Diazonium Compound Containing Layer Patents (Class 430/157)
  • Patent number: 5618656
    Abstract: An improved image forming method is disclosed which comprises contacting both an originating photographic element and a display photographic element with substantially similar processing solutions. The originating photographic element is characterized in that it contains at least 50 mole percent silver chloride grains and no more than 2 mole percent silver iodide, based on total silver forming the grain projected area. The grains are tabular grains bounded by {100} faces having adjacent edge ratios of less than 100 and each having an aspect ratio of at least 2.
    Type: Grant
    Filed: April 20, 1995
    Date of Patent: April 8, 1997
    Assignee: Eastman Kodak Company
    Inventors: Richard P. Szajewski, John M. Buchanan
  • Patent number: 5618649
    Abstract: The present invention provides an imaging element comprising on a hydrophilic support a light sensitive layer containing a diazo resin or a diazonium salt characterized in that said light sensitive layer contains pullulan. The obtained imaging element shows an improved storage stability.
    Type: Grant
    Filed: May 6, 1996
    Date of Patent: April 8, 1997
    Assignee: AGFA-Gevaert, N.V.
    Inventors: Joan Vermeersch, Guido Hauquier, Dirk Kokkelenberg
  • Patent number: 5589315
    Abstract: A photosensitive composition containing a polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and lithographic printing plates and screen printing plates formed with the same: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: January 6, 1995
    Date of Patent: December 31, 1996
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5556733
    Abstract: A thermal development diazo copying material is composed of a support, a diazo layer which contains a diazo compound, and a coupler layer which contains a coupling component, an alkali-soluble resin and a thermofusible material, which are overlaid on the support.
    Type: Grant
    Filed: March 4, 1994
    Date of Patent: September 17, 1996
    Assignee: Ricoh Company, Ltd.
    Inventors: Shigeru Kusakata, Masanori Rimoto
  • Patent number: 5552260
    Abstract: Acid-sensitive polymers and imageable articles employing them are disclosed. In particular, photosensitive compositions are disclosed comprising: (a) a photoinitiator which generates an acid upon exposure to radiation; and (b) a polymer having acid labile groups pendant from the polymer backbone, said acid labile pendant groups comprising at least one each of A and B wherein A has the formula --T-(C.dbd.O)OCR.sup.1 R.sup.2 OR.sup.3, and B has the formula --T-(C.dbd.O)OR.sup.4 Si(R.sup.5).sub.3, wherein R.sup.1 and R.sup.2 each represent H or an alkyl group with the proviso that at least one of R.sup.1 and R.sup.2 must be hydrogen; R.sup.3 represents an alkyl group; or any two of R.sup.1, R.sup.2, and R.sup.3 may together form a ring group having from 3 to 36 carbon atoms; R.sup.5 represents an alkyl group, aryl group, an alkoxy group, an aryloxy group, an acyloxy group, or a trialkylsiloxy group; and R.sup.4 and T represents a divalent linking group wherein T is bonded to the polymer backbone and R.sup.
    Type: Grant
    Filed: November 16, 1994
    Date of Patent: September 3, 1996
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Dennis E. Vogel, Leonard J. Stulc
  • Patent number: 5550001
    Abstract: A radiation-sensitive plate comprises a substrate coated with a radiation-sensitive composition including a component having groups imparting solubility in aqueous solutions and a component having functional groups capable of reacting with a silane compound. The surface of the composition is modified by reaction with a silane compound. The plate gives rise to images of improved ink receptivity and can be developed in aqueous developer liquids after image-wise exposure.
    Type: Grant
    Filed: May 5, 1994
    Date of Patent: August 27, 1996
    Assignee: DuPont (U.K.) Limited
    Inventors: John R. Wade, Michael J. Pratt, Robert A. W. Johnstone, David I. Smith
  • Patent number: 5543260
    Abstract: A diazo heat-sensitive recording material containing a support having provided thereon a recording layer containing a diazo compound, a coupler, and an organic base, wherein the diazo compound is a compound represented by formula (I): ##STR1## wherein R.sub.1 represents --C(Z.sub.1)(Z.sub.2)--CH.sub.2 --A, --CH.sub.2 --C(Z.sub.1)(Z.sub.2)--A or --{C(Z.sub.1)(Z.sub.2)}.sub.m --A,wherein Z.sub.1 represents an alkyl group, an aralkyl group or an aryl group; Z.sub.2 represents a hydrogen atom, an alkyl group, an aralkyl group or an aryl group; A represents a halogen atom, an acyl group, a cyano group, or a group containing at least one oxygen, nitrogen, phosphorus or sulfur atom through which A is bonded to --CH.sub.2 -- or Z.sub.2 ; and m represents an integer of 1 to 5;R.sub.2 and R.sub.3, which may be the same or different, each represent an alkyl group, an aralkyl group or an aryl group; R.sub.1 and R.sub.
    Type: Grant
    Filed: November 8, 1994
    Date of Patent: August 6, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiichi Tateishi, Sadao Ishige, Hiroshi Kamikawa
  • Patent number: 5536616
    Abstract: A photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a crosslinking agent. The crosslinking agent comprises a water soluble sugar. The present invention also provides a method of making microelectronic structures.
    Type: Grant
    Filed: September 21, 1994
    Date of Patent: July 16, 1996
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Sze-Ming Lee
  • Patent number: 5494772
    Abstract: A heat-sensitive recording material comprising on a support a heat-sensitive layer comprising color-forming component A, color-forming component B which forms a color by reacting with the color-forming component A, and a tricarbocyanine dye having at least two acidic groups, wherein the tricarbocyanine dye has an absorption maximum wavelength of 650 to 1300 nm in the heat-sensitive layer and has an absorption maximum wavelength 50 nm or more longer than that of an aqueous solution of the tricarbocyanine dye.
    Type: Grant
    Filed: March 8, 1993
    Date of Patent: February 27, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Noriyuki Hosoi, Koh Takeuchi, Yoshio Inagaki
  • Patent number: 5492789
    Abstract: A process for producing microcapsules containing a diazonium salt compound, and a photofixation thermal recording material employing the same. The process comprises adding an organic solvent solution containing both the diazonium salt compound and a polyfunctional isocyanate compound to an aqueous solution of a water-soluble polymer, emulsifying the organic solvent solution into the aqueous solution using an emulsifying agent, and then polymerizing the polyfunctional isocyanate compound to form microcapsule walls, said emulsifying agent comprising an alkyl glucoside represented by formula (I): ##STR1## wherein n is an integer of 0 to 2 and R represents a linear or branched alkyl group having 4 to 18 carbon atoms.
    Type: Grant
    Filed: October 26, 1994
    Date of Patent: February 20, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Igarashi, Sadao Ishige
  • Patent number: 5486446
    Abstract: A multi-color heat-sensitive recording material is disclosed which comprises a support having laminated thereon in the following order a first heat-sensitive color forming layer comprising mainly an electron donating dye precursor and an electron accepting compound, a second heat-sensitive color forming layer containing a diazonium salt compound having a maximum absorption wavelength of 360.+-.20 nm and a coupler capable of reacting with the diazonium salt compound by heating to form color and a third heat-sensitive color forming layer containing a diazonium salt compound represented by formula (I) having a maximum absorption wavelength of 400.+-.20 nm and a coupler represented by formula (II) capable of reacting with the diazonium salt compound by heating to form color: ##STR1## wherein R.sub.1 and R.sub.2 each represents an alkyl group, an aralkyl group or an aryl group; Y represents a halogen atom, an acyl group, an alkoxycarbonyl group or a sulfamoyl group; and X.sub.1.sup.
    Type: Grant
    Filed: June 8, 1994
    Date of Patent: January 23, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tetunori Matushita, Hiroshi Kamikawa, Hiroshi Satoh, Kimiatus Nomura, Mitsuyuki Tsurumi
  • Patent number: 5478689
    Abstract: A thermal development diazo copying material is composed of a support, and a photosensitive layer formed thereon, which includes a diazo compound, a coupler, an alkali-soluble resin, and a sensitizer, with only the coupler being contained in microcapsules made of the alkali-soluble resin.
    Type: Grant
    Filed: February 18, 1994
    Date of Patent: December 26, 1995
    Assignee: Ricoh Company, Ltd.
    Inventors: Masanori Rimoto, Shigeru Kusakata
  • Patent number: 5466557
    Abstract: A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid, (4) an infrared absorber, and (5) terephthalaldehyde. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
    Type: Grant
    Filed: August 29, 1994
    Date of Patent: November 14, 1995
    Assignee: Eastman Kodak Company
    Inventors: Neil F. Haley, Steven L. Corbiere
  • Patent number: 5459010
    Abstract: A photosensitive composition comprising a photosensitive material and a polymer, wherein the polymer comprises from 2 to 50 mol % of hydroxyalkyl (meth)acrylate units, of which the main component is units of a hydroxyalkyl (meth)acrylate of the following formula (I): ##STR1## wherein R.sub.1 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10.
    Type: Grant
    Filed: October 4, 1994
    Date of Patent: October 17, 1995
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Shigeki Shimizu, Youichiro Tsuji
  • Patent number: 5445912
    Abstract: The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer contiguous to a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica and is applied at a solids content of more than 200 mg per m.sup.2 but less than 750 mg per m.sup.2.
    Type: Grant
    Filed: March 9, 1994
    Date of Patent: August 29, 1995
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Guido Hauquier, Willem Cortens, Paul Coppens, Joan Vermeersch, Erik Mostaert, Eric Verschueren
  • Patent number: 5443938
    Abstract: A photosensitive printing member comprises a porous supporting member and a photosensitive layer formed on the porous supporting member. The photosensitive layer comprises a photosensitive material and a foaming material or filler melted or dispersed in the photosensitive material. A porous stamp plate can be formed with fewer process steps than the conventional method and without using a mold. As a result, a small number of photosensitive printing members can be used to produce various models of stamps.
    Type: Grant
    Filed: September 24, 1993
    Date of Patent: August 22, 1995
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventor: Jun Sakai
  • Patent number: 5429903
    Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.
    Type: Grant
    Filed: June 17, 1994
    Date of Patent: July 4, 1995
    Assignee: Hoechst Celanese Corporation
    Inventor: Stanley F. Wanat
  • Patent number: 5430130
    Abstract: An photosensitive polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and is adequate as a photosensitive agent for lithographic printing plates and screen printing plates: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: July 4, 1995
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5427887
    Abstract: Disclosed is a light-sensitive composition which comprises(A) a diazo resin and(B) an alkali-soluble and swellable polymer compound, said polymer compound being a vinyl copolymer containing, as a constitutional unit, 0.1 to 10 mole % of a structure derived from an ester of acrylic acid or methacrylic acid having an alkyl group with 8 or more carbon atoms.
    Type: Grant
    Filed: August 16, 1993
    Date of Patent: June 27, 1995
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Satoshi Konuma, Toshiyuki Matsumura, Akihisa Murata, Shigeo Tsuji
  • Patent number: 5424164
    Abstract: A recording material which comprises a support having provided thereon capsules containing a photosensitive diazonium salt, and a polymerizable coupler. The recording material can give a predetermined hue when light, pressure, heat and the like are applied alone or in combination. The main advantages of the recording material are that a specific hue can be selected safely, mixing of colors can be avoided, desensitization problem does not occur and a fixed image can be obtained.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: June 13, 1995
    Assignee: Fuji Photo Film Co., Ltd
    Inventors: Masato Satomura, Ken Iwakura, Akira Igarashi
  • Patent number: 5424166
    Abstract: A negative-working radiation-sensitive mixture which comprisesa) a compound, which forms a strong acid on irradiation, of the general formula ##STR1## in which R.sup.1 is a radical R.sup.2 --SO.sub.2 -- or R.sup.3 --C(O)-- andR.sup.2 and R.sup.3 independently of one another are an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound containing at least two reactive groups which can be crosslinked by an acid andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions, is described.The radiation-sensitive mixture according to the invention is distinguished by a high sensitivity over a wide spectral range. It likewise exhibits a high heat stability and forms no corrosive photolysis products on exposure to light.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: June 13, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Ralph Dammel, Horst Roeschert, Walter Spiess, Winfried Meier
  • Patent number: 5424165
    Abstract: A light-sensitive composition comprises a diazo resin, a polymeric binder and a low molecular weight organic compound having at least 3 carboxyl groups and free of other functional groups containing elements other than hydrogen and carbon atoms. The composition may further comprise a compound carrying at least one phosphorus atom-containing oxoacid residue and a compound carrying at least one sulfonic acid residue. The light-sensitive composition can easily be developed with an aqueous alkaline developer, can provide a lithographic printing plate having good printing durability and has excellent storage stability. Therefore, the developability and resistance to background contamination thereof are not deteriorated even after storing under high temperature and humidity conditions over a long time period.
    Type: Grant
    Filed: December 14, 1992
    Date of Patent: June 13, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5409797
    Abstract: A heat-sensitive recording material for laser recording is provided including a support having thereon a heat-sensitive layer including at least a first substantially colorless coloring component, a second substantially colorless coloring component which reacts with the first substantially colorless coloring component to develop a color, and an infrared-absorbing dye.
    Type: Grant
    Filed: September 7, 1993
    Date of Patent: April 25, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Noriyuki Hosoi, Masao Yabe, Naoto Yanagihara
  • Patent number: 5407777
    Abstract: A diazo-type recording material comprising a support having thereon a recording layer comprising a photosensitive diazo compound enclosed in microcapsules, a coupling component which reacts with said diazo compound by heating at a basic pH to develop a color, and a 1-phenyl-3-pyrazolidone compound represented by the formula: ##STR1## wherein the substituents X, and R.sub.1 -R.sub.4 are defined in the specification.
    Type: Grant
    Filed: November 17, 1992
    Date of Patent: April 18, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hirokazu Shimada, Akihiro Shimomura
  • Patent number: 5401603
    Abstract: A tonable, aqueous-processable, photosensitive element and process for forming a colored image from said element is described. The element comprises a support and a tonable, aqueous-processable photosensitive layer, said photosensitive layer consisting essentially of (a) an aqueous-processable, photoinsolubilizable photosensitive composition comprising a photosensitive material, and (b) a water-soluble plasticizer, wherein said photosensitive material is present in sufficient amount to insolubilize said photosensitive layer on exposure to actinic radiation, said photosensitive composition is present in sufficient amount to form a layer when said photosensitive layer is coated, and said plasticizer is present in sufficient amount to make said photosensitive layer.
    Type: Grant
    Filed: February 15, 1994
    Date of Patent: March 28, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Gregory A. Bodager, Bruce M. Monroe
  • Patent number: 5395734
    Abstract: Acid-sensitive polymers and imageable articles employing them are disclosed. In particular, photosensitive compositions are disclosed comprising: (a) a photoinitiator which generates an acid upon exposure to radiation; and (b) a polymer having acid labile groups pendant from the polymer backbone, said acid labile pendant groups comprising at least one each of A and B wherein A has the formula --T--(C.dbd.O)OCR.sup.1 R.sup.2 OR.sup.3, and B has the formula --T--(C.dbd.O)OR.sup.4 Si(R.sup.5).sub.3, wherein R.sup.1 and R.sup.2 each represent H or an alkyl group with the proviso that at least one of R.sup.1 and R.sup.2 must be hydrogen; R.sup.3 represents an alkyl group; or any two of R.sup.1, R.sup.2, and R.sup.3 may together form a ring group having from 3 to 36 carbon atoms; R.sup.5 represents an alkyl group, aryl group, an alkoxy group, an aryloxy group, an acyloxy group, or a trialkylsiloxy group; and R.sup.4 and T represents a divalent linking group wherein T is bonded to the polymer backbone and R.sup.
    Type: Grant
    Filed: November 30, 1992
    Date of Patent: March 7, 1995
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Dennis E. Vogel, Leonard J. Stulc
  • Patent number: 5393637
    Abstract: Disclosed is a photosensitive composition used for offset printing, which provides an offset printing plate with excellent durability and developability. The photosensitive composition comprises:(I) a film-forming binder resin,(II) a photosensitive substance, and(III) a microgel having a particle size of 0.01 to2.0 .mu. prepared by emulsion polymerization using a polymeric emulsifier having an Sp value of 9 to 16.
    Type: Grant
    Filed: February 28, 1992
    Date of Patent: February 28, 1995
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kazunori Kanda, Yoshifumi Ichinose, Seiji Arimatsu, Katsuji Konishi, Takakazu Hase
  • Patent number: 5382495
    Abstract: It has surprisingly been found that a protective coating composition for diazo-containing materials can be prepared from a cellulose ester, a hydroxylated resin, a crosslinking agent, microcrystalline silica and an acid catalyst. The coating compositions of the invention provide improved protection for diazo-containing materials from physical and chemical damage. The protective coating compositions of the invention are particularly effective for protecting the diazo-containing materials from chemical attack from solvents. The invention further relates to photographic elements and phototools provided with the protective coating composition and a method for providing the coating composition.
    Type: Grant
    Filed: May 1, 1991
    Date of Patent: January 17, 1995
    Assignee: Rexham Graphics, Inc.
    Inventors: Thomas C. Niziolek, George Hodgins, Marie B. Ray
  • Patent number: 5372915
    Abstract: A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
    Type: Grant
    Filed: August 4, 1993
    Date of Patent: December 13, 1994
    Assignee: Eastman Kodak Company
    Inventors: Neil F. Haley, Steven L. Corbiere
  • Patent number: 5372907
    Abstract: A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: December 13, 1994
    Assignee: Eastman Kodak Company
    Inventors: Neil F. Haley, Steven L. Corbiere
  • Patent number: 5348834
    Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: September 20, 1994
    Assignee: Hoechst Celanese Corporation
    Inventor: Stanley F. Wanat
  • Patent number: 5342727
    Abstract: A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl and wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.
    Type: Grant
    Filed: December 20, 1991
    Date of Patent: August 30, 1994
    Assignees: Hoechst Celanese Corp., IBM Corp.
    Inventors: Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis R. McKean, Carlton G. Willson, Ralph Dammel
  • Patent number: 5340681
    Abstract: Photopolymeric printing plates are presented wherein and electrochemically etched and anodized, silicated aluminum substrate has a single photosensitive coating thereon composed of a photopolymerizable combination which includes a photopolymerizable pigment dispersion, a photosensitive lithographic diazonium resin, multifunctional acrylate oligomer, multifunctional acrylate monomer, photopolymerizable binder and photoinitiator to yield a non-tacky, mar resistant, easily developed durable plate. In a preferred embodiment, an additional aqueous, non-photosensitive overcoat is applied over the initial coating to retard oxygen inhibition.
    Type: Grant
    Filed: November 5, 1993
    Date of Patent: August 23, 1994
    Assignee: International Paper Company
    Inventors: Maria T. Sypek, Paul A. Perron, Gary V. Grosclaude
  • Patent number: 5340685
    Abstract: A light-sensitive composition comprises a light-sensitive diazo resin, a polymer binder and a fluorine atom-containing surfactant, wherein the polymer binder is a polyurethane resin having acidic hydrogen atom-containing substituents and comprising structural units derived from a diol represented by the following general formula (I); and the fluorine atom-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group which has a carbon atom number of 3 to 20 and a fluorine atom content of not less than 30% by weight and in which at least three terminal carbon atoms are completely fluorinated, with (ii) poly(oxyalkylene) acrylate or poly(oxyalkylene)methacrylate, the copolymer containing the fluoroaliphatic group-containing acrylate or methacrylate units in an amount ranging from 35 to 50% by weight on the basis of the weight of the copolymer and the copolymer having has a molecular weight ranging from 20,000 to 100,000:HO--(CH.sub.2 CH.sub.2 O).sub.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: August 23, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5340699
    Abstract: A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
    Type: Grant
    Filed: August 4, 1993
    Date of Patent: August 23, 1994
    Assignee: Eastman Kodak Company
    Inventors: Neil F. Haley, Steven L. Corbiere
  • Patent number: 5328796
    Abstract: A diazo type recording material, which has a substantially unstained background, a superior preservability, and is capable of producing images of high density, wherein the diazo recording material comprises a support having thereon a recording layer comprising a photosensitive diazo compound, a hydroxyphenylsulfone derivative and a coupling component which forms a color by reacting with the diazo compound, with the diazo compound being enclosed in microcapsules.
    Type: Grant
    Filed: April 28, 1993
    Date of Patent: July 12, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akihiro Shimomura, Taketatsu Sugiyama, Makoto Ohno, Toshiharu Tanaka
  • Patent number: 5320928
    Abstract: A photosensitive composition comprising a sensitizing amount of light-sensitive diazonium compound and a polyurethane resin binder in an amount sufficient to improve physical property of the composition, wherein said polyurethane resin has at least one group selected from a phosphonic acid group, a phosphoric acid group and ester groups thereof in an amount sufficient to improve adhesion to a support. The photosensitive composition of the present invention provides an excellent adhesion to a support, an excellent developability with an aqueous alkali developer, and a high printing durability.
    Type: Grant
    Filed: September 5, 1991
    Date of Patent: June 14, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 5316892
    Abstract: A negative-working lithographic printing plate having a radiation-sensitive layer comprising a diazo resin, an acid-substituted ternary acetal polymer and an unsaturated polyester is developed with an aqueous developing composition comprising an organic solvent, an anionic surface active agent, sodium oxalate, sodium nitrate or an alkali metal tetraborate an aliphatic monocarboxylic acid, an aliphatic dicarboxylic acid and sufficient alkaline buffering system to provide an alkaline pH. The method effectively avoids problems of blinding and background sensitivity which are of critical concern in the printing art.
    Type: Grant
    Filed: July 23, 1992
    Date of Patent: May 31, 1994
    Assignee: Eastman Kodak Company
    Inventors: John E. Walls, Gary R. Miller, Raymond W. Ryan, Jr.
  • Patent number: 5310618
    Abstract: A light-sensitive composition comprising either an alkali-soluble resin or radical-polymerizable, unsaturated compound, and a diazonium compound represented by general formula (I) or (II):(S).sub.1 --(L.sup.1).sub.m --(D).sub.n (I)--(L.sup.2 (S)).sub.o --(L.sup.3 (D)).sub.P -- (II)wherein D is a diazonium salt group, S is a light absorbing group, L.sup.1, L.sup.2 and L.sup.3 are connecting groups connecting S and D, provided that S and D are not conjugated by L.sup.1, L.sup.2 and L.sup.3 ; l, m, n, o and p are integers.
    Type: Grant
    Filed: May 24, 1991
    Date of Patent: May 10, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kouichi Kawamura
  • Patent number: 5304452
    Abstract: A recording material comprising a support coated with a photosensitive layer comprising a photosensitive diazo compound enclosed in microcapsules and a coupling component. The microcapsules are produced by forming an organic solution containing the diazo compound and a wall monomer, and emulsifying the organic solution in an aqueous solution containing an anionic surface-active agent and polyvinylpyrrolidone to produce oil droplets containing the wall monomer. The wall monomer is polymerized to form a wall around the oil droplets. When heat is applied to the photosensitive layer under alkaline conditions, the coupling component reacts with the diazo compound to form a color.
    Type: Grant
    Filed: October 9, 1992
    Date of Patent: April 19, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Makoto Ohno, Akihiro Shimomura, Toshiharu Tanaka
  • Patent number: 5302487
    Abstract: The invention describes a solvent mixture for photohardenable compositions, which includes(a) a first component having(i) a first constituent of(aa) a polar solvent of the formula R-OH, wherein R is a H or alkyl, or(aa') a monoalkylether or an alkylether ester of a glycol and constituent of(ii) a second an organic solvent having a boiling point in the range of from about 60.degree. to 160.degree. C. and comprising an aliphatic ketone, an alkanoic acid alkylester, a hydroxyalkanoic acid alkylester or a cyclic ether,in quantitative proportions selected to form a homogeneous mixture, andb) from about 0.1 to 8% by weight, relative to the total solvent mixture, of another solvent, the boiling point of which is higher than each individual boiling point of the constituents of the first component (a). The solvent mixture is used to obtain coating solutions layers which have a higher photosensitivity than corresponding layers prepared without the addition of component (b).
    Type: Grant
    Filed: May 19, 1992
    Date of Patent: April 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Reinhold Arneth, Eberhard Hehl, Werner Frass, Guenter Jung
  • Patent number: 5300397
    Abstract: A light-sensitive composition comprising a diazonium compound and a polymer binder wherein the polymer binder comprises structural units represented by the following formula (I); ##STR1## wherein X represents a single bond, an ester bond or an amide bond; and Y represents a polymer group comprising structural units represented by the following formula (II); ##STR2## where Z represents ##STR3## R.sup.1 and R.sup.3 represent hydrogen atom or methyl group; R.sup.2 and R represent a single bond or a divalent bridging group; and R.sup.5 and R.sup.6 represent hydrogen atom or optionally substituted hydrocarbon group having 1 to 15 carbon atoms; and R.sup.7 represents an optionally substituted hydrocarbon group having 1 to 15 carbon atoms. The present light-sensitive composition exhibits extremely enhanced sensitivity and hence gives sufficient image formation with a short light exposure time.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: April 5, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Keitaro Aoshima
  • Patent number: 5286594
    Abstract: Photopolymeric printing plates are presented wherein an electrochemically etched and anodized, silicated aluminum substrate has a single photosensitive coating thereon composed of a photopolymerizable combination which includes a photopolymerizable pigment dispersion, a photosensitive lithographic diazonium resin, multifunctional acrylate oligomer, multifunctional acrylate monomer, photopolymerizable binder and photoinitiator to yield a non-tacky, mar resistant, easily developed durable plate. In a preferred embodiment, an additional aqueous, non-photosensitive overcoat is applied over the initial coating to retard oxygen inhibition.
    Type: Grant
    Filed: June 11, 1992
    Date of Patent: February 15, 1994
    Assignee: International Paper Company
    Inventors: Maria T. Sypek, Paul A. Perron, Gary V. Grosclaude
  • Patent number: 5279917
    Abstract: A light-sensitive composition comprises a light-sensitive compound, an alkali soluble resin and a fluorine-containing surfactant. The surfactant is a copolymer of a (poyoxyalkylene)acrylate or (polyoxyalkylene)methacrylate with an acrylate or methacrylate having a fluorine-containing aliphatic group. The copolymer has a weight average molecular weight of 1000 to 6000 and contains the acrylate or methacrylate in an amount of 10 to 25% by weight. The fluorine-containing aliphatic group has 6 to 20 carbon atoms and 30% or more by weight of fluorine atoms.
    Type: Grant
    Filed: May 4, 1992
    Date of Patent: January 18, 1994
    Assignee: Konica Corporation
    Inventors: Yutaka Adachi, Hideyuki Nakai, Takeshi Tanaka
  • Patent number: 5278030
    Abstract: A developer liquid for image-wise exposed radiation sensitive compositions comprises ethyl hexyl sulphate, a surfactant, and alkaline material such that the pH is al least 12 and preferably at least 13.5. The developer liquid may additionally include a water soluble carboxylic acid salt such as sodium octanoate and the sodium salt of ethylene diamine tetra acetic acid. Such developer liquids can be formulated for use with both positive-working and negative-working compositions.
    Type: Grant
    Filed: November 6, 1990
    Date of Patent: January 11, 1994
    Assignee: Du Pont-Howson Limited
    Inventors: Michael Ingham, Paul A. Styan
  • Patent number: 5278022
    Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub. --Z.sup.+, CO.sub.2 R or SO.sub.3 -Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.
    Type: Grant
    Filed: March 18, 1992
    Date of Patent: January 11, 1994
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: John R. Wade, Robert A. W. Johnstone
  • Patent number: 5275907
    Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.
    Type: Grant
    Filed: July 23, 1992
    Date of Patent: January 4, 1994
    Assignee: Eastman Kodak Company
    Inventor: John E. Walls
  • Patent number: 5272035
    Abstract: A light-sensitive composition comprising (a) a diazonium compound, (b) a polyurethane resin having a substituent group with an acidic hydrogen atom, and (c) a compound of the following general formula: ##STR1## wherein X is a single bond, --O--, --CH.sub.2 --, or --CH.sub.2 O--; Y is an alkyl group, a hydroxy group, an alkoxy group, a nitro group or a halogen atom; n is an interger of from 0 to 5; R is a hydrogen atom, an alkyl group, a phenyl group or a substituted phenyl group; and wherein, when n.gtoreq.2, Y may be the same or different.Also disclosed is a photosensitive lithographic printing plate having a support and a light-sensitive layer deposited thereon. The light-sensitive layer comprises the above novel light-sensitive composition.
    Type: Grant
    Filed: May 15, 1991
    Date of Patent: December 21, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5264318
    Abstract: A positive type photosensitive composition developable with water or warm water alone of water-soluble photocrosslinking agent, water-soluble resin and synthetic resin emulsion and further a coloring agent, if necessary.
    Type: Grant
    Filed: January 7, 1992
    Date of Patent: November 23, 1993
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Norio Yabe, Kuniaki Monden, Hisashi Mino
  • Patent number: 5262270
    Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and a binary acetal polymer which functions as a polymeric binder. The binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: November 16, 1993
    Assignee: Eastman Kodak Company
    Inventor: John E. Walls