Abstract: Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z—R1CH?CHR2, wherein R1 and R2 are, independently, C1 to C6 perfluoroalkyl groups, or C1 to C6 hydrofluoroalkyl groups, and recovering the surface from the composition.

Abstract: A method for controlling a chemical solution applying apparatus is disclosed. The method includes setting at least two dummy dispense rates for dummy dispensation which is periodically carried out by the chemical solution applying apparatus, and switching the dummy dispense rates so that the amount of chemical solution dispensed during a first predetermined period is kept over a predetermined value.

Abstract: The present invention provides a method for easily producing a particle-arranged structure. In the structure produced by the method, particles are regularly arranged. The method of the present invention comprises: preparing a dispersion comprising a solvent, a polymerizable compound dissolved in the solvent and particles insoluble and dispersed uniformly in the solvent; spin-coating the dispersion on a substrate so as to arrange the particles in the liquid phase of the dispersion; and then curing the polymerizable compound.

Abstract: In accordance with the invention, there are articles including hydrophobic composite coating and methods of forming a hydrophobic composite coating. The method of forming a hydrophobic composite coating can include providing a substrate, wherein the substrate can include at least one region. The method can also include providing a dispersion including a plurality of carbon nanotubes, a stabilizer, a hydrophobic polymer, and a solvent, wherein the plurality of carbon nanotubes can be selected from the group consisting of single wall carbon nanotubes and multiple wall carbon nanotubes, and wherein each of the plurality of carbon nanotubes has an aspect ratio of at least about 10. The method can further include applying the dispersion to the one region to form a coated substrate and heating the coated substrate to form a hydrophobic composite coating such that the hydrophobic composite coating has a water contact angle of at least about 120°.

Abstract: This invention describes methods of synthesis and applications of a composite material of a colloidal crystal and a substrate. The method includes steps of (a) providing a substrate having a surface with a surface relief pattern; and (b) applying a liquid dispersion containing colloidal particles onto the surface and spinning the substrate whereby colloidal particles are swept across the surface and self-assemble in void spaces on the surface defined by the relief pattern. The resulting composite material (substrate with colloidal crystal) may be used in various applications such as chromatography, for use in lab-on-chip based devices, micro-reactors and the like. The material may be infiltrated by a material and the composite inverted to remove the colloidal particles to produce an inverted colloidal crystal pattern on the substrate. The material may be selected such that the inverted colloidal crystal pattern is a photonic crystal.

Abstract: The invention discloses isostatic-pressing (IP) applied to polymer (e.g., PTFE) coated razor blade edges to produce thin, dense, and uniform blade edges which in turn exhibit low initial cutting forces correlating with a more comfortable shaves. The isostatic press utilized may be a hot isostatic press (HIP) or cold isostatic press (CIP) or any other isostatic press process. The HIP conditions may include an environment of elevated temperatures and pressures in an inert atmosphere. The HIP conditions may be applied to non-sintered coatings or sintered coatings or before or after a Flutec® process is applied to coatings. CIP conditions may include room temperature and elevated pressure. The polymeric material may be a fluoropolymer or a non-fluoropolymer material or any composite thereof. It may be deposited initially by any method, including but not limited to, dipping, spin coating, sputtering, or thermal Chemical Vapor Deposition (CVD).

Abstract: A method of forming a liquid coating on a substrate that reduces the amount of consumption of the coating liquid and achieves a more even distribution of the thickness of the liquid coating film. The method may include supplying a solvent to a surface of a substrate, starting a supply of a coating liquid to the surface of the substrate while rotating the substrate at a first rotation speed, stopping a rotation of the substrate by decelerating the rotation of the substrate at a deceleration larger than 30000 rpm/sec at a point of time when the supply of the coating liquid is stopped, and then rotating the substrate at a second rotation speed. Accordingly, the dispense amount of the coating liquid is reduced and the film thickness of the coating liquid is flatten.

Abstract: It is an object of the present invention to provide a method for producing a solid substrate used for sensors having a film with a small film thickness distribution, and a solid surface used for sensors having a film with a small film thickness distribution. The present invention provides a method for producing a solid substrate for sensors that has a coating on the surface using spin coating, wherein a substrate to be coated is rotated in an atmosphere in which the vapor pressure of coating solvent is 50% to 100% with respect to the saturation vapor pressure so as to form a thin film of a coating solution on said substrate to be coated.

Abstract: The present invention employs the totally printable process to fabricate an organic/inorganic multi-layered laminate gas barrier film. Such totally printable process is simple with lower costs. Moreover, through the pattern design, the adhesion between the organic and inorganic layers is improved.

Abstract: There are provided a substrate coating method and a substrate coating apparatus to achieve the uniformity of a coating-liquid film and the improvement of the yield by inhibiting the bubbles generated during the application of a coating liquid. Also, there are provided a substrate coating method and a substrate coating apparatus to achieve the effective availability of the coating liquid and the uniformity of the coating-liquid film. According to one example, a substrate coating method includes forming a liquid pool of deionized water by rotating the substrate at low speed of a first rotation speed and supplying deionized water to the center of the substrate, mixing the water-soluble coating liquid with the deionized water by supplying the coating liquid to the center of the substrate in a state where the substrate is rotated at the first rotation speed, and forming the coating-liquid film by rotating the substrate at a second rotation speed higher than the first rotation speed.

Abstract: A closed-loop system and process is used for applying fire retardant chemicals to substrates including fibers, yarns, fabrics or mixtures thereof. Substrates are preferably positioned in a vessel such as a dye machine which circulates the fire retardant chemicals. After absorption of the fire retardant composition, non-absorbed fire retardant chemicals are recovered and re-used on subsequent batches of fibers. The re-use of fire retardant chemicals can take place in the same vessel which is used to treat successive batches of substrates. Alternatively, recovery can be achieved by directing the non-absorbed fire retardant composition into a second dye machine containing additional fibers, or by extracting the fire retardant composition by centrifugation or other means, or by a combination of the two processes. The process is environmentally friendly, and allows for higher throughput on impregnating fibers with fire retardant chemicals.

Abstract: In the present invention, a plurality of exhaust paths connected to a plurality of cup bodies surrounding substrate holding portions respectively are joined together for common use, and the openings of exhaust rate adjustment sections provided on the exhaust paths are adjusted with reference to data in which combinations of the numbers of rotations of the substrate holding portions are associated with combinations of set exhaust rates of the exhaust paths when solution treatment is performed by rotating the substrate by the substrate holding portion. According to the present invention, the cup body can be exhausted at an intended exhaust rate at all times independently of the state where the substrate in which cup body is subjected to which process.

Abstract: The spin coating apparatus includes: a collet including a tubular portion disposed coaxially with a predetermined rotation axis, the tubular portion having a slit that extends from a top portion of the tubular portion in a direction of the rotation axis to a midway part in the direction of the rotation axis; and a diameter-expanding member for urging the tubular portion of the collet radially outwardly to expand the outer diameter of the tubular portion. With the spin coating apparatus, a plate-like workpiece having a center hole is held at the center hole by the tubular portion of the collet with both sides of the workpiece exposed, and a flowable material can be applied to both the sides of the workpiece.

Abstract: A method of fabricating a cleaning wafer capable of cleaning process residues from a substrate support surface is disclosed. The method comprises providing a cleaning disc, and applying a liquid polymer precursor to the cleaning disc by spraying or spin coating the liquid polymer precursor onto the disc to form a polymer precursor film on the disc. The polymer precursor film is cured to form a polymer layer having a cleaning surface.

Abstract: Group IVA (e.g., silicon, germanium) small particle compositions and related methods are described. In some embodiments, the small particle compositions and related methods are used to form a layer on a substrate.

Abstract: A protective film forming method for forming a protective film of resin on a work surface of a wafer.

Abstract: Disclosed herein is an that includes a substrate; and a nanoporous coating disposed thereon; the nanoporous coating having a thickness of about 5 nanometers to about 10 micrometers; where an interface between the substrate and the nanoporous coating is disposed at an angle of about 60 degrees to about 120 degrees to a horizontal; the nanoporous coating being in contact with a liquid; the nanoporous coating being operative to improve the critical heat flux by an amount of about 20% to about 100% over a surface that does not have a nanoporous coating.

Abstract: Coated display pieces. Display pieces for electronic and mechanical displays are coated with a coating material coating. The coating helps to reduce or prevent breakage or shattering and/or to improve light transmission. Methods of making the coated display pieces are also described.

Abstract: A method for forming a photoresist layer is provided. The method includes following steps. A wafer is provided in a semiconductor machine. The wafer is spun at a first spin speed. A pre-wet solvent is dispensed on the spinning wafer by using a nozzle disposed at a fixed position. The pre-wet solvent then stops dispensing. The spin speed of the wafer is adjusted from the first spin speed to a second spin speed which is faster than the first spin speed. Thereafter, a photoresist layer is coated on the wafer.

Abstract: A method for producing zeolite films or membranes at essentially ambient pressure, which includes preparing a synthesis mixture comprising an ionic liquid solvent and an aluminum and/or silicon and/or phosphate source and converting the synthesis mixture to form a continuous zeolite layer. In addition, a method of synthesizing zeolite nanocrystals, which includes preparing a synthesis mixture, the synthesis mixture having a silica or a silica and alumina source, and a template; and synthesizing the synthesis mixture to form zeolite nanocrystals.

Abstract: Spin coating method for a recording medium having a hole in the center, including moving a tip of a feeding nozzle to an initial position at a distance X above a recording surface and a distance A radially apart from a periphery of the hole, feeding a coating liquid onto the recording surface for a predetermined period of time while rotating the recording medium at a predetermined speed, and moving the tip from the initial position along a radial direction towards an outer periphery of the recording medium while keeping the tip above the recording surface at the distance X. X satisfies X?2 [3 r ?/(2 g C)]1/3, where ? and C respectively are surface tension and density of the coating liquid, r is the outer radius of the feeding nozzle, and g is the acceleration of gravity. A satisfies A?r+X/3.

Abstract: In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.

Abstract: The present invention provides compounds of formulae (I), (II), and (III), which can be block copolymers with various substituents and side-chain groups. The side-chains can include semifluorinated alkyl- and PEG-derived groups. The block copolymers can be surface active block copolymers (SABCs) and can be used as antifouling coatings. Coating compositions employing the compounds of the invention and methods for their use are also provided.

Abstract: The present invention discloses a pH buffering hybrid material and the forming method thereof. The pH buffering hybrid material comprises a substrate, a conductive polymer layer on the substrate, and a ZnO nanorod layer produced by deposition of ZnO particles as nucleuses on the conductive polymer layer, and the ZnO particles growing into the ZnO nanorods via hydrothermal reaction. The pH buffering hybrid material has the pH turning ability and the potential of conductivity.

Abstract: Substrates having nanostructures disposed thereon and methods of forming nanostructures on the substrates are disclosed.

Abstract: A polymer film comprising at least two layers, wherein each layer comprises a compound comprising the formula: wherein R1 and R2 are independently selected organic groups. A method of making a polymer film comprising the steps of: providing a monomer solution comprising one or more monomers comprising the formula: wherein R1 and R2 are independently selected organic groups; dispensing the monomer solution onto a substrate; heating the monomer solution on the substrate to polymerize the monomer; and repeating the steps of providing a monomer solution, dispensing, and heating one or more times, wherein the spin-coating is performed on top of the prior spin-coated layer.

Abstract: A method of forming a particle-rod nanostructure is disclosed. The method comprises preparing a mixture comprising an inorganic nanoparticle and an organic molecule in a solvent. The method further comprises spin-coating the mixture to nucleate a crystal growth of the organic molecule on the inorganic nanoparticle deposited on a substrate, yielding the particle-rod nanostructure.

Abstract: The invention relates to a process for producing composite bodies comprising at least one covering layer a) and a rigid foam based on isocyanate b), in which the covering layer a) is moved continuously and the starting material for the rigid foam based on isocyanate b) is applied to the covering layer, wherein the application of the liquid starting material for the rigid foam based on isocyanate b) is effected by means of a fixed tube which is provided with orifices and is arranged parallel to the covering layer a) and at right angles to the direction of movement of the covering layer a).

Abstract: A coating apparatus has a stage module, a temperature regulating module which adjusts a temperature of a substrate to a set temperature, a coating module which applies a coating liquid to the temperature-regulated substrate, and a heating module which heats the coating-liquid applied substrate, arranged in a process section in order from an upstream end of transfer along a transfer path of the substrate, and has a dummy stage placed between the coating module and the heating module so that when by means of a substrate transfer mechanism which has an upper arm and a lower arm, provided one on the other and advanceable and retreatable independently of each other, substrates are transferred one by one from an upstream module to a downstream module in order by alternately operating the upper arm and the lower arm, that arm which performs transfer from the temperature regulating module to the coating module differ from that arm which receives a substrate from the heating module, that numbers are sequentially assig

Abstract: A monoclinic CeTi2O6 thin film and a sol-gel process for the deposition of CeTi2O6 thin films, which has applications as passive counter electrodes in electrochromic devices, sensors and photocatalytic agent is presented. This film can be obtained by spin coating a solution, which comprises both titanium and cerium precursors on to electrically conducting or insulating glass substrates and annealing at a temperature of 600° C. for 5 min. in air. The Ce:Ti mole ratio in the deposition sol for the preparation of the film is identified in the range of 0.4:1 and 0.6:1.

Abstract: A method compensates film height modulations in spin coating of a resist film layer. From a desired layout pattern, a substrate topography as a result of lithographically structuring in image fields is determined. A spin coating model is provided to determine a modeled resist film height based on the substrate topography during spin coating of a resist film. A nominal resist film height by using the spin coating model with an unperturbed substrate topography having a flat surface is determined. Next, film height modulations based on a difference are determined for test points and the desired layout pattern is optimized by implementing further structural elements in order to form an optimized mask pattern by minimizing the film height modulations.

Abstract: The present invention provides a spin coater including a rotation table that rotatably holds the disc substrate, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dripping unit configured to drip an ultraviolet-curable resin composition onto the surface of the disc substrate, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup which is increased by the heating unit each time the ultraviolet-curable resin composition is spread, so as to be constant over multiple spin coating processes.

Abstract: A free standing film includes: i. a matrix layer having opposing surfaces, and ii. an array of nanorods, where the nanorods are oriented to pass through the matrix layer and protrude an average distance of at least 1 micrometer through one or both surfaces of the matrix layer. A method for preparing the free standing film includes (a) providing an array of nanorods on a substrate, optionally (b) infiltrating the array with a sacrificial layer, (c) infiltrating the array with a matrix layer, thereby producing an infiltrated array, optionally (d) removing the sacrificial layer without removing the matrix layer, when step (b) is present, and (e) removing the infiltrated array from the substrate to form the free standing film. The free standing film is useful as an optical filter, ACF, or TIM, depending on the type and density of nanorods selected.

Abstract: The optical storage medium, in particular a read-only optical disc, comprises a substrate layer, a read only data layer comprising a pit structure and being arranged on the substrate layer, a mask layer comprising nanoparticles for providing a super resolution near field effect, and a dielectric layer arranged between the data layer and the mask layer. The dielectric layer has a thickness, which changes in dependency of the pit structure and is for example a plastic layer having a completely flat surface for providing a uniform arrangement of the nanoparticles. For the manufacturing of a respective optical storage medium, the dielectric layer is arranged on the data layer advantageously by means of spin coating.

Abstract: A method of producing a mask blank has a resist film forming (resist coating) process of dispensing a resist solution containing a resist material and a solvent onto a square-like substrate, and rotating the substrate to spread the dispensed resist solution over the substrate and to dry the resist solution on the substrate, thereby forming a resist film on the substrate. While the substrate is rotated in the resist film forming (resist coating) process, an exhausting member performs an exhausting operation to cause an airflow along an upper surface of the substrate from the center of the substrate towards an outer peripheral portion of the substrate so that a puddle of the resist solution formed at a peripheral end portion of the substrate is prevented from being moved towards the center of the substrate by the rotation of the substrate.

Abstract: An apparatus for applying a coating solution and a method of fabricating a liquid crystal display device using the same are provided. In order to improve the shape of the inside of the nozzle and to secure the geometrical uniformity of the inside of the nozzle, the apparatus includes a nozzle comprising a nozzle body, the nozzle body including an external body and an internal body. A distance between the external body and the internal body is controlled. An inlet port is provided on the nozzle body so that coating solution is received, and a discharge port is provided below the nozzle body to coat the surface of a material to be processed with the coating solution and a driving unit for moving the nozzle in a predetermined direction.

Abstract: An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time.

Abstract: One aspect of the invention relates to a linker-free, one-step method of grafting polymer films onto organic substrates, and the films obtained by such a method. In certain embodiments, the grafted polymer films are conductive. In certain embodiments, said grafting method utilizes the ability for Friedel-Crafts catalyst to form radical cations from organic substrates. In one embodiment, the method provides poly-3,4-ethylenedioxythiophene (PEDOT) thin films grafted to organic substrates. In other embodiments, the method is applicable to the polymerization of other monomers to yield conducting polymers, such as polyanilines, polypyrroles, polyfurans, polythiophenes and their derivatives. Remarkably, the polymer films grafted by the inventive methods show enormous increases in adhesion strength. Further, in certain embodiments, polymer patterns were easily obtained using the inventive methods and soft lithography techniques.

Abstract: Techniques for arranging materials on a substrate are provided. In one embodiment, a system may comprise a driver for providing a rotational force, an outer body having an inner surface, and an inner body having an outer surface and disposed within the outer body in a concentric relationship therewith. The inner body may be coupled to the driver to be rotated by the rotational force. The system may further comprise a coupler attached to the outer body in order to retain a substrate, which forms at least one patterned groove therein. A fluid channel, which may be defined between the inner and outer bodies, may be filled with a fluid medium containing materials such as nano materials. When the inner body rotates via the rotational force, the materials contained in the fluid medium may be arranged in the patterned groove of the substrate.

Abstract: The present invention relates to a method for producing an optical recording medium. In the method, on the surface of a recording layer formed by spin-coating a first coating solution containing a photo-isomerizable component, a second coating solution that contains a photo-isomerizable component that can be isomerized by radiation having the same wavelength as radiation used for isomerizing the photo-isomerizable component contained in the recording layer and incapable of dissolving the recording layer is spin-coated to form an intermediate layer. Since the intermediate layer thus formed cannot be dissolved by the first coating solution, a recording layer is further laminated on this layer. Thus, it becomes possible to make the recording layer thicker and also to provide a high-density recording characteristic.

Abstract: Disclosed is a liquid processing apparatus capable of increasing the number of arranged substrate retainers without increasing the total exhaust amount of the liquid processing apparatus. A N-number (N is an integer identical to or greater than three) of cup bodies are inhaled and exhausted in total exhaust amount E through a plurality of separate exhaustion passage each having a first damper, and through a common exhaustion passage connected in common downstream of the separate exhaustion passages. The first dampers are configured such that an external air is received from the cup body in a first intake amount of external air E1 for one of the cup bodies where a chemical liquid nozzle is placed at a setting location facing a wafer, and an external air is received from each of the other cup bodies in a second intake amount of external air E2 less than the first amount E1 and the intake amount of external air from both each of the other cup bodies and each of branched passages equals (E?E1)/(n?1).

Abstract: Embodiments of the invention provide a method for spin coating a film onto a substrate. Preferred embodiments deposit a film, such as a resist, having a thickness gradient from the substrate's centrifugal center to its edge. The gradient may be linear or stepwise continuous, for example. Other embodiments of the invention provide a semiconductor fabrication method. The method comprises forming a resist layer having a predetermined thickness on a substrate. Preferably, the predetermining includes making swing curve measurements on a single test wafer that is coated according to embodiments of the invention.

Abstract: The present invention discloses a method of fabricating organic light emitting diode array, which adopts a directional spin coating technology to grow different organic light-emitting materials on the same plane so as to control the color of the emitted light and accomplish monochrome or full color organic light emitting diodes.

Abstract: There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.

Abstract: The invention provides an ink jet device for producing a biological assay substrate. The device releases a plurality of substances onto the substrate from print heads, provided with the substances. The device further comprises means to subject the printed substrates to an accelerated motion. The accelerated motion which acts about perpendicular to the surface of the substrates acts to control penetration of the substances into the substrate. The invention also relates to a method for producing a biological assay substrate, and to a biological assay substrate obtainable by such method.

Abstract: The present invention relates to a method of producing an ultrahydrophobic surface, the method comprising providing a mixture comprising low surface energy material and a sacrificial material, forming a layer from the mixture wherein the layer contains particles of the sacrificial material, treating the layer so as to destroy the particles of sacrificial material and generate a laterally continuous matrix of solid low surface energy material containing an array of depressions.

Abstract: Dielectric compositions comprising siloxane and polymeric components, as can be used in a range of transistor and related device configurations.

Abstract: The present disclosure is directed to a metal-containing apparatus including a substrate member constructed of a metal that is highly resistant to pitting corrosion and wear in aggressive media. An exemplary metal-containing apparatus is a plate heat exchanger. The metal includes an oxidation layer on the surface thereof and a thin metal oxide nanoporous film on top of the oxidation layer. The nanoporous film is highly compliant and is comprised of oxygen and aluminum, titanium, silicon, zirconium and combinations thereof.

Abstract: A photoresist coating process including a first step and a second step is provided. In the first step, a wafer is accelerated by a first average acceleration. In the second step, the wafer is accelerated by a second average acceleration. The first acceleration and the second acceleration are both larger than zero, and photoresist material is provided to the wafer only in the second step.

Abstract: The present invention contemplates a variety of methods and techniques for fabricating an improved carbon nanotube (CNT) device such as an AFM probe. A CNT is first formed on a desired location such as a substrate. The CNT and substrate are then covered with a protective layer through a CVD or other suitable process. Then a length of the CNT is exposed through etching or other suitable process, the exposed length being formed to a length suitable for a desired application for the CNT device.