Abstract: The present invention discloses a solder paste laser induced forward transfer device and method. The device comprises a laser, a beam shaping module, an optical path adjustment module, a solder paste transfer module and a computer control system, wherein the laser is connected to the beam shaping module, followed by the optical path adjustment module, and the solder paste transfer module is located below the optical path adjustment module. The beam shaping module comprises a beam expanding lens, an aperture, a flat-top beam shaper and a spatial light modulator. The optical path adjustment module comprises a two-dimensional galvanometer and an f-? lens. The solder paste transfer module consists of a transparent substrate, a solder paste film, a clamp, a Z-axis lifting table, a receiving substrate, and an XYZ precise moving platform. The computer control system consists of a computer and drivers of other devices.

Abstract: In a method of manufacturing a chemical fluid for manufacturing an electronic material, a method of reducing particulate metal in the chemical fluid is selected according to a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by SP ICP-MS in the chemical fluid, and at least one of the concentration of particulate metal including an iron atom, the concentration of particulate metal including a copper atom, or the concentration of particulate metal including a zinc atom is reduced by using the selected reducing method.

Abstract: To provide a photosensitive composition for hologram recording that enables further improvement in diffraction characteristic. A photosensitive composition for hologram recording that includes at least two kinds of photopolymerizable monomers, a photopolymerization initiator, a binder resin, and a polymerization inhibitor. The at least two kinds of photopolymerizable monomers are a monofunctional monomer and a polyfunctional monomer.

Abstract: A drug delivery device is provided comprising a housing having an exterior surface, drug ex-pelling means comprising an indicator member arranged to move corresponding to an action performed on or by the drug delivery device, and a carrier foil on which is formed or mounted an energy source, electronically controlled communication means, and a processor adapted to (i) receive input from the drug delivery device indicative of indicator member movement and (ii) control the communication means. The flexible carrier foil is mounted on the exterior of the housing, and the flexible carrier foil is covered at least in part by a sealing foil covering directly or indirectly the thereon formed or mounted components, whereby a sealed interior space for the components formed or mounted on the flexible carrier foil is formed between the housing exterior surface and the sealing foil.

Abstract: A transistor manufacturing method includes forming a source electrode and a drain electrode on a substrate, forming a layer including an insulator layer to cover the source electrode and the drain electrode, and forming a gate electrode on the layer including the insulator layer, wherein the forming the gate electrode includes forming a plating base film, forming a protection layer of the plating base film, forming a photoresist layer on the protection layer to expose the photoresist layer with desired patterning light, causing the exposed photoresist layer to come into contact with a developer to remove the photoresist layer and the protection layer until the plating base film is uncovered corresponding to the patterning light, and after depositing a metal on the uncovered plating base film, causing an electroless plating solution to come into contact with the plating base film to perform electroless plating.

Abstract: An additive manufacturing method. The method includes mixing a reflective material including fibers with a photopolymer resin to form a resin mixture having a loading of the reflective material of at least 3 wt. %. The method further includes curing the resin mixture using a light source to form first and second individually cured layers and a bridge of a portion of the fibers between the two layers.

Abstract: Articles, methods of making an article, and resin compositions are disclosed. An article is disclosed that includes a cured light-curable resin having dispersed therein a reflective material that reflects at least 85% of the visible light spectrum. A loading of reflective material may be at least 3 wt. % of the article and the reflective material may comprise over 50 vol. % of a total filler composition of the article. The reflective material may be a white or near-white material, such as cellulose fibers, talc powder, or soy flour. A method is disclosed that includes mixing a reflective material that reflects at least 85% of the visible light spectrum with a photopolymer resin at a loading of at least 3 wt. % to form a resin mixture and curing the resin mixture using a light source in an additive manufacturing process. The disclosed resins may reduce the curing time of additive manufacturing processes.

Abstract: The purpose of the present invention is to provide a thermal transfer sheet which can prevent a kick and a scumming, and can form a photographic tone color image of high quality with a continuous tone image by sublimation transfer, while expanding the range of choices for colorants to be included in a colorant layer; a coating liquid for colorant layer to be used for forming the colorant layer of this thermal transfer sheet; a method for manufacturing this thermal transfer sheet; and image forming method employing this thermal transfer sheet.

Abstract: A plating method includes forming a catalyst layer 118 on a surface of a substrate including an inner surface of a recess 112; drying the substrate having the catalyst layer formed thereon such that an inside of the recess is dried as well; removing the catalyst layer at least on the surface of the substrate at the outside of the recess by supplying a processing liquid, which is configured to dissolve a material of the surface of the substrate, onto the surface of the substrate while rotating the dried substrate and while preventing or suppressing the processing liquid from being introduced into the dried inside of the recess; and forming a plating layer 119 on the inside of the recess, at which the catalyst layer is not removed, by an electroless plating process.

Abstract: A double-sided transparent conductive film including a base material film, having an anti-blocking layer, an optical adjusting layer and a transparent conductive layer formed in this order on each of both sides of the base material film, wherein an anti-blocking layer containing particles is formed at least one of: a location between the base material film and one optical adjusting layer; and a location between the base material film and the other optical adjusting layer, the anti-blocking layer has a flat portion and protrusion portions caused by the particles, and a value obtained by subtracting a thickness of the flat portion of the anti-blocking layer from a mode diameter of the particles is larger than a thickness of the optical adjusting layer.

Abstract: An electromechanical transducer includes a first electrode; a silicon oxide film disposed on the first electrode; and a vibration film including a silicon nitride film disposed on the silicon oxide film with a space therebetween and a second electrode disposed on the silicon nitride film so as to oppose the first electrode.

Abstract: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a ?max of at least 150 nm and up to and including 450 nm. The -A- recurring units are present in the reactive polymer in an amount of up to and including 98 mol % based on total reactive polymer recurring units. The -B- recurring units comprise pendant groups that provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units. The -B- recurring units are present in an amount of at least 2 mol %, based on total reactive polymer recurring units.

Abstract: A photographic material for image display including an intimately sorbed contrast agent that provides a contrast layer against which the recorded image can be seen regardless of the nature and color of the background.

Abstract: The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.

Abstract: An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness, and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.

Abstract: A system and method for forming photoresists over semiconductor substrates is provided. An embodiment comprises a photoresist with a concentration gradient. The concentration gradient may be formed by using a series of dry film photoresists, wherein each separate dry film photoresist has a different concentration. The separate dry film photoresists may be formed separately and then placed onto the semiconductor substrate before being patterned. Once patterned, openings through the photoresist may have a tapered sidewall, allowing for a better coverage of the seed layer and a more uniform process to form conductive materials through the photoresist.

Abstract: A method for verifying repairs on masks for photolithography is provided. A mask fabricated based on a mask layout is inspected for defects, and the positions at which defects are found on the mask are stored in a position file. In a repair step, the defects are repaired and, for each repaired position, in a verification step, an aerial image of the mask is taken at that position and the aerial image is analyzed to determine whether at that position the mask meets tolerance criteria established for one or more selected target parameters, and if the tolerance criteria have been met, the repair is verified. The verification can include a) based on the position file, a desired structure is defined in the mask layout at the repaired position, b) an aerial image is simulated for the desired structure, c) the captured aerial image is compared with the simulated one, and d) based on the comparison, a decision is made as to whether the repair at that position is verified.

Abstract: A radiation-sensitive material comprising a support and a radiation sensitive composition on the support is disclosed, wherein the radiation sensitive composition includes a dispersion containing nanoparticles of a sensitizer.

Abstract: Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for controlling development rate, and a crosslinking agent in a solvent system. The methods involve applying the composition to a substrate and curing the composition. An imaging layer is applied to the composition, followed by light exposure and developing, during which the light-exposed portions of the imaging layer are removed, along with portions of the hard mask composition adjacent said light-exposed portions. The size of the hard mask composition structures are controlled by the development rate, and they yield feature sizes that are a fraction of the imaging layer feature sizes, to give a pattern that can ultimately be transferred to the substrate.

Abstract: A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.

Abstract: An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.

Abstract: A photosensitive resin composition according to the present invention includes: a copolymer having a repeating unit having a thermal crosslinking group; and a photosensitive agent. As such, the photosensitive resin composition according to the present invention can form a resin with improved heat resistance. Further, a microlens-forming photosensitive resin composition according to the present invention includes: a copolymer having a repeating unit having a thermal crosslinking group; and a photosensitive agent, the copolymer having a mass-average molecular weight of 10,000 to 30,000. As such, the microlens-forming photosensitive resin composition according to the present invention can form a resin with improved heat resistance.

Abstract: In a reticle substrate is used for forming a reticle held on a stepper and has main surfaces opposing each other, side faces, and chamfered surfaces formed between main surfaces and side faces, a flatness-measuring area is defined as an area excluding a peripheral area of a width of 3 mm inwardly laid from a boundary between the main surface and the chamfered surfaces and has a flatness of 0.5 ?m or less, and a maximum height from a reference plane falls between ?1 and 0 ?m at the boundary between the main surface and the chamfered surface.

Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.

Abstract: An image forming medium includes a substrate and a mixture including a photochromic material and a solvent wherein the mixture is coated on the substrate, such that the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the solvent.

Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.

Abstract: Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate and a transfer layer of semiconductive material in conjunction with a dielectric. The donor is exposed with the positive image of the desired pattern to be formed on the receiver, such that the exposed portions of the layer of semiconductive and dielectric material are simultaneously transferred, forming the desired pattern of semiconductive and dielectric material on the receiver. The semiconducting material can be patterned to form a thin film transistor. The method can also be used to pattern a light-emitting polymer or small molecule in conjunction with the charge injection layer to form the light-emitting display for light-sensitive organic electronic devices. Donor elements for use in the process are also disclosed.

Abstract: Providing a fabrication method of a periodic domain inversion structure. A nonlinear optical ferroelectric material substrate is provided. A photoresist layer is formed on the upper and the lower surface of the substrate, and periodic gratings formed by interference of two laser beams are employed to expose the photoresist layer on the upper surface. Meanwhile, the two laser beams pass through the substrate, so the periodic gratings are used to expose the photoresist layer on the lower surface. A development process is performed to form a periodic photoresist pattern on the two surfaces of the substrate. A conductive layer is formed above the substrate for covering the photoresist pattern and the surface of the exposed substrate. The photoresist pattern and a portion of the conductive layer thereon are removed by lift-off. A voltage is applied to the substrate via the remaining conductive layer to polarize parts of the substrate.

Abstract: A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiety, and further wherein the point volume of the activation has at least one dimension of less than about 1 micron. The method is of particular utility for water-soluble molecules, particularly biologically active water-soluble molecules.

Abstract: The laminate film for covering of an image carried by a support has a construction comprising a transparent base material and a transparent adhesive layer formed on one side of the base material, wherein the adhesive layer is composed of a pressure-sensitive adhesive and has a surface with a fine uneven structure.

Abstract: Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced.

Abstract: An etching process is described. A material layer having a bottom anti-reflection coating (BARC) and a patterned photoresist layer thereon is provided. An etching step is performed to the BARC using the patterned photoresist layer as a mask. A cleaning step is performed to remove the polymer formed on the surface of the patterned photoresist layer. Thereafter, another etching step is performed to the material layer using the patterned photoresist layer as a mask.

Abstract: A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and disposed on the first layer a second layer which includes an energy photoactive material.

Abstract: A square substrate has a pair of opposed major surfaces and peripheral end faces therebetween, wherein a tapered edge portion is disposed between the peripheral end face and each major surface to define an inner boundary with the major surface, and has a width of 0.2–1 mm from the peripheral end face. Both or either one of the major surfaces of the substrate has a flatness of up to 0.5 ?m in an outside region of the substrate that extends between a position spaced 3 mm inward from the peripheral end face and the inner boundary of the tapered edge portion.

Abstract: The invention relates to a web material comprising a carrier sheet, a continuous pragmatic sheet and an adhesive layer wherein the adhesive layer is between the carrier sheet and the pragmatic sheet, the adhesive layer more strongly adheres to the pragmatic sheet and the pragmatic sheet is narrower than the carrier sheet wherein the side of the carrier sheet in contact with the adhesive is reflective.

Abstract: The invention relates to a web material comprising a carrier sheet, a continuous pragmatic sheet and an adhesive layer wherein the adhesive layer is between said carrier sheet and the pragmatic sheet, said adhesive layer more strongly adheres to the pragmatic sheet and the pragmatic sheet is narrower than the carrier sheet.

Abstract: The invention relates to an image device comprising a base material having a pattern of diffuse and specular metallic reflectivity and overlaying said pattern an image.

Abstract: Micro-lenses for use in imagers and their method of manufacture from intermediate lens structures are described. Lithographic masks are used to remove unwanted portions from the intermediate lens structures and to remove cut-out portions from the intermediate lens structures to alter the radius of the resultant micro-lenses. Lithographic masks are also used to inhibit pull-back of the micro-lenses during a reflow step.

Abstract: A photographic article. According to one embodiment, the photographic article comprises: a first image area comprising a photographic film negative of an image; and a second image area, different than the first image area, comprising a positive image of the image.

Abstract: A method for printing an image on a surface of a substrate having a surface finish defined by a gloss, the method comprising: printing an image on the surface of the substrate, such that image areas thereof have a thickness, when fixed to the substrate and dry, of less than about 6 micrometers of a thermoplastic material; and smoothing the surface of at least a portion of the thermoplastic material.

Abstract: A photographic article. According to one embodiment, the photographic article comprises: a first image area comprising a photographic film negative of an image; and a second image area, different than the first image area, comprising a positive image of the image.

Abstract: A photographic film with a row of sprocket holes formed on each side thereof includes a sensitometric step wedge of different light intensity values exposed along one side of the film, preferably located between the sprocket holes.

Abstract: A thermally imageable layer comprising an aqueous dispersion containing an immiscible compound, typically a near infrared absorber, and a dispersant, typically an acrylic polymer, which layer is useful in laser induced colorant transfer processes.

Abstract: The invention relates to an imaging element comprising an imaging layer and a support, wherein the support comprises a base material having thereon at least two polyolefin layers, wherein the uppermost layer of the at least two polyolefin layers comprises a mixture of optical brighteners comprising a Compound A having the following formula: 1

Abstract: A material delivery system is provided for miniature structures fabrication which has a substrate, a material carrier having a deposition layer, and a laser beam directed towards the material carrier element. A control unit is operatively coupled to the substrate, the material carrier element and laser beam for exposing respective areas of the deposition layer to the laser beam in a patterned manner so that the depositable material of the deposition layer is transferred to the substrate surface for deposition on its surface. The system operates in either an additive mode of operation, or a subtractive mode of operation so that a workpiece does not have to be removed from the tool when change of modes of operation takes place.

Abstract: A photographic article. According to one embodiment, the photographic article comprises: a first image area comprising a photographic film negative of an image; and a second image area, different than the first image area, comprising a positive image of the image.

Abstract: A system and a method are provided for matching the color of a target sample at a remote location. The system has a first computer that is operative to receive and transmit target spectral data at a first location. A second computer in the system is located at a second location remote from the first computer. The second computer is operative to receive the target spectral data or formula identifier from the first computer. The system includes a database including a plurality of data sets. Each data set has at least spectral data corresponding to standard samples. The system also has software capable of searching the database using the target spectral data as search criteria and returning a match with a data set having standard spectral data that matches the target spectral data. The system optionally has a device that can sense the target spectral data of the target sample and input that target spectral data into the first computer, optionally also non-spectral data and QC capability.

Abstract: The optical functional element contains aggregates of developed silver grains obtained by developing silver halide grains arranged so as to constitute a periodical structure. The element includes a substrate and a medium layer. The aggregates of the developed silver grains are arranged in the medium layer so as to constitute said periodical structure. The element is produced by first selectively exposing a photo-curing resin layer formed on said substrate in which the silver halide grains are dispersed so as to selectively photo-cure the photo-curing resin layer, then overall exposing the photo-curing resin layer to expose the silver halide grains in the photo-curing resin layer, and thereafter developing the photo-curing resin layer.

Abstract: A print control for flexographic printing, particularly a flexographic printing form comprising a print control element, and a process for producing such a flexographic printing form.

Abstract: A barrier rib for an EL display element. The rib is formed from the radiation sensitive resin composition containing (A) an alkali soluble resin, (B) a polymerizable compound having an ethylenically unsaturated bond, and (C) a radiation sensitive polymerization initiator.