Abstract: New aminoazobenzene derivatives of the general formula I ##STR1## in which R and R' independently of one another denote hydrogen, alkyl with up to 4 C atoms or halogen,X denotes hydrogen or O--Y andY denotes alkyl or acyl with in each case up to 4 C atoms or optionally substituted aryl with up to 10 C atoms,are outstandingly suitable as radiation-absorbing substances in negatively operating photoresist compositions.

Abstract: An improved overlay proofing film comprising a substantially transparent polyester base film which is first coated on one or both sides with a non-light sensitive composition having a refractive index of about 1.6, said non-light sensitive composition consisting essentially of a copolymer of polymethyl methacrylate and methacrylic acid, said coated polyester base film having a second coating on either side thereon, said second coating comprising a light sensitive mixture of(a) a resinous binder;(b) a colorant; and(c) a light sensitive material.

Abstract: The invention relates to a photosensitive composition for direct positive color photography. The photosensitive composition comprises a binder containing a plurality of grains of a semiconductor material, each grain having adsorbed on its surface one of three different complexes of spiropyran with a metal salt, each complex being sensitive to a different wavelength of light, a cross-linkable polymer and a free radical initiator. The photographic composition provides a non-silver photographic process based on the photo-decomposition of the metal-spiropyran complex absorbed on the grains of semiconductor material.

Abstract: This invention relates to a radiation-sensitive composition having resistance to oxygen reactive-ion etching and a process for forming a pattern by using the same.The radiation-sensitive composition of this invention comprises a mixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane, said mixture containing 5 to 100 wt. % of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane, and a resist containing a phenolic resin soluble in an aqueous alkali solution.

Abstract: A radiation-sensitive, imageable article comprises in sequence a substrate, a vapor-deposited colorant layer capable of providing a reflection optical density of at least 0.6 to a 10 nm band of the electromagnetic spectrum between 280 and 900 nm, a vapor-deposited metal or metalloid layer of uniform composition, and a photosensitive resist layer which is non-integral with said colorant layer, the ratio of the thickness of said colorant layer to said metal or metalloid layer being at least 7:1.

Abstract: The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

Abstract: The present invention discloses a method of photolytically developing a colored image on a cellulosic material. In this method, the material is contacted with a nitrogen containing polymer in solution and a mono-sulfonyl azide compound in solution. The sample is thereafter exposed to a UV-containing light source for an amount of time sufficient to develop a color thereon.

Abstract: This invention relates to negative photoresist systems containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.

Abstract: A film of a photoresist having phenolic hydroxyl groups is irradiated with far-ultraviolet radiation, and is thereafter developed with an alkaline aqueous solution. Using as a mask a resist pattern thus obtained, dry etching is carried out to form a microscopic pattern. Since the photoresist is highly immune against the dry etching, the microscopic pattern can be formed at a high precision. By adding an azide of a specified structure, the photoresist has its sensitivity to the far-ultraviolet radiation enhanced more.

Abstract: A photoresist composition, comprising, a water-soluble azide compound and a water-soluble polymer in combination with a water-soluble silane compound having at least two alkoxysilane groups.

Abstract: A photosensitive lithographic plate comprising a hydrophilic substrate, a photosensitive diazo resin layer superposed on the substrate, and a layer of a photosensitive polyvinyl acetal resin containing an aromatic azide group in a side chain thereof and having an acid number of 10 to 100 and superposed on the diazo resin layer, and a method for the manufacture of this photosensitive lithographic plate.

Abstract: A photosensitive polymer composition comprising (A) a poly(amic acid), (B) a compound or a mixture of compounds which can form a compound having two or more amino groups in the molecule, and (C) at least one compound having a boiling point of 150.degree. C. or higher at atmospheric pressure and selected from the group consisting of ##STR1## wherein R.sup.a, R.sup.b, R.sup.c, m and n are as defined in the specification, has good properties and does not produce cracks on a pattern at the time of development obtained from said composition.

Abstract: A relief image-forming composition having an acidic pH comprises a photosensitive component and an indicator capable of existing in two states differing in actinic opacity dependent upon pH. A relief image is formed by (1) exposing to light selected areas of a layer of the composition, the indicator being in its state of lower actinic opacity, (2) removing layer material from the exposed areas or from the unexposed areas and (3) shifting the pH in the remaining layer material to a value at which the indicator exists in its state of higher actinic opacity. The resultant image can then be used as an intermediate original in diazotype copying processes.

Abstract: A photoresist composition comprising a sensitizer in a binder that is a naphthol polymer alone or mixed with another compatible resin such as a novolak resin or a polyvinyl phenol. The use of the naphthol resin as a portion of the binder increases the heat distortion temperature of the photoresist composition.

Abstract: This invention relates to a light-sensitive laminate comprising a light-sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light-transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light-transmitting material, photo-imaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.

Abstract: The invention provides a light-sensitive lithographic printing plate containing a light-sensitive composition which has a different degree of solubility in an exposed area of said printing plate than in an unexposed area of said printing plate when said printing plate is developed in a developing solution. This printing plate is produced by a process which comprises coating on a support a solution prepared by dissolving a light-sensitive composition containing a light-sensitive material and at least one fluorinated surfactant having Formula (I) in a quantity of between 0.005% by weight and 0.05% by weight based on the weight of said composition, in at least one solvent having (A) a solubility parameter of at least 8(cal/cm.sup.3)1/2, and (B) a boiling point within the range of from 100.degree. to 200.degree. C. Said Formula (I) is Rf-A-Y, wherein Rf is a partially or completely fluorinated hydrophobic alkyl moiety, A is a single bind or bivalent moiety and Y is a hydrophilic moiety.

Abstract: Photoresist compositions based upon a water-soluble polymer are disclosed together with a water-soluble bisazide compound as a cross-linker, a water-soluble adhesion-improving diazo compound are characterized in that a water-soluble silane compound is included. The compositions are photosensitive, particularly to ultraviolet rays, and adhere well to the substrates to which they are applied. The compositions of the invention are used as photoresists.

Abstract: A presensitized lithographic printing plate, which comprises a support having a hydrophilic surface. A non-silver light-sensitive layer capable of having formed therein a lipophilic image pattern and a direct positive light-sensitive silver halide emulsion layer are provided on the support in that sequence. The non-silver light-sensitive layer is provided with an adjacent hydrophilic colloid layer in which a resin is dispersed in fine particle form. The resin is a copolymer comprising (A) a recurring unit derived from at least one monomer of acrylic acid and methacrylic acid, and (B) a recurring unit derived from at least one monomer of an aralkyl acrylate and an aralkyl methacrylate.

Abstract: Bilayer photosensitive imaging articles comprising a substrate coated with an image layer and a resist layer are disclosed. The substrate may be transparent, translucent or opaque to give imaging articles useful in different applications. The image layer which should be from about 0.3-3.0 microns in thickness includes an organic film-forming vehicle from the group of copolymers of the formula: ##STR1## where P is styrene, ethylene or methyl vinyl ether; m is 1-3; n is 1,10; X is OH, OHN.sub.2, ONH.sub.4, OR, ONH.sub.3 R, ONH.sub.2 R.sub.2, ONHR.sub.3, ONH.sub.3 RNH.sub.2, ONa, OK, OLi; R is an alkyl group in the range C.sub.1 -C.sub.10 optionally including a functional group such as ketone, alcohol, esther, ether alcohol or aryl; m=1-3, n=1-10; and the molecular weight is between 1,000-150,000. The image layer may also include a coloring medium. The resist layer, which should be from about 0.5 to about 2.

Abstract: Disclosed is a pattern formation method comprising exposing a photosensitive composition comprising a bisazide compound represented by the following general formula: ##STR1## wherein A stands for an atom or atomic group selected from O, S, CH.sub.2, CH.sub.2 CH.sub.2, SO.sub.2 and S.sub.2, X stands for an atom or atomic group selected from H and N.sub.3, and when X is H, Z is a group of N.sub.3 and when X is N.sub.3, Z is an atom of H or Cl, and a polymeric compound to deep UV rays, to form fine patterns.

Abstract: The plate-, foil- or strip-shape support materials for offset printing plates are based on chemically, mechanically and/or electromechanically roughened aluminum, or on one of its alloys. Optionally, the aluminum may also have an aluminum oxide layer produced by anodic oxidation. One of the two surfaces the support material has a hydrophilic coating of at least one salt-type hydrophilic organic polymer which is a complex-type product obtained by reacting (a) a water-soluble organic polymer having acid functional groups containing phosphorus or sulfur (for example, polyvinylphosphonic or polyvinylsulfonic acid) with (b) a salt of an at least divalent metal cation.In a process for manufacturing this support material, the complex-type reaction product, dissolved in an aqueous acid, is applied to at least one surface of the support material and the support material thus modified is dried.

Abstract: The plate-, foil- or strip-shape support materials for offset printing plates are based on chemically, mechanically and/or electromechanically roughened aluminum, or on one of its alloys. Optionally, the aluminum may also have an aluminum oxide layer produced by anodic oxidation. One of the two surfaces of the support material has a hydrophilic coating of at least one salt-type hydrophilic organic polymer which is a complex-type product obtained by reacting (a) a water-soluble organic polymer having carboxylate substituents, carboxylic acid amide substituents and/or carboxylic acid imide substituents as functional groups, with (b) a salt of an at least divalent metal cation, and wherein the quantity of complex-type reaction product is less than about 0.1 mg per dm.sup.2 of support material surface.

Abstract: An improved substrate suitable for use as a base for a lithographic printing plate, especially a plate useful for the production of continuous tone images. The substrate is produced by extremely uniformly graining an aluminum sheet which has a highly polished, mirror-like surface.

Abstract: A process for forming an image is disclosed wherein a photosensitive image-forming material comprising a diazonium compound or an azide compound is exposed and developed by a peeling development method wherein a development carrier sheet having thereon a layer of an adhesive composition is adhered to the image-forming material, before or after exposure, and, after exposure, peeled from the image-forming material whereby the exposed areas of the photosensitive layer are adhered to the carrier sheet thereby forming a relief image, and the unexposed areas remaining adhered to the support also forming a relief image.

Abstract: The formation of spots when making a printing plate using a presensitized printing plate comprising a silver halide light-sensitive layer formed on an aluminum support having an aluminum oxide film on the surface directly or over a non-silver light-sensitive intermediate layer is effectively prevented by incorporating a mercapto compound in one of the layers.

Abstract: A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming hisazide compound as a photocuring agent, is disclosed.The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.

Abstract: When a low molecular weight dihydric or trihydric alcohol is added to a photoresist composition comprising a water-soluble polymer substance and a diazide photo-crosslinking agent, the fluidity of the composition is improved and the drying speed is moderately retarded and it enables the formation of a photoresist layer having a uniform film thickness and uniform drying degree. The said alcohol is exemplified by ethylene glycol, glycerol, etc. and is preferably added in an amount of 5-300 parts by weight per 100 parts by weight of the water-soluble polymer substance.

Abstract: A method of providing a negative electron and/or X-ray resist material on a substrate comprising applying a layer of resist material to the substrate, exposing the layer to a pattern of electrons and/or X-rays and removing the unexposed portions of the layer of resist material in which method the resist material comprises a polyvinylcarbazole compound which (a) contains a polymer and/or a copolymer of the formula ##STR1## in which n exceeds 30 which is halogenated in the nucleus or (b) contains a mixture of the copolymer optionally halogenated in the nucleus with a bisazide of the formulaN.sub.3 RN.sub.3in which R represents an organic residue.

Abstract: This invention relates to novel photosensitized sheet constructions which, upon exposure to an energy source through a screened image, can accurately and simultaneously reproduce said image in both its negative and positive forms.

Abstract: A process for forming an image is disclosed wherein a photo-sensitive material composed of a support and a layer of a photo-sensitive composition containing a diazonium compound, an o-quinonediazide compound or an aromatic azide is exposed and developed by heating in intimate contact with a peeling development carrier sheet, and subsequently, peeling the carrier sheet from the photo-sensitive material.

Abstract: Disclosed is an imaging light-sensitive material which comprises a transparent substrate, [I] a polyamide layer containing an alcohol-soluble polyamide as the major component and having a thickness of from 2 to 11 microns and [II] a light-sensitive layer having a thickness of from 0.5 to 5 microns.

Abstract: A photo-sensitive and heat-sensitive composition consisting essentially of a leuco-pigment; a hydrogen donator; a photo-reductant which, when exposed to a visible light, produces a reducing agent by the action of said hydrogen donator coexisting therewith; a photooxidant which, when exposed to an ultraviolet ray, causes said leuco-pigment coexisting therewith to generate color and simultaneously, when reacted with said reducing agent, is deprived of its own oxidizing ability; and a cobalt complex which reacts with the reducing agent in amplifying manner to thereby suppress the reaction of a color-forming system, and a recording element using the same.

Abstract: A support for a lithographic plate comprising an aluminum plate or an aluminum-alloy plate the surface of which has been grained such that the grain structure comprises pits and;(i) the distribution of pit diameter is such that the pits corresponding to 5% and 95% on a cumulative frequency curve for pit diameter are about 3.mu. or more and about 10.+-.1.mu. in diameter, respectively; and(ii) the center line average roughness (Ra) of said surface is on the range from about 0.6 to 1.0.mu.. A light-sensitive material for preparing a lithographic plate is also disclosed.

Abstract: A peel-apart-developable light-sensitive material comprising a light-sensitive element (a) comprising (i) a first support having coated thereon (ii) a thin layer and (iii) a light-sensitive composition layer in this order, in combination with an adhesive element (b) comprising (i) a second support having coated thereon (ii) an adhesive composition layer, wherein the thin layer (ii) has a different composition from the composition of the light-sensitive layer (iii) and having the capability that, where the light-sensitive composition layer (iii) is imagewise exposed to actinic radiation and then one of the first support (i) or the second support (i) is peeled from the combination of the light-sensitive element (a) and the adhesive element (b) laminated together in which the light-sensitive composition layer (iii) is adjacent the adhesive composition layer (ii), all of or a portion of the thin layer (ii) is peeled off with the second support (i), the adhesive composition layer (ii) and the light-sensitive compo

Abstract: A stabilized photosensitive composition comprising a leuco dye, a photooxidizing agent, and further a 2,4-dihydroxybenzaldoxime which is suitable for use in lithography, photoresists, etc., for obtaining visible contrast between the exposed and unexposed areas.

Abstract: The invention presents a novel photoresist composition used in the photoetching in the manufacture of various electronic semiconductor devices, in which the phenomenon of halation adversely affecting the fidelity of the etching patterns can be very much reduced. The photoresist composition of the invention comprises (a) a cyclized rubber, (b) a bisazide compound, (c) a photoextinction agent which is a 4-phenylazo-N,N-disubstituted aniline compound or a related bis derivative of biphenyl or diphenyl ether, and (d) a fluorescent agent which is a N,N'-di(substituted methylene) derivative of a phenylenediamine or hydrazine.With this formulation, the loss of ultraviolet absorption at about 360 nm caused by the photodecomposition of the component (b) is compensated for by the absorption of the photodecomposition product of the component (c) while the component (d) has no absorption at about 360 nm but emits a fluorescence in the range of 380 to 450 nm.

Abstract: A photosensitive image forming material which comprises a transparent support having thereon, in order, a poly(vinyl alcohol) layer, an alcohol soluble polyamide layer and a photosensitive resin composition layer with at least one of the poly(vinyl alcohol) layer and the photosensitive resin composition layer containing a colorant therein; and an image forming method using the image-forming material. Such a layer structure ensures sufficiently layer good adhesion as well as strippability of the developed image on demand.

Abstract: When a low molecular weight dihydric or trihydric alcohol is added to a photoresist composition comprising a water-soluble polymer substance and a bisazide photo-crosslinking agent, the fluidity of the composition is improved and the drying speed is moderately retarded and it enables the formation of a photoresist layer having a uniform film thickness and uniform drying degree. The said alcohol is exemplified by ethylene glycol, glycerol, etc. and is preferably added in an amount of 5-300 parts by weight per 100 parts by weight of the water-soluble polymer substance.

Abstract: An image recording material formed with a support, a photosensitive composition layer formed on the support, and a mono-particle layer of solid particles of different optical transmittances formed on the photosensitive composition layer. When the recording material is exposed to light, the firmness with which the photosensitive composition holds the solid particles varies locally from point to point in accordance with the exposure energies of light passed through the solid particles. Thus by causing the dissolving force of the solvent or other physical forces to act on the photosensitive composition, the particles held weakly are selectively removed from the recording material, whereby an image is formed by the particles left on the recording material. The recording material on which the image has been formed can be used as a printing form as it is or by being subjected to simple after-treatment.

Abstract: There is disclosed a dry system image producing element comprising a substrate, a thin metal layer and a photosensitive layer. After exposing the element to light through a desired pattern, the photosensitive layer is peeled off to obtain a light barrier pattern made from the metal on the substrate corresponding to the photosensitized portion.

Abstract: A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer. By the selection of amine-responsive reducing agent precursors, the amines released by the cobalt(III) complexes cause an amplified image.

Abstract: A photosensitive image forming element comprising: a support; photosensitive layer therein which is rendered alkali-soluble upon exposure and which comprises (i) an azide compound having at least one alkali-soluble group in its molecular structure, and (ii) a polyamide.