cuts grooves having variable depth and variable pitch into the surface. Prisms formed from the master have variable depth, variable height prisms that provide anti-wetout and anti-Moiré features.

Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.

Abstract: The present invention provides an imprint apparatus which performs an imprint process in which a resin on a substrate is cured while a mold having a pattern formed thereon is pressed against the resin to transfer the pattern onto the substrate, the apparatus comprising a changing unit which includes a contact member having a contact surface that comes into contact with a side surface of the mold, and is configured to apply a force to the side surface of the mold through the contact member to change a shape of the pattern formed on the mold, and an adjusting unit configured to change at least one of an angle and a position of the contact member to adjust a contact state between the contact surface and the side surface of the mold.

Abstract: A method for producing a mold includes: applying a block copolymer solution made of first and second polymers on a base member; performing a first annealing process at a temperature higher than Tg of the block copolymer after drying the coating film; forming a concavity and convexity structure on the base member by removing the second polymer by an etching process; performing a second annealing process of the concavity and convexity structure at a temperature higher than Tg of the first polymer; forming a seed layer on the structure; laminating or stacking a metal layer on the seed layer by an electroforming; and peeling off the metal layer from the base member. The second annealing process enables satisfactory transfer of a concavity and convexity structure on the base member onto the metal layer.

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

Abstract: A template system, and a nano-imprint method using the same, include a template having a nano-pattern and configured to transfer the nano-pattern to a resin material on a substrate, and a pressure controlling apparatus configured to change a pressure of the template with respect to the substrate according to an intensity of bubbles captured between the substrate and the template.