Abstract: A cleaning fabric wound on a roll (12) is used for cleaning printing cylinders (2, 3, 4) of a printing system (1). The cleaning fabric (13) includes a liquid absorbable material configured to be soaked with a cleaning liquid containing a polar additive configured to make the cleaning liquid polar. The roll (12) of cleaning fabric (13) is included in a cleaning cassette (10) which is movable between an idle position out of contact with the printing cylinders, and an active position in which the cleaning fabric (13) included in the cassette (10) is in contact with a printing cylinder to be cleaned.

Abstract: Latex-based formulations for coating and sculpting applications may provide blending a wet mixture with a dry mixture or blending a wet composition with a dry powder. The formulation may then be applied to a surface. In some embodiments, after the formulation is applied to a surface, the formulation may be set to the surface by covering the formulation applied to the surface with a material and/or the formulation may be self-setting on the surface. The formulation may fill gaps in the surface, thereby reducing cracks and shrinkage of the surface. The formulation may be applied to surfaces in a plurality of applications that may include, but are not limited to, sculpting, molding, and cosmetic repairs.

Abstract: A polymer-based pattern mask system and methods of masking and patterning a substrate employ an organosilane to enhance adhesion between a pattern mask and the substrate. The substrate is compatible with the organosilane. The methods include applying a coating of the organosilane to a substrate surface and printing a pattern mask on the coated surface using a roll-to-roll printing process. The pattern mask is polymer-based. The organosilane enhances adhesion during printing of the pattern mask. The method of patterning further includes patterning the substrate surface and lifting-off the pattern mask. The organosilane further enhances adhesion during patterning and does not hinder lifting-off the pattern mask. The system includes the pattern mask, the organosilane and a lift-off agent to remove the pattern mask.

Abstract: A liquid toner-based pattern mask system and methods of masking and patterning a substrate employ a polymer-based liquid toner as a pattern mask. The liquid toner is deposited on the substrate in a masking pattern. The pattern mask is lifted off of the substrate after patterning the substrate using a lift-off technique that breaks a bond between the surface of the substrate and the pattern mask.