Abstract: The procsses disclosed is for preparing a film of fluorine-modified tungsten oxide on a substrate. The process comprises providing a tungsten oxide film on the substrate and then exposing the tungsten oxide film at an elevated temperature to a stream of a gaseous fluorocarbon. The exposure takes place for a time sufficient to modify the tungsten oxide with fluorine and form a film having modified infrared adsorption and reflectant properties.

Abstract: Fluorine-doped tungstic oxide is prepared by reacting together tungsten hexafluoride, an oxygen-containing compound, and a fluorine-containing compound.

Abstract: Glazing article comprises a substrate bearing a substantially transparent coating comprising an optically functional layer and a thinner anti-iridescence layer undercoat mediate the optically functional layer and the substrate. The anti-iridescence layer eliminates or substantially reduces iridescence and, in addition, is readily designed to make the overall coating colorless or to provide a substantially uniform, muted color. The anti-iridescence layer comprises a high refractive index zone on the substrate, having a refractive index higher than that of the substrate. Multiple gradient step zones are stacked on the high refractive index zone, including a low refractive index zone. A second gradient step zone having a refractive index higher than that of the first gradient step zone is positioned on the low refractive index zone, such that the low refractive index zone is directly sandwiched between the two higher refractive index zones.

Abstract: Thin, uniform films of niobium and tantalum complex metal oxides are deposited by chemical vapor deposition onto a substrate by vaporizing a single source precursor containing metal M' ions and metal M" ions, where metal M' is Li, Na, or K and metal M" is Nb or Ta, and contacting the vapor with the substrate at a temperature sufficiently high to decompose the precursor and form an M'M" metal oxide.

Abstract: Thin, uniform films of complex metal oxides are deposited by chemical vapor deposition onto a substrate by vaporizing a single source precursor containing metal M' ions and metal M" ions, where metal M' is Li, Na, K, Ba, Mg, Ca, Sr, or Pb, and metal M" is V, Nb, Ta, or Ti, and contacting the vapor with the substrate at a temperature sufficiently high to decompose the precursor and form an M'M" metal oxide.

Abstract: The present invention is related to an organic composite. This organic composite comprises a substrate having an organic material surface and a film formed on the substrate by such plasma CVD method. Said organic material have an unsaturated bond of carbon. This organic composite gives an improved performance in an adhesion between the film and the substrate.

Abstract: Thin, uniform films of complex metal oxides are deposited by chemical vapor deposition onto a substrate by vaporizing a single source precursor, which is the reaction product of a metal M' beta-diketonate and a metal M" alkoxide, where metal M' is Li, Na, K, Ba, Mg, Ca, Sr, or Pb, and metal M" is V, Nb, Ta, or Ti, and contacting the vapor with the substrate at a temperature sufficiently high to decompose the precursor and form an M'M" metal oxide. Alternatively, compounds in which a M" metal is attached to a beta-diketonate, and an M' metal is attached to an alkoxide, are used to form the reaction product vapor precursor.

Abstract: The invention concerns a method and apparatus for producing a carbon coated optical fiber. An optical fiber is drawn through a reactor tube. Reactant gas is flowed into the tube and onto the fiber where it reacts to form a carbon coating on the fiber. The reactant gas and reaction products are flowed in the direction of movement of the fiber and out of an end of the tube and into a receiving chamber having a diameter larger than that of the reaction tube. The reactant gas continues to react as it flows through the tube and after it exits the tube. At least some of the reaction product deposit on the surface of the receiving chamber where it has no adverse effect on the draw process.

Abstract: A glazing article comprises a substrate bearing a substantially transparent coating comprising an optically functional topcoat and a thinner anti-iridescence layer undercoat mediate the topcoat and the substrate. The anti-iridescence layer eliminates or substantially reduces iridescence and, in addition, is readily designed to make the overall coating either colorless or to provide a substantially uniform muted color. The anti-iridescence layer comprises a first thickness zone in which the refractive index is higher than that of the substrate. A low refractive index zone is positioned directly on the high refractive index zone. A second high refractive index zone is positioned on the low refractive index zone, such that the low refractive index zone is directly sandwiched between the two high refractive index zones. A fourth zone, a low refractive index zone, follows the second high refractive index zone.

Abstract: A film pattern of a desired material is formed on a substrate by forming a pattern of powder of inorganic material on the substrate, forming at least a single layer of film of desired material on the substrate on which the pattern of the powder of inorganic material is formed so that a part of the film of the desired material is formed on at least a part of the pattern of the powder of inorganic material, and mechanically removing the pattern film of the powder of inorganic material together with a part of the film of the desired material formed thereon.

Abstract: Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.

Abstract: The invention is method of forming a multi-color luminescent display including the steps of depositing on an insulator substrate a smooth single layer of host material which itself may be a phosphor with the properties to host varying quantities of different impurities and introducing one or more of said different impurities into selected areas of the single layer of host material via an appropriately positioned mask as by thermal diffusion or ion-implantation to form a pattern of phosphors of different colors in the single layer of host material such that the top surface of the host layer remains smooth. Red phosphors are formed by adding impurities selected from the group consisting of Sm, SmF.sub.3, Eu, EuF.sub.3, and ZnS:MnTbF.sub.3 to a ZnS host; green phosphors by adding impurities selected from the group consisting of Tb and TbF.sub.3 to a ZnS host; and blue phosphors by adding impurities selected from the group consisting of Tm, Al, Ag and Mg to a ZnS host.

Abstract: Active matrix addressed liquid crystal TV sets configurated in the way described by A. G. Fischer in U.S. Pat. No. 3,840,695 can be enlarged to monolithic square-meter-sized wall TV panels. The large-area thin-film-electronic matrix circuit needed to address the superimposed liquid crystal layer can be vacuum-deposited from a multiple source evaporator onto one coherent glass pane through a number of small reticulated perforated sheet metal masks which are held successively against a chosen reticle of the large glass pane, in exact registration with each other and neighbouring reticles. The large glass pane must be precision-shifted in X-Y-reticle-steps for repeated vacuum depositions, in exact registration. The machinery required is described.

Abstract: Disclosed is a metalorganic chemical vapor deposition (MOCVD) process of depositing an indium oxide or an indium/tin oxide film on a substrate using indium alkyl etherate or indium alkyl etherate and organotin compound precursors, respectively.

Abstract: Process for the storage of information in an organic recording layer which, as the result of local treatment of its surface with an organic solvent in accordance with the shape of the information to be marked can alter its absorption spectrum and/or its photoconductivity in such a way that information is produced and stored respectively at the treated areas of this layer. The information thus stored can be read off visually, by means of a micro-reader or by means of an incorporated electrode system.

Abstract: An atmospheric pressure chemical vapor deposition (APCVD) system for doping indium-oxide films with both tin and fluorine to produce dual electron donors in a non-batch process. The APCVD system has a conveyor belt and drive system for continuous processing through one or more reaction chambers separated by nitrogen purge curtains. A substrate passing through the system enters a muffle heated by several heaters and the reaction chambers are supplied by a source chemical delivery system comprising an oxidizer source, a fluorine chemical source, a nitrogen source, rotometers for the above sources, a mass flow controller, a tin chemical bubbler, heated lines, an indium chemical bubbler, a pair of water baths with heaters, and associated valving.

Abstract: A process for preparing an electroluminescent device includes the steps of forming an insulating layer and a luminescent layer on a substrate, wherein the insulating and luminescent layers are respectively formed at different forming areas in the same deposition chamber.

Abstract: A method for manufacturing edge emission type EL device arrays is disclosed. The method initially involves depositing a first and a second lower electrode layer of different properties. The second lower electrode layer is patterned into a common electrode arrangement conductive to a plurality of edge emission type EL devices. On top of the first and second lower electrode layers, an EL device layer and an upper electrode layer are deposited. The first lower electrode layer is patterned together with the EL device layer and upper electrode layer into a plurality of edge emission type EL devices. The parts ranging from the top edge of the light-emitting edges for the EL devices to the inside of the substrate are etched. This provides a highly smooth light-emitting edge for each EL device.

Abstract: The invention is a multi-color luminescent display 10 comprising an insulator substrate 11 and a single layer of host material 13 which may be a phosphor deposited thereon that hosts one or more different impurities 14, therein forming a pattern of selected and distinctly colored phosphors such as blue, green and red phosphors in the single layer of host material 13. Transparent electrical conductor means 12 may be provided for subjecting selected portions of the pattern of colored phosphors to an electric field thereby forming a multi-color, single layer electroluminescent display.

Abstract: A textured layer of tin oxide on a vitreous substrate in which the thickness and degree of texture of the layer can be controlled independently of one another. The tin oxide fabricated by a process comprising steps of depositing a first film of tin oxide on the substrate by chemical vapor deposition from a first reactant mixture of tin chloride, water, and an alcohol and depositing a second film of tin oxide on the first tin oxide film by chemical vapor deposition from a second reactant mixture of tin chloride and water. Where the substrate is ordinary soda lime glass, it preferably is first coated with a film of silicon dioxide. The process permits deposition of substantially uniform layers of tin oxide in a continuous deposition process.

Abstract: A method for producing coatings on a heated substrate, preferably glass, comprises pretreating the substrate with a gaseous composition of water, air and a fluorine compound, and thereafter depositing a fluorine-doped tin-oxide coating on the substrate.

Abstract: A coated object comprising a glass substrate and an organomineral film, such as an organosilicon compound, deposited upon at least a portion of the glass substrate wherein the coating is of a sufficient thickness and has a sufficient refractive index so as not to absorb energy within the visible spectrum. The object may additionally comprise at least one coating layer interposed upon the substrate beneath the organomineral film to improve the optical properties of the coated object. A method for making the coated object of the invention is described wherein a plasma deposition process is utilized to deposit the organomineral film upon the surface of the glass or glass-based substrate.

Abstract: Thin film coatings for solid state storage batteries and electrochromic energy conservation devices are now formed on low temperature glass and plastic substrates by an ion-assisted RF deposition process. The attachment of such coated glass or plastic substrates to existing windows in situ allows ordinary plate glass windows in homes, office buildings and factories to be converted to "smart-windows" resulting in a substantial savings in heating and air conditioning costs.

Abstract: High phosphorus polyphosphides, namely MP.sub.x, where M is an alkali metal (Li, Na, K, Rb, and Cs) or metals mimicking the bonding behavior of an alkali metal, and x=7 to 15 or very much greater than 15 (new forms of phosphorus) are useful semiconductors in their crystalline, polycrystalline and amorphous forms (boules and films). MP.sub.15 appears to have the best properties and KP.sub.15 is the easier to synthesize. P may include other pnictides as well as other trivalent atomic species. Resistance lowering may be accomplished by doping with Ni, Fe, Cr, and other metals having occupied d or f outer electronic levels; or by incorporation of As and other pnictides. Top contacts forming junction devices doped with Ni and employing Ni as a back contact comprise Cu, Al, Mg, Ni, Au, Ag, and Ti. Photovoltaic, photoresistive, and photoluminescent devices are also disclosed. All semiconductor applications appear feasible.

Abstract: An alignment layer for a liquid crystal display device provides optimum molecular alignment, tilt angle and resistivity by depositing a glow discharge layer comprised of carbon, nitrogen, and hydrogen onto the electrodes of the liquid crystal cell.

Abstract: The method of making an electrically conductive polymer-metal compound having a predetermined electrical conductivity on a substrate includes the steps of preparing a reaction mixture of a gaseous metallo-organic compound, a metal-free gaseous organic compound and a carrier gas such as argon or mixtures of argon and hydrogen, producing a glow discharge zone in the reaction mixture and exposing the substrate to action of the gaseous metallo-organic compound and the metal-free gaseous organic compound in the glow discharge zone in such a way as to produce a film or layer of the polymer-metal compound with a predetermined electrical conductivity. The selection of the electrical conductivity can be made by setting at least one of a number of parameters of the process including the pressure and temperature of the glow discharge zone, the power density in the glow discharge and particularly the ratio of the amount of metal-free gaseous organic compound to carrier gas.

Abstract: In a method of forming a transparent conductive film, an arc discharge type plasma produced by arc discharging is generated in an atmosphere wherein the pressure of an atmospheric gas is 3.0 .times. 10.sup.-4 Torr or higher; the plasma is converged onto a vapor deposition material for forming a transparent conductive film to thereby evaporate the vapor deposition material, whereby said transparent conductive film is formed on a substrate located above said vapor deposition material.

Abstract: This invention relates to a method for forming a transparent conductive metal oxide film having good characteristic properties. The method comprises feeding an atomized or gasified starting material onto a substrate to form a metal oxide film on the substrate, wherein the substrate is heated to form a first metal oxide film having a good degree of orientation of crystals and a second film formation step wherein a second metal oxide film is formed on the first metal oxide film under higher substrate temperature conditions than those in the first film formation step to form a second metal oxide film having a degree of orientation of crystals in conformity with that of the first metal oxide film.

Abstract: The process for making a thin Molybdenum sulfide film on a substrate in which the physical properties vary in a wide range and can be adjusted to the desired values comprises depositing on the substrate from a reaction gas mixture in the gas phase. This can be accomplished by decomposing a volatile molybdenum compound together with a volatile sulfur compound as a reactive gas in a glow discharge to form the reaction gas mixture in the presence of the substrate. The molybdenum compound can be molybdenum hexacarbonyl. The sulfur compound can be hydrogen sulfide.

Abstract: A thin platinum film which is both conductive and transparent is produced by laser chemical vapor deposition of a suitable organometallic compound, such as allyl cyclopentadienyl platinum. After deposition, the film is annealed to increase the relative abundance of platinum with respect to carbon. The film can be further conditioned by electrically cycling the same in a bath of sulfuric acid.

Abstract: Novel organometallic coating compositions comprising organo bismuth compounds are disclosed, along with a method for chemical vapor deposition to form bismuth oxide films on the surface of a substrate such as glass.

Abstract: A transparency such as an aircraft front window has an electrically conductive metal, e.g. gold, film vacuum deposited thereon for demisting and/or defrosting purposes. To increase the reliability of such metal film, a layer of an oxide of indium, e.g. indium tin oxide, is formed on the metal film by a sputtering operation to a typical thickness of 10 to 200 nm.

Abstract: An organotin coating composition comprising bis-tributyltin oxide is disclosed, along with a chemical vapor deposition method for pyrolyzing it to form a tin oxide film on the surface of a substrate.

Abstract: The invention relates to the production of transparent electric conductors.According to the invention, a doped tin oxide layer formed by CVD is heat-treated to improve its conductivity.

Abstract: Apparatus for pyrolytically forming a metal compound coating on an upper face of a hot glass substrate 1 comprises conveyor means 2 for conveying the substrate 1 in a downstream direction 3. A coating chamber 6 opening downwardly onto the path 1 and means 7 for spraying coating precursor downwardly towards the substrate.The spraying means 7 is located to spray the coating precursor solution from a height above the substrate path 1 of at least 75 cm. Heating means are provided for supplying heat to the spraying zone 9. Means such as aspirator boxes 39 is provided for generating aspirating forces on atmospheric material within the passageway 13 to encourage such material to flow along the substrate path to the downstream end (27) of the passageway and to enter exhaust ducting leading such material away from the substrate path.

Abstract: A method of forming a textured layer of tin oxide on a vitreous substrate in which the thickness and degree of texture of the layer can be controlled independently of one another. The method comprises the steps of depositing a first film of tin oxide on the substrate by chemical vapor deposition from a first reactant mixture of tin chloride, water, and an alcohol and depositing a second film of tin oxide on the first tin oxide film by chemical vapor deposition from a second reactant mixture of tin chloride and water. Where the substrate is ordinary soda lime glass, it preferably is first coated with a film of silicon dioxide. The method permits deposition of substantially uniform layers of tin oxide in a continuous deposition process.

Abstract: Apparatus for use in pyrolytically forming a metal oxide coating on an upper face of a hot glass substrate 1 in sheet or ribbon form comprises conveyor means 2 for conveying the substrate 1 in a downstream direction 3 along a path also indicated at 1 and a roof structure 5 defining a coating chamber 6 opening downwardly onto the path and comprising a passageway 11 along which coating precursor vapor and oxidizing gas can be conducted downstream in contact with the upper substrate face during the conveyance of the substrate. The roof structure 5 defines, in or adjacent the upstream end of the passageway 11, a mixing zone 7 which opens downwardly onto the substrate path 1. Means such as spray nozzle 35 is provided for injecting coating precursor material into the mixing zone 7 from a height of at least 50 cm above the level of the substate path 1.

Abstract: An EL element is composed of a glass base plate, a transparent electrode, a dielectric body layer, a luminous body layer, another dielectric body layer and a rear electrode which are piled on each other in order. An an electron inflow restraining layer is formed between the luminous body layer and another dielectric body layer. The luminous body layer is formed by doping Mn into a ZnS crystal and the electron inflow restraining layer is formed by irradiating gas ions of high energy to the surface of the luminous body layer. The electron inflow restraining layer restrains the inflow of electrons supplied to the luminous body layer while being accelerated by an electric field formed between the transparent electrode and the rear electrode.

Abstract: A novel organotin coating composition comprising tributyltin dimethylpropionate is disclosed, along with a method for preparing it and a method for pyrolyzing it to form a tin oxide film on the surface of a substrate.

Abstract: Haze-free tin oxide coatings are made from an organotin compound which ordinarily gives only hazy coatings. The improvement comprises first forming an undercoat of a haze-free tin oxide film on a substrate, preferably by decomposition of monophenyltin trichloride. Thereafter the tin oxide overcoating assumes the haze-free characteristics of the undercoat film.

Abstract: A method and composition for depositing SiO.sub.2 on substrates by chemical vapor deposition are provided wherein aminoxysilane reagents are utilized. These aminoxysilane reagents pyrolyze at about the same temperatures as organometallic reagents, permitting multiple alternating layers of silicon dioxide and metal oxides to be formed at the same operating temperature.

Abstract: A method of producing a substrate structure for a large size display panel. The method involves conveying a transparent substrate from a transparent substrate storage means in a conveying path through a vacuum chamber, and while conveying the substrate, forming at least a patterned transparent conductive film on a surface of the substrate by depositing strips of conductive film on the substrate through a pattern containing member extending in a direction orthogonal to the substrate conveying direction and having strip forming openings therein at intervals along the lengths thereof, and storing the transparent substrates with the strips thereon at the end of the conveying path.

Abstract: A tin oxide coated article characterized by including a transparent, haze-free tin oxide coating on a substrate, such as glass. The tin oxide coating is formed by deposition from a liquid coating composition including an organotin compound, such as an alkyltin trichloride, and a haze-reducing additive, such as a fluorocarboxylic acid or acid anhydride.

Abstract: An improved liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings by chemical vapor deposition includes the reaction product of a reactive fluorine dopant compound and an organotin compound, preferably 1-30 wt. % of the fluorine dopant and 70-99 wt. % of the organotin compound. The preferred liquid coating composition includes the reaction product of trifluoroacetic acid and monobutyltin trichloride.

Abstract: Apparatus for pyrolytically forming a metal compound coating on an upper face of a hot glass substrate 1 in sheet or ribbon form comprises conveyor means 2 for conveying a the substrate along a path also indicated at 1 in a downstream direction 3, a roof structure 5 defining a coating chamber 6 opening downwardly onto the path 1 and means 7 for discharging coating precursor material into the chamber 6. Upstream of the coating chamber 6 there is an antechamber 25 which communicates with the coating chamber 6 via an entry slot 24 which is defined in part by the path of the substrate 1, and via which gas can be caused to flow into the coating chamber 6 so as to form (when the apparatus is in use) a blanket layer which covers the upper face of the substrate 1 along a first part of the length of the chamber 6. Means 26 is provided for controllably preheating the gas forming the blanket layer.

Abstract: This specification is directed to a method of improving the conductivity and lowering the emissivity of a doped tin oxide film on the surface of a soda lime silica glass sheet. The method includes the steps of heating the glass sheet to a temperature in a range from 1000.degree. F. to 1250.degree. F. Thereafter, a fluorine-containing compound is applied to a surface of the heated glass sheet to react therewith to form a film in which divalent oxygen atoms and hydroxyl ions on the surface of the glass sheet are replaced with monovalent fluorine atoms. In this manner, the surface of the glass sheet is brought closer to a state of electro-neutrality and the monovalent fluorine atoms form a more stable bond with soda and silica atoms of the surface of the glass sheet. Thereafter, a doped tin oxide film is applied to the film formed on the heated glass sheet to a thickness required to give the doped tin oxide film the desired conductivity and emissivity characteristics.

Abstract: It is often required to solder an electrical connection to a component or a lead thereto via a contact pad. At present pads are commonly of materials that tend to oxidize during any subsequent heat processing of the device, and are then difficult to solder. It has now been discovered that certain alloys of copper containing manganese may be used to construct contact pads that are both solderable and remain so even when ovened in air at 200.degree. C., and the invention provides a method of constructing solderable contact pads upon a chosen substrate, in which method there is formed on the relevant area of the substrate a layer of such a manganese/copper alloy.

Abstract: In accordance with the invention, there is provided herein an improved chemical vapor deposition method for forming fluorine-doped tin oxide coatings using a liquid coating composition which includes a reactive organic fluorine dopant and an organotin compound. The method is carried out under a defined set of process conditions such that the coating produced has a minimum and constant sheet resistance which is substantially independent of deposition temperature.

Abstract: A thin-film electroluminescent (EL) display panel comprises a thin-film EL layer, first and second dielectric layers, the thin-film EL layer being disposed between the dielectric layers, first and second metal oxide layers, and first and second electrodes, the first and second metal oxide layers being disposed respectively between the first and second dielectric layers, and the first and second electrodes. Preferably, at least one of the first and second metal oxide layers is made of Al.sub.2 O.sub.3, SiO.sub.2 or the like with a thickness of about 100-800.ANG. and at least one of the dielectric layers being about 1000-3000.ANG..

Abstract: A transparent electroconductive film is of p-type and mainly composed of iridium oxide. The p-type transparent electroconductive film can be produced by a reactive sputtering or reactive ion plating at room temperature. The p-type transparent electroconductive film can be used as electrodes.