Abstract: A surface-coated cutting tool in which a hard coating layer exhibits exceptional adhesion resistance and anomalous damage resistance is provided. This surface-coated cutting tool includes a tool body composed of a WC based cemented carbide or a TiCN based cermet; and at least one hard coating layer provided on a surface of the tool body, and; 1) the hard coating layer includes at least one complex nitride layer, 2) the complex nitride layer contains 0.001 to 0.030 atom % of chlorine, 3) in the complex nitride layer, an area ratio of longitudinal crystal grains having an aspect ratio equal to or greater than 2 occupying a longitudinal cross section is 50% or more, and 4) a layer thickness of the complex nitride layer is 0.2 ?m to 20 ?m.

Abstract: A cutting chain for a chainsaw may include a plurality of drive links, and a plurality of cutter links. Each of the drive links includes a top portion and a bottom portion that interfaces with a guide bar of the chainsaw. The cutter links are operably coupled to respective ones of the drive links at the top portion thereof. At least one of the cutter links includes a base portion and a cutting portion extending away from the base portion. The cutting portion includes a side plate and a top plate, the top plate including a top face and a bottom face. The side plate includes an outer face and an inside face. Multiple coating materials are provided on respective different surfaces of the drive links or cutter links such that different coating materials are applied based on a wear context of the respective different surfaces.

Abstract: A valve device for an internal combustion engine may include a valve and a metallic tungsten matrix coating containing at least one tungsten nanocarbide disposed on at least a portion of the valve via a chemical vapor deposition (CVD) process. The coating may include a thickness ranging from 5 ?m to 150 ?m and a hardness between 500 HV and 2000 HV.

Abstract: Deposition processes are disclosed herein for depositing thin films comprising a dielectric transition metal compound phase and a conductive or semiconducting transition metal compound phase on a substrate in a reaction space. Deposition processes can include a plurality of super-cycles. Each super-cycle may include a dielectric transition metal compound sub-cycle and a reducing sub-cycle. The dielectric transition metal compound sub-cycle may include contacting the substrate with a dielectric transition metal compound. The reducing sub-cycle may include alternately and sequentially contacting the substrate with a reducing agent and a nitrogen reactant. The thin film may comprise a dielectric transition metal compound phase embedded in a conductive or semiconducting transition metal compound phase.

Abstract: A nuclear fuel cladding tube for a liquid-metal or molten-salt cooled reactor includes a tubular body of metal material and a protective coating applied on an outer surface of the tubular body, to contact the coolant. The coating includes at least one layer of coating material selected from the group consisting of ceramic materials, refractory metals, and FeCrAlY alloys, and includes a matrix composed of the coating material in amorphous phase, inside which nanodomains composed of the coating material in crystalline phase are dispersed.

Abstract: An article is coated with a coating having a dark color. In a preferred embodiment, the coating comprises a nickel or polymer basecoat layer, and a first color layer comprised of oxygen-rich refractory metal oxycarbides, a second color layer comprising oxygen-rich refractory metal oxycarbides and a top layer of refractory metal oxides.

Abstract: A method of manufacturing a semiconductor device, includes: alternately performing (i) a first step of alternately supplying a first raw material containing a first metal element and a halogen element and a second raw material containing a second metal element and carbon to a substrate by a first predetermined number of times, and (ii) a second step of supplying a nitridation raw material to the substrate, by a second predetermined number of times, wherein alternating the first and second steps forms a metal carbonitride film containing the first metal element having a predetermined thickness on the substrate.

Abstract: A method of manufacturing a semiconductor device, includes: alternately performing (i) a first step of alternately supplying a first raw material containing a first metal element and a halogen element and a second raw material containing a second metal element and carbon to a substrate by a first predetermined number of times, and (ii) a second step of supplying a nitridation raw material to the substrate, by a second predetermined number of times, wherein alternating the first and second steps forms a metal carbonitride film containing the first metal element having a predetermined thickness on the substrate.

Abstract: A method of manufacturing a semiconductor device, includes: alternately performing (i) a first step of alternately supplying a first raw material containing a first metal element and a halogen element and a second raw material containing a second metal element and carbon to a substrate by a first predetermined number of times, and (ii) a second step of supplying a nitridation raw material to the substrate, by a second predetermined number of times, wherein alternating the first and second steps forms a metal carbonitride film containing the first metal element having a predetermined thickness on the substrate.

Abstract: A process for producing a hard material layer on a substrate includes depositing a TiCNB hard material layer by chemical vapor deposition (CVD) from a gas system including a titanium source, a boron source, at least one nitrogen source and at least one carbon source, in which the carbon source includes an alkane having at least two carbon atoms, an alkene or an alkyne. A cutting tool includes a substrate to which a TiCNB hard material layer has been applied, in which a ratio of carbon atoms (C) to nitrogen atoms (N) in the TiCxNyB1-x-y system deposited on the substrate is 0.70?X?1.0, preferably 0.75?X?0.85, and a polished section through the substrate and the hard material layer is substantially free of an eta phase following Murakami etching.

Abstract: The invention relates to coated bodies made of metal, hard metal, cermet or ceramic material, coated with a single- or multi-layer coating system containing at least one hard material composite coating, and to a method for coating such bodies. The aim of the invention is to develop a coating system for such bodies, which is single- or multi-layered and comprises at least one hard material composite coating, which contains cubic TiAlCN and hexagonal AlN as the main phases and is characterized by a composite structure having a smooth, homogeneous surface, high oxidation resistance and high hardness. The aim includes the development of a method for cost-effectively producing such coatings. The hard material composite coating according to the invention contains cubic TiAlCN and hexagonal AlN as main phases, wherein the cubic TiAlCN is microcrystalline fcc-Ti1-xAlxCyNz where x>0.75, y=0 to 0.25 and z=0.75 to 1 having a crystallite size of ?=0.

Abstract: This disclosure provides (a) methods of making an oxide layer (e.g., a dielectric layer) based on titanium oxide, to suppress the formation of anatase-phase titanium oxide and (b) related devices and structures. A metal-insulator-metal (“MIM”) stack is formed using an ozone pretreatment process of a bottom electrode (or other substrate) followed by an ALD process to form a TiO2 dielectric, rooted in the use of an amide-containing precursor. Following the ALD process, an oxidizing anneal process is applied in a manner is hot enough to heal defects in the TiO2 dielectric and reduce interface states between TiO2 and electrode; the anneal temperature is selected so as to not be so hot as to disrupt BEL surface roughness. Further process variants may include doping the titanium oxide, pedestal heating during the ALD process to 275-300 degrees Celsius, use of platinum or ruthenium for the BEL, and plural reagent pulses of ozone for each ALD process cycle.

Abstract: The invention has an object of providing catalysts that are not corroded in acidic electrolytes or at high potential, have excellent durability and show high oxygen reducing ability. An aspect of the invention is directed to a process wherein metal carbonitride mixture particles or metal oxycarbonitride mixture particles are produced from an organometallic compound of a Group IV or V transition metal, a metal salt of a Group IV or V transition metal, or a mixture of these compounds using laser light as a light source.

Abstract: A method of coating all surfaces of a plurality of piston rings in a single run by a chemical vapor deposition (CVD) process is provided. The method can include providing a coil formed of an iron-based material; heating the coil; and depositing a coating on all surfaces of the coil during a single continuous period of time, without having to move the coil during the CVD process. The coil is maintained in a fixed position during the depositing step. The method next includes splitting the coil into a plurality of separate coated piston rings. Alternatively, the method can include providing a plurality of stacked keystone piston ring bodies; and disposing a cylinder around the stack to maintain the keystone piston ring bodies in position while depositing the CVD coating on all surfaces of the keystone piston ring bodies during the single coating run.

Abstract: Embodiments of the invention generally provide methods for depositing metal-containing materials and compositions thereof. The methods include deposition processes that form metal, metal carbide, metal silicide, metal nitride, and metal carbide derivatives by a vapor deposition process, including thermal decomposition, CVD, pulsed-CVD, or ALD.

Abstract: This disclosure provides (a) methods of making an oxide layer (e.g., a dielectric layer) based on titanium oxide, to suppress the formation of anatase-phase titanium oxide and (b) related devices and structures. A metal-insulator-metal (“MIM”) stack is formed using an ozone pretreatment process of a bottom electrode (or other substrate) followed by an ALD process to form a TiO2 dielectric, rooted in the use of an amide-containing precursor. Following the ALD process, an oxidizing anneal process is applied in a manner is hot enough to heal defects in the TiO2 dielectric and reduce interface states between TiO2 and electrode; the anneal temperature is selected so as to not be so hot as to disrupt BEL surface roughness. Further process variants may include doping the titanium oxide, pedestal heating during the ALD process to 275-300 degrees Celsius, use of platinum or ruthenium for the BEL, and plural reagent pulses of ozone for each ALD process cycle.

Abstract: The invention relates to a method for the coating of a surface of a ceramic basic body with a titanium compound, comprising the steps of (i) providing a preformed ceramic material; (ii) at least one step of surface activation of said ceramic material using a plasma for plasma-chemical surface preparation wherein the plasma comprises high-energy ions; (iii) at least one step of applying a titanium compound bonding layer to said ceramic material by plasma-supported coating wherein the plasma-supported coating is performed in pulsed and/or non-pulsed fashion; (iv) at least one step of applying a functional titanium compound layer by pulsed plasma-supported coating. The invention also relates to novel compositions as well as uses of the novel compositions.

Abstract: The invention relates to a transparent glass substrate, associated with a transparent electro-conductive layer capable of constituting an electrode of a photovoltaic cell and composed of a doped oxide, characterized by the interposition, between the glass substrate and the transparent electroconductive layer, of a mixed layer of one or more first nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) having good adhesive properties with glass, and one or more second nitride(s) or oxynitride(s) or oxide(s) or oxycarbide(s) capable of constituting, possibly in the doped state, a transparent electroconductive layer; a method for producing this substrate; a photovoltaic cell, a tempered and/or curved glass, a shaped heating glass, a plasma screen and a flat lamp electrode having this substrate.

Abstract: In a method for coating at least part of the inner face of a piston ring, said ring preferably consisting of cast iron or steel, a PVD and/or DLC coating is applied by means of at least one of the following methods: PA-CVD, glow discharge and/or HIPIMS. A piston ring has a coating that is formed at least on part of the inner face of said ring, said coating being a PVD and/or DLC coating that preferably has been applied by means of PA-CVD, glow discharge and/or HIPIMS.

Abstract: A brake disk formed of a light weight ceramic and ceramic composite materials, the brake disk having a coating overlying at least a portion of the brake disk. The brake disk includes parallel surfaces wherein at least a portion of the parallel surfaces are coated with a coating material to increase wear resistance and decrease corrosion. The coating over the brake disk includes multiple layers of the coating material, wherein the coating material includes coating material particles configured to construct a pattern of repetition that is consistent with a lattice structure when applied over the parallel surfaces of the brake disk.

Abstract: An approach is provided for coating a golf club head with a material. The approach involves securing a first golf club head component to a second golf club head component using an adhesive, resulting in a golf club head main body having an exterior surface. The approach further includes physical vapor depositing at least one layer on at least a portion of the exterior surface of the golf club head main body at a temperature less than a melting point of the adhesive.

Abstract: A first element (10) adapted to selectively engage a second element (20), wherein the first element comprises a coating (12) and at least an engaging portion (14) of the first element is coated in said coating, wherein the coating is formed by vapour deposition to provide a thermo-chemically stable layer for temperatures up to 800° C. The coating (12) may comprise one or more of a nitride, oxide or carbide of titanium, chromium or aluminium.

Abstract: A vapor phase deposition apparatus 100 for forming a thin film comprising a chamber 1060, a piping unit 120 for supplying a source material of the thin film into the chamber 1060 in a gaseous condition, a vaporizer 202 for vaporizing the source material in a source material container 112 and supplying the vaporized gas in the piping unit 120 and a temperature control unit 180, is presented.

Abstract: The methods described herein relate to deposition of low resistivity, highly conformal tungsten nucleation layers. These layers serve as a seed layers for the deposition of a tungsten bulk layer. The methods are particularly useful for tungsten plug fill in which tungsten is deposited in high aspect ratio features. The methods involve depositing a nucleation layer by a combined PNL and CVD process. The substrate is first exposed to one or more cycles of sequential pulses of a reducing agent and a tungsten precursor in a PNL process. The nucleation layer is then completed by simultaneous exposure of the substrate to a reducing agent and tungsten precursor in a chemical vapor deposition process. In certain embodiments, the process is performed without the use of a borane as a reducing agent.

Abstract: The invention relates to a method for producing a coated substrate body by chemical vapor deposition at least on one layer made of a carbonitride of a metal of IVa-Vla-groups of the periodic table, wherein a monocyclic hydrocarbon is used in the gas atmosphere during the deposition, in addition to a nitrile. According to the invention, the thus produced coated substrate body has a high degree of hardness and is used, preferably, in cutting operations where the cutting speeds are ?250 m/min.

Abstract: This disclosure provides (a) methods of making an oxide layer (e.g., a dielectric layer) based on titanium oxide, to suppress the formation of anatase-phase titanium oxide and (b) related devices and structures. A metal-insulator-metal (“MIM”) stack is formed using an ozone pretreatment process of a bottom electrode (or other substrate) followed by an ALD process to form a TiO2 dielectric, rooted in the use of an amide-containing precursor. Following the ALD process, an oxidizing anneal process is applied in a manner is hot enough to heal defects in the TiO2 dielectric and reduce interface states between TiO2 and electrode; the anneal temperature is selected so as to not be so hot as to disrupt BEL surface roughness. Further process variants may include doping the titanium oxide, pedestal heating during the ALD process to 275-300 degrees Celsius, use of platinum or ruthenium for the BEL, and plural reagent pulses of ozone for each ALD process cycle.

Abstract: A method for coating a tool or tool part, includes providing a base structure of the tool or the tool part at a temperature of 850° C. to 950° C. and applying at least one layer to the base structure. One or more layers of the at least one layer is formed of a metal carbonitride of composed of at least one of titanium, zirconium, hafnium, vanadium, niobium, tantalum and chromium. The one or more layers of the at least one layer is deposited by a deposition of a gas containing methane, nitrogen and at least one metal compound. After beginning the applying, the temperature is increased by at least 40° C. to an increased temperature and the deposition is continued for a time at the increased temperature.

Abstract: A tool die for forming a green ceramic body. The tool die has a wear resistant coating that is deposited on a substrate and has an outer or free surface having a morphology that provides a mean roughness in a range from about 0.03 ?m up to about 0.8 ?m Rq. In one embodiment, the wear resistant coating has multiple alternating layers of fine grained and coarse grained materials. Methods of making the tool die and wear resistant coating are also provided.

Abstract: A process for producing a wear-resistant coating and to a wear-resistant coating on predetermined surfaces (2) of machine or engine parts (1) consisting of a sintered material which are exposed to frictional wear, for fuel feed units in particular, comprising at least one metal-free amorphous hydrocarbon layer (5) with sp2- and sp3-hybridized carbon applied to the predetermined surface (2) of the machine or engine part (I) for reducing friction and increasing the wear resistance of the predetermined surface (2) of the machine or engine part (1), and at least one intermediate layer of a metal-containing hydrocarbon layer formed between the predetermined surface of the machine or engine part and the amorphous hydrocarbon layer wherein the metal is a combination of W, Ti, Hf and Ge.

Abstract: Provided are scratch-, wear- and corrosion-resistant coatings for metal substrates, including orthopedic implants and other metal-containing constructs, as well as methods for making such coatings. The inventive coatings comprise multiple micron-width layers of titanium nitride, titanium carbonitride, or both titanium nitride and titanium carbonitride, and may also contain a layer of aluminum oxide, and may be characterized by alternating layers of titanium nitride and titanium carbonitride. The present coatings curtail the growth of microcracks that can otherwise result from surface cracks or scratches on coated substrates, and thereby provide improved wear characteristics, resist scratching, and prevent the penetration of corrosive fluids to the substrate material.

Abstract: The invention relates to bodies coated with a hard material, comprising a multi-layer coating system containing at least one Ti1-xAlxN hard material coating and to a multi-stage CVD method for producing the bodies. The aim of the invention is to achieve excellent adhesion of the Ti1-xAlxN hard material coating in bodies coated with a hard material comprising a multi-layer coating system containing at least one Ti1-xAlxN hard material coating and a high degree of wear resistance. According to the invention, the bodies coated with a hard material comprising a multi-layer coating system containing at least one Ti1-xAlxN hard material coating are characterized by the following features: the coating system consists of a) a bonding coating applied to the body, consisting of TiN, Ti(C,N) or TiC; b) a phase gradient coating that is applied to the bonding coating; and c) the single or multi-phase Ti1-xAlxN hard material coating or coatings applied to the phase gradient coating.

Abstract: The present invention relates to a method to rationally coat cutting tool inserts comprising a substrate and a coating deposited using a CVD and/or MTCVD method. According to the invention the inserts are positioned on a net with a surface roughness, Ra, of the wires between 2 and 50 ?m.

Abstract: In one embodiment, a method for depositing materials on a substrate is provided which includes forming a titanium nitride barrier layer on the substrate by sequentially exposing the substrate to a titanium precursor containing a titanium organic compound and a nitrogen plasma formed from a mixture of nitrogen gas and hydrogen gas. In another embodiment, the method includes exposing the substrate to the deposition gas containing the titanium organic compound to form a titanium-containing layer on the substrate, and exposing the titanium-containing layer disposed on the substrate to a nitrogen plasma formed from a mixture of nitrogen gas and hydrogen gas. The method further provides depositing a conductive material containing tungsten or copper over the substrate during a vapor deposition process. In some examples, the titanium organic compound may contain methylamido or ethylamido, such as tetrakis(dimethylamido)titanium, tetrakis(diethylamido)titanium, or derivatives thereof.

Abstract: Methods of forming metal compounds such as metal oxides or metal nitrides by sequentially introducing and then reacting metal organic compounds with ozone one or with oxygen radicals or nitrogen radicals formed in a remote plasma chamber. The metal compounds have surprisingly and significantly improved uniformity when deposited by atomic layer deposition with cycle times of at least 10 seconds. The metal compounds also do not contain detectable carbon when the metal organic compound is vaporized at process conditions in the absence of solvents or excess ligands.

Abstract: Embodiments of the invention provide methods for forming hafnium materials, such as oxides and nitrides, by sequentially exposing a substrate to hafnium precursors and active oxygen or nitrogen species (e.g., ozone, oxygen radicals, or nitrogen radicals). The deposited hafnium materials have significantly improved uniformity when deposited by these atomic layer deposition (ALD) processes. In one embodiment, an ALD chamber contains an expanding channel having a bottom surface that is sized and shaped to substantially cover a substrate positioned on a substrate pedestal. During an ALD process for forming hafnium materials, process gases form a vortex flow pattern while passing through the expanding channel and sweep across the substrate surface. The substrate is sequentially exposed to chemical precursors that are pulsed into the process chamber having the vortex flow.

Abstract: A method for producing a substrate having a carbon-doped titanium oxide layer, which is excellent in durability (high hardness, scratch resistance, wear resistance, chemical resistance, heat resistance) and functions as a visible light responding photocatalyst, is provided. The surface of a substrate, which has at least a surface layer comprising titanium, a titanium alloy, a titanium alloy oxide, or titanium oxide, is heat-treated in a combustion gas atmosphere of a gas consisting essentially of a hydrocarbon, or in a gas atmosphere consisting essentially of a hydrocarbon, such that the surface temperature of the substrate is 900 to 1,500° C.; or a combustion flame of a gas consisting essentially of a hydrocarbon, is directly struck against the surface of the substrate for heat treatment such that the surface temperature of the substrate is 900 to 1,500° C., thereby forming a carbon-doped titanium oxide layer, whereby the substrate having the carbon-doped titanium oxide layer is obtained.

Abstract: The present invention relates to a coated cemented carbide insert (cutting tool), particularly useful for wet or dry milling of steels at high cutting speeds, milling of hardened steels, and high feed copy milling of tool steels. The cutting tool insert is characterised by a cemented carbide body comprising WC, NbC, and TaC, a W-alloyed Co binder phase, and a coating comprising an innermost layer of TiCxNyOz with equiaxed grains, a layer of TiCxNyOz with columnar grains and a layer of ?-Al2O3.

Abstract: A method for surface treating a titanium gas turbine engine component. The method includes providing a gas turbine engine component having a titanium-containing surface. The component is heated to a temperature sufficient to diffuse carbon into the titanium and below 1000° F. The surface is contacted with a carbon-containing gas to diffuse carbon into the surface to form carbides. Thereafter, the carbide-containing surface is coated with a lubricant comprising a binder and a friction modifier. The binder preferably including titanium oxide and the friction modifier preferably including tungsten disulfide. The coefficient of friction between the surface and another titanium-containing surface is less than about 0.6 in high altitude atmospheres.

Abstract: A coated product is disclosed consisting of a metallic substrate and a composite coating wherein at least one component of the composite coating is of MAX material type. Furthermore, a method of producing such a coated product is disclosed using vapour deposition technique in a continuous roll to roll process.

Abstract: A coated cutting tool insert is disclosed particularly useful for dry and wet machining, preferably milling, in un-, low- and high alloyed steels and cast iron, with or without raw surface zones. The insert is characterized by a WC—TaC—NbC—Co cemented carbide with a W alloyed Co-binder phase and a coating including an innermost layer of TiCxNyOz with columnar grains and a top layer, at least on the rake face, of a smooth ?-Al2O3.

Abstract: The present invention relates to a cutting insert particularly for turning of stainless steel comprising a cemented carbide substrate and a post-treated coating with a substrate of cemented carbide having a composition of from about 5.0 to less than about 8.0 wt % Co, from about 3.0 to about 8.0 wt % cubic carbides of the metals Ti, Ta and Nb with a Ti/(Ti+Ta+Nb) ratio of from about 0.05 to about 0.3 and balance tungsten carbide (WC) having a grain size of from about 1.5 to about 3.5 ?m in the as-sintered state. Further, the substrate has a surface zone of from about 5 to about 30 ?m characterized by an enrichment of binder phase and a depletion of cubic carbides, and a coating having a first, innermost layer system of one or several layers of TiCxNyOz with x+y+z?1 with a total thickness of from about 0.7 to about 5.

Abstract: A method for manufacturing a diamond film is provided. The material with a low thermal decomposition point is used as a substrate. A buffer layer is formed on the substrate by coating or deposition, and then a diamond film is coated thereon, fitting the shape of the required diamond film. With the buffer layer, the coating or deposition uniformity of the diamond film is improved, and the problems such as thermal stress cracking and assembly damage are solved as well. During a subsequent process of forming the diamond film, the substrate is thermally decomposed due to a high temperature, such that the problems such as stripping and die loss are overcome.

Abstract: A cutting insert preferably for milling of extremely highly alloyed grey cast iron, of a substrate and a coating and methods of making and using the insert are disclosed. The cemented carbide substrate includes WC, of from about 3 to about 8 weight-% Co and less than about 0.5 weight-% carbides of metals from groups IVb, Vb or VIb of the periodic table. The coating has a first, innermost layer of TiCxNyOz with x+y+z=1, y>x and z less than about 0.2, preferably y greater than about 0.8, and z=0, with equiaxed grains with size less than about 0.5 ?m and a total thickness of from about 0.1 to about 1.5 ?m, a layer of TiCxNy with x+y=1, x greater than about 0.3 and y greater than about 0.3, preferably x greater than or equal to about 0.5, with a thickness of greater than about 3 to about 5 ?m with columnar grains with an average diameter of less than about 5 ?m, a layer of a smooth, fine-grained, grain size of from about 0.5 to about 2 ?m, ?-Al2O3 with a thickness of from about 0.

Abstract: A cutting tool insert has a multilayer ceramic coating. The multilayer ceramic coating is a stratified structure of alternating sub layers of an oxide material and interfacial layers of a second material having good adhesion with the oxide material. The ceramic coating is deposited by chemical vapor deposition; each subsequently deposited interfacial layer serving to terminate a previously deposited oxide material sub layer and to serve as a surface for deposition of a subsequent oxide material sub layer. The second material is a solid solution of at least one element of the oxide material in a hard material.

Abstract: Coated milling inserts particularly useful for milling of highly alloyed grey cast iron with or without cast skin under wet conditions at preferably rather high cutting speeds and milling of nodular cast iron and compacted graphite iron with or without cast skin under wet conditions at moderate cutting speeds are disclosed. The inserts are characterised by a WC—Co cemented carbide with a low content of cubic carbides and a highly W-alloyed binder phase and a coating including an inner layer of TiCxNy with columnar grains followed by a layer of ?-Al2O3 and a top layer of TiN.

Abstract: The present invention relates to a coated cutting insert with excellent toughness properties particularly useful for toughness demanding short hole drilling in general steel materials and a method of making the same. The inserts comprise a substrate and a coating. The substrate comprises WC, from about 8 to about 11 wt-% Co and from about 0.2 to about 0.5 wt-% Cr with an average WC-grain size of from about 0.5 to about 1.5 ?m and a CW-ratio of from about 0.80 to about 0.90. The coating comprises a first (innermost) layer of TiCxNyOz with a thickness less than about 1.5 ?m, a layer of TiCxNyOz with a thickness of from about 1 to about 8 ?m with columnar grains, a layer of fine-grained grain ?-Al2O3 with a thickness of from about 0.5 to about 5 ?m and a further layer less than about 1 ?m thick of TiCxNyOz whereby at the rake face the outermost TiCxNyOz-layer and Al2O3-layer are fully or partly missing.

Abstract: The present invention discloses coated inserts particularly useful for milling of compacted graphite iron under wet conditions at moderate cutting speeds comprising a cemented carbide body and a coating. The cemented carbide body comprises WC, from about 7.3 to about 7.9 wt-% Co and from about 1.0 to about 1.8 wt-% cubic carbides of Ta and Nb and a highly W-alloyed binder phase. The radius of the uncoated cutting edge is from about 25 to about 45 ?m. The coating comprises: a first, less than about 1 ?m, TiCxNyOz layer adjacent to the cemented carbide having a composition of x+y=1, x is greater than or equal to 0; a second, from about 1 to about 2 ?m, TiCxNyOz layer having a composition of x greater than about 0.4, y greater than about 0.4 and z is less than about 0.1 and equal to or greater than zero; a third, less than about 1 ?m, TiCxNyOz layer having a composition of x+y+z greater than or equal to about 1 and z greater than about 0; an ?-Al2O3-layer with a thickness of from about 2.1 to about 3.

Abstract: A protective layer for a susceptor is prepared. The susceptor is a graphite block; and the protective layer consists of a titanium nitride film and a titanium carbide film. The susceptor with the protective layer is used in epitaxial growth and device process with life time prolonged, energy saved, and cost reduced.

Abstract: Methods of making a coated cemented carbide body include: forming a powder mixture having WC, 5-12 wt % Co, 3-11% cubic carbides of Ta and Ti with a ratio of Ta/Ti is 1.0-4.0; adding N in an amount of 0.6-2.0% of the weight of Ta and Ti; milling and spray-drying the mixture to form a powder; compacting and sintering the powder at a temperature of 1300-1500° C., in a controlled atmosphere of about 50 mbar followed by cooling, whereby a body having a binder phase enriched and essentially gamma-phase free surface zone of 5-50 ?m in thickness is obtained; applying a pre-coating treatment to the body; and appling a hard, wear-resistant coating to the body.

Abstract: A method of making a cutting insert includes forming a powder mixture containing WC, 2-10 wt % Co, 4-12 wt % cubic carbides, adding N in an amount of 0.9-1.7% of the weight of the cubic carbides, mixing the powder with a pressing agent, milling and spray drying the mixture, compacting and sintering the material at 1300-1500 in an atmosphere of sintering gas 40-60 mbar, applying post-sintering treatment, and applying a coating by CVD or MTCVD.